Radiation imagery chemistry: process, composition, or product thereof inventions 07/07

20070172745 - Evanescent wave assist features for microlithography: A method for improved imaging performance of a microlithography photomask is described. By providing sub resolution evanescent wave assist features in regions surrounding a main photomask feature, the coupling of the evanescent energy from these features can add to the transmission efficiency of the main feature. The photomask comprises a... Agent: Hiscock & Barclay, LLP

20070172748 - Method of forming composite color image: The present invention provides a composite color image forming method. The method includes electrically charging a latent image-holding member; exposing the charged latent image-holding member to light to form an electrostatic latent image; developing the electrostatic latent image with a two-component developer containing toner particles of one color and a... Agent: Oliff & Berridge, PLC

20070172742 - Volume hologram recording material and volume hologram recording medium: A volume hologram recording material is provided that has high sensitivity, good storage stability after recording, and a large interference fringe refractive index difference, the material being used for forming a volume hologram recording film desirable as a data recording system. A volume hologram recording medium comprising same is also... Agent: Sughrue Mion, PLLC

20070172744 - New aperture design for improving critical dimension accuracy and electron beam lithography throughput: Disclosed is an improved aperture design for improving critical dimension accuracy and electron beam lithography. A pattern may be created on a reticle by passing an electron beam through a first aperture having a first shape comprising an upper horizontal edge, a lower horizontal edge, a vertical edge, an upper... Agent: Haynes And Boone, LLP

20070172746 - Semiconductor device and manufacturing method thereof: A semiconductor device and a manufacturing method thereof in which the peripheral length of an aperture and the mechanical strength of cylinders in a cell can be increased without changing the occupation rate of patterns in the cell. By forming a slit in the middle of each mask pattern so... Agent: Young & Thompson

20070172743 - System and method for storing and transporting photomasks in fluid: An apparatus for and method of storing and transporting a photomask. A photomask storage container has fluid-tight walls, an opening for moving the photomask into and out of the container, and a sealable inlet for a storage fluid. The method includes placing the photomask in the storage container through the... Agent: Law Office Of Delio & Peterson, LLC.

20070172747 - Multilayer imageable element with improved chemical resistance:

20070172749 - Imaging member: A flexible imaging member which does not require the use of an anti-curl back coating is disclosed herein. The flexible imaging member has a layer comprising two charge transport molecules dispersed in a film-forming polymer binder. The first charge transport molecule is a biphenyl amine, terphenyl diamine, or bis(triarylamine) stilbene.... Agent: Richard M. Klein, Esq. Fay, Sharpe, Fagan, Minnich & Mckee, LLP

20070172750 - Toner for developing electrostatic latent image: A toner of the present containing a colored resin particle comprising a binder resin, a colorant, a charge control agent and a parting agent, has the following properties: (1) the colored resin particle has a volume average particle diameter (Dv) in the range of 4 to 9 μm; (2) the... Agent: Armstrong, Kratz, Quintos, Hanson & Brooks, LLP

20070172751 - Toner for developing electrostatic latent image: A toner for developing electrostatic latent images comprising a colored resin particle containing a binder resin, a colorant, a charge control agent and a parting agent, has the following properties: (1) the colored resin particle has a volume average particle diameter (Dv) in the range of 4 to 9 μm;... Agent: Armstrong, Kratz, Quintos, Hanson & Brooks, LLP

20070172752 - Image forming apparatus and image forming method: wherein the intermediate layer includes a metal oxide, the charge generation layer comprises an organic charge generation material, and the irradiator irradiates the photoreceptor with writing light having a wavelength shorter than 450 nm, which is not absorbed in the metal oxide in the intermediate layer.... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070172753 - Photosensitive resin composition and manufacturing method of semiconductor device using the same: A positive photosensitive resin composition, which contains a polybenzoxazole precursor, a quinonediazide photosensitizer and a carbonate solvent, and a method of manufacturing a semiconductor device using the composition.... Agent: Sughrue-265550

20070172754 - Recording paper used for an electrophotographic system and image recording method: A recording paper used for an electrophotographic system is provided, wherein, in a gas chromatograph generated using a headspace method by holding two pieces of the paper of dimensions about 1 cm×about 1 cm at about 120° C. for about 3 minutes, the quantity of aldehyde compounds generated having a... Agent: Oliff & Berridge, PLC

20070172759 - Antireflection film composition, substrate, and patterning process: an organic solvent. There can be provided an antireflection film composition that prevents intermixing in the vicinity of the antireflection film/photoresist film interface, that provides a resist pattern over the antireflection film with almost vertical wall profile, and that provides less damage to an underlying layer of the antireflection film.... Agent: Oliff & Berridge, PLC

20070172760 - Photosensitive polymer and photoresist composition having the same:

20070172758 - Planographic printing plate material and its manufacturing process: Disclosed is a planographic printing plate material comprising a hydrophilic support and provided thereon, an image formation layer whose alkali solubility is changed after near-infrared laser exposure, wherein the image formation layer contains, as a infrared absorbent, a compound having absorption maximum in the wavelength regions of from 700 to... Agent: Frishauf, Holtz, Goodman & Chick, PC

20070172761 - Positive photosensitive composition and method of forming pattern using the same: wherein Xa1 represents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, A1 represents one of a single bond and a divalent connecting group, ALG represents an acid leaving hydrocarbon group, Xa2 represents one of a hydrogen atom, an alkyl group, a cyano group,... Agent: Sughrue-265550

20070172763 - Fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and fluorine-containing polymer prepared by polymerization of same: respectively, wherein X1 and X2 are the same or different and each is H or F; X3 is H, F, Cl or CF3; Rf1 and Rf2 are the same or different and each is a perfluoroalkyl group having 1 to 20 carbon atoms; Rf3 is a fluorine-containing alkylene group having... Agent: Sughrue Mion, PLLC

