Radiation imagery chemistry: process, composition, or product thereof inventions 04/08

20080096116 - Toner and production method thereof, image forming apparatus and image forming method, and process cartridge: The object of the invention is to provide a toner enabling excellent transferring properties, cleanability, and fixability and forming a high-precision image without substantially degraded image quality even after printed on a number of sheets of paper. The invention also provides the toner-production method, an image forming apparatus, an image... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080096113 - Exposure mask, manufacturing method of electronic device, and checking method of exposure mask: According to the present invention, provided is a method of manufacturing a electronic device including forming a film over a substrate, performing a photoresist over the film, performing a first exposure by using an exposure mask which includes a scribe region and a inspection mark formed in a first side... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080096114 - Neck height equalization in magnetic write pole mold: An improved mold, for use in the formation of a perpendicular magnetic write head, is described, together with a process for its manufacture. Conventional alumina is replaced by tantalum in the yoke portion of the mold. When both the tantalum and the alumina areas are simultaneously subjected to reactive ion... Agent: Saile Ackerman LLC

20080096115 - Oxime ester photoinitiators: Compounds of the formula (I), wherein R1, R2 and R10 independently of one another are C1-C20alkyl, phenyl, C1-C12alkylphenyl or phenyl-C1-C6alkyl; R3 and R4 independently of one another are hydrogen, C1-C20alkyl, NR6R7 or SR8, provided that at least one of R3 or R4 is NR6R7 or SR8; R5 is hydrogen or... Agent: Joann Villamizar Ciba Corporation/patent Department

20080096117 - Bisazo compound, 2-hydroxy-3-phenylcarbamoyl naphthalene compound and method manufacturing bisazo compound: wherein, Ar1 and Ar2 independently represent a substituted or non-substituted aryl group, when at least one of Ar1 and Ar2 has a substituent, the substituent is selected from the group consisting of an alkyl group having 1 to 4 carbon atoms, phenyl group, biphenyl group, naphthyl group, anthryl group, and... Agent: Cooper & Dunham, LLP

20080096118 - Polyester resin and manufacturing method thereof, electrostatic-image-developing toner, developing apparatus, cartridge, image-forming apparatus, and micro-reactor apparatus: A polyester resin has a molecular weight distribution (MWD) of approximately from 1.0 to 2.2, wherein molecular weight distribution (MWD) is a weight-averaged molecular weight (Mw)/a number-averaged molecular weight (Mn); and a luminosity (L*) of from approximately 97.0 to 100 when the polyester resin is molded in a diameter of... Agent: Oliff & Berridge, PLC

20080096119 - Toner and method of manufacturing the same: A toner including toner particles comprising a binder resin, a coloring agent and a wax. The toner particles are prepared by agglomerating and/or fusing at least two kinds of resin particulates and particles of the coloring agent dispersed in an aqueous medium. A first resin particulate among the at least... Agent: Cooper & Dunham, LLP

20080096120 - Toner: An eletrophotographic toner comprising toner particles each containing a colorant and a resin, wherein the resin in the toner particle satisfies the following Formulas (1) and (2): Formula (1) 20≦Tg≦40, Formula (2) 15≦(Ta−Tg)≦40, wherein Tg (° C.) is a glass transition point of the resin; and Ta (° C.) is... Agent: Lucas & Mercanti, LLP

20080096121 - Carrier, supplemental developer, developer in image developer, developer feeding apparatus, image forming apparatus and process cartridge: A carrier for use in an image forming apparatus in which a toner and a carrier are fed to an image developer thereof and an extra developer including the toner and the carrier in the image developer is discharged therefrom, wherein at least one of the carrier fed to the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080096122 - Method for imaging with imaging member having filled overcoat layer: A method for forming images including a) depositing an electrostatic latent image on a charge retentive surface of a photoreceptor member having a substrate; a charge transport layer with charge transport materials; and an overcoat layer positioned on the charge transport layer, wherein the overcoat layer includes a crosslinkable alcohol-soluble... Agent: Patent Documentation Center

20080096123 - Process for producing electrophotographic photosensitive member: A process for producing an electrophotographic photosensitive member is disclosed. The electrophotographic photosensitive member includes a conductive support and a surface layer provided thereon containing at least a resin. The process has the step of forming a plurality of depressed portions on the surface layer by irradiation with laser light... Agent: Fitzpatrick Cella Harper & Scinto

20080096124 - Structured thermal transfer donors: A laser induced thermal imaging (LITI) donor film having a substrate, a light-to-heat conversion layer overlaying the substrate, and a transfer layer overlaying the light-to-heat conversion layer. A surface of the transfer layer includes microstructured or nanostructured features, in a continuous or discontinuous pattern, embossed or otherwise imparted in the... Agent: 3m Innovative Properties Company

20080096125 - Antireflective coating compositions: l

20080096126 - Polymer compound, positive resist composition and process for forming resist pattern: wherein R represents a hydrogen atom, a fluorine atom, a lower alkyl group having 20 or less carbon atoms, or a fluorinated lower alkyl group having 20 or less carbon atoms, R1 represents at most 20-membered cyclic group which may have a substituent, n represents 0 or an integer of... Agent: Knobbe Martens Olson & Bear LLP

20080096127 - Photoactive compounds: The present invention relates to novel photoactive compounds that can be used in formulating photoresist compositions.... Agent: Alan P. Kass Clariant Corporation

20080096129 - Process for production of electroluminescent element and electroluminescent element: A process of producing an electroluminescent element is provided. The production process comprises repeating at least twice a step of forming an electroluminescent layer comprising a buffer layer and a luminescent layer by patterning using a photolithographic process, thereby producing an electroluminescent element comprising a patterned electroluminescent layer. The method... Agent: Burr & Brown

20080096128 - Resist composition and patterning process: A chemically amplified positive resist composition comprises a compound having an amine oxide structure as a basic component, a base resin, a photoacid generator, and an organic solvent. The resist composition exhibits a high resolution, significantly prevents a line pattern from collapsing after development, and has improved etch resistance.... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080096131 - Resist composition and patterning process: A resist composition comprises a polymer which increases its alkali solubility under the action of an acid as a base resin, and a copolymer comprising recurring units containing a sulfonic acid amine salt and recurring units containing at least one fluorine atom as an additive. The composition is suited for... Agent: Birch Stewart Kolasch & Birch

20080096130 - Positive resist composition: A positive resist composition comprising (a) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, contains a structural unit having a group represented by formula (X) defined in the specification, has a weight average molecular weight of not more than... Agent: Sughrue Mion, PLLC

20080096133 - Photocurable and thermosetting resin composition, cured product thereof and printed circuit board obtained using the same: A photocurable and thermosetting resin composition comprising (A) a carboxyl-group containing resin, (B) an oxime ester-based photopolymerization initiator containing an oxime ester group, (C) an aminoacetophenone-based photopolymerization initiator and/or a phosphine oxide-based photopolymerization initiator, (D) a compound having at least two ethylenically unsaturated groups in its molecule, (E) a filler,... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080096132 - Polymer latex of high acrylonitrile content, film, pattern forming material and lithographic printing plate precursor using the same, and method for production of polymer latex: A method for producing a polymer latex includes: mixing a polymerizable monomer in which acrylonitrile accounts for 70% by weight or more of a total of the polymerizable monomer, water and a polymerization initiator to conduct emulsion polymerization; and distilling off a monomer unpolymerized in the emulsion polymerization.... Agent: Sughrue-265550

20080096134 - Positive resist composition and pattern forming method using the same: wherein AR represents a substituted or unsubstituted benzene ring or a substituted or unsubstituted naphthalene ring; Rn represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted cycloalkyl group or a substituted or unsubstituted aryl group; and A represents an atom or group selected from the group consisting of... Agent: Sughrue-265550

20080096136 - Method of forming mask pattern of semiconductor device: A method of forming a photoresist pattern for etching an underlying layer of a semiconductor device. A surface of a semiconductor substrate is coated with photoresist. A mask bias is controlled for a mask writer apparatus depending on a mask target critical dimension. The photoresist is exposed and developed based... Agent: Sherr & Nourse, PLLC

20080096135 - Methods for forming patterns of a filled dielectric material on substrates: Methods of forming a pattern of filled dielectric material on a substrate by thermal transfer processes are disclosed comprising exposing to heat a thermally imageable donor element comprising a substrate and a transfer layer of dielectric material. The exposure pattern is the image of the desired pattern to be formed... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20080096137 - Method for fabricating flow channel capable of balancing air pressure: A method for fabricating flow channel capable of balancing air pressure. A device wafer is provided, and a plurality of chambers not conducting to each other are formed on the front surface of the device wafer. Subsequently, a plurality of flow channels are formed on the front surface of the... Agent: North America Intellectual Property Corporation

20080096138 - Method of reducing critical dimension bias during fabrication of a semiconductor device: An anti-reflective hard mask layer left on a radiation-blocking layer during fabrication of a reticle provides functionality when the reticle is used in a semiconductor device manufacturing process.... Agent: Shirley L. Church, Esq.

20080096139 - Mastering based on heat-induced shrinkage of organic dyes: The present invention relates to a method for providing a high-density relief structure in a recording stack of a master substrate, particularly a master substrate for making a stamper for the mass-fabrication of optical discs or a master substrate for making a stamp for micro contact printing. Furthermore, the present... Agent: Philips Intellectual Property & Standards

20080096140 - Ferrule for optical wave guide: An apparatus includes an optical wave guide and a ferrule. The optical wave guide has a prespecified horizontal-positioning surface and a prespecified vertical-positioning surface. The ferrule is to precisely couple with the optical wave guide. The ferrule defines a first datum plane mating with the prespecified vertical-positioning surface of the... Agent: Law Offices Of Michael Dryja

20080096141 - Cleaning liquid for lithography and method for resist pattern formation:

20080096142 - Baking apparatus, substrate heat treatment method and semiconductor device manufacturing method for using baking apparatus, pattern forming method and semiconductor device manufacturing method for using pattern forming method: A baking apparatus according to one embodiment of the invention includes a hotplate which performs heat treatment to a substrate placed on the hotplate, a base which has at least three support pins passing through through-holes made in the hotplate and supporting the substrate on the hotplate from a backside... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080096143 - Non-transparent microvoided biaxially stretched film, production process therefor and process for obtaining a transparent pattern therewith: A non-transparent microvoided biaxially stretched self-supporting non-laminated polymeric film, the film comprising linear polyester as a continuous phase and dispersed uniformly therein an amorphous high polymer with a higher glass transition temperature than the glass transition temperature of the continuous phase and/or a crystalline high polymer having a higher melting... Agent: Leydig Voit & Mayer, Ltd

20080096144 - Silver halide photographic light-sensitive material for movie subtitles: A silver halide photographic light-sensitive material for movie subtitles, includes: a transparent support; and at least one light-sensitive layer and at least one light-insensitive layer, directly or indirectly on the transparent support, wherein the at least one light-insensitive layer comprises at least one kind of a silicone oil.... Agent: Birch Stewart Kolasch & Birch

20080090155 - Deformation-based contact lithography systems, apparatus and methods: One or more of a contact lithography module, a pattern tool and a substrate include a strain control region to prevent deformation-related misalignment.... Agent: Hewlett Packard Company

20080090156 - Photo mask having assist pattern and method of fabricating the same: A photomask has highly reliable assist patterns, and a method of fabricating the same is provided. The photomask includes a transparent substrate, circuit pattern and assist patterns. The circuit pattern recessed into the transparent substrate relative to a surface thereof has a first thickness, and assist patterns located adjacent to,... Agent: Mills & Onello LLP

20080090160 - Alignment for contact lithography: A contact lithography system includes a patterning tool having a pattern for transfer to a substrate; and a sensor disposed on the patterning tool for sensing a magnetic pattern disposed on the substrate to determine alignment between the patterning tool and the substrate. A method of aligning a patterning tool... Agent: Hewlett Packard Company

20080090161 - Recording material, smoothing system, and image-forming system: A recording material has toner reception layers on both surfaces of a base. The toner reception layers have glass transition temperatures in the range of 40 to 80° C. One of the toner reception layers that is to be smoothed prior to the other toner reception layer has a higher... Agent: Canon U.s.a. Inc. Intellectual Property Division

20080090162 - Binder resin composition of toner, toner composition and preparation method thereof: A binder resin composition which can sharply, but reversibly, melt and solidify within a narrow temperature range, a toner composition of enhanced low-temperature fixability and durability having the binder resin composition, and a preparation method thereof. The binder resin composition of the toner includes a first polymer compound having a... Agent: Stanzione & Kim, LLP

20080090158 - Method for designing an index profile suitable for encoding into a phase mask for manufacturing a complex optical grating: A method for designing an index profile suitable for encoding into a phase mask for manufacturing a complex optical grating is provided. The optical grating corresponds to a target index profile defining a target spectral response. A modified index profile is set equal to the target index profile and expressed... Agent: Darby & Darby P.C.

20080090157 - Photo mask with improved contrast and method of fabricating the same: A photo mask which enhances contrast and a method of fabricating the same are provided. The photo mask includes a transparent substrate and a light shielding layer pattern formed on the transparent substrate. The light shielding layer pattern includes apertures through which the transparent substrate is exposed. Depressions aligned with... Agent: Marger Johnson & Mccollom, P.C.

20080090159 - Photomask blank, photomask, and method of manufacture: A photomask blank comprising a multilayer film including at least four layers of different compositions, wherein the interface between the layers is moderately graded in composition; a phase shift mask blank comprising a phase shift film of at least two layers including a surface layer of a composition based on... Agent: Birch Stewart Kolasch & Birch

20080090163 - Emulsion aggregation processes: A process for preparing a toner, includes solvent flashing wax and resin together to emulsify the resin and wax to a sub-micro size; mixing the wax and resin emulsion with a colorant, and optionally a coagulant to form a mixture; heating the mixture at a temperature below a glass transition... Agent: Oliff & Berridge, PLC.

20080090164 - Developer, process cartridge, and image forming apparatus: The invention provides a developer having at least a toner, an aeration ratio (AR) of the developer measured by a powder rheometer being in a range of about 5.0 to about 10.0. It is preferable that the developer further contains an external additive of silica particles having a small diameter.... Agent: Oliff & Berridge, PLC

20080090165 - Toner and developer, toner container, process cartridge, image forming apparatus, and image forming method using the same: To provide a toner containing an ethyl acetate-soluble polyester component and an ethyl acetate-insoluble polyester component, wherein the toner is granulated in an aqueous medium, the ethyl acetate-insoluble polyester component is obtained by elongating and/or cross-linking a modified polyester resin during granulating and/or after granulating, the modified polyester resin is... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080090166 - Addition of extra particulate additives to chemically processed toner: The present invention relates to the combination of a chemically processed toner with extra particulate additive in a conical mixer. The toner may include polymer resins having a glass transition temperature (Tg) wherein the mixer and/or toner may be maintained below the glass transition temperature during mixing. Prior to mixing... Agent: Lexmark International, Inc. Intellectual Property Law Department

20080090167 - Method of addition of extra particulate additives to image forming material: The present invention relates to a method for combining extra particulate additive with toner. The method includes mixing toner and extra particulate additive in a conical mixer having temperature control. The toner may contain polymeric material having a glass transition temperature (Tg) and the mixing may be carried out wherein... Agent: Lexmark International, Inc. Intellectual Property Law Department

20080090168 - Positive type dry film photoresist: A positive type photoresist resin film includes a support film and a thermosetting positive type photoresist resin layer laminated over the support film. The positive type photoresist resin layer contains alkali soluble resin, a diazide based photosensitive compound and a sensitivity enhancer. The support film has a surface roughness that... Agent: Birch Stewart Kolasch & Birch

