Radiation imagery chemistry: process, composition, or product thereof inventions 11/07

20070275310 - Method for determining an acceptable reticle tolerance for a reticle used to produce an integrated circuit layout: A method and apparatus is provided for determining an acceptable reticle tolerance for a reticle used to produce an integrated circuit layout. The method begins by specifying a wafer target CD and a wafer CD tolerance for the integrated circuit layout. A reticle target CD is provided for the reticle... Agent: Mayer & Williams PC

20070275309 - Patterning a single integrated circuit layer using multiple masks and multiple masking layers: A multiple mask and a multiple masking layer technique can be used to pattern a single IC layer. A resolution enhancement technique can be used to define one or more fine-line patterns in a first masking layer, wherein each fine-line feature is sub-wavelength. Moreover, the pitch of each fine-line pattern... Agent: Bever, Hoffman & Harms, LLP

20070275312 - Semiconductor device: A semiconductor device including a test element for a dielectric breakdown test on conductive patterns formed on a semiconductor substrate, wherein the test element includes: a step pattern which is associated with a step portion formed in an underlying layer which is formed on the semiconductor substrate; a conductive pattern... Agent: Birch Stewart Kolasch & Birch

20070275313 - Calculation method and apparatus of exposure condition, and exposure apparatus: A method for calculating a correction amount to a focus amount or an exposure dose in exposing a substrate with an exposure apparatus includes a storing step of storing plural sets, each of which is a combination of a set focus amount, a set exposure dose, and first image information... Agent: Morgan & Finnegan, L.L.P.

20070275314 - Diphenyl amine derivative, production method therefor and electrophotographic photoconductor: (In the general formula (1), R1 to R12 each are a hydrogen atom, an alkyl group which may have a substituent, or the like, Z is a ring structure linked with a benzene ring, which is a 4 to 8-membered ring including a hydrogen atom, a nitrogen atom, an oxygen... Agent: Arthur G. Schaier Carmody & Torrance LLP

20070275311 - Flat panel display manufacturing: A method includes exposing a photo-resist layer using a first exposure machine that has a first resolution to cause the photo-resist layer to have an exposed portion and an un-exposed portion. The photo-resist layer is exposed using a second exposure machine that has a second resolution to further expose the... Agent: Fish & Richardson PC

20070275308 - Reflective mask blank, reflective mask, and method of manufacturing semiconductor device: A reflective mask blank and a reflective mask each have, on a multilayer reflective film, a protective film that protects the multilayer reflective film from etching during pattern formation of an absorber layer or a buffer layer formed on the protective film. The protective film is formed by a ruthenium... Agent: Sughrue Mion, PLLC

20070275307 - Resist composition and method for forming resist pattern: A resist composition is provided that yields fine resolution, and improved levels of line edge roughness and depth of focus. This composition includes a resin component (A) that undergoes a change in alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure,... Agent: Knobbe Martens Olson & Bear LLP

20070275315 - Toner, method for manufacturingthe toner, and developer, image forming method, image forming apparatus and process cartridge using the toner: A toner is provided manufactured by a method including mixing a particulate porous cross-linked resin having pores on a surface thereof and a volume average particle diameter of from 15 to 50 μm with a pre-toner including a colored particulate material comprising a binder resin, a colorant, and a release... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20070275316 - Electrostatic image developing toner: An electrostatic image developing toner is disclosed. The toner contains an external additive, which contains inorganic minute particles having a number average primary particle diameter of 5-30 nm and a titanic acid compound treated by silicone oil or a coupling agent.... Agent: Lucas & Mercanti, LLP

20070275317 - Resin for toner and toner: A resin for toner containing a resin component having both a polyester unit produced by polycondensation of a polyhydric alcohol component and a polycarboxylic acid component, and an aryl group having a sulfonic ester group as a substituent; and a toner that contains the resin for toner.... Agent: Fitzpatrick Cella Harper & Scinto

20070275318 - Toner, developer, image developer and image forming apparatus: A toner including toner particles including a binder resin, a colorant, and an inorganic particulate material present on a surface of the toner particles. The toner particles have a surface roughness (Ra) of from 1 to 30 nm, a standard deviation of the surface roughness of from 10 to 90... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20070275319 - Heat-transfer label well-suited for labeling fabrics and methods of making and using the same: A method for labeling fabrics, such as fabric garments, and a heat-transfer label well-suited for use in said method. In one embodiment, the heat-transfer label comprises (i) a support portion, the support portion comprising a carrier and a release layer; (ii) a wax layer, the wax layer overcoating the release... Agent: Kriegsman & Kriegsman

20070275323 - Increasing photoresist processing throughput: Two acids may be formed per exposed photon using free radical promotion so that two acid products are produced via two parallel pathways. This results in increased fabrication facility throughput. In some embodiments, this may be achieved while reducing side-lobe defect liability.... Agent: Trop Pruner & Hu, PC

20070275324 - Low activation energy photoresist composition and process for its use: The present invention relates to a radiation sensitive photoresist composition. The composition comprises a polymer comprising at least two monomers. The first monomer has an acid cleavable tertiary ester group. The second monomer is an acidic monomer. The acid cleavable ester group of the polymer has a surprisingly low activation... Agent: Robert Martin

20070275321 - Methods for enhancing resolution of a chemically amplified photoresist: Methods are provided for enhancing resolution of a chemically amplified photoresist. A film comprising a photoacid generator and a polymer comprising functional groups bonded to protecting moieties is deposited on a substrate. The film is exposed to patterned radiation. The patterned radiation results in protonation of a portion of the... Agent: Ingrassia Fisher & Lorenz, P.C. (amd)

