Radiation imagery chemistry: process, composition, or product thereof inventions 10/07

20070248890 - Index contrasting-photoactive polymerizable materials, and articles and methods using same: The present invention provides a composition comprising at least one a photoactive index-contrasting polymerizable material, wherein the photoactive polymerizable material comprises at least one reactive functional group and at least one index-contrasting group, and wherein the photoactive polymerizable material includes one or more of the following parameters: (1) a distance... Agent: Jagtiani + Guttag

20070248893 - Method of forming a mask layout and layout formed by the same: A mask layout forming method includes designing an original layout in which a diagonal pattern of a first polygon is repeatedly arranged in a diagonal direction relative to a vertical-axis direction. Opposite edge sides of the diagonal pattern of the first polygon are corrected such that second polygons extending in... Agent: Townsend And Townsend And Crew, LLP

20070248891 - Method of manufacturing field emission display (fed) using half tone photomask: A method of manufacturing a Field Emission Display (FED) having a double gate structure using a half tone photomask includes sequentially forming a cathode material layer, a resistance material layer, and a photoresist on a substrate, arranging a half tone photomask on the photoresist, the half tone photomask having a... Agent: Robert E. Bushnell

20070248897 - Photomask blank: A photomask blank has a light-shielding film composed of a single layer of a material containing a transition metal, silicon and nitrogen or a plurality of layers that include at least one layer made of a material containing a transition metal, silicon and nitrogen, and has one or more chrome-based... Agent: Birch Stewart Kolasch & Birch

20070248894 - Resist material and pattern formation method using the same: wherein R1, R2 and R3 are the same or different and are a hydrogen atom, a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R is a... Agent: Mcdermott Will & Emery LLP

20070248899 - Pattern decomposition and optical proximity correction method for double exposure when forming photomasks: A pattern decomposition and optical proximity correction method for double exposure comprises defining second exposure patterns by performing a logical operation on target patterns and first exposure patterns, comparing the first and second exposure patterns with the target patterns by performing a logical operation on the first and second exposure... Agent: Townsend And Townsend And Crew, LLP

20070248901 - Electrophotographic photoconductor, image forming apparatus, and process cartridge: p

20070248892 - A method of aligning a first article relative to a second article and an apparatus for aligning a first article relative to a second article: A method and apparatus is described for aligning a first article relative to a second article, for example for aligning a nanoimprint template with a semiconductor wafer. The method comprises the steps of: providing said second article with at least one flexible structure fixed relative thereto at least one point,... Agent: Gifford, Krass, Sprinkle,anderson & Citkowski, P.c

20070248895 - Method for reduction of photomask defects: A method for reducing defect levels in a photomask by employing a cleaning process which does not degrade the photomask after multiple cycles of cleaning. The method is suitable for patterned metal stencil photomasks and phase shift photomasks. The method employs an alkaline aqueous cleaning solution for a particular time... Agent: Duane Morris LLPIPDepartment (tsmc)

20070248896 - Photoresist formulation for high aspect ratio plating: SU-8 photoresist compositions are modified to improve their adhesion properties by adding 1% to 6% of an adhesion promoter selected from the group consisting of glycidoxypropanetrimethoxysilane, mercatopropyltrimethoxysilane, and aminopropyltrimethoxysilane. SU-8 photoresist compositions are modified to improve their resistance to cracking and film stress by adding 0.5% to 3% of a... Agent: N. Kenneth Burraston Kirton & Mcconkie

20070248898 - Targets for alignment of semiconductor masks: Alignment of mask layers in semiconductor manufacturing is carried out by using alignment lines having at least one row of diffractively reflecting or scattering features on the lines. The features are made using a phase shift mask which, in combination with selected photoresist, suppresses second and higher order lobes, thereby... Agent: Schneck & Schneck

20070248900 - Developer, image forming apparatus and image forming method: i

20070248902 - Toner composition having dual wax: Included is an emulsion aggregation toner formulation having at least one latex and a combination of at least two waxes, wherein one wax is a synthetic wax, and another wax is a natural wax, and further including a developer containing a carrier and the just-described toner.... Agent: Patent Documentation Center

20070248903 - Toner: c

20070248904 - Process for preparing toner particles and toner particles: Toner particles are prepared by a process comprising providing an extrusion apparatus; adding resin particles and additive particles to a supply means in the extrusion apparatus; adding the resin particles and the additive particles to a blending chamber in the extrusion apparatus, which blending chamber is maintained at a temperature... Agent: Oliff & Berridge, PLC.

20070248905 - Two-layer film and method of forming pattern with the same: sequentially applying positive radiation-sensitive resin compositions 1 and 2 to form a two-layer laminate; subjecting the two-layer resist to single exposure and development to produce fine patterns having an undercut cross section; depositing and/or sputtering an organic or inorganic thin layer with use of the resist pattern as a mask;... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070248906 - Silver halide color photographic light-sensitive material: q

20070248907 - Apparatus and method for laser engraveable printing plates: An apparatus and method for calibration of laser ablating energy versus ablating depth for a laser ablateable printing plate in relation to materials forming the printing plate, includes a memory for storing data, for each of a plurality of materials, corresponding to correlated different detected depths of each of a... Agent: Richard M. Goldberg

20070248908 - Advanced chemically amplified resist for sub 30nm dense feature resolution: The present invention discloses a chemically amplified (CA) resist composition for printing features having a dimension of about 30 nm or less and a method of forming a material structure having a pattern containing features having a dimension of about 30 nm or less by using the inventive CA resist.... Agent: Scully Scott Murphy & Presser, PC

