|Radiation imagery chemistry: process, composition, or product thereof patents - Monitor Patents|
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Radiation imagery chemistry: process, composition, or product thereof April patents by class relation 04/07Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 04/26/2007 > patent applications in patent subcategories.
20070092807 - Fabrication method of photomask-blank: A susceptor having the most basic structure has a three-layer structure including a first and a second transparent quartz part and an opaque quartz part sandwiched therebetween. For example, the opaque quartz part is made of “foamed quartz”. In addition, the opacity of the opaque quartz part to flash light... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20070092808 - Halftone type phase shift mask blank and phase shift mask thereof: A halftone type phase shift mask blank including, on a transparent substrate, at least a phase shifter film having a predetermined transmittance for an exposed light and a predetermined phase difference for the transparent substrate, wherein the phase shifter film is formed by a multilayer film in which films including... Agent: Sughrue Mion, PLLC
20070092806 - Mask at frequency domain and method for preparing the same and exposing system using the same: A mask at frequency domain comprises a plurality of amplitude patterns positioned on a first surface of the mask and a plurality of phase patterns positioned on a second surface of the mask. The amplitude patterns have different vertical thicknesses to change the amplitude of an exposing light, and the... Agent: Oliff & Berridge, PLC
20070092805 - Microlithography method using a mask with curved surface: m
20070092809 - Fabrication of rear projection surface using reversal emulsion: A method for fabrication of a rear projection article forms an arrangement of refractive elements on one surface of a transparent support and forms an apertured surface on the opposite surface of the support. A photographic positive reversal emulsion is applied to the opposite surface of the substrate to form... Agent: Paul A. Leipold Patent Legal Staff
20070092810 - Mask-less method of forming aligned semiconductor wafer features: A method of forming features in a semiconductor is disclosed. The method includes providing a wafer substrate including a surface having a reflective region, and coating the surface with a photosensitive layer. The method additionally includes exposing the photosensitive layer. The method further includes controlling exposure intensity such that the... Agent: Dicke, Billig & Czaja, P.l.l.c.
20070092811 - Method for selecting photomask substrate, method for manufacturing photomask, and method for manufacturing semiconductor device: According to an aspect of the invention, there is provided a method for selecting a photomask substrate, including dividing a chip area scheduled to be arranged on the photomask substrate regarding a specific transfer pattern layer into a management pattern area in which an element pattern changed in shape by... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20070092812 - Optically initiated silicon carbide high voltage switch: An improved photoconductive switch having a SiC or other wide band gap substrate material, such as GaAs and field-grading liners composed of preferably SiN formed on the substrate adjacent the electrode perimeters or adjacent the substrate perimeters for grading the electric fields.... Agent: The Regents Of The University Of California
20070092814 - Imaging member with dialkyldithiocarbamate additive: An imaging member containing a substrate, and an outer layer containing a dialkyldithiocarbamate additive, and an image forming apparatus for forming images on a recording medium including the imaging member above, a development component to apply a developer material to said charge-retentive surface to develop said electrostatic latent image to... Agent: Pillsbury Winthrop Shaw Pittman LLP
20070092813 - Imaging members: An imaging member having a charge transport layer is provided. The charge transport layer includes a plurality of charge transport layers coated from solutions of similar or different compositions or concentrations, wherein the upper or additional transport layer(s) comprise a lower concentration of charge transport compound than the first (bottom)... Agent: Fay Sharpe / Xerox - Rochester
20070092815 - Imaging member having barrier polymer resins: The presently disclosed embodiments relate in general to electrophotographic imaging members, such as layered photoreceptor structures, and processes for making and using the same. More particularly, the embodiments pertain to a photoreceptor additive to improve impermeability to gases and moisture so as to minimize environment variation of photoreceptor performance.... Agent: Pillsbury Winthrop Shaw Pittman LLP
20070092816 - Imaging member having porphine additive: The presently disclosed embodiments relate in general to electrophotographic imaging members, such as layered photoreceptor structures, and processes for making and using the same. More particularly, the embodiments pertain to a photoreceptor additive to eliminate charge deficient spots in specific conditions and improve image quality.... Agent: Pillsbury Winthrop Shaw Pittman LLP
20070092817 - Imaging member: An imaging member having an overcoat layer formed from a high viscosity overcoat composition. The viscosity of the overcoat composition is sufficient for reducing or preventing the diffusion of charge transport molecules into the overcoat layer. For example, in one embodiment the magnitude of diffusion of charge transport molecules is... Agent: Richard M. Klein, Esq. Fay, Sharpe, Fagan, Minnich & Mckee, LLP
20070092818 - Magnetic single component toner for electrostatic image development and insulation damage suppression method for amorphous silicon photosensitive member: A magnetic single component toner for electrostatic latent image development, which is used in a magnetic single component toner projection development method using an a-Si photosensitive member having a film thickness of no more than 30 μm, and a cleaning blade as a cleaning means for removing toner from the... Agent: GlobalIPCounselors, LLP
20070092819 - Method for producing electrophotographic toner and electrophotographic toner: A method for producing an electrophotographic toner comprising the steps of: (1) mixing a water-insoluble organic solvent, an oil-soluble dye capable of chelating with a metal, a metal compound and water to form an oil-soluble dye dispersion, (2) removing the organic solvent from the oil-soluble dye dispersion to form colored... Agent: Cantor Colburn, LLP
20070092821 - Toner for electrostatic image development, electrostatic image developer and image forming method using the same: The present invention relates to a toner for electrostatic image development, comprising a crystalline ester compound synthesized by polymerizing a carboxylic acid component with an alcohol component, a non-crystalline resin, a colorant and a releasing agent, wherein the weight-average molecular weight of the crystalline ester compound is 5000 or less,... Agent: Oliff & Berridge, PLC
20070092820 - Toner with enhanced fuser release properties: The crystalline state of the release wax of an electrophotographic toner is made so that the crystalline state has the highest melt transition temperature. In an embodiment, this is done by synthesizing the toner particles at a controlled low temperature, the temperature being that found consistent with subsequent cooling to... Agent: Lexmark International, Inc. Intellectual Property Law Department
20070092822 - Method of producing toner for developing electrostatic charge image, toner for developing electrostatic charge image, developer for electrostatic charge image and method for forming image: A method of producing a toner for developing electrostatic charge image, the method comprising: aggregating particles containing a crystalline polyester resin, particles containing a non-crystalline polyester resin and particles of a releasing agent in an aqueous medium, so as to form aggregated particles; and heating the aggregated particles to fuse... Agent: Oliff & Berridge, PLC
20070092823 - Image forming method and production process of toner for developing electrostatic latent image: An image forming method, which comprises: forming an electrostatic latent image on a surface of a latent image supporting member; developing the electrostatic latent image formed on the surface of the latent image supporting member with a toner for developing an electrostatic latent image or an electrostatic latent image developer... Agent: Oliff & Berridge, PLC
20070092824 - Solvent system for overcoating materials: A unique solvent system adapted for high speed overcoat applications is disclosed. The solvent system comprises methyl alcohol and monochlorobenzene in a weight ratio of about 6:1 to about 1.5:1, respectively.... Agent: Richard M. Klein, Esq. Fay, Sharpe, Fagan, Minnich & Mckee, LLP
20070092825 - Toner additives: The presently disclosed embodiments relate in general to toners for use in electrophotographic apparatuses, such as printers and copiers. More particularly, a toner formulation of at least one binder, at least one colorant, and an embrittling agent, and methods for making the same, is provided wherein the embrittling agent increases... Agent: Pillsbury Winthrop Shaw Pittman LLP
20070092826 - Thermally conductive material and use in high-speed printing: A thermally conductive material, a donor element including the material, a method of printing using the donor element, and a print assembly including the donor element are described, wherein the thermally conductive material includes at least two immiscible or incompatible organic polymers, or a block or graft copolymer, wherein the... Agent: Paul A. Leipold Patent Legal Staff
20070092833 - Image recording media and image layers: Imaging layers, image recording media, and methods of preparation of each, are disclosed.... Agent: Hewlett Packard Company
20070092827 - Inks for use on light-activated imaging media: An light activated imaging medium comprises a substrate and an imaging composition disposed on the substrate, the composition comprising a matrix and a color-forming agent within the matrix and an alloy of at least two leuco dyes, the leuco dyes having at least first and second melting points, respectively, and... Agent: Hewlett Packard Company
20070092836 - Lithographic printing plate precursor and lithographic printing method: An on-press development or non-processing (non-development) type lithographic printing plate precursor capable of giving a printout image having a large lightness difference, and a lithographic printing method using this lithographic printing plate precursor are provided, a lithographic printing plate precursor comprising a support and a photosensitive-thermosensitive layer capable of recording... Agent: Birch Stewart Kolasch & Birch
20070092832 - Method and apparatus for controlled triggering of oxygen scavenging compositions utilizing a wrap-around shade: An apparatus is provided for activating an oxygen scavenging composition that includes a plurality of UV lamps arranged in a bank and disposed in a UV chamber; the UV lamps include first and second sides through which UV light is transmittable. A series of guide rolls disposed in the UV... Agent: Alston & Bird LLP
20070092828 - Nir/ir curable coatings for light directed imaging: An imaging medium comprises a substrate and an imaging composition disposed on the substrate. The imaging composition comprises a matrix, a thermochromic compound dispersed or dissolved in the matrix; and at least two photoinitiators dispersed or dissolved in the matrix.... Agent: Hewlett Packard Company
20070092834 - Photoimageable, thermosettable fluorinated resists: The present invention provides fluorinated, thermosettable compositions that are photoimageable and which function as low dielectric materials. Such low dielectric materials are useful as passivation resist layers in liquid crystal displays, electroluminescent displays, light emitting diodes and semiconductor manufacture.... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center
20070092829 - Photosensitive coating for enhancing a contrast of a photolithographic exposure: A photosensitive coating material for enhancing a contrast of a photolithographic exposure of a resist film formed on a substrate, including a base polymer, a solvent for facilitating deposition of the photosensitive coating material upon a surface adjacent to said resist film to form a film thereupon, an alkaline additive... Agent: Slater & Matsil LLP
20070092835 - Photosensitive film: A photosensitive film excellent in workability and making it possible, in a normal pressure laminating process, to laminate photosensitive films on the surface of substrate having a metallic surface with a reduced number of air voids generated and in a high product yield, said film comprising a support film (A),... Agent: Griffin & Szipl, PC
20070092830 - Polymeric radiation-absorbing materials and ophthalmic devices comprising same: