Radiation imagery chemistry: process, composition, or product thereof inventions 12/07

20070298332 - Exposure mask and method for manufacturing semiconductor device using the same: An exposure mask of a semiconductor device comprises a substrate. Recesses are etched on a surface of the substrate to change a refractive index of an incident light. The changed refractive index causes a diffraction angle of the incident light to increase or decrease. As a result of the change... Agent: Townsend And Townsend And Crew, LLP

20070298331 - Gas filling apparatus for photomask box: A gas filling apparatus used to fill a photomask box with gas such as nitrogen or other inert gas. The gas filing apparatus of the present invention has a gas filling chamber provided with a plurality of first pillared elements, a plurality of second pillared elements, at least one gas... Agent: Reed Smith LLP

20070298329 - Photomask and method for using the same: The invention is directed to a photomask for a photolithography process. The photomask comprises a substrate, at least one image region and a plurality of alignment marks. The image regions are located on the substrate and at least an image center of one of the image regions non-overlap with a... Agent: Jianq Chyun Intellectual Property Office

20070298330 - Recticle pattern applied to mix-and-match lithography process and alignment method of thereof: A recticle pattern applied to a mix-and-match lithography process is described. The recticle has a transparent region and a non-transparent region. The transparent region includes a device region and a scribe line region. The recticle pattern includes a plurality of device patterns, a portion of a first and a second... Agent: Jianq Chyun Intellectual Property Office

20070298334 - Method of fabricating periodic domain inversion structure: Providing a fabrication method of a periodic domain inversion structure. A nonlinear optical ferroelectric material substrate is provided. A photoresist layer is formed on the upper and the lower surface of the substrate, and periodic gratings formed by interference of two laser beams are employed to expose the photoresist layer... Agent: Jianq Chyun Intellectual Property Office

20070298336 - Carrier coating: A carrier coating that may be used to coat carrier particles, including a specific additive that imparts the coating with superior storage stability and wherein the carrier coating includes an acrylic-based polymeric powder obtained from an emulsion of an acrylic-based polymer, a surfactant, a cationic initiator, and a conductive filler.... Agent: Pillsbury Winthrop Shaw Pittman LLP

20070298338 - Image forming method: An electrophotographic image forming method is disclosed. In the method electrostatic latent image is developed by a non-magnetic single-component developing system, in which a non-magnetic single-component developer is conveyed by a developer carrying member, the developer carrying member is contacted with a developer layer regulation member for regulating an amount... Agent: Lucas & Mercanti, LLP

20070298339 - Electrophotographic carrier, method of manufacturing the same, and image forming method employing the same: An objective is to provide a highly durable carrier for a developer which is capable of forming a high-definition image stably with no deterioration of a developing property since the carrier resistance and the charging ability remain stable even though the developer is used for a long duration; a method... Agent: Lucas & Mercanti, LLP

20070298342 - Titanyl phthalocyanine photoconductors: wherein X and Y are each independently alkyl, alkoxy, aryl, a halogen, and wherein the photogenerating layer contains a titanyl phthalocyanine prepared by dissolving a Type I titanyl phthalocyanine in a solution comprising a trihaloacetic acid and an alkylene halide; adding the mixture comprising the dissolved Type I titanyl phthalocyanine... Agent: Patent Documentation Center

20070298340 - Imaging member having nano-sized phase separation in various layers: Imaging members useful in electrostatographic apparatuses, including printers, copiers, other reproductive devices, and digital apparatuses. More particularly, imaging members having nano-sized particles serving as fillers dispersed or contained in one or more layers of the imaging member that provide for increased mechanical strength and improved wear.... Agent: Pillsbury Winthrop Shaw Pittman LLP

20070298341 - Titanyl phthalocyanine photoconductors: A photoconductor containing an optional supporting substrate, a photogenerating layer, and at least one charge transport layer, and wherein the photogenerating layer contains a titanyl phthalocyanine prepared, for example, by dissolving a Type I titanyl phthalocyanine in a solution comprising a trihaloacetic acid and an alkylene halide; adding the mixture... Agent: Patent Documentation Center

20070298327 - Method for manufacturing laser hologram paper: A method for manufacturing water-based laser hologram papers has acts of entirely or partially coating water-based varnish on a printed paper substrate, subjecting the paper substrate to a mirror treatment, and entirely or partially molding the paper substrate with laser compressing operations. By substituting PVC or PET plastic membranes with... Agent: Rosenberg, Klein & Lee

20070298328 - Novel resist material and method for forming a patterned resist layer on a substrate: A method for the formation of a patterned resist layer on a substrate surface by patternwise irradiation with actinic radiation. The first step of the method is formation of a coating layer comprising a substituted triphenylene compound having a diameter of between 1 and 3 nm, a sensitizer which increases... Agent: Allen Bloom C/o Dechert

20070298333 - Manufacturing process of an organic mask for microelectronic industry: A process for manufacturing an organic mask for the microelectronics industry, including forming an organic layer on a substrate; forming an inorganic mask on the organic layer; and etching selectively the organic layer through the inorganic mask. Furthermore, forming the inorganic mask includes forming at least a first auxiliary layer... Agent: Stmicroelectronics Inc. C/o Wolf, Greenfield & Sacks, P.C.