20080090169 - Composite film suitable as a donor support in a radiation-induced thermal transfer imaging process: A composite film suitable as a donor support in a radiation-induced thermal transfer imaging process, said film comprising a polymeric substrate and a transfer-assist coating layer derived from an aqueous composition comprising one or more water-soluble or water-dispersible radiation-absorbing compound(s).... Agent: Ratnerprestia

20080090170 - Pattern forming template and pattern forming method: A pattern forming template used in a nano-imprinting method is disclosed. An imprint material layer formed of liquid having a photo-setting property is coated on a to-be-processed substrate. A pattern is transferred onto the imprint material layer by applying light to a surface on which the pattern is not formed... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080090173 - Polymer, resist composition, and patterning process: A resist composition comprising an alkali-soluble polymer having lactone units incorporated therein as an additive forms a resist film which has on its surface a reduced contact angle after development and prevents water penetration during immersion lithography.... Agent: Birch Stewart Kolasch & Birch

20080090171 - Positive resist composition for immersion lithography and method for forming resist pattern: wherein R1 is a hydrogen atom or a methyl group; R2 and R3 are each independently represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms; n is an integer of 0 to 3; and Z is an aliphatic cyclic group having 4 to 12 carbon... Agent: Knobbe Martens Olson & Bear LLP

20080090172 - Resist composition and patterning process: A resist composition comprises a polymer comprising recurring units having formula (1) wherein R1, R4, R7, and R14 are H or methyl, R2, R3, R15, and R16 are H, alkyl or fluoroalkyl, R is F or H, R5 is alkylene, R6 is fluorinated alkyl, R8 is a single bond or... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080090174 - Novel oxonol dye compounds and optical information recording medium: r

20080090175 - Positive working light sensitive planographic printing plate material and planographic printing plate manufacturing process employing the same: Disclosed are a positive working planographic printing plate material comprising an aluminum support and provided thereon, a light sensitive layer, wherein the light sensitive layer contains an alkali soluble resin and pigment having on the surface a development restrainer and a positive working planographic printing plate material comprising an aluminum... Agent: Frishauf, Holtz, Goodman & Chick, PC

20080090177 - Resin composition comprising cardo resin, method for forming pattern using the resin composition and color filter using pattern formed by the method: s

20080090176 - Semiconductor wafer and semiconductor device: Disclosed is a semiconductor wafer which is characterized in that a resin layer composed of a resin composition containing a cyclic olefin resin (A) having an epoxy group and a photoacid generator (B) is arranged on a surface on which a circuit element is formed, and the residual stress of... Agent: Smith, Gambrell & Russell

20080090179 - Novel polymer, resist composition and patterning process using the same: There is disclosed a polymer at least comprising repeating units represented by the following general formulae (1) and (2), and the polymer having a mass average molecular weight of 1,000 to 500,000. There can be provided a polymer, and a resist composition, in particular, a chemically amplified positive resist composition... Agent: Oliff & Berridge, PLC

20080090178 - Heat-sensitive transfer image-receiving sheet and coating composition for forming heat-sensitive transfer image-receiving sheet: wherein, R1 represents a hydrogen atom, a halogen atom or a methyl group; L1 represents a divalent linking group; R2 represents an alkylene group having 1 to 5 carbon atoms which may be further substituted; n represents an integer of 1 to 40; Z1 represents a hydrogen atom or a... Agent: Sughrue Mion, PLLC

20080090180 - Method of fabricating semiconductor device: A semiconductor fabrication method may include depositing hexamethyldisilazane (HMDS) on a wafer surface, cooling the wafer and coating the wafer surface with a first photoresist, heating the wafer on which the first photoresist has been coated to induce a silylation reaction, cooling the wafer, and developing and removing the first... Agent: Workman Nydegger

20080090181 - Method for producing submicron structures: The invention relates to a method for producing submicron structures using a shadow mask, whereby a material charge and/or energy charge occurs through the openings of the shadow mask. The method comprises the following steps: a film which is used as a shadow mask and which is made of a... Agent: Diederiks & Whitelaw, PLC

20080090182 - Method for manufacturing microlens: A main object of the present invention is to provide a method for manufacturing a microlens that can easily form a microlens having a smooth shape, in which a maximum thickness position is different from a gravity center position. To attain the object, the present invention provides a method for... Agent: Ladas & Parry LLP

20080090183 - Aligned carbon nanotubes and method for construction thereof: Aligned carbon nanotubes and composites for electrical interconnect and thermal interface materials are provided. In one preferred embodiment, an aligned carbon nanotube device comprises a substrate and a plurality of carbon nanotubes having a substantially vertical profile. The substantially vertical carbon nanotubes are coupled to the substrate. In another preferred... Agent: Troutman Sanders LLP

20080090184 - Positive -working photoimageable bottom antireflective coating: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a... Agent: Sangya Jain Clariant Corp.

