Radiation imagery chemistry: process, composition, or product thereof inventions 08/07

20070202423 - Exposure apparatus, control method for the same, and device manufacturing method: An exposure apparatus includes a chamber where an optical element having a capping layer is arranged, and exposes a substrate by using the optical element. The exposure apparatus includes a supply unit which supplies a material to repair the capping layer into the chamber, and a providing unit which provides... Agent: Fitzpatrick Cella Harper & Scinto

20070202420 - Adjustable film frame aligner: A film frame aligner for automatically aligning a film frame includes a film frame support, a film frame pusher for pushing the film frame, and a film frame location mechanism for locating at least one notch in the film frame.... Agent: Dicke Billig & Czaja, PLLC Attn: Christopher Mclaughlin

20070202419 - Method for producing phase shifter masks: In a method for manufacturing a mask, a first area around a defect in a mask is coated with an organic material using an electron beam. The organic material is hardened in a second smaller area around the defect using the electron beam. Excess portions of the organic material are... Agent: Lerner And Greenberg, P.A.

20070202418 - Multi layer, attenuated phase shifting mask: The present invention provides an attenuated phase shift mask (“APSM”) that, in each embodiment, includes completely transmissive regions sized and shaped to define desired semiconductor device features, slightly attenuated regions at the edges of the completely transmissive regions corresponding to isolated device features, highly attenuated regions at the edges of... Agent: Trask Britt, P.C./ Micron Technology

20070202421 - Process for preparing a polymeric relief structure: The invention deals with a process for the preparation of a polymeric relief structure via electromagnetic radiation. In the process a compound is used that reduces the interfacial tension of the coated substrate. As a result the aspect ratio as well as the curvature of the surface are enhanced, and... Agent: Nixon & Vanderhye, PC

20070202422 - Undercoat composition: A binder containing a substituted fluorone can be utilized in an electrophotographic imaging member undercoat layer.... Agent: Carol L. Cole, Min, Hsieh & Hack, LLP

20070202424 - Magnetic toner: Provided is a magnetic toner comprising magnetic toner particles each comprising at least a binder resin and a magnetic iron oxide, the magnetic toner being excellent in developability and environmental stability, and being capable of reducing a toner consumption. A saturation magnetization σs and a remanent magnetization σr of the... Agent: Fitzpatrick Cella Harper & Scinto

20070202425 - Toner and image forming apparatus: Disclosed is a toner used for an image forming apparatus, comprising an organic photoreceptor as a latent image supporting material and a cleaning blade for removing a residual toner on the organic photoreceptor after a transfer process, wherein the friction coefficient between the organic photoreceptor and the toner is from... Agent: Clark & Brody

20070202426 - Two-component developer: An object of the present invention is to provide a two-component developer that suppresses burying of an external additive into toner particles and a change in charging performance of a toner with time, and secures stable development performance. To achieve this object, the two-component developer of the present invention including... Agent: Rabin & Berdo, PC

20070202427 - Toner, method for preparing the toner, developer including the toner, and image forming method and apparatus and process cartridge using the toner: A method for preparing a toner including providing toner particles including at least a binder resin; and contacting a coating fluid including a silicone resin and at least one of a super critical fluid and a sub-critical fluid with a surface of the toner particles to form thereon a layer... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070202430 - Carrier and developer for forming latent electrostatic images, associated apparatus and methodology: A carrier for a double component developer for developing latent electrostatic images at least contains a particulate core material having a weight average particle diameter (Dw) of from 25 to 45 μm and a magnetic moment of from 65 to 90 Am2/Kg at 1 KOe and a resin layer located... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070202429 - Carrier particles coated with a conductive coating: The carrier core is coated whit a conductive coating that is more conductive than the core. This coating conductive particles coated with conductive polymer.... Agent: Oliff & Berridge, PLC.

20070202428 - Coated carrier particles and processes for forming: Carrier core is coated with a coating containing polymer formed in the Presence of a surfactant and conductive particles coated with conductive polymer. The carrier may be formed by forming polymer particles by polymerization in the presence of a surfactant; dry-mixing carrier cores with a powder comprising the polymer particles... Agent: Oliff & Berridge, PLC.

20070202432 - Liquid developer and image forming apparatus: A liquid developer includes toner particles formed of a resin material and a coloring agent, and an insulation liquid in which the toner particles are dispersed, the insulation liquid containing ester-exchange oil obtained by an ester-exchange reaction of linseed oil and at least one of semidrying oil and nondrying oil.... Agent: Hogan & Hartson L.L.P.

20070202431 - Method of manufacturing liquid developer, liquid developer, and image forming apparatus: A method of manufacturing a liquid developer includes associating fine particles mainly containing a resin material so as to obtain associated particles, and disintegrating the associated particles in an insulation liquid so as to obtain toner particles.... Agent: Hogan & Hartson L.L.P.

20070202433 - Method of manufacturing toner: There is provided a method of manufacturing a toner, using a shearing force for granulation, in which bubbles are prevented from arising upon application of the shearing force, thus manufacturing a diameter-reduced toner having a particle diameter of about 5 μm which is favorable for enhancement in definition and resolution... Agent: Nixon & Vanderhye, PC

20070202438 - Light sensitive planographic printing plate material and its manufacturing process: Disclosed is a light sensitive planographic printing plate material comprising a support and provided thereon, a photopolymerizable light sensitive layer containing a siloxane surfactant and a protective layer containing one or more kinds of water-soluble polymers in that order, contact and of 25° C. water to the light sensitive layer... Agent: Frishauf, Holtz, Goodman & Chick, PC

20070202440 - Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions: Fluorocarbinol- and/or fluoroacid-functionalized silsesquioxane polymers and copolymers are provided. The polymers are substantially transparent to ultraviolet radiation (UV), i.e., radiation of a wavelength less than 365 nm and are also substantially transparent to deep ultraviolet radiation (DUV), i.e., radiation of a wavelength less than 250 nm, including 157 nm, 193... Agent: Mintz, Levin, Cohn, Ferris, Glovsky & Popeo, P.C.

20070202434 - Light sensitive coating compositions useful for lithographic elements: A radiation sensitive composition which is primarily sensitive in the near UV and visible region of the electromagnetic spectrum is composed of a polymeric binder, an ethylenically unsaturated monomer, a radiation absorbing compound, a photoaccelerator, an onium compound, and an adhesion promoter, which are overcoated with an oxygen barrier layer.... Agent: Alston & Bird LLP

20070202435 - Methods of forming optical waveguides: Provided are photosensitive compositions which are suitable for use in forming optical waveguides. The compositions include a polymer having units of the formula (RSiO1.5), wherein R is a substituted or unsubstituted organic group, and a photoactive component for altering the solubility of the polymer upon exposure to actinic radiation. The... Agent: Rohm And Haas Electronic Materials LLC

20070202437 - Photosensitive composition: wherein R11s are individually a group selected from the group consisting of a vinyl ether group, a vinyl ether skeleton-bearing group, an alkoxy group, a substituted hydroxyl group and hydroxyl group, at least one of R11s being a vinyl ether group or a vinyl ether skeleton-bearing group, R12 is a... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070202436 - Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns: Disclosed herein are compositions useful in forming organic active patterns that may, in turn, be incorporated in organic memory devices. The compositions comprise N-containing conjugated electroconductive polymer(s), photoacid generator(s) and organic solvent(s) capable of dissolving suitable quantifies of both the electroconductive polymer and the photoacid generator. Also disclosed are methods... Agent: Harness, Dickey & Pierce, P.L.C

