Radiation imagery chemistry: process, composition, or product thereof inventions 02/08

20080050665 - Imaging member having high molecular weight binder: Imaging members useful in electrostatographic apparatuses, including printers, copiers, other reproductive devices, and digital apparatuses. More particularly, imaging members having a binder of high molecular weight that is included in one or more layers of an imaging member to impart coating consistency and to provide for increased mechanical strength and... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20080050666 - Electrophotographic photoconductor and image forming apparatus: To provide an electrophotographic photoconductor which can effectively prevent the generation of exposure memory and the increase in residual potential by easily adjusting the electroconductivity in an intermediate layer, and an image forming apparatus using the electrophotographic photoconductor. An electrophotographic photoconductor comprising a base body, and an intermediate layer containing... Agent: Arthur G. Schaier Carmody & Torrance LLP

20080050659 - Method of patterning self-organizing material, patterned substrate of self-organizing material and method of producing the same, and photomask using patterned substrate of self-organizing material: It is intended to provide a method of patterning a self-organizing material whereby a self-organizing material having a self-organization ability such as a nucleic acid can be aligned and immobilized in a desired manner on a substrate by using the imprint process, a patterned substrate of a self-organizing material and... Agent: Harness, Dickey & Pierce, P.L.C

20080050660 - Multi-layer body including a diffractive relief structure and method for producing the same: There are described a process for the production of a multi-layer body (100) having a partially shaped first layer (3m) and a multi-layer body produced in that way. It is provided that a diffractive first relief structure (4) is shaped in a first region of a replication layer (3) of... Agent: Hoffmann & Baron, LLP

20080050661 - Photomask fabrication utilizing a carbon hard mask: Methods for forming a photomask using a carbon hard mask are provided. In one embodiment, a method of forming a photomask includes etching a chromium layer through a patterned carbon hard mask layer in the presence of a plasma formed from a process gas containing chlorine and carbon monoxide.... Agent: Patterson & Sheridan, LLP

20080050662 - Process for production of pattern-forming body: A primary object of the present invention is to provide a process for the production of a pattern-forming body, the process enabling the formation of a highly precise pattern, requiring no post-exposure treatment and being free from a fear as to the deterioration of the pattern-forming body itself because no... Agent: Ladas & Parry LLP

20080050663 - Laminate for laser marking: There is provided a laminate for laser marking which is useful for forming displays, for example, on the S-shaped surface of sheet-like molded products made of thermoplastic resins, by suitably employing a thermoplastic polymer composition for laser marking. The present invention relates to a laminate for laser marking, comprising: a... Agent: Nixon & Vanderhye, PC

20080050664 - Electrographic photosensitive member, process cartridge and electrophotographic apparatus: An object of the present invention is to provide an electrophotographic photosensitive member having high durability and hardly causing sensitivity decrease even if short wavelength light, particularly light having a wavelength of 380 to 450 nm is used as exposure light, and a process cartridge and an electrophotographic apparatus having... Agent: Fitzpatrick Cella Harper & Scinto

20080050667 - Custom color toner: The present invention provides a custom color toner having a first particle size. Colored particles are attached to the surface of the base toner in an amount sufficient to provide a predetermined color to the base toner. The colored particles have a second particle size less than the first particle... Agent: Andrew J. Anderson Patent Legal Staff

20080050668 - Toner compositions: Use of a charge control agent in a toner, such as a magenta toner, to give an increased triboelectric charge is disclosed. The magenta toner may contain a magenta resin, such as xanthene. The charge control agent is a styrene-acrylate polymer, such as the following polymer of Formula II:... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20080050669 - Toner: A toner comprising a binder resin and a colorant, wherein the binder resin comprises an urea modified polyester, the urea modified polyester being prepared by urea-bonding an isocyanate-modified crystalline polyester segment and an isocyanate-modified amorphous polyester using an amine crosslinking agent.... Agent: Cantor Colburn, LLP

20080050670 - Toner kit, deep-color cyan toner, pale-color cyan toner, and image forming method: The present invention provides: a toner kit having a deep toner and a pale toner which are separated from each other, wherein: the deep toner and the pale toner satisfy prescribed conditions for an L*a*b* color coordinate system where a* represents a hue in the red-green direction, b* represents a... Agent: Fitzpatrick Cella Harper & Scinto

20080050671 - Image forming method: An image forming method, comprising the steps of: agitating a mixture of toner particles and carrier particles so as to electrically charge the toner particles; forming a charged toner layer on a toner conveying roller by extracting the charged toner particles from the mixture; forming an electrostatic latent image on... Agent: Lucas & Mercanti, LLP

20080050672 - Light activated contrast systems using masked developers for optical data recording: An optical data recording medium includes a substrate and a markable coating on the substrate. The markable coating includes a radiation absorber, a leuco dye, a developer and a deprotection agent.... Agent: Hewlett Packard Company

20080050673 - Optical recording medium: An optical recording medium contains a recording layer being composed of a phase-change recording material where at least four elements, Ga, Sb, Sn and Ge are contained and the transfer linear velocity is 20 m/s to 30 m/s, and when the wavelength of a recording/reproducing light is within the range... Agent: Cooper & Dunham, LLP

20080050674 - Polyester compound and resist material using the same: There is provided a novel polyester compound having in its main polymer chain an aliphatic cyclic structure with carboxylic acids or carboxylic acid ester groups as represented by the chemical formula (1), a resist material containing the polyester compound and a patterning method using the resist material.... Agent: Crowell & Moring LLP Intellectual Property Group

20080050675 - Positive resist composition and pattern forming method using the same: A positive resist composition comprising: (A) a resin having a repeating unit represented by a specific formula (I) and a repeating unit represented by a specific formula (A1); (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (F) a surfactant represented by... Agent: Sughrue-265550