20070275322 - Negative-working radiation-sensitive compositions and imageable materials: A radiation-sensitive composition includes a radically polymerizable component and an iodonium borate initiator composition capable of generating radicals sufficient to initiate polymerization of the free radically polymerizable component upon exposure to imaging radiation. The iodonium borate composition includes a particular diaryliodonium borate compound having organic substituents to provide a sum... Agent: Paul A. Leipold Patent Legal Staff

20070275325 - Photoresist undercoat-forming material and patterning process: A material comprising a specific bisphenol compound of formula (1) is useful in forming a photoresist undercoat wherein R1 and R2 are H, alkyl, aryl or alkenyl, R3 and R4 are H, alkyl, alkenyl, aryl, acetal, acyl or glycidyl, R5 and R6 are alkyl having a ring structure, or R5... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070275326 - Resist protective film composition and patterning process: m

20070275320 - Chemically amplified photorestist composition, laminated product, and connection element: There are provided a stable chemically amplified photoresist composition that undergoes no change in alkali solubility prior to irradiation, a photoresist laminated product produced by laminating the photoresist composition onto a support, and a manufacturing method for a photoresist pattern and a manufacturing method for a connection terminal that use... Agent: Knobbe Martens Olson & Bear LLP

20070275327 - Photosensitive resin composition, resist pattern forming method, substrate processing method, and device manufacturing method: A photosensitive resin composition is constituted by a polymer, as a component (A), having a monodisperse molecular weight distribution; and a compound, as a component (B), first generating a functional group which is capable of being silylated by radiation irradiation.... Agent: Fitzpatrick Cella Harper & Scinto

20070275328 - Decomposable composition and method for using the same: p

20070275330 - Bottom anti-reflective coating: Disclosed are embodiments of a bi-layer bottom anti-reflective coating (BARC) with graded optical properties (i.e., a graded refractive index) and a method of forming the BARC. The BARC is formed by sequentially coating two BARC layers onto a substrate. Each BARC layer comprises a polymer and an optical component, each... Agent: Frederick W. Gibb, Iii Gibb & Rahman, LLC

20070275331 - Pattern forming method and method for manufacturing semiconductor device: A micropattern is formed with high accuracy with a sufficient manufacture process margin without using a photomask complicated in manufacture process at high manufacture cost like an alternating phase shift mask. Double exposure is performed by using a pair of photomasks such as an ordinary chrome mask, an attenuated phase... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070275329 - System and method for characterizing lithography effects on a wafer: In the manufacture of semiconductors, it is often necessary to characterize the effect of line width and line width shape on yield. In an example embodiment, there is a method (200) for randomizing exposure conditions across a substrate. The method comprises generating a list of random numbers (210). A random... Agent: Philips Electronics North America Corporation Intellectual Property & Standards

20070275332 - Method for producing high resolution nano-imprinting masters: A method for producing high resolution nano-imprinting masters is disclosed. The method inverts the negative features of an exposed and developed positive e-beam resist to positive features in the patterned silicon nitride layer of the nano-imprinting master. A first, oxidation resistant, mask layer is used to pattern a DLC layer... Agent: D'arcy H. Lorimer

20070275333 - Method for controlling the treatment of a crystal with a liquid: The invention relates to a method for controlling the treatment of a crystal (2) by means of a liquid, wherein an image signal is captured by an image capturing system (200), said image signal representing a momentary image of a crystal having drops poured thereon by an electrically controllable microdosing... Agent: Knobbe Martens Olson & Bear LLP

20070269722 - Hybrid phase-shift mask and manufacturing method thereof: This invention discloses a hybrid phase-shift mask (PSM) having multi-film structure that from bottom to top is transparent film, attenuate film, and opaque film. By using several exposure and develop processes as well as controlling the etching selectivity, the multi-film structure can be patterned to form the chrome-less PSM and... Agent: Birch Stewart Kolasch & Birch

20070269721 - Method and apparatus for providing mask in semiconductor processing: Disclosed is a method for processing a two layer mask for use in fabrication of semiconductor devices whereby the critical dimension (CD) of a semiconductor device being fabricated with the mask can be controlled. After forming a carbon mask layer and a silicon containing photoresist layer on the carbon mask,... Agent: Beyer Weaver LLP

20070269724 - Method and process for immersion exposure of a substrate: The technology disclosed relates to immersion lithography, in particular to the exposure of masks by deep and vacuum ultraviolet wavelengths with so-called sub-wavelength resolution. It also is likely to be useful for other methods of sub-wavelength lithography such as lithography on silicon wafers, surface-acoustic wave (SAW) and diffractive optical devices.... Agent: Haynes Beffel & Wolfeld LLP

20070269728 - Electrophotographic photoreceptor and manufacturing method thereof, process cartridge, and image forming device: There is provided: an electrophotographic photoreceptor including a photosensitive layer and a surface layer laminated on a conductive substrate in this order, the photosensitive layer including an organic substance, the surface layer including a group 13 element and nitrogen, a thickness of the surface layer being from about 0.01 μm... Agent: Oliff & Berridge, PLC

20070269729 - Electrophotographic photoreceptor, and image forming apparatus and process cartridge using the electrophotographic photoreceptor: An electrophotographic photoreceptor is provided, including an electroconductive substrate and a photosensitive layer located overlying the electroconductive substrate, wherein an outermost layer of the electrophotographic photoreceptor includes a resin including a graft copolymer in which a monomer having a polar group is graft polymerized to a polycarbonate resin, a polyarylate... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20070269720 - Alkali-developable, colored photosensitive resin composition and color filter using the alkali-developable, colored photosensitive resin composition: An alkali-developable, colored photosensitive resin composition obtained by adding a colorant and a photopolymerization initiator to an alkali-developable resin composition, containing a reaction product obtained by esterification between an epoxy adduct and a polybasic acid anhydride, the epoxy adduct having a structure formed by adding an unsaturated monobasic acid and... Agent: Young & Thompson