20070202439 - Polymerizable composition and planographic printing plate precursor: wherein R1 represents a hydrogen atom or a methyl group; R2 represents a linking group which includes two or more atoms selected from a carbon atom, a hydrogen atom, an oxygen atom, a nitrogen atom and a sulfur atom and has a number of atoms of 2 to 82; A... Agent: Sughrue Mion, PLLC

20070202441 - Optical storage medium using nanoparticles: e

20070202443 - Method for processing lithographic printing plate precursor, plate inspection method, image quality control method and dyeing aqueous solution used therein: A method for processing a lithographic printing plate precursor, the method comprising: imagewise exposing a lithographic printing plate precursor, so as to form an exposed lithographic printing plate precursor; and then bringing the exposed lithographic printing plate precursor into contact with an aqueous solution containing a basic coloring matter, wherein... Agent: Birch Stewart Kolasch & Birch

20070202442 - Method and apparatus for merging a mask and a printing plate: A mask and a printing plate are merged using a first cylinder configured to receive the mask and a second cylinder configured to receive the printing plate. At least one of the first cylinder and the second cylinder are rotatable. The mask and printing plate are merged by at least:... Agent: Mark G. Bocchetti Patent Legal Staff

20070202444 - Resist pattern forming method and apparatus: A resist pattern forming method which uses resist pattern swelling technique and yet is capable of reducing CD dispersion. A resist pattern is formed on a substrate, and the substrate is left to stand or is baked. Subsequently, the substrate is applied with a swelling agent and then baked. After... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070202445 - Method for manufacturing micro structure: A method for forming a pattern includes the steps of: (a) preparing a lower hard mask layer and an upper hard mask layer stacked on an etching target film; (b) forming a resist pattern above the upper hard mask layer; (c) etching the upper hard mask film by using the... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070202446 - Semiconductor device fabrication method having step of removing photo-resist film or the like, and photo-resist film removal device: In the step of removing the photo-resist film formed on a substrate, dry ice particles, with a predetermined particle size, are blasted onto the photo-resist film at a predetermined pressure in a state of heating the substrate at room temperature or higher, such as 30 to 200° C., preferably at... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070202447 - Silver salt photothermographic dry imaging material and image forming method by use thereof: A method of processing a photothermographic material by a thermal processor is disclosed, wherein the photothermographic material comprises on one side of a support a light-sensitive layer containing an organic silver salt, silver halide grains, a binder and a reducing agent and a light-insensitive layer and on the other side... Agent: Lucas & Mercanti, LLP

20070202448 - Silver halide color photographic light-sensitive material: m

20070196745 - Exposure mask, method of forming resist pattern and method of forming thin film pattern: An exposure mask capable of improving resolution is provided. An exposure mask includes one slit-shaped main transmission region and three pairs of slit-shaped auxiliary transmission regions arranged in order in a direction perpendicular to the longitudinal direction of the main transmission region, each pair of auxiliary transmission regions facing each... Agent: Oliff & Berridge, PLC

20070196743 - Method for crystallizing amorphous silicon into polysilicon and mask used therefor: A mask for laser-crystallizing amorphous silicon into polysilicon is provided. The mask comprises a transparent substrate having a first block, a second block, and a third block with equal sizes. The second block is located between the first block and the third block. The first block includes a plurality of... Agent: Jianq Chyun Intellectual Property Office

20070196741 - Phase calibration for attenuating phase-shift masks: A phase metrology pattern for attenuating phase masks. The phase error of this pattern can be determined to high accuracy by aerial image measurements. This pattern can be used to create an optical phase standard for calibrating phase metrology equipment for attenuated phase masks, or as a witness pattern on... Agent: Ibm Microelectronics Intellectual Property Law

20070196747 - Grid-based resist simulation: A grid-based resist simulator predicts how a wafer coated with one or more resist layers will develop when exposed with a mask pattern. Image intensity values are calculated at a grid of points on the wafer, and the image intensity points are analyzed with a resist simulator that produces a... Agent: Klarquist Sparkman, LLP

20070196742 - Mask-patterns including intentional breaks: A method for determining a mask pattern to be used on a photo-mask in a photolithographic process is described. During the method, a target pattern that includes at least one continuous feature is provided. Then a mask pattern that includes a plurality of distinct types of regions corresponding to the... Agent: Wilson Sonsini Goodrich & Rosati

20070196744 - Method for producing a mask for the lithographic projection of a pattern onto a substrate: A layout is decomposed into partial patterns. An intermediate mask is drawn for each of the partial patterns. The intermediate masks are used in a mask stepper or scanner progressively for projection again into a common pattern on a test mask. A line width distribution LB(x,y) is determined from the... Agent: Edell, Shapiro & Finnan, LLC

20070196746 - Methods and apparatuses for applying wafer-alignment marks: Embodiments of the invention provide methods and apparatuses for efficient and cost-effective imaging of alignment marks. For one embodiment, alignment mark imaging is accomplished separately from, and independent of product imaging through use of a relatively low cost, low resolution, imaging tool. For one embodiment a wafer is exposed to... Agent: Intel/blakely

20070196748 - Process of making a semiconductor device using multiple antireflective materials: A lithographic structure consisting essentially of: an organic antireflective material disposed on a substrate; a vapor-deposited RCHX material, wherein R is one or more elements selected from the group consisting of Si, Ge, B, Sn, Fe and Ti, and wherein X is not present or is one or more elements... Agent: Connolly Bove Lodge & Hutz LLP (for IBM Yorktown)

20070196749 - Image bearing member, image forming method, and image forming apparatus: An image bearing member including a substrate, a photosensitive layer, provided overlying the substrate and a cross linking charge transport layer provided overlying the photosensitive layer, wherein the area of the photosensitive layer which is most distant from the substrate contains a charge transport material, a binder resin and a... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070196750 - Image bearing member, and image forming apparatus and process cartridge using the same: An image bearing member is provided, including a substrate and a surface layer formed by optically curing at least a radical polymerizable compound with a charge transport structure and a radical polymerizable monomer without a charge transport structure, wherein the transmission factor of the surface layer for light having a... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070196751 - Charge generating composition: A charge generating composition including at least one charge generating material, at least one polymer binder, and at least one styrene-containing copolymer is disclosed.... Agent: Carol L. Cole Min, Hsieh & Hack, LLP

20070196752 - Imaging member: An imaging member with a unique overcoat composition adapted for forming protective, scratch-resistant overcoats is disclosed. The overcoat composition comprises a binder component that includes particular proportions of a acrylated polyol and propylene glycol. The overcoat composition also comprises a transport agent and a crosslinking agent.... Agent: Richard M. Klein, Esq. Fay, Sharpe, Fagan, Minnich & Mckee, LLP

