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Radiation imagery chemistry: process, composition, or product thereof January USPTO class listing 01/08Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 01/31/2008 > patent applications in patent subcategories. USPTO class listing
20080026298 - Method to optimize grating test pattern for lithography monitoring and control: A method of making a process monitor grating pattern for use in a lithographic imaging system comprises determining minimum resolvable pitch of a plurality of spaced, adjacent line elements, and selecting a process monitor grating period that is an integer multiple M, greater than 1, of the minimum resolvable pitch.... Agent: Law Office Of Delio & Peterson, LLC.
20080026299 - Multi-tone optical mask, method of manufacturing the same and method of manufacturing thin-film transistor substrate by using the same: A multi-tone optical mask includes a substrate, a light-blocking pattern, a first semi-transmitting pattern and a second semi-transmitting pattern. The light-blocking pattern is formed on the substrate. The first semi-transmitting pattern is formed on the substrate. The second semi-transmitting pattern partially overlaps the first semi-transmitting pattern. The multi-tone optical mask... Agent: Macpherson Kwok Chen & Heid LLP
20080026302 - Black matrix compositions and methods of forming the same: Black matrix compositions, methods for forming a black matrix, and apparatus for use in forming a color filter for a flat-panel display are disclosed. The compositions, methods and apparatus use an additive including polymerizable molecules, the polymerizable molecules each including polar portions and non-polar portions. The non-polar portions are ink-phobic... Agent: Dugan & Dugan, PC
20080026305 - Apparatus and method for alignment using multiple wavelengths of light: A method and system are disclosed for aligning a lithography template having a pattern with a substrate in preparation for transferring the pattern to a surface of the substrate. The system includes an optical imaging system adapted to image a first alignment structure formed on a top surface of the... Agent: Hewlett Packard Company
20080026306 - Patterning and treatment methods for organic light emitting diode devices: A thermal transfer donor element is provided which can include a support, light-to-heat conversion layer, interlayer, and transfer layer. When the donor element is brought into contact with a receptor and imagewise irradiated, an image is obtained which is free from contamination by the light-to-heat conversion layer. In order to... Agent: 3m Innovative Properties Company
20080026307 - Circuit pattern formation device and method of forming circuit pattern: The purpose of the present invention is to provide a method for transferring a pattern of a circuit pattern precursor formed of electroconductive particles containing no resin component onto an objective substrate with high transfer efficiency while retaining a pattern shape. A method of transferring the circuit pattern precursor formed... Agent: Antonelli, Terry, Stout & Kraus, LLP
20080026308 - Protective overcoat: A photoconductive having an overcoat layer that includes a cured or substantially crosslinked product of at least a melamine-formaldehyde resin and a charge transport compound, and an optional phenol compound.... Agent: Oliff & Berridge, PLC.
20080026309 - Imaging belt with nanotube backing layer, and image forming device including the same: An imaging belt comprises a substrate layer, an outer image layer and an inner anti-curl backing layer. The inner anti-curl backing layer, in turn, includes one or more carbon nanotubes disposed therein, together with an exposed backing layer surface. An image forming device includes the imaging belt. The image forming... Agent: Patent Documentation Center
20080026310 - Oxo-titanylphthalocyanine crystal, method for producing the same, and electrophotographic photoreceptor: The invention provides an oxo-titanylphthalocyanine crystal which is stable, is superior in dispersibility in a photoreceptive layer and efficiently contributes to improvements in sensitivity and charge retention rate of an electrophotographic photoreceptor when it is used as a charge generating agent, a method for producing the oxo-titanylphthalocyanine crystal, and an... Agent: Arthur G. Schaier Carmody & Torrance LLP
20080026301 - Method of fabricating liquid crystal dispaly device: A method of fabricating a LCD device comprises preparing a substrate having a plurality of LCD panel regions within main exposure regions, performing a main exposure process at the LCD panel regions to define a non-exposure region between the main exposure regions; and performing a sub exposure process at the... Agent: Mckenna Long & Aldridge LLP
20080026300 - Photomask manufacturing method and semiconductor device manufacturing method: This invention discloses a photomask manufacturing method. A pattern dimensional map is generated by preparing a photomask in which a mask pattern is formed on a transparent substrate, and measuring a mask in-plane distribution of the pattern dimensions. A transmittance correction coefficient map is generated by dividing a pattern formation... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20080026303 - Donor sheet, color filter, organic el element and method for producing them: A donor sheet for transferring an image pattern to an image receiving element by a thermal imaging process using laser beam, comprising a base having formed in order on the base a light-to-heat conversion layer, and a transfer layer containing an image component which is melted by heating due to... Agent: Merchant & Gould PC
20080026304 - Structure for pattern formation, method for pattern formation, and application thereof: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.... Agent: Ladas & Parry LLP
20080026312 - Releasing agent dispersion: The present invention relates to a releasing agent dispersion for toner including a releasing agent, and a dibasic acid containing an alkyl group and/or an alkenyl group or a salt of the dibasic acid, wherein at least one acid group of the dibasic acid is a carboxyl group; and a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20080026311 - Resin emulsion: The present invention relates to a resin emulsion being produced by neutralizing a resin binder containing acid group with a basic compound in an aqueous medium wherein the resin binder containing acid group contains a polyester produced from a raw monomer composition containing a trivalent or higher-valent polyhydric alcohol in... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20080026313 - Image forming apparatus and image forming method: An image forming apparatus includes an electrophotographic photosensitive member and a toner. The photosensitive member has a universal hardness of 1.5×108 to 2.3×108 N/m2, the hardness being measured in an environment of 25° C. with a humidity of 50% using a Vickers diamond indenter having a quadrangular pyramid shape with... Agent: Fitzpatrick Cella Harper & Scinto
20080026318 - Composite photoresist for modifying die-side bumps: A composite photoresist comprises a photoresist material and a filler material dispersed within the photoresist material, wherein the filler material includes a plurality of nanoparticles. The photoresist material may comprise an acrylic-based photoresist, a novolak-based photoresist, a polyhydroxystyrene-based photoresist, a SLAM, or a BARC. The filler material may comprise base-soluble... Agent: Intel Corporation C/o Intellevate, LLC
20080026315 - Fluorinated half ester of maleic anhydride polymers for dry 193 nm top antireflective coating application: The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for 193 nm lithography. The inventive composition is soluble in aqueous base solutions and has low refractive index at 193 nm. The inventive composition comprises an aqueous base-soluble polymer having a backbone and... Agent: Scully Scott Murphy & Presser, PC
20080026317 - Method for using compositions containing fluorocarbinols in lithographic processes: The present invention involves a method for generating a photoresist image on a substrate. The method comprises coating a substrate with a film comprising a polymer comprising fluorocarbinol monomers; imagewise exposing the film to radiation; heating the film to a temperature of, at, or below about 90° C. and developing... Agent: Robert Martin
20080026316 - Photoresist composition with antibacterial agent: A photoresist composition, e.g., a positive acting resist, for use in the formation of circuit patterns and the like on printed circuit boards and the like circuitized substrates, the photoresist composition including a quantity of silver therein in a sufficient amount to substantially prevent bacteria formation within said composition. A... Agent: Lawrence R. Fraley Hinman, Howard & Kattell, LLP