20070269725 - Light control material for displaying color, information, and images: A light control material is provided for displaying color images having microstructures either on its surface or within the material which reflect a selected color and bandwidth of light in accordance with their physical characteristics. In an exemplary embodiment, the microstructures are stepped structures which reflect a particular color and... Agent: Thomas, Kayden, Horstemeyer & Risley, LLP

20070269723 - Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film: The present invention provides an optically semitransmissive film that has a near-zero phase shift, has a desired transmissivity, and is relatively thin; a novel phase-shift mask that uses the optically semitransmissive film; a photomask blank that can manufacture the phase-shift mask; and a method for designing the optically semitransmissive film.... Agent: Oliff & Berridge, PLC

20070269726 - Phase-shift mask, manufacturing method thereof and manufacturing method of semiconductor element: A phase-shift mask including a transparent substrate, and a light-shielding film formed on the transparent substrate and provided with first apertures and second apertures which are alternately arranged. The transparent substrate is partially removed through the second apertures to form a recessed portion having a predetermined depth. Light transmitted through... Agent: Staas & Halsey LLP

20070269727 - Modified polymers and their use in the production of lithographic printing plate precursors: Radiation-sensitive negative working element comprising (a) a substrate with a hydrophilic surface and (b) a layer on the hydrophilic surface of the substrate, wherein said layer comprises a modified polymer obtainable by reacting (i) a polymer with —COOH, —SO3H, —P03H2 and/or —PO4H2 in the side chains, wherein the polymer is... Agent: Eastman Kodak Company Patent Legal Staff

20070269730 - Polymerized toner with high chargeability and good charge stability and preparation method thereof: The present invention relates to a polymerized toner with high chargeability and good charge-stability, and a method of preparing the polymerized toner. In particular, the present invention relates to a polymerized toner containing pigments, pigment stabilizers, charge control agents and binder resin monomers, and a method to prepare the polymerized... Agent: Mckenna Long & Aldridge LLP

20070269731 - Method of preparing toner and toner prepared using the method: A method of manufacturing toner uses a simplified process, in which the use of a surfacant is reduced to minimize the amount of wastewater generated. The toner manufactured using the method, an image forming method using the toner, and an image forming apparatus employing the toner are also provided.... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.

20070269732 - Resin particle liquid dispersion for electrostatic image developing toner, production process of the liquid dispersion, electrostatic image developing toner, production process of the toner, electrostatic image developer and image forming method: A resin particle liquid dispersion for an electrostatic image developing toner includes: a polycondensable resin obtained by polycondensing at least one selected from the group consisting of a polycondensable monomer, an oligomer of the polycondensable monomer and a prepolymer of the polycondensable monomer, wherein the resin particle liquid dispersion further... Agent: Oliff & Berridge, PLC

20070269733 - Toner for developing electrostatic image: The present invention provides a toner for developing electrostatic image comprising a colored particle containing a binder resin, a colorant and a release agent, wherein the toner for developing electrostatic image has two or more maximum values of peaks or shoulders of loss tangent (tan δ) in the range from... Agent: Kratz, Quintos & Hanson, LLP

20070269734 - Uper layer film forming composition for liquid immersion and method of forming photoresist pattern: An immersion upper layer film composition is provided which exhibits sufficient transparency for the exposure wavelength 248 nm(KrF) and 193 nm(ArF), can form a protective film on the photoresist film without being intermixed with the photoresist film, is not eluted into water used during immersion exposure to maintain a stable... Agent: Merchant & Gould PC

20070269737 - Color forming compositions and associated methods: Compositions and methods for forming color images on a substrate capable of development at desired wavelengths or energy levels are disclosed and described. The color forming composition can include a carrier system and a latent pigment with a pendent group, wherein the latent pigment is colorless or pale in color... Agent: Hewlett Packard Company

20070269741 - Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography: m

20070269739 - Materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use: This invention relates to iodonium salts, acetal copolymers and polymer binders comprising functional groups capable of undergoing cationic or radical polymerization, their method of preparation and their use in the preparation of coating solutions and coatings. This invention also relates to coatings containing the iodonium salts, acetal copolymers and/or polymer... Agent: Goudreau Gage Dubuc

20070269740 - Methods of marking and related structures and compositions: Methods are disclosed that include directing electromagnetic radiation and/or heat to a structure, the structure including a substrate, a first layer, and a marking composition between the substrate and the first layer. At least a portion of the electromagnetic radiation and/or heat is transmitted through the first layer and the... Agent: Fish & Richardson PC

20070269736 - New sub 40 nm resolution si containing resist system: The present invention discloses a resist composition and a method of forming a material structure having a pattern containing features having a dimension of about 40 nm or less by using the inventive resist. The inventive resist comprises a polymer and a photoacid generator. The polymer of the present invention... Agent: Scully Scott Murphy & Presser, PC

20070269738 - Photosensitive film, photosensitive film laminate and photosensitive film roll: The photosensitive film of the invention is a photosensitive film comprising a photosensitive resin layer (30) on a support film (1), characterized in that the photosensitive resin layer (30) is prepared by laminating two or more layers including a facing photosensitive resin layer (2) having a facing surface that faces... Agent: Griffin & Szipl, PC

20070269735 - Radiation-sensitive resin composition: e

20070269742 - Optical information recording medium and method of producing the same: An optical information recording medium includes an optical recording layer onto which information is to be recorded by a laser beam, wherein the optical recording layer includes a dye film containing a specific mono(aza)methine compound and an acid and is directly provided on a surface of a layer that allows... Agent: Knobbe Martens Olson & Bear LLP

20070269743 - Conductive lithographic polymer and method of making devices using same: A conductive photolithographic film and method of forming a device using the conductive photolithographic film. The method includes depositing a conductive photolithographic film on a top surface of a substrate; and patterning the conductive photolithographic film to create a desired circuit pattern using a lithographic process. The conductive photolithographic film... Agent: Intel/blakely

