Radiation imagery chemistry: process, composition, or product thereof inventions 06/07

20070148561 - Exposure equipment having auxiliary photo mask and exposure method using the same: Example embodiments of the present invention may provide exposure equipment having an auxiliary photo mask. The exposure equipment may include a light source, and a first photo mask spaced apart from the light source by a desired distance. A second photo mask may include a third region and a fourth... Agent: Harness, Dickey & Pierce, P.L.C

20070148560 - Thin film pattern forming device and method: A thin film pattern forming device includes a chamber having an inner space communicated with the outside, a first fixing unit provided in the chamber case, a pattern electrode plate having a protrusion electrode protruded with a certain shape, and fixed to the first fixing unit, a second fixing unit... Agent: Ked & Associates, LLP

20070148564 - Patterning method and methods for producing electro-optic device, color filter, illuminant, and thin-film tranisistor: A patterning method forms a pattern including a lyophilic region and a lyophobic region. The method includes treating the surface of an object by exposing an atmosphere containing at least one gas selected from the group consisting of hydrogen, deuterium, deuterated hydrogen, and tritium; partially exposing the treated surface to... Agent: Fitzpatrick Cella Harper & Scinto

20070148556 - Photosensitive composition for volume hologram recording: A volume hologram recording material having a composition that is adjusted in accordance with a recording wavelength in a visible region set individually and specifically, and is excellent in sensitivity or hologram recording performance. A photosensitive composition for volume hologram recording having a photopolymerizable compound, a photopolymerization initiator and a... Agent: Ladas & Parry LLP

20070148557 - Composition for forming nitride coating film for hard mask: There is provided an underlayer coating that causes no intermixing with photoresist layer, can be formed by a spin-coating method, and can be used as a hard mask in lithography process of manufacture of semiconductor device. Concretely, it is an underlayer coating forming composition used in manufacture of semiconductor device... Agent: Oliff & Berridge, PLC

20070148558 - Double metal collimated photo masks, diffraction gratings, optics system, and method related thereto: A photo mask having at least 2 mask pattern layers disposed to collimate light patterns passing through the mask. An improved optical photo lithographic system utilizing light collimating photo masks to improve resolution, depth of focus and field size. A method of manufacturing integrated circuit chips utilizing light collimating photo... Agent: Andrew J Befumo

20070148562 - Method of achieving cd linearity control for full-chip cpl manufacturing: A method of generating masks for printing a pattern including a plurality of features having varying critical dimensions. The method includes the steps of: (1) obtaining data representing the pattern; (2) defining a plurality of distinct zones based on the critical dimensions of the plurality of features; (3) categorizing each... Agent: Mcdermott Will & Emery LLP

20070148559 - Phase shift mask and method for fabricating the same: A phase shift mask and a method for fabricating the same are provided. The phase shift mask includes: a substrate; a multiple thin layer structure formed over the substrate, the multiple thin layer structure including an opening formed to a predetermined depth; and an absorption material filling a portion of... Agent: Blakely Sokoloff Taylor & Zafman

20070148563 - Color filter and fabrication method thereof: A color filter and a method for fabricating the same. At least one conductive film is provided above a light shielding layer between R/G/B color filter units. The conductive film is electrically connected to an electrode layer, thereby reducing the resistance thereof.... Agent: Thomas, Kayden, Horstemeyer & Risley, LLP

20070148565 - Method for manufacturing a color filter: An exemplary method for manufacturing a color filter, comprising the steps of: providing a substrate; forming a black matrix on the substrate; forming a photo-resist layer on the substrate; and continuously exposing the photo-resist layer using at least three light sources respectively having different wavelengths and developing the photo-resist layer... Agent: Wei Te Chung Foxconn International, Inc.

20070148566 - Optical waveguides and methods thereof: Embodiments in accordance with the present invention provide waveguide structures and methods of forming such structures where core and laterally adjacent cladding regions are defined. Some embodiments of the present invention provide waveguide structures where core regions are collectively surrounded by laterally adjacent cladding regions and cladding layers and methods... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070148567 - Method and apparatus for laser-drilling an inkjet orifice in a substrate: An inkjet aperture in a substrate has a compound cross-section including a circular portion and an elongated trough-shaped portion. The aperture is formed in the substrate by laser drilling. A laser beam is projected on a mask having circular apertures corresponding to the circular portion of the inkjet aperture cross-section.... Agent: Stallman & Pollock LLP

20070148568 - Toner and method for producing the same, toner kit, and developer, process cartridge, image forming method and image forming apparatus: A toner kit containing at least a black toner, a yellow toner, a magenta toner and a cyan toner, wherein these toners have at least the binder resin, the colorant and the charge controlling agent having the molecular structure containing K+ as the counterion, when the K+ intensity detected by... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070148569 - Azine-based charge transport materials having two reactive rings: t

20070148571 - Arylamine compound, charge transport material, electrophotographic photoreceptor, image forming apparatus, and process cartridge: Ar1 represents a phenyl group substituted by a substituted or unsubstituted monovalent polycyclic aromatic hydrocarbon group, and a substituted or unsubstituted monovalent heterocyclic group. Ar2 represents a substituted or unsubstituted arylene group. R1 represents a hydrogen atom, a halogen atom, an alkoxy group, or a substituted or unsubstituted alkyl group.... Agent: Oliff & Berridge, PLC

20070148570 - Electrophotographic photoreceptor, process cartridge and image-forming apparatus: 1

20070148572 - Imaging member: An imaging member having an adhesive charge transport layer is disclosed herein. The charge transport layer comprises a low surface energy polymer having siloxane segments in its backbone and a charge transport compound; it may further comprise a film-forming polymer. The charge transport layer has low surface energy, reduced coefficient... Agent: Richard M. Klein, Esq. Fay, Sharpe, Fagan, Minnich & Mckee, LLP

20070148573 - Imaging member: The presently disclosed embodiments are directed to charge transport layers useful in electrostatography. More particularly, the embodiments pertain to an electrostatographic imaging member with an improved charge transport layer including a polymeric binder that lowers the surface energy involved and reduces friction.... Agent: Pillsbury Winthrop Shaw Pittman LLP

20070148574 - Electrophotographic photoreceptor and electrophotographic apparatus: An electrophotographic photoreceptor that without detriment to excellent electrophotographic performance, realizes coating of any defects on a conductive substrate and excels in repetition stability and environmental performance. There is provided an electrophotographic photoreceptor having a photoreceptive layer superimposed via an undercoat layer on a conductive support, characterized in that the... Agent: Stevens Davis Miller & Mosher, LLP

20070148575 - Imaging member: The presently disclosed embodiments are directed to overcoat layers useful in electrostatography. More particularly, the embodiments pertain to an electrostatographic imaging member with an improved overcoat layer including a polymeric binder that lowers the surface energy involved and reduces friction.... Agent: Pillsbury Winthrop Shaw Pittman LLP

20070148576 - Toner for electrostatic charge development, method for manufacturing the toner, and method for forming an image: The present invention provides a toner for electrostatic charge development comprising an amorphous polyester resin, a releasing agent, and magnetic metal particles covered with a resin the main component of which is a crystalline polyester resin.... Agent: Oliff & Berridge, PLC

