Radiation imagery chemistry: process, composition, or product thereof inventions 05/07

20070122719 - Method and apparatus for generating opc rules for placement of scattering bar features utilizing interface mapping technology: A method of applying optical proximity correction features to a mask having a plurality of features to be imaged. The method includes the steps of defining a set of process parameters to be utilized to image the mask; defining a set of pitch ranges corresponding to pitches exhibited by the... Agent: Mcdermott Will & Emery LLP

20070122718 - Method of manufacturing gray scale mask and microlens, microlens, spatial light modulating apparatus and projector: A gray scale mask having distribution of light transmittance determined for the purpose of exposing a resist layer with a predetermined pattern, wherein the distribution of the light transmittance is determined so that the resist layer having been exposed in accordance with a first resist shape would be used to... Agent: Oliff & Berridge, PLC

20070122720 - Polarized reticle, photolithography system, and method of fabricating a polarized reticle: Polarized reticles, photolithography systems utilizing a polarized reticle, and methods of using such a system are disclosed. A polarized reticle is formed having a reticle containing at least one first patterned region at least partially surrounded by at least one second patterned region. The first patterned region of the polarized... Agent: Trask Britt, P.C./ Micron Technology

20070122721 - Method of fabricating black matrix of a color filter: A method of fabricating a black matrix of a color filter is provided. In the method, a black matrix layer formed of a hydrophobic organic material is formed on an upper surface of a transparent substrate. A black matrix is formed by patterning the black matrix layer. Side surfaces of... Agent: Cantor Colburn, LLP

20070122722 - Method of manufacturing color filter substrate of liquid crystal display device: A method of manufacturing color filter substrate of an LCD device is disclosed. The method includes forming black matrix layers on a substrate except in pixel regions, positioning a printing film above the substrate, the printing film including a color filter printing layer, an overcoat layer, and a transforming layer,... Agent: Song K. Jung Mckenna Long & Aldridge LLP

20070122723 - Process: A process for etching a metal or alloy surface which comprises applying an etch-resistant ink by ink jet printing to selected areas of the metal or alloy, exposing the etch-resistant ink to actinic radiation and/or particle beam radiation to effect polymerisation, optionally thermally treating the etch-resistant ink and then removing... Agent: Morgan Lewis & Bockius LLP

20070122724 - Electrophotographic photoconductor, and image forming process, image forming apparatus and process cartridge for an image forming apparatus using the same: Disclosed is an electrophotographic photoconductor including at least a photoconductive layer on a conductive substrate, wherein the surface layer of the photoconductive layer contains at least a surface crosslinked layer formed by curing a tri- or more-functional radical polymerizable monomer without having a charge transporting structure and a mono-functional radical... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070122725 - Method for preparing oxytitanium phthalocyanine chartge generating material and apparatus for preparing the same: Disclosed herein are a method and an apparatus for preparing oxytitanium phthalocyanine as a charge generating material. The method comprises the steps of homogeneously mixing an oxytitanium phthalocyanine crude with an organic solvent while microwave energy having a frequency of 0.1˜100 GHz and a power of 10˜3,000 W and ultrasonic... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070122726 - Single-component magnetic toner and developing unit and image forming apparatus using the toner: The magnetic single-component toner contains in its binder resin at least magnetic powder, and externally added with magnetic powder of basically polyhedral grain shape with apexes and ridges being rounded to be formed into curved surfaces such that portions deemed as straight lines remain on the circumference of the projected... Agent: Rossi, Kimms & Mcdowell LLP.

20070122727 - Toner and image forming method: Provided a toner including at least: toner particles each containing at least a binder resin, a release agent, and a colorant; and an inorganic fine powder, in which: a degree of aggregation Y1 at a time of compression (200 kpa) of the toner satisfies a relationship of 15≦Y1≦35, and a... Agent: Fitzpatrick Cella Harper & Scinto

20070122728 - Toner composition and method: A method for forming toner particles includes polymerizing monomers to form a latex comprising polymer particles; combining the latex with unsaturated curable resin to form aggregates containing the polymer particles and the unsaturated curable resin particles; and heating the aggregates to form coalesced particles. A toner composition that may be... Agent: Oliff & Berridge, PLC.

20070122729 - Toner, and image forming method, image forming apparatus, and process cartridge using the toner: A toner is provided including a colorant; a resin composition (A) comprising at least one binder resin and a hydrocarbon wax having a melting point of 70-90° C. in an amount of from 6 to 30% by weight based on total weight of resin composition (A), and having a softening... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070122730 - Method for producing binder resin, particulate resin dispersion and method for producing same, electrostatic image development toner and method for producing same, electrostatic image developer, and image forming method: t

20070122731 - Binder resin for the toner, method for producing the same, and toner for electrophotography using the resin: A binder resin (A) for a toner contains a styrene-acrylic resin having a structure derived from a carboxyl group and a structure derived from a glycidyl group, wherein the content (AIS) of a gel component is 1 mass %≦AIS≦50 mass % and the content (AVO) of a volatile component in... Agent: Buchanan, Ingersoll & Rooney PC

20070122732 - Method of preparing toner and toner prepared using the method: A method of preparing a toner is provided, including: preparing a toner composition including a macromonomer having a hydrophilic group, a hydrophobic group and one or more reactive functional groups, and one or more polymerizable monomers; emulsion polymerizing the toner composition and mixing one or more materials selected from the... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.

20070122733 - Positive photosensitive resin composition, method for forming pattern, and electronic part: Provided is a positive photosensitive resin composition which is advantageous not only in excellent sensitivity, resolution and adhesion, but also in excellent heat resistance even when the composition is cured by a low-temperature process at equal to or lower than 280° C., as well as low water absorption and capability... Agent: Antonelli, Terry, Stout & Kraus, LLP

20070122737 - Coating and developing system and coating and developing method: A coating and developing system for forming a resist film on a substrate by coating the substrate with a liquid resist and developing the resist film after the resist film has been processed by immersion exposure that forms a liquid layer on the surface of the substrate is capable of... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070122738 - Image forming material: The present invention relates to an image forming material having, on a substrate, an image forming layer that includes at least (A) a novolac type phenolic resin containing phenol as a structural unit, (B) a photo-thermal converting agent, and (C) a specific ammonium compound or a specific onium salt.... Agent: Sughrue Mion, PLLC

20070122734 - Molecular photoresist: In one embodiment, a photoacid generator is attached to a primary resist molecule having a radius of gyration of less than about 3 nanometers, the primary molecule other than a traditional photoresist polymer. This embodiment may have increased homogeneity and decreased acid diffusion, which may increase the sensitivity of the... Agent: Trop Pruner & Hu, PC

20070122735 - Optical storage device having limited-use content and method for making same: The invention relates generally to optical storage devices, such as DVDs and CDs, on which compositions containing dyes are disposed so as to facilitate limited or selective use of at least a portion of the content of the optical storage devices. The invention also relates to methods of making limited-use... Agent: General Electric Company Global Research

20070122742 - Photocurable and thermosetting resin composition, dry film using the same, and cured product thereof: A photocurable and thermosetting resin composition comprising (A) a carboxylic acid-containing photosensitive resin having at least one carboxyl group and at least two ethylenically unsaturated bonds in its molecule, (B) a filler, (C) a photopolymerization initiator, (D) a diluent, and (E) a compound having at least two cyclic ether groups... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070122739 - Planographic printing plate material and printing process: Disclosed is a planographic printing plate material comprising a support and provided thereon, a hydrophilic layer and a thermosensitive image formation layer in that order, wherein the hydrophilic layer contains metal oxide particles (as light-to-heat conversion materials) having a Mohs hardness of from 6.0 to 10.0 and an average particle... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070122743 - Planographic printing plate precursor: A planographic printing plate precursor includes a support having disposed thereon a recording layer containing a water-insoluble and alkali-soluble resin, a development inhibitor and an infrared absorber and exhibiting enhanced solubility in an aqueous alkali solution through light exposure. The recording layer may have either a mono-layer construction or a... Agent: Sughrue Mion, PLLC