20080026320 - Photosensitive paste composition, barrier rib prepared using the composition and plasma display panel comprising the barrier rib: A barrier rib of a plasma display panel is prepared using the photosensitive past composition. Since a pattern of a barrier rib for a PDP having high resolution and high precision can be made by only a single exposure to light, and a barrier rib having a higher reflective index... Agent: Stein, Mcewen & Bui, LLP
20080026322 - Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method: A silicon-containing film is formed from a heat curable composition comprising (A-1) a silicon-containing compound obtained by effecting hydrolytic condensation of a hydrolyzable silicon compound in the presence of an acid catalyst and removing the acid catalyst, (A-2) a silicon-containing compound obtained by effecting hydrolytic condensation of a hydrolyzable silicon... Agent: Birch Stewart Kolasch & Birch
20080026323 - Heat-sensitive transfer image-receiving sheet: A heat-sensitive transfer image-receiving sheet, containing; a support; at least one receptor layer containing at least two kinds of latex polymers, said latex polymers having different elastic moduli from each other; and at least one heat-insulation layer containing hollow latex polymer particles and a water-soluble polymer, said at least one... Agent: Sughrue Mion, PLLC
20080026319 - Laser marking of coated articles and laser-markable coating composition: A method of marking a coating includes incorporating into a powder coating composition a laser-reactive material; forming a coating layer on an article with the coating composition, and marking the coating on the article with a laser. The marking can be printing, a graphic, a design, a log, information, symbols,... Agent: Harness, Dickey & Pierce, P.L.C
20080026321 - Positive-working photoresist composition for thick film formation: The invention provides a chemical-amplification positive-working photoresist composition suitable for forming a resist film of a relatively large thickness on a substrate in addition to other advantages. The inventive composition contains (A) a photoacid-generating agent, (B) an alkali-insoluble resin capable of being imparted with increased alkali-solubility by interaction with an... Agent: Wenderoth, Lind & Ponack, L.L.P.
20080026324 - Lithographic printing plate precursor and method for preparation of lithographic printing plate: A lithographic printing plate precursor comprising: an aluminum support having a hydrophilic surface; and a photosensitive layer comprising a binder polymer having an acid value of 0.3 meq/g or less, wherein the photosensitive layer comprises a pigment dispersed with a pigment dispersant which is free from a —COOH group, a... Agent: Sughrue-265550
20080026325 - Image transfer process for thin film component definition: A method for fabricating a thin film component according to one embodiment comprises forming a wafer having a thin film layer, a release layer, and a patterned layer of photoresist; transferring the pattern of the layer of photoresist to the release layer and the thin film layer; adding a layer... Agent: Zilka-kotab, PC
20080026326 - Method of producing thin film magnetic head: The method of producing a thin film magnetic head is capable of flattening a surface of a hard bias film without badly influencing a read-element. The method comprises the steps of: forming a magnetoresistance effect film on a wafer substrate; forming a resist layer, at a position corresponding to a... Agent: Patrick G. Burns, Esq. Greer, Burns & Crain, Ltd.
20080026327 - Method for forming fine pattern with a double exposure technology: The method for forming a fine pattern of a semiconductor device includes depositing a photoresist film over a semiconductor substrate having an underlying layer, performing a first exposure process using a first exposure mask to form a first photoresist pattern, the first exposure mask defining a first and a second... Agent: Townsend And Townsend And Crew, LLP
20080026328 - Method for fabricating a structure for a microelectromechanical systems (mems) device: The invention provides a microfabrication process which may be used to manufacture a MEMS device. The process comprises depositing one or a stack of layers on a base layer, said one layer or an uppermost layer in said stack of layers being a sacrificial layer; patterning said one or a... Agent: Knobbe, Martens, Olson & Bear, LLP
20080026329 - Surface modification of polymer surface using ion beam irradiation: A system and method for producing a plurality of controlled surface irregularities, such as wrinkles, is provided. The system includes a polymeric substrate. An irradiation source is positioned to provide a beam on desired areas of the polymeric substrate. The surface irregularities appear on the exposed region by controlling the... Agent: Gauthier & Connors, LLP
20080026331 - Lactone-containing compound, polymer, resist composition, and patterning process: Lactone-containing compounds having formula (1) are novel wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are monovalent hydrocarbon groups, or R2 and R3 may together form an aliphatic hydrocarbon ring, R4 is H or CO2R5, R5 is a monovalent hydrocarbon group, W is CH2, O or S,... Agent: Birch Stewart Kolasch & Birch
20080026330 - Immersion topcoat materials with improved performance: c
20080026332 - Developing agent and manufacturing method thereof: A developing agent comprises first and second resin fine particles containing a colorant and a release agent and different in weight average molecular weight, and a concentration of the release agent which is softened at a low temperature in the second resin fine particles having the high weight average molecular... Agent: Amin, Turocy & Calvin, LLP
20080026333 - Silver halide photosensitive material and image-forming method using the same: A silver halide photosensitive material having at least one blue-sensitive layer, at least one green-sensitive layer, and at least one red-sensitive layer, on a transparent support, wherein at least one of the green-sensitive layers contains a coupler represented by general formula (I) or general formula (Z), and all of the... Agent: Birch Stewart Kolasch & Birch
20080026334 - Topcoat layers for phosphor or scintillator screens or panels: A photo-curable composition comprising a polymer or copolymer and a (meth)acrylate type monomer with more than one (meth)acrylate group per monomer molecule and two or more ethyleneoxy groups per (meth)acrylate group in said monomer is particularly suitable for use as a topcoat layer for phosphor or scintillator screens or panels,... Agent: Nexsen Pruet, LLC01/24/2008 > patent applications in patent subcategories. USPTO class listing
20080020290 - Negative resist composition and patterning process using the same: There is disclosed a negative resist composition comprising, at least, a polymer comprising a repeating unit of hydroxy vinylnaphthalene represented by the following general formula (1). There can be provided a negative resist composition, in particular, a chemically amplified negative resist composition that can exhibit higher resolution than conventional hydroxy... Agent: Oliff & Berridge, PLC
20080020289 - Novel polymer, positive resist composition and patterning process using the same: There is disclosed a polymer comprising: at least, a repeating unit of substitutable hydroxy styrene and a repeating unit of substitutable hydroxy vinylnaphthalene which are represented by the following general formula (1). There can be provided a polymer suitable as a base resin of a positive resist composition, in particular,... Agent: Oliff & Berridge, PLC
20080020295 - Exposure mask and method for manufacturing semiconductor device using the same: A method for manufacturing a semiconductor device comprises forming a photoresist pattern by an exposure process with an exposure mask including a shifter pattern and further performing a reflow process on the photoresist pattern to obtain a line/space pattern having a wave type with a uniform a pattern line-width and... Agent: Townsend And Townsend And Crew, LLP
20080020299 - Mask and manufacturing method of microlens using thereof: The present invention relates to a mask and a method of manufacturing a microlens using the mask, which condenses external light in a CMOS image sensor so that the microlens irradiated by means of a photodiode can have an excellent radius of curvature. With the present invention, the phase shift... Agent: The Law Offices Of Andrew D. Fortney, Ph.d., P.C.