20070148577 - Hydrophobic inorganic fine particles, hydrophobic inorganic fine particles production process, and toner: Hydrophobic inorganic fine particles characterized by being a mixture of at least small-particle-diameter inorganic fine particles having an average primary particle diameter of 5 to 25 nm and having a maximum peak particle diameter of 20 nm or less and large-particle-diameter inorganic fine particles having an average primary particle diameter... Agent: Fitzpatrick Cella Harper & Scinto

20070148578 - Electrostatic charge image developing toner: Provided is an electrostatic charge image developing toner usable for downsized color image forming apparatus capable of rapid print preparation with neither an influence on production cost nor use of a specific material as the toner constituent material. Also disclosed is an electrostatic charge image developing toner possessing at least... Agent: Lucas & Mercanti, LLP

20070148579 - Binder resin for electrostatic image developing toner, binder resin liquid dispersion for electrostatic image developing toner, electrostatic image developing toner and production processes thereof: o

20070148580 - Non-magnetic toner, two-component developer, and image forming apparatus:

20070148586 - Hardmask compositions for resist underlayer film and method for producing semiconductor integrated circuit device using the same:

20070148587 - Process for preparing stable photoresist compositions:

20070148585 - Hyperbranched polymer, production method therefor and resist composition containing hyperbranched polymer: The present invention provides a hyperbranched polymer suitable as a polymer material for nanofabrication, in particular, photolithography. The hyperbranched polymer of the present invention is characterized by having a core portion prepared by a living radical polymerization of chloromethyl styrene or the like, and an acid decomposition group such as... Agent: Hoffmann & Baron, LLP

20070148583 - Lithographic printing plate precursors with mercapto-functionlalized free-radical polymerizable monomers: Lithographic printing plate precursor comprising: a) an untreated or pretreated substrate and b) a radiation-sensitive coating comprising: (i) at least one polymeric binder soluble or swellable in aqueous alkaline developers; (ii) at least one free-radical polymerizable monomer and/or oligomer comprising at least one non-aromatic C—C double bond and at least... Agent: Patent Legal Staff

20070148588 - Methods of releasing photoresist film from substrate and bonding photoresist film with second substrate: Disclosed herein is a method of releasing a photoresist film from a substrate, which includes forming a self-assembled monolayer (SAM) on a substrate; coating the SAM with a photoresist film; and rinsing the substrate with an alcohol or an acid. According to the photoresist film releasing method, a photoresist film... Agent: Cantor Colburn, LLP

20070148582 - Negative photosensitive composition and negative photosensitve lithographic printing plate: The present invention relates to a negative photosensitive composition comprising: (A) an infrared absorber, (B) an organic boron compound which has a function as a polymerization initiator when used in combination with the infrared absorber (A), (C) an onium salt, and (D) a compound having a polymerizable unsaturated group. The... Agent: Patent Legal Staff

20070148591 - Pattern and wiring pattern and processes for producing them: This invention provides a process for producing a pattern, which can produce a semiconductor device or a display device at low cost, and a pattern produced by the production process. In the present invention, a highly lyophobic surface covering layer is formed on a photosensitive resin composition layer formed on... Agent: Az Electronic Materials Usa Corp. Industrial Property Department

20070148581 - Photoresist composition and method of forming resist pattern: in the formula (1), X represents a C2 to C6 alkylene group of which at least a hydrogen atom is substituted by a fluorine atom; R1 to R3 represent independently of each other an aryl or alkyl group, and at least one of R1 to R3 represents an aryl group.... Agent: Harness, Dickey & Pierce, P.L.C

20070148592 - Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition: A photosensitive composition containing a compound having a specific structure, a pattern-forming method using the photosensitive composition, and a compound having a specific structure used in the photosensitive composition.... Agent: Sughrue-265550

20070148593 - Polymerizable composition and planographic printing plate precursor using the same: There is provided a polymerizable composition comprising (A) a binder polymer, (B) a polymerizable compound having an unsaturated group, and (C) a diaryl iodonium salt having at least two electron-donating groups. The iodonium salt (C) preferably has three or more electron-donating groups. This polymerizable composition is useful as a recording... Agent: Sughrue Mion, PLLC

20070148594 - Polymers, resist compositions and patterning process: A polymer is provided comprising recurring units having formulas (1), (2), (3), (4), (5), and (6) in amounts of 1-60 mol % (1), 1-60 mol % (2), 1-50 mol % (3), 0-60 mol % (4), 0-30 mol % (5), and 0-30 mol % (6), and having a Mw of 3,000-30,000... Agent: Birch Stewart Kolasch & Birch

20070148589 - Positive resist composition and pattern forming method using the same: A positive resist composition, which comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having at least one of a fluorine atom and... Agent: Sughrue-265550

20070148595 - Positive resist composition and pattern forming method using the same: A positive resist composition, which comprises: (A) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure, of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having... Agent: Sughrue-265550

20070148584 - Resist composition and patterning process: Resist compositions comprising as the base resin a polymer having alkoxyisobutoxy as a reactive group which is decomposable under the action of an acid to increase solubility in alkali have advantages including a significantly enhanced contrast of alkali dissolution rate before and after exposure, a high sensitivity, and a high... Agent: Birch Stewart Kolasch & Birch

20070148590 - Siloxane compound, photoresist composition including the siloxane compound and method of forming a pattern using the photoresist composition: s

20070148596 - Hardcoat agent composition and optical information medium thereof: A hardcoat agent composition comprising a fluorine-containing polyether compound (A) having a perfluoropolyether unit, urethane bond and active energy ray reactive group and a curable compound (B) having equal to or more than 2 active energy ray polymerizing groups in the molecule. An optical information medium having a film substance... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070148597 - Method and apparatus for laser exposure of a screen for use in screen printing: The subject matter of the invention is a method for laser exposure of a screen (11), whereas only one portion of the screen (11) is used for motive exposure (16). Providing a method for laser exposure of a screen of the type mentioned herein above, in which soiling of the... Agent: Thomas R. Vigil

20070148600 - Active energy ray-curable resin composition and method for forming resist pattern: Disclosed are an active energy ray-curable resin composition, wherein when the active energy ray-curable resin composition is coated onto a substrate and made into a resist film with a predetermined thickness, a ratio (Y/X) of a quantity of a transmitted active energy ray (Y) after transmission through the resist film... Agent: Knobbe Martens Olson & Bear LLP

20070148598 - Method for fabricating dual damascene structures: A method for fabricating a dual damascene structure includes providing a multi-layer photoresist stack comprising a first photoresist layer and a second photoresist layer, wherein each photoresist layer has a distinct dose-to-clear value, exposing said photoresist stack to one or more predetermined patterns of light, and developing said photo-resist layers... Agent: F. Chau & Associates, LLC

20070148599 - Multiple step printing methods for microbarcodes: A method of forming a plurality of encoded microparticles with a lithography process to define codes for identifying the particles is disclosed herein.... Agent: Muir Intellectual Property Law Group

20070148602 - Method for manufacturing semiconductor device: Disclosed herein is a method for manufacturing a semiconductor device that includes performing an O2 plasma treatment step after forming a Si-containing anti-reflection film.... Agent: Marshall, Gerstein & Borun LLP

20070148603 - Method for forming pattern and method for fabricating lcd device using the same: A method for forming a pattern and a method for fabricating an LCD device using the same is disclosed, wherein a photoresist layer is removed from a substrate without using a photoresist stripper, so that the pattern is formed with a low fabrication costs. The method comprising sequentially forming a... Agent: Mckenna Long & Aldridge LLP

20070148601 - Optical diffuser with uv blocking coating using inorganic materials for blocking uv: A diffuser is provided in an illumination system, where the diffuser is capable of blocking significant amounts of ultraviolet (UV) radiation. In certain example embodiments of this invention, the diffuser includes a glass substrate which supports a UV coating(s) that blocks significant amounts of UV radiation thereby reducing the amount... Agent: Nixon & Vanderhye, PC

20070148604 - Photothermographic material: The present invention provides a photothermographic material having, on at least one side of a support, an image forming layer including at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, and a non-photosensitive layer, wherein the non-photosensitive layer includes at least a... Agent: Taiyo Corporation

20070141488 - Imaging member: In imaging member comprising a charge generating layer, a charge transport layers and an optional barrier layer between the charge generating layer and the charge transport layer. The charge transport layer may comprise a first and a second or more layers, wherein the first layer comprises a film-forming polymer having... Agent: Fay Sharpe LLP

20070141479 - Mask data creation method: A mask pattern includes a main pattern to be transferred through exposure and an auxiliary pattern that diffracts exposing light and is not transferred through the exposure. The main pattern is made from a shielding portion, a phase shifter or a combination of a semi-shielding portion or a shielding portion... Agent: Mcdermott Will & Emery LLP

20070141482 - Mask for crystallizing silicon, apparatus having the mask and method of crystallizing with the mask: A mask for crystallizing silicon includes a first, a second, and a third pattern part arranged in a longitudinal direction, each of the first, second, and third pattern parts including a plurality of unit blocks for transmitting and blocking a portion of light. At least two of the first, second... Agent: Macpherson Kwok Chen & Heid LLP

20070141478 - Method for forming poly-silicon film: A method for forming a poly-silicon film, comprising steps of: (a) providing a system for forming a poly-silicon film, comprising a laser generator for generating a laser beam and a mask disposed in a traveling path of the laser beam, the mask having a plurality of first transparent regions with... Agent: Birch Stewart Kolasch & Birch

20070141476 - More accurate and physical method to account for lithographic and etch contributions in opc models: A method for manufacturing a corrected photo mask using an optical proximity effect correction method, the method comprising of the steps of: producing a test mask that provides a mask pattern for extracting a plurality of function models of a plurality of processes for the optical proximity effect correction method;... Agent: Texas Instruments Incorporated

20070141483 - Near-field exposure photoresist and fine pattern forming method using the same: A near-field photoresist for formation of a fine pattern with by near-field exposure includes an alkali-soluble novalac resin, a diazyde-type photosensitizer which is photoreactive by near-field exposure, a photoacid generator which generates acid by the near-field exposure, and a solvent.... Agent: Fitzpatrick Cella Harper & Scinto

20070141477 - Optical proximity correction method, optical proximity correction mask and conductive line structure: An optical proximity correction method is described. A photomask pattern including multiple line patterns arranged in an end-to-end manner is provided. An initial correction step is conducted to add an end pattern at each of the two ends of each line pattern. Then, a fine correction step is conducted to... Agent: Jianq Chyun Intellectual Property Office

20070141480 - Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask: A method of forming a pattern including a first pattern portion having a first minimum dimension and a second pattern portion having a second minimum dimension includes a first exposure step of performing exposure using a Levenson-type mask and a second exposure step of performing exposure using a half tone-type... Agent: Mcdermott Will & Emery LLP

20070141481 - Photo mask and method of fabricating array substrate for liquid crystal display device using the same: A photo-mask used for fabricating a photoresist pattern in process of fabricating an array substrate for a liquid crystal display device comprises a transmissive area having a first transmittance; a blocking area having a second transmittance; a first half-transmissive area including at least one coating layer and having a third... Agent: Brinks Hofer Gilson & Lione

20070141484 - Color filter and manufacture method thereof: A color filter including a substrate, a black matrix and a plurality of colored patterns is provided. The black matrix is disposed on the substrate and defines a plurality of sub-pixels on the substrate. In each sub-pixel, the height of the black matrix gradually decreases from the outside to the... Agent: Jianq Chyun Intellectual Property Office

20070141485 - Multilayered imaging element: This invention relates to a method of coating multiple layers on a support comprising a) taking a support; b) simultaneously coating on said support a chill settable layer and a non-chill settable layer; c) lowering the temperature of the layers to immobilize said layers; and d) drying said layers. It... Agent: David A. Novais Patent Legal Staff

20070141486 - Device manufacturing method and computer program product: In a double exposure process to print features at a reduced pitch, the critical dimension of features printed in the first exposure is measured and used as a target for the second exposure.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070141487 - Imaging member: An imaging member having an anti-curl back coating is disclosed. The anti-curl back coating comprises a low surface energy polymer having siloxane segments in its backbone and a film forming polymer. The anti-curl back coating has low surface energy and improved surface lubricity.... Agent: Richard M. Klein, Esq. Fay, Sharpe, Fagan, Minnich & Mckee, LLP

20070141489 - Imaging member: An imaging member is disclosed which includes a charge generating layer and a charge transport layer. The charge transport layer includes a first charge transport layer adjacent the charge generating layer and at least a second charge transport layer adjacent the first charge transport layer. Each charge transport layer includes... Agent: Richard M. Klein, Esq. Fay, Sharpe, Fagan, Minnich & Mckee, LLP

20070141490 - Imaging member: An imaging device including a substrate, a charge generating layer, and a charge transport layer is disclosed. A particular charge generating layer is disclosed that includes porphine, or its derivatives, to facilitate charge generation while suppressing ghosting and improving photoreceptor performance.... Agent: Richard M. Klein, Esq. Fay, Sharpe, Fagan, Minnich & Mckee, LLP

20070141491 - Imaging member: An imaging member comprising a barrier or under-layer intermediate a photogenerating layer and charge transport layer to reduce charge deficiency spots. The barrier under-layer comprises a film forming polymer binder selected from a conductive polymer binder, a non-conductive polymer binder, or mixtures thereof. Optionally, the barrier layer can include a... Agent: Richard M. Klein, Esq. Fay, Sharpe, Fagan, Minnich & Mckee, LLP

20070141492 - Additive for photoconductor end seal wear mitigation: This invention provides an organic photoconductor which does not experience end-seal wear in normal use. This invention provides charge transport formulation that is easily prepared and coated by standard, dip-coating methods. This is realized by addition of a small amount of poly(methyl methacrylate-co-ethylene glycol dimethacrylate). Commercially available, 8μ spherical particles... Agent: Lexmark International, Inc. Intellectual Property Law Department

20070141493 - Imaging member: An imaging member having an anti-curl back coating comprising an inner layer and an outer layer is disclosed. The outer layer comprises a low surface energy polymer having siloxane segments in its backbone and the inner layer comprises a film forming polymer. The anti-curl back coating has low surface energy... Agent: Richard M. Klein, Esq. Fay, Sharpe, Fagan, Minnich & Mckee, LLP

20070141494 - Solvent-free toner making process using phase inversion: A process for making toner particles comprising: (a) forming an emulsion comprising a disperse phase including a first aqueous composition and a continuous phase including molten one or more ingredients of a toner composition, wherein there is absent a toner resin solvent in the continuous phase; (b) performing a phase... Agent: Patent Documentation Center

20070141495 - Emulsion/aggregation toners having novel dye complexes: Disclosed is a toner particle having at least binder and colorant. The colorant is a dye complex comprising a dye, a nonionic surfactant and a complexing agent. The toner having this colorant exhibits improved color gamut.... Agent: Oliff & Berridge, PLC

20070141498 - Toner, developer, and image forming apparatus: A toner is provided including a binder resin; a release agent; a colorant; and a fatty acid amide compound, wherein the binder resin includes: an amorphous polyester (A) having a softening point of from 70 to 140° C.; an amorphous polyester (B) having a softening point of from 120 to... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070141496 - Toner compositions: A toner composition that includes a resin substantially free of cross linking, a cross linked resin, a polyester resin as a crystalline polyester resin, and a colorant.... Agent: Oliff & Berridge, PLC.

20070141497 - Toner for developing electrostatic latent image, developer for developing electrostatic latent image, and image-forming process using the toner for developing electrostatic latent image: The present invention provides a toner for developing an electrostatic latent image comprising a releasing agent containing a hydrocarbon, a binder resin, and a colorant, wherein, when an average carbon number of the hydrocarbon is designated as N, the hydrocarbon contains components having a carbon number in the range of... Agent: Oliff & Berridge, PLC

20070141499 - Toner: The invention provides a toner which is excellent in its low-temperature fixing property and high-temperature offset resistance regardless of the types of paper, and constantly provides high-quality images regardless of environments and does not generate image defects even after prolonged use. In a master curve of the toner at a... Agent: Fitzpatrick Cella Harper & Scinto

20070141500 - Toner, method of preparing the toner, and developer, image forming method, image forming apparatus, and process cartridge using the toner: A toner is provided including a colorant; a first binder resin; and a second binder resin, wherein an amount of the first binder resin and an amount of the second binder resin are phase separated from each other in the toner, and wherein a phase of the first binder resin... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070141502 - Ferrite carrier core material for electrophotography, ferrite carrier for electrophotography and methods for producing them, and electrophotographic developer using the ferrite carrier: A ferrite carrier core material for electrophotography having a homogeneous composition, a certain surface property, a favorable fluidity, a high magnetization and a low resistance, and a ferrite carrier for electrophotography methods for producing them, and an electrophotographic developer using the ferrite carrier-core material, which exhibits a fast charge rising... Agent: Rothwell, Figg, Ernst & Manbeck, P.C.

20070141501 - Chemically prepared porous toner: The present invention provides a porous toner. The porous toner has a porosity of greater that 20 percent. The toner can include vinyl polymers, copolymers of styrene monomers and polyesters. In addition a method of manufacture of the toner particles is provided.... Agent: Paul A. Leipold Eastman Kodak Company

20070141503 - Resin particle liquid dispersion for electrostatic image developing toner, production process of the liquid dispersion, electrostatic image developing toner, production process of the toner, electrostatic image developer and image forming method: A resin particle liquid dispersion for an electrostatic image developing toner comprises: a terminal addition-polymerized polyester having an acid value of from about 5 to about 70 mg.KOH/g, and the terminal addition-polymerized polyester is obtained by a process comprising: polycondensing a polycondensable monomer having a composition comprising the components (a)... Agent: Oliff & Berridge, PLC

20070141504 - Liquid developer: r

20070141505 - Method for producing electrophotographic photoreceptor, electrophotographic photoreceptor and image forming apparatus: An method for producing an electrophotographic proreceptor includes a first coating step of applying a coating liquid containing a sublimable antioxidant and a photoconductive substance, onto a conductive substrate to form a first coating film thereon, a first drying step of drying the formed first coating film by heating to... Agent: Nixon & Vanderhye, PC

20070141506 - Toner, method for manufacturing the toner, developer including the toner, toner container containing the toner, and image forming method, image forming apparatus and process cartridge using the toner: A toner including toner particles comprising a binder resin; and at least two kinds of particulate resins which are located on at least a surface of the toner particles, wherein the toner satisfies at least one of the following relationships (TgA−TgB)≧20° C., wherein TgA and TgB represent glass transition temperatures... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070141507 - Curable polyester having an oxetanyl group at end and process for preparing the same, resist composition, jet printing ink composition, curing methods and uses thereof: There are provided a novel curable polyester, a cured product thereof, and a process for preparing the same, as well as a resist composition and a jet Printing ink composition comprising the curable polyester, curing methods and uses thereof. The curable polyester of the present invention has a polyester skeleton... Agent: Sughrue Mion, PLLC

20070141511 - Cyclic compound, photoresist composition and method of forming a photoresist pattern using the same: A photoresist composition includes a cyclic compound, a photoacid generator, and an organic solvent. The cyclic compound includes any one selected from the group consisting of moieties having chemical structures represented by the formulae (1), (2), (3) and (4) set forth herein, and at least one moiety having the chemical... Agent: Volentine Francos, & Whitt PLLC

20070141514 - Method for forming photoresist pattern and photoresist laminate: A method for forming a photoresist pattern involves the steps of: depositing a photoresist film on a substrate, the photoresist film containing an acid-generating agent capable of generating an acid upon exposure to light; overlaying an antireflective film over the photoresist film, the antireflective film containing a fluorine-based acidic compound;... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070141510 - Nanocomposite photosensitive composition and use thereof: The present invention relates to a photoresist composition suitable for image-wise exposure and development as a negative photoresist comprising a negative photoresist composition and an inorganic particle material having an average particle size equal or greater than 10 nanometers, wherein the thickness of the photoresist coating film is greater than... Agent: Alan P. Kass Az Electronic Materials Usa Corp.

20070141509 - Negative photoresist composition: The present invention is directed to a negative photoresist composition which mainly is composed of a) a polyimide having pendant carboxyl groups, wherein a portion of the carboxyl groups reacted with glycidyl (meth)acrylate monomers to form covalent bonds. The photoresist composition further contains b) monomers having a tertiary amino group... Agent: Bacon & Thomas, PLLC

20070141508 - Negative resist composition and method for forming resist pattern: Disclosed is a negative resist composition which enables to form a resist pattern with improved shape properties by reducing roughness. Also disclosed is a method for forming a resist pattern using such a negative resist composition. The negative resist composition contains at least an alkali-soluble resin, a crosslinking agent which... Agent: Harness, Dickey & Pierce, P.L.C

20070141512 - Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive composition: A photosensitive composition containing a compound having a specific structure as described in the specification, a pattern-forming method using the photosensitive composition and the compound having a specific structure used in the photosensitive composition.... Agent: Sughrue-265550

20070141513 - Positive photosensitive composition: A positive photosensitive composition comprising (A) an acid generator that generates an acid upon irradiation of an actinic ray or radiation, (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution,... Agent: Sughrue Mion, PLLC

20070141515 - Process for forming a solder mask, apparatus thereof and process for forming electric-circuit patterned internal dielectric layer: In a process for forming a solder mask, a photoimageable ink is coated on a carrier film to form a photoimageable ink layer on the carrier film. The photoimageable ink layer is dried to form a photoimageable resist layer, thereby forming at least one photoimageable resist layer bearing film. The... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070141517 - Resist resolution using anisotropic acid diffusion: Methods for increasing the resolution capability and line edge roughness of resists, including chemically amplified resists are disclosed. In order to improve upon the resolution, dipolar species may be coupled to a photoacid group and/or added to the resist, where the dipolar species may influence the direction of acid diffusion.... Agent: Fulbright & Jaworski L.L.P.