20080090185 - Method and apparatus for rinsing a substrate during lithographic development processing: The invention provides a method capable of eliminating occurrence of concentration difference in developer depending on position on a substrate surface when a developer on the substrate is replaced with a rinse; preventing occurrence of stain-like defects on a resist film surface; and reducing amount used of the developer. While... Agent: Townsend And Townsend And Crew, LLP

20080090186 - Method and system for performing development processing during photolithography: A method of eliminating an occurrence of concentration differences in a developer depending on position on a substrate surface when a developer on the substrate is replaced with a rinse, preventing occurrence of stain-like defects on a resist film surface, and reducing amount of the developer used is disclosed. While... Agent: Townsend And Townsend And Crew, LLP

20080090187 - Photothermographic material: m

20080085455 - Methods for storing holographic data and storage media derived therefrom: The present invention provides methods for storing holographic data and articles derived using these methods. The method includes providing an optically transparent substrate comprising a photochemically active dye and a sensitizing solvent. The method further includes irradiating the optically transparent substrate with a holographic interference pattern to form an optically... Agent: General Electric Company Global Research

20080085456 - Radiation mask with spatially variable transmissivity: A mask, a method for creating a mask, and a method for irradiating a substrate through use of the mask. Creating the mask establishes the mask by designing the mask, forming the mask, or both designing and forming the mask. Creating the mask includes receiving a specified target transmittance (TS)... Agent: Schmeiser, Olsen & Watts

20080085458 - Oxime derivatives and use thereof as latent acids: R8, R9, R10 and R11 for example are C1-C6alkyl which is unsubstituted or substituted by halogen; or R8, R9 and R10 are phenyl which is unsubstituted or substituted by C1-C4alkyl or halogen; or R10 and R11 together are 1,2-phenylene or C2-C6alkylene which is unsubstituted or substituted by C1-C4alkyl or halogen.... Agent: Joann Villamizar Ciba Corporation/patent Department

20080085457 - Exposure mask and method of manufacturing a film pattern: A method of manufacturing a film pattern includes forming a film over a substrate, applying a photoresist over the film, exposing the photoresist using a first mask pattern including a first mask opening and a second mask opening, and an optical proximity correction being applied only to the first mask... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080085459 - Electrophotographic photoconductor, and electrophotographic apparatus: There is provided an electrophotographic photoconductor which contains at least a conductive substrate, a photoconductive layer comprising a charge generating material and charge transport material, and a surface layer disposed on the photoconductive layer, disposed in this order, wherein the surface layer is a cross-linked resin which contains at least... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20080085460 - Toner, method of producing the same, developer, and image forming apparatus: A toner that when the complex elastic modulus measured at an angular frequency of 6.28 rad/sec., and a strain amount of 0.3% is 1×106 Pa or more and 1×108 Pa or less, the tangent loss is 0.5 or more and 1.8 or less.... Agent: Oliff & Berridge, Plc

20080085461 - Production method of toner for developing electrostatic image: A production method of a toner for developing an electrostatic image comprising steps of: a suspension process in which a polymerizable monomer composition comprising at least a polymerizable monomer and a colorant is dispersed in an aqueous dispersion medium comprising a dispersion stabilizer to obtain a suspension having droplets of... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080085462 - Lithographic apparatus and device manufacturing method: A device manufacturing method is disclosed that includes providing a substrate on a substrate table, the substrate having a target region comprising a plurality of generally planar surfaces, each surface having a different height relative to the substrate table, determining the relative heights of each generally planar surface, projecting a... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080085463 - Photoactive compounds: wherein C1+ is a cation; each of R30, R31, R32, R33, R34, R35, R36, R37, R38, R39, R40, and R41 are selected from hydrogen, alkyl, alkyl chain optionally containing one or more O atoms, halide, aryl, aralkyl, alkoxyalkyl, cycloalkyl, hydroxyl, and alkoxy, the alkyl, alkyl chain optionally containing one or... Agent: Alan P. Kass Az Electronic Materiales Usa Corp.

20080085466 - Polymer, resist protective coating material, and patterning process: A resist protective coating material comprises a polymer comprising repeat units having formulae (1a) and (1b) and having a Mw of 1,000-500,000. R1a and R1b are H, F or alkyl or fluoroalkyl, R2a, R2b, R3a and R3b are H or alkyl, or R2a and R2b, and R3a and R3b may... Agent: Birch Stewart Kolasch & Birch

20080085465 - Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor: The present invention includes a method of solidifying a polymerizable liquid to form a film on a substrate that features minimizing inhibition of the polymerization process by oxygen contained in the atmosphere surrounding the polymerizable liquid. To that end, the polymerizable liquid includes, inter alia, an initiator that consumes oxygen... Agent: Molecular Imprints

20080085464 - Positive photosensitive composition, polymer compounds for use in the positive photosensitive composition, manufacturing method of the polymer compounds, compounds for use in the manufacture of the polymer compounds, and pattern-forming method using the p: A positive photosensitive composition comprises: a polymer compound having an acid-decomposable structure on a terminal of the polymer compound; and a compound capable of generating an acid upon irradiation with actinic ray or radiation.... Agent: Sughrue-265550

20080085467 - Photosensitive material and optical recording medium using the same: The present invention relates to a powdery photosensitive material comprising evenly dispersed components and free from a variation in quality, and an optical recording medium produced from the photosensitive material. The photosensitive material is produced by a process including freezing a solution of components that constitutes the photosensitive material dissolved... Agent: Amin, Turocy & Calvin, LLP