20070196753 - Image forming media containing reflecting pigment: The invention relates to an image forming media composition including an infrared reflecting pigment. The infrared reflecting pigment may be one that substantially absorbs light in the visible spectrum of about 400-700 nanometers and reflects greater than about 5.0% of light within the wavelength of about 700-2500 nanometers. The infrared... Agent: Lexmark International, Inc. Intellectual Property Law Department

20070196754 - Method of manufacturing toner and toner: In a method of manufacturing a toner in which toner particles are obtained by mixing resin particles and at least a colorant with each other to be coagulated, and heating an obtained coagulated product, binder resin is granulated into fine particles by a granulating method including a coarse particle preparing... Agent: Nixon & Vanderhye, PC

20070196755 - Toner with high strength magnetite: A toner having a high strength magnetite in an amount of from about 10 to about 40 weight percent, wherein the magnetite includes a material selected from the group consisting of FeO, Fe2O3, Fe3O4, gamma iron oxides, cobalt-gamma iron oxides, and mixtures thereof, and further including a developer having a... Agent: Patent Documentation Center

20070196756 - Method for manufacturing toner and toner: Resin particles containing at least binding resin and wax particles having a diameter of 30 to 600 nm are coagulated, and a resulting coagulated product is heated. Such wax particles are manufactured, for example, by way of a coarse particle preparing step, a slurry preparing step, a pulverizing step, a... Agent: Nixon & Vanderhye, PC

20070196759 - Electrostatic image developing toner: A toner comprising: (i) toner particles, each toner particle comprising a binder resin and a colorant; and (ii) an oxymonocarboxylic acid or a salt thereof, wherein a total content of the oxymonocarboxylic acid or the salt thereof in the toner is 10 to 173 ppm based on the total weight... Agent: Lucas & Mercanti, LLP

20070196758 - Toner for developing electrostatic image, developer for developing electrostatic image, and method for forming image: A toner for developing an electrostatic image comprises: a binder resin; and a releasing agent, wherein the binder resin comprises a polycondensation resin obtained by polycondensing a polycondensation monomer in the presence of a polycondensation catalyst, the releasing agent comprises a condensation compound obtained by condensing a condensation monomer in... Agent: Oliff & Berridge, PLC

20070196757 - Electrostatic latent image toner, and manufacture thereof, and electrostatic image developer, and image forming method: An electrostatic latent image toner in which the quantity within the toner of alkyl carboxylate esters formed from a carboxylic acid containing from approximately 3 to 5 carbon atoms and an alkyl group containing from approximately 3 to 5 carbon atoms is no more than approximately 4 ppm.... Agent: Oliff & Berridge, PLC

20070196760 - Toner composition comprising polyester toner particles encapsulating a wax and method of producing same: The invention pertains, in part, to a toner composition that is suitable for developing latent electrostatic images and being comprised of substantially spherical polyester particles with a volume average diameter in the range of 2-10 microns and which contain a wax component in the interior. The invention also pertains to... Agent: Susan P. Petraglia

20070196761 - Barrier rib and black top for plasma display panel and method of fabricating the same: A method of fabricating barrier ribs and black tops for a plasma display panel including sequentially laminating a photosensitive barrier rib material and a photosensitive black top material on a substrate, simultaneously exposing and developing the photosensitive black top material and the photosensitive barrier rib material in a predetermined pattern... Agent: Birch Stewart Kolasch & Birch

20070196762 - Scuff plate: To provide a scuff plate that produces no irregularity in illumination or light emission, a scuff plate 1 of the invention has a light emitting element 2 which has a pillar-like shape and of which a portion which makes up at least part of an outer circumferential side and extends... Agent: Posz Law Group, PLC

20070196763 - Method of forming laminated resist: There is formed a laminated resist which exhibits sufficient reflection reducing effect in a photolithography process using light of vacuum ultraviolet region and also has sufficient developing characteristics in a developing process. The method of forming the laminated photoresist comprises (I) a step for forming the photoresist layer (L1) on... Agent: Sughrue Mion, PLLC

20070196766 - Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition: wherein Z represents a monovalent organic group, when two Z's are present, the two Z's may be the same or different, and they may be bonded to each other to form a cyclic structure; X represents —CO— or —SO2—, when two X's are present, the two X's may be the... Agent: Sughrue-265550

20070196765 - Radiation-sensitive positive resin composition for producing platings, transfer film, and process for producing platings: The radiation-sensitive positive resin composition for producing platings includes a polymer (A) that has at least one end terminated with —SR (wherein R is a linear or branched alkyl group of 1 to 20 carbon atoms, a cyclic alkyl group of 3 to 20 carbon atoms, or a derivative thereof)... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070196764 - Resist composition for supercritical development: In a resist composition for supercritical development process, a development process is carried out by supercritical development process without alkali development process, and includes a base resin which is not removed by said supercritical developer in the presence of acid (A) and an acid generator which generates an acid upon... Agent: Knobbe Martens Olson & Bear LLP

20070196767 - Use of squaric acid dyes in optical layers for optical data recording: The present invention relates the use of squaric acid dyes in optical layers for optical data recording, preferably for optical data recording using a laser with a wavelength up to 450 nm. The invention further relates to a write only read many (WORM) type optical data recording medium capable of... Agent: Clariant Corporation Intellectual Property Department

20070196769 - Methods of forming patterns in semiconductor devices using photo resist patterns: Disclosed is a method of forming patterns in semiconductor devices by using photo resist patterns. These methods comprise forming photo resist patterns on a substrate. Inferior patterns are selected among the photo resist patterns. The inferior patterns are eliminated or shrunken by irradiating the selected inferior patterns with an electron... Agent: Myers Bigel Sibley & Sajovec

20070196768 - Charged particle beam projection method and program used therefor: A deposition energy distribution when a charged particle beam is made incident upon a resist film, is approximated by a sum of element distributions having Gaussian distributions. A pattern area density map partitioning the pattern layout plane into small regions, is defined for each element distribution. First and second sub-steps... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070196771 - Method of developing laser sensitive lithographic printing plate: A method of developing a laser sensitive lithographic printing plate with ink and/or fountain solution is described. The printing member comprises on a substrate a photosensitive layer soluble or dispersible in ink and/or fountain solution and capable of hardening upon exposure to a laser. The plate is exposed with a... Agent: Gary Ganghui Teng

20070196770 - Printing sleeve and method of manufacturing the same: The present invention is directed to the manufacture of “seamless” photosensitive printing elements from substantially planar printing plate blanks wrapped around cylindrical printing sleeves or carriers. The method comprises the steps of cutting a photosensitive printing element to a size for wrapping around a printing sleeve, trimming ends of the... Agent: John L. Cordani Carmody & Torrance LLP

20070196772 - Method for forming fine pattern of semiconductor device: A method for forming a fine pattern of a semiconductor device comprises: forming a photoresist layer including a first photoresist pattern region having a first pattern density and a second photoresist pattern region having a second pattern density which is denser than the first pattern density; performing an exposure process... Agent: Townsend And Townsend And Crew, LLP

20070196773 - Top coat for lithography processes: The present invention provides a top coat composition comprising a silicon-containing polymer prepared by hydrolysis and condensation of at least one silica source; a solvent; optionally a catalyst; and optionally water, wherein the silicon-containing polymer depolymerizes upon exposure to an aqueous base-containing solution.... Agent: Air Products And Chemicals, Inc. Patent Department