20070141516 - Ultra dark polymer: A method and a material for creating an antireflective coating on an integrated circuit. A preferred embodiment comprises applying a dark polymer material on a reflective surface, curing the dark polymer material, and roughening a top surface of the dark polymer material. The roughening can be achieved by ashing the... Agent: Texas Instruments Incorporated

20070141518 - Silver halide emulsion and silver halide color photographic light-sensitive material: wherein MD1 represents Cr, Mo, Re, Fe, Ru, Os, Co, Rh, Pd, or Pt; XD1 represents a halogen ion; LD1 represents a ligand other than XD1; n represents 3, 4, 5, or 6; and m represents 4-, 3-, 2-, 1-, 0 or 1+.... Agent: Sughrue Mion, PLLC

20070134559 - Hologram production method and hologram production system employing silver halide photosensitive material: A hologram production method comprising steps in which a specific image-converting apparatus, specific hologram exposure apparatus, and specific processor are used, wherein the exposure apparatus is of the type in which partial element holograms are formed on a photosensitive material by exposing the photosensitive material while moving the exposure head... Agent: Sughrue-265550

20070134565 - Color filter mask layout: Embodiments relate to a color filter mask layout that may be capable of reducing an SNR by preventing an occurrence of a corner rounding during manufacturing of a color filter. In embodiments, a color filter mask layout may include a blue color filter mask pattern disposed at a center part,... Agent: Sherr & Nourse, PLLC

20070134562 - Fabrication method for photomask, fabrication method for device and monitoring method for photomask: A fabrication method for a photomask is disclosed. Two or more metal layers are formed over a substrate, and a main pattern and a monitor pattern are formed over one or more ones of the two or more metal layers other than the lowermost metal layer. Then, the monitor pattern... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070134568 - Halftone type phase shift mask blank and halftone type phase shift mask: A halftone type phase shift mask having a semitranslucent film pattern and a shielding film pattern provided on a transparent substrate in this order is constituted in such a manner that each of the reflectances of the transparent substrate, the semitranslucent film pattern and the shielding film pattern for an... Agent: Sughrue-265550

20070134560 - Lithography system using a programmable electro-wetting mask: A maskless lithography system is described having a programmable mask to allow performing several lithographic steps using the same mask. In every lithographic step, the corresponding pattern is obtained by providing a digital pattern to the programmable mask. The programmable mask includes an array of pixels which are based on... Agent: Philips Intellectual Property & Standards

20070134567 - Mask and method of manufacturing display device using the same: A mask for deposition of a low molecule deposition on a substrate for a display device comprises: a supporting frame formed with a pattern forming region; a plurality of pattern forming parts formed in the pattern forming region; and an auxiliary supporting frame formed between the pattern forming parts.... Agent: Macpherson Kwok Chen & Heid LLP

20070134564 - Method of manufacturing semiconductor device, mask and semiconductor device: A method of manufacturing a semiconductor device answerable to refinement of circuits by correctly connecting adjacent small patterns with each other with excellent reproducibility in connective exposure and a semiconductor device manufactured by this method are proposed. According to this method of manufacturing a semiconductor device, connective exposure is performed... Agent: Mcdermott Will & Emery LLP

20070134563 - Photomask and method of manufacturing semiconductor device: A photomask is disclosed, which includes a substrate transparent to irradiation light, a low density diffraction area having a plurality of low-density arranged light reducing portions which are arranged at a low density on the transparent substrate at a period more than twice the wavelength of the irradiation light, and... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070134561 - Systems and methods for reducing edge effects: systems, methods, and programs for reducing edge effects, the systems, methods, and programs include inputting an image mask, the image mask defining the location of a boundary to recieve a coating , modifying an edge of the image mask to reduced the thickness of the coating at the modified edge;... Agent: Oliff & Berridge, PLC.

20070134566 - Titania-doped quartz glass and making method, euv lithographic member and photomask substrate: A titania-doped quartz glass containing 3-12 wt % of titania at a titania concentration gradient less than or equal to 0.01 wt %/μm and having an apparent transmittance to 440 nm wavelength light of at least 30% at a thickness of 6.35 mm is of such homogeneity that it provides... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070134569 - Electrophotographic photosensitive member, method of producing the same and image forming apparatus: The present invention relates to an electrophotographic photosensitive member and an image forming apparatus provided with the electrophotographic photosensitive member. The electrophotographic photosensitive member includes a cylindrical body and a photosensitive layer formed on a circumferential surface of the cylindrical body and including a latent image forming area and a... Agent: Hogan & Hartson L.L.P.

20070134570 - Long life photoconductors: A photoconductor with a charge transport layer having about 20-25% by weight of 4-N,N-bis(4-methylphenyl)-amino-benzaldehyde-N′,N′-diphenylhydrazone is in an essentially standard resin binder, such as a polycarbonate resin binder. Electrical characteristics are those of the larger amounts using conventional charge transport agents, and the larger amount of binder provides much improved wear... Agent: Lexmark International, Inc. Intellectual Property Law Department

20070134571 - Photoconductive members: p

20070134572 - Photoconductive members: wherein each of R1, R2, R3, and R4 are the same or different and are independently selected from the group consisting of hydrogen, alkyl, aryl, hydrocarbon, which may be optionally substituted or arranged in such a way as to form a cyclic ring which can be either saturated or unsaturated... Agent: Marylou J. Lavoie, Esq. LLC

20070134574 - Method of manufacturing organic thin film transistor: Provided is a method of manufacturing an organic thin film transistor (OTFT). The method comprises forming all components in the OTFT including electrodes, an insulating layer, and an organic layer using laser printing. The laser printing allows formation of a fine pattern by selectively scattering toner only on a portion... Agent: Lowe Hauptman Berner, LLP

20070134573 - Photoreceptor with overcoat layer: An electrophotographic imaging member includes a substrate, a charge generating layer, a charge transport layer, and an overcoating layer, where the overcoating layer includes a terphenyl arylamine dissolved or molecularly dispersed in a polymer binder.... Agent: Oliff & Berridge, PLC.

20070134575 - Photoconductive members: wherein each of R1, R2, R3, and R4 are the same or different and are independently selected from the group consisting of hydrogen, alkyl, aryl, hydrocarbon, which may be optionally substituted or arranged in such a way as to form a cyclic ring which can be either saturated or unsaturated... Agent: Marylou J. Lavoie, Esq. LLC

20070134576 - Toner composition: Toner compositions having reduced odor are provided.... Agent: George Likourezos, Esq C/o Carter, Deluca, Farrell & Schmidt, LLP

20070134577 - Toner composition: Copolymer encapsulated wax particles and their use in forming toner compositions having particles with a desired circularity and size are provided.... Agent: Carter, Deluca, Farrell & Schmidt, LLP

20070134578 - Electrophotographic developing agent: An electrophotographic developing agent including an untreated toner including a binding resin, a black colorant, and a charge controlling agent, and an external additive added to a surface of the untreated toner, wherein the black colorant includes a titanium oxide. Accordingly, the electrophotographic developing agent has good mixing properties, dispersion... Agent: Stanzione & Kim, LLP

20070134579 - Processes for producing toner by treatment with enzyme: Herein is disclosed a process for producing emulsion aggregation toner including (i) adding a base to an emulsion aggregation toner to increase the pH of the toner to from about 7 to about 12; (ii) sieving and filtering the toner; (iii) washing the toner with an enzyme selected from the... Agent: Patent Documentation Center Xerox Corporation

20070134580 - Electrophotographic toner and image-forming system: An electrophotographic toner for visualizing an electrostatic latent image formed by an electrophotographic process, an electrostatic printing process, an electrostatic recording process, etc., which is produced in consideration of the environment and safety. The electrophotographic toner includes a fixing resin and a colorant. The electrophotographic toner is a black toner... Agent: Mcginn Intellectual Property Law Group, PLLC

20070134581 - Toner, toner production method, and image forming method: The present invention provides a method for producing a toner including preparing an emulsified dispersion which contains emulsion particles by emulsifying or dispersing an oil phase containing at least a pigment and any one of a binder resin and a binder resin precursor in an aqueous medium, and granulating toner... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070134583 - Method of preparing toner and toner prepared using the method: A method of preparing a toner, includes: preparing a toner composition including a macromonomer including a hydrophilic group, a hydrophobic group, and one or more reactive functional groups, and one or more polymerizable monomers; emulsion polymerizing the toner composition while further adding one or more materials selected from the group... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.

20070134582 - Toner for developing electrostatic charge images: A toner for developing electrostatic charge images in which offset phenomenon and winding phenomenon do not occur in a wide temperature range, even if the binding resin contains the alicyclic olefinic resin, that is, a toner for developing electrostatic charge images which is superior in fixability in a high temperature... Agent: Antonelli, Terry, Stout & Kraus, LLP

20070134584 - Liquid developer: A liquid developer which has excellent preservability, storage stability for a long period of time, and fixing characteristic of toner particles and which is also harmless to the environment is provided. The liquid developer contains an insulation liquid and toner particles dispersed in the insulation liquid. The insulation liquid contains... Agent: Hogan & Hartson L.L.P.

20070134585 - Dissolution inhibitors in photoresist compositions for microlithography: The invention relates to photoresist composition suitable for use at 10-165 nm comprising: (a) a polymeric binder (b) a photoactive compound (c) a dissolution inhibitor, the dissolution inhibitor comprising at least (i) two aromatic groups, (ii) fluorine and (iii) a blocked acid group which when unblocked has a pKa<12. Preferred... Agent: Nixon & Vanderhye, PC

20070134587 - Lithographic printing plate precursor and lithographic printing method: A lithographic printing plate precursor comprising a support and an image-forming layer which is capable of being removed with at least one of a printing ink and dampening water, wherein the image-forming layer contains a stratiform compound.... Agent: Birch Stewart Kolasch & Birch

20070134593 - Material for forming resist protecting film for use in liquid immersion lithography process, composite film, and method for forming resist pattern: Provided are a material for forming a resist protecting film which is for use in a liquid immersion lithography process and which is formed on a resist film, wherein the material has the following properties of: being transparent with respect to exposure light; having substantially no compatibility with a liquid... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070134592 - Photosensitive lithographic printing plate and method for making a printing plate: A photosensitive lithographic printing plate includes a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate... Agent: Agfa C/o Keating & Bennett, LLP

20070134591 - Positive photoresist composition: A positive photoresist composition comprising an alkali-soluble resin, a 1,2-quinonediazide compound, an organic solvent, and a fluorinated organosilicon compound of formula (1) serving as a surfactant can be effectively coated to uniformity over large areas and is improved in resist pattern profile. Rf is a C5-C30 perfluoroalkyl group containing at... Agent: Birch Stewart Kolasch & Birch

20070134589 - Positive resist composition and pattern forming method using the same: wherein R1 represents a hydrogen atom or an alkyl group; R2 represents a fluoroalkyl group; R3 represents a hydrogen atom or a monovalent organic group; R4 to R7 each independently represents a hydrogen atom, a fluorine atom, an alkyl group, a fluoroalkyl group, an alkoxy group or a fluoroalkoxy group,... Agent: Sughrue-265550

20070134590 - Positive resist composition and pattern making method using the same: A positive resist composition comprising: (A) a resin showing an increase in the solubility in an alkali developer by the action of an acid; (B) a compound being capable of generating an acid when irradiated with an actinic ray or a radiation; (C) a resin having a silicon-containing repeating unit... Agent: Sughrue-265550

20070134588 - Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition: A positive resist composition comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having at least one of a fluorine atom and a... Agent: Sughrue-265550

20070134586 - Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern: wherein R1 represents hydrogen atom or methyl group; R2 to R9 independently represent hydrogen atom, halogen atom or alkyl group having 1 to 4 carbon atoms; X represents —CH═N—, —CONH—, —(CH2)n—CH═N— or —(CH2)n—CONH— and the N atom in X is bonded to a carbon atom in the benzene ring having... Agent: Young & Thompson

20070134594 - Fluorescent dye and structure and manufacturing method of fluorescent storage media using thereof: A fluorescent dye, a structure of a fluorescent storage media and method using thereof, are disclosed. The fluorescent dye of the present invention comprises an organic violet fluorescent compound having a chemical structure (I) is suitable for using a short wavelength laser having a wavelength less than 500 nm as... Agent: J.c. Patents

20070134595 - Pressurized aerosol formulation for use in radiation sensitive coatings: The present invention is directed to a coating composition, comprising a photoresist composition; and a propellant miscible in the photoresist composition, as well as a pressurized container, comprising a coating composition contained in the pressurized container and comprising a photoresist composition; and a propellant miscible in the photoresist composition; and... Agent: Wiggin And Dana LLP Attention: Patent Docketing

20070134596 - Photosensitive printing element having nanoparticles and method for preparing the printing element: This invention relates to a photosensitive printing element for use as a flexographic printing form and a process for preparing the form from the element. The photosensitive element has a layer of a photopolymerizable composition that comprises an elastomeric binder, a photoinitiator, a monomer comprising silica particles bonded with an... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20070134598 - Manufacturing method of semiconductor device, and wafer and manufacturing method thereof: A semiconductor device manufacturing method which makes it possible to accurately grasp chip positions on a wafer. The method comprises the steps of forming an uppermost layer wiring, a passivation film and a resist; exposing, using a reticle having formed thereon a pad pattern, exposure shot regions excluding one exposure... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070134597 - Process to form an isolated trench image in photoresist: An isolated hole in a photoresist layer is formed by surrounding it with additional, somewhat narrower, dummy hole features. The ratio of feature width to resist thickness is adjusted so that, after development, there is no resist on the floor of the isolated (main) hole whereas a reduced, but finite,... Agent: Stephen B. Ackerman