20080020297 - Mask for photolithography and method of fabricating photoresist pattern using the same: A mask for photolithography with high exposure margin and a method of fabricating a photoresist pattern, using the mask are provided. The mask for photolithography includes a transparent substrate and a plurality of optical shielding members on the transparent substrate. Each optical shielding member includes a plurality of optical shielding... Agent: Myers Bigel Sibley & Sajovec
20080020292 - Measurement of a scattered light point spread function (psf) for microelectronic photolithography: A scattered light point spread function is measured for use in fabricating microelectronic and micromechanical devices using photolithography. In one example, a photosensitive layer of a microelectronic substrate is exposed through a test mask, the test mask having a series of differently sized patterns, each pattern surrounding a central monitor... Agent: Blakely Sokoloff Taylor & Zafman
20080020291 - Optical diffusers, photomasks and their methods of fabrication: A large mask with random apertures may be formed by forming a smaller mask (also called a cell mask) with a random pattern of transmissive apertures which is then repeatedly replicated to create the large mask. The random pattern may be created by perturbing the aperture locations by a small... Agent: Ronald D. Trice
20080020294 - Photomask, focus measurement apparatus and focus measurement method: A test photomask includes a first mask pattern and a second mask pattern formed at a center portion of the first mask pattern thereon. The first mask pattern is a pattern with light condensing effect and a nature in which an exposure-dose amount to a transfer object varies in dependence... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20080020293 - Vortex mask and method for preparing the same and method for preparing a circular pattern using the same: A vortex mask comprises a substrate, a first phase region positioned on the substrate, a second phase region surrounding the first phase region, and a third phase region positioned on the substrate and connected to the first phase region and the second phase region. When exposure beams penetrate the first... Agent: Oliff & Berridge, PLC
20080020300 - Photosensitive resin composition for color filter of image sensor and color filter of image sensor using the same: A photosensitive resin composition for a color filter of an image sensor is disclosed. The photosensitive resin composition is developable with an aqueous alkaline solution. The photosensitive resin composition can include (a) an acrylic resin, (b) a photopolymerizable acrylic monomer, (c) a photopolymerization initiator, (d) a pigment dispersion and (e)... Agent: Summa, Allan & Additon, P.A.
20080020301 - Method and device for fabricating nano-structure with patterned particle beam: The present invention provides a method and an apparatus for producing a two-dimensional patterned beam, e.g. a two-dimensional patterned and focused ion beam, for fabricating a nano-structure on a substrate with the precursor gas. In comparison with the conventional focused ion beam that is applied for fabricating a dot-like nano-structure... Agent: Volpe And Koenig, P.C.
20080020303 - Alignment for contact lithography: A contact lithography system includes a patterning tool having a pattern for transfer to a substrate; and at least one alignment device coupled to the patterning tool. The alignment device is configured to measure alignment between the patterning tool and a substrate for receiving the pattern of the patterning tool.... Agent: Hewlett Packard Company
20080020306 - Electrophotographic photoreceptor: An electrophotographic imaging member includes a substrate, a charge generating layer, and a charge transport layer, where the charge generating layer includes a photogenerating material, a film-forming polymer binder, and a glycol compound having two hydroxyl groups bonded to adjoining carbon atoms in the carbon chain.... Agent: Oliff & Berridge, PLC.
20080020307 - Electrophotographic photoreceptor: An electrophotographic imaging member includes a substrate, a charge generating layer, and a charge transport layer, where the charge generating layer includes a photogenerating material and a hydroxyl group-containing polymeric compound.... Agent: Oliff & Berridge, PLC.