20070248911 - Pattern forming method and bilayer film: A pattern forming method comprising forming a coating of a radiation-sensitive resin composition, which contains an acid-dissociable group-containing polysiloxane, alkali-insoluble or scarcely alkali-soluble but becoming alkali-soluble when the acid-dissociable group dissociates, on a film containing a polymer with a carbon content of 80 wt % or more and a polystyrene-reduced... Agent: Merchant & Gould PC

20070248909 - Photosensitive composition for use in producing printing plate, and photosensitive printing original plate laminate and printing plate using the photosensitive composition: The present invention provides a photosensitive composition for use in producing a printing plate, and a photosensitive printing original plate laminate and a printing plate using the photosensitive composition, having durability to various types of printing inks and having excellent printability. The photosensitive composition includes at least a binder resin,... Agent: Knobbe Martens Olson & Bear LLP

20070248910 - Polyamide: wherein m and n represent an integer satisfying m≧1, n≧1, 2≦(m+n)≦150, 0.3≦m/(m+n)≦0.9, R1 and R2 represent at least one monovalent organic group containing a photopolymerizable unsaturated bond, X1 represents at least one tetravalent aromatic group, X2 represents at least one trivalent aromatic group, Y1 and Y2 represent at least one... Agent: Greenblum & Bernstein, P.L.C

20070248912 - Method and apparatus for thermal development with vapor treatment: This invention pertains to a method and apparatus for thermally developing a photosensitive element. The photosensitive element includes a composition layer capable of being partially liquefied upon heating. Heating the layer causes one or more organic compounds in the layer to form a vapor. Oxidation of the vapor forms carbon... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20070248915 - Method for manufacturing patterned thin-film layer: A method for manufacturing a patterned thin-film layer includes: providing a substrate having a plurality of banks on the substrate, with the banks and the substrate cooperatively defining a plurality of accommodating spaces; depositing ink having a solvent with high boiling temperature into each of the accommodating spaces using at... Agent: PCe Industry, Inc. Att. Cheng-ju Chiang Jeffrey T. Knapp

20070248914 - Method for contaminant removal: Method for removing contaminants from a surface during semiconductor fabrication. A preferred embodiment comprises developing a resist layer on a top surface of a semiconductor substrate, curing the developed resist layer, and cleaning the developed resist layer with a developer solution to remove contaminants. The cleaning makes use of the... Agent: Texas Instruments Incorporated

20070248913 - Process for producing film forming resins for photoresist compositions: The present invention provides a method for producing a film forming resin suitable for use in a photoresist composition by passing a solution of a film forming resin in a solvent through at least two filter sheets, one filter sheet comprising a particulate strong cationic or weak cationic ion exchange... Agent: Az Electronic Materials Usa Corp. Attention: Industrial Property Dept.

20070248916 - Resist pattern forming method, thin-film pattern forming method, and microdevice manufacturing method: A resist pattern forming method comprises the steps of plasma-processing a surface of an acid-feedable resist layer formed and patterned on a surface of a substrate in a gas atmosphere containing a fluorocarbon; attaching a resin composition crosslinkable in the presence of an acid to the plasma-processed surface of the... Agent: Oliff & Berridge, PLC

20070248917 - Method of manufacturing a device using a near-field photomask and near-field light: A method of manufacturing a device includes the steps of (i) providing a near-field photomask including a light shield film for constituting a light shield portion and openings formed in the light shield film, wherein the openings include two or more parallel first slit openings lengthening in a first direction... Agent: Fitzpatrick Cella Harper & Scinto

20070248918 - Compositions, systems and methods for imaging: Briefly described, embodiments of this disclosure include light directed imaging layers, light directed image recording media, and methods of preparation of each. One exemplary embodiment of the light directed imaging layer, among others, includes a matrix; a developer substantially dissolved in the matrix; a color former that is substantially insoluble... Agent: Hewlett Packard Company

20070248919 - Lithographic pellicle: The present invention provides a lithographic pellicle for optimal use in the liquid-immersion exposure-type photolithography that employs selectively only the inclinedly incident components of incident laser beams, the lithographic pellicle affording a broader range of inclined incidence transmissivity that can be used in a photolithographic procedure. A lithographic pellicle for... Agent: Lowe Hauptman Ham & Berner, LLP

20070243472 - Holographic recording medium, recording method thereof, reading method thereof, recording apparatus and reading apparatus for holograohic recording medium: A holographic recording medium 1 includes a holographic recording layer 7 having information recorded by use of recording beams L1, L2 and a two-state variable layer 5 arranged on one side of the holographic recording medium 1 where the recording beams L, L2 radiate from the holographic recording layer 7.... Agent: The Nath Law Group

20070243477 - Imaging member: The presently disclosed embodiments relate in general to electrophotographic imaging members, such as layered photoreceptor structures, and processes for making and using the same. More particularly, the embodiments pertain to a photoreceptor undercoat layer that includes titanium oxide with untreated surface to improve image quality.... Agent: Pillsbury Winthrop Shaw Pittman LLP