20070196774 - Exposure method and device manufacturing method: An exposure method is provided in which a substrate is favorably exposed in a state with a liquid being retained in a desired condition. An upper surface (1A) of a base material (1) that is used as the substrate (P) to be exposed via the liquid has an effective region... Agent: Oliff & Berridge, PLC

20070196775 - Removing solution for photosensitive composition: A removing solution for photosensitive composition for removal of colored pigment-containing photosensitive compositions, comprising at least one solvent selected from the group consisting of alkylene glycol monoalkyl ether carboxylic acid esters, alkoxycarboxylic acid esters and alicyclic ketones, at least one solvent selected from the group consisting of linear amides, cyclic... Agent: Sughrue Mion, PLLC

20070196776 - Stable high ph developer: Developer composition obtainable by (a) providing water, (b) dissolving such an amount of an alkaline component selected from alkali silicates, alkali hydroxides, Na3PO4, K3PO4, NR4OH, wherein each R is independently selected from C1C4 alkyl groups and C1-C4 hydroxyalkyl groups, and mixtures thereof in the water provided in step (a) that... Agent: Eastman Kodak Company Patent Legal Staff

20070196777 - Black and white photothermographic material: The present invention provides a black and white photothermographic material having, a first image forming layer including at least a photosensitive silver halide, a non-photosensitive organic silver salt, and a reducing agent for silver ions, wherein the black and white photothermographic material further has a second image forming layer including... Agent: Taiyo Corporation

20070196778 - Black and white photothermographic material: e

20070196779 - Black and white photothermographic material:

20070190434 - Pattern forming method and phase shift mask manufacturing method: A phase shift mask manufacturing method comprises the steps of processing a light-shielding layer over a transparent substrate into a predetermined light-shielding pattern, forming a resist film on the predetermined light-shielding pattern, performing writing on the resist film based on writing data and developing the resist film, thereby forming a... Agent: Sughrue Mion, PLLC

20070190435 - Dye-containing photosensitive composition, color filter using the same, and production method thereof: The present invention provides a dye-containing photosensitive composition that includes at least phthalocyanine, a photosensitive compound, and a transition metal complex of which the molar absorption coefficient ε in a visible light region is less than 5000.... Agent: Sughrue Mion, PLLC

20070190438 - Method and apparatus for controlling light intensity and for exposing a semiconductor substrate: In an embodiment, a method of controlling a light intensity includes measuring a critical dimension distribution of a pattern on a substrate. The critical dimension distribution is formed using a first illumination having a first intensity distribution, which is irradiated onto the substrate through a photo mask. A second intensity... Agent: Marger Johnson & Mccollom, P.C.

20070190439 - Electrophotographic photoreceptor and electrophotographic imaging apparatus employing the photoreceptor: An electrophotographic photoreceptor including a photosensitive layer which includes a titanyl phthalocyanine crystal having a major absorption peak at a wavelength of 780 nm±10 nm and a minor absorption peak having an intensity of ¾ or less of the major absorption peak at 690 nm±10 nm in the visible-infrared absorption... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.

20070190433 - Mask and exposure apparatus: An exposure apparatus transfers a pattern from a mask onto a sensitive substrate. A film protects the mask, and a film frame, between the mask and the film, holds the film spaced away from a surface of the mask. The film has a first transmittance for radiation of a necessary... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070190432 - Method and apparatus for fabricating semiconductor chips using varying areas of precision: A system that fabricates a semiconductor chip. The system places patterns for components which require fine line-widths within a high resolution region of a reticle, wherein the high resolution region provides sharp focus for a given wavelength of light used by the lithography system. At the same time, the system... Agent: Sun Microsystems Inc. C/o Park, Vaughan & Fleming LLP

20070190430 - Photo-mask stage: A photo-mask stage of an exposure apparatus includes a fixed component to fix a first photo-mask, an exchanging component, which is able to assemble or to disassemble with the fixed component for fixing a second photo-mask.... Agent: North America Intellectual Property Corporation

20070190431 - Photomask structure: A photomask structure is described, including a substrate having multiple half-tone phase shift patterns on a device region and multiple opaque patterns on a die seal ring region. By using the photomask, a side lobe effect does not occur to the photoresist layer corresponding to the die seal ring region... Agent: T-conn Precision Corporation

20070190436 - Resist composition: A resist composition which is stable relative to solvents used in immersion lithography processes and displays excellent sensitivity and resist pattern profile, and a method of forming a resist pattern that uses such a resist composition are provided. The resist composition is in accordance with predetermined parameters, or is a... Agent: Knobbe Martens Olson & Bear LLP

20070190437 - Substrate processing apparatus: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block, and an interface block. An exposure device is arranged adjacent to the... Agent: Ostrolenk Faber Gerb & Soffen

20070190440 - Toner for electrostatic image development: A toner for electrostatic image development containing a resin binder, a charge control agent, and a colorant, and wherein the charge control agent contains a metal complex of a salicylic acid compound and a quaternary ammonium salt of a carboxylic acid. The toner for electrostatic image development of the present... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070190445 - Toner for use in electrostatic image development: An electrostatic image developing toner is disclosed, comprising a resin and a colorant, wherein the toner contains at least one iminocarboxylic acid or its salt in an amount of from 26 to 388 ppm by mass.... Agent: Lucas & Mercanti, LLP

20070190442 - Toner, and developer, image forming method, image forming apparatus, and process cartridge using the toner: A toner is provided prepared by a wet granulation method, comprising a binder resin and a colorant, wherein the toner adsorbs ammonia (NH3) in an amount of from 70 to 400 μmol/m2 per unit of specific surface area and carbon dioxide (CO2) in an amount of not greater than 10... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070190441 - Toner composition: Toner compositions having high molecular weight and improved melt flow are provided.... Agent: George Likourezos

20070190443 - Toner, and image forming method and apparatus and process cartridge using the toner: A toner including toner particles including a binder resin, a colorant and a release agent, and an external additive including a first particulate inorganic material having a formula of MgxSiyOx+2y where each of x and y is an integer, and a number average secondary particle diameter of from 0.02 μm... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070190444 - Toner, developer, toner-containing container, process cartridge, image-forming apparatus and image-forming process: Toners, developers, toner-containing containers, process cartridges, image forming apparatuses and image forming processes are provided that may maintain proper transfer ability and cleaning property for long period, exhibit less image fluctuation, and represent less embedding of external additives even under stirring the developer at use, and also afford stable flowability... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070190454 - Photoresist composition, method of patterning thin film using the same, and method of manufacturing liquid crystal display panel using the same: n

20070190456 - Planographic printing plate material: An objective is to provide a planographic printing plate material exhibiting excellent developability, printing durability, together with excellent oxygen-shielding layer adhesion and moisture dependence after exposure. Disclosed is a planographic printing plate material possessing a support provided thereon, a photosensitive layer, wherein the photosensitive layer comprises (A) at least two... Agent: Lucas & Mercanti, LLP

20070190457 - Resist composition and patterning process using the same: A resist composition is provided comprising a silicone resin, a photoacid generator, a nitrogen-containing organic compound, and a solvent. The silicone resin is obtained through cohydrolytic condensation of a mixture of three silane monomers containing a fluorinated norbornane group, an organic group having a carboxyl group protected with an acid... Agent: Birch Stewart Kolasch & Birch