20070134600 - Coating and developing apparatus, coating and developing method and storage medium in which a computer-readable program is stored: A coating and developing apparatus comprises a washing section for washing the surface of a substrate after it has been subjected to a dipping exposure process in an exposing apparatus, and a first substrate carrying means adapted to transfer the substrate carried out from the exposing apparatus after the dipping... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070134599 - In-situ functionalization of carbon nanotubes: An embodiment of the present invention is a technique to functionalize carbon nanotubes in situ. A carbon nanotube (NT) array is grown or deposited on a substrate. The NT array is functionalized in situ with a polymer by partial thermal degradation of the polymer to form a NT structure. The... Agent: Blakely Sokoloff Taylor & Zafman

20070134601 - Rinsing method and developing method: A rinsing process is performed by supplying a rinsing liquid onto a substrate with a light-exposed pattern formed thereon and treated by a developing process. The rinsing liquid contains a polyethylene glycol family surfactant or an acetylene glycol family surfactant in a critical micelle concentration or less. Preferably, the surfactant... Agent: Smith, Gambrell & Russell

20070134602 - High-pressure processing apparatus: A high-pressure processing apparatus is used for performing a film formation process on a target object, while using a process fluid containing a high-pressure fluid and a film formation source material. The apparatus includes a pressure tight container defining a process field for accommodating the target object, and configured to... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070134603 - Photothermographic material: The present invention provides a photothermographic material comprising a substrate, and a photosensitive silver halide, a non-photosensitive organic silver salt, reducing agents for thermal development and a binder which are provided on the substrate, wherein: the reducing agents for thermal development include a reducing agent which does not form a... Agent: Taiyo Corporation

20070128523 - Optical refractive index-modifying polymer composition, hologram recording material and method of controlling refractive index: P

20070128527 - Angled-wedge chrome-face wall for intensity balance of alternating phase shift mask: A method and structure for a phase shift mask having a light reducing layer with sloped sidewalls. In some embodiments, the sloped sidewalls can help improve the image imbalance. The mask comprising: a substrate having a first region, a second region and a third region; the third region position between... Agent: William Stoffel

20070128528 - Mask blank and photomask having antireflective properties: The present invention relates to mask blanks with anti reflective coatings comprising at least two sublayers. Such bilayer or multilayer anti reflective coatings are advantageous for binary and phase shift mask blanks for use in lithography for an exposure wavelength of 300 nm or less with improved anti reflection properties;... Agent: Millen, White, Zelano & Branigan, P.C.

20070128524 - Method of arranging mask patterns: A method of arranging mask patterns, which includes a first mask has a first mask pattern, a second mask has a second mask pattern. The distance between the first mask boundary and the first mask pattern boundary is different form the distance between the second mask boundary and the second... Agent: North America Intellectual Property Corporation

20070128526 - Non-collinear end-to-end structures with sub-resolution assist features: Sub-resolution assist features for non-collinear features are described for use in photolithography. A photolithography mask with elongated features is synthesized. An end-to-end gap between two features if found for which the ends of the two features facing the gap are linearly offset from one another. A sub-resolution assist feature is... Agent: Blakely Sokoloff Taylor & Zafman

20070128525 - Sub-resolution assist features for photolithography with trim ends: Sub-resolution assist features with trim ends are described for use in photolithography. A photolithography mask with elongated features is synthesized. A sub-resolution assist feature is applied to an end-to-end gap between the elongated features. Trim is applied to the ends of the sub-resolution assist feature, the trim connecting the sub-resolution... Agent: Blakely Sokoloff Taylor & Zafman

20070128529 - Exposure method and apparatus, coating apparatus for applying resist to plural substrates, and device manufacturing method: Disclosed are an exposure method and apparatus, a coating apparatus and a device manufacturing method, wherein, in one preferred form, the exposure method is used to expose a resist having been applied onto a substrate by one of a plurality of resist coating units, and it includes a selecting step... Agent: Cowan Liebowitz & Latman P.C. John J Torrente

20070128530 - Tetrahydroxy compound, method for preparing the tetrahydroxy compound, and photoreceptor using the tetrahydroxy compound: A new tetrahydroxy compound having a specific structure including two 2,3-dihydroxypropyloxy groups is provided. The compound has good charge transport property. In addition, a charge transport layer including the tetrahydroxy compound or a reaction product of the tetrahydroxy compound is provided. Further, a charge transport layer coating liquid is provided... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070128532 - Monoazo pigment preparations based on c.i. pigment yellow 74: The invention relates to a pigment preparation containing CI pigment yellow 74 according to formula (I) as a basic pigment and CI pigment yellow 62 according to formula (II) as a pigment dispersing agent.... Agent: Clariant Corporation Intellectual Property Department

20070128531 - Non-magnetic, ceramic one-component toner: A non-magnetic, ceramic one-component toner which is transferred onto a glass, glass ceramics or ceramics substrate or a similar solid or flexible substrate by electrophotographic printing and is burnt into in a subsequent temperature process. The one-component toner includes a synthetic matrix and a portion of substantially inorganic foreign matter.... Agent: Pauley Petersen & Erickson

20070128533 - Process for producing a toner: The present invention relates to a process for producing a toner which includes the steps of emulsifying a resin binder containing a polyester in an aqueous medium to prepare an emulsion of the resin binder and adding a water-soluble nitrogen-containing compound having a molecular weight of 350 or less to... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070128534 - Liquid developer and image forming apparatus using the same: A liquid developer includes a vegetable oil, a positively chargeable pigment, and a phosphorous acid ester compound. Here, the vegetable oil contains 30% to 80% by mass of triglyceridic linoleic acid component... Agent: Hogan & Hartson L.L.P.

20070128535 - Liquid developer and image forming apparatus using the same: A liquid developer includes a positively chargeable pigment, a carrier liquid formed of a vegetable oil, and an antioxidant formed of a phosphorous acid ester compound.... Agent: Hogan & Hartson L.L.P.

20070128536 - Liquid developer and image forming apparatus using the same: A liquid developer includes a carrier liquid formed of a vegetable oil containing a positively chargeable pigment, wherein the liquid developer contains an antioxidant formed of a phosphorus acid ester compound and contains 10% to 60% by mass of triglyceridic linolenic acid component in the carrier liquid.... Agent: Hogan & Hartson L.L.P.