20080050676 - Semiconductor device manufacturing method, data generating apparatus, data generating method and recording medium readable by computer recoded with data generating program: A semiconductor manufacturing method comprising, a data generating process including, acquiring a simulation light pattern that simulates a shape of a light exposure pattern formed on a substrate on the basis of design data of a semiconductor device, acquiring a simulation electron beam exposure pattern that simulates a shape of... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080050677 - Processing method, manufacturing method of semiconductor device, and processing apparatus: A processing method for selectively reducing or removing the region to be exposed with energy ray in a film formed on a substrate, comprising relatively scanning a first exposure light whose shape on the substrate is smaller than the whole first region to be exposed against the whole first region... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080050678 - Polymers for anti-reflective coatings, anti-reflective coating compositions and methods of forming a pattern using the same: An anti-reflective coating composition includes a solvent and about 20 to about 35 percent by weight of a polymer prepared by a condensation reaction of an acrylate polymer including a hydroxyl group with a derivative of muramic acid and a derivative of mandelic acid.... Agent: Volentine & Whitt PLLC

20080050679 - Methods and systems for performing immersion processing during lithography: A method of processing a substrate includes forming a coating layer over a front surface of the substrate and exposing the coating layer in an immersion scanner. The coating layer may include a photoresist layer. The method also includes performing one or more immersion processes on the substrate after exposure.... Agent: Townsend And Townsend And Crew, LLP

20080050680 - Lithography systems and methods: Systems and methods of lithography of semiconductor devices are disclosed. A preferred embodiment comprises a method of exposing a workpiece. The method includes moving a workpiece along a plurality of exposure fields in a column in a first direction while alternatingly moving a lithography mask in a second direction and... Agent: Slater & Matsil LLP

20080050681 - Immersion fluid for immersion lithography: Aimed at improving balance between refractive index and absorbance of an immersion fluid used for light exposure based on the immersion method, the immersion fluid is configured as containing a deuterated dialkyl sulfoxide.... Agent: Mcginn Intellectual Property Law Group, PLLC

20080050682 - Developer for thermal positive type photosensitive composition: Provided is a developer for thermal positive type photosensitive composition, which is easy in developer handling such as pH adjustment, has a developing treatment capability ensuring durability in multiple uses, has little change of pH value over a prolonged period of time and is excellent in durability, has a development... Agent: Wenderoth, Lind & Ponack, L.L.P.

20080050683 - Photothermographic material: wherein Rf represents a fluoroalkyl group or fluoroalkenyl group having 3 to 17 fluorine atoms; Rf′ represents a divalent group thereof; L and Y represent a bond or a divalent linking group; Z represents an anionic group, a cationic group, a betaine group, or a nonionic polar group; and Z′... Agent: Taiyo Corporation

20080044739 - Correction of resist critical dimension variations in lithography processes: According to one aspect, a method is provided for preparing a photoresist mask set adapted to correct for critical dimension variations resulting from topography effects in a semiconductor device. A plurality of rules is established for correcting critical dimension variations resulting from topography effects associated with predetermined structural combinations. A... Agent: Banner & Witcoff, Ltd.

20080044744 - Method for manufacturing display device: When a mask layer is formed, a first liquid composition containing a mask-layer-forming material is applied on an outer side of a pattern that is desired to be formed (corresponding to a contour or an edge portion of a pattern) to form a first mask layer having a frame shape.... Agent: Cook, Alex, Mcfarron, Manzo, Cummings & Mehler Ltd

20080044741 - Metrology systems and methods for lithography processes: Metrology systems and methods for lithography processes are disclosed. In one embodiment, a method of manufacturing a semiconductor device includes providing a mask having a plurality of corner rounding test patterns formed thereon. A first semiconductor device is provided, and a layer of photosensitive material of the first semiconductor device... Agent: Slater & Matsil LLP

20080044740 - Photomask having haze reduction layer: A photomask is fabricated to have a patterned surface and a transparent layer formed on the patterned surface.... Agent: David M. O'dell Attorney For Applicants

20080044743 - Soft mold and method of fabricating the same: A soft mold may be manufactured that is used for forming a pattern. Semiconductor devices and flat panel display devices include a plurality of fine patterns on a substrate. The soft mold may be photo-curable and formed of a material with a hydrophobic property similar to heat-curable molds. The photo-curable... Agent: Brinks Hofer Gilson & Lione

20080044748 - Method for separating optical and resist effects in process models: A methodology to improve the through-process model calibration accuracy of a semiconductor manufacturing process using lithographic methods by setting the correct defocus and image plane position in a patterning process model build. Separations of the optical model and the photoresist model are employed by separating out the adverse effects of... Agent: Law Office Of Delio & Peterson, LLC.

20080044749 - Circuit pattern formation device and method of forming circuit pattern to substrate: An object is to improve the adhesion strength between a circuit pattern and its substrate without increasing the resistance value of the circuit pattern in preparation of a circuit pattern holding substrate. A circuit pattern formation device 100 forms, after forming a precursor circuit-pattern 12 in the surface of a... Agent: Antonelli, Terry, Stout & Kraus, LLP

20080044737 - Data storage medium comprising colloidal metal and preparation process thereof: Disclosed is a photopolymerizable holographic recording medium for data storage that comprises colloidal metal, and which exhibits a threshold for a second stage polymerization which is substantially insensitive to the light used for both forming holograms and interrogating the medium during servo and/or read events. Also disclosed is a method... Agent: Hamilton, Brook, Smith & Reynolds, P.C.