20080020308 - Imaging member having antistatic anticurl back coating: The presently disclosed embodiments relate in general to electrophotographic imaging members, such as layered photoreceptor structures, and processes for making and using the same. More particularly, the embodiments pertain to the incorporation of organic sulfonic acids in the anticurl back coating to reduce or eliminate static charge buildup in the... Agent: Pillsbury Winthrop Shaw Pittman LLP
20080020309 - Imaging member having antistatic anticurl back coating: The presently disclosed embodiments relate in general to electrophotographic imaging members, such as layered photoreceptor structures, and processes for making and using the same. More particularly, the embodiments pertain to the incorporation of thiophosphates in the anticurl back coating to reduce or eliminate static charge buildup in the imaging member... Agent: Pillsbury Winthrop Shaw Pittman LLP
20080020310 - Imaging member having antistatic anticurl back coating: The presently disclosed embodiments relate in general to electrophotographic imaging members, such as layered photoreceptor structures, and processes for making and using the same. More particularly, the embodiments pertain to the incorporation of metallic compounds in the anticurl back coating to reduce or eliminate static charge buildup in the imaging... Agent: Pillsbury Winthrop Shaw Pittman LLP
20080020311 - Imaging member having antistatic anticurl back coating: The presently disclosed embodiments relate in general to electrophotographic imaging members, such as layered photoreceptor structures, and processes for making and using the same. More particularly, the embodiments pertain to an additive of ammonium or phosphonium salts or mixtures thereof to reduce or eliminate static charge buildup in the imaging... Agent: Pillsbury Winthrop Shaw Pittman LLP
20080020312 - Imaging member having antistatic anticurl back coating: The presently disclosed embodiments relate in general to electrophotographic imaging members, such as layered photoreceptor structures, and processes for making and using the same. More particularly, the embodiments pertain to the incorporation of silanols in the anticurl back coating to reduce or eliminate static charge buildup in the imaging member... Agent: Pillsbury Winthrop Shaw Pittman LLP
20080020313 - Imaging member having antistatic anticurl back coating: The presently disclosed embodiments relate in general to electrophotographic imaging members, such as layered photoreceptor structures, and processes for making and using the same. More particularly, the embodiments pertain to the incorporation of esters of phosphoric acid in the anticurl back coating to reduce or eliminate static charge buildup in... Agent: Pillsbury Winthrop Shaw Pittman LLP
20080020314 - Imaging member having antistatic anticurl back coating: The presently disclosed embodiments relate in general to electrophotographic imaging members, such as layered photoreceptor structures, and processes for making and using the same. More particularly, the embodiments pertain to the incorporation of polyols in the anticurl back coating to reduce or eliminate static charge buildup in the imaging member... Agent: Pillsbury Winthrop Shaw Pittman LLP
20080020288 - Resist composition and process for formation of resist patterns: A resist composition that includes a base material component (A), which contains acid-dissociable, dissolution-inhibiting groups and exhibits increased alkali solubility under the action of acid, an acid generator component (B) that generates acid on exposure, and an organic solvent (C), in which the components (A) and (B) are dissolved in... Agent: Knobbe Martens Olson & Bear LLP
20080020296 - Method and apparatus for performing dark field double dipole lithography (ddl): A method of generating complementary masks for use in a dark field double dipole imaging process. The method includes the steps of identifying a target pattern having a plurality of features, including horizontal and vertical features; generating a horizontal mask based on the target pattern, where the horizontal mask includes... Agent: Mcdermott Will & Emery LLP
20080020298 - Photomask, and method and apparatus for producing the same: A shading area having a transmissivity in the range of 0 to 2% is formed at the center of a clear defect in a wiring pattern of a halt half tone mask. Semitransparent areas having a transmissivity in the range of 10 to 25% are formed, adjacently to shading area,... Agent: Mcdermott Will & Emery LLP
20080020302 - Device having etched feature with shrinkage carryover: In an embodiment of the present invention, a device includes a first etched feature located in a critical dimension scanning electron microscope (CD-SEM) characterization location, the first etched feature having an upper section, a middle section, and a lower section wherein the middle section is severely shrunk relative to a... Agent: Intel Corporation C/o Intellevate, LLC
20080020304 - Electrical, plating and catalytic uses of metal nanomaterial compositions: This invention relates generally to uses of novel nanomaterial composition and the systems in which they are used, and more particularly to nanomaterial compositions generally comprising carbon and a metal, which composition can be exposed to pulsed emissions to react, activate, combine, or sinter the nanomaterial composition. The nanomaterial compositions... Agent: Winstead PC
20080020305 - Electrophotographic photoconductor, and image forming process, image forming apparatus and process cartridge for an image forming apparatus using the same: Disclosed is an electrophotographic photoconductor including at least a photoconductive layer on an electroconductive substrate, which comprises at least a cross-linked surface layer formed by curing a tri- or more-functional radical polymerizable monomer without having a charge transporting structure and a mono-functional radical polymerizable compound having a charge transporting structure... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20080020315 - Substrate collection method and substrate treatment apparatus: When a trouble occurs in a substrate treatment apparatus, the substrate existing in the substrate treatment apparatus is quickly collected without exerting adverse effects on the subsequent substrate treatment to resume the substrate treatment early. At the time of occurrence of trouble in a coating and developing treatment apparatus, all... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20080020316 - Electrophotographic toner and electrophotographic developer by use thereof: An electrophotographic toner is disclosed, meeting the requirement that a ratio of a storage modulus at 60° C. [G′(60)] to a storage modulus at 80° C. [G′(80)], G′(60)/G′(80) is from 1×102 to 1×104; a ratio of a storage modulus at 100° C. [G′(100)] to a storage modulus at 120° C.... Agent: Lucas & Mercanti, LLP
20080020317 - Novel metal nanoparticle and formation of conductive pattern using the same: A metal nanoparticle which is prepared by forming a self-assembled monolayer including a terminal reactive group on the surface thereof, and introducing a functional group capable of being removed by the action of an acid or an base into the terminal reactive group wherein the self-assembled monolayer is built up... Agent: Buchanan, Ingersoll & Rooney PC
20080020318 - Donor sheet, color filter, organic el element and method for producing them: A donor sheet for transferring an image pattern to an image receiving element by a thermal imaging process using laser beam, comprising a base having formed in order on the base a light-to-heat conversion layer, and a transfer layer containing an image component which is melted by heating due to... Agent: Merchant & Gould PC
20080020320 - Color forming composition containing optional sensitizer: A method of forming a radiation imageable coating includes preparing a radiation-curable polymer matrix including an acidic activator species, forming a leuco-dye phase, distributing the leuco-dye phase in the polymer matrix, evaluating a power level of an targeted radiation source, and if the power level of the targeted radiation source... Agent: Hewlett Packard Company
20080020319 - Graded arc for high na and immersion lithography: A method of forming a device using a graded anti-reflective coating is provided. One or more amorphous carbon layers are formed on a substrate. An anti-reflective coating (ARC) is formed on the one or more amorphous carbon layers wherein the ARC layer has an absorption coefficient that varies across the... Agent: Patterson & Sheridan, LLP