20070298335 - Exposure condition setting method, substrate processing device, and computer program: A method includes forming a resist film on an etching target layer disposed on a test substrate, and performing sequential light exposure with a predetermined test pattern on the resist film sequentially at a plurality of areas, while respectively using different combinations of a light exposure amount and a focus... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20070298337 - Microcapsules and processes for producing the same: A microcapsule is produced by dispersing a liquid organic dispersion in an aqueous medium to form a capsule particle in the aqueous medium, the liquid organic dispersion containing an acid group-containing resin, a colored particle and an organic solvent, and the capsule particle comprising a disperse system containing the liquid... Agent: Birch Stewart Kolasch & Birch

20070298343 - Toner: The invention relates to a developer for developing electrostatic images. The developer includes magnetic carrier particles at a loading of from 60 to 99 weight percent of the developer. Toner particles are at a loading of 1 to 40 weight percent of the developer. The toner particles include a resin... Agent: Paul A. Leipold Patent Legal Staff

20070298344 - Process for producing toner for electrostatic charge image development toner for electrostatic charge image development: To provide a process for efficiently producing a toner for developing an electrostatic charge image, which is scarcely susceptible to aggregation of the toner and free from blocking during the storage or from soiling the image forming apparatus and which is excellent in image characteristics. A process for producing a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20070298345 - Method of preparing toner and toner prepared using the method: A method of preparing toner and a toner using the method is provided. More particularly, a method of preparing toner controls a shape of finally obtained toner particles by adjusting a molecular weight and Tg of polymer latex and can easily obtain a desired size, shape, and size distribution of... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.

20070298346 - Toner particles of controlled morphology: A method for the preparation of electrostatographic toner comprising the steps of: a) dissolving a polymer material and a quaternary ammonium tetraphenylborate salt in an organic solvent to form an organic phase; b) dispersing the organic phase in an aqueous phase comprising a particulate stabilizer to form a dispersion and... Agent: Paul A. Leipold Patent Legal Staff

20070298347 - Liquid developer: A liquid developer composition for electrophotography is disclosed which comprises a pigment, an acrylic-based thermoplastic resin, an electric insulating solvent and a dispersant, the acrylic-based thermoplastic resin having a degree of swelling of less than 0.5 g against the electric insulating solvent, the dispersant comprising at least one of modified... Agent: Ware Fressola Van Der Sluys & Adolphson, LLP

20070298348 - Silver halide color photographic light-sensitive material and image forming method: A silver halide color photographic light-sensitive material having, on a support, at least each one light-sensitive silver halide emulsion layers containing yellow-, magenta-, or cyan-dye-forming-coupler, and at least one light-insensitive hydrophilic colloid layer, wherein at least one of the dye-forming couplers is a dye-forming coupler that forms an azomethine dye... Agent: Sughrue Mion, PLLC

20070298349 - Antireflective coating compositions comprising siloxane polymer: where m is 0 or 1, W and W′ are independently a valence bond or a connecting group linking the cyclic ether to the silicon of the polymer and L is selected from hydrogen, W′ and W, or L and W′ are combined to comprise a cycloaliphatic linking group linking... Agent: Sangya Jain Az Electronic Materials Usa Corp.

20070298350 - Method and apparatus for development of lithographic printing plate precursor: To provide a development system for lithographic printing plate precursors using a neutral developer, capable of preventing the non-image area of the resulting printing plates from being stained. In developing a lithographic printing plate precursor with a neutral developer having a pH of from 5.8 to 8.6, ultrasonic waves and/or... Agent: Eastman Kodak Company Patent Legal Staff

20070298351 - Image recording material, planographic printing plate precursor, and planographic printing method using the same: The invention provides: an image recording material comprising a support having provided thereon in this order an image recording layer containing a binder polymer (A), a compound having a polymerizable unsaturated group (B), and a polymerization initiator (C), and a layer containing a hydrophilic polymer and a compound having within... Agent: Sughrue Mion, PLLC

20070298352 - Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process: Sulfonate salts have the formula: HOCH2CH2CF2CF2SO3−M+ wherein M+ is a Li, Na, K, ammonium or tetramethylammonium ion. Onium salts, oxime sulfonates and sulfonyloxyimides derived from these salts are effective photoacid generators in chemically amplified resist compositions.... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070298353 - Pattern forming method and method for manufacturing semiconductor device: Double exposure is performed by using a pair of photomasks, an attenuated phase shift mask or the like which is not an alternating phase shift mask, and a pattern is transferred onto a photoresist. Here, on the occasion of performing exposure with the photomask for forming a finer pattern, double... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070298354 - Carbon coating on an implantable device: A carbon coating on a stent having a bioactive agent covalently attached thereto and methods of making the same are described.... Agent: Squire, Sanders & Dempsey LLP

20070298355 - Resist top coat composition and patterning process: There is disclosed a resist top coat composition, comprising at least a polymer that has an amino group or a sulfonamide group at a polymer end and that is represented by the following general formula (1); and a patterning process comprising: at least, a step of forming a photoresist film... Agent: Oliff & Berridge, PLC

20070292768 - Photoacid generators, chemically amplified resist compositions, and patterning process: A photoacid generator has formula (1). A chemically amplified resist composition comprising the photoacid generator has advantages including a high resolution, focus latitude, long-term PED dimensional stability, and a satisfactory pattern profile shape. When the photoacid generator is combined with a resin having acid labile groups other than those of... Agent: Birch Stewart Kolasch & Birch

20070292771 - Method and system for optimizing intra-field critical dimension uniformity using a sacrificial twin mask: Disclosed is a method and a system for optimizing intra-field critical dimension of an integrated circuit. A first mask for an integrated circuit is provided comprising at least one device region. A second mask is provided by copying the first mask and a lithography operation is provided to the integrated... Agent: Haynes And Boone, LLP

20070292773 - Nano imprint master and method of manufacturing the same: A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form... Agent: Sughrue Mion, PLLC

20070292775 - Pellicle: A pellicle is provided that includes an aluminum alloy pellicle frame having a polymer coating on the surface and a pellicle film stretched over the pellicle frame. There is also provided a process for producing the pellicle in which the polymer coating is an electrodeposition-coated film, the process including a... Agent: Armstrong, Kratz, Quintos, Hanson & Brooks, LLP