20070122745 - Planographic printing plate precursor, substrate for the same and surface hydrophilic material: A planographic printing plate precursor comprises a substrate having disposed thereon a hydrophilic layer which includes hydrophilic graft chains and a crosslinked structure formed through hydrolytic polycondensation of an alkoxide of an element selected from Si, Ti, Zr and Al. An aluminum substrate for a planographic printing plate includes a... Agent: Buchanan, Ingersoll & Rooney PC

20070122744 - Positive-working photoresist composition and photosensitive material using same: The invention discloses a chemical-amplification positive-working photoresist composition in the form of a solution which is particularly suitable for the formation, on the surface of a substrate, of a photoresist layer having a thickness of 100 to 650 nm to be in compliance with the trend toward increasing fineness of... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070122741 - Resist protective coating material and patterning process: A pattern-forming process uses a resist protective coating material comprising a C8-C12 ether compound as a solvent. A resist protective coating formed on a resist film is water-insoluble, soluble in an alkaline developer, and unmixable with the resist film, and thus the immersion lithography can be performed. During alkaline development,... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070122736 - Resist protective film material and pattern formation method: The invention is a protective film material for immersion lithography that enables desirable immersion lithography, can be removed simultaneously with development of a photoresist layer, and has excellent process adaptability. The invention also includes a method for forming a pattern using the material. More specifically, the invention is a protective... Agent: Alston & Bird LLP

20070122740 - Resist undercoat-forming material and patterning process: In the lithographic multilayer resist process, a material comprising a copolymer of a hydroxy-containing vinylnaphthalene with hydroxy-free olefins is useful in forming a resist undercoat. The undercoat-forming material has a high transparency and optimum values of n and k so that it functions as an antireflective coating during short-wavelength exposure,... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070122746 - Benzopyran colorants, method of manufacture, and method of use: wherein X is hydrogen or a radical of Formula (II), R1 independently at each occurrence is a C1-C20 aliphatic radical, a C3-C10 cycloaliphatic radical, or a C3-C10 aromatic radical; R2, R3, R4 and R5 are independently at each occurrence a halogen, a nitro group, a cyano group, a hydroxy group,... Agent: Cantor Colburn LLP - Ge Plastics - Smith

20070122747 - Optical information recording method and optical information recording medium: The present invention provides an optical information recording medium including a substrate with an on-groove and an in-groove, having successively disposed thereon a dye recording layer and a transparent sheet, wherein a width of the on-groove ranges from 50 to 140 nm, and a barrier layer is formed between the... Agent: Sughrue Mion, PLLC

20070122748 - Photopolymer printing form with reduced processing time: The present invention is directed to an improved method of producing photosensitive printing plate blanks comprising the steps of: a) forming a first photocurable layer on a backing sheet; b) curing the first photocurable layer with actinic radiation to create a hard floor layer throughout the first photocurable layer; and... Agent: John L. Cordani Carmody & Torrance LLP

20070122749 - Method of nanopatterning, a resist film for use therein, and an article including the resist film: A method of nanopatterning includes the steps of providing a resist film (12) and forming a pattern in the resist film (12). The resist film (12) includes a copolymer consisting of an organosilicone component and an organic component. An article (10) includes a substrate (14) and the resist film (12)... Agent: Howard & Howard Attorneys, P.C.

20070122751 - Methods of patterning using photomasks including shadowing elements therein and related systems: A photomask for patterning an integrated circuit device using a patterning radiation may include a transparent substrate, a pattern of radiation blocking regions, an array of radiation blocking regions, and an array of shadowing elements. The transparent substrate may have first and second opposing surfaces, and the pattern of radiation... Agent: Myers Bigel Sibley & Sajovec

20070122750 - Salt suitable for an acid generator and a chemically amplified resist composition containing the same: p

20070122752 - Semiconductor device manufacturing method and substrate processing system: A semiconductor device manufacturing method includes: forming an etching mask having a predetermined circuit pattern on a surface of an etching target film disposed on a semiconductor substrate; etching the etching target film through the etching mask to form a groove or hole in the etching target film; removing the... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070122753 - Method for manufacturing semiconductor device: A method for manufacturing a semiconductor device is provided. The method includes forming a polysilicon layer on a semiconductor substrate, forming an anti-reflection coating on the polysilicon layer, forming a photoresist (PR) layer pattern on the anti-reflection coating, etching the anti-reflection coating using the PR layer pattern as a mask... Agent: Saliwanchik Lloyd & Saliwanchik A Professional Association

20070122754 - Manufacturing method of pattern formed body: A main object of the present invention is to provide a manufacturing method of a plurality of pattern formed bodies which makes it possible that even if the pattern formed bodies are continuously manufactured, their property varied patterns are each made into a target pattern form with high precision. To... Agent: Ladas & Parry LLP

20070122755 - Heat developable photosensitive material including a combination of specified reducing agents: The invention provides a heat developable photosensitive material including a substrate, and at least one constituent layer which contains a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent for thermal developing and a binder. The material includes at least one reducing agent that does not form a... Agent: Taiyo Corporation

20070117027 - Hologram-recording material, hologram-recording medium, and hologram-recording method: A hologram-recording material, including a photoresponsive molecule, a reactive molecule having an intrinsic birefringence, and a photopolymerization initiator that accelerates polymerization and/or crosslinking of the reactive molecule having an intrinsic birefringence, a content of the photopolymerization initiator being in a range of less than about 0.1 wt % relative to... Agent: Oliff & Berridge, PLC

20070117029 - Exposure pattern or mask and inspection method and manufacture method for the same: An exposure pattern or mask inspection and manufacture method and an exposure pattern or mask are provided which can perform comparison inspection of the exposure pattern or mask with ease and at a high precision. A mask pattern portion for exposing a predetermined pattern by an exposure beam is inspected... Agent: Rader Fishman & Grauer PLLC

20070117028 - Mask handling method, and mask and device or apparatus comprising a gripper therefor, device manufacturing method and device manufactured thereby: A mask for use in a lithographic projection apparatus comprises three brackets arranged on the circumference of the mask. The brackets are provided with grooves directed to a common imaginary point and are intend to cooperate with three pins provided on a mask gripper present in a mask handling apparatus... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070117030 - Method of two dimensional feature model calibration and optimization: A method for generating a photolithography mask for optically transferring a pattern formed in the mask onto a substrate utilizing an imaging system. The method includes the steps of: (a) defining a set of calibration patterns, which are represented in a data format; (b) printing the calibration patterns on a... Agent: Mcdermott Will & Emery LLP

20070117031 - Colored curable composition, color filter and method of producing thereof: [R1: H, chlorine atom, alkyl group, or aryl group; L1: —N(R2)C(═O)—, —OC(═O)—, —C(═O)N(R2)—, —C(═O)O—, or a group represented by formula (II), formula (III), or formula (IV); R2: H, alkyl group, aryl group, or hetero cyclic group; L2: divalent coupler for coupling L1 and Dye; n=0 or 1, m=0 or 1;... Agent: Sughrue Mion, PLLC

20070117032 - Method for determining an exposure dose and exposure apparatus: A method of determining an exposure dose for writing a pattern using an electron beam writer determines a target dose in the exposure region to obtain a predetermined energy deposition in a specific position of the exposure region, the predetermined energy deposition being larger than a reference energy deposition in... Agent: Gregory L. Mayback, P.A.

20070117033 - Electrostatic latent image bearing member, and image forming apparatus, process cartridge, and image forming method using the same: An electrostatic latent image bearing member is provided including a substrate and a photosensitive layer located overlying the substrate, wherein the outermost layer of the electrostatic latent image bearing member includes a cross-linked resin formed from a cross-linking reaction between a charge transport polyol having a specific formula and an... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070117034 - Toner and method of preparing toner: A method of preparing a toner is provided, including: preparing a toner composition including a macromonomer having a hydrophilic group, a hydrophobic group, and at least one reactive functional group, and at least one polymerizable monomer; emulsion polymerizing the toner composition and mixing at least one material selected from the... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.