20080085469 - Novel photoacid generators, resist compositions, and patterning process: R is hydroxyl, alkyl, aryl, hetero-aryl, alkoxy, aryloxy or hetero-aryloxy, R1 is a divalent organic group which may have a heteroatom (O, N or S) containing substituent, or R1 may form a cyclic structure with R. The photoacid generators are compatible with resins and can control acid diffusion and are... Agent: Birch Stewart Kolasch & Birch

20080085468 - Resist composition and pattern forming method using the same: i

20080085470 - Hydrogenated ring-opening metathesis polymer, resist composition comprising the same and patterning method: wherein, e and f represent respectively an integer of 0 to 3, wherein the at least one of X1 of the general formula [1] of the structural unit [A], X of the general formula [3] and X3 of the general formula [4] of the structural unit [B] is —O—, and... Agent: Buchanan, Ingersoll & Rooney Pc

20080085471 - Photolithographic method using multiple photoexposure apparatus: A photoexposure method photoexposes a photosensitive material layer located over a substrate while using a first set of photoexposure conditions that includes use of a first photoexposure apparatus. The photoexposure method then photoexposes the once photoexposed photosensitive material layer located over the substrate while using a second set of photoexposure... Agent: Scully, Scott, Murphy & Presser, P.c.

20080085472 - Method of fabricating semiconductor device: A method of fabricating a semiconductor device includes forming a first mask layer on a semiconductor substrate, forming a second mask layer on the first mask layer, patterning the first mask layer and the second mask layer to form a first mask pattern and a second mask pattern, respectively, the... Agent: Lee & Morse, P.c.

20080085473 - Copolymer for use in chemical amplification resists: A copolymer is provided for use in a lithographic photoresist composition, particularly a chemical amplification photoresist. In a preferred embodiment, the copolymer is substantially transparent to deep ultraviolet radiation, i.e., radiation of a wavelength less than 250 nm, including 157 nm, 193 nm and 248 nm radiation, and has improved... Agent: Mintz, Levin, Cohn, Ferris, Glovsky And Popeo, P.c

20080085474 - Exposure method using near field light and pattern formation method using the method: Provided is an exposure method using near field light which can form a pattern finer than a mask pitch and avoid difficulty when forming a mask for fine lithography at unity magnification. The exposure method is configured such that a mask including a light shielding film with a fine opening... Agent: Fitzpatrick Cella Harper & Scinto

20080085476 - Fluid ejection device with dry-film photo-resist layer: Methods of manufacturing a fluid ejection device comprise, in one embodiment, forming filler structures on a substrate and laminating a dry film onto the substrate over the filler structures. The dry film defines a barrier layer around the filler structures and an orifice layer above the filler structures. The filler... Agent: Hewlett Packard Company

20080085477 - Method and apparatus for processing a wafer: A method of a single wafer wet/dry cleaning apparatus comprising: a transfer chamber having a wafer handler contained therein; a first single wafer wet cleaning chamber directly coupled to the transfer chamber; and a first single wafer ashing chamber directly coupled to the transfer chamber.... Agent: Applied Materials/blakely

20080085475 - Method of imaging and developing negative-working elements: Negative-working imagable elements can be imaged and then developed using a lower pH organic-based single-phase developer that is less toxic and corrosive and that can be more readily disposed of after use. This developer has a pH less than 12 and comprises a) an amphoteric surfactant comprising a nitrogen-containing heterocycle,... Agent: Andrew J. Anderson Patent Legal Staff

20080085478 - Structure for pattern formation, method for pattern formation, and application thereof: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.... Agent: Ladas & Parry LLP

20080085479 - Pattern forming method and device production process using the method: A pattern forming method for forming a pattern comprising a plurality of fine particles disposed on a substrate includes a step of forming, on the substrate, a silane coupling agent-containing layer containing an amino group-containing silane coupling agent; a step of forming a negative resist layer or a dissolution inhibition... Agent: Fitzpatrick Cella Harper & Scinto

20080085480 - Method to remove resist layers from a substrate: A method for removing a resist layer from a substrate is described. The method for removing a resist layer from a substrate, wherein the resist layer comprises bulk resist contacting the substrate and a resist crust being present at the outer surface of the resist layer, includes providing at least... Agent: Mcdonnell Boehnen Hulbert & Berghoff LLP

20080085481 - Rolls of optical film: An exemplary roll of film includes an oriented optical film comprising a birefringent material characterized by an effective orientation axis and a normalized difference between a refractive index for light polarized along TD and a refractive index for light polarized along ND being less than 0.06. The optical film has... Agent: 3m Innovative Properties Company

20080085482 - Copolymer and photothermographic material containing the same: Disclosed is a photothermographic material comprising on support a light-insensitive silver salt of an aliphatic carboxylic acid, a light-sensitive silver halide and a reducing agent for silver ions, wherein the photothermographic material further comprises a copolymer comprising a backbone comprising a chain having a monomeric repeating unit, represented by formula... Agent: Lucas & Mercanti, LLP

20080081267 - Defect repair method for photomask and defect-free photomask: A method of repairing a photomask with a depression defect includes providing a photomask including a depression defect on a transparent substrate, forming a protection layer which covers the depression defect, etching a predetermined depth of the transparent substrate of the photomask with the protection layer as the etch mask,... Agent: F. Chau & Associates, LLC

20080081266 - Photo mask and method for fabricating the same: A photo mask and the method for fabricating the same wherein the photo mask includes: a mask substrate; a frame pattern formed along a contour of a target pattern to be transcribed to a wafer on the mask substrate, which includes a first pattern arranged in the aperture orientation of... Agent: Marshall, Gerstein & Borun LLP

20080081265 - Reticle and method of manufacturing method the same: A reticle and a method of producing the same are disclosed. The reticle includes a medium layer formed on a transparent substrate, chrome layer patterns spaced apart from each other at predetermined intervals on the medium layer, and a frame and a pellicle formed to enclose the resulting structure. The... Agent: Marshall, Gerstein & Borun LLP

20080081269 - Azo dye compound, coloring composition, ink sheet for thermal transfer recording, thermal transfer recording method, color toner, ink for inkjet, and color filter: r

20080081268 - Colored curable composition, color filter and production method thereof: wherein, R1 represents a substituent group; L represents an aliphatic or aromatic connecting group; Z1 represents a non-metal atom group needed for forming a six-membered ring with carbon atoms; at least one of the multiple groups R1 has —OY, —COOY, —SO3Y, —CON(Y)CO—, —CON(Y)SO2— or —SO2N(Y)CO—; Y represents a hydrogen atom,... Agent: Sughrue Mion, PLLC

20080081271 - Method of real time dynamic cd control: A method of real time dynamic CD control in a system for heat-treating resist coated wafers on a hotplate. The method includes establishing a temperature profile for a hotplate surface, where the hotplate surface is divided into a plurality of temperature control zones, and sequentially heat-treating the resist coated wafers... Agent: Wood, Herron & Evans, LLP (tokyo Electron)

20080081272 - Optical disk apparatus and label printing method: An optical disk apparatus includes an optical pickup head which radiates a laser beam on the label surface of the optical disk, thereby printing the label image information, a laser driving unit which sets a laser power of the laser beam which is radiated from the optical pickup head, a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080081274 - Image recording material, method for producing the same, and image forming method: An image recording material which has a support and an image recording layer containing a crystalline polymer and an amorphous polymer on at least one surface of the support, wherein the image recording layer has a storage elastic modulus G′ at 100° C. of 1×102 Pa to 1×105 Pa during... Agent: Sughrue Mion, PLLC

20080081264 - Optical components made from an inorganic/organic hybrid material for the production of refractive index gradient layers with rapid kinetics and method for the production thereof: An organic-inorganic hybrid material comprising (a) at least one soluble organic polymer, (b) at least one mono- or polynuclear metal complex having at least one ligand which comprises at least one photochemically and/or thermally polymerizable functional group and (c) surface-modified nanoscale particles. Also disclosed is an optical component which is... Agent: Greenblum & Bernstein, P.L.C

20080081270 - Photo-curable composition, color filter and method for producing the same, and solid state imager: The invention provides a photo-curable composition having at least: (A) a binder polymer; (B) a multifunctional photo-curable compound having at least one selected from the group consisting of acidic functional groups and alkyleneoxy chains; (C) an oxime photopolymerization initiator; and (D) a pigment. The acidic functional group is preferably a... Agent: Sughrue Mion, PLLC

20080081273 - Image forming method and apparatus: e

20080081275 - Process for producing resin-coated metal particles, resin-coated metal particles, and toner for forming circuit: A process for producing resin-coated metal particles includes coating surfaces of metal particles with silica; allowing a polymerizable group to adsorb onto the surfaces of the silica-coated particles by the use of a silane coupling agent; and coating the surfaces of the silica-coated particles with a polymeric resin by mixing... Agent: Dickstein Shapiro LLP

20080081276 - Developer, image forming method, and image forming apparatus: p

20080081277 - Developing member and electrophotographic image forming apparatus: A developing member is provided which is capable of forming a high-quality image by simultaneously solving the problem of fogging in a high temperature and high humidity environment and the problem of ghosts in a low temperature and low humidity environment. The developing member includes a mandrel and a resin... Agent: Fitzpatrick Cella Harper & Scinto

20080081278 - Carrier for electrostatic image development, and image formation method and apparatus: An image forming apparatus, including a latent image-holding member, a developing unit, a transfer unit, a cleaning unit, and a recycling unit, wherein the developer includes a toner having an external-additive adhesiveness index SA in the range of approximately 50% to approximately 95% and: a carrier containing magnetic particles and... Agent: Oliff & Berridge, PLC

20080081279 - Azo dye compound, coloring composition, ink sheet for thermal transfer recording, thermal transfer recording method, color toner, ink for inkjet, and color filter:

20080081280 - Azo dye compound, coloring composition, ink sheet for thermal transfer recording, thermal transfer recording method, color toner, ink for inkjet, and color filter: The present invention relates to the field of color filters and LCDs. More specifically, the invention relates to a colorant composition for making color filters comprising pyrimido[5,4-g]pteridine derivatives of formula (I) wherein A1, A2, A3, and A4 are each independently of the others —NR1R2, wherein R1 and R2 are each... Agent: Joann Villamizar Ciba Corporation/patent Department

20080081281 - Materials for photoresist, photoresist composition and method of forming resist pattern: To overcome the problem that a device performance is degraded by the edge roughness of a photoresist pattern, a mixture of polynuclear phenol compounds having, in one molecule, 0 to 6 functional groups which are chemically converted due to actions of an acid with the solubility in an alkaline developer... Agent: Antonelli, Terry, Stout & Kraus, LLP