20070172762 - Photoresist composition for deep ultraviolet lithography: s

20070172756 - Photosensitive resin composition, photosensitive element comprising the same, process for producing resist pattern, and process for producing printed wiring board:

20070172757 - Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method:

20070172755 - Positive photoresist and method for producing structure: Disclosed herein are a positive-type photoresist which can be developed with an aqueous alkali solution of low concentration or neutral water, can be readily stripped with ozone water, hardly produces scum, and contributes to reduction in costs and environmental loads, and a method for manufacturing a structure having a circuit... Agent: Rader Fishman & Grauer PLLC

20070172764 - Multilayer imageable element containing sulfonamido resin: A positive-working imageable element comprises inner and outer layers and a radiation absorbing compound such as an IR absorbing dye. The inner layer includes a first polymeric material. The ink receptive outer layer includes a second polymeric binder comprising a polymer backbone and an —X—C(=T)-NR—S(═O)2— moiety that is attached to... Agent: Andrew J. Anderson Eastman Kodak Company.

20070172766 - Laser sensitive lithographic printing plate comprising specific acrylate monomer and initiator: High speed violet or ultraviolet laser sensitive lithographic printing plate comprising on a substrate a specific photosensitive composition is described. The photosensitive layer comprises a multifunctional (meth)acrylate monomer, a hexaarylbiimidazole compound, and a sensitizing dye. Combination of both multifunctional urethane (meth)acrylate monomer and multifunctional non-urethane (meth)acrylate monomer can be advantageously... Agent: Gary Ganghui Teng

20070172765 - Laser sensitive lithographic printing plate having specific photopolymer composition: High speed violet or ultraviolet laser sensitive lithographic printing plate comprising on a hydrophilic substrate a specific photosensitive composition is described. The photosensitive layer comprises a polymeric binder, a multifunctional (meth)acrylate monomer, a free-radical initiator, and a sensitizing dye, with specific weight ratio of the monomer to the polymer. Combination... Agent: Gary G. Teng

20070172768 - Pattern forming method: A pattern forming method which uses a positive resist composition comprises: (A) a silicon-free resin capable of increasing its solubility in an alkaline developer under action of an acid; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a silicon-containing resin having... Agent: Sughrue-265550

20070172769 - Pattern forming method: A pattern forming method which uses a positive resist composition comprises: (A) a fluorine-free resin capable of increasing its solubility in an alkaline developer under action of an acid; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a fluorine-containing resin having... Agent: Sughrue-265550

20070172767 - Exposure method, device manufacturing method using the same, exposure apparatus, and substrate processing method and apparatus: An exposure method for exposing a predetermined area on a substrate includes an operation for executing first exposure for the predetermined area by forming a liquid immersion area of a first liquid on the substrate, and an operation for executing second exposure for the predetermined area by forming a liquid... Agent: Oliff & Berridge, PLC

20070172770 - Methods for manufacturing dense integrated circuits: One inventive aspect relates to a method for forming integrated circuits and circuits obtained therewith. The method of forming a circuit pattern in a device layer of a semiconductor substrate comprises decomposing the circuit pattern in two constituent orthogonal subpatterns. The method further comprises transferring the pattern of a first... Agent: Knobbe Martens Olson & Bear LLP

20070172771 - Method for manufacturing electrodes of a plasma display panel: A method for manufacturing electrodes of a plasma display panel includes providing a front transparent substrate including transparent electrodes on the front transparent substrate, coating a black photosensitive paste film and a main photosensitive conductive paste film of negative-working type on the transparent electrodes, exposing the black photosensitive paste film... Agent: North America Intellectual Property Corporation

20070172773 - Method for manufacturing electroluminescent element: A main object of the present invention is to provide a method for manufacturing an EL element which can avoid a state which plural unnecessary layers are laminated on each pattern-formed light-emitting portion when the light-emitting portions are formed by photolithography and thus enables quick and easy peeling treatment in... Agent: Seyfarth Shaw LLP

20070172772 - Microlens: Provided is a microlens having an inorganic compound layer directly formed on the surface of a base lens material that is resistant to cracking and wrinkling of the inorganic compound layer under high-temperature and high-humidity environment and also to cracking of the base lens material by repeated temperature fluctuation, and... Agent: Osha Liang L.L.P.

20070172774 - Process for forming a feature by undercutting a printed mask: A print patterned mask is formed a digital lithographic process on the surface of a photoresist or similar material layer. The print patterned mask is then used as a development or etching mask, and the underlying layer overdeveloped or overetched to undercut the print patterned mask. The mask may be... Agent: Jonathan A. Small JasIPConsulting

20070172775 - Method of forming an organic semiconductor pattern and method of manufacturing an organic thin film transistor using the same: A method of forming an organic semiconductor pattern is provided. A pattern is formed on a first substrate. An adhesive is coated on the pattern to form an adhesive pattern. An organic semiconductor layer is formed on a second substrate. The second substrate is combined with the first substrate to... Agent: Macpherson Kwok Chen & Heid LLP

20070172776 - Developer regenerators: The present invention provides an aqueous regenerator for addition to an aqueous developer that contains an organic solvent, a dispersing agent and a weak base, and has a pH of between about 8 and less than about 13. The aqueous regenerator includes an organic solvent, dispersing agent, and an effective... Agent: Andrew J. Anderson Patent Legal Staff