20080020321 - Positive type resist composition, process for forming resist pattern, and process for performing ion implantation: A positive resist composition which is obtained by dissolving (A) a resin ingredient for resists and (B) an acid generator ingredient in an organic solvent, wherein the ingredient (A) comprises (A1) a resin ingredient for resists which has the structural unit (a1), structural unit (a2), and structural unit (a3) shown... Agent: Knobbe Martens Olson & Bear LLP
20080020322 - Photosensitive organic semiconductor compositions: The present invention relates to a photosensitive organic semiconductor composition comprising an organic p-type semiconductor pigment with a p-type conducting polymer, wherein the ionization potentials of the organic p-type semiconductor pigment and the p-type conducting polymer are nominally equivalent and a photosensitive organic semiconductor composition comprising an organic n-type semiconductor... Agent: Andrew J. Anderson Patent Legal Staff
20080020323 - Light sensitive planographic printing plate material: Disclosed is a light sensitive planographic printing plate material comprising a support and provided thereon, a light sensitive layer containing a polymerization initiator, a polymerizable ethylenically unsaturated compound, a polymeric binder, and a sensitizing dye, wherein the sensitizing dye is represented by formula (1),... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20080020324 - Immersion lithography defect reduction with top coater removal: A method for photolithography processing includes providing a substrate coated with a photosensitive layer thereon and a top coater overlying the photosensitive layer; exposing the photosensitive layer to a radiation energy; removing the top coater; and baking the photosensitive layer after the removing of the top coater layer.... Agent: Haynes And Boone, LLP
20080020326 - Pattern decomposition method for double exposure: A pattern decomposition method capable of achieving patterns with a complicated layout by double exposure. The pattern decomposition method for decomposing a target pattern which includes first patterns having repeated lines and spaces and second patterns disposed between the first patterns and having a predetermined size into patterns for first... Agent: Marshall, Gerstein & Borun LLP
20080020325 - Positive and negative dual function magnetic resist lithography: The present invention discloses a positive and negative dual function magnetic resist lithography method. At first, a substrate coated with a positive and negative dual function magnetic resist layer is provided. The positive and negative dual function magnetic resist layer comprises a manganese(Mn)-containing precursor and at least one hydrophilic polymer.... Agent: Wpat, PC
20080020327 - Method of formation of a damascene structure: A method in which during the formation of damascene features in a semiconductor structure, a planarization material is added to vias formed in the dielectric to protect the vias during subsequent lithographic processing. The planarization material preferred is a developable photosensitive material which can be exposed and developed to define... Agent: International Business Machines Corporation Dept. 18g
20080020328 - Method for forming micropattern: The present invention provides a method for forming a micropattern, enabling to narrow intervals between resist patterns, in which the narrowing extent of intervals between resist patterns can be increased while maintaining the controllability of resist pattern dimensions and the good resist pattern shape within a wafer face. The present... Agent: Thelen Reid Brown Raysman & Steiner LLP
20080020329 - Method for fabricating semiconductor device and exposure mask: The method for fabricating the semiconductor device includes the step of forming a photoresist film 84 over a substrate 10, the step of exposing interconnection patterns to the photoresist film 84, the step of exposing to the photoresist film 84 hole patterns of a plurality of holes positioned at ends... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20080020330 - Method for developing a photoresist: A method for developing a photoresist includes applying a first developer to the photoresist to remove non-cross-linked areas of the photoresist, and applying a second developer to the photoresist to remove remaining non-cross-linked areas of the photoresist, wherein the first developer and the second developer differ in their compositions.... Agent: Slater & Matsil LLP
20080020331 - Direct thermographic materials with crosslinked carrier layer: A coating composition comprising a single-phase mixture of first and second polymers that are different polymers.... Agent: Susan L. Parulski Patent Legal Staff
20080020332 - Device, system and method for operating a digital radiograph: A handheld radiographic device is provided, the device may include an X-ray detector adapted to provide a digital radiographic frame of a dynamic image of an object under investigation, a position determination subsystem adapted to provide position data associated with a digital radiographic frame and an image processing controller adapted... Agent: Empk & Shiloh, LLP01/17/2008 > patent applications in patent subcategories. USPTO class listing
20080014508 - Lithographic apparatus and device manufacturing method: A reticle gripper to hold a reticle of a lithographic apparatus is presented. The reticle gripper includes three gripper structures to contact the surface of the reticle. Each of the three gripper structures determines a position with respect to the reticle gripper of one of the points on the surface... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20080014511 - Photomask with overlay mark and method of fabricating semiconductor device: Provided are a photomask and a method of fabricating a semiconductor device. The photomask includes a photomask substrate including a chip region and a scribe lane region, with an overlay mark formed in the scribe lane region. The overlay mark includes one or more sub-overlay marks. Each of the sub-overlay... Agent: Marger Johnson & Mccollom, P.C.
20080014512 - Method of fabricating color filter substrate: A method of fabricating a color filter substrate is provided. First, several color filter patterns are formed on a substrate. Then, an opaque layer is formed over the substrate and the color filter patterns. After that, the opaque layer is patterned to form a black matrix between the color filter... Agent: J C Patents, Inc.
20080014514 - Developer, developing device, image forming apparatus, and image forming method: A developer which contains a toner manufactured in a wet method and a carrier, forms an image which has enhanced image density, image reproducibility, etc., and prevents image defects such as fog from being generated. As the toner manufactured in the wet method, there is used a toner which is... Agent: Nixon & Vanderhye, PC
20080014515 - Organic photoreceptor and electrophotographic image forming apparatus including the organic photoreceptor: An organic photoreceptor and an electrophotographic image forming apparatus provided including the organic photoreceptor, wherein the organic photoreceptor has the shortage of a conventional single-layered type photoreceptor and has higher photosensitivity and good repetition stability. The photoreceptor has a photosensitive layer on an electrically conductive substrate where the photosensitive layer... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.
20080014516 - Silanol containing photoconductors: A photoconductor containing an optional supporting substrate, a photogenerating layer, and at least one silanol containing charge transport layer.... Agent: Patent Documentation Center
20080014517 - Silanol containing photoconductors: A photoconductor containing an optional supporting substrate, a silanol containing photogenerating layer, and at least one charge transport layer.... Agent: Patent Documentation Center
20080014519 - Organic photoreceptor and electrophotographic image forming apparatus including the photoreptor: An organic photoreceptor and an electrophotographic image forming apparatus including the organic photoreceptor are provided. The organic photoreceptor has the same advantage as a conventional laminated photoreceptor but improved electric properties such as higher photosensitivity and lower exposure potential.... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.