20070292770 - Photolithographic method and apparatus employing a polychromatic mask: A photolithographic method and associated apparatus are provided that permit three-dimensional structures to be defined in a photoresist coating in such a manner that multi-level structures can be formed which have constant width at different depths within the photoresist coating. The photolithographic method and apparatus may permit such three-dimensional structures... Agent: Alston & Bird, LLP

20070292776 - Overlay vernier key and method for forming contact holes of semiconductor device using the same: A substrate includes an overlay vernier key structure that includes an outer pattern formed over one layer over a semiconductor substrate, as a reference for an overlay measurement, and an inner pattern comprising a cluster of vernier patterns formed over another layer. The vernier patterns have a dimension and a... Agent: Townsend And Townsend And Crew, LLP

20070292777 - Method and apparatus for determining whether a sub-resolution assist feature will print: One embodiment of the present invention provides a system that determines whether a sub-resolution assist feature will print. During operation, the system receives a layout which contains a sub-resolution assist feature. Next, the system determines whether the sub-resolution assist feature will print using a process model and the layout. The... Agent: Pvf -- Synopsys, Inc C/o Park, Vaughan & Fleming LLP

20070292778 - Methods of measuring critical dimensions and related devices: A method of measuring a critical dimension may include forming an object pattern on a substrate and forming a plurality of reference patterns on the substrate, wherein each of the plurality of reference patterns has a different critical dimension. An optical property of each of the plurality of reference patterns... Agent: Myers Bigel Sibley & Sajovec

20070292779 - Toner for developing electrostatic image and image formation process using it: (in the chemical formula (1), R1 and R3 are the same or different to each other and are an alkyl group having a straight chain or a branch chain of 3 to 8 carbons; R2a, R2b, R4a and R4b are the same or different to each other and are selected... Agent: Steptoe & Johnson LLP

20070292781 - Electrophotographic photoreceptor and image-forming apparatus using the same: An electrophotographic photoreceptor comprising a conductive support and a photosensitive layer formed on the conductive support and containing at least a charge generation material and a charge transport material, wherein a surface layer of the photoreceptor contains a polycarbonate copolymer having structural units represented by the following general formulas (1)... Agent: Nixon & Vanderhye, PC

20070292780 - Electrophotographic photoconductor, and image forming apparatus and process cartridge using the same: An electrophotographic photoconductor including: an outermost layer, wherein the outermost layer comprises an amino group-containing acryl-modified polyorganosiloxane, wherein the amino group-containing acryl-modified polyorganosiloxane is a copolymer in which a polyorganosiloxane represented by the following structural formula (1) and an acrylic monomer are graft-polymerized.... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20070292787 - Ether containing photoconductors:

20070292783 - Ether phosphate containing photoconductors:

20070292788 - Ether phosphate containing photoconductors: wherein R1, R2, R3 and R4 are independently selected from the group consisting of hydrogen, alkyl, aryl, alkoxy, substituted alkyl, substituted aryl, substituted alkoxy, and halogen, and the sum of n plus m (n+m) is from about 1 to about 10, and an optional antioxidant; and wherein a thiophosphate is... Agent: Patent Documentation Center

20070292789 - Polyphenyl ether containing photoconductors: e

20070292782 - Polyphenyl ether phosphate containing photoconductors:

20070292792 - Polyphenyl ether phosphate containing photoconductors:

20070292791 - Polyphenyl thioether containing photoconductors:

20070292785 - Polyphenyl thioether phosphate containing photoconductors:

20070292790 - Polyphenyl thioether phosphate containing photoconductors:

20070292784 - Thiophosphate containing photoconductors: An imaging member containing an optional supporting substrate, a photogenerating layer, and at least one charge transport layer, and wherein the at least one charge transport layer contains at least one thiophosphate.... Agent: Patent Documentation Center

20070292786 - Thiophosphate containing photoconductors: An imaging member containing an optional supporting substrate, a photogenerating layer and at least one charge transport layer, and wherein the at least one charge transport layer contains at least one thiophosphate, and wherein the thiophosphate is present in an amount of from about 0.005 to about 0.09 weight percent.... Agent: Patent Documentation Center

20070292793 - Thiophosphate containing photoconductors: An imaging member containing an optional supporting substrate, a photogenerating layer and at least one charge transport layer, and wherein said photogenerating layer contains at least one thiophosphate.... Agent: Patent Documentation Center

20070292794 - Imaging members and method for stabilizing a charge transport layer of an imaging member: A method for stabilizing a single-layer charge transport layer or a two-layer charge transport layer including a first charge transport layer and a second pass charge transport layer of an imaging member, wherein the charge transport layer or layers comprises a charge transport material, includes a) contacting surfactant, polytetrafluoroethylene particles... Agent: Marylou J. Lavoie, Esq. LLC

20070292795 - Blocked polyisocyanates incorporating planar electron-deficient tetracabonylbisimide moieties: The present invention is a photoconductive element containing an electrically conductive support, an electrical barrier layer disposed over said electrically conductive support and a charge generation layer capable of generating positive charge carriers when exposed to actinic radiation disposed over the barrier layer. The barrier layer is formed from a... Agent: Paul A. Leipold Patent Legal Staff

20070292796 - Monomeric glass mixtures incorporating tetracarbonylbisimide group: The present invention is a photoconductive element that includes an electrically conductive support, an electrical barrier layer disposed over said electrically conductive support, and disposed over said barrier layer, a charge generation layer capable of generating positive charge carriers when exposed to actinic radiation. The barrier layer includes a monomeric... Agent: Paul A. Leipold Patent Legal Staff

20070292797 - Imaging member having adjustable friction anticurl back coating: The presently disclosed embodiments are directed to anticurl back coatings useful in electrostatography. More particularly, the embodiments pertain to an electrophotographic imaging member with an improved anticurl back coating formulated by a polymer blend comprising two low surface energy polymeric materials that prevents curling, renders surface lubricity, eliminates electrostatic charge... Agent: Pillsbury Winthrop Shaw Pittman LLP