20070190458 - Resist composition and patterning process using the same: A resist composition is provided comprising a silicone resin, a photoacid generator, a nitrogen-containing organic compound, and a solvent. The silicone resin is obtained through cohydrolytic condensation of a mixture of three silane monomers containing a norbornane group having hexafluoroisopropyl alcohol, an organic group having a carboxyl group protected with... Agent: Birch Stewart Kolasch & Birch

20070190459 - Resist underlayer coating forming composition for mask blank, mask blank and mask: There is provided a resist underlayer coating forming composition used in processes for manufacturing a mask blank and a mask, and a mask blank and a mask manufactured from the composition. The resist underlayer coating forming composition comprises a polymer compound having a halogen atom-containing repeating structural unit and a... Agent: Oliff & Berridge, PLC

20070190451 - Calixresorcinarene compounds, photoresist base materials, and compositions thereof: e

20070190452 - Flexographic printing plate precursor and imaging method: A laser imageable flexographic printing plate precursor comprises a thermoset elastomeric upper layer that is at least partially ablatable and comprises a radiation sensitive compound, and a non-ablatable elastomeric underlayer. This flexographic printing plate precursor can be imaged to provide a printing plate that is primarily useful for “high quality”... Agent: Paul A. Leipold Patent Legal Staff

20070190446 - Lithographic printing original plate and lithographic printing plate: An object of the present invention is to provide a lithographic printing plate with a hydrophilic layer mainly made from resins which has a photosensitivity to the light in near infrared region, on which images can be printed directly with laser beam, requiring no development and wiping off operation, and... Agent: Birch Stewart Kolasch & Birch

20070190450 - Negative radiation-sensitive resin composition: It is an object of the present invention to provide a process capable of precisely producing a plated shaped article of a large thickness such as a bump or a wiring, a negative radiation-sensitive resin composition which is preferably used for the process and has excellent sensitivity and resolution, and... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070190447 - Photoresist composition and method of forming resist pattern:

20070190455 - Positive type resist composition and resist pattern formation method using same: A positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the... Agent: Knobbe Martens Olson & Bear LLP

20070190448 - Positive-type resist composition for liquid immersion lithography and method for forming resist pattern: The present invention relates to a positive-type resist composition for liquid immersion lithography and a method of forming a resist pattern, in particular, a positive-type resist composition for liquid immersion lithography that exhibits superior liquid immersion resistance to water; and a method for forming a resist pattern by thereof. The... Agent: Hoffmann & Baron, LLP

20070190453 - Resist cover film-forming material, process for forming resist pattern, semiconductor device and process for manufacturing the same: The present invention can provide a resist cover film-forming material which is suitably used for a resist cover film for liquid immersion exposure and can transmit ArF excimer laser lights and provide a process for forming a resist pattern using the resist cover film-forming material. The resist cover film-forming material... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070190449 - Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer: In formulas (1) and (2), n represents an integer of 2 to 24; J represents a single bond or a divalent hydrocarbon group which may have a substituent/heteroatom when n=2, or represents an n-valent hydrocarbon group which may have a substituent/heteroatom when n≧3; E represents a residue of a polymerization... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070190460 - Optical recording/reproducing method: An optical recording/reproducing method and an optical recording medium capable of performing excellent optical recording with a simple structure in a recording layer made of environmentally friendly materials. The optical recording medium has a recording layer on a substrate. The recording layer has a pair of dielectric layers of which... Agent: Oliff & Berridge, PLC

20070190461 - Material for forming exposure light-blocking film, multilayer interconnection structure and manufacturing method thereof, and semiconductor device: (where R1, R2 and R3 may be the same or different, at least one of R1, R2 and R3 represents a hydrogen atom and the others represent any one of an alkyl group, alkenyl group, cycloalkyl group and aryl group which are optionally substituted, and n is an integer of... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070190463 - Method to align mask patterns: Alignment tolerances between narrow mask lines, for forming interconnects in the array region of an integrated circuit, and wider mask lines, for forming interconnects in the periphery of the integrated circuit, are increased. The narrow mask lines are formed by pitch multiplication and the wider mask lines are formed by... Agent: Knobbe Martens Olson & Bear LLP

20070190462 - Substrate processing method, substrate processing apparatus, and manufacturing method of semiconductor device: A substrate processing method including while a liquid is supplied between a processing target substrate to be applied with exposure treatment and a projection optical system of an exposure apparatus for carrying out the exposure treatment, prior to providing a resist film on a first main face of the processing... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070190465 - Positively radiation-sensitive resin composition: It is an object of the present invention to provide a production process capable of precisely producing a plated shaped article of a large thickness such as a bump or a wiring, a positive radiation-sensitive resin composition which is preferably used for the process and has excellent sensitivity and resolution,... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070190466 - Manufacturing method for pixel structure: A manufacturing method for a pixel structure is provided. The method includes the following steps. A first photomask is used to form a source/drain on a substrate. A second photomask is used twice to form a transparent conductive layer and a channel layer on the substrate respectively. The transparent conductive... Agent: J.c. Patents, Inc.

20070190467 - Silver halide photographic material and image-forming method using the same: An image-forming method of recording a digital image data in resolution of 2,000 dpi or more, the method comprising: recording a digital image data on a silver halide photographic material with little deterioration.... Agent: Birch Stewart Kolasch & Birch

20070190468 - Photothermographic materials incorporating arylboronic acids: Incorporation of certain arylboronic acid compounds into photothermographic materials provides materials with reduced initial image Dmin and improved hot-dark Dmin print stability without unacceptable loss in sensitometric properties.... Agent: Carestream Health Inc,

20070184361 - Photomask, pattern formation method using the same and mask data creation method: A principal pattern made of a plurality of isolated transparent portions is formed in a light-shielding portion disposed on a transparent substrate having a transparent property against exposing light. The principal pattern includes a first principal pattern and a second principal pattern adjacent to each other at a given distance,... Agent: Mcdermott Will & Emery LLP

20070184362 - Method of fabricating color filter: A method of manufacturing a color filter forming a black matrix on a substrate, the black matrix defining a plurality of pixels, forming liquid ink layers within the pixels and drying the liquid ink layers, penetrating solvent vapor into surfaces of the dried liquid ink layers to form ink layers... Agent: Stanzione & Kim, LLP

20070184363 - Method of manufacturing a black matrix of color filter: A method of manufacturing a black matrix of a color filter includes forming a light-shielding layer of a hydrophobic organic material on a surface of a transparent substrate, forming a blocking layer of a fluorinated resin on a top surface of the light-shielding layer, patterning the light-shielding layer and the... Agent: Stanzione & Kim, LLP

20070184365 - Patterning method and manufacturing method for a display device: A patterning method includes coating a photosensitive surface active agent on a base film, forming an organic layer on the surface active agent, decreasing adhesion between the surface active agent and the organic layer by exposing light through a mask having a predetermined opening on the organic layer, adhering the... Agent: Macpherson Kwok Chen & Heid LLP

20070184367 - Liquid crystal display device and manufacturing method thereof: An exemplary liquid crystal display (“LCD”) device and a manufacturing method thereof are capable of improving a drop margin of liquid crystal. The LCD device according to an exemplary embodiment of the present invention include first and second substrates that are assembled with liquid crystal disposed therebetween, an organic layer... Agent: Cantor Colburn, LLP

20070184371 - Image forming method, liquid developing device, and image forming apparatus: An image forming method includes: by using a plurality of liquid developers having different colors, forming a plurality of single color images corresponding to the colors; transferring a non-fixed color image onto a recording medium; and fixing the non-fixed color image onto the recording medium. In the image forming method,... Agent: Hogan & Hartson L.L.P.