20070117036 - Cyan toner and method of producing cyan toner: A cyan toner is provided which is brighter and more greenish in hue than conventional cyan toners and highly translucency. A cyan toner characterized by comprising toner particles at least having a coloring compound represented by the Formula (1):... Agent: Fitzpatrick Cella Harper & Scinto

20070117035 - Electrostatic latent image developing toner, method of producing electrostatic latent image developing toner, and electrostatic latent image developer: A method of producing an electrostatic latent image developing toner that includes the steps of producing a resin particle dispersion by polymerizing, in a water-based solvent, a polymerizable monomer that includes a polymerizable monomer having a vinyl-based double bond, and washing the resin particle dispersion through contact with an organic... Agent: Oliff & Berridge, PLC

20070117037 - Liquid developer manufacture process: A method of creating a liquid developer with improved conductivity comprising: dissolving a solid charge adjuvant in a carrier liquid aided by heating the carrier liquid; then mixing the dissolved charge adjuvant with a thermoplastic resin and carrier liquid; grinding the mixture to form toner particles; and adding a charge... Agent: Hewlett Packard Company

20070117038 - Method for forming mark and liquid ejection apparatus: A method for forming a mark includes ejecting a droplet of a liquid containing a mark forming material onto a surface of an object; radiating a laser beam from a radiation port to a predetermined radiation target position; moving at least one of the object and the radiation port relative... Agent: Harness, Dickey & Pierce, P.L.C

20070117045 - Chemical amplification type positive photoresist composition and resist pattern forming method: The present invention provides a chemical amplification type positive photoresist composition which is excellent in storage stability as a resist solution in a bottle A novolak resin or a hydroxystyrenic resin is reacted with a crosslinking agent to give a slightly alkali-soluble or alkali-insoluble resin having such a property that... Agent: Knobbe Martens Olson & Bear LLP

20070117042 - Imaging methods: Methods of imaging are disclosed. Imaging compositions which are sensitive to low levels of energy are applied to a work piece. Energy is applied to the imaging compositions to cause a color or shade change such that workers may modify the work piece based on the color or shade change.... Agent: John J. Piskorski Rohm And Haas Electronic Material LLC

20070117043 - Photoacid generators and lithographic resists comprising the same: The present invention relates to photoacid generating compounds, lithographic resists comprising photoacid generating compounds, and to various lithographic processes techniques, and applications. In one embodiment, the present invention provides a photoacid generator of Formula (I):... Agent: Kilpatrick Stockton LLP - 46872 J. Steven Gardner

20070117041 - Photosensitive coating for enhancing a contrast of a photolithographic exposure: In a preferred embodiment, a photosensitive coating material for use as a contrast enhancing layer (CEL) disposed at the bottom of a resist film includes a base polymer, which has no acid cleavable groups for being insoluble with respect to a developer, wherein the developer is designed to remove exposed... Agent: Slater & Matsil LLP

20070117039 - Photosensitive resin composition, photosensitive layer using the same and photosensitive resin printing original plate: The present invention is to obtain without any trouble a photosensitive resin composition, a photosensitive layer and a photosensitive resin printing original plate, which are developable with an aqueous developer, resistant to an aqueous ink and a cosolvent ink, and assured of good image reproducibility. The present invention relates to... Agent: Leydig Voit & Mayer, Ltd

20070117044 - Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method: A multilayer resist process comprises forming in sequence an undercoat film, an intermediate film, and a photoresist film on a patternable substrate, and effecting etching in multiple stages. A silicon-containing film forming composition is useful in forming the intermediate film serving as an etching mask, comprising a silicon-containing polymer obtained... Agent: Birch Stewart Kolasch & Birch

20070117040 - Water castable-water strippable top coats for 193 nm immersion lithography: wherein R is an aliphatic or alicyclic radical; m and n are independently integers, and are the same or different; and p is zero or 1. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is particularly... Agent: Scully Scott Murphy & Presser, PC

20070117046 - Optical recording medium and process for producing the same: An optical recording medium is provided with: a first substrate having first pits on one face thereof; a first reflective layer that is formed on the face bearing the first pits of the first substrate in a manner so as to reflect lands and recesses of the first pits; a... Agent: Wenderoth, Lind & Ponack L.L.P.

20070117048 - Method of manufacturing printing plate and method of manufacturing liquid crystal display device using the same: A method of manufacturing a precise printing plate, and a method of manufacturing an LCD device using the same are disclosed, the method of manufacturing the precise printing plate comprising forming a mask layer of a predetermined pattern on a substrate; etching the substrate with an etchant including an anionic... Agent: Brinks Hofer Gilson & Lione

20070117047 - Printing plate, method of manufacturing of printing plate and liquid crystal display device using the same: A printing plate to form a precise pattern, a method for manufacturing the printing plate, and a method for fabricating an LCD device using the printing plate in which the printing plate includes a substrate having at least one trench and sidewall elements formed at an inner perimeter of the... Agent: Brinks Hofer Gilson & Lione

20070117049 - Anti-reflective coatings using vinyl ether crosslinkers: Novel, wet developable anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a polymer and/or oligomer having acid functional groups and dissolved in a solvent system along with a crosslinker and a photoacid generator. The preferred acid functional group is a carboxylic acid, while the... Agent: Hovey Williams LLP

20070117050 - Maintenance of photoresist activity on the surface of dielectric arcs for 90 nm feature sizes: We have determined that it is necessary to remove hydroxyl groups from the surface of a DARC over which a CAR photoresist is applied, to reduce poisoning of the photoresist during imaging. The poisoning is reduced by treating the surface of the DARC film with a hydrogen or helium-containing plasma... Agent: Patent Counsel Applied Materials, Inc.

20070117051 - Trimming a mems device to fine tune natural frequency: A mirror device includes a mirror, an anchor, and a spring coupling the mirror to the anchor. The anchor and/or mirror can define one or more rows of holes adjacent to the coupling location of the spring. The natural frequency of the device can be adjusted by removing material between... Agent: Patent Law Group LLP

20070117052 - Method for precipitating separation of photosensitive silver halide particle dispersion and silver salt photothermographic dry imaging material using thereof: A method for separating photosensitive silver halide particles by precipitation from a dispersion comprising the silver halide particles and a protective colloid of a natural polymer, the method comprising the step of mixing the dispersion with an organic polymer having a logarithm value of n-octanol/water partition coefficient (being a log... Agent: Lucas & Mercanti, LLP

20070117054 - Photothermographic material: The present invention provides a photothermographic material including a support having disposed on one surface thereof at least one image-forming layer containing a binder, an organic silver salt, a reducing agent for reducing silver ions, an organic polyhalogen compound and a photosensitive silver halide, wherein the photosensitive silver halide has... Agent: Taiyo Corporation

20070117053 - Photothermographic materials containing post-processing stabilizers: e

20070111108 - Hologram recording material and hologram recording medium: The present invention provides a hologram recording material which attains high refractive index change, flexibility, high sensitivity, low scattering, environment resistance, durability, low shrinkage, and high multiplicity, and is suitable for volume hologram recording. Also, the present invention provides a hologram recording medium. A hologram recording material comprising: an organometallic... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070111107 - Hologram recording material, and hologram recording medium: The present invention provides a hologram recording material which attains high refractive index change flexibility, high sensitivity, low scattering, environment resistance, durability, low shrinkage, and high multiplicity, and is suitable for volume hologram recording. Also, the present invention provides a hologram recording medium. A hologram recording material comprising: an organometallic... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070111110 - In-situ plasma treatment of advanced resists in fine pattern definition: A novel, in-situ plasma treatment method for eliminating or reducing striations caused by standing waves in a photoresist mask, is disclosed. The method includes providing a photoresist mask on a BARC (bottom anti-reflective coating) layer that is deposited on a feature layer to be etched, etching the BARC layer and... Agent: Tung & Associates Suite 120