20070269744 - Resist composition for electron beam or euv (extreme ultraviolet) and method for forming resist pattern: wherein X represents an alkylene group having 2 to 6 carbon atoms, in which at least one hydrogen atom is substituted with a fluorine atom; and each of Y and Z independently represents an alkyl group having 1 to 10 atoms, in which at least one hydrogen atom is substituted... Agent: Knobbe Martens Olson & Bear LLP

20070269745 - Lithographic printing plate precursors with oligomeric or polymeric sensitizers: Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a freeradical polymerization, (ii) at least... Agent: Eastman Kodak Company Patent Legal Staff

20070269746 - Pattern forming method used in semiconductor device manufacturing and method of manufacturing semiconductor device: A method of forming a pattern on a photosensitive resin film in lithography, a method of forming a pattern for a semiconductor device, and a method of manufacturing a semiconductor device using the patterned film are disclosed. In an aspect of the invention, there is provided a method of forming... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070269747 - Lithography technique using silicone molds: A method includes the steps of: A) filling a silicone mold having a patterned surface with a curable (meth)acrylate formulation, B) curing the curable (meth)acrylate formulation to form a patterned feature, C) separating the silicone mold and the patterned feature, optionally D) etching the patterned feature, and optionally E) repeating... Agent: Dow Corning Corporation Co1232

20070269748 - Method for manufacturing an array of interferometric modulators: In one embodiment, the invention provides a method for manufacturing an array of interferometric modulators. Each interferometric modulator comprises first and second optical layers which when the interferometric modulator is in an undriven state are spaced by a gap of one size, and when the interferometric modulator is in a... Agent: Knobbe, Martens, Olson & Bear, LLP

20070269750 - Colored masking for forming transparent structures: The invention relates to a process for forming a stacked transparent structure comprising providing a support, coating one side of said support with a multicolored mask, coating the other side of the support with a layer curable by visible light, and exposing the light-curable layer through the mask with visible... Agent: Paul A. Leipold Patent Legal Staff

20070269749 - Methods to reduce the minimum pitch in a pattern: Methods to reduce the minimum pitch of a pattern are described. A photo-resist on a substrate is exposed to a radiation through a mask. The mask has features that are separated by a distance. Photo-resist portions having a first exposure to the radiation, second exposure to the radiation, and third... Agent: Blakely Sokoloff Taylor & Zafman

20070269751 - Immersion liquid for liquid immersion lithography process and method for forming resist pattern using such immersion liquid: The formation of a resist pattern with high resolution using liquid immersion lithography, while concurrently preventing deterioration of the resist film during the liquid immersion lithography and deterioration of the used liquid itself, is possible through the use of a liquid which can be suitably used in a liquid lithography... Agent: Thelen Reid Brown Raysman & Steiner LLP

20070269752 - Method for pattern formation using photoresist cleaning solution: e

20070269753 - Concentrated processing composition for silver halide color paper and method of processing: An object of the present invention is to provide a method of processing silver halide color paper that ensures (a) promptness such that finished prints can be handed at shop to customers, (b) small installation area for mini-labs, (c) processing solution stability capable of withstanding slack seasons, (d) normal image... Agent: Birch Stewart Kolasch & Birch

20070269754 - Acrylic polymer and radiation-sensitive resin composition: To provide a resist which is excellent in the solubility in a resist solvent and little dependent on baking temperature and can form developed patterns reduced in line edge roughness. An acrylic polymer characterized by comprising units of the general formula (1), units of general formula (2), and units of... Agent: Merchant & Gould PC

20070264585 - Photomask having half-tone phase shift portion: A photomask has a half-tone phase shift portion in a reticle alignment mark portion instead of a light transmissive portion so as to reduce an exposure light transmittance and reduce an influence from ghost.... Agent: Sughrue Mion, PLLC

20070264580 - Coating compositions for use with an overcoated photoresist: Organic coating composition are provided including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred organic coating compositions of the invention comprise one or more resins that can harden upon thermal... Agent: Peter F. Corless Rohm And Haas Electronic Materials LLC

20070264582 - Double-decker mask-pellicle assembly: A mask-pellicle assembly is disclosed. The mask-pellicle assembly includes a mask substrate having an absorber pattern and a hard pellicle attached to the mask substrate by exterior gas pressure.... Agent: Tung & Associates

20070264583 - Mask blank manufacturing method: A method of manufacturing a mask blank includes a thin film forming step of forming a thin film, which becomes a mask pattern, on a mask blank substrate and a resist film forming step of forming a resist film on the thin film. The method further includes a step of... Agent: Sughrue Mion, PLLC

20070264584 - Pattern arrangement method of semiconductor device: A pattern arrangement method of a semiconductor device is provided. In the pattern arrangement method, patterns are classified according to effective pitches and critical dimensions, and pattern dispersion is predicted according to the effective pitches and the critical dimensions by using a statistical analysis of process parameters. Two-dimensional coordinates of... Agent: Marger Johnson & Mccollom, P.C.

20070264581 - Patterning masks and methods: Patterning masks and methods for lithography are disclosed. A preferred embodiment includes a lithography mask comprising a pattern for at least one feature and at least one polarizing element.... Agent: Slater & Matsil LLP

20070264586 - Method of manufacturing dichroic filter array: A method of manufacturing a dichroic filter array is provided and comprises forming a first dichroic filter material layer on a substrate, and then forming a patterned photoresist layer on the first dichroic filter material layer. The exposed portion of the first dichroic filter material layer is removed so as... Agent: Jianq Chyun Intellectual Property Office

20070264587 - Resist composition: A resist composition comprising (A) a hydrogen silsesquioxane resin, (B) an acid dissociable group-containing compound, (C) a photo-acid generator, (D) an organic solvent and optionally (E) additives. The resist composition has improved lithographic properties (such as high etch-resistance, transparency, resolution, sensitivity, focus latitude, line edge roughness, and adhesion) suitable as... Agent: Dow Corning Corporation Co1232

20070264588 - Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks: The present invention includes an imprint lithography system for impinging a flux of light upon a liquid to polymerize the liquid, the system including, a source of light producing the flux of light; and a template having overlay marks being disposed between the liquid and the source of light and... Agent: Fish & Richardson P.C.