20070172777 - Image forming method using a silver halide color photographic light-sensitive material, and silver halide color photographic light-sensitive material: An image-forming method comprising: employing a silver halide color photographic light-sensitive material, comprising, on a support, at least one silver halide emulsion layer containing a yellow dye-forming coupler, at least one silver halide emulsion layer containing a magenta dye-forming coupler, at least one silver halide emulsion layer containing a cyan... Agent: Sughrue Mion, PLLC

20070172778 - Silver halide color photographic light-sensitive material: in formulas (I), (A), (B) and (C), D represents a group to give a compound having a chromophore; X represents a dissociable hydrogen or a group having a dissociable hydrogen; y is an integer from 1 to 7; R1 represents a substituted or unsubstituted alkyl or alkoxy group; R2 and... Agent: Sughrue Mion, PLLC

20070172779 - Hologram silver halide photographic material, hologram and method for producing the same: The present invention is characterized to provide a hologram silver halide photographic material having high sensitivity and diffraction efficiency, providing an excellent image and having less color residue and noise in a transparent part, a hologram, a method for producing the same. In the present invention, a hologram silver halide... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.

20070166628 - Mask and display substrate manufactured using the mask and display panel having the display substrate: A mask used in manufacturing a display substrate, including a transmission region and a reflection region, includes a transparent substrate, a translucent layer and a light blocking layer. The transparent substrate transmits light. The translucent layer is on the transparent substrate and transmits a portion of the light. The light... Agent: Frank Chau, Esq. F. Chau & Associates, LLC

20070166630 - Photomasks including multi-layered light-shielding and methods of manufacturing the same: Example embodiments may provide photomasks including multi-layered light-shielding, and methods of manufacturing the same. An example embodiment may include a transparent substrate, and a multi-layered light-shielding layer having non-transparent and transparent layers alternately laminated on the transparent substrate.... Agent: Harness, Dickey & Pierce, P.L.C

20070166631 - Dye-containing negative working curable composition, color filter and method of producing thereof: The invention provides a dye-containing negative working curable composition comprising at least a dye, a photo polymerization initiator, and as a radical polymerizable monomer, (C-1) an acidic group-containing polyfunctional (meth)acrylic compound having an acid value of 25 mgKOH/g or more, or (C-1) the acidic group-containing polyfunctional (meth)acrylic compound in combination... Agent: Sughrue Mion, PLLC

20070166633 - Exposure system, exposure method, and method for manufacturing semiconductor device: An exposure system includes a exposure tool for projecting an image of a mask pattern onto a first resist with test values of a dose to form test resist patterns, a microscope for defining coordinates of mask positions along the mask pattern in a scan direction, measuring actual values of... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070166625 - Latent holographic media and method: A holographic recording medium having a polymer matrix comprising a developer, wherein the holographic recording medium is capable of recording a latent hologram and the developer is capable of developing the latent hologram into a readable hologram by activation of the developer is disclosed. The holographic recording medium is capable... Agent: Morrison & Foerster LLP

20070166626 - Scattering bar opc application method for mask esd prevention: A method for reducing ESD on scattering bars in forming a mask containing a target pattern is provided. In one embodiment, the target pattern comprising features to be imaged onto a substrate is obtained. The mask is modified to include at least one scattering bar, the at least one scattering... Agent: Thomas, Kayden, Horstemeyer & Risley, LLP

20070166627 - Semiconductor device manufacturing method, mask manufacturing method, and exposure method: In order to form a transfer pattern of desired size with high accuracy, a method for manufacturing a semiconductor device includes a process of forming the transfer pattern including a line whose width and angle varies, by performing multiple exposure using a plurality of masks having different patterns over different... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070166629 - White defect repairing method and apparatus of photomask, manufacturing method of photomask, and manufacturing method of semiconductor device: According to an aspect of the invention, there is provided a white defect repairing method of a photomask which repairs a white defect present at an edge portion of a pattern of the photomask, the method including forming a groove or a hole having a tilted side wall which inhibits... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070166632 - Positive photosensitive insulating resin composition and cured product thereof: Positive photosensitive insulating resin compositions of the invention contain at least (A) an alkali soluble resin having a phenolic hydroxyl group, (B) a compound having a quinonediazido group, (C) crosslinked fine particles, (D) a compound containing at least two alkyletherified amino groups in the molecule, and (F) a solvent The... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070166634 - Photoreceptor with overcoat layer: s

20070166635 - Toner and method of preparing the toner: A toner is provided including a binder resin, a colorant, and a release agent, which has a volume average particle diameter (Dv) of from 3 to 9 μm, and wherein the binder resin and the release agent form a sea-island structure in which the island formed of the release agent... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070166637 - Method of preparing toner and toner prepared using the method: A method of preparing a toner, including: preparing a colorant dispersion by mixing a reactive emulsifier and a colorant; preparing a toner composition by mixing a macromonomer including a hydrophilic group, a hydrophobic group and at least one reactive functional group, at least one polymerizable monomer and a chain transfer... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.

20070166636 - Electrophotographic toner and electrophotographic developer and image forming method: An electrophotographic toner that includes a colorant, a release agent, a non-crystalline resin and a crystalline resin, wherein the crystalline resin is a polyalkyl acrylate or polyalkyl methacrylate having an alkyl group of approximately 18 or more carbon atoms, and is produced by copolymerization with approximately 10 mol % or... Agent: Oliff & Berridge, PLC

20070166638 - Method of manufacturing toner and toner: A toner is manufactured by way of a coarse particle preparing step, a slurry preparing step, a pulverizing step, a cooling step, and a depressurizing step. Slurry of toner coarse particles obtained by way of the coarse particle preparing step and the slurry preparing step is made to pass under... Agent: Nixon & Vanderhye, PC