20070111111 - Light measurement apparatus and light measurement method: Disclosed is a light measurement apparatus including: an optical branching device to branch light to be measured into a plurality of pieces; a time delay processing unit to give a predetermined time delay to one branched piece of the light; an optical phase diversity circuit to output an in-phase signal... Agent: Sughrue Mion, PLLC

20070111114 - Method for manufacturing a semiconductor device, stencil mask and method for manufacturing a the same: Preparing a stencil mask comprising a silicon thin film in which an opening for selectively irradiating charged particles to a semiconductor substrate is provided and whose irradiation surface on which the charged particles are irradiated is implanted with an impurity, and selectively irradiating charged particles to the semiconductor substrate using... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070111113 - Photo mask for mitigating stitching effect and exposing method using the same: A mask which can mitigate the so-called stitching effect. The mask includes a plurality of blocks. The stitching area between two adjacent blocks is nonlinear. In an exposure process of the glass substrate for liquid crystal display, the mask can alleviate the substrate from stitching effect while exposing the glass... Agent: Wei Te Chung Foxconn International, Inc.

20070111109 - Photolithography scattering bar structure and method: A photolithography mask includes a design feature located in an isolated or semi-isolated region of the mask and a plurality of parallel linear assist features disposed substantially perpendicular to the design feature. The plurality of parallel linear assist features may include a first series of parallel assist features disposed on... Agent: Haynes And Boone, LLP

20070111112 - Systems and methods for fabricating photo masks: A system and method for fabricating a photo mask are provided. The method includes preparing weak point data based on mask layout data, fabricating a photo mask based on the mask layout data and extracting critical point data by analyzing the aerial image of the fabricated photo mask based on... Agent: Harness, Dickey & Pierce, P.L.C

20070111115 - Light reflective structure, method for producing the same and display: In order to fabricate a light reflective structure for a liquid crystal display, a photosensitive resin layer is formed with use of a thermosetting photosensitive resin, the photosensitive resin layer is exposed through a photomask having a particular pattern by a proximity method, the exposed photosensitive resin layer is developed... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070111116 - Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same: To provide an exposure method and an exposure apparatus, using a complementary divided mask, designed to enable alignment of a complementary divided mask at a high precision over the entire region of a semiconductor wafer. Further, to provide a semiconductor device fabricated by the exposure method and a method of... Agent: Robert J. Depke Lewis T. Steadman

20070111117 - Laser induced thermal imaging method and fabricating method of organic light-emitting diode using the same: A laser induced thermal imaging method capable of effectively laminating a donor film and an acceptor substrate using a magnetic force; and a fabricating method of an organic light-emitting diode using the same. The laser induced thermal imaging method includes arranging an acceptor substrate, in which a first magnet is... Agent: Stein, Mcewen & Bui, LLP

20070111118 - Electrophotographic photoconductor and image-forming apparatus: An electrophotographic photoconductor having an excellent crack resistance and wear resistance as well as excellent sensitivity characteristics, while keeping good image characteristics of the photoconductor is provided. In addition, an image-forming apparatus equipped with such an electrophotographic photoconductor is also provided. The electrophotographic photoconductor includes a photosensitive layer containing at... Agent: Arthur G. Schaier Carmody & Torrance LLP

20070111119 - Method for repairing gas turbine engine compressor components: A method for repairing an eroded surface of a gas turbine compressor component includes depositing an amorphous alloy onto the eroded surface, melting the amorphous alloy with a laser beam on the eroded surface, and re-solidifying the amorphous alloy to form a welded deposit. The weld is then machined to... Agent: Honeywell International Inc.

20070111120 - Arylamine processes: A process for the preparation of a tertiary arylamine compound, comprising reacting an arylhalide, such as an arylbromide, and an arylamine in an alkylene glycol compound in the presence of a catalyst.... Agent: Oliff & Berridge, PLC.

20070111121 - Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus: An electrophotographic photosensitive member, a process cartridge and an electrophotographic apparatus are provided which not only secure mechanical strength sufficiently but also bring a vast improvement in charge transport performance and which can well satisfy electrical properties. An electrophotographic photosensitive member is provided an outermost surface layer of which contains... Agent: Fitzpatrick Cella Harper & Scinto

20070111122 - Photoreceptor with mixed crystalline phthalocyanine: The present invention provides an electrophotographic element. The element has a charge generation layer including binder and, dispersed in the binder, a physical mixture of (1) a high speed cocrystallized mixture of TiOPc and TiOFPc having a first intensity peak at 7.4 with respect to X-rays characteristic of Cu Kα... Agent: Paul A. Leipold Patent Legal Staff

20070111123 - Titanyl phthalocyanin crystal, method for preparing the same and electrophotographic photoconductor: According to the present invention, a titanyl phthalocyanin crystal excellent in storage stability in organic solvents, a method for preparing the same and an electrophotographic photoconductor using the same are provided. In the titanyl phthalocyanin crystal, the method for preparing such a titanyl phthalocyanin crystal and the electrophotographic photoconductor using... Agent: Arthur G. Schaier, Carmody & Torrance LLP

20070111125 - Charge controlling agent and toner: A charge controlling agent is provided as a compound in which an amide group is introduced together with a sulfonic group or a derivative thereof. The charge controlling agent is characterized by including at least one compound represented by the chemical formula (2) in which an amide group is introduced... Agent: Fitzpatrick Cella Harper & Scinto

20070111124 - Toner and two-component developer: Toner includes aggregated and associated particles formed by mixing in an aqueous medium at least a resin particle dispersion in which resin particles are dispersed, a colorant particle dispersion in which colorant particles are dispersed, and a wax particle dispersion in which wax particles are dispersed and heat-treating the mixed... Agent: Hamre, Schumann, Mueller & Larson P.C.

20070111126 - Epoxidized low-molecular-weight ethylene polymer, release agent for electrophotographic toner, and electrophotographic toner for developing electrostatic charge image: [MEANS FOR SOLVING PROBLEMS] A release agent for an electrophotographic toner, which comprises an epoxidized low-molecular-weight ethylene polymer (B) which contains an epoxy group in the polymer chain of a low-molecular-weight ethylene polymer (A), and has (i) a density of 870 to 1,050 kg/m3, (ii) a melting point of 70... Agent: Buchanan, Ingersoll & Rooney PC

20070111127 - Toner having crystalline wax: Embodiments include a toner with a fractionated and/or distilled wax having from about 30 to about 64 carbon units, a degree of crystallinity as calculated by heat of melting and as measured by DSC of from about 55 to about 100, a Mw is from about 500 to about 800,... Agent: Patent Documentation Center

20070111128 - Toner having crystalline wax: Embodiments include a chemical toner composition having a first resin including a styrene vinyl copolymer and having a Tg of from about 46 to about 56° C., b) a second resin including a styrene vinyl copolymer having a Tg of from about 55 to about 65° C., c) a distilled... Agent: Patent Documentation Center

20070111129 - Toner compositions: A toner composition includes a resin substantially free of cross linking and having a weight average molecular weight of from about 50,000 to about 1,000,000, a wax, a colorant, and a coagulant.... Agent: Oliff & Berridge, PLC

20070111130 - Toner compositions: A toner composition includes a reactive resin substantially free of cross linking, a wax, and a colorant. The reactive resin can include reactive epoxy and carboxylic acid functional groups.... Agent: Oliff & Berridge, PLC

20070111131 - Toner having crystalline wax: Embodiments include a toner with a distilled wax having a crystallinity of from about 55 to about 100 percent, wherein the degree of crystallinity is calculated using the following formulas: [Heat of enthalpy (Hm) J/g/294 J/g]×100 =degree of crystallinity (Xc); [Heat of recrystallization (Hrc) J/g/294 J/g]×100 =degree of crystallinity (Xc);... Agent: Patent Documentation Center