20080044738 - Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same: s

20080044742 - Method of correcting critical dimension in photomask and photomask having corrected critical dimension using the method: Provided are a method of correcting a critical dimension (CD) in a photomask and a photomask having a corrected CD using the method. The method may include providing a substrate that is transparent with respect to an incident light, forming shielding patterns on the substrate to form a photomask, detecting... Agent: Harness, Dickey & Pierce, P.L.C

20080044745 - Process for production of pattern-forming body: A primary object of the present invention is to provide a process for the production of a pattern-forming body, the process enabling the formation of a highly precise pattern, requiring no post-exposure treatment and being free from a fear as to the deterioration of the pattern-forming body itself because no... Agent: Ladas & Parry LLP

20080044746 - Permanent, removable tissue markings: The present invention provides microparticles that create permanent tissue markings, such as tattoos, designed in advance for change and/or removal on demand, as well as methods for implanting the microparticles in tissue and changing and/or removing the resulting markings. Colored microparticles are constructed with specific electromagnetic absorption and/or structural properties... Agent: Fish & Richardson PC

20080044747 - Solvent-less process for producing transient documents: An image forming method including (a) providing a reimageable medium comprised of a substrate and a photochromic material, wherein the medium is capable of exhibiting a color contrast and an absence of the color contrast; (b) exposing the medium to an imaging light corresponding to a predetermined image to result... Agent: Patent Documentation Center

20080044751 - Electroconductive member, process cartridge, and image forming apparatus: An electroconductive member including an electroconductive support, an electric resistance adjusting layer formed on the electroconductive support, and a top surface layer that coats the surface of the electric resistance adjusting layer, the top surface layer containing at least one oxygen-containing inorganic compound selected from among a composite oxide of... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080044750 - Electrophotographic photosensitive body: An object of the present invention is to provide an electrophotographic photosensitive body which is not impaired in electrophotographic characteristics such as charged potential and residual potential, and which is also excellent in repeating stability. The present invention provides an electrophotographic photosensitive body including a conductive support having thereon a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080044752 - Color toner for developing electrostatic latent image: The color toner for developing electrostatic latent images comprising a colored resin particle containing at least a binder resin, a colorant, a charge control agent and a parting agent, wherein an extracted liquid with water by means of a hot water extraction method from said colorant has a pH value... Agent: Kratz, Quintos & Hanson, LLP

20080044753 - Binder resin for toner, method for production thereof, and toner: The present invention relates to a binder resin for a toner which is used in electrophotography and the like. An objective of the present invention is to obtain a binder resin for a toner containing a crystalline resin which satisfies both excellent low temperature fixing property and excellent offset resistance,... Agent: Buchanan, Ingersoll & Rooney PC

20080044754 - Toner composition: A toner having a core with a first latex having a specific glass transition temperature, and further having a shell surrounding the core with a second latex having a specific glass transition temperature, and processes for producing the same.... Agent: George Likourezos, Esq. Carter, Deluca, Farrell & Schmidt, LLP

20080044755 - Toner composition: Toner compositions, in embodiments, having excellent charging characteristics and excellent dispensing performance are provided.... Agent: Marylou J. Lavole, Esq. LLC

20080044756 - Method of fine pitch bump stripping: A method for removing dry film resist (DFR) from a fine pitch solder bump array on a semiconductor wafer provides for pre-soaking the wafer in a chemical bath then turbulently exposing the wafer to a chemical solution, both steps taking place in batch processing with the wafers processed in a... Agent: Duane Morris LLPIPDepartment (tsmc)

20080044757 - Molecular glass photoresists: Several small molecule, molecular glasses are disclosed with new architectures designed for use as photoresists in semiconductor lithography. The disclosed photoresists are low molecular weight organic materials that demonstrate a glass transition temperature significantly above room temperature as well as a low tendency towards crystallization. The molecular glass photoresists have... Agent: Miller, Matthias & Hull

20080044761 - Multilayer dry film resist, method of manufacturing the resist, and method of manufacturing display plate for liquid crystal display panel using the resist: A multilayer dry film resist includes two or more organic films which can be patterned; the multilayer dry film resist includes a base substrate, a first organic film disposed on the base substrate, and a second organic film disposed on the first organic film and including a photosensitizer.... Agent: Frank Chau, Esq. F. Chau & Associates, LLC

20080044758 - Negative-working radiation-sensitive compositions and imageable materials: A radiation-sensitive composition and negative-working imageable element includes a polymeric binder comprising pendant allyl ester groups to provide solvent resistance, excellent digital speed (sensitivity) and can be imaged and developed without a preheat step to provide lithographic printing plates. The polymeric binder can be prepared with a precursor polymer having... Agent: Eastman Kodak Company Patent Legal Staff

20080044760 - Positive resist composition and pattern formation method using the positive resist composition: A positive resist composition comprising: a resin which increases solubility in an alkali developing solution by an action of an acid and comprises a repeating unit containing a lactone structure and a cyano group and a repeating unit containing a first acid-decomposable group; a resin which increases solubility in an... Agent: Sughrue-265550

20080044759 - Fine pattern forming material, method of forming fine resist pattern and electronic device: A fine pattern forming material comprising a water soluble resin of polyvinyl alcohol derivative, etc., a water soluble crosslinking agent of melamine derivative, urea derivative, etc., an amine compound, a nonionic surfactant and water or a solution of a mixture of water and water soluble organic solvent, the solution exhibiting... Agent: Mcdermott Will & Emery LLP

20080044762 - Radiographic image conversion panel and production method thereof: A radio graphic image conversion panel containing a substrate having thereon a phosphor layer formed by a vapor-accumulating method, wherein the phosphor layer has a thickness distribution of not more than ±20%, the thickness distribution being defined by the formula: ((Dmax−Dmin)/(Dmax+Dmin))×100, provided that Dmax is a maximum thickness of the... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080044763 - Resin composition and thermo/photosensitive composition: The present invention provides a resin composition that includes (A) a polymer compound that has, on a side chain of a main chain polymer, through a lir ‘cage group containing a hydrogen-bonding group and a ring structure, a terminal ethylenic unsaturated bond, and is soluble or swelling in water or... Agent: Sughrue Mion, PLLC

20080044764 - Chemically amplified positive photosensitive thermosetting resin composition, method of forming cured article, and method of producing functional device: There is provided a photosensitive thermosetting resin composition used for producing a permanent film, capable of forming a resin layer which is excellent in fluidity upon heat bonding after pattern, formation and also has excellent adhesion as well as bonding properties and/or sealing properties. This composition contains a reaction product... Agent: Knobbe Martens Olson & Bear LLP

20080044766 - Photoresist composition and method of manufacturing a color filter substrate by using the same: A photoresist composition includes a coloring agent, a binder resin, a cross-linker, a photo-polymerization initiator and a solvent. The coloring agent includes an anthraquinone-based dye and a pigment. A color filter formed from the photoresist composition has a relatively greater light-transmittance. Thus, a contrast of a display apparatus having the... Agent: Macpherson Kwok Chen & Heid LLP

20080044765 - Ir radical polymerization-type photopolymer plate using specific binder polymer: Disclosed is a negative photosensitive composition containing (A) an infrared absorbent, (B) an organic boron compound, (C) a compound having a polymerizable unsaturated group and (D) a binder resin having a sulfonamide group or an active imino group.... Agent: Eastman Kodak Company Patent Legal Staff

20080044767 - Negative-working imageable materials: A negative-working imageable element includes a combination of a specific polymeric binder comprising pendant allyl ester groups with an highly efficient iodonium borate free radical initiator to provide solvent resistance, excellent digital imaging speed (sensitivity) and can be imaged and developed without a preheat step to provide lithographic printing plates.... Agent: Andrew J. Anderson Patent Legal Staff

20080044768 - Continuous sloped phase edge architecture fabrication technique using electron or optical beam blur for single phase shift mask ret: A phase shift mask may include boundaries between phase shift regions with continuous sloped phase edges. The continuous sloped phase edges may be produced by introducing a predetermined degree of defocus into a beam used during production of the mask to image the pattern on the mask. Such a phase... Agent: Fish & Richardson, PC

20080044769 - Method for forming resist pattern, semiconductor device and production method thereof: The method for forming a resist pattern of the present invention comprises at least forming a resist pattern, coating a resist pattern thickening material to cover the surface of the resist pattern, baking the resist pattern thickening material, and developing and separating the resist pattern thickening material, wherein at least... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080044770 - Process for forming resist pattern, semiconductor device and manufacturing method for the same: To provide a process for forming a resist pattern, which the process can adopt even ArF excimer laser light as exposure light in a patterning step, can thicken a resist pattern (e.g., a hole pattern) regardless of its size, and can reduce the size of a resist space pattern with... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080044772 - Anti-reflective imaging layer for multiple patterning process: Novel methods of double patterning a photosensitive resin composition are provided. The methods involve applying the photosensitive composition to a substrate and thermally crosslinking the composition. The crosslinked layer can be used to provide reflection control. Upon exposure to light, the crosslinked polymer (or oligomer or monomer) in the compositions... Agent: Hovey Williams LLP

20080044771 - Manufacturing method of fuel cell having micro sensors and polymer layers: A manufacturing method of fuel cell having micro sensors and polymer layers is disclosed. It include the following steps of: (1) depositing first polymer layer step, (2) first lithographic processing step, (3) depositing chromium layer step, (4) depositing gold layer step, (5) removing first photo-resist layer step, (6) depositing second... Agent: Rosenberg, Klein & Lee

20080044773 - Method of manufacturing a patterned color conversion layer, and methods of manufacturing a color conversion filter and an organic el display that use a color conversion layer obtained by the method: A method of manufacturing a color conversion layer with a predetermined pattern is disclosed which does not cause any damage on the color conversion layer formed by a dry process such as an evaporation method to achieve a large scale and high definition. The method includes steps of sequentially forming,... Agent: Rossi, Kimms & Mcdowell LLP.

20080044774 - Method for exposing twice by two masks in semiconductor process: The present invention relates to a method for exposing twice by two masks in a semiconductor process, which includes: (a) providing a substrate having a surface; (b) forming a negative-type photosensitive material on the surface of the substrate; (c) providing a first mask having a first pattern; (d) performing a... Agent: Volentine & Whitt PLLC

20080044775 - Method for aligning or assembling nano-structure on solid surface: The present invention relates to a method for selectively assembling and aligning nano-structures on a solid surface; and, more particularly, to a method for directly adsorbing the nano-structures on the solid surface with sliding the nano-structure from a slippery molecular layer to the solid surface after the solid surface is... Agent: Venable LLP

20080044776 - Underlayer compositions containing heterocyclic aromatic structures: A composition suitable for use as a planarizing underlayer in a multilayer lithographic process is disclosed. The inventive composition comprises a polymer containing heterocyclic aromatic moieties. In another aspect, the composition further comprises an acid generator. In yet another aspect, the composition further comprises a crosslinker. The inventive compositions provide... Agent: Scully, Scott, Murphy & Presser, P.C.

20080044777 - Apparatus and method for making a forming structure: A method for making a forming structure having columnar protrusions extending therefrom comprising the steps of exposing a liquid photosensitive resin to light having an activating wavelength thereby inducing partial curing of the photosensitive resin to form a monolithic slab of partially-cured photosensitive resin; and, including the step of inducing... Agent: The Procter & Gamble Company Intellectual Property Division - West Bldg.

20080038647 - Liquid developer, method of making liquid developer, image forming method, and image forming apparatus: A liquid developer includes an insulating liquid and toner particles dispersed in the insulating liquid. The toner particles include a plurality of corpuscle combiners including a resin material, and the insulating liquid includes glyceride of an unsaturated fatty acid.... Agent: Hogan & Hartson L.L.P.

20080038646 - Resin particle dispersion liquid, toner for developing electrostatic image and method for producing the same, developer for developing electrostatic image, and method for forming image: A resin particle dispersion liquid comprises: resin particles comprising polyester having terminal carboxyl groups, the polyester being obtained by polycondensation of a polycondensable monomer, wherein the polyester has the terminal carboxyl groups that are partially neutralized to form carboxyl anions, the resin particles in the resin particle dispersion liquid having... Agent: Oliff & Berridge, PLC

20080038649 - Electrophotographic photoreceptor and method of preparing the photoreceptor, and image forming method, image forming apparatus and process cartridge therefor using the photoreceptor: r

20080038648 - Photoreceptor: An electrophotographic imaging member includes a substrate, a photogenerating layer, and an optional overcoating layer, where the photogenerating layer includes a multi-block polymeric charge transport material at least partially embedded within a carbon nanotube material.... Agent: Oliff & Berridge, PLC.

20080038650 - Photoreceptor: An electrophotographic imaging member includes a substrate, a photogenerating layer, and an optional overcoating layer, where the photogenerating layer includes a chemically functionalized carbon nanotube material.... Agent: Oliff & Berridge, PLC.