20070292767 - Underlayer coating forming composition for lithography containing cyclodextrin compound: There is provided an underlayer coating forming composition for lithography for forming an underlayer coating having a high dry etching rate compared with photoresist, causing no intermixing with the photoresist, and excellent in property of filling hole on the semiconductor substrate, which is used in lithography process of manufacture of... Agent: Oliff & Berridge, PLC

20070292774 - Method and system for optimizing intra-field critical dimension uniformity using a sacrificial twin mask: Disclosed is a method and a system for optimizing intra-field critical dimension of an integrated circuit. A first mask for an integrated circuit is provided comprising at least one device region. A second mask is provided by copying the first mask and a lithography operation is provided to the integrated... Agent: Haynes And Boone, LLP

20070292769 - Method of manufacturing photomask blank: An unnecessary film removal device, an unnecessary film removal method, and a method of manufacturing a photomask blank, the unnecessary film removal device wherein a shield member (cover member) is installed apart a specified distance from the surface of a substrate so that chemicals are not fed to the portions... Agent: Sughrue Mion, PLLC

20070292772 - Structure of a lithography mask: The invention relates to a reflection lithography mask comprising, on a substrate (S), a reflector coating (RC) and a stack comprised of an etching barrier layer and an absorbing layer, said stack covering only a part of the reflector coating. The absorbing layer is made solely of dielectric material and... Agent: Thelen Reid Brown Raysman & Steiner LLP

20070292798 - Curable composition and elastic roller therefrom: e

20070292799 - Encapsulated toner compositions incorporating organic monomeric glasses: The present invention is an electrostatographic core shell toner which includes as a core material of at least two nonpolymeric compounds each independently corresponding to the structure (R1Y1)p[(Z1Y2)mR2Y3]nZ2Y4R3. M is zero or one, n is zero up to an integer at which said compound starts to become a polymer and... Agent: Paul A. Leipold Patent Legal Staff

20070292800 - Reactive polymer particles and method of preparation: The present invention provides a method for the preparation of a UV curable electrostatographic toner. The process includes the steps of dispersing a polymeric material and a UV curable material and a UV photoinitiator in an organic solvent to form an organic phase. The organic phase is dispersed in an... Agent: Paul A. Leipold Patent Legal Staff

20070292801 - Thermal transfer receiving sheet: A thermal transfer receiving sheet comprising a sheet-form substrate and a receiving layer having as a main component thereof a dye-dyeable resin formed on at least one side of said sheet-form substrate; wherein the receiving layer contains cellulose acetate butyrate and polyester resin having a number average molecular weight up... Agent: Kratz, Quintos & Hanson, LLP

20070292803 - Optical recording medium and recording method thereof: An optical recording medium includes: a recording layer containing a photopolymerization initiator and a photopolymerization compound; and a pigment that generates light through a multiphoton absorption process.... Agent: Nixon & Vanderhye, PC

20070292802 - Positive photosenstive composition: There is provided a positive photosensitive composition which requires no burning, makes it possible to obtain necessary and sufficient adhesion when it is applied under a humidity of 25 to 60%, can be developed at a low alkali intensity, makes it possible to carry out development with keeping high sensitivity... Agent: Patrick H. Alley Squirrel Leap,

20070292805 - Alkali-developable photosensitive color composition: An alkali-developable photosensitive color composition containing a binder resin, a fluorine-containing copolymer, a photopolymerization initiator, a colorant, and a solvent. A photopolymerizable unsaturated compound is used as the binder resin. The photopolymerizable unsaturated compound is obtained by adding (B) an unsaturated monobasic acid to (A) a polyfunctional epoxy resin to... Agent: Young & Thompson

20070292804 - Photosensitive resin composition and photosensitive dry film by the use thereof: A photosensitive resin composition and a photosensitive dry film which are excellent in both sensitivity and stability and are well-balanced in tent strength, resolution and plating non-staining are provided. The photosensitive resin composition comprises an alkali-soluble resin (A), a photopolymerizable compound (B) and a photopolymerization initiator (C), and the polymerization... Agent: Thelen Reid Brown Raysman & Steiner LLP

20070292806 - Dynamic puddle developing process: A dynamic puddle developing process is disclosed. First, a semiconductor substrate having a photoresist disposed thereon is provided, in which the photoresist has been exposed. Next, a developer is disposed on the surface of the photoresist and a first static puddle process is performed to maintain the semiconductor substrate in... Agent: North America Intellectual Property Corporation

20070292807 - 3-d relief pattern blank and method of using: The 3-D relief pattern blank and method of using comprises the steps of using a cutting machine to cut a thin, retroreflective heat reflective sheet in a desired pattern. The thin, retroreflective heat reflective sheet is formed to provide a heat-retroreflective mask. Subsequently, the heat-retroreflective mask is transferred to a... Agent: Litman Law Offices, Ltd.

20070292808 - Developing solution composition for lithography and method for resist pattern formation: This invention provides a novel developing solution composition for lithography, which can efficiently reduce defects without varying the formulation of a resist composition per se and without sacrificing the quality of a resist pattern by the use thereof, and a novel method for resist pattern formation using the developing solution... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070292809 - Process for the production of double-layer heat-sensitive imageable elements: The invention relates to a process for the production of a heat-sensitive imageable element comprising: (a) providing a substrate, (b) applying a first coating solution, comprising at least one photothermal conversion material, at least one polymer A soluble or swellable in an aqueous alkaline developer and at least one solvent,... Agent: Eastman Kodak Company Patent Legal Staff

20070287074 - Controlled ambient reticle frame: Embodiments provide a system and a method to control the gas ambient in a reticle frame system. The reticle frame system can include a first cross structure including a pellicle, a second cross structure substantially parallel to the first cross structure, a first side structure, and a second side structure.... Agent: Texas Instruments Incorporated

20070287073 - Lithography systems and methods: Lithography systems and methods are disclosed. A preferred embodiment comprises a lithography system including a support for a substrate, a projection lens system, an illuminator adapted to direct light towards the support for the substrate through the projection lens system along an optical path, and at least one Fresnel element... Agent: Slater & Matsil LLP

20070287075 - Mask arrangement, optical projection system and method for obtaining grating parameters and absorption properties of a diffractive optical element: A mask arrangement or an optical projection system includes a diffractive optical element. The diffractive optical element includes grid sections having gratings with defined grating parameters and absorbing elements with defined absorption properties, wherein each grid section corresponds to a respective mask section with mask pattern elements. The diffractive optical... Agent: Edell, Shapiro & Finnan, LLC

20070287072 - Mask substrate depth adjustment to adjust for topography on surface: Methods of forming and using a mask having a mask substrate including a non-planar surface are disclosed. The non-planar surface includes at least one portion having a depth configured to compensate for topography on the surface of a semiconductor wafer.... Agent: Hoffman, Warnick & D'alessandro LLC

20070287076 - Multilayer mirror, evaluation method, exposure apparatus, device manufacturing method: A multilayer mirror used for EUV light includes a substrate, a reflection layer for reflecting the EUV light, a stress compensation layer, formed between the substrate and the reflection layer, for compensating a deformation of the substrate by the reflection layer, wherein the substrate has a first area, in which... Agent: Morgan & Finnegan, L.L.P.

20070287080 - Enhancement of inkjet-printed elements using photolithographic techniques: A method of manufacturing includes depositing a material on a surface of a substrate in a liquid form using an inkjet process, whereby the material dries in an initial shape on the substrate. A photolithographic process is applied using a mask that is separate from the substrate in order to... Agent: Sughrue Mion, PLLC

20070287079 - Light shading structure, and color filter substrate, active device array substrate, liquid crystal display panel thereof: A light shading structure suitable for being disposed on a substrate is provided, wherein the substrate has a display region and a non-display region. The light shading structure includes a black matrix layer and a light shading layer. The black matrix layer is disposed on the substrate and defines multiple... Agent: Jianq Chyun Intellectual Property Office

20070287084 - Light sensitive organic photoconductor: An electrophotoconductive element which may be irradiated with laser light having a wavelength (λ) of about 350-500 nm which contains titanylphthalocyanine (TiOPC), which may be polymorphic. The electrophotoconductive element may therefore include an electroconductive support, a charge generation layer containing TiOPC, a charge transport layer and a source of laser... Agent: Lexmark International, Inc. Intellectual Property Law Department

20070287085 - Electrophotographic photoreceptor, and process cartridge and image forming apparatus using the same: Disclosed is an electrophotographic photoreceptor. The electrophotographic photoreceptor includes an organic photoreception layer that is formed on a conductive base and includes at least polycarbonate. An outermost surface of the organic photoreception layer has been subjected to surface treatment using plasma of gas including hydrogen, or hydrogen and nitrogen.... Agent: Fildes & Outland, P.C.

20070287077 - Photomask and exposure method: To provide a photomask capable of preventing a foreign matter generation in using the photomask, and an exposure method using this photomask. The photomask includes a transparent substrate 2; a transfer pattern 4 formed in a main region 3 of a center portion of the transparent substrate 2; a light-shading... Agent: Sughrue Mion, PLLC

20070287078 - Reticle, semiconductor die and method of manufacturing semiconductor device: The invention is directed to increasing the number of semiconductor dice obtained from one semiconductor wafer and enhancing the reliability and yield of the semiconductor dice when the semiconductor dice as products and TEG dice are formed on the semiconductor wafer. TEG die pattern regions are respectively placed on the... Agent: Morrison & Foerster LLP

20070287081 - Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques: The present invention is directed towards a method for determining deformation parameters that a patterned device would undergo to minimize dimensional variations between a recorded pattern thereon and a reference pattern, the method including, inter alia, comparing spatial variation between features of the recorded pattern with respect to corresponding features... Agent: Molecular Imprints

20070287082 - Color correction method with transparent toner insignia images: A method for color correction of an image having an insignia portion in a multi-module printer (10). A first color profile is calibrated for a four-color image. A second color profile is calibrated for a four-color image with a transparent toner layer on top of the insignia portion of the... Agent: David A. Novais Patent Legal Staff

20070287083 - Electrophotographic photoreceptor and method of preparing the photoreceptor, and image forming apparatus, image forming method and process cartridge using the photoreceptor: An electrophotographic photoreceptor, including an electroconductive substrate; and a photosensitive layer, located overlying the electroconductive substrate, wherein an outermost layer of the electrophotographic photoreceptor includes an amine compound and a charge transport material, and wherein the amine compound includes an amine site having an electrostatic potential with a dimensionless unit... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20070287086 - Colored photosensitive resin composition, color filter, image sensor, and camera system: An object of the present invention is to provide a colored photosensitive resin composition which causes a small change in exposure in case of forming a pattern before and after storage. Disclosed is a colored photosensitive resin composition comprising a dye, a photo acid generator, a curing agent, and an... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070287087 - Colored photosensitive resin composition, color filter, image sensor, and camera system: in the formula (I), R1 to R3 each independently represents a hydrogen atom, a linear alkyl group having 1 to 6 carbon atoms, a branched alkyl group having 3 to 12 carbon atoms, a cycloalkyl group having 3 to 6 carbon atoms or an aryl group having 6 to 12... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070287088 - Bronsted acid compound, manufacturing method of condensation compound, dispersion liquid of condensation compound particles, manufacturing method of electrostatic image developing toner, manufacturing method of binder resin, binder resin, dispersion liqui:

20070287089 - Electrophotographic toner and image forming apparatus: In Formula (1), R1, R2, R3, and R4 each independently represent a hydrogen atom, an alkyl group or an aromatic group, and X− represents a molybdate anion or a tungstate anion. In Formula (2), R5+ and R6+ each independently represent a hydrogen ion, an ammonium ion, an iminium ion, or... Agent: Oliff & Berridge, PLC

20070287090 - Toner: A toner having a BET specific surface area of from 1.5 to 3.5 m2/g, obtainable by a process including the steps of; step (1): pulverizing a toner composition containing at least a resin binder and a colorant in the presence of fine inorganic particles having an average primary particle size... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20070287091 - System and method for exposing electronic substrates to uv light: A flash lamp exposure system for exposing a substrate to ultraviolet radiation. The system includes at least one flash lamp, each of which includes: at least one lamp for emitting ultraviolet radiation in response to a voltage; at least one first reflector, each first reflector being adapted to reflect the... Agent: Christie, Parker & Hale, LLP

20070287093 - Low refractive index composition comprising fluoropolyether urethane compound: Antireflective films and low refractive index compositions are described. The low refractive index layer comprises the reaction product of a composition comprising at least one free-radically polymerizable material having a high fluorine content, and at least one free-radically polymerizable fluoropolyether urethane material.... Agent: 3m Innovative Properties Company

20070287096 - Photoacid generators, chemically amplified resist compositions, and patterning process: A photoacid generator has formula (1) wherein R is H, F, Cl, nitro, alkyl or alkoxy, n is 0 or 1, m is 1 or 2, r is an integer of 0-4, and r′ is an integer of 0-5. A chemically amplified resist composition comprising the photoacid generator has advantages... Agent: Birch Stewart Kolasch & Birch

20070287097 - Planographic printing plate material: p

20070287095 - Planographic printing plate precursor and pile of planographic printing plate precursors: The invention has a support, a recording layer provided on the support, and a protective layer containing a hydrophilic polymer and silica-coated organic resin fine particles provided as the uppermost layer. The organic resin fine particles are preferably composed of at least one resin selected from the group consisting of... Agent: Sughrue Mion, PLLC

20070287094 - Planographic printing plate, planographic printing plate material, support for planographic printing plate material, and planographic printing method: An objective is to provide a planographic printing plate material exhibiting excellent properties such as printing durability, resistance to chemicals and anti-stain at the beginning of printing via restart of printing, and also a planographic printing plate exhibiting excellent properties such as printing durability, resistance to chemicals and anti-stain at... Agent: Lucas & Mercanti, LLP

20070287092 - Method for producing a base material for screen printing, and base material of this type: Method for producing a base material (25) for screen printing, which comprises a protective film (10), a screen (5) and an intermediate resist layer (13) comprising photosensitive material, the method comprising the steps of applying a first resist layer (15) to one side of the protective film (10), drying the... Agent: Hoffmann & Baron, LLP

20070287098 - Mehtod for preparation of lithographic printing plate and lithographic printing plate: A method for preparation of a lithographic printing plate including: exposing imagewise a lithographic printing plate precursor including a hydrophilic support, a photosensitive layer containing a sensitizing dye, a radical polymerization initiator, a radical polymerizable compound and a binder polymer and a protective layer provided in this order, to laser... Agent: Sughrue-265550

20070287099 - Printing resist, method for preparing the same and patterning method using the same: Disclosed herein is a printing resist sequentially transferred to a printing plate and a substrate after being applied to a printing roll. The printing resist comprises at least one polymer main chain bound to a tackiness-inducing vinyl group. The surface of the printing resist has tackiness without complete dryness, thus... Agent: Mckenna Long & Aldridge LLP

20070287100 - Near-field exposure method: A near-field exposure method includes closely contacting an exposure mask having a light blocking film with small openings of a size not greater than a wavelength of exposure light of an exposure light source, to a photoresist layer formed on a substrate having surface unevenness, and projecting the exposure light... Agent: Fitzpatrick Cella Harper & Scinto

20070287101 - Double exposure technology using high etching selectivity: Ultrafine patterns with dimensions smaller than the chemical and optical limits of lithography are formed by superimposing two photoresist patterns using a double exposure technique. Embodiments include forming a first resist pattern over a target layer to be patterned, forming a protective cover layer over the first resist pattern, forming... Agent: Mcdermott Will & Emery LLP

20070287102 - Pattern formation method: After forming a resist film including a hygroscopic compound, pattern exposure is performed by selectively irradiating the resist film with exposing light while supplying water onto the resist film. After the pattern exposure, the resist film is developed so as to form a resist pattern.... Agent: Mcdermott Will & Emery LLP

20070287103 - Method and apparatus for fabricating flat panel displays employing partially transparent borders: A method of manufacturing includes depositing a material on a surface of a substrate in a liquid form using an inkjet process, whereby the material dries in an initial shape on the substrate. A photolithographic process is applied using a mask that is separate from the substrate in order to... Agent: Sughrue Mion, PLLC

20070287104 - Photo-definable self-assembled materials: The present invention provides a mesoporous material comprising at least one region of mesoporous material patterned at a lithographic scale. The present invention also provides a method for forming a patterned mesoporous material comprising: coating a sol on a substrate to form a film, the sol comprising: at least one... Agent: Schwegman, Lundberg & Woessner, P.A.

20070287105 - Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for device production: A process for forming a resist pattern comprises the steps of applying on a substrate to form a photosensitive resist layer a photosensitive composition comprising at least one photosensitive compound having, in the molecule, two or more structural units represented by C6R2-6—CHR1—OR7 or C6R2-6—CHR1—COOR7 where R1 is a hydrogen atom... Agent: Fitzpatrick Cella Harper & Scinto

20070287106 - Process for producing electroluminescent element: There is provided a process for producing an EL element by photolithography, which process can produce an EL element having improved luminescence efficiency. The production process comprises the steps of removing a photoresist from photoresist layer-covered parts of an electroluminescent layer and cleaning the surface of the electroluminescent layer parts... Agent: Harness, Dickey & Pierce, P.L.C

20070281218 - Dummy phase shapes to reduce sensitivity of critical gates to regions of high pattern density: A method of generating dummy phase shapes in the layout of an alternating phase shift mask. The method comprises identifying a linewidth-sensitive feature and a large feature in the circuit design, and identifying a space therebetween. On the aItPSM mask layout there are provided opposing phase shifting shapes to project... Agent: Law Office Of Delio & Peterson, LLC.

20070281223 - Electrooptic device and electronic device including the same: An electrooptic device includes: a pair of first and second substrates that sandwich an electrooptic material; a plurality of pixel electrodes disposed in a pixel region on the first substrate; a first light shielding layer disposed on the second substrate, the first light shielding layer defining the periphery of the... Agent: Advantedge Law Group, LLC

20070281219 - Masking techniques and contact imprint reticles for dense semiconductor fabrication: A reticle comprising isolated pillars is configured for use in imprint lithography. In some embodiments, on a first substrate a pattern of pillars pitch-multiplied in two dimensions is formed in an imprint reticle. The imprint reticle is brought in contact with a transfer layer overlying a series of mask layers,... Agent: Knobbe Martens Olson & Bear LLP

20070281221 - Stencil mask: A stencil mask (10) for use in electron beam projection exposure includes a silicon base plate (12), an insulating film (14) formed on the silicon base plate, and a silicon film (16) formed on the insulating film. In the silicon base plate and the insulating film, an opening (18) penetrating... Agent: Ingrassia Fisher & Lorenz, P.C.

20070281220 - Topography based patterning: A mask having features formed by self-organizing material, such as diblock copolymers, is formed on a partially fabricated integrated circuit. Initially, a copolymer template, or seed layer, is formed on the surface of the partially fabricated integrated circuit. To form the seed layer, diblock copolymers, composed of two immiscible blocks,... Agent: Knobbe Martens Olson & Bear LLP

20070281224 - Scratch-off document and method for producing same: A scratch-off document and a method for producing a scratch off document are disclosed. The scratch-off document may include: a base material; a first toner layer affixed to the base material, wherein the first toner layer comprises a content to be masked; an optional barrier layer; and a second toner... Agent: Pepper Hamilton LLP

20070281225 - Method of correcting for pattern run out: s

20070281227 - Multilayer type electrophotographic photoconductor and image forming apparatus: The present invention is to provide a multilayer type electrophotographic photoconductor capable of stably obtaining a high image quality image over a long term by restraining the exposure memory and the photo memory, and an image forming apparatus comprising such a multilayer type electrophotographic photoconductor. A multilayer type electrophotographic photoconductor... Agent: Arthur G. Schaier Carmody & Torrance LLP

20070281226 - Photoreceptor with electron acceptor: An electrophotographic imaging member includes at least one layer including a hole transport material and a strong electron acceptor material, such as an electro photographic imaging member including a substrate, a charge generating layer, a hole transport layer, and an optional overcoating layer, wherein at least one layer of the... Agent: Oliff & Berridge, PLC.

20070281228 - Photoreceptor with overcoat layer: An electrophotographic imaging member includes a substrate, a charge generating layer, a charge transport layer, and an overcoating layer, the overcoating layer being a cured film formed from a composition including at least a hydroxyl group-containing polymer or oligomer, a benzoguanamine compound containing at least one —CH2OR group, wherein each... Agent: Oliff & Berridge, PLC.

20070281229 - Electrophotographic photoconductor and image forming apparatus: A charge transporting substance having three stilbene structures or butadiene structures in a molecule, represented by the following general formula is used as an organic photoconductive material. An electrophotographic photoconductor is prepared by causing a photosensitive layer which is disposed on a conductive support, to contain the organic photoconductive material... Agent: Nixon & Vanderhye, PC

20070281222 - Method of correcting opaque defect of photomask using atomic force microscope fine processing device: An opaque defect is processed by scanning with a high load or height fixed mode using a probe harder than a pattern material of a photomask at the time of going scanning, and is observed by scanning with a low load or intermittent contact mode at the time of returning... Agent: Brinks Hofer Gilson & Lione

20070281230 - Image-receiving sheet and manufacturing method thereof, and image-forming process and image-forming system for electrophotography: The object of the present invention is to provide an image-receiving sheet for the electrophotography which is excellent in the adhesion resistance and can form an image having a high image quality and an effective manufacturing method thereof, and also a image-forming process and image-forming system for the electrophotography using... Agent: Sughrue Mion, PLLC

20070281231 - Toner, toner particle-producing method, image-forming apparatus and image-forming process: The toner according to the present invention is a toner containing toner particles, comprising microparticle-deposited toner particles carrying polymerization microparticles having a particle diameter of 100 to 2,000 nm deposited on the surface of primary polymerization particles having a particle diameter of 3 to 12 μm in an amount of... Agent: Casella & Hespos

20070281232 - Toner, electrophotographic apparatus and process cartridge: A toner, and an electrophotographic apparatus and an electrophotographic process cartridge using the toner are provided having excellent charge stability without adversely affecting electric properties of the toner even when used for a long period of time and having excellent image density stability without bringing about image deletion and blurring.... Agent: Fitzpatrick Cella Harper & Scinto

20070281233 - Toner composition having coated strontium titanate additive: A toner comprising a resin and having on a surface thereof, an additive package comprising coated strontium titanate.... Agent: Patent Documentation Center

20070281234 - Electrostatic charge image developing toner: An objective is to provide a toner capable of obtaining clear prints with no image unevenness at low cost. Disclosed is an electrostatic charge image developing toner comprising toner particles each containing at least a binder resin, a colorant and wax, wherein a ratio {(S1/S)×100} of total area (S1) of... Agent: Lucas & Mercanti, LLP