20070166640 - Defect reduction in immersion lithography: An embodiment of the invention provides a method for forming a semiconductor device. A method comprises forming a resist on a substrate. A photoacid generator (PAG) is dispersed homogeneously in the resist. The method includes concentrating the PAG near a surface of the resist by evaporating a solvent from the... Agent: Slater & Matsil LLP

20070166639 - Laminated resist used for immersion lithography: There is provided a laminated resist which is transparent in the case of exposure light of not less than 193 nm and can form a fine pattern having an intended form without defects with good reproducibility. The laminated resist has a photoresist layer (L1) and a transparent protective layer (L2)... Agent: Sughrue Mion, PLLC

20070166644 - Photoresist composition and method of forming a photoresist pattern using the same: In one aspect, a photoresist composition includes a cross-linking agent, a photosensitive material, an organic solvent, and a compound having a chemical structure represented by formulae (1) or (2) herein. The cross-linking agent includes at least one epoxy group and/or at least two hydroxyl groups.... Agent: Volentine & Whitt PLLC

20070166643 - Photosensitive resin composition and manufacturing method of semiconductor device using the same: A positive photosensitive resin composition, which contains a polybenzoxazole precursor capable of increasing alkali solubility by an action of an acid, a triarylsulfonium salt and a sensitizer; and a method of manufacturing a semiconductor device using the composition.... Agent: Sughrue-265550

20070166642 - Photosensitive resin composition, and cured product and use thereof: The invention relates to a photosensitive resin composition comprising (A) an epoxy(meth)acrylate resin synthesized from components containing (a) epoxy prepolymer, (b) an unsaturated group-containing monocarboxylic acid and (c) an acid anhydride, (B) a urethane (meth)acrylate resin synthesized from components containing (d) a dihydroxyl compound having a carboxyl group, (e) a... Agent: Sughrue Mion, PLLC

20070166641 - Positive resist composition and process for formation of resist patterns: A positive resist composition includes a resin component (A) and an acid generator component (B), wherein the component (A) is a copolymer that includes a structural unit (a1) derived from an (α-lower alkyl)acrylate ester that contains a monocyclic or polycyclic group-containing acid dissociable, dissolution inhibiting group, a structural unit (a2)... Agent: Knobbe Martens Olson & Bear LLP

20070166645 - Chalcogenide precursor compound and method for preparing chalcogenide thin film using the same: Disclosed herein are a soluble chalcogenide precursor compound and a method for preparing a chalcogenide thin film using the precursor compound by a solution deposition process, e.g., spin coating or dip coating. In the method, the use of the chalcogenide precursor as an inorganic semiconductor material soluble in organic solvents... Agent: Cantor Colburn, LLP

20070166646 - Methods for forming pattern using electron beam and cell masks used in electron beam lithography: Provided methods for forming a pattern using electron beam and cell masks for electron beam lithography. The methods may include forming a resist layer on a substrate, the resist layer including a first region, a second region surrounding the first region, and a third region surrounding the second region. The... Agent: Harness, Dickey & Pierce, P.L.C

20070166647 - Light sensitive planographic printing plate material and planographic printing plate manufacturing process: Disclosed is a light sensitive planographic printing plate material comprising a support and provided thereon, a light sensitive layer containing a polymeric binder, a polymerizable ethylenically unsaturated compound and a photopolymerization initiator, wherein the polymeric binder is a polymer having a acid value of from 40 to 120 and a... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070166648 - Integrated lithography and etch for dual damascene structures: A method and structure for an integrated via and line lithography followed by integrated via and line etch. A two-layered, negative resist based lithography is used to generate a dual damascene structure in the photoresist which is subsequently transferred into the underlying ILD using an lithography with an integrated RIE.... Agent: International Business Machines Corporation Dept. 18g

20070166649 - Method of forming a micro device: A method of forming a micro device includes using a light source which has a first wavelength beaming to a photo resist which is suited for a second wavelength, developing the photo resist which is suited for the second wavelength to form a plurality of sensitization block, and performing a... Agent: North America Intellectual Property Corporation

20070166650 - Patterning methods and masks: Masks for patterning material layers of semiconductor devices, methods of patterning and methods of manufacturing semiconductor devices, and lithography systems are disclosed. A lithography mask includes a pattern of alternating lines and spaces, wherein the lines and spaces comprise different widths. When the lithography mask is used to pattern a... Agent: Slater & Matsil LLP

20070166651 - Stamper, method of forming a concave/convex pattern, and method of manufacturing an information recording medium: A stamper is formed so that a thickness between a concave/convex pattern formation surface, where a concave/convex pattern is formed, and a rear surface gradually decreases in a predetermined area of the stamper. The predetermined area corresponds to an area where pressure is likely to be concentrated when the concave/convex... Agent: Greenblum & Bernstein, P.L.C

20070166652 - Digital mold texturizing methods, materials, and substrates: Methods, materials, and systems for texturizing mold surfaces is disclosed. In one method and system of the invention, a first step involves generating a graphics file of a desired texture pattern. The graphics file is subsequently output to an ink jet printer, which is configured to print using an acid-etch... Agent: Pauly, Devries Smith & Deffner, L.L.C.