20070264589 - Modified nigrosine, its production method, and toner for developing electrostatic charge images using this modified nigrosine: Modified nigrosine which has satisfactory dispersibility in resin and which reduces the residual aniline amount is offered, and its production method is also offered. Moreover, toner for developing electrostatic charge images is offered, which uses modified nigrosine colorant that resolves the aforementioned problems, which has excellent charge-imparting properties, which exhibits... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070264590 - Patterning process, film forming process, electroluminescence device manufacturing process, electroluminescence device, and electroluminescence display apparatus: Disclosed is a patterning process includes a patterning step including exposing a base to light, the base including: (a) a substrate; (b) a photocatalyst layer formed on part of the substrate and containing a photocatalyst; and (c) a patterning layer formed on an upper surface of a base including the... Agent: Sughrue Mion, PLLC

20070264591 - Imprint lithography: A method of making an imprint template includes providing a transfer layer on a substrate and providing a layer of imprintable medium on the transfer layer, using a master imprint template to imprint a pattern into the imprintable medium, polymerizing the imprintable medium by exposing it to actinic radiation, then... Agent: Pillsbury Winthrop Shaw Pittman, LLP Eric S. Cherry - Docketing Supervisor

20070264592 - Resist polymer, preparing method, resist composition and patterning process: A polymer for resist use is prepared by previously charging a reactor with a solution containing a chain transfer agent and holding at a polymerization temperature, and continuously or discontinuously adding dropwise a solution containing monomers and a polymerization initiator to the reactor for radical polymerization. The polymer has a... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070264593 - Method for manufacturing semiconductor device using immersion lithography process: A method for manufacturing a semiconductor device using an immersion lithography process is disclosed. The immersion lithography process includes forming a photoresist film over an underlying layer of a semiconductor substrate; exposing the photoresist film to light without using an exposure mask; and performing an exposure process using an exposure... Agent: Heller Ehrman LLP

20070264594 - Method of inhibiting photoresist pattern collapse: A method of inhibiting photoresist pattern collapse which includes the steps of providing a substrate; providing a photoresist layer on the substrate; exposing and developing the photoresist layer; applying a top anti-reflective coating layer to the photoresist layer; rinsing the photoresist layer; and drying the photoresist layer.... Agent: Tung & Associates

20070264595 - Method for multiple irradiation of a resist: The invention relates to a method with contrast reversal which, inter alia, opens up new areas of application for resists.... Agent: Slater & Matsil LLP

20070264596 - Thermal acid generator, resist undercoat material and patterning process: A thermal acid generator of generating an acid on heating above 100° C. has formula: CF3CH(OCOR)CF2SO3−(R1)4N+ wherein R is alkyl or aryl, R1 is hydrogen, alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl, or R1 may bond together to form a ring with N. The sulfonic acid generated possesses an ester... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070264597 - Method for manufacturing transflective liquid crystal display: An exemplary method for fabricating a transflective liquid crystal display device includes: (1) forming a first metal layer on a substrate and conducting a lithography and etching process so as to define a gate and protrusions within a thin film transistor (TFT) region and a reflection region separately; (2) forming... Agent: Wei Te Chung Foxconn International, Inc.

20070264599 - Method for manufacturing semiconductor device using immersion lithography process with filtered air: A method for manufacturing a semiconductor device using an immersion lithography process is disclosed. The semiconductor device is manufactured by filtering an air by using an amine removing chemical filter; and applying the filtered air onto a photoresist film formed on a semiconductor substrate (i) after washing the photoresist film... Agent: Heller Ehrman LLP

20070264598 - Method of forming a fine pattern: A process of forming a fine pattern including forming a first photoresist layer over a first layer of a semiconductor device. Portions of the first photoresist layer are exposed causing a photochemical reaction therein. Prior to developing the first photoresist layer, a second photoresist layer is formed over the first... Agent: Tung & Associates Suite 120

20070264600 - Heterocyclic colorants based on diazabenzoisoindoles: The invention is directed to novel colorants of formula (I), wherein A represents a group of general formulas (II), (III), (IV) or (V), and B represents a substituted or unsubstituted ortho-C6-C18 arylene, wherein C and D represent an alicyclic or heteroyclic group.... Agent: Clariant Corporation Intellectual Property Department

20070264601 - Photosensitive resin composition and photosensitive dry film by the use thereof: A photosensitive resin composition for h-ray exposure which has high sensitivity for h-ray and is excellent in resolution of a resist pattern, and a photosensitive dry film by the use thereof are provided. The photosensitive resin composition is composed of an alkali-soluble resin (A) having an alicyclic epoxy group-containing unsaturated... Agent: Thelen Reid Brown Raysman & Steiner LLP

20070259274 - Negative resists based on acid-catalyzed elimination of polar molecules: The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and... Agent: Mintz, Levin, Cohn, Ferris, Glovsky And Popeo, P.c

20070259272 - Photoresist composition and method of manufacturing a thin-film transistor substrate using the same: A photoresist composition includes about 100 parts by weight of resin mixture including novolak resin and acryl resin and about 10 parts to about 50 parts by weight of naphthoquinone diazosulfonic acid ester. A weight-average molecular weight of the novolak resin is no less than about 30,000. A weight-average molecular... Agent: Cantor Colburn, LLP