20070111132 - Method for preparing oxytitanium phthalocyanine charge generating meterial and the new-type oxytitanium phthalocyanine charge generating material therefrom: Disclosed herein is a method for preparing oxytitanium phthalocyanine as a charge generating material. The method comprises the steps of mixing 30-100 wt % sulfuric acid and an oxytitanium phthalocyanine crude in a mixing ratio between 100:1 and 1:1, homogeneously grinding the mixture in a wet grinder filled with zirconia... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070111133 - Extruded slipping layer for thermal donor: A thermal donor element having a dye layer on an extruded substrate, wherein the extruded substrate includes a polyester-containing material and a slip agent, but does not contain silica particles, is disclosed.... Agent: Paul A. Leipold Patent Legal Staff

20070111134 - Rework process for photoresist film: There is disclosed a rework process for a photoresist film over a substrate having at least an antireflection silicone resin film and the photoresist film over the silicone resin film comprising: at least removing the photoresist film with a solvent while leaving the silicone resin film unremoved; and forming a... Agent: Oliff & Berridge, PLC

20070111139 - Negative resist composition and patterning process: A negative resist composition is provided comprising a polymer comprising recurring units having formula (1), an organic solvent, a crosslinker, and an optional photoacid generator. In formula (1), R1 and R2 are hydrogen or methyl, m is 0 or a positive integer of 1 to 5, p and q are... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070111141 - Negative-working photosensitive resin composition and photosensitive resin plate using the same: in a range of 3.5 wt % or less based on the weight of the photosensitive resin composition. A photosensitive resin plate using the photosensitive resin composition is also disclosed. By this invention, a negative-working photosensitive resin composition particularly excellent in the reproducibility of the highlight areas and the independent... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070111138 - Photoactive compounds: The present invention relates to novel photoacid generators.... Agent: Alan P. Kass Az Alectronic Materials Usa Corp.

20070111136 - Photosensitive resin composition, photosensitive element employing it, resist pattern forming method, process for manufacturing printed circuit board and method for removing photocured product: The photosensitive resin composition of the invention comprises (A) a photopolymerizing compound with two or more ethylenic unsaturated bonds in the molecule and (B) a photopolymerization initiator which initiates photopolymerization reaction of the (A) photopolymerizing compound, the photosensitive resin composition being characterized in that the molecule of the (A) photopolymerizing... Agent: Antonelli, Terry, Stout & Kraus, LLP

20070111135 - Positive resist composition and method of forming resist pattern using same: A positive resist composition which includes a resin component (A) that exhibits increased alkali solubility under the action of acid, an acid generator component (B) that generates acid on exposure, and an organic solvent (C). The component (A) includes (i) a structural unit (a1), which contains an acid dissociable, dissolution... Agent: Knobbe Martens Olson & Bear LLP

20070111140 - Resist composition and patterning process using the same: There is disclosed a resist composition which shows high sensitivity and high resolution on exposure to high energy beam, provides reduced Line Edge Roughness because swelling at the time of development is reduced, provides minor amounts of residue after development, has excellent dry etching resistance, and can also be used... Agent: Oliff & Berridge, PLC

20070111137 - Resist polymer solution and process for producing the same: A resist polymer solution comprising a resist polymer containing a repeating unit decomposed by the action of an acid so as to be soluble in alkali and a repeating unit having a polar group, the resist polymer dissolved in a solvent for coating film formation, wherein the amount of impurities... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070111142 - Optical disk and recording/reproducing apparatus: r

20070111144 - Display device and manufacturing method of the same: A plurality of wires and electrodes are formed by forming a first conductive film, selectively forming a resist over the first conductive film, forming a second conductive film over the first conductive film and the resist, removing the second conductive film formed over the resist by removing the resist, forming... Agent: Nixon Peabody, LLP

20070111143 - Method of fixing organic molecule and micro/nano article: To make it possible to fix various organic molecules in an arbitrary configuration or arrangement on a micro/nano scale as a cheap and simple process by irradiating a photocurable resin containing an organic molecule on a substrate with light, thereby curing the photocurable resin in a given pattern and removing... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070111145 - Thermally developable materials with backside conductive layer: Thermally developable materials that comprise a support have a conductive backside layer that has increased conductive efficiency. Conductivity is provided by non-acicular metal antimonate particles that are present in an amount greater than 55 and up to 85 dry weight % at a coverage of from about 0.06 to about... Agent: Andrew J. Anderson Patent Legal Staff

20070105025 - Mask, mask blank, and methods of producing these: A mask decreased in warping and having a high positioning precision, provided with at least a substrate aperture formed at a portion of a silicon substrate, a first silicon oxide film formed at one surface of the silicon substrate, a single crystal silicon layer formed on the first silicon layer... Agent: Sonnenschein Nath & Rosenthal LLP

20070105026 - Mask, mask blank, and methods of producing these: A mask decreased in warping and having a high positioning precision, provided with at least a substrate aperture formed at a portion of a silicon substrate, a first silicon oxide film formed at one surface of the silicon substrate, a single crystal silicon layer formed on the first silicon layer... Agent: David R. Metzger Sonnenschein Nath & Rosenthal

20070105027 - Method for quartz bump defect repair with less substrate damage: A method for minimizing damage to a substrate while repairing a defect in a phase shifting mask for an integrated circuit comprising locating a bump defect in a phase shifting mask, depositing a first layer of protective coating to an upper surface of the bump defect, depositing a second layer... Agent: Dickstein Shapiro LLP

20070105023 - Reticle and optical proximity correction method: An OPC method includes providing a primary mask having a primary pattern, forming an assist mask having a correction pattern substantially complementary to the primary pattern, and forming a reticle by overlapping the primary mask and the assist mask. The light transmittance of the correction pattern is adjustable so as... Agent: North America Intellectual Property Corporation

20070105028 - Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device: A reticle set, includes a first photomask having a circuit pattern provided with first and second openings provided adjacent to each other sandwiching a first opaque portion, and a monitor mark provided adjacent to the circuit pattern; and a second photomask having a trim pattern provided with a second opaque... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070105024 - Structure and methodology for fabrication and inspection of photomasks: A photomask, method of designing, of fabricating, of designing, a method of inspecting and a system for designing the photomask. The photomask, includes: a cell region, the cell region comprising one or more chip regions, each chip region comprising a pattern of opaque and clear sub-regions corresponding to features of... Agent: Schmeiser, Olsen & Watts

20070105029 - Differential critical dimension and overlay metrology apparatus and measurement method: A method is described for measuring a dimension on a substrate, wherein a target pattern is provided with a nominal characteristic dimension that repeats at a primary pitch of period P, and has a pre-determined variation orthogonal to the primary direction. The target pattern formed on the substrate is then... Agent: International Business Machines Corporation Dept. 18g

20070105030 - 1, 4-benzodioxane sulfonic acid compound and use thereof as electron-acceptor material: By using a charge-transporting thin film which is made of charge-transporting varnish containing, as an electron-acceptor material, a 1,4-benzodioxane sulfonic acid compound represented by the formula (1) below especially in an OLED device or a PLED device, there can be realized excellent EL device characteristics such as low driving voltage,... Agent: Birch Stewart Kolasch & Birch

20070105031 - Electrophotographic photoconductor: and further has a layered structure composed of a plurality of said charge transporting layers wherein the outermost layer of the said charge transporting layers show 50% or higher elastic power (ηHU) measured in the surface coating hardness test by applying a highest pushing load of 5 mN to the... Agent: Nixon & Vanderhye, PC

20070105032 - Titanyl phthalocyanine crystal and manufacturing method thereof and electrophotographic photoreceptor and electrophotographic imaging apparatus using the photoreceptor: A titanyl phthalocyanine crystal has a major absorption peak at a wavelength of 780 nm±10 nm in the visible-infrared absorption spectrum and a minor absorption peak has an intensity of ¾ or less of the major absorption peak at 700 nm±10 nm. A method of manufacturing the crystal, an electrophotographic... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.