20080038651 - Photoreceptor: An electrophotographic imaging member includes a substrate, an optional intermediate (undercoat) layer, a photogenerating layer, which can be a single layer of include separate charge generating and charge transport layers, and an optional overcoating layer, wherein the photogenerating layer or a sub-layer thereof include a carbon nanotube material.... Agent: Oliff & Berridge, PLC.

20080038652 - Photoreceptor: An electrophotographic imaging member includes a substrate, a photogenerating layer, and an optional overcoating layer, where the photogenerating layer includes a self-assembled carbon nanotube material having pendant charge transport materials.... Agent: Oliff & Berridge, PLC.

20080038653 - Double-component developer: An electrophotographic developer comprising a toner and a carrier is disclosed. The toner contains a toner binder resin, a colorant and a releasing agent, and a carrier contains a magnetic particles dispersed in a carrier binder resin, wherein the releasing agent contained in toner is composed of from 40 to... Agent: Lucas & Mercanti, LLP

20080038654 - Double-component developer: An electrophotographic developer comprising a toner and a carrier is disclosed. The contains a toner binder resin, a colorant and a releasing agent, and a carrier contains magnetic particles dispersed in a carrier binder resin, wherein the releasing agent contains a first releasing agent component of a linear-chain hydrocarbon compound... Agent: Lucas & Mercanti, LLP

20080038656 - Developer and image forming method using the developer: A negatively-chargeable non-magnetic one-component developer for developing an electrostatic latent image using a contact DC-bias development method, having a capacitance of 1.05×10−12 to 1.25×10−12 F, a volume resistivity of 5.0×1010 to 5.0×1012 Ω·cm and a dielectric loss tangent of 1.0×10−3 to 2.0×10−2. In a contact DC-bias development method, the developer... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20080038655 - Toner for developing electrostatic latent image: A toner for developing electrostatic latent images comprising a colored resin particle containing a binder resin, a colorant and a parting agent, and an external additive, wherein a volume average particle diameter (Dv) is 4 to 10 μm and an average circularity is in the range of 0.93 to 0.995;... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080038657 - Full color image forming method: A color image forming method, comprising the steps of: forming a yellow toner image with a two component yellow developer, a light yellow toner image with a two component light yellow developer, a magenta toner image with a two component magenta developer, a light magenta toner image with a two... Agent: Lucas & Mercanti, LLP

20080038658 - Conductive belt, method of producing same, and image-forming apparatus having same: A method of producing a conductive belt composed of a base resin containing polybutylene naphthalate resin at not less than 50 mass % nor more than 100 mass % and 1 to 3 mass % of carbon nano-fibers having a DBP oil absorption amount at not less than 150 ml/100... Agent: Birch Stewart Kolasch & Birch

20080038659 - Antireflective composition for photoresists: m

20080038662 - Bottom resist layer composition and patterning process using the same: There is disclosed a bottom resist layer composition for a multilayer-resist film used in lithography comprising, at least, a polymer comprising a repeating unit represented by the following general formula (1). Thereby, there can be provided a bottom resist layer composition that exhibits optimum n value and k value on... Agent: Oliff & Berridge

20080038663 - Laser-decomposable resin composition and pattern-forming material using the same: A laser-decomposable resin composition contains: a compound including at least one structure selected from a carboxyl group and a carboxylic acid anhydride structure and at least one hetero atom selected from N, S and O atoms other than the structure; and a binder polymer.... Agent: Sughrue-265550

20080038661 - Copolymer and top coating composition: l

20080038660 - Method of making grating structures having high aspect ratio: A method for realizing a grating structure including the steps of providing a layered structure having a substrate, a grating layer, a first masking layer of polysilicon, a dielectric layer and a second masking layer. Additionally, a resist layer is deposited on the second masking layer; the resist layer is... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080038664 - Silsesquioxane compound mixture, method of making, resist composition, and patterning process: wherein Y is an aliphatic or aromatic organic group optionally having a functional group, X1, X2 and X3 are H, halogen, alkoxy or aryloxy is hydrolyzed in the presence of an acid or base catalyst, and a second stage wherein dehydrating condensation is carried out in the presence of a... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080038665 - Photosensitive resin composition having a high refractive index: The present invention discloses a photosensitive resin composition which comprises (A) a compound having a molecule with at least one thiirane ring and a total number of a thiirane ring and/or an epoxy ring of at least 2 in the molecule, and (B) a photo acid generator, said composition having... Agent: Jones, Tullar & Cooper, P.C.

20080038667 - Light sensitive planographic printing plate material: Disclosed is a light sensitive planographic printing plate material comprising a support and provided thereon, a light sensitive layer containing a polymerization initiator, a polymerizable ethylenically unsaturated compound, a polymeric binder, and a sensitizing dye, wherein the polymerization initiator is a biimidazole compound, and the sensitizing dye is represented by... Agent: Frishauf, Holtz, Goodman & Chick, PC

20080038666 - Positive-working photoimageable bottom antireflective coating: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a... Agent: Sangya Jain Clariant Corp.

20080038668 - Negative laser sensitive lithographic printing plate having specific photosensitive composition: High speed violet or ultraviolet laser sensitive lithographic printing plate comprising on a hydrophilic substrate a specific photosensitive composition is described. The photosensitive layer comprises an alkaline soluble polymeric binder, a multifunctional (meth)acrylate monomer, a free-radical initiator, and a sensitizing dye. The plate is imagewise exposed with a violet or... Agent: Gary Ganghui Teng

20080038669 - Non-truly-spherical high-molecular fine particles, process for producing the same, inkjet ink composition containing fine particles, lithographic printing plate using the same, process for producing printing plate, and electrophoretic particles-containing: Non-truly-spherical high-molecular fine particles are produced by a radical polymerization between a first radical-polymerizable monomer having a nucleophilic group and a second radical-polymerizable monomer having a group reacting with the nucleophilic group to form a covalent bond in a non-aqueous solvent in the presence of a dispersion-stabilizing resin.... Agent: Sughrue-265550

20080038672 - Method for manufacturing electronic device, electronic device, and electronic apparatus: A method for manufacturing an electronic device including a substrate and an organic thin film patterned in a predetermined shape includes: a) forming a coating film made of a first compound on a surface of the substrate, the first compound including a polymerization initiation site bindable with a second compound... Agent: Oliff & Berridge, PLC

20080038671 - Pattern forming method and apparatus: A pattern forming method includes forming a resist film or sequentially forming a resist film and a protection film in this order on a surface of a substrate; then, performing immersion light exposure that includes immersing the resist film or the resist film and the protection film formed on the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080038670 - Solder mask application process: A method of making a circuitized substrate in which the substrate includes circuit elements having exposed surfaces defined by two thin layers of permanent photoimaged solder mask material which are applied through fine mesh screens. The use of two thin layers assures effective coverage of the material to precisely expose... Agent: Lawrence R. Fraley Hinman, Howard & Kattell, LLP

20080038673 - Method for adjusting a critical dimension in a high aspect ratio feature: A method for adjusting the lateral critical dimension (i.e., length and width) of a feature formed in a layer on a substrate using a dry etching process. One or more thin intermediate sub-layers are inserted in the layer within which the feature is to be formed. Once an intermediate sub-layer... Agent: Dla Piper US LLP

20080038674 - Composite polymer microfluidic control device: A device for microfluidic control comprising a regulator that is moveable in a conduit where the regulator is a composite polymer formed from a composite mixture comprising a polymerizable precursor and a particulate filler.... Agent: Eksigent Technologies, LLC C/o Sheldon Mak Rose & Anderson

20080038675 - Exposure method, exposure apparatus, exposure system and device manufacturing method: When exposing a same resist layer of a wafer a plurality of times, at least in one exposure of the plurality of exposures, by filling a space between a projection optical system, which projects an exposure light on the wafer, and the wafer with water by a liquid supply/drainage unit,... Agent: Oliff & Berridge, PLC

20080038676 - Top coat material and use thereof in lithography processes: wherein: M is a polymerizable backbone moiety; Z is a linking moiety selected from the group consisting of —C(O)O—, —C(O)—, —OC(O)—, and —O—C(O)—C(O)—O—; R1 is selected from the group consisting of an alkylene, an arylene, a semi- or perfluorinated alkylene, and a semi- or perfluorinated arylene; p and q are... Agent: International Business Machines Corporation Dept. 18g

20080038677 - Patterning non-planar surfaces: A pattern is formed on a non-planar surface by forming a layer of photoresist on a part having a surface comprising a non-planar surface area. A deformable mask is aligned over at least a portion of the non-planar surface area of the part such that the deformable mask substantially deforms... Agent: Stevens & Showalter, L.L.P.

20080038678 - Condensation type polymer-containing anti-reflective coating for semiconductor: There is provided an anti-reflective coating forming composition comprising a polymer having a pyrimidinetrione structure, imidazolidinedione structure, imidazolidinetrione structure or triazinetrione structure and a solvent. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, and can use in lithography... Agent: Oliff & Berridge, PLC

20080038679 - Developing agent and manufacturing method thereof: A developing agent contains a toner particle having a substantially spherical polymer phase selected from any one of acrylic bases, styrene bases or styrene-acrylic bases and a polyester based resin phase to coat the polymer phase such that at least a part thereof is exposed. It becomes possible to improve... Agent: Amin, Turocy & Calvin, LLP

20080038680 - Donor substrate for laser induced thermal imaging and method of fabricating organic light emitting display using the same substrate: A donor substrate for laser induced thermal imaging (LITI) and a method of fabricating an organic light emitting display (OLED) using the donor substrate are provided. A conductive frame is disposed on and connected to an anti-static layer of the donor substrate and frames the periphery of the donor substrate.... Agent: Christie, Parker & Hale, LLP

20080032203 - Lithographic method and patterning device: A lithographic method includes patterning a beam of radiation with a patterning device. The patterning device includes at least two image patterning portions and at least two metrology mark patterning portions. The method also includes projecting at least two image portions of the patterned beam of radiation sequentially onto target... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080032209 - Long length flexible circuits and method of making same: Disclosed is a method for making long flexible circuits. Some of the long circuits may be made using a single photoimaging mask. Also disclosed are flexible circuits made by this method.... Agent: 3m Innovative Properties Company

20080032204 - Methods of optical proximity correction: Systems and methods of optical proximity correction are disclosed. A preferred embodiment comprises a method of determining optical proximity correction, which includes providing a design for a lithography mask. The design comprises a layout for a material layer of a semiconductor device. A predicted wafer image producible by the design... Agent: Slater & Matsil LLP

20080032211 - Optical proximity correction mask pattern: An optical proximity correction (OPC) mask pattern used in a layout for a photolithography process. An OPC mask pattern may include a first mask pattern for an active region and a second mask pattern for a gate pattern. The second mask pattern may have a plurality of micro patterns stacked... Agent: Sherr & Nourse, PLLC

20080032205 - Overlay mark: An overlay mark formed on a photomask, comprising a first rectangular region, a second rectangular region, a third rectangular region, and a fourth rectangular region, each rectangular region having the same pattern configuration, a longer side of the first rectangular region and a longer side of the third rectangular region... Agent: Birch Stewart Kolasch & Birch

20080032208 - Overlay mark and method of forming the same: An overlay mark may include a main overlay pattern and an auxiliary overlay pattern, wherein the main overlay pattern may have an opening exposing a substrate and the auxiliary overlay pattern may be formed in the opening. The auxiliary overlay pattern may be spaced apart from a sidewall of the... Agent: Harness, Dickey & Pierce, P.L.C

20080032206 - Photomask registration errors of which have been corrected and method of correcting registration errors of photomask: Provided are photomask registration errors of which have been corrected and a method of correcting the registration errors of a photomask. The photomask includes a photomask substrate, an optical pattern formed on one surface of the photomask substrate, and a plurality of stress generation portions formed in the photomask substrate.... Agent: F. Chau & Associates, LLC

20080032215 - Color filter substrate and fabricating method thereof: A method of fabricating a color filter substrate is provided. First, a transparent substrate having a display region, a peripheral region and a buffer region is provided. Next, a shielding pattern layer is formed in the peripheral region of the transparent substrate, and a color filter layer is formed in... Agent: Jianq Chyun Intellectual Property Office

20080032221 - Polyarylate containing member: A photoconductor containing a substrate, an undercoat layer thereover comprising a polyol resin, an aminoplast resin, a polyarylate, a siloxane modified polyarylate, an epoxy modified polyarylate, or a urethane modified polyarylate, or an amine modified polyarylate, and a metal oxide; a photogenerating layer, and at least one charge transport layer.... Agent: Patent Documentation Center

20080032219 - Polyester containing member: A photoconductor containing a substrate, an undercoat layer thereover comprising a resin mixture of, for example, a polyol resin, and an aminoplast resin, and a polyester, and a metal oxide; a photogenerating layer and at least one, such as 1 to about 4, charge transport layer.... Agent: Patent Documentation Center

20080032220 - Silicone free polyester containing member: A photoconductor containing a substrate, a layer thereover, which layer contains, for example, a polyol resin, an aminoplast resin, a silicone free polyester, and a metal oxide dispersed therein; and at least one imaging layer formed on the polyol resin containing layer.... Agent: Patent Documentation Center

20080032216 - Phosphate ester containing photoconductors: A photoconductor containing a substrate, an undercoat layer thereover wherein the undercoat layer includes, for example, a polyol resin, an aminoplast resin, a polymeric phosphate ester adhesion component, and a metal oxide; and at least one imaging layer, such as a photogenerating and charge transport layer, formed on the undercoat... Agent: Patent Documentation Center

20080032217 - Phosphoric acid ester containing photoconductors: A photoconductor containing a substrate, a layer thereover wherein the layer comprises, for example, a polyol resin, an aminoplast resin, an ester of phosphoric acid adhesion component, and a metal oxide; and at least one imaging layer of, for example, a photogenerating layer and a charge transport layer formed on... Agent: Patent Documentation Center

20080032218 - Silanol containing photoconductor: A photoconductor containing a substrate, an undercoat layer thereover comprising a polymeric resin, a silanol, and a metal oxide; and a photogenerating layer; and at least one charge transport layer.... Agent: Patent Documentation Center

20080032202 - Material for forming resist protective film for use in liquid immersion lithography process and method for forming resist pattern using the protective film: The liquid immersion lithography process is configured so that the resist pattern resolution is improved by exposing a resist film to the lithographic exposure light under the conditions in which the predetermined thickness of the liquid for liquid immersion lithography, of which the refractive index is higher than that of... Agent: Hoffmann & Baron, LLP

20080032212 - High definition mask and manufacturing method of the same: A high definition mask and a manufacturing method of the same are provided. The high definition mask according to an embodiment includes a quartz plate; a phase shift mask (PSM) area found on the quartz plate in a predetermined pattern; and a chromeless mask (CLM) are formed in a finger... Agent: Saliwanchik Lloyd & Saliwanchik A Professional Association

20080032213 - Mask blanks: The present invention provides a mask blank which comprises a substrate made of a synthetic quartz glass and a light-shielding film laminated on a surface of the substrate and is for use in a semiconductor device production technique employing an exposure light wavelength of 200 nm or shorter, wherein the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080032207 - Method for correcting optical proximity effects: In a method for correcting optical proximity effects (optical Proximity Correction, OPC) when imaging a pattern, arranged in the object surface of a projection objective, into the image surface of the projection objective with the aid of a projection objective, a multiplicity of optical elements and at least one pupil... Agent: Sughrue Mion, PLLC

20080032210 - Method for fabricating mask and device isolation film: Embodiments relate to a method for fabricating a mask used in a photolithography process. According to embodiments, a Design dimensions of DI model considering a line width of a photoresist after Photo Engraving Process (PEP) are corrected to be used. Among the design dimensions, a design dimension for a distance... Agent: Sherr & Nourse, PLLC

20080032214 - Photoresist trimming process: A photoresist trimming gas compound is provided which will selectively remove a resist foot or scum from the lower portions of sidewalls of a photoresist. Additionally, the trimmer compound hardens or toughens an upper surface of the photoresist thereby strengthening the photoresist. The trimmer compound includes O2 and at least... Agent: Greenblum & Bernstein, P.L.C

20080032222 - Powder coating apparatus and method of powder coating using an electromagnetic brush: Apparatus and methods for applying powder coatings to a substrate using a magnetic brush developer, including a method and apparatus for applying powder coatings to a substrate either directly or by intermediate transfer using a magnetic brush with a rotating magnetic field and for preparing the coating materials. The apparatus... Agent: David A. Novais Patent Legal Staff

20080032223 - Charge control agent, toner and toner producing method: The present invention provides a charge control agent, adapted to control charging ability of resins or compositions containing resins, comprising a copolymer that comprises a polymer block A and a polymer block B, the polymer block A is prepared by copolymerizing a maleimide, which being unsubstituted or substituted for a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080032224 - Aggregate dispersant, method of manufacturing aggregate of resin-containing particles, toner, developer, deveoping apparatus, and image forming apparatus: A toner in form of aggregate of resin-containing particles is manufactured by aggregating the resin-containing particles which contain binder resin and the colorant, with the aid of an aggregate dispersant containing a polymer in which anionic polar groups are bonded to a main chain. To be specific, salt of divalent... Agent: Nixon & Vanderhye, PC

20080032225 - Liquid developer, method of preparing liquid developer, and image forming apparatus: t

20080032226 - Toner for developing electrostatic latent image: An improved toner comprises a binder resin comprising a urea-modified polyester resin; a colorant master batch comprising a colorant; a resin; and a pigment dispersant. The toner is prepared by a method comprising dissolving or dispersing toner compositions including a modified polyester resin capable of forming the urea-modified polyester resin... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080032227 - Method for preparing latex containing pigment copolymerized with a crystalline polymer: A method of preparing a latex that includes pigments copolymerized with a crystalline polymer includes: dispersing a pigment and a dispersing agent in water having an ultra-high purity to obtain a pigment dispersion; dissolving a crystalline monomer in a basic monomer mixture to obtain an organic phase; dissolving while heating... Agent: Staas & Halsey LLP

20080032231 - Resist lower layer material, resist lower layer substrate comprising the material and method for forming pattern: m

20080032230 - Substrate used for immersion lithography process, method of manufacturing substrate used for immersion lithography process, and immersion lithography: A substrate having a photoresist film, capable of easily performing immersion lithography with high precision and stability, is provided. A surface tension of the substrate in a periphery region is lower than that of the substrate in a rest region. Immersion liquid supplied onto the photoresist film hardly leaks out,... Agent: Oliff & Berridge, PLC

20080032228 - Top antireflective coating composition containing hydrophobic and acidic groups: The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for immersion lithography. The inventive composition is soluble in aqueous base solutions and insoluble in water. The inventive composition comprises a polymer having at least one hydrophobic moiety, at least one acidic moiety... Agent: Scully Scott Murphy & Presser, PC

20080032229 - Bottom antireflective coatings: The present invention relates to bottom antireflective coatings.... Agent: Az Electronic Materials Usa Corp. Attention: Industrial Property Dept.

20080032232 - Novel resins and photoresist compositions comprising same: Provided are new resins that comprise carbocyclic aryl units with hetero substitution units and photoresists that contain such resins. Particularly preferred photoresists of the invention comprise a deblocking resin that contains hydroxy naphthyl units and can be effectively imaged with sub-200 nm radiation such as 193 nm radiation.... Agent: S. Matthew Cairns Rohm And Haas Electronic Materials LLC

20080032233 - Crossbar-array designs and wire addressing methods that tolerate misalignment of electrical components at wire overlap points: Various embodiments of the present invention are directed to crossbar array designs that interfaces wires to address wires, despite misalignments between electrical components and wires. In one embodiment, a nanoscale device may be composed of a first layer of two or more wires and a second layer of two or... Agent: Hewlett Packard Company

20080032234 - Exposure apparatus, exposure method, and method for producing device: An exposure apparatus includes a nozzle member which has at least one of a supply port for supplying a liquid and a recovery port for recovering the liquid, and a nozzle adjusting mechanism which adjusts at least one of a position and a posture of the nozzle member depending on... Agent: Oliff & Berridge, PLC

20080032235 - Fabrication method of active device array substrate: A fabrication method of active device array substrate is disclosed. First, a substrate and a multi-tone mask are provided. Then, a gate electrode, a gate insulation layer, a channel material layer, a metal material layer and a photo resist layer are formed on the substrate sequentially. Next, the photoresist layer... Agent: Jianq Chyun Intellectual Property Office

20080032236 - Method and apparatus for solid-state microbattery photolithographic manufacture, singulation and passivation: A method for producing a thin film lithium battery is provided, comprising applying a cathode current collector, a cathode material, an anode current collector, and an electrolyte layer separating the cathode material from the anode current collector to a substrate, wherein at least one of the layers contains lithiated compounds... Agent: Kagan Binder, PLLC

20080032237 - Method for producing photonic crystals: The invention relates to a process for producing photonic crystals by first providing an inorganic photoresist which, on illumination with energy greater than the electronic band gap of the photoresist, exhibits a phase alteration. Illumination of the photoresist with a laser beam whose energy is lower than the electronic band... Agent: Friedrich Kueffner

20080032238 - System and method for controlling the size and/or distribution of catalyst nanoparticles for nanostructure growth: Techniques for controlling the size and/or distribution of a catalyst nanoparticles on a substrate are provided. The catalyst nanoparticles comprise any species that can be used for growing a nanostructure, such as a nanotube, on the substrate surface. Polymers are used as a carrier of a catalyst payload, and such... Agent: Agilent Technologies Inc.

20080032239 - Pattern formation method: In the pattern formation method, a resist film is formed on a substrate, and a barrier film is formed on the resist film. Thereafter, with a liquid provided on the barrier film, pattern exposure is performed by selectively irradiating the resist film with exposing light through the barrier film. After... Agent: Mcdermott Will & Emery LLP

20080032240 - Reduction of co2 reaction at developer surface: In a system and process for developing an imaged plate by contacting the plate with an alkaline developer, contained in a developer tank having a cover spaced over the developer level, the space between the developer level and cover is maintained at a concentration of carbon dioxide below ambient for... Agent: Alix Yale & Ristas LLP

20080032242 - Method of forming plated product using negative photoresist composition and photosensitive composition used therein: A method is provided that enables the formation of multiple level plated products with large plating depth. A negative photoresist composition comprising (a) an alkali-soluble resin, (b) an acid generator, and (c) other components is used, and a plated product is formed by (A) a step of forming a layer... Agent: Knobbe Martens Olson & Bear LLP

20080032243 - Photoresist coating composition and method for forming fine contact of semiconductor device: A coating composition containing a coating base resin and a C4-C10 alcohol as a main solvent, and a method for forming a fine contact of a semiconductor device including the steps of preparing the coating composition, forming a photoresist film on a semiconductor substrate having an underlying layer, performing exposure... Agent: Marshall, Gerstein & Borun LLP

20080032241 - Resist polymer, process for production thereof, resist composition, and process for production of substrated with patterns thereon: in the formula (1), L is a divalent linear, branched, or cyclic C1-20 hydrocarbon group which may have a substituent and/or a heteroatom; R11 is a g-valent linear, branched, or cyclic C 120 hydrocarbon group which may have a substituent and/or a heteroatom; and g represents an integer of 1... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080032244 - Method and apparatus for forming crystalline portions of semiconductor film: A crystallization method which generates a crystallized semiconductor film by irradiating at least one of a polycrystal semiconductor film and an amorphous semiconductor film with light beams having a light intensity distribution with an inverse peak pattern that a light intensity is increased toward the periphery from an inverse peak... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.