20070243473 - Hologram recording material and hologram recording medium: The present invention provides a hologram recording material which is not required to be subjected to pre-exposure treatment at the time of recording, attains high refractive index change, high sensitivity, low scattering, environment resistance, durability, low dimensional change, and high multiplicity, and is suitable for volume hologram recording. Also, the... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070243474 - Hologram recording material and hologram recording medium: The present invention provides a hologram recording material which attains high refractive index change, high flexibility, high sensitivity, low scattering, environment resistance, durability, low dimensional change and high multiplicity, and is suitable for volume hologram recording. Also, the present invention provides a hologram recording medium. A hologram recording material comprising:... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070243475 - Method for forming fine concavo-convex patterns, method for producing optical diffraction structure, and method for copying optical diffraction structure: A method for forming fine concavo-convex patterns by using a relief formation material 3 having a relief formation layer 2 composed of a resin having thermoplasticity and a relief pattern sheet 6 having on a surface thereof fine concavo-convex patterns 5, wherein a photothermal conversion layer 7 is formed in... Agent: Ladas & Parry LLP

20070243476 - Imaging member: The presently disclosed embodiments relate in general to electrophotographic imaging members, such as layered photoreceptor structures, and processes for making and using the same. More particularly, the embodiments pertain to a photoreceptor undercoat layer that includes polyol and aminoplast resins to improve image quality.... Agent: Pillsbury Winthrop Shaw Pittman LLP

20070243478 - Electrostatic image developing toner, electrostatic image developer, image forming method, image forming apparatus and printed matter: wherein R1CO— and R2CO— each independently represents a saturated or unsaturated acyl group having a carbon number of 16 to 24, which may have a hydroxyl group; R3 represents a linear or branched alkyl group having a carbon number of 1 to 3; and R4 represents a linear or branched... Agent: Oliff & Berridge, PLC

20070243479 - Electrostatic latent image carrier, electrostatic latent image developer and image forming apparatus: An electrostatic latent image carrier having core particles and a resin coating layer that coats the surface of the core particles, wherein the surface roughness of the core particles exhibits a surface roughness Sm that satisfies the expression Sm≦2.0 μm and a surface roughness Ra (compliant with JIS B0601) that... Agent: Oliff & Berridge, PLC

20070243481 - Aqueous dispersions for use as toners: A compound that includes an aqueous dispersion, wherein the dispersion includes a thermoplastic resin and at least one stabilizing agent, and at least one selected from the group consisting of a colorant and a magnetic pigment, wherein the dispersion has an average volume diameter particle size from about 0.05 to... Agent: Osha Liang LLP / Dow

20070243480 - Carrier compositions: Carrier includes a mixture of carrier particles. The mixture may contain first carrier particles containing carrier cores that are coated with a polymer coating, the coating containing polymer and conductive particles, and second carrier particles containing carrier cores that are not coated with a polymer coating. The mixture may contain... Agent: Oliff & Berridge, PLC.

20070243482 - Electrophotographic developer and carrier therefor, core material particle for carrier for electrophotographic developer and production method thereof and image forming method: The present invention can provide small-diameter core material particles for electrophotographic carrier, the particles that can prevent occurrences of carrier adhesions and reduce toner spent, have excellent durability and cause little fluctuations in image density with a narrow particle diameter distribution, and an efficient, cost-effective production method thereof. That is,... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070243483 - Fixing liquid, fixing device using the fixing liquid, and image forming apparatus comprising the fixing device: The present invention provides a fixing liquid for fixing microparticles containing a resin to a medium, a fixing device using this fixing liquid, and an image forming apparatus comprising this fixing device. The fixing liquid of the present invention is a fixing liquid for fixing resin microparticles to a medium,... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070243487 - Forming method of resist pattern and writing method of charged particle beam: e

20070243486 - Composition for forming adhesive layer and relief printing plate using the same, and method for manufacturing relief printing plate: A composition for forming an adhesive layer which results in strong adhesion force between a substrate and a photosensitive resin layer, and which does not cause transfer of the constituting components to the substrate, a relief printing plate using the same, and a method for manufacturing a relief printing plate... Agent: Knobbe Martens Olson & Bear LLP

20070243485 - Production process of polymerized toner: In a process for producing a polymerized toner, comprising Step 1 of preparing a polymerizable monomer composition and Step 2 of polymerizing the polymerizable monomer composition with a polymerization initiator to form colored polymer particles, Step 1 comprises Step A of finely dispersing the colorant in a liquid mixture containing... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070243488 - Resin composition: Provided is a resin composition that gives a molded article excellent in hardness and abrasion resistance and that is suitable for a photosensitive layer of an electrophotographic photoreceptor. This invention provides a resin composition containing an aromatic polycarbonate resin containing 90 to 100 mol% of a recurring unit from 1,1-bis(4-hydroxyphenyl)cyclohexane... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070243484 - Wet developable bottom antireflective coating composition and method for use thereof: The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer. The antireflective coating composition comprises a polymer, which comprises at least one monomer unit containing one or more moieties selected... Agent: Scully Scott Murphy & Presser, PC

20070243489 - Optical information-recording medium, method for recording information, and compound: e

20070243491 - Method of making a semiconductor with a high transmission cvd silicon nitride phase shift mask: A method for making a semiconductor device includes (a) providing a source of actinic radiation (601), (b) providing a mask formed from (i) a substrate that is substantially transparent to the actinic radiation, and (ii) a plurality of silicon nitride structures formed on the substrate using chemical vapor deposition and... Agent: Hamilton & Terrile, LLP

20070243490 - Prevention of plasma induced damage arising from etching of crack stop trenches in multi-layered low-k semiconductor devices: A method of fabricating a semiconductor device begins by forming a lower interconnection dielectric on a substrate and forming at least one active or passive device in the lower interconnection dielectric. An etch stop layer is formed on the lower interconnection dielectric and an interconnect stack layer is formed on... Agent: Mayer & Williams PC