20070160918 - Circuit pattern exposure method and mask: A circuit pattern exposure method for irradiating illumination light onto a mask to transfer (offset) mask patterns that are formed in the mask to a semiconductor substrate, wherein the mask includes a plurality of main mask patterns that are arranged at a prescribed pitch and auxiliary mask patterns that are... Agent: Young & Thompson

20070160921 - Electrophotographic photoconductor, method of producing the same and image forming apparatus: wherein R1 and R2 are, the same or different, each an alkyl group or an allyl group which may have a substituent or a heterocyclic residue to be formed through or not through a nitrogen atom or an oxygen atom together with the nitrogen atom to which R1 and R2... Agent: Nixon & Vanderhye, PC

20070160912 - Thermal transfer sheet, process for producing the same, and image formed object produced by transfer of said thermal transfer sheet: This invention provides a hologram thermal transfer sheet that can realize thermal transfer treatment with high efficiency. The thermal transfer sheet comprises a base material sheet and a transparent transfer layer provided separably on the base material sheet, characterized in that a hologram layer is provided on at least a... Agent: Burr & Brown

20070160914 - Anti-aberration pattern and method for manufacturing the same: The invention is directed to a pattern on a mask. The pattern comprises a main dense pattern, a first anti-aberration pattern and a second anti-aberration pattern. The main dense pattern comprises a first outmost sub-pattern and a second outmost sub-pattern, wherein the first outmost sub-pattern and the second pattern are... Agent: J.c. Patents, Inc.

20070160917 - Correcting 3d effects in phase shifting masks using sub-resolution features: Using phase shifting on a mask can advantageously improve printed feature resolution on a wafer, thereby allowing greater feature density on an integrated circuit. Phase shifting can create an intensity imbalance between 0 degree and 180 degree phase shifters on the mask. An improved method of designing an alternating PSM... Agent: Bever Hoffman & Harms, LLP

20070160915 - Phase shifting mask having a calibration feature and method therefor: A phase shift mask that corresponds to a layer of at least one semiconductor die has a substrate. A method thereof includes overlying a phase shifter film over the substrate. A permanent light calibration feature is positioned in close proximity to the at least one semiconductor die. The permanent light... Agent: Freescale Semiconductor, Inc. Law Department

20070160919 - Phase-shift mask providing balanced light intensity through different phase-shift apertures and method for forming such phase-shift mask: A photomask may include a patterned layer, a phase-shift layer adjacent the patterned layer, a first aperture, a second aperture, and a light-absorbing layer. The first aperture may allow light to pass through the patterned layer and the phase-shift layer and provide a first phase shift. The second aperture may... Agent: Baker Botts L.L.P. Patent Department

20070160913 - Protected pattern mask for reflection lithography in the extreme uv or soft x-ray range: A mask (MM) with patterns (MF) for use in a reflection lithography device with a photon beam with a wavelength of less than about 120 nm. Said mask (MM) comprises a planar substrate (ST) fixed to a reflecting structure (SMR) comprising a front face provided with selected patterns (MF) made... Agent: Christie, Parker & Hale, LLP

20070160916 - Reflective-type mask blank for euv lithography: There are provided a substrate with a reflective layer and an EUV mask blank, which can prevent particles from adhering to a surface of the reflective layer or an absorbing layer, or into a reflective layer or an absorbing layer during formation thereof by eliminating electrical connection between a film... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070160920 - Method of adding fabrication monitors to integrated circuit chips: An integrated circuit, a method and a system for designing and a method fabricating the integrated circuit. The method including: (a) generating a photomask level design of an integrated circuit design of the integrated circuit, the photomask level design comprising a multiplicity of integrated circuit element shapes; (b) designating regions... Agent: Schmeiser, Olsen & Watts

20070160922 - Developer for electronic printing, and process for producing glass plate having electric conductor pattern: To provide a process for producing a glass plate having an electric conductor pattern excellent in adhesion to the surface of the glass plate, whereby it is not required to have a screen ready for every model and adjustment to desired electric heating performance and antenna performance is easy, and... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070160923 - Release agent, toner, and method for manufacturing same: There are provided a release agent capable of attaining a toner excellent in an anti-offset property and an anti-filming property, without detaching from a kneaded mass even in a case of granulating by heating a dispersion medium containing the kneaded mass, as well as a toner using the release agent... Agent: Nixon & Vanderhye, PC

20070160924 - Toner and developer using the toner: e

20070160925 - Developer, developer cartridge, developing unit, and image forming apparatus: A developer contains a resin, a coloring agent, and an external additive in an amount of 2.5 to 4.5 weight parts added to the resin in an amount of 100 weight parts resin. The developer has an average volume mean particle diameter in the range of 4.5 to 6.5 μm... Agent: Rabin & Berdo, PC

20070160926 - Toner and process for producing toner: The present invention provides a toner that exhibits excellent low-temperature fixing properties, offset resistance, and has excellent storage stability in a developing machine. The toner has, in a DSC curve obtained by measuring the toner with differential scanning calorimeter, a glass transition temperature (Tg1) measured in a first scan of... Agent: Fitzpatrick Cella Harper & Scinto

20070160929 - Lactone-containing compound, polymer, resist composition, and patterning process: Lactone-containing compounds having formula (1) are novel wherein A1 is a polymerizable functional group having a double bond, R1 is a monovalent C1-C10 hydrocarbon group in which some or all hydrogen atoms are substituted by fluorine atoms, and W is CH2, O or S. They are useful as monomers to... Agent: Birch Stewart Kolasch & Birch

20070160930 - Coating compositions for photoresists: In one aspect, the present invention relates to coating compositions that comprise a resin component, wherein the predominant portion of the resin component comprising one or more resins that are at least substantially free of fluorine. Coating compositions of the invention are useful as photoresist overcoat layers, including in immersion... Agent: Peter F. Corless Rohm And Haas Electronic Materials LLC

20070160928 - Photosensitive resin composition for printing substrate capable of laser sculpture: A photosensitive resin composition for a laser engravable printing substrate, comprising resin (a) having a polymerizable unsaturated group whose number average molecular weight is in the range of 1000 to 20×104, organic compound (b) having a polymerizable unsaturated group whose number average molecular weight is <1000 and organosilicon compound (c)... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070160927 - Radiation-sensitive resin composition, process for producing the same and process for producing semiconductor device therewith: This radiation sensitive resin composition is applied onto an object to be processed 2 to form a photoresist film 3. The photoresist film is exposed and then developed to form a fine resist pattern 4 with 0.2 μm or less in pattern width. Thereafter, dry etching is conducted to form... Agent: Mcdermott Will & Emery LLP

20070160931 - Organic dyes for recording layer and high density optical recording medium using the same: A recording layer including a novel dye for a high density optical recording medium, employing short wavelength laser source with a wavelength no longer than 530 nm for recording high density information and reproduction/playback of the high density information recordings, is provided. The dye incorporated in the recording layer has... Agent: J C Patents, Inc.