20070184353 - Volume hologram recording material and volume hologram recording medium: A volume hologram recording material is provided that has high sensitivity, good storage stability after recording, and a large interference fringe refractive index difference, the material being used for forming a volume hologram recording film desirable as a data recording system. A volume hologram recording medium comprising same is also... Agent: Sughrue Mion, PLLC

20070184356 - Apparatus and methods for measuring shape of both sides of a plate: In an apparatus for measuring shapes of both sides of a plate, a measuring apparatus body includes a reference plane of a longitudinal surface plate disposed in an almost vertical state at one end on a metallic bed, a holding mechanism for holding a plate to be measured in almost... Agent: Dla Piper US LLP

20070184355 - Cross-shaped sub-resolution assist feature: Cross-shaped sub-resolution assist features may be utilized to print lithographic patterns in semiconductor fabrication processes. The crosses may be isolated structures or may be part of a grid arrangement. The main features, such as contacts, may be positioned on the mask so as to be intersected by the cross-shaped sub-resolution... Agent: Trop Pruner & Hu, PC

20070184358 - Micro-patterned sio2/tio2 films through photo and chemical reactions: A method for making a patterned SiO2 films over TiO2 (SiO2/TiO2) under ambient atmospheric conditions, including room temperature, through photo and chemical reactions. The method is simple, convenient and can be performed in a short period of time, typically less than two hours. The patterned TiO2 film is fabricated through... Agent: Smith Hopen, Pa

20070184360 - Photomask features with interior nonprinting window using alternating phase shifting: Aspects of the present invention provide for a novel photomask for patterning features for an integrated circuit, the photomask including masked features having interior nonprinting windows. In some embodiments, the interior nonprinting window is an alternating phase shifter, while the area surrounding the masked features transmits light unshifted. In other... Agent: Vierra Magen/sandisk Corporation

20070184359 - Photomask, pattern formation method using photomask and mask data creation method: A mask pattern includes a main pattern to be transferred through exposure and an auxiliary pattern that diffracts exposing light and is not transferred through the exposure. The main pattern is made from a shielding portion, a phase shifter or a combination of a semi-shielding portion or a shielding portion... Agent: Jack Q. Lever, Jr. Mcdermott, Will & Emery

20070184354 - Process for etching photomasks: Method and apparatus for etching a metal layer disposed on a substrate, such as a photolithographic reticle, are provided. In one aspect, a method is provided for processing a substrate including positioning a substrate having a metal layer disposed on an optically transparent material in a processing chamber, introducing a... Agent: Patterson & Sheridan, LLP

20070184357 - Systems, masks, and methods for photolithography: Photomask patterns are represented using contours defined by mask functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to... Agent: Wilson Sonsini Goodrich & Rosati

20070184366 - Dye containing curable composition, color filter, and process of preparing color filter: The present invention provides a dye-containing curable composition a dye-containing curable composition containing at least an alkali soluble binder, an organic-solvent-soluble dye, a radiation-sensitive compound and a metal complex of a transition element in which the maximum value of a molar absorption coefficient ε in a visible light range is... Agent: Sughrue Mion, PLLC

20070184364 - Method for manufacturing color filter: The main object of the present invention is to provide a method for manufacturing a color filter, capable of having the surface of the pixel part flatly even in the case a pixel part is formed by an ink discharging method, and the thickness of each pixel part evenly. In... Agent: Seyfarth Shaw LLP

20070184369 - Lithography verification using guard bands: A method for verifying a lithographic process is described. During the method, a set of guard bands are defined around a target pattern that is to be printed on a semiconductor die using a photo-mask in the lithographic process. An estimated pattern is calculated using a model of the lithographic... Agent: Wilson Sonsini Goodrich & Rosati

20070184368 - Projection optical system and projection-type image display apparatus: There is a need for providing a projection optical system that is appropriate for maintaining high resolution with low distortion, miniaturizing a reflector, decreasing the number of reflectors, and decreasing the depth and the bottom (or top) of a display used for a rear projection television, for example. The projection... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070184370 - Dry toner, method for manufacturing the same, image forming apparatus, and image forming method: A dry toner contains fine particles having average sphericity of 0.93 to 0.99, a content of the fine particles having a particle diameter of 2 μm or less in the dry toner is 20% by number or less. A method for manufacturing a dry toner includes a process for dispersing... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070184372 - Toner and method for forming image: A magenta toner is provided which contains at least a binder resin, a colorant, and a wax, in which a maximum heat-absorption peak temperature as measured using a differential scanning calorimeter, a reflectance at a predetermined wavelength when measured in a powder state by spectroscopic analysis, and lightness when measured... Agent: Fitzpatrick Cella Harper & Scinto

20070184373 - Fractal skr-method for evaluating image quality: This invention provides an improved method for evaluating the quality of images using a test Skr-matrix system. The index k refers to the fractal level in an Skr-matrix, having matrices themselves as elements. The index r≦k refers to the Kronecker sub-level to which a typical internal sum structure is present.... Agent: Knobbe Martens Olson & Bear LLP

20070184375 - Electrostatic charge image developing toner and image forming method: An object is to provide an electrostatic charge image developing toner and an image forming method using the same capable of maintaining image properties for a long duration, which exhibit not only sufficient transparency and chromaticness, accompanied with high color reproduction and excellent charging characteristic, but also excellent heat resistance,... Agent: Lucas & Mercanti, LLP

20070184374 - Electrophotographic toner: An electrophotographic toner is disclosed, comprising a binding resin, a colorant and a releasing agent, wherein the releasing agent comprises a first releasing agent component and a second releasing agent component, the first releasing agent component is a straight chain hydrocarbon compound exhibiting a melting point of 50 to 100°... Agent: Lucas & Mercanti, LLP

20070184376 - Method of preparing electrophotographic developer: A method of preparing a nonmagnetic one-component pulverized color electrophotographic developer, includes: preparing a master batch by melt-kneading at least two binder resins and wax; and melt-kneading a mixture of the master batch, a colorant, and a charge control agent. According to the method, paper jams can be decreased and... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.

20070184377 - Image forming apparatus, and toner and developer used therein: m

20070184378 - Liquid developer: A liquid developer of the type that is positively-charged is provided. The liquid developer includes an insulation liquid, and toner particles dispersed in the insulation liquid, wherein each of the toner particles includes a toner matrix particle mainly made of a polyester resin and a positively-charged polymeric dispersant adhering to... Agent: Hogan & Hartson L.L.P.