20070243492 - Double exposure photolithographic process: A first high resolution pattern is defined in a first layer of photoresist on a work surface and portions of the first layer are removed to expose the pattern on the work surface. The exposed portions of the work surface and the remaining portions of the first layer are then... Agent: Morgan, Lewis & Bockius LLP

20070243493 - Method for manufacturing field emission substrate: A method for manufacturing a field emission substrate is disclosed. The method includes the following steps: providing a substrate having a conductive layer; forming a hydrophobic layer on the conduction layer; patterning the hydrophobic layer; and removing the hydrophobic layer from the surface of the conductive layer so that the... Agent: Bacon & Thomas, PLLC

20070243494 - Photoresist stripping solution and a method of stripping photoresists using the same: A photoresist stripping solution comprising (a) a carboxyl group-containing acidic compound, (b) at least one basic compound (for example, monoethanolamine, tetraalkylammonium) selected from among alkanolamines and specific quaternary ammonium hydroxides, (c) a sulfur-containing corrosion inhibitor and (d) water, and having a pH value of 3.5-5.5; and a method of stripping... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070238031 - Method for forming minute pattern and method for forming semiconductor memory device using the same: A method for forming a minute pattern includes depositing a material layer on a semiconductor substrate having a conductive region, forming a first mask layer on the material layer, forming a recess region in the first mask layer, performing layer processing to form a first mask pattern in the recess... Agent: Lee & Morse, P.C.

20070238030 - Pellicle for lithography: The invention provides a pellicle for lithography used in the photolithography, affording a wider range of transmissivity to inclinedly incident beams that can be used in a photolithographic procedure. The pellicle used in the photolithography using ArF excimer laser beams is characterized in that the pellicle has a pellicle membrane... Agent: Lowe Hauptman Ham & Berner, LLP

20070238026 - Holographic recording composition, optical recording medium and optical recording method: in the Structural Formula (1) shown above, X1 represents a hydrogen atom or a methyl group; Y1 represents an oxygen atom or NR10 (R10 represents a hydrogen atom or an alkyl group); L1 represents a divalent organic connecting group; n1 is an integer of 0 or 1; R1 to R9... Agent: Sughrue Mion, PLLC

20070238032 - Half-tone type phase-shifting mask and method for manufacturing the same: A half-tone type phase-shifting mask is disclosed. The mask includes a half-tone film disposed on a part on which a light-shielding pattern and a part on which a semi-light shielding pattern, and a light-shielding film disposed on the half-tone film residing in a part on which the light-shielding pattern. The... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070238027 - Method for generating alignment marks and related masks thereof: A method for generating alignment marks on a substrate is disclosed. The method includes: providing a mask, the mask includes at least one alignment mark set, wherein the alignment mark set includes a first alignment mark capable of being utilized in a first exposure machine and a second alignment mark... Agent: North America Intellectual Property Corporation

20070238033 - Reflection type photomask blank, reflection type photomask, and method of manufacturing semiconductor device using the same: In a reflection type photomask blank having a multilayer reflection film and a light absorption laminated layer laminated on a substrate, the light absorption laminated layer is composed by laminating a second light absorption layer having DUV light absorbing capacity and containing at least one of nitrogen and oxygen, and... Agent: Staas & Halsey LLP

20070238028 - Substrate treatment method and substrate treatment apparatus: An object of the present invention is to uniformly form a fine resist pattern with a desired dimension within a plane of a substrate. In a solvent vapor supply unit, a solvent vapor discharge nozzle is provided which can discharge a solvent vapor for swelling a resist pattern while moving... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070238029 - Underlayer coating forming composition for lithography containing naphthalene ring having halogen atom: There is provided an underlayer coating forming composition for lithography, and an underlayer coating having a high dry etching rate compared with photoresist, and causing no intermixing with the photoresist, which are used in lithography process of manufacture of semiconductor device. Concretely, it is an underlayer coating forming composition comprising... Agent: Oliff & Berridge, PLC

20070238034 - Color filter array and imaging device containing such color filter array and method of fabrication: A method and apparatus are disclosed which provide a color filter array for an imaging device in which the filters of the array are accurately positioned through the use of a patterned mask layer used to form filters for one color of the array. Additionally or alternatively, the color filter... Agent: Dickstein Shapiro LLP

20070238035 - Method and apparatus defining a color filter array for an image sensor: An apparatus and method to provide an imager having an array of color filter elements, each color filter element being separated from each other by spacers. The spacers can optically isolate filter elements from each other.... Agent: Dickstein Shapiro LLP

20070238036 - Dielectric, display equipped with dielectric, and method for manufacturing said dielectric: The present invention provides ern. The dielectric has a lower dielectric layer composed of a photosensitive composition and an upper dielectric layer, composed of a photosensitive composition formed on the above-mentioned lower dielectric layer, are included, with the transmittance of the above-mentioned upper dielectric layer to light used in a... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20070238037 - Imprint lithography: A method of making a substantial replica of a first imprint template which bears a first pattern is disclosed. The method includes filling recesses of the first pattern with a first material, removing the first material from the first imprint template to form a second imprint template which bears a... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070238038 - Exposure condition setting method, semiconductor device manufacturing method, and exposure condition setting program: A method of optimally setting exposure conditions when light emitted from an effective light source is applied to a mask pattern formed on a mask for exposure and diffracted light emitted from the mask is projected onto a substrate via a projection lens to expose the substrate thereto, the method... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070238039 - Synthesis of aromatic silicon-containing compounds: Methods are provided for preparing aromatic silicon-containing compounds. The methods include providing an aromatic starting material; reacting the aromatic starting material with a base to form an aromatic salt; and reacting the aromatic salt with a halo-alkylene-silane to form an aromatic silicon-containing compound. Compositions prepared by these methods, protective layers... Agent: Oliff & Berridge, PLC.

20070238040 - Developer: t

20070238041 - Image forming method using trickle developing system, developer used for the same, manufacturing method thereof, and image forming apparatus: A method to form an image using a trickle developing system, wherein (a) the toner comprises colorant particles with a volume median diameter of 3 to 8 μm having first inorganic particles on surfaces of the colorant particles to form toner particles; (b) the carrier comprises magnetic particles with a... Agent: Lucas & Mercanti, LLP

20070238042 - Oilless-fixing toner, and image forming method, apparatus and process cartridge using the oilless-fixing toner: wherein a total energy determined from a torque and a load of the screw blade is from 450 to 530 mJ when rotating in the oilless-fixing toner at 100 mm/s, and a ratio of total energy at 10 mm/s to total energy at 100 mm/s is from 2.0 to 3.0.... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070238043 - Developing method and developing assembly: A developing method is provided in which a developer is carried on a developer carrying member, a thin layer of the developer is formed thereon and a latent image on a latent image bearing member is developed with a developer. The developer is composed of magnetic toner particles containing a... Agent: Fitzpatrick Cella Harper & Scinto

20070238044 - Calcium oxide dispersion liquid and process for production thereof: A calcium oxide dispersion liquid contains calcium oxide fine particles having a median particle diameter (volume basis) of 1 to 200 nm and a maximum particle diameter of 10 to 1,000 nm, and an organic dispersion medium. The calcium oxide dispersion liquid is produced by filling calcium oxide fine particles,... Agent: Sughrue Mion, PLLC

20070238047 - Photosensitive resin composition for color filters: c

20070238049 - Planographic printing plate material and printing process: Disclosed is a planographic printing plate material comprising a support and provided thereon, a hydrophilic layer containing a light-to-heat conversion material and a thermosensitive image formation layer in that order, wherein the thermosensitive image formation layer contains a latex containing a hydrophobic component and a hydrophilic component as a protective... Agent: Lucas & Mercanti, LLP

20070238048 - Anti-reflective coating composition and production method for pattern using the same: The object of the present invention is to provide an anti-reflective coating composition having excellent coating properties while maintaining performance as an anti-reflective film. An anti-reflective coating composition comprising at least the following components (A), (B), (C), (D), and (E) and a production method for a pattern using the anti-reflective... Agent: Kratz, Quintos & Hanson, LLP

20070238046 - Laser marking: Individually generated laser beams are combined to provide a composite, co-focal output. Such beams, which are of two different wavelengths, are particularly suitable for laser marking applications. A particular embodiment is described which is useful for marking thermo-chromic materials overlaid with plastics comprising or containing polypropylene.... Agent: Dykema Gossett PLLC

20070238045 - Multi-layered radiation imageable coating: A radiation imageable coating includes a first thermochromic layer including a bleachable antenna dye and a second thermochromic layer including a non-bleachable antenna dye.... Agent: Hewlett Packard Company

20070238050 - Photosensitive composition and method for forming pattern using same: r

20070238051 - Blanket for a printing roll, method of manufacturing the same, patterning method using the same, and method of manufacturing liquid crystal display device: A blanket for a printing roll is disclosed that includes an Si-based resin layer and an acrylate film formed on one surface of the Si-based resin layer, wherein the acrylate film prevents a volatile solvent from permeating into the blanket, to thereby prevent the blanket from being deformed.... Agent: Brinks Hofer Gilson & Lione

20070238052 - Coating compositions for photolithography: In a first aspect, methods are provided that comprise: (a) applying a curable composition on a substrate; (b) applying a hardmask composition above the curable composition; (c) applying a photoresist composition layer above the hard mask composition, wherein one or more of the compositions are removed in an ash-free process.... Agent: Peter F.corless Rohm And Haas Electronic Materials LLC

20070238053 - Manufacturing method of semiconductor device: A manufacturing method includes forming a stacked film including first/second/third layers on a substrate, forming a first resist pattern on the stacked film, forming a first film pattern by etching the first layer through the first resist pattern, removing the first resist pattern, partially covering the first film pattern with... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070238054 - In-line process for making thin film electronic devices: An in-line process for making a thin film electronic device on a substrate is described comprising the steps of: a) depositing a structurable layer onto a substrate; b) depositing a patternable material onto the structurable layer in a first pattern; and c) etching the structurable layer in areas uncovered by... Agent: Howrey LLP

20070238055 - Method for manufacturing optical disk master, method for manufacturing optical disk, and apparatus for manufacturing optical disk master: A method for manufacturing an optical disk master, a method for manufacturing an optical disk, and an apparatus for manufacturing an optical disk master are provided. The method for manufacturing an optical disk master includes measuring the reflectance of laser light at each of a plurality of radius positions by... Agent: Bell, Boyd & Lloyd, LLP

20070238056 - Method and device for production of three-dimensional objects by means of electromagnetic radiation of electromagnetic radiation and application of an absorber by means of an ink-jet method: The present invention relates to a process for the bonding of material for the production of three-dimensional objects by means of selective heating via electromagnetic energy which is either non-coherent and/or non-monochromatic and/or non-oriented, with a wavelength of from 100 nm to 1 mm. This radiation may be emitted in... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070231714 - Photomask making method and semiconductor device manufacturing method: A photomask making method and a semiconductor-device manufacturing method to improve the uniformity of the line widths of patterns. A gate electrode pattern and a gate wiring pattern are formed in a first photomask used in a double exposure process, and shift patterns are formed in a second photomask. Then,... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070231715 - Photomask using separated exposure technique, method of fabricating photomask, and apparatus for fabricating photomask by using the method: A method of fabricating a photomask may include forming a light-shielding layer and a first resist film on a substrate, forming a first resist pattern by exposing first exposed regions of the first resist film to a first exposure source that may have a first energy, forming a first, light... Agent: Lee & Morse, P.C.

20070231721 - Electrophotographic photoreceptor, process cartridge, image forming apparatus and coating composition: The invention provides an electrophotographic photoreceptor comprising a conductive substrate having a photosensitive layer and a protective layer thereon, the protective layer comprising a crosslinked film having a phenolic structure, in which the relationship between a pH of the exfoliated protective layer extracted with distilled water (pHOCL) and a pH... Agent: Oliff & Berridge, PLC

20070231708 - Polymer compound, acid generator, positive resist composition, and method for formation of resist patterns: The invention provides a polymer compound capable of forming a positive resist composition that can form a high-resolution pattern with a reduced level of LER, an acid generator formed from such a polymer compound, a positive resist composition that includes such a polymer compound, and a method for forming a... Agent: Knobbe Martens Olson & Bear LLP

20070231712 - Alternating phase shift masking: An alternating phase shift mask may be formed using a dry undercut etch. The dry undercut etch reduces problems associated with wet etching of quartz or glass masks. In addition, the use of the dry undercut etch enables image balancing between the zero and pi apertures. This approach is not... Agent: Trop Pruner & Hu, PC

20070231713 - Anti-reflective coating for out-of-band illumination with lithography optical systems: As anti-reflective coating for out-of-band illumination in a lithography system is described. An optical element with such a coating may include a surface to reflect an intended waveband of light impinging on the optical element and a coating to reduce the reflection of light outside of the intended waveband.... Agent: Blakely Sokoloff Taylor & Zafman

20070231709 - Lithographic apparatus and patterning device: A mask for a lithographic apparatus is disclosed, the mask having a patterned region bearing a pattern to be transferred onto a substrate and a border surrounding the patterned region, wherein at least part of the border has a plurality of elements, the dimensions of the elements being such that,... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070231710 - Method and system for forming a photomask pattern: The present application is directed to methods of forming a photomask pattern for writing a photomask. In one embodiment, a method of the present application comprises providing a first pattern for forming an integrated circuit feature, adjusting the first pattern to form a second pattern that accounts for transition region... Agent: Texas Instruments Incorporated

20070231716 - Plasma etching chamber and method for manufacturing photomask using the same: A plasma etching chamber of a plasma etching apparatus used in an etching process for manufacturing a photomask and a method for manufacturing a photomask using the same. The plasma etching chamber includes an electrode having a supporting surface for supporting a photomask substrate and a top surface surrounding the... Agent: Volentine & Whitt PLLC

20070231711 - System and method for making photomasks: The present application is directed to methods of forming a phase pattern for an integrated circuit feature described in a design database as having a first target dimension. In one embodiment, the method comprises determining whether forming a phase pattern for the integrated circuit feature described in the design database... Agent: Texas Instruments Incorporated

20070231717 - Dynamic compensation system for maskless lithography: A method for dynamically registering multiple patterned layers on a substrate (3) comprises: depositing a first layer on the substrate; printing a first pattern (20) on the first layer; depositing a second layer on the first pattern; and printing a second pattern on the second layer while dynamically detecting the... Agent: Mark G. Bocchetti Patent Legal Staff

20070231718 - Toner, and image forming method: A toner includes toner particles containing at least a binder resin and a colorant, and inorganic fine particles. The shape factor SF-1 of the toner particles is in a specific range. The toner has a storage elastic modulus at 140° C., G′ (140° C.), in a specific range the toner... Agent: Fitzpatrick Cella Harper & Scinto

20070231719 - Electrophotographic photosensitive member, and image forming apparatus using same: The present invention relates to an electrophotographic photosensitive member including a cylindrical body and a photosensitive layer. The cylindrical body has provided with an outer circumference, end surfaces and chamfers formed therebetween. and aThe photosensitive layer is formed on the outer circumference of the cylindrical body. The photosensitive layer covers... Agent: Hogan & Hartson L.L.P.

20070231720 - Electrophotographic photoconductor, image forming method, image forming apparatus, and process cartridge: A preferred aspect of an electrophotographic photoconductor of the present invention contains a layer containing a hardened material which is prepared by polymerizing (A) a chain-polymerizable group-containing tertiary amine compound in which at least one alkyl group is bound to a nitrogen atom constituting an amine structure through chain polymerization.... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070231722 - Ferromagnetic material powder, carrier for electrophotographic developer, process for producing them and electrophotographic developer: A ferromagnetic material powder comprising a magnetic oxide which is a complex of a magnetite phase and a ferrite phase, wherein the ferromagnetic material powder has a spinel crystal structure and a magnetoplumbite crystal structure, and in the spinel crystal structure, the content of Fe3+ in site A is 35... Agent: Rothwell, Figg, Ernst & Manbeck, P.C.