20070105033 - Toner: The present invention provides a toner which is excellent in low-temperature fixability and transparency and has high gloss, and which is excellent in offset resistance, storage stability, and development stability. The toner is characterized in that: a square radius of inertia Rt at a peak top of a main peak... Agent: Fitzpatrick Cella Harper & Scinto

20070105034 - Printing of images with selective gloss and toners therefore: A matte liquid toner suitable for use in a liquid toner printer, comprising a carrier liquid, toner particles comprising a resin and substantially uncolored additive particles of average diameter between 1 and 20 micrometers dispersed in the resin.... Agent: Hewlett Packard Company

20070105035 - Photoresist stripping solution and method of treating substrate with the same: Disclosed is a photoresist stripping solution comprising: (a) a salt of hydrofluoric acid with a base free from metallic ions; and (b) a water-soluble organic solvent, wherein the content of the component (a) is 0.001 to 0.1 mass % based on the total mass of the photoresist stripping solution. Also... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070105040 - Developable undercoating composition for thick photoresist layers: The present invention relates to an undercoating composition for a photoresist comprising a polymer which is insoluble in an aqueous alkali developer but becomes soluble prior to development, and a photoacid generator which produces a strong acid upon exposure to radiation, and further where the polymer is transparent at the... Agent: Sangya Jain Az Electronic Materials Usa Corp.

20070105039 - Dual band color forming composition: A radiation image-able coating includes a first phase including a radiation curable polymer matrix and an activator disposed in the radiation curable polymer matrix, a second phase insolubly distributed in the first phase, the second phase including a color-former, and an antenna dye package distributed in at least one of... Agent: Hewlett Packard Company

20070105044 - Fluorine-containing polymer coating composition, method for forming fluorine-containing polymer film using coating composition, and method for forming photoresist or lithographic pattern: There is provided a means for forming a protective film of a fluorine-containing polymer composition excellent in smoothness and adhesiveness on a photoresist. Moreover, there is provided a means for removing the protective film without impairing the underlying photoresist. A polymer coating composition obtainable by dissolving a fluorine-containing polymer compound... Agent: Young & Thompson

20070105041 - Lithographic printing plate comprising bi-functional compounds: e

20070105043 - Photosensitive coating for enhancing a contrast of a photolithographic exposure: A photosensitive coating material for enhancing a contrast of a photolithographic exposure of a resist film formed on a substrate, including a base polymer, a solvent for facilitating deposition of the photosensitive coating material upon a surface adjacent to said resist film to form a film thereupon, an alkaline additive... Agent: Slater & Matsil LLP

20070105046 - Photosensitive composition: Photoresist compositions and methods suitable for depositing a thick photoresist layer in a single coating application are provided. Such photoresist layers are particularly suitable for use in chip scale packaging, for example, in the formation of metal bumps.... Agent: Jonathan D. Baskin Rohm And Haas Electronic Materials LLC

20070105036 - Photosensitive element, resist pattern formation method and printed wiring board production method: o

20070105038 - Positive resist composition and method for forming resist pattern: A positive resist composition that includes a base resin component (A) and an acid generator component (B), wherein the component (A) is a copolymer that includes structural units (a-1), which are derived from an (α-lower alkyl) acrylate ester that contains an acid dissociable, dissolution inhibiting group, and also contains an... Agent: Knobbe Martens Olson & Bear LLP

20070105045 - Positive resist composition and pattern formation method using the positive resist composition: A positive resist composition comprises: (A) a resin that contains a repeating unit (A1) having a lactone structure and a cyano group, and increases its solubility to an alkali developer by action of an acid; (B) a compound that generates an acid by irradiation with actinic ray or radiation; and... Agent: Sughrue-265550

20070105042 - Resist composition and patterning process: A hydroxystyrene/indene/alkoxyisobutoxystyrene copolymer having Mw of 1,000-500,000 is formulated as a base resin to give a resist composition, typically chemically amplified positive resist composition. The composition exhibits a high resolution, a satisfactory resist pattern profile after development, and improved etch resistance and is thus suitable as a micropatterning material for... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070105037 - Thick film photoresist composition and method of forming resist pattern: A negative thick film photoresist composition with improved alkali developability is provided. The composition comprises: (A) a resin component containing (a) from 61 to 90% by weight of a structural unit derived from a cyclic alkyl (meth)acrylate ester, and (b) a structural unit derived from a radical polymerizable compound containing... Agent: Knobbe Martens Olson & Bear LLP

20070105048 - Optical recording medium and manufacturing method thereof: A manufacturing method for an optical recording medium, comprises the steps of depositing a recording layer on a substrate, forming an intermediate layer on the recording layer, transferring a depression-protrusion contour to the intermediate layer by use of a transmissive stamper, removing the transmissive stamper away from the intermediate layer,... Agent: Fitzpatrick Cella Harper & Scinto

20070105047 - Record carriers and method for the production of record carriers: The invention comprises an optical record carrier comprising a data track, the data track including a sequence of marks and spaces of a plurality of different lengths. The marks and spaces form symbols encoding data. The length of each symbol comprises an integral multiple of a standard bit length, and... Agent: Philips Intellectual Property & Standards

20070105049 - Organic dye for recording layer and high density optical recording medium using the same: A recording layer including a novel dye for a high density optical recording medium, employing short wavelength laser source with a wavelength no longer than 530 nm 530 nm for recording high density information and reproduction/playback of the high density information recordings, is provided. The dye incorporated in the recording... Agent: J.c. Patents, Inc.

20070105050 - Method and apparatus for producing microchips: Method for producing microchips by using immersion lithography, wherein the immersion fluid comprises an additive so that the refractive index of the immersion fluid is increased relative to the fluid not comprising the additive. The exposure light in the method has improved resolution, so that microchips having an increased integration... Agent: Nixon & Vanderhye, PC

20070105051 - Method of forming pattern: Formation of a constricted portion in an interconnect pattern is inhibited while moderating design rule for a phase shifting mask. When an interconnect pattern including a plurality of straight lines that are arranged in parallel is formed in a photoresist film on or over a wafer, the process thereof comprises:... Agent: Young & Thompson

20070105052 - Method of making thin film transistor liquid crystal display: A thin film transistor liquid array substrate includes forming a plurality of amorphous silicon thin film transistors and storage capacities on a transparent substrate, wherein the amorphous silicon thin film transistors and the storage capacities are arranged in an array pattern. The storage capacitor has a top electrode and a... Agent: Bacon & Thomas, PLLC

20070105053 - Method of manufacturing semiconductor device: Aiming at improving productivity of the semiconductor devices and at improving the product yield, a method of the present invention fabricates a semiconductor device by using, as a photomask, a first photomask 106 having a first rectangular pattern 104a obtained by dividing a mask pattern, and a second photomask 108... Agent: Sughrue Mion, PLLC

20070105054 - Pattern forming method and manufacturing method of semiconductor device: According to an aspect of the invention, there is provided a pattern forming method including forming a lower layer organic film on a substrate, forming an upper layer resist film containing an inorganic element on the lower layer organic film, exposing a pattern on the upper layer resist film and... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070105055 - Manufacturing method of master disc for optical disc, and master disc for optical disc: An inorganic resist layer made of an incomplete oxide of a transition metal is formed as a film onto a substrate by a sputtering method. A single element or alloy of the transition metal, or an oxide of them is used as a target material. Oxygen or nitrogen is used... Agent: Rader Fishman & Grauer PLLC

20070105056 - Method of forming a microlens array having a high fill factor: A method of forming a microlens array includes preparing a substrate; fabricating a photosensitive array on the substrate; depositing a layer of lens material on the photosensitive array; depositing and patterning photoresist on the lens material, wherein patterning includes forming a photoresist region having a solid curved upper surface and... Agent: Robert D. Varitz