20080014520 - Organic photoreceptor for short wavelengths and electrophotographic imaging forming apparatus employing the organic photoreceptor: An organic photoreceptor and an electrophotographic image forming apparatus employing the organic photoreceptor are provided, where the organic photoreceptor has high photosensitivity with respect to light radiation at short wavelengths and low exposure potential. Specifically, an organic photoreceptor for short wavelengths having a photosensitive layer including a naphthalene tetracarboxylic acid... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.
20080014509 - Method for improved manufacturability and patterning of sub-wavelength contact hole mask: A method of applying optical proximity correction features to a mask having a target pattern comprising a plurality of features to be imaged. The method includes the steps of defining a set of process parameters to be utilized to image the mask; determining an interference map based on the process... Agent: Mcdermott Will & Emery LLP
20080014510 - Photomask designing apparatus, photomask, photomask designing method, photomask designing program and computer-readable storage medium on which the photomask designing program is stored: A photomask designing apparatus designs a photomask provided with a light transmission region through which exposure light with a predetermined wavelength transmits, a semi-transmission region having an optical characteristic of 180-degree phase shift and a light shielding region shielding exposure light. The semi-transmission region has a width set so as... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20080014513 - Coated substrates and method of coating: Disclosed herein is a xerographic print comprising a substrate with a toner-based image printed thereon, the printed substrate including low surface tension portions having a surface tension of no more than about 22 mN/m at 25 Deg. C. resulting in a surface tension gradient field on the substrate, the printed... Agent: Diane F. Covello Alix, Yale & Ristas, LLP
20080014518 - Process for preparing photosensitive outer layer: The presently disclosed embodiments are directed to an improved overcoat for an imaging member having a substrate, a charge transport layer, and an overcoat positioned on the charge transport layer, and a process for making the same including combining a resin having a reactive group selected from the group consisting... Agent: Pillsbury Winthrop Shaw Pittman LLP
20080014521 - Toner and method of manufacturing the same: There is provided a toner which can be manufactured in a simple production method and which is excellent in preservation stability and anti-offset property with uniformly-charging performance. The toner is formed of aggregate of resin-containing particles which are obtained by forming amorphous resin particles into slurry and further finely granulating... Agent: Nixon & Vanderhye, PC
20080014522 - Process for producing toner, and toner: A process for producing a toner by subjecting a polymer and a resin component containing a cross-linkable polymer capable of cross-linkingly reacting with the polymer, to cross-linking reaction in the presence of a first wax to form a wax-containing cross-linked polymer composition; mixing the wax-containing cross-linked polymer composition with at... Agent: Fitzpatrick Cella Harper & Scinto
20080014523 - Toner: p
20080014524 - Developing agent and image forming method: The invention defines an adhesive force characteristic of a toner, which makes it possible to control behaviors of toner particles by applying an electric field, and defines, when an amount of charges before transfer per weight of the toner particles is Q (μC/g), an average adhesive force of the toner... Agent: Amin, Turocy & Calvin, LLP
20080014525 - Method of applying spot varnish to xerographic image and emulsion aggregation toners for use therein: A method of forming a xerographic image having at least one portion with a gloss different from a gloss of another portion of the xerographic image includes xerographically forming a toner image on a surface of a substrate and forming a finish over the toner image at the at least... Agent: Oliff & Berridge, PLC.
20080014526 - Liquid developer and image forming apparatus: A liquid developer having superior fixing characteristic of toner particles to a recording medium and which is harmless to the environment, and an image forming apparatus using the liquid developer are provided. The liquid developer is comprised of an insulation liquid and toner particles dispersed in the insulation liquid, wherein... Agent: Hogan & Hartson L.L.P.
20080014527 - Toner, developer, toner container, process cartridge, image forming apparatus, and image forming method: To provide a toner that can provide long-term removability and high-definition images with reduced image layer thickness and densely-packed toner particles, a developer capable of forming high-quality images using the toner, a toner container for containing the toner, a process cartridge using the toner, an image forming apparatus using the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20080014528 - Metal compositions, thermal imaging donors and patterned multilayer compositions derived therefrom: The invention provides metal compositions, including silver compositions, and thermal imaging donors prepared with the compositions. The donors are useful for thermal transfer patterning of a metal layers and optionally, a corresponding proximate portion of an additional transfer layer onto a thermal imaging receiver. The compositions are useful for dry... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center
20080014529 - Antireflective coating compositions: Antireflective coating compositions with reduced outgassing are disclosed.... Agent: Az Electronic Materials Usa Corp. Attention: Industrial Property Dept.