20070160932 - Electron beam lithography apparatus: An apparatus includes a beam deflection portion for deflecting the electron beam to change an irradiation position of the electron beam; a synchronization signal generation portion for generating a synchronization signal which is in synchronization with the rotation of the substrate; a controller for controlling the beam deflection portion on... Agent: Mcginn Intellectual Property Law Group, PLLC

20070160935 - Lithographic printing plate material for ctp: The present invention relates to a lithographic printing plate material for CTP, which comprises a substrate, a photosensitive layer formed on the substrate, and a dye-containing layer formed on the photosensitive layer, wherein the photosensitive layer is formed by a photosensitive composition comprising a halomethyl group-containing compound and an organoboron... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070160934 - Photosensitive printing sleeves and method of forming the same: The photosensitive printing element of the invention comprises a hollow cylindrical support layer (2), at least one layer of photopolymerizable material (3), and a masking layer (4). Portions of the masking layer are removed by laser radiation. The layer of photopolymerizable material (3) is then exposed to actinic radiation through... Agent: John L Cordani Carmody And Torrance

20070160933 - Water-developable photopolymer plate for letterpress printing: Disclosed is a method for producing a water-developable photopolymer plate for letterpress printing comprising an exposure step, a development step and a post-exposure step wherein the photopolymer plate is brought into contact with a liquid containing a modified silicone compound and/or a fluorine compound during or after the exposure step.... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070160936 - Adhesion method using gray-scale photolithography: A method for adhering substrates using gray-scale photolithography includes: (a) applying a photopatternable corn-position to a surface of a substrate to form a film; (b) exposing a portion of the film to radiation having a wavelength of from 150 to 800 nm through a gray-scale photomask to produce an exposed... Agent: Dow Corning Corporation Co1232

20070160937 - Photocurable resin composition and a method for forming a pattern: A photocurable resin composition containing a photopolymerization initiator and a (meth)acrylate monomer and/or oligomer, said (meth)acrylate monomer or oligomer having a cyclic structure, in which the atomic weight of carbon (Mcr) in said cyclic structure and the number of whole carbon atoms (MTOT) in said composition have the relation of... Agent: Antonelli, Terry, Stout & Kraus, LLP

20070160938 - Organic el display panel comprising electrode separator and its manufacturing method: An organic EL display panel includes a plurality of anodes (2) formed on a substrate (1), a plurality of auxiliary electrodes (3) held in electrical contact with the anodes (2), an anode separator (4) covering each auxiliary electrode (3) and a part of the anodes (2), a plurality of organic... Agent: Hamre, Schumann, Mueller & Larson, P.C.

20070160939 - Color image forming apparatus: A color image forming device, including: an optical scanning part; an image carrier where a latent image is formed by the optical scanning part; a developing part configured to develop the latent image of the image carrier; an endless belt configured to move so as to come in contact with... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070160940 - Laminated film for dye-sensitized solar cell and electrode for dye-sensitized solar cell, and process for their production: There is provided a laminated film for a dye-sensitized solar cell characterized by comprising a polyester film and a transparent conductive layer formed on one side thereof, the transparent conductive layer having a surface tension of 40 mN/m or greater, and an electrode for a dye-sensitized solar cell with excellent... Agent: Sughrue Mion, PLLC

20070154820 - Photosensitive resin composition and black matrix using the same: A photosensitive resin composition suitable for the production of a light-shielding black matrix for use in a liquid crystal display is disclosed. The photosensitive resin composition includes a cardo binder resin and a carboxyl group-containing polyfunctional monomer and exhibits superior physical properties, such as heat resistance, chemical resistance, development margin,... Agent: Knobbe Martens Olson & Bear LLP

20070154823 - Multi-attribute light effects for use in curing and other applications involving photoreactions and processing: Systems and methods that provide multi-attribute light effects, including one or more channels for each light effect, preferably both channels being provided in an array of solid state light emitters.... Agent: Ganz Law, P.C.

20070154816 - Mask and fabrication method thereof and application thereof: A mask including a transparent substrate, a semi-transparent layer and a film layer is provided. The transparent substrate at least has a first region, a second region and a third region. The semi-transparent layer covers the second region and the third region of the transparent substrate and exposes the first... Agent: J.c. Patents, Inc.