20070105057 - Method for forming photoresist pattern: A method of forming a photoresist pattern, capable of improving an adhesion property of the photoresist pattern formed on a substrate, includes forming a photocatalytic layer on a substrate, forming a negative-type photoresist layer on the photocatalytic layer, exposing the photoresist layer to ultraviolet rays, heat-treating the photoresist layer, and... Agent: Cantor Colburn, LLP

20070105058 - Dual layer workpiece masking and manufacturing process: The present invention relates to preparation of patterned workpieces in the production of semiconductor and other devices. Methods and devices are described utilizing resist and transfer layers over a workpiece substrate. The methods and devices produce small feature dimensions in masks and phase shift masks. The methods described may apply... Agent: Haynes Beffel & Wolfeld LLP

20070105059 - Image forming method using photothermographic material: A method of forming an image using a photothermographic material containing a support having thereon an image forming layer which contains an organic silver salt, silver halide grains, a binder and a reducing agent, the method including the steps of: imagewise exposing the photothermographic material to light to form a... Agent: Lucas & Mercanti, LLP

20070099092 - Halftone phase shift mask blank, and method of manufacture: A halftone phase shift mask blank has a phase shifter film on a transparent substrate. The phase shifter film is composed of a metal silicide compound containing Mo, at least one metal selected from Ta, Zr, Cr and W, and at least one element selected from O, N and C.... Agent: Birch Stewart Kolasch & Birch

20070099093 - Method for providing representative features for use in inspection of photolithography mask and for use in inspection of photo-lithographically developed and/or patterned wafer layers, and products of same: Critically representative features (CRF's) for use in mask-making verification and/or resist development verification are defined and/or copied into the in-scribe area used by wafer CD features. The placement of mask-CRF's in the wafer CD bar region eliminates the problem of correctly and quickly locating mask-CRF's at different positions in the... Agent: Macpherson Kwok Chen & Heid LLP

20070099091 - Method of the adjustable matching map system in lithography: A method is provided for improving layer to layer overlay of a second layer pattern on a first layer pattern formed in a substrate. A plurality of first reference marks is placed inside a pattern area on a first layer mask which is used to form the first layer pattern.... Agent: Thomas, Kayden, Hostemeyer & Risley LLP

20070099095 - Applying colour elements and busbars to a display substrate: A method of applying to a display substrate colour elements and addressing busbars in a defined alignment relative to each other includes: forming said colour elements and said busbars on a surface of a transfer carrier; 10 adhering said colour elements and said busbars to said display substrate; and removing... Agent: Hewlett Packard Company

20070099096 - Dye-containing curable composition, color filter and method of producing thereof: A dye-containing curable composition comprising at least (A) an organic solvent-soluble dye, (B) a radiation-sensitive compound, (C) a transition metal complex, wherein the maximum value of the molar absorption coefficient ε in the visible light range is lower than the molar absorption coefficient ε of the organic solvent-soluble dye, and... Agent: Sughrue Mion, PLLC

20070099094 - Method for producing color filter for image sensor: A method for producing a color filter for an image sensor capable of obtaining pixels each constituted substantially into a rectangular shape and having a favorable cross-sectional pattern profile and capable of effectively preventing the deformation of a dye-containing pixel even in a case of conducting post-baking or the like,... Agent: Sughrue Mion, PLLC

20070099098 - Method of the adjustable matching map system in lithography: A method is provided for improving layer to layer overlay of a second layer pattern on a first layer pattern formed in a substrate. A plurality of first reference marks is placed inside a pattern area on a first layer mask which is used to form the first layer pattern.... Agent: Thomas, Kayden, Hostemeyer & Risley LLP

20070099097 - Multi-purpose measurement marks for semiconductor devices, and methods, systems and computer program products for using same: A mark for use in measuring characteristics of a layer of the semiconductor device includes multiple staggered L-shaped patterns including adjacent vertices, and legs that include line segments having variable spacing between them. Related methods, systems and computer program products for using the mark to calibrate semiconductor devices also are... Agent: Myers Bigel Sibley & Sajovec

20070099099 - Lithographic apparatus and device manufacturing method: A lithographic apparatus has a patterning support holding a patterning device. At least one position sensor measures a position of the patterning device relative to the patterning support, and generates a measuring signal. A positioning device controls a position of the patterning support on the basis of the measuring signal... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070099100 - Method for exposing a substrate and lithographic projection apparatus: A method for improving the uniformity of a lithographic process. In one aspect, the probability density function of a first and second lithographic apparatus are matched by providing a continuous z-motion to a stage in the first lithographic apparatus during substrate exposure. Preferably, the z-motion is characterized by a normally... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070099101 - Imaging member: A flexible imaging member which does not require the use of an anti-curl back coating is disclosed herein. The flexible imaging member has a layer comprising two charge transport molecules dispersed in a film-forming polymer binder and an overcoat layer. The first charge transport molecule is a biphenyl amine, terphenyl... Agent: Richard M. Klein, Esq. Fay, Sharpe, Fagan, Minnich & Mckee, LLP

20070099102 - Toner for developing electrostatic image: The present invention aims to provide a toner for developing electrostatic image which is excellent in image reproducibility and further in cleaning performance. A toner for developing electrostatic image comprising a colored particle containing a binder resin and a colorant, and an external additive, wherein the toner for developing electrostatic... Agent: Armstrong, Kratz, Quintos, Hanson & Brooks, LLP

20070099103 - Sulfone charge control agents for electrostatographic toners: The present invention is directed to an electrostatographic toner having a sulfone charge control agent having the structure X—SO2—Y wherein X is an alkyl or aromatic group and Y is an alkyl or aromatic group. The present invention is also directed to an electorstatographic developer containing the electrostatographic toner having... Agent: Paul A. Leipold Patent Legal Staff

20070099104 - Two component developing agent: A two-component developing agent retained on the periphery surface of a magnetic roller 11 and a development roller 12 are brought in contact with each other, the nonmagnetic toner in the two-component developing agent is electrostatically adhered to the periphery surface of the development roller 12, and the nonmagnetic toner... Agent: GlobalIPCounselors, LLP

20070099105 - Non-magnetic toner for developing electrostatic image: The present invention aims to provide a non-magnetic toner for developing electrostatic image which is able to perform stable high-quality printing in spite of environmental changes in, for example, temperature, humidity and so on. The non-magnetic toner for developing electrostatic image comprising a colored particle, produced by a method comprising... Agent: Armstrong, Kratz, Quintos, Hanson & Brooks, LLP

20070099106 - Electrophotographic toner: A method of preparing an electrophotographic toner is discloser, comprising subjecting polyester resin particles and colored microparticles to coagulation and fusion in an aqueos medium to form toner particles, wherein the colored microparticles comprise a colorant and a crosslinked polyester resing or a nitrogen-containing polycondensate resing.... Agent: Lucas & Mercanti, LLP

20070099108 - Anti-reflective coatings: Novel self-crosslinking polymers are provided and which are useful in antireflective coatings to reduce outgassing.... Agent: Alan P. Kass Az Electronic Materials Usa Corp.

20070099111 - Novel positive photosensitive polybenzoxazole precursor compositions: A heat resistant positive-working photosensitive PBO precursor composition comprising: (a) at least one polybenzoxazole precursor polymer; (a) at least one plasticizer compound; (b) at least one solvent; wherein the amount of the plasticizer present in the composition is an amount effective to reduce the sidewall angle of imaged and cured... Agent: Paul D. Greeley, Esq. Ohlandt, Greeley, Ruggiero & Perle, L.L.P.