20070259273 - Positive resist composition and method of forming resist pattern: A positive resist composition including a base material for a pattern-forming material (A), which contains a protector (X1) of a polyhydric phenol compound (x) having two or more phenolic hydroxyl groups and a molecular weight of 300 to 2,500, in which a portion of the phenolic hydroxyl groups are protected... Agent: Knobbe Martens Olson & Bear LLP

20070259275 - Anti-reflection coating for an euv mask: An EUV mask includes, on top of a multi-layer mirror, a spectral purity enhancement layer, for application in an EUV lithographic apparatus. On top of the spectral purity enhancement layer, a patterned absorber layer is provided. The spectral purity enhancement layer includes a first spectral purity enhancement layer, but between... Agent: Pillsbury Winthrop Shaw Pittman, LLP Eric S. Cherry - Docketing Supervisor

20070259276 - Photomask blank, photomask and method for producing those: A metal film is provided as a light shielding layer on one principle surface of a photomask substrate. The metal film cannot be substantially etched by chlorine-based dry etching containing oxygen ((Cl+O)-based dry etching) and can be etched by chlorine-based dry etching not containing oxygen (Cl-based dry etching) and fluorine-based... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070259277 - Method for manufacturing color filter: In the present invention, a provision of a method for manufacturing a color filter capable of forming a highly sophisticated pattern, to be formed easily at a low cost is desired. The present invention achieves the above mentioned object by providing a method for manufacturing a color filter comprising: (1)... Agent: Seyfarth Shaw LLP

20070259278 - Photosensitive resin composition: A photopolymerization process for producing pigmented and non-pigmented articles comprises irradiating with electromagnetic radiation in the range from 190 to 600 nm, or with electron beam or with X-rays a photosensitive composition which can be developed by alkali solution which composition comprises (A) a polymer containing at least one carboxylic... Agent: Ciba Specialty Chemicals Corporation Patent Department

20070259279 - Near infrared ray activation type positive resin composition: A near infrared ray activation type positive resist composition comprising (A) a vinyl-based polymer having a monomer unit having an alkali-soluble group blocked by an ether having an alkenyl group next to an ether oxygen, (B) a photothermal converting substance generating heat by a light in the near infrared region,... Agent: Fitch, Even, Tabin & Flannery

20070259280 - Photomask, exposure control method and method of manufacturing a semiconductor device: A photomask transferring a light shield film pattern formed on a transparent substrate by a projection exposure apparatus, comprising a circuit pattern for transferring a predetermined pattern to a resist film, and an exposure monitor mark, the exposure monitor mark being formed in a manner that blocks having a predetermined... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070259281 - Hydroxygallium phthalocyanines: Methods for preparing Type V hydroxygallium phthalocyanine are provided.... Agent: George Likourezos, Esq. Carter, Deluca, Farrell & Schmidt, LLP

20070259282 - Electrophotographic toner, image forming method, dye and metal chelate dye: wherein X1 and X2 are each a monodentate or didentate ligand, provided that X1 and X2 may link with each other which may be the same or different from each other; n and m are each an integer of 0 to 2; W1 is a counter ion when a counter... Agent: Cantor Colburn, LLP

20070259283 - Toner: A toner including toner particles containing at least a binder resin and a colorant. The binder resin is a vinyl-based resin. The toner contains a THF insoluble matter in a quantity of 0.0 mass % or more to less than 16.0 mass %. The toner has a main peak in... Agent: Fitzpatrick Cella Harper & Scinto

20070259284 - Capsulated toner: There is provided a capsulated toner which has low-temperature fixing ability, good storage stability, excellent charge stability, high fixing strength to a sheet paper, and low consumption, and is capable of forming a color image of high-definition, high-gloss, and high-density. The capsulated toner for electrophotography includes a shell layer containing... Agent: Nixon & Vanderhye, PC

20070259285 - Method for creating a built-in self test (bist) table for monitoring a monolayer deposition (mld) system: A method of monitoring a processing system in real-time using low-pressure based modeling techniques that include processing one or more of wafers in a processing chamber, calculating dynamic estimation errors for the precursor and/or purging process, and determining if the dynamic estimation errors can be associated with pre-existing BIST rules... Agent: Wood, Herron & Evans, LLP (tokyo Electron)

20070259287 - Resin composition for forming fine pattern and method for forming fine pattern: A resin composition which, in forming a fine pattern by a heat treatment of a resist pattern formed by using a photoresist, can be applied onto the resist pattern, can cause the resist pattern to smoothly shrink by heat treatment, and can be easily washed away by a treatment with... Agent: Merchant & Gould PC

20070259286 - Reversible piezochromic systems: The present invention provides a reversible piezochromic system that gives high contrast images upon an application of pressure to the system. The system has a short color-reversal time and can be prepared inexpensively by admixing a suitable electron donating compound and a suitable electron accepting compound. The reversible piezochromic systems... Agent: Dickstein Shapiro

20070259288 - Optical recording medium and method of producing the same: Provided are an optical recording medium having a multi-layer structure and a method of producing the optical recording medium, in which an adhesive layer or a hardening resin layer in a high-quality optical recording medium having the multi-layer structure can be formed at low cost with signal pattern transferability of... Agent: Fitzpatrick Cella Harper & Scinto

20070259289 - Thin film transistor array panel, manufacturing method thereof, and mask therefor: A passivation layer is deposited and a photoresist is formed. The photoresist includes first to third portions with decreased thickness, the second portions located on portions of drain electrodes and data lines and the third portions located on portions of gate lines. A mask for forming the photoresist has rectilinear... Agent: Macpherson Kwok Chen & Heid LLP

20070259290 - Measuring and/or inspecting method, measuring and/or inspecting apparatus, exposure method, device manufacturing method, and device manufacturing apparatus: In the inspection of one reticle of reticles used for double exposure, the pattern area of the reticle is divided into a plurality of areas, according to (a) whether an area is a light-transmitting section or a light-shielding section, (b) whether a pattern area of the other reticle is a... Agent: Oliff & Berridge, PLC