20070154817 - Methods and devices for lithography using electromagnetic radiation with short wavelengths: One inventive aspect relates to a method of lithographic processing of a device). The method may be performed using a lithographic processing system and applying a reticle). Lithographic processing of a device typically is characterized by focus conditions, a set of selectable lithographic processing system parameter values and selectable reticle... Agent: Knobbe Martens Olson & Bear LLP

20070154819 - Color filter substrate and fabricating method thereof: A color filter substrate including a black matrix layer, a color pattern layer and an electrode layer is provided. The black matrix layer is disposed on a substrate to define a plurality of sub-pixel regions thereon. The black matrix layer has at least one identified mark. The color pattern layer... Agent: J.c. Patents, Inc. Suite 250

20070154818 - Integrated color filter: An integrated color filter includes a substrate with a black matrix thereon to define a plurality of sub pixels on a surface thereof. A plurality of color filter units disposed in the sub pixels respectively, which are made of pigment doping organic material. The organic material is fluorescence or phosphorescence... Agent: Bacon & Thomas, PLLC

20070154821 - Pringting plates comprising modified pigment products: The present invention discloses printing plates comprising a substrate and a radiation-absorptive layer, wherein the radiation-absorptive layer comprises at least one modified pigment product. The modified pigment product comprises a pigment having attached at least one organic group and at least one amphiphilic counterion. Methods of imaging printing plates are... Agent: Michelle B. Lando, Esq. Cabot Corporation

20070154822 - Imaging element having improved durability: The invention provides an imaging element comprising a support having thereon, in order, at least one imaging layer, at least one interlayer containing a lubricant which provides scratch-resistance and at least one outermost layer containing a different lubricant which provides abrasion-resistance and a method of processing the element. The element... Agent: Patent Legal Staff

20070154824 - Method and program for calculating exposure dose and focus position in exposure apparatus, and device manufacturing method: A method for calculating an offset of an exposure dose and a focus position in an exposure apparatus that exposes a substrate via an original includes the steps of obtaining information of a shape of a pattern formed on the substrate using the exposure apparatus, calculating a shift amount between... Agent: Morgan & Finnegan, L.L.P.

20070154825 - Electrophotographic photoreceptor, method of image formation, image formation apparatus and process cartridge for image formation apparatus: An electrophotographic photoconductor that is excellent in the stability of image quality and can realize high durability is provided. In an electrophotographic photoconductor in which an underlying layer, a photoconductive layer, and a crosslinked-type charge transportation layer are stacked on an electrically conductive support in order, the underlying layer is... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070154826 - Electrophotographic photoreceptor and electrophotograph: The present invention relates to an electrophotographic photoreceptor used for electrophotographic apparatuses such as copying machines, LED, LD printers, etc. and particularly to an electrophotographic photoreceptor which has an undercoat layer and uses an organic photoconductive material, and an electrophotographic apparatus provided with the photoreceptor.... Agent: Stevens Davis Miller & Mosher, LLP

20070154827 - Electrophotographic photoconductor: An electrophotographic photoconductor includes an undercoat layer and a photosensitive layer sequentially provided on a conductive substrate. The undercoat layer is mainly composed of a resin and contains a metal oxide. The resin is provided by mixing and polymerizing raw materials of aromatic dicarboxylic acid in a range of 0.1... Agent: Rabin & Berdo, PC

20070154828 - Electrophotographic photosensitive member, and electrophotographic apparatus and process cartridge which make use of the same: wherein R1 and R2 are each an optionally substituted alkyl group or a halogen atom; R3 and R5 are each a hydrogen atom, R4 and R6 are each a 3-substituted phenyl group where the substitutent is Cl, F, Br, I, nitro, trifluoromethyl, trifluromethoxyl, acetyl or cyano; Z1 and Z2 are... Agent: Fitzpatrick Cella Harper & Scinto

20070154829 - Toner for electronic printing, and process for producing glass plate having electric conductor pattern: To provide a process for producing a glass plate having an electric conductor pattern excellent in adhesion with the surface of the glass plate, whereby it is not required to have a screen ready for every model and adjustment to desired electric heating performance and antenna performance is easy, and... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070154830 - Method of preparing toner and toner prepared using the method: A method of preparing a toner includes: preparing high molecular weight latex particles by polymerizing a toner composition including a macromonomer having a hydrophilic group, a hydrophobic group and at least one reactive functional group, at least one polymerizable monomer, a colorant and wax; aggregating the high molecular latex particles... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.

20070154831 - Method of preparing toner and toner prepared using the method: A method of preparing a toner is provided, including: preparing a core by mixing a polyester resin and a colorant with a macromonomer including a hydrophilic group, a hydrophobic group, and one or more reactive functional groups, and a nonionic reactive emulsifier; and preparing a shell by polymerizing the exterior... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.

20070154832 - Method of preparing toner and toner prepared using the method: A method of preparing a toner, includes: preparing a high molecular weight latex particle by polymerizing a toner composition including a macromonomer having a hydrophilic group, a hydrophobic group and at least one reactive functional group, and at least one polymerizable monomer; forming a core particle by aggregating the high... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.

20070154833 - Resin-coated carrier for electrophotographic developer and process for producing the same, and electrophotographic developer comprising the resin-coated carrier: An object of the present invention is to provide a resin-coated ferrite carrier comprising a carrier core material having a small particle size, a high sphericity and surface uniformity, and a low standard deviation, a process for producing the carrier, and an electrophotographic developer comprising the resin-coated ferrite carrier and... Agent: Rothwell, Figg, Ernst & Manbeck, P.C.

20070154834 - Developer carrying member and developing method by using thereof: The present invention relates to a developer carrying member for carrying a developer having at least a substrate and a resin-coated layer formed on the surface of the substrate. The developer carrying member is the one which carries a one-component developer to visualize the electrostatic latent image carried by the... Agent: Fitzpatrick Cella Harper & Scinto

20070154838 - Hard mask composition and method for manufacturing semiconductor device: Disclosed herein is a cross-linking polymer that includes a silicon compound and a hydroxyl compound. Also disclosed herein is a composition that includes the cross-linking polymer and an organic solvent. The composition can be used as a part of hard mask film applied over an underlying layer during the manufacture... Agent: Marshall, Gerstein & Borun LLP

20070154839 - Hard mask composition for lithography process: An inorganic hard mask composition, which is useful in the manufacture of semiconductor devices. When an underlying layer pattern of a semiconductor device is formed, an inorganic hard mask film having an excellent etching selectivity to an organic hard mask is further coated over an organic hard mask film and... Agent: Marshall, Gerstein & Borun LLP