20070231723 - Image forming apparatus, image forming method and toner: An image forming apparatus includes: an image carrying member, a toner feeding unit that forms a charged toner on a surface of the image carrying member, a toner image forming unit that forms a reversely charged toner image by applying charge to the charged toner according to image information, the... Agent: Morgan Lewis & Bockius LLP

20070231724 - Image forming apparatus, image forming method and toner: An image forming apparatus includes an image carrier; an electrostatic latent image forming unit; a developing unit; a color information applying unit; a transfer unit; a fixing unit; and a color forming unit, the toner containing a first component and a second component that are present in an isolated state... Agent: Morgan Lewis & Bockius LLP

20070231725 - Secure imaging toner and methods of forming and using the same: A toner for printing documents that are difficult to chemically or physically forge and that are readily easy to visually verify and methods of using and forming the toner are disclosed. The toner includes a colorant for printing an image on a surface of a document, a fluorescent pigment that... Agent: Snell & Wilmer LLP (oc)

20070231729 - Dry toner, method for producing dry toner, and method for forming an image: The toner having a significantly improved dispersibility of a colorant in toner particles is provided. The present invention provides a dry toner comprising: (i) a binder resin; (ii) a colorant; (iii) at least one of metallophthalocyanine and a metallophthalocyanine derivative having a central metal selected from the group consisting of... Agent: Fitzpatrick Cella Harper & Scinto

20070231726 - Positive electrified charge control agent and positive electrified toner for developing electrostatic image: (in the formula (I) and formula (II), [D-(SO3)2]2− is a bivalent anion of an organic acid having at least two sulfonic acid groups, p is 0 or 1, B is a bonding line when p is 0, B is a carbon atom or a nitrogen atom when p is 1,... Agent: Steptoe & Johnson LLP

20070231727 - Toner formulations containing extra particulate additive: The present invention relates to the use of extra particulate additives in selected chemically processed toner compositions for use in an image forming apparatus. The extra particulate additive may have a controlled aspect ratio and be combined with the chemically processed toner. The chemically processed toner may provide toner particles... Agent: Lexmark International, Inc. Intellectual Property Law Department

20070231728 - Toner formulations containing extra particulate additives: The present invention relates to toner compositions containing extra particulate additives. The additives may include a mixture of silica particles having differing BET surface areas and may include an acicular inorganic oxide. The control of such additives may be relied upon to control toner performance with respect to functional performance... Agent: Lexmark International, Inc. Intellectual Property Law Department

20070231730 - Radiation curable toner composition: The invention relates to dry toner particles comprising at least a radiation curable resin and a colouring agent, the radiation curable resin comprises a blend of a) an (meth)acrylated epoxy/polyester resin b) (meth)acrylated polyurethane resin. Preferably, when fused and cured toner images obtainable from said dry toner particles are obtained... Agent: Bacon & Thomas, PLLC

20070231731 - Ferrite carrier for electrophotographic developer, method for producing the same, and electrophotographic developer: A ferrite carrier for an electrophotographic developer having a compression breaking strength of 150 MPa or more, a rate of compressive change of 15.0% or more and a shape factor SF-1 of 100 to 125, a method for producing the same, and an electrophotographic developer containing the ferrite carrier.... Agent: Rothwell, Figg, Ernst & Manbeck, P.C.

20070231732 - Electrophotographic resin-coated ferrite carrier, method for producing the same, and electrophotographic developer: f

20070231733 - Image forming apparatus and image forming method: An image forming apparatus at least containing an electrophotographic photoconductor, a latent electrostatic image forming unit, a developing unit, a transferring unit, and a fixing unit, wherein a glass transition temperature of an outermost layer of the electrophotographic photoconductor is 100° C. or more, wherein the toner is obtained by... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070231737 - Decomposable resin composition and flexographic printing plate precursor using the same: A decomposable resin composition containing a metathesis catalyst and a polymer compound.... Agent: Sughrue-265550

20070231739 - Polymerizable negative planographic printing plate precursor, stack of planographic printing plate precursors, and method of producing polymerizable negative planographic printing plate precursor: A polymerizable negative planographic printing plate precursor including a hydrophilic support, and a polymerizable negative photosensitive layer and a protective layer containing polyvinylalcohol, organic resin fine particles (preferably, having an absolute specific gravity of 0.90 to 1.25 and an average particle diameter of 2.0 to 15 μm) and mica particles... Agent: Sughrue Mion, PLLC

20070231741 - Resist composition and patterning process: A positive resist composition comprising a resin component having a solubility in an alkaline developer that increases under the action of an acid, a compound capable of generating an acid in response to actinic radiation, and an acidic organic compound having a molecular weight of at least 150 exhibits a... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070231738 - Resist composition and patterning process using the same: There is disclosed a resist composition comprising, at least, a polymer including repeating units represented by the following general formula (1). There can-be provided a resist composition that has a good barrier property against water, prevents resist components from leaching to water, has high receding contact angle against water, does... Agent: Oliff & Berridge, PLC

20070231736 - Bottom antireflective coating composition and method for use thereof: The present invention discloses an antireflective coating composition for applying between a substrate surface and a photoresist composition. The antireflective coating composition of the present invention comprises a polymer, which includes at least one monomer unit containing a lactone moiety and at least one monomer unit containing an absorbing moiety.... Agent: Scully Scott Murphy & Presser, PC