20070281235 - Polyester resin for toner, toner composition and resin particle: [MEANS FOR SOLVING PROBLEMS] A polyester resin for toners which is obtained by polycondensing a polyol component and a polycarboxylic acid component is characterized by containing 20-100 weight % of one or more polyester resins (A1) having a storage elastic modulus from 2.5×103 Pa to 5×106 Pa at 150° C.... Agent: Edwards Angell Palmer & Dodge LLP

20070281237 - Image forming apparatus, image forming method, and process cartridge: To provide an image forming apparatus, image forming method and process cartridge, which are excellent in low-temperature fixation properties, storage stability, durability and filming resistance, can reduce generation of odor, and are capable of forming an extremely high quality image. The apparatus includes: a latent electrostatic image bearing member; a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20070281236 - Image forming apparatus, image forming method and process cartridge: To provide an image forming apparatus including a latent electrostatic image bearing member; a charging unit; an exposing unit; a developing unit; a transferring unit; and a fixing unit, wherein the binder resin of a toner comprises a polyester-based resin (A) and a polyester-based resin (B) having a melting point... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20070281238 - Fixing of toner images for duplex printing: Toner images applied on the first-side and on the second-side of a substrate are fixed together by microwaves, by being heated to a final fixing temperature, and that the toner image applied on the first-side is prefixed by microwaves before a toner image on the second-side is applied, with the... Agent: Eastman Kodak Company Patent Legal Staff

20070281239 - Process for producing electrophotographic photosensitive member: A process for producing an electrophotographic photosensitive member, which has the step of bringing i) the surface of an electrophotographic photosensitive member having at least a charge transport layer on a cylindrical support and ii) a mold having a fine unevenness surface profile into pressure contact with each other to... Agent: Fitzpatrick Cella Harper & Scinto

20070281240 - Developing agent and method for manufacturing the same: A method for manufacturing a developing agent by mixing a coarsely granulated mixture containing a binder resin and a coloring agent with an aqueous medium and mechanically stirring the resulting mixed solution to finely granulate the coarsely granulated mixture, thereby forming a fine particle.... Agent: Amin, Turocy & Calvin, LLP

20070281241 - Thermal mass transfer substrate films, donor elements, and methods of making and using same: Substrate films, thermal mass transfer donor elements, and methods of making and using the same are provided. In some embodiments, such substrate films and donor elements include at least two dyads, wherein each dyad includes an absorbing first layer and an essentially non-absorbing second layer. Also provided are methods of... Agent: 3m Innovative Properties Company

20070281243 - Base material for pattern forming material, positive resist composition and method of resist formation: A base material for a pattern-forming material, a positive resist composition, and a method of resist pattern formation that are capable of forming a high resolution pattern with reduced levels of LER. The base material includes a low molecular weight compound (X1), which is formed from a polyhydric phenol compound... Agent: Knobbe Martens Olson & Bear LLP

20070281244 - Color forming compositions with improved marking sensitivity and image contrast and associated methods: Compositions and methods for production of color images which are developable with improved marking sensitivity and image contrast are disclosed and described. Specifically, a color forming composition can comprise a polymeric activator phase including a polymer matrix and an activator dissolved therein, a color former phase including a color former,... Agent: Hewlett Packard Company

20070281242 - Silsesquioxane resin: This invention pertains to a silsesquioxane resin with improved lithographic properties (such as etch-resistance, transparency, resolution, sensitivity, focus latitude, line edge roughness, and adhesion) suitable as a photoresist; a method for incorporating the fluorinated or non-fluorinated functional groups onto silsesquioxane backbone. The silsesquioxane resins of this invention has the general... Agent: Dow Corning Corporation Co1232

20070281245 - Compositions: Said inks are especially useful as ink jet printing inks. The inks are especially suitable for food contact applications and when printed and cured demonstrate good fat resistance and low levels of leaching to foodstuffs.... Agent: Morgan Lewis & Bockius LLP

20070281246 - Processing method of light sensitive planographic printing plate material: Disclosed is a processing method of a light sensitive planographic printing plate material comprising an aluminum support and provided thereon, a light sensitive layer containing an ethylenically unsaturated compound, a photopolymerization initiator and a polymeric binder, the method comprising the steps of imagewise exposing the light sensitive planographic printing plate... Agent: Cantor Colburn, LLP

20070281247 - Laser ablation resist: A method of making micro-structure devices by coating a first layer of resist (12) on a substrate (10). A pattern is created on the substrate by radiation induced thermal removal of the resist.... Agent: Mark G. Bocchetti Patent Legal Staff

20070281248 - Stabilization of deep ultraviolet photoresist: An integrated circuit fabrication process as described herein employs a photoresist stabilization step where patterned photoresist material is exposed to radiation having a wavelength that promotes cross-linking in the shallow surfaces of the patterned photoresist features. The patterned photoresist material is highly absorptive of the stabilizing radiation, which results in... Agent: Ingrassia Fisher & Lorenz, P.C. (amd)

20070281249 - Novel nanoparticle patterning process: A method of making a metallic pattern (250) comprises: depositing a layer of photoresist (130) on a substrate (110); forming a patter on the photoresist; depositing a layer of metal nanoparticles (190) on the photoresist and pattern; removing the photoresist and overlying metal nanoparticles on the photoresist; and sintering the... Agent: Mark G. Bocchetti Patent Legal Staff

20070281250 - Electrophotographic image-receiving sheet and process for image formation using the same: The electrophotographic image-receiving sheet includes a support and a toner image-receiving layer which contains a thermoplastic resin and is disposed on the support, in which a surface of the toner image-receiving layer has a glossiness by specular reflection of 20 or less before image formation at an angle of incidence... Agent: Sughrue Mion, PLLC