20080014530 - Graft pattern-forming method, graft pattern material, lithography method, conductive pattern - forming method, conductive pattern, color filter producing method, color filter, and mircrolens producing method: An object of the present invention is to provide a graft pattern-forming method giving a graft pattern allowing formation of a high-resolution pattern that has an oil- and water-repellent region in a commonly-used exposure machine, a lithography method of using the oil- and water-repellent graft pattern formed by the method... Agent: Sughrue Mion, PLLC
20080014531 - Radiation-hardened programmable device: A method of programming a radiation-hardened integrated circuit includes the steps of supplying a prototype device including an SRAM memory circuit or programmable key circuit to a customer, having the customer develop working data patterns in the field in the same manner as a reading and writing to a normal... Agent: Hogan & Hartson LLP
20080014532 - Laminate body, and method for manufacturing thin substrate using the laminate body: Provided is a laminated body comprising a substrate to be ground and a support, where the substrate may be ground to a very small (thin) thickness and can then be separated from the support without damaging the substrate. One embodiment is a laminated body comprising a substrate to be ground,... Agent: 3m Innovative Properties Company
20080014533 - Semiconductor device fabrication and dry develop process suitable for critical dimension tunability and profile control: The critical dimension (CD) of features formed during the fabrication of a semiconductor device may be controlled through the use of a dry develop chemistry comprising O2, SO2 and a hydrogen halide. For example, a dry develop chemistry comprising a gas comprising O2 and a gas comprising SO2 and a... Agent: Trask Britt, P.C./ Micron Technology
20080014535 - Method for detecting defects which originate from chemical solution and method of manufacturing semiconductor device: A method for detecting defects which originate from a chemical solution includes coating a chemical solution on a surface of a mask, and radiating an exposure beam to the mask on which the chemical solution is coated, thereby performing enlarged projection exposure on a resist film which is formed on... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20080014534 - Microphotonic maskless lithography: A maskless lithography system and method to expose a pattern on a wafer by propagating a photon beam through a waveguide on a substrate in a plane parallel to a top surface of the wafer.... Agent: Goodwin Procter LLP Patent Administrator
20080014536 - Colorant-containing curable composition, color filter using the composition, and method for manufacturing the same: In Formula (I), R1 and R2 each independently represent H, an alkyl group, an alkenyl group, an aryl group, or an aralkyl group. R1 and R2 may be formed into a heterocycle together with a jointly bonded nitrogen atom. R3 represents a halogen atom, a trihalomethyl group, an alkoxy group,... Agent: Sughrue Mion, PLLC01/10/2008 > patent applications in patent subcategories. USPTO class listing
20080008940 - Glass mask used for patterning and manufacturing method and apparatus therefor: A glass mask used for patterning includes a plurality of glass plates superposed on one after another and a pattern formation layer formed on at least one of the glass plates. This structure makes it possible to suppress degradation in patterning precision due to warping of a photomask.... Agent: Staas & Halsey LLP
20080008943 - Ink composition, inkjet recording method, printed material, method of producing planographic printing plate, and planographic printing plate: The present invention provides an ink composition comprising a compound having a fragment containing a cyclic ether group having at least one bicyclo or tricyclic substituent.... Agent: Sughrue Mion, PLLC
20080008944 - Toner for electrostatic image development, electrostatic image developer and image forming method using the same: The invention provides a toner for electrostatic image development having at least a binder resin and a colorant and having an existence ratio of an IA Group element, from which hydrogen is excluded, measured by XPS (X-ray Photoelectron Spectroscopy) in a range of about 0.03 to 1.0 atom % and... Agent: Oliff & Berridge, PLC
20080008945 - Toner, toner producing method and image forming method: A toner is disclosed. The toner comprises a vinyl resin, a colorant, and a compound represented by a formula of Compound 1, Compound 2 ion or Compound 3.... Agent: Lucas & Mercanti, LLP
20080008946 - Image forming apparatus and recording medium: t
20080008947 - Electrophotographic imaging member undercoat layers: An imaging member includes a substrate; a charge generation layer positioned on the substrate; at least one charge transport layer positioned on the charge generation layer; and an undercoat layer positioned on the substrate on a side opposite the charge generation layer, the undercoat layer comprising a binder component and... Agent: Marylou J. Lavoie, Esq. LLC
20080008950 - Electrophotographic imaging member undercoat layers: An imaging member including a substrate; a charge generation layer positioned on the substrate; at least one charge transport layer positioned on the charge generation layer; and an undercoat layer positioned on the substrate on a side opposite the charge generation layer, the undercoat layer comprising a thiophosphate, and optionally... Agent: Marylou J. Lavoie, Esq. LLC
20080008948 - Imaging members and method for sensitizing a charge generation layer of an imaging member: An imaging member including a substrate; thereover a charge generation layer comprising a thiophosphate; and at least one charge transport layer positioned on the charge generation layer.... Agent: Marylou J. Lavoie, Esq. LLC
20080008949 - Imaging members and method for sensitizing a charge generation layer of an imaging member: An imaging member including a substrate; an optional undercoat layer situated on the substrate; an optional adhesive layer situated on the substrate or on the optional blocking layer; a charge generation layer situated on the substrate, on the optional undercoat layer, or on the adhesive layer, the charge generation layer... Agent: Marylou J. Lavoie, Esq. LLC
20080008951 - Imaging members and method for sensitizing a charge generation layer of an imaging member: An imaging member including a substrate; an optional undercoat layer; a charge generating layer comprising photoconductive pigment and a pigment sensitizing dopant having an electron acceptor molecule; and a charge transport layer.... Agent: Marylou J. Lavoie, Esq. LLC
20080008952 - Organophotoreceptor and electrophotographic imaging apparatus including the organophotoreceptor: An organophotoreceptor and an electrophotographic imaging apparatus including the organophotoreceptor are provided. The organophotoreceptor provides an excellent image quality by preventing an optical fatigue and a thermal fatigue occurring when repeatedly used. The organophotoreceptor includes a conductive support, an undercoat comprising a metal oxide and antioxidant dispersed in a binder,... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.
20080008939 - Deposition of photosensitive media for digital hologram recording: Hologram production devices can include holographic recording material deposition systems to deposit holographic recording material as needed by the hologram production device. Various nozzles, ink jets, and similar devices can be used to deposit one or more components of the holographic recording material on to an appropriate substrate. If needed,... Agent: Campbell Stephenson LLP
20080008941 - Photomask and method of manufacturing semiconductor device using the photomask: A photomask includes a mask substrate to be irradiated with irradiation light, and first and second phase shifters arranged on the mask substrate. The first phase shifter is arranged on the mask substrate with a first pitch not larger than eight times the wavelength of the irradiation light, has a... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20080008942 - Prevention of photoresist scumming: A photo acid generator (PAG) or an acid is used to reduce resist scumming and footing. Diffusion of acid from photoresist into neighbors causes a decreased acid level, and thus causes resist scumming. An increased acid layer beneath the resist prevents acid diffusion. In one embodiment, the increased acid layer... Agent: Knobbe Martens Olson & Bear LLP
20080008953 - Liquid developer and image forming apparatus using the same: p
20080008955 - Graded spin-on organic antireflective coating for photolithography: An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.... Agent: Connolly Bove Lodge & Hutz LLP (for IBM Yorktown)
20080008954 - High silicon-content thin film thermosets: High silicon-content resin composition that can be used to form thin film thermosets, useful in forming low k dielectric constant materials and as well as hard mask materials with anti-reflective properties for the photolithography industry are disclosed.... Agent: Alan P. Kass Az Electronic Materials Usa Corp.
20080008957 - Negative-working radiation-sensitive compositions and imageable elements: A radiation-sensitive composition includes a radically polymerizable component and an initiator composition capable of generating radicals sufficient to initiate polymerization of the radically polymerizable component upon exposure to imaging radiation. This composition also includes a radiation absorbing compound, a polymeric binder having poly(alkylene glycol) side chains, and a nonionic phosphate... Agent: Paul A. Leipold, Patent Legal Staff Eastman Kodak Company
20080008962 - Polymerizable ester compounds, polymers, resist compositions and patterning process: Novel polymerizable ester compounds having formulae (1) to (4) undergo no acid-induced decomposition by β-elimination wherein A1 is a polymerizable functional group having a carbon-carbon double bond, R1 is H or —C—(R5)3, R2 and R3 are alkyl, R4 is H or alkyl, R5 is a monovalent hydrocarbon group, X is... Agent: Birch Stewart Kolasch & Birch
20080008959 - Positive resist compositions and patterning process: In a positive resist composition comprising (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) a photoacid generator, component (A) is a polymer of formula (1) wherein R1 is H, methyl or trifluoromethyl, R2 and R3 are alkyl, R4 is... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20080008960 - Positive resist compositions and patterning process: In a positive resist composition comprising (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) a photoacid generator, component (A) is a polymer of formula (1) wherein R1 is H, methyl or trifluoromethyl, R2 and R3 are alkyl, R4 is... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20080008961 - Positive resist compositions and patterning process: A positive resist composition is provided comprising (A) a resin component having a carboxylic acid moiety protected with an acetal protective group which is decomposable under the action of an acid, wherein in the carboxylic acid moiety protected with an acetal protective group, deprotection occurs not by way of β-elimination,... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20080008956 - Positive-working imageable members with branched hydroxystyrene polymers: Both single-layer and multi-layer positive-working imageable compositions can be used in positive-working elements having a substrate and at least one imageable layer. These elements can be used to prepare lithographic printing plates. The imageable elements include a radiation absorbing compound and a hydroxystyrene polymer having repeating branched hydroxystyrene units.... Agent: Paul A. Leipold Eastman Kodak Company
20080008963 - Reversible heat-sensitive recording medium and method of recording an image using the heat-sensitive recording medium: A reversible heat-sensitive recording medium is provided, which includes a heat-sensitive portion, and a light-transmitting heat-insulating layer disposed to contact the heat-sensitive portion. The heat-sensitive portion contains a light-heat conversion material and a heat-sensitive reversible layer. The light-heat conversion material is enabled to absorb light having a specific wavelength and... Agent: Harness, Dickey & Pierce, P.L.C
20080008958 - Signing film: There is described a signing film wherein provided on a background of the signing film is a decorative printing which forms a security feature and which fluoresces when viewed under UV light. So that the decorative printing which fluoresces under UV light is not to be perceived when viewing the... Agent: Hoffmann & Baron, LLP
20080008964 - Light emitting diode and method of fabricating a nano/micro structure: A method of fabricating a nano/micro structure comprising the following steps is provided. First, a film is provided and then a mixed material comprising a plurality of particles and a filler among the particles is formed on the film. Next, the particles are removed by the etching process, the solvent... Agent: Jianq Chyun Intellectual Property Office
20080008965 - Ester compounds and their preparation, polymers, resist compositions and patterning process: Novel ester compounds having formulae (1) to (4) wherein A1 is a polymerizable functional group having a carbon-carbon double bond, A2 is oxygen, methylene or ethylene, R1 is a monovalent hydrocarbon group, R2 is H or a monovalent hydrocarbon group, any pair of R1 and/or R2 may form an aliphatic... Agent: Birch Stewart Kolasch & Birch
20080008966 - Ink composition, inkjet recording method, printed material, and process for producing lithographic printing plate: (In Formula (I) and Formula (II), R1 denotes a hydrogen atom, a halogen atom, or an alkyl group having 1 to 4 carbons, X1 denotes a divalent linking group, R2 and R3 independently denote a substituent, k denotes an integer of 1 to 6, q and r independently denote an... Agent: Sughrue Mion, PLLC
20080008968 - Coating method for non-destructive examination of articles of manufacture: A method for non-destructive evaluation of an article of manufacture (30) by coating the article with a temperature-sensitive coating (34), stimulating the article with energy (18) to induce temperature changes in the article responsive to features of the article, then evaluating (24) a resulting topography of energy-induced changes (50, 52,... Agent: Siemens Corporation Intellectual Property Department
20080008967 - Utilization of electric field with isotropic development in photolithography: Photolithography processing methods by which a photoresist layer is deposited, a portion of the photoresist layer is exposed to electromagnetic radiation to transfer a reticle pattern thereto, and the exposed portion of the photoresist layer is treated with thermal energy while being subjected to an electric field, wherein the electric... Agent: Haynes And Boone, LLP
20080008969 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same: A method for patterning a layer increases the density of features formed over an initial patterning layer using a series of self-aligned spacers. A layer to be etched is provided, then an initial sacrificial patterning layer, for example formed using optical lithography, is formed over the layer to be etched.... Agent: Micron Technology, Inc.
20080008970 - Lithographic process: In a lithographic process for producing microstructures by means of a direct-write system, predefined areas are exposed by means of a focused beam, particularly a laser beam, in order to produce microstructures. This process is to be further developed such that structures can be produced which are smaller than the... Agent: Crowell & Moring LLP Intellectual Property Group
20080008971 - Cationic photopolymerizable epoxy resin composition, minute structural member using the same and method for manufacturing minute structural member: A cationic photopolymerizable epoxy resin composition includes an epoxy resin, a cationic photopolymerization initiator, an inhibitor of cationic polymerization and a compound that has a fluoroalkyl group and also has a substituent at its terminal, with the substituent being allowed to cross-link react with the epoxy group of the epoxy... Agent: Fitzpatrick Cella Harper & Scinto
20080008972 - Method for automatically generating at least one of a mask layout and an illumination pixel pattern of an imaging system: A method and device can be used for automatically generating at least one of a mask layout and an illumination pixel pattern of an imaging system in a process for the manufacturing of a semiconductor device. The mask layout is subdivided into a multitude of discrete tiles. A first dataset... Agent: Slater & Matsil, L.L.P.
20080008973 - Substrate processing method and substrate processing apparatus: The invention provides a method capable of preventing the occurrence of collapse of resist pattern accompanied by size reduction in pattern dimensions can be prevented when processing a resist film having been exposed and formed on the surface of a substrate, and in which there is no fear that posterior... Agent: Ostrolenk Faber Gerb & SoffenPrevious industry: Chemistry: electrical current producing apparatus, product, and process
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