20070184384 - Novel sulfonium compound, photosensitive composition containing the compound and pattern-forming method using the photosensitive composition: wherein R1 to R13 each independently represents a hydrogen atom or a substituent, and at least one of R1 to R13 is a substituent containing an alcoholic hydroxyl group; Z represents a single bond or a divalent linking group; and X− represents a counter anion; and a pattern-forming method using... Agent: Sughrue-265550

20070184383 - Photosensitive composition, photosensitive planographic printing plate material, and recording method of planographic printing plate material: e

20070184381 - Lithographic printing plates with high print run stability: Radiation-sensitive element comprising (a) an optionally pretreated substrate and (b) a radiation-sensitive coating consisting of a composition comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a freeradical polymerization, (ii) at least one radiation-sensitive initiator or initiator... Agent: Eastman Kodak Company Patent Legal Staff

20070184380 - Negative-working radiation-sensitive compositions and imageable materials: A radiation-sensitive composition includes a radically polymerizable component and a borate initiator composition capable of generating radicals sufficient to initiate polymerization of the radically polymerizable component upon exposure to imaging radiation. This composition also includes a radiation absorbing compound (such as an IR-sensitive dye), a polymeric binder comprising a polymer... Agent: Paul A. Leipold Patent Legal Staff

20070184379 - Peeling-off method and reworking method of resist film: A processing method of a substrate includes: a step of forming an Si—C based film and a resist film in turn on an objective film to be etched that has been formed on a substrate; a first etching step of etching the Si—C based film making use of the resist... Agent: Smith, Gambrell & Russell

20070184382 - Salt suitable for an acid generator and a chemically amplified resist composition containing the same: The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I), and a resin which contains a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution... Agent: Birch Stewart Kolasch & Birch

20070184385 - Ultra high-density recordable optical data recording media: An ultra high-density recordable optical data recording media that which adds a near-field electromagnetic field enhancement layer between a substrate and a recording layer, by using the resonance enhancement effect produced between the near-field electromagnetic field enhancement layer and the recording layer to read very small recording marks (less than... Agent: Birch Stewart Kolasch & Birch

20070184386 - Optical recording material and optical recording medium: The present invention provides a high level optical recording material which is capable of recording and reading by a blue laser with a short wavelength. An optical recording material comprises an organic dye compound A whose absorption maximum wavelength (λmax) is not less than 340 nm and not more than... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070184388 - Developing solution for lithographic printing plate precursor and method for preparing lithographic printing plate: A method for preparing a lithographic printing plate comprising the steps of light-exposing a presensitized plate for use in making a lithographic printing plate, and developing the light-exposed plate with an alkaline developing solution comprising a polyoxyalkylene adduct of alkylene diamine, and at least one selected from the group consisting... Agent: Buchanan, Ingersoll & Rooney PC

20070184387 - Method for preparation of lithographic printing plate and lithographic printing plate precursor: A method for preparing a lithographic printing plate comprising: exposing a lithographic printing plate precursor comprising a hydrophilic support, a photosensitive layer containing a sensitizing dye having an absorption maximum in a wavelength range of from 350 to 450 nm represented by the formula (I) as defined herein, a polymerization... Agent: Sughrue-265550

20070184390 - Exposure method: An exposure method includes the steps of illuminating a mask that has a contact hole pattern using an illumination light, and projecting, via a projection optical system, the contact hole pattern onto a substrate to be exposed, wherein three lights among diffracted lights from the contact hole pattern interfere with... Agent: Morgan & Finnegan, L.L.P.

20070184389 - Method of forming a printhead: A method of manufacturing a printhead includes providing a polymeric substrate having a surface; providing a patterned material layer on the surface of the polymeric substrate; and removing at least some of the polymeric substrate not covered by the patterned material layer using an etching process.... Agent: Mark G. Bocchetti Patent Legal Staff

20070184391 - Method of applying patterned metallization to block filter resonators: An embodiment of the present invention provides a method of applying patterned metallization to a ceramic block comprising applying a photodefinable ink to said ceramic block; drying said ink; exposing said photodefinable ink to UV radiation through a predefined mask according to the thickness of the film to form a... Agent: James S. Finn

20070184392 - Coating and developing method, coating and developing system and storage medium: A resist film formed on a substrate is coated with a water-repellent protective film and the substrate is subjected to a developing process after the substrate has been processed by an immersion exposure process. The protective film is removed from the substrate after the resist film has been processed by... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070184393 - Image forming method, liquid developer developing apparatus, and image forming apparatus: An image forming method using liquid developers is provided. The method includes a developing step for forming a plurality of monochromatic color images using a plurality of liquid developers of different colors; a transfer step for transferring a plurality of monochromatic color images which correspond to the respective different colors... Agent: Hogan & Hartson L.L.P.

20070178390 - Exposure mask, liquid crystal display device using the same, and method of manufacturing liquid crystal display device using the same: An exposure mask suitable for forming a color filter for compensating for a difference in color reproduction between a reflective area and a transmissive area including first areas causing a part of a thin film to remain as a thin film pattern by controlling an incident light, second areas removing... Agent: Cantor Colburn, LLP

20070178391 - Mask having balance pattern and method of patterning photoresist using the same: A method and mask having balance patterns for reducing and/or preventing chemical flare from occurring in a photoresist between a first mask region and a second mask region. Balance patterns formed on the mask may have a desired and/or predetermined pitch and may be regularly arranged. If the pitch of... Agent: Harness, Dickey & Pierce, P.L.C

20070178393 - Reflective photomask and method of fabricating the same: A reflective photomask for EUV light is disclosed. The reflective photomask may include a projecting pattern selectively formed on a substrate and a reflective layer on the substrate and the projecting pattern.... Agent: Harness, Dickey & Pierce, P.L.C

20070178387 - Mask fabrication supporting method, mask blank providing method, and mask blank dealing system: A mask blank is provided by forming a plurality of films, including at least a thin film to be a transfer pattern, on a board. At the time of patterning a resist film of the mask blank according to pattern data, film information to check with a pattern is obtained... Agent: Sughrue Mion, PLLC

20070178392 - Method for manufacturing attenuated phase-shift masks and devices obtained therefrom: One inventive aspect relates to an attenuated phase shift mask suitable for hyper NA lithographic processing of a device, to a method of making such a mask and to hyper NA lithographic processing using such a mask. The attenuated phase shift mask is made taking into the effect of the... Agent: Knobbe Martens Olson & Bear LLP

20070178388 - Semiconductor devices and methods of manufacturing thereof: Semiconductor devices and methods of manufacturing thereof are disclosed. A plurality of features is formed on a workpiece, the plurality of features being located in a first region and a second region of the workpiece. Features in the first region have a first lateral dimension, and features in the second... Agent: Slater & Matsil LLP

20070178389 - Universal photomask: A mask set for forming a semiconductor device includes a universal mask used multiple times in the fabrication process. The universal mask may include contact structures, interconnect structures or both. For each level of use, the universal mask includes some features that provide connection between superjacent and subjacent features and... Agent: Duane Morris LLPIPDepartment (tsmc)

20070178394 - Resist composition: A resist composition which is stable relative to solvents used in immersion lithography processes and displays excellent sensitivity and resist pattern profile, and a method of forming a resist pattern that uses such a resist composition are provided. The resist composition is in accordance with predetermined parameters, or is a... Agent: Knobbe Martens Olson & Bear LLP

20070178395 - Imaging members: An imaging member including a metal or metallized substrate; an undercoat layer comprising a polymer resin and a near infrared absorbing component that absorbs at an imaging member exposure wavelength and has a high molar extinction coefficient; and one or more additional layers disposed on the undercoat layer, wherein the... Agent: Marylou J. Lavoie, Esq. LLC

20070178396 - Imaging members and method of treating an imaging member: A method for treating a metal substrate or a metallized substrate of an imaging member including providing a metal or metallized substrate of an imaging member; treating the metal or metallized substrate with a sol-gel composition comprising a rare earth metal to form a passivation layer on the metal or... Agent: Marylou J. Lavoie, Esq. LLC

20070178397 - Electrophotographic toner: m

20070178398 - Toner for electrophotography, image forming apparatus, and toner manufacturing method: A toner for electrophotography satisfies Ft/Dt≦3.0 [nN/μm], where Ft is an inter-toner non-electrostatic adhesion force after a compressive stress within 0.7×10−2 [N/m2] to 1.5×x10−2 [N/m2] is applied, and Dt is a toner particle diameter. The inter-toner non-electrostatic adhesion force is obtained by filling a two-dividable cell for an Agrobot manufactured... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070178399 - Image forming method: Disclosed is an electrophotographic image forming method which comprises steps of forming a toner image on an image support, fixing the toner image on the image support in a fixing nip section of a fixing device employing a contact heating system and the toner contains a first releasing agent, a... Agent: Cantor Colburn, LLP

20070178400 - Electrophotographic photosensitive member process cartridge and electrophotographic apparatus: wherein A denotes a hole-transporting group, P1 and P2 independently denote a chain polymerization function group and Z denotes a bonding organic group; a, b and d are independently an integer of at least 0 satisfying a+b×d≧2 provided that if a≧2, plural groups P1 can be identical or different; if... Agent: Fitzpatrick Cella Harper & Scinto

20070178401 - Method of producing polymerized toner: wherein, in the Formula 2, the aperture ratio is a value expressed in percentage and the media diameter is a value expressed in millimeter.... Agent: Armstrong, Kratz, Quintos, Hanson & Brooks, LLP

20070178402 - Laser irradiation device and method of fabricating organic light emitting display device using the same: A laser irradiation device and a method of fabricating an organic light emitting display device (OLED) using the same are disclosed. The laser irradiation device includes: a laser source generating a laser beam; a mask disposed below the laser source and patterning the beam and a projection lens disposed below... Agent: Knobbe Martens Olson & Bear LLP

20070178403 - Thermal imaging process and products made therefrom: The invention relates to a method for thermally transferring an imaging material from an imaging donor to a receiver to form a pattern of the imaging material on the receiver in which a transparent texturing material is thermally transferred, preferably by laser exposure, from a texturing donor to the receiver... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20070178406 - Coating compositions for use with an overcoated photoresist: Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactive groups that are reactive following crosslinking. In another aspect, underlying coating... Agent: Peter F. Corless Rohm And Haas Electronic Materials LLC

20070178404 - Methods of preventing defects in antireflective coatings: A method of forming a relief image on a substrate including: applying over a substrate a layer of an antireflective coating; and vacuum processing the antireflective coating. This method reduces the number of pinhole defects present in the antireflective coating.... Agent: Scully Scott Murphy & Presser, PC

20070178407 - Polymer, resist protective coating material, and patterning process: A polymer comprising repeat units having formula (1) wherein R1 and R2 are hydrogen or C1-C12 alkyl, or R1 and R2 may bond together to form a ring, and R30 is hydrogen or methyl is used to formulate a resist protective coating material. A protective coating formed therefrom on a... Agent: Birch Stewart Kolasch & Birch

20070178405 - Positive resist composition and method of pattern formation with the same: A positive resist composition comprising: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound containing at least one group... Agent: Sughrue-265550

20070178408 - Process for producing printing substrate capable of laser sculpture: A process for producing a laser engravable printing substrate, comprising the step of forming a layer of photosensitive resin composition on a cylindrical support or sheeted support and the step of irradiating the formed layer of photosensitive resin composition with light to thereby provide a layer of cured photosensitive resin... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070178409 - Exposure method of forming three-dimensional lithographic pattern: An exposure method of forming a three-dimensional lithographic pattern is provided. The method includes providing a substrate. A first photoresist layer is formed on the substrate. The first photoresist layer corresponds to a first exposure removal dose. A second photoresist layer is formed on the first photoresist layer. The second... Agent: Ingrassia Fisher & Lorenz, P.C.

20070178410 - Method of forming three-dimensional lithographic pattern: A method of forming a three-dimensional lithographic pattern is provided. The method includes providing a substrate. A first photoresist layer is formed on the substrate. The first photoresist layer corresponds to a first exposure removal dose. A second photoresist layer is formed on the first photoresist layer. The second photoresist... Agent: Ingrassia Fisher & Lorenz, P.C.

20070178411 - Semiconductor device manufacturing method: The semiconductor device manufacturing method comprises the step of transferring patterns formed on a reticle to a semiconductor substrate by an exposure with oblique incidence illumination. In the step of making the exposure with oblique incidence illumination, the exposure is made with an aperture stop 16 including a first ring-shaped... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070178412 - Method for manufacturing printed circuit board with thin film capacitor embedded therein: In a method for manufacturing a printed circuit board with a thin film capacitor embedded therein, a conductive metal is sputtered via a first mask to form a lower electrode. A dielectric material is sputtered via a second mask to form a dielectric layer. The conductive metal is sputtered via... Agent: Mcdermott Will & Emery LLP

20070178413 - Thin film transistor array panel and method of manufacturing the same: A thin film transistor (TFT) array panel and method of manufacturing the same are provided. The method includes forming a semiconductor layer and an ohmic contact layer over a gate line, forming a conductive layer on the ohmic contact layer, forming a first photosensitive layer pattern on the conductive layer,... Agent: Macpherson Kwok Chen & Heid LLP

20070178414 - Developing solution and method for producing lithography printing plate: wherein, in the formula (I) and (II), R1 to R10 each independently represent one of a hydrogen atom an an alkyl group; “1” represents an integer of 1 to 3; and X1 and X2 each independently represent one of a sulfonate salt, a sulfate monoester salt, a carboxylate salt and... Agent: Buchanan, Ingersoll & Rooney PC

20070178415 - Silver halide color photographic light-sensitive material: A silver halide color photographic light-sensitive material having, on a support, a yellow dye-forming light-sensitive silver halide emulsion layer, a magenta dye-forming light-sensitive silver halide emulsion layer and a cyan dye-forming light-sensitive silver halide emulsion layer, and a light-insensitive hydrophilic colloid layer that does not develop a color, wherein a... Agent: Sughrue Mion, PLLC

20070178416 - Photothermographic material: The present invention provides a photothermographic material having, on at least one side of a support, an image forming layer including at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, and a non-photosensitive layer, wherein the photothermographic material includes at least one... Agent: Taiyo Corporation

20070178417 - Photothermographic material and an image forming method: A photothermographic material having a support, an image forming layer which is disposed on the support and contains at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, at least one non-photosensitive layer which is disposed on the same side of the support... Agent: Taiyo Corporation