20070259291 - Structures and methods for low-k or ultra low-k interlayer dielectric pattern transfer: The present invention relates to improved methods and structures for forming interconnect patterns in low-k or ultra low-k (i.e., having a dielectric constant ranging from about 1.5 to about 3.5) interlevel dielectric (ILD) materials. Specifically, reduced lithographic critical dimensions (CDs) (i.e., in comparison with target CDs) are initially used for... Agent: Scully Scott Murphy & Presser, PC

20070259292 - Method for making a micro-fluid ejection device: A method of etching a semiconductor substrate. The method includes the steps of applying a photoresist etch mask layer to a device surface of the substrate. A select first area of the photoresist etch mask is masked, imaged and developed. A select second area of the photoresist etch mask layer... Agent: Lexmark International, Inc. Intellectual Property Law Department

20070259293 - Method for forming high-resolution pattern having desired thickness or high aspect ratio using dry film resist: Disclosed herein is a method for forming a pattern, comprising: attaching a single-layer or multi-layer dry film resist made of a semi-solid or solid material to part or all of the surface of a substrate; exposing the dry film resist to light either by irradiating a focusable energy beam directly... Agent: Cantor Colburn, LLP

20070259294 - Cyanine compound and optical recording materials: Cyanine compounds represented by the general formula (I) which exhibit decomposition behavior suitable for the optical recording material to be used in optical recording layers of optical recording media for high-speed recording: (I) wherein A and B are each an optionally substituted benzene or naphthalene ring; X is O, S,... Agent: Young & Thompson

20070259295 - Positive photosensitive composition: Provided is a positive photosensitive composition excellent in an etching factor and adhesion. The composition includes: (A) an alkali-soluble high molecular substance having in the molecule thereof at least one carboxyl group, (B) a photo-thermal conversion material which absorbs infrared rays from an image exposure light source to convert the... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070254218 - Phase shifting mask capable of reducing the optical proximity effect and method for preparing semiconductor devices using the same: A phase shifting mask capable of decreasing the optical proximity effect comprises a substrate and at least one phase shifting pattern positioned on the substrate, wherein the phase shifting pattern surrounds at least one optical correction pattern. Preferably, the optical correction pattern is an aperture exposing the substrate, and positioned... Agent: Oliff & Berridge, PLC

20070254224 - Electrostatic latent image bearing member, and image forming apparatus and process cartridge using the electrostatic latent image bearing member: An electrostatic latent image bearing member is provided including a substrate and a photosensitive layer located overlying the substrate, wherein the outermost layer of the electrostatic latent image bearing member includes a cross-linked resin formed from a cross-linking reaction between a polyol having 2 or more hydroxyl groups including a... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070254226 - Imaging member:

20070254223 - Imaging member:

20070254217 - Method and apparatus for solving mask precipitated defect issue: Disclosed are a method and an apparatus for solving mask precipitated defect issue. A gas is purged into a photomask reticle assembly for diffusing precipitated defects out of a photomask in the photomask reticle assembly. A metal shielding assembly enclosing the photomask reticle assembly is provided for reducing precipitated defects... Agent: Haynes And Boone, LLP

20070254219 - Photomask, method for producing the same, and method for forming pattern using the photomask: A photomask has a semi-light-shielding portion having a light-shielding property and a light-transmitting portion surrounded by the semi-light-shielding portion, and a peripheral portion positioned in the periphery of the light-transmitting portion. The semi-light-shielding portion and the light-transmitting portion transmit exposure light in the same phase, whereas the peripheral portion transmits... Agent: Mcdermott Will & Emery LLP

20070254220 - Azo compound, composition for photo-alignment film using the same, and method for producing photo-alignment film: (wherein, R1 and R2 each independently represents a hydroxy group, or a polymerizable functional group selected from the group consisting of a (meth)acryloyl group, a (meth)acryloyloxy group, a (meth)acrylamide group, a vinyl group, a vinyloxy group, and a maleimide group; X1 represents single bond when R1 is a hydroxy group... Agent: Kratz, Quintos & Hanson, LLP

20070254221 - Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel: h

20070254222 - Fluidized bed reaction apparatus and methods for using the same: Apparatuses and methods for preparing sol-gel solutions are provided. Specicifically, apparatuses include a vessel optionally containing a stirrer; a pump; a fluidized bed reaction column; and multiple fluid lines. The multiple fluid lines connect the vessel and the pump in a first circulation loop and connect the vessel, the pump... Agent: Oliff & Berridge, PLC.

20070254225 - Arylamine processes: Processes for selectively hydrogenating double and/or triple bonds in organic molecules include providing at least one organic molecule containing a double and/or triple bond, providing at least one hydrogen donor molecule, and hydrogenating the double and/or triple bond in the presence of at least one catalyst. Processes for preparing arylamine... Agent: Oliff & Berridge, PLC.

20070254227 - Toner and methods of producing same: A toner and a method of producing same. In one embodiment, the method includes the steps of forming an organic phase containing a resin, an organic solvent, a colorant, a charge control agent, and a phase change stabilizer, wherein the organic solvent is characterized in that the resin is soluble... Agent: Morris Manning Martin LLP

20070254228 - Toner compositions and processes: A toner composition includes toner particles including a polymeric resin, a colorant, a wax, and an optional coagulant, and a coagulant applied as a surface additive to a surface of the toner particles to alter a triboelectric charge of the toner particles.... Agent: Oliff & Berridge, PLC.

20070254229 - Toner compositions: A toner composition includes a styrene-based polymer resin, a crystalline polyester wax, a second wax different from the crystalline polyester wax, a colorant, and a coagulant.... Agent: Oliff & Berridge, PLC.