20070099112 - Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process: h

20070099113 - Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process: Sulfonate salts have the formula: CF3—CH(OH)—CF2SO3−M+ wherein M+ is a Li, Na, K, ammonium or tetramethylammonium ion. Because of inclusion within the molecule of a hydroxyl group which is a polar group, the sulfonic acids are effective for restraining the length of acid diffusion through hydrogen bond or the like.... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070099110 - Organic anti-reflective coating polymer, organic anti-reflective coating composition and method for forming photoresist pattern: wherein R1 is a C1-C5 linear or branched alkyl group, R2 and R3 are each independently hydrogen or methyl, X is halogen, n is a number from 1 to 5, and a, b and c, representing the mole fraction of each monomer, are each independently from about 0.1 to about... Agent: Marshall, Gerstein & Borun LLP

20070099116 - Photoconductive layer forming radiation image taking panel and radiation image taking panel: A photoconductive layer for a radiation image taking panel is formed by selenium alloy containing 0.1 to 1000 molar ppm of monovalent metal and 0.1 to 1000 molar ppm of a chalcogenide element other than Se or selenium alloy containing 0.1 to 1000 molar ppm of monovalent metal and 0.1... Agent: Sughrue Mion, PLLC

20070099119 - Photosensitive composition with low yellowing under uv-light and sunlight exposure: This disclosure relates to a photosensitive composition useful in preparing water-developable, relief printing plates and other photosensitive articles. The compositions comprise an unsaturated polyurethane pre-polymer, which is the reaction product of at least one polyether diol, at least one aliphatic diisocyanate, at least one hydroxyl-functionalized mono-, di- and tri-(meth)acrylate, and... Agent: Thomas, Kayden, Horstemeyer & Risley, LLP

20070099115 - Photosensitive resin composition, image forming material and image forming method using thereof: There is devised a novel acryl resin in which an unsaturated group introduced in an alkali soluble resin is placed at a longer distance from the resin skeleton of the alkali soluble resin, the mobility of the unsaturated group is promoted and the number of the unsaturated double bonds is... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070099118 - Planographic printing plate precursor: A positive planographic printing plate precursor includes a support having disposed thereon a lower thermosensitive layer containing a water-insoluble but alkali-soluble polymer compound and an upper thermosensitive layer containing a water-insoluble but alkali-soluble polymer compound, with alkali-solubility increasing under heat, wherein (i) both the upper thermosensitive layer and the lower... Agent: Sughrue Mion, PLLC

20070099114 - Polymer, resist composition and patterning process: A polymer of which dissolution rate in an alkaline developer increases under the action of acid comprises recurring units having formulae (1) and (2) wherein R1, R2, and R4 are H or methyl, R3 is difluoromethyl or trifluoromethyl, and X is tertiary alkyl. A resist composition comprising the polymer has... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070099107 - Resin for positive resist composition, and positive resist composition using the same, laminate and method for forming resist pattern: The use of a positive resist composition that includes a resin with a specific structure improves the resolution and yields a resist pattern with a favorable shape. In addition, when a resist layer is formed on either a magnetic film or a metallic oxidation prevention film formed on the magnetic... Agent: Knobbe Martens Olson & Bear LLP

20070099117 - Sulfonamide compound, polymer compound, resist material and pattern formation method: wherein R1, R2 and R3 are the same or different and are a hydrogen atom, a fluorine atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a straight-chain... Agent: Mcdermott Will & Emery LLP

20070099109 - System and method for radiation imaging by in-situ particle formation: A radiation image-able coating includes a curable polymer matrix, a metal complex disposed in the curable polymer matrix, wherein the metal complex is configured to form localized metallic particles when exposed to heat.... Agent: Hewlett Packard Company

20070099120 - Developing solution for lithographic printing plate precursor and method for making lithographic printing plate: An alkaline developing solution for development of a presensitized plate for use in making a lithographic printing plate, which developing solution comprises a polyoxyalkylene adduct of alkylene diamine, a polyoxyalkylene compound having an acid radical, and an anionic surfactant; a method for making a lithographic printing plate comprising the steps... Agent: Buchanan, Ingersoll & Rooney PC

20070099124 - Composition for removing immersion lithography solution and method for manufacturing semiconductor device including immersion lithography process using the same: Disclosed herein is a composition for removing an immersion lithography solution. The composition includes an organic solvent and an acid compound. Also disclosed is a method for manufacturing a semiconductor device including an immersion lithography process. When a photoresist pattern is formed by the immersion lithography process, an exposure process... Agent: Marshall, Gerstein & Borun LLP

20070099125 - Fabrication method for a damascene bit line contact plug: A fabrication method for a damascene bit line contact plug. A semiconductor substrate has a first gate conductive structure, a second gate conductive structure and a source/drain region formed therebetween. A first conductive layer is formed in a space between the first gate conductive structure and the second gate conductive... Agent: Quintero Law Office, PC

20070099121 - Liquid discharge head manufacturing method, and liquid discharge head obtained using this method: According to the present invention, a method for manufacturing a liquid discharge head includes the steps of depositing a solid layer for forming a flow path on a substrate on which an energy generating element is arranged to generate energy that is used to discharge liquid, forming, on the substrate... Agent: Fitzpatrick Cella Harper & Scinto

20070099123 - Method of forming solder mask and wiring board with solder mask: A method of forming solder mask, suitable for forming a solder mask on the surface of a wiring board, is provided. The surface of the wiring board includes a first region and a second region, and the surface of the wiring board has a wiring pattern thereon. The method includes... Agent: Jianq Chyun Intellectual Property Office

20070099122 - Reflective film interface to restore transverse magnetic wave contrast in lithographic processing: A method and system for exposing a resist layer with regions of photosensitivity to an image in a lithographic process using a high numerical aperture imaging tool. There is employed a substrate having thereover a layer reflective to the imaging tool radiation and a resist layer having a region of... Agent: Law Office Of Delio & Peterson, LLC.

20070099127 - Compact integrated capacitor: An interdigitized, single layer capacitor with a narrow interplate channel and a method for forming the same is disclosed. The narrow interplate channel is formed using a method which provides for a narrower interplate channel than can be produced using standard photolithographic techniques.... Agent: Schneck & Schneck

20070099126 - Methods of fabricating integrated circuit transistors by simultaneously removing a photoresist layer and a carbon-containing layer on different active areas: Integrated circuit transistors may be fabricated by simultaneously removing a photoresist layer on a first active area of an integrated circuit substrate and a carbon-containing layer on a second active area of the integrated circuit substrate, to expose a nitride stress-generating layer on the second active area. A single mask... Agent: Myers Bigel Sibley & Sajovec

20070099128 - Method for manufacturing insulating resin layer, substrate for electro-optical devices, method for manufacturing electro-optical device, and electro-optical device: [Solving Means] A method for manufacturing an insulating layer for electro-optical devices according to the present invention includes an exposure step of performing exposure for a protrusion-forming layer 7 containing a photosensitive resin (insulating material) with an illuminance of 80 mW/cm2 or more. The resin is decolorized due to the... Agent: Oliff & Berridge, PLC

20070099129 - Developing method and developing apparatus: A developing method is used for subjecting a light-exposed resist film disposed on a wafer W to a developing process by a developing solution and a rinsing process by a rinsing liquid. In a state where the resist film on the wafer W is wet with the developing solution or... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070099130 - Developer for recording materials: A developer which contains a triphenolic compound (B) being a triphenolic compound (A) of the general formula (1) satisfying the requirements: (a) an OH group is present at one or more of 4- and 4′-positions of the left and right aromatic rings and (b) at least one of the substituents... Agent: Staas & Halsey LLP

20070099131 - Photographic materials having improved keeping properties: The use of a red-sensitising trinuclear merocyanine dye and an osmium dopant according to formula (I): [Os(NZ)L5]r wherein Z is sulphur or oxygen, L is a ligand and r is 0, −1, −2 or −3, in photographic silver halide emulsions for use in photographic materials, result in a reduction and/or... Agent: Patent Legal Staff

20070099132 - Photothermographic material: wherein R01 represents a hydrogen atom, an alkyl group with 1 to 6 carbon atoms, a halogen atom, or a cyano group; and R02 represents an alkyl group with 1 to 6 carbon atoms, a halogen atom or a cyano group (both R01 and R02 are not hydrogen atoms at... Agent: Taiyo Corporation