20070128537 - Toner manufacturing method: A toner manufacturing method that allows production of toner having desired characteristics with stability in accordance with fusion emulsification technique for obtaining a toner by granulating a resin kneaded product while dispersing it in an aqueous medium. A resin kneaded product containing at least a binder resin and a colorant... Agent: Nixon & Vanderhye, PC

20070128538 - Method of depositing an amorphous carbon layer: A method of forming an integrated circuit using an amorphous carbon film. The amorphous carbon film is formed by thermally decomposing a gas mixture comprising a hydrocarbon compound and an inert gas. The amorphous carbon film is compatible with integrated circuit fabrication processes. In one integrated circuit fabrication process, the... Agent: Patterson & Sheridan, LLP

20070128539 - Composition for removing photoresist and method of forming a pattern using the same: In a method of forming a pattern using a composition for removing photoresist, a layer is formed on a substrate, and then a photoresist pattern is formed on the layer. A portion of the layer exposed by the photoresist pattern is etched using the photoresist pattern as an etching mask... Agent: Daly, Crowley, Mofford & Durkee, LLP

20070128541 - Materials for photoresist, negative-tone photoresist composition, method of forming resist pattern, and semiconductor device: With the tendency of reducing the size of semiconductor circuit patterns, edge roughness on a resist pattern is increased when pattern dimensions required are close to the size of the resist molecules. The present invention provides a technique for preventing degradation of the device performance and negative effects over the... Agent: Antonelli, Terry, Stout & Kraus, LLP

20070128540 - Photoresist resin composition, method of forming a photoresist pattern, and method of manufacturing a display substrate using the same: A photoresist resin composition comprises about 10 to about 35% by weight of an acryl-based copolymer, about 5 to about 10% by weight of a quinone diazide compound, about 55 to about 80% by weight of a solvent, and about 0.01 to about 0.5% by weight of a silane-based surfactant... Agent: Cantor Colburn, LLP

20070128542 - Recording method: According to an aspect of the invention, there is provided a method of recording an image, including irradiating a CO2 laser having a wavelength of from 9 to 11 μm onto a recording material in which a recording layer and a protective layer are provided on a support in this... Agent: Sughrue Mion, PLLC

20070128543 - Topcoats for use in immersion lithography: A method of forming a top coat layer and a topcoat material for use in immersion lithography. A topcoat layer is formed on a photoresist layer from an aqueous solution that is immiscible with the photoresist layer. The topcoat layer is then rendered insoluble in neutral water but remains soluble... Agent: Schmeiser, Olsen & Watts

20070128544 - Information recording device and method: There is provided an information recording device for recoding information onto an information recording medium including a first recording layer (L0 layer) having a first recording capacity and a second recording layer (L1 layer) having a second recording capacity. The information recording device includes: write means capable of writing information... Agent: Young & Thompson

20070128545 - Information recording medium, information recording apparatus and method, and computer program: An information recording medium (100) is provided with: a first recording layer (L0 layer) and a second recording layer (L1 layer) in each of which record information can be recorded, the information recording medium includes a plurality of block areas, each of which is a unit of recording the record... Agent: Young & Thompson

20070128546 - Imageable members with improved chemical resistance: Both single-layer and multilayer imageable elements have a substrate and at least one imageable layer. The elements can be used to prepare either negative- or positive-working imaged elements, for example as lithographic printing plates. The imageable elements also include a radiation absorbing compound and a solvent-resistant polymer comprising pendant phosphoric... Agent: Paul A. Leipold Eastman Kodak Company

20070128548 - Photosensitive composition comprising triazine-based photoactive compound containing oxime ester: The present invention relates to a photosensitive composition comprising a triazine-based photoactive compound containing oxime ester. The photosensitive composition according to the present invention has good sensitivity, retention rate, mechanical strength, heat resistance, chemical resistance and developing durability since it contains, as photopolymerization initiator, a compound having an oxime ester... Agent: Mckenna Long & Aldridge LLP

20070128547 - Positive resist composition: A positive resist composition comprising a polymer capable of increasing its solubility in an alkali developer under action of an acid, wherein the resin comprises repeating units containing at least two special types of acetal structures separately, a compound capable of generating an acid upon irradiation with an actinic ray... Agent: Sughrue-265550

20070128549 - Method of fabricating nanoimprint mold: Provided is a method of fabricating a nanoimprint mold which can form sub-100 nm fine pattern structures. The method includes forming patterns on a first substrate using an E-beam lithography (EBL) process, and transferring the patterns formed on the first substrate to a second substrate using a nanoimprint lithography (NIL)... Agent: Mayer, Brown, Rowe & Maw LLP

20070128550 - Method for preparation of lithographic printing plate and lithographic printing plate precursor: A method for preparing a lithographic printing plate comprising: exposing a lithographic printing plate precursor comprising a hydrophilic support, a photosensitive layer containing (A) a sensitizing dye having an absorption maximum in a wavelength range of from 350 to 450 nm represented by the formula (I) or (II) as defined... Agent: Sughrue-265550

20070128552 - Manufacturing method of pattern formed body and pattern formed body manufacturing apparatus: A main object of the invention is to provide a a manufacturing method of a plurality of pattern formed bodies which makes it possible that even if the pattern formed bodies are continuously manufactured, their property varied patterns are each made into a target pattern form with high precision; and... Agent: Ladas & Parry LLP

20070128551 - Manufacturing method of thin film transistor array panel: A method of manufacturing a thin film transistor array panel. The method includes forming an amorphous silicon layer, an insulating layer, and a conductive layer on a substrate, forming a first photoresist having a first portion and a second portion with a thickness less than the first portion on the... Agent: F. Chau & Associates, LLC

20070128553 - Method for forming feature definitions: Methods are provided for processing a substrate by depositing a negative mask material on a surface of the substrate, etching the negative mask material to the substrate surface to form negative mask feature definitions, depositing an etch resistant material in the negative mask feature definitions, polish the etch resistant material... Agent: Patterson & Sheridan, LLP

20070128556 - Method of manufacturing semiconductor integrated circuit devices: To alleviate the absolute value control accuracy of phases in a mask having a groove shifter structure, transfer regions formed at different planar positions on the same plane of the same mask are subjected to a multiple exposure by scanning exposure. Although. identical mask patterns are formed over the transfer... Agent: Antonelli, Terry, Stout & Kraus, LLP

20070128555 - Novel ester compound, polymer, resist composition, and patterning process: A polymer comprising recurring units (2) obtained through polymerization of an ester compound of formula (1) is used to form a resist composition. R1 is F or C1-C6 fluoroalkyl, R2 is H or C1-C8 alkyl, R3 is O or C1-C6 alkylene, R4 and R5 each are H or C1-C10 alkyl... Agent: Birch Stewart Kolasch & Birch

20070128557 - Phototool coating: A phototool having a fluorinated phosph(on)ate coating and methods of using the phototool.... Agent: 3m Innovative Properties Company

20070128554 - Semiconductor device manufacturing method to form resist pattern, and substrate processing apparatus: This invention discloses a method to form a resist pattern on a to-be-processed substrate by immersion exposure. A resist film is formed on the central portion of the upper surface of the to-be-processed substrate, on a bevel portion of the upper surface, which is obtained by chamfering the peripheral portion... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070128558 - Pattern formation method and exposure system: After forming a resist film made from a chemically amplified resist material, pattern exposure is carried out by irradiating the resist film with exposing light while supplying, between a projection lens and the resist film, a solution of water (having a refractive index of 1.44) that includes an antifoaming agent... Agent: Mcdermott Will & Emery LLP

20070128559 - Material for forming fine pattern, method of forming fine pattern, method of manufacturing electronic device using the same, and electronic device manufactured from the same: A raw material of a cover layer as a material for forming a fine pattern is applied as to cover a resist pattern. Then, a component in the cover layer permeates into the resist pattern. Thereby, a mixed layer having a lower softening point than that of the resist pattern... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070128560 - Photographic element with speed-enhancing compound: The invention provides a color photographic element comprising at least one light-sensitive silver halide emulsion layer or a non silver-containing light-insensitive layer, in which at least one of these layers contains a colorless heterocyclic compound having either one or two hetero atoms in the ring or ring system, being other... Agent: Patent Legal Staff