20070254230 - External additive composition and process: A process for toner preparation includes forming toner particles by mixing an emuslion comprising at least binder resin and a colorant, aggregating the toner particles, and blending external additives with the toner particles in a blender to form a toner, wherein the blender has a blend intensity of from about... Agent: Oliff & Berridge, PLC.

20070254231 - Toner for electrophotography: p

20070254232 - Image forming method, and electrophotographic apparatus making use of the image forming method: An image forming method is disclosed having a charging step, an exposure step, a developing step and a transfer step. This method uses a toner which includes toner particles containing a binder resin and a colorant, and inorganic fine powder, and uses a photosensitive member which has on its surface... Agent: Fitzpatrick Cella Harper & Scinto

20070254233 - Electrophotographic image forming method and image forming apparatus: In an image forming method in which a toner image, which is visualized via an electrostatic latent image formed on an electrophotographic photoreceptor, employing a developer incorporating toner, is transferred onto a recording material followed by fixing, and any residual toner remaining on the electrophotographic photoreceptor is removed, an image... Agent: Lucas & Mercanti, LLP

20070254234 - Stabilized azo dye and method for its preparation:

20070254240 - Dye-containing negative curable composition, color filter and method for producing the same: The present invention provides a dye-containing negative curable composition comprising at least two dyes (A), an oxime photopolymerization initiator (B) and a radical polymerizable monomer (C); or a dye-containing negative curable composition comprising at east two organic-solvent soluble dyes (A), an oxime photopolymerization initiator (B), a radical polymerizable monomer (C)... Agent: Sughrue Mion, PLLC

20070254239 - Resist for printing and patterning method using the same: A resist for printing that is coated on a printing roll and is then sequentially transcribed on a printing plate and a substrate including: a material wherein a cohesive energy between the resist and the printing plate is larger than a cohesive energy between the resist and a blanket formed... Agent: Mckenna Long & Aldridge LLP

20070254236 - High contact angle topcoat material and use thereof in lithography process: A topcoat material for application on top of a photoresist material is disclosed. The topcoat material comprises an acid-inert compound. The topcoat material also comprises a polymer or an oligomer or a cage structure which shows negligible intermixing with the imaging layer and is soluble in aqueous base developer. A... Agent: Norris Mclaughlin & Marcus, Pa

20070254238 - Method for making a lithographic plate: Process for the posttreatment of an imaged lithographic printing plate comprising (a) providing a lithographic printing plate comprising image areas and non-image areas on a lithographic substrate; (b) bringing the lithographic printing plate of step (a) into contact with a solution comprising a hydrophilic polymer comprising structural units derived from... Agent: Eastman Kodak Company Patent Legal Staff

20070254235 - Self-topcoating resist for photolithography: Resist compositions that can be used in immersion lithography without the use of an additional topcoat are disclosed. The resist compositions comprise a photoresist polymer, at least one photoacid generator, a solvent; and a self-topcoating resist additive. A method of forming a patterned material layer on a substrate using the... Agent: Norris Mclaughlin & Marcus, Pa

20070254237 - Topcoat material and use thereof in immersion lithography processes: Disclosed is a topcoat composition comprising a polymer having a dissolution rate of at least 1500 Å/second in an aqueous alkaline developer, and at least one solvent. The topcoat composition can be used to coat a photoresist layer on a material layer on a substrate, for example, a semiconductor chip.... Agent: Norris Mclaughlin & Marcus, Pa

20070254241 - Method of treating on-press developable lithographic printing plate: A method of treating an on-press developable lithographic printing plate with a treating solution after imagewise exposure and before on-press development is described. The plate comprises on a substrate a photosensitive layer developable with ink and/or fountain solution and capable of hardening upon exposure to a radiation. The plate is... Agent: Gary G. Teng

20070254242 - Method for producing flexographic printing plates by means of laser engraving: Process for the production of flexographic printing plates by means of direct laser engraving, in which the particulate and gaseous degradation products formed in the course of the engraving are taken up by means of a suction apparatus, and the waste gas stream laden with the degradation products is purified... Agent: Connolly Bove Lodge & Hutz, LLP

20070254243 - Method for manufacturing photosensitive resin composition and relief pattern using the same: A method for manufacturing a positive photosensitive resin composition, the method comprising: filtering a composition having a concentration of solids content of 30 mass % or more through a hollow fiber filter having a pore size of 0.1 μm or less, wherein the composition comprises: (A) resin; (B) a photosensitizer;... Agent: Sughrue-265550

20070254244 - Method of forming a resist structure: The present invention includes a method of forming a resist structure comprising depositing a first photoresist material over a first layer. Selectively exposing portions of the first layer to light to provide exposed portions and unexposed portions in the first photoresist layer. Without developing the first photoresist layer, depositing a... Agent: Tung & Associates

20070254246 - Developer used for planographic printing plate material and processing method by use thereof: wherein R1 is a branched alkyl group having carbon atoms of not more than 20 which may be interrupted by —NH—; R2 is an alkylene group having carbon atoms of 1 to 10; and n is an integer of 2 to 100. There is also disclosed a method of processing... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070254245 - Poly (imide-azomethine ) copolymer, poly (amic acid-azomethine) copolymer , and positive photosensitive resin composition: e

20070254247 - Radiation-sensitive resin composition: A radiation-sensitive resin composition comprising (A) a resin which comprises at least one recurring unit (I-1), (I-2), or (I-3), and a recurring unit (II), and is insoluble or scarcely soluble in alkali, but becomes alkali soluble by action of an acid, (B) a photoacid generator, and (C) a polycyclic compound.... Agent: Merchant & Gould PC

20070254248 - Silver halide color photographic light-sensitive material: r

20070254249 - Photothermographic material: A photothermographic material, which includes: a support; and image forming layers containing a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, a polyhalogen compound, and a binder, on the support, wherein the number of the image forming layers provided is a least 2, at least one layer... Agent: Taiyo Corporation