20080081282 - Resist composition and pattern forming method using the same: wherein Q1 and Q2 each independently represents a monovalent organic group, provided that either one of Q1 and Q2 has a proton acceptor functional group, Q1 and Q2 may be combined with each other to form a ring and the ring formed may have a proton acceptor functional group; and... Agent: Sughrue-265550

20080081283 - Structure for pattern formation, method for pattern formation, and application thereof: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.... Agent: Ladas & Parry LLP

20080081284 - Optical information recording medium: A first optical information recording medium comprises a first WORM-type recording layer on which information is recorded by irradiation with a laser light having a wavelength of 440 nm or less, and a cover layer having a thickness of 0.01 to 0.5 mm, formed in this order on a first... Agent: Sughrue Mion, PLLC

20080081285 - Optical information recording medum and azo-metal complex dye: f

20080081287 - Chemically amplified resist material and pattern formation method using the same: In the pattern formation method, a resist film is formed on a substrate by using a chemically amplified resist material including fumaric acid substituted by an acid labile group released by an acid; an alkali-soluble polymer soluble in an alkaline solution; and a photo-acid generator for generating an acid through... Agent: Mcdermott Will & Emery LLP

20080081286 - Optical information recording medium and azo-metal complex dye:

20080081288 - Photosensitive composition, compound for use in the photosensitive composition, and pattern-forming method using the photosensitive composition:

20080081289 - Resist composition and pattern forming method using the same: wherein AR represents a substituted or unsubstituted benzene ring or a substituted or unsubstituted naphthalene ring; Rn represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted cycloalkyl group or a substituted or unsubstituted aryl group; and A represents a hydrogen atom, a substituted or unsubstituted alkyl group, a... Agent: Sughrue-265550

20080081291 - Photopolymerization type photosensitive lithographic printing plate precursor: A negative-working photopolymerization type photosensitive lithographic printing plate precursor for exposing with laser, includes: a hydrophilic support; at least one photopolymerizable photosensitive layer; and a protective layer, provided in this order, wherein the photopolymerizable photosensitive layer contains a sensitizing dye, a dye or pigment capable of absorbing light having a... Agent: Sughrue-265550

20080081290 - Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition: A resist composition comprises: (A) a resin capable of increasing its solubility in an alkali developer by action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation; (C) a resin having at least one of a fluorine atom and a silicon... Agent: Sughrue-265550

20080081292 - Resist composition and pattern forming method using the same: wherein Rfa and Rfb each independently represents a monovalent organic group having a fluorine atom, and two Rfa's or three Rfb's may be the same or different and may combine with each other to form a ring; and X+ represents a sulfonium cation or an iodonium cation, and a pattern... Agent: Sughrue-265550

20080081293 - Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same: e

20080081294 - Photosensitive resin composition, production method of cured relief pattern using the same and semiconductor device: A photosensitive resin composition contains: a polymer represented by the formula (I) as defined herein, in which 0.5 mol % or more of A in the polymer represented by the formula (I) is a protective group; a photosensitizing agent; a compound containing a methacryloyl or acryloyl group within a molecule... Agent: Sughrue-265550

20080081295 - Developing solution for lithographic printing plates and production method of lithographic printing plate: A developing solution containing at least one of compounds represented by the formulae <1>, <2> and <3> as defined herein, and having a pH of from 2 to 10; and a method for producing a lithographic printing plate, including imagewise exposing a lithographic printing plate precursor including an image recording... Agent: Sughrue-265550

20080081296 - Method for fabricating recess pattern in semiconductor device: A method for fabricating a recess pattern in a semiconductor device includes forming a photoresist layer over a substrate including active regions, performing a first photo-exposure process on the photoresist layer using a photo mask including repeatedly formed line structures and spaces, performing a second photo-exposure process on the photoresist... Agent: Lowe Hauptman Ham & Berner, LLP

20080081297 - Method of forming pattern of semiconductor device: A method of forming a pattern of a semiconductor device includes forming a hard mask layer over a semiconductor substrate and forming a photoresist film pattern over the hard mask layer. An outer portion of the photoresist film pattern is converted into an oxide layer having a first vertical wall,... Agent: Townsend And Townsend And Crew, LLP

20080081298 - Laser irradiation apparatus and laser irradiation method: It is an object of the present invention to provide a laser irradiation apparatus and a laser irradiation method that increase energy intensity distribution in a region having low energy intensity distribution in an end region in a major-axis direction of laser light, in performing laser irradiation. In irradiating an... Agent: Nixon Peabody, LLP

20080081299 - Method for repairing photomask pattern defects: A method for repairing photomask pattern defects includes patterning a target layer on a transparent substrate, thereby forming first patterns, detecting a defect die including a defect pattern by inspecting the first patterns; forming a mask layer on the transparent substrate, forming a mask pattern that selectively exposes the defect... Agent: Marshall, Gerstein & Borun LLP

20080081300 - Silver halide photosensitive material and image forming method using the same: A silver halide photosensitive material comprising at least one blue-sensitive layer, at least one green-sensitive layer and at least one red-sensitive layer on a transparent support, wherein a peak wavelength of spectral sensitivity of at least one of the green-sensitive layer is in the range of −10 nm or more... Agent: Birch Stewart Kolasch & Birch