20070231734 - Low activation energy dissolution modification agents for photoresist applications: A photoresist composition including a polymer, a photo acid generator and a dissolution modification agent, a method of forming an image using the photoresist composition and the dissolution modification agent composition. The dissolution modification agent is insoluble in aqueous alkaline developer and inhibits dissolution of the polymer in the developer... Agent: Schmeiser, Olsen & Watts

20070231735 - Negative photoresist compositions: where, W is a multivalent linking group, R1 to R6 are independently selected from hydrogen, hydroxyl, (C1-C20) alkyl and chlorine, X1 and X2 are independently oxygen or N—R7, where R7 is hydrogen or (C1-C20) alkyl, and n is and integer equal to or greater than 1, and c) at least... Agent: Sangya Jain Az Electronic Materials Usa Corp.

20070231740 - Planographic printing plate precursor and stack thereof: The present invention provides a planographic printing plate precursor, including: a support; and a photosensitive layer containing a polymerizable compound; an oxygen barrier layer; and a protective layer containing a filler (preferably an organic resin particle), the layers being formed in this order on the support. The present invention also... Agent: Sughrue Mion, PLLC

20070231742 - Optical information-recording medium: wherein A, B, C and D each represents an electron attractive group, wherein sum total of Hammett's σp values of A and B, and sum total of Hammett's σp values of C and D are respectively 0.6 or more, and A and B, or C and D may be linked... Agent: Sughrue Mion, PLLC

20070231743 - Optical media device with minipulatable read capability: An optical media device comprises a mask layer placed over a data layer, and that includes chemical ingredients designed to render the data layer unreadable by an optical reader in a first initial state, and allow the data layer to be read when converted to a second state. The mask... Agent: Jeffer, Mangels, Butler & Marmaro, LLP

20070231744 - Holographic recording medium: A holographic recording medium includes a recording layer containing a matrix material, a photoactive monomer having an ethylenic unsaturated bond dispersed in the matrix material and a photoinitiator, and a polymerization-terminating layer formed on at least one surface of the recording layer.... Agent: Nixon & Vanderhye, PC

20070231745 - Method for preparation of lithographic printing plate and lithographic printing plate precursor: A method for producing a lithographic printing plate comprising: imagewise exposing a lithographic printing plate precursor comprising: a hydrophilic support; a photosensitive layer containing a radical polymerizable compound having an isocyanuric acid group, a binder polymer having an acid value of 0.3 meq/g or less, a sensitizing dye having an... Agent: Sughrue-265550

20070231746 - Treating carbon containing layers in patterning stacks: Adherence between antireflective coating and a carbon containing hard mask may be improved by treating the carbon containing hard mask with a plasma. In some embodiments, using antireflective coatings, such as silicon dioxide, SiOxHy, SiOxNy, or organics, adherence to carbon containing hard masks may be improved by exposing the hard... Agent: Trop Pruner & Hu, PC

20070231747 - Radiation-sensitive negative resin composition: wherein R1 is a hydrogen atom or a methyl group; R2 is a linear, cyclic or aromatic hydrocarbon group of 6 to 12 carbon atoms, or a substituted hydrocarbon group wherein at least one hydrogen atom in the linear, cyclic or aromatic hydrocarbon group is substituted with a hydrocarbon group;... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070231749 - Method for forming a semiconductor device: A method for forming a gate structure includes providing a semiconductor substrate. A gate stack layer is formed on the semiconductor substrate. A first mask layer is formed on the gate stack layer. A second mask layer is formed on the first mask layer. A patterned photoresist is formed on... Agent: Quintero Law Office, PC

20070231748 - Patterning trenches in a photoresist layer with tight end-to-end separation: A method for forming two trenches with tight end-to-end spacing in a dielectric layer begins with providing a substrate having a dielectric layer. A hard-mask layer is deposited on the dielectric layer and a first photoresist layer is deposited on the hard-mask layer. The first photoresist layer is patterned to... Agent: Intel Corporation C/o Intellevate, LLC

20070231750 - Method of forming damascene structure: A method for forming a damascene structure utilizes dual hard mask layers and a thin etch stop layer, and does not require a sacrificial layer within the via. A floating etch stop layer can additionally be used. The dual hard masks may be formed of dielectric and neither of the... Agent: Patterson & Sheridan, LLP

20070231751 - Photoresist top coat out-of-band illumination filter for photolithography: An out-of-band illumination filter for use in photolithography in the form of a top coat on a photoresist is described. The top coat may used by applying a photoresist to a substrate, applying a top coat to the photoresist to prevent out-of-band illumination from exposing the photoresist, and exposing the... Agent: Blakely Sokoloff Taylor & Zafman

20070231752 - Method for shrinking opening sizes of a photoresist pattern: A method for shrinking opening sizes of a photoresist is provided. A patterned photoresist layer having an opening is formed on a substrate. The opening includes a first size. The photoresist layer is baked at a temperature below a glass transition temperature of the photoresist layer. A layer of SAFIER... Agent: Thomas, Kayden, Horstemeyer & Risley, LLP

20070231753 - Silver halide color photographic light-sensitive material: m

20070231754 - Black and white photothermographic material: The present invention provides a black and white photothermographic material having, on at least one side of a support, at least a photosensitive silver halide, a non-photosensitive organic silver salt, a color developing agent, and a coupler which reacts with an oxidation product of the color developing agent to form... Agent: Taiyo Corporation