20070154837 - Composition for hard mask and method for manufacturing semiconductor device: Disclosed herein is a composition that includes a silicon compound, a novolak resin, a catalyst, and an organic solvent, which can be used as a part of hard mask film over an underlying layer during the manufacture of a semiconductor device. The hard mask film is useful in the formation... Agent: Marshall, Gerstein & Borun LLP

20070154836 - Helical pixilated photoresist: A helical pixilated photoresist includes a photoacid generator, a photoimageable polymer comprising a self-assembly moiety and a solubility switch, the photoimageable polymer having a helical structure. In one embodiment the helical pixilated photoresist is formed of a photoimageable polymer comprising a pyridine-based quencher copolymer and a solubility switch copolymer, wherein... Agent: Blakely Sokoloff Taylor & Zafman

20070154841 - Photoresist composition for deep ultraviolet lithography: h

20070154835 - Positive photosensitive composition: There is provided a positive photosensitive composition which requires no burning, makes it possible to obtain necessary and sufficient adhesion when it is applied under a humidity of 25 to 60%, makes it possible to carry out development with keeping high sensitivity while forming no residue, ensures sharp edges, can... Agent: Mcglew & Tuttle, PC

20070154840 - Radiation curable resin composition and rapid prototyping process using the same: The invention relates to a radiation curable composition comprising relative to the total weight of the composition (A) 0-29 wt % of a cationically curable component having a linking aliphatic ester group, (B) 10-85 wt % of an epoxygroup containing component other than A, (C) 1-50 wt % of an... Agent: Nixon & Vanderhye, PC

20070154842 - Method for fabricating printing plate with fine pattern using electric field: A fabricating method of a printing plate includes forming a first conductive layer on an upper surface of a printing plate, forming a second conductive layer on a lower surface of the printing plate, forming an etch-resist pattern by etching a portion of the first conductive layer, submerging the printing... Agent: Seyfarth Shaw, LLP

20070154845 - Method for fabricating liquid crystal display device: A method for fabricating a liquid crystal display includes: forming a gate electrode on a substrate; sequentially providing an insulation layer, a semiconductor layer and an etch stopper layer on the gate electrode; patterning the etch stopper layer and the semiconductor layer to form an etch stopper layer pattern and... Agent: Mckenna Long & Aldridge LLP

20070154844 - Fluorinated compound, fluoropolymer, resist composition, and composition for resist protective film: wherein R1 is a hydrogen atom, an alkyl group having at most 20 carbon atoms, or (CH2)aCOOR4 (wherein a is 0 or 1, and R4 is a hydrogen atom or an alkyl group having at most 20 carbon atoms), each of R2 and R3, which are independent of each other,... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070154843 - Resin and resin composition: Disclosed is a hydroxy polyamide represented by the following general formula (1) and having a 5-amino isophthalic acid derivative structure in the main chain structure. (1) (In the formula, m and n represent integers, X represents at least one tetravalent organic group, Y represents at least one divalent organic group... Agent: Greenblum & Bernstein, P.L.C

20070154847 - Chalcogenide layer etching method: A protective layer is deposited on a chalcogenide layer and a patterned photoresist layer is formed on the protective layer. The patterned photoresist layer and the protective layer are etched to form openings therethrough to the chalcogenide layer to create etched photoresist and etched protective layers. The etched photoresist layer... Agent: Macronix C/o Haynes Beffel & Wolfeld LLP

20070154848 - Low ph development solutions for chemically amplified photoresists: A method for carrying out positive tone lithography with a carbon dioxide development system is carried out by: (a) providing a substrate, the substrate having a polymer resist layer formed thereon, (b) exposing at least one portion of the polymer resist layer to radiant energy causing a chemical shift to... Agent: Myers Bigel Sibley & Sajovec

20070154846 - Switching micro-resonant structures using at least one director: When using micro-resonant structures, it is possible to use the same source of charged particles to cause multiple resonant structures to emit electromagnetic radiation. This reduces the number of sources that are required for multi-element configurations, such as displays with plural rows (or columns) of pixels. In one such embodiment,... Agent: Davidson Berquist Jackson & Gowdey LLP

20070154849 - Method of fabricating a semiconductor transistor: A method for fabricating a semiconductor transistor having a size of 90 n m or less includes, sequentially depositing a gate oxide film, a poly silicon, an organic antireflection film, and a photo-resist on a substrate; exposing and developing the photo-resist to form a photo-resist pattern having a critical dimension... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070154851 - Maintenance of photoresist adhesion on the surface of dielectric arcs for 90 nm feature sizes: We have traced the detachment of photoresist during development of patterned features in the range of about 90 nm and smaller to a combination of the reduced “foot print” of the pattern on the underlying substrate and to the contact angle between the underlying substrate surface and the developing reagent.... Agent: Shirley L. Church, Esq.

20070154852 - Method for patterning a thin film using a plasma by-product: Embodiments relate to a method of patterning a thin film using a by-product of plasma. According to embodiments, the method may include (a) forming a thin film serving as a target object to be etched on a substrate, (b) forming photoresist patterns on the thin film, (c) performing a plasma... Agent: Sherr & Nourse, PLLC

20070154850 - Resolution enhancement in optical lithography via absorbance-modulation enabled multiple exposures: A method to enhance resolution in optical lithography via absorbance-modulation involves exposing an opaque absorbance modulation layer (AML) to a first waveform having wavelength, 81, with the first exposure forming a first set of transparent regions in the opaque AML and forming a first pattern made of a set of... Agent: Gauthier & Connors, LLP

20070154853 - Silver halide color photographic light-sensitive material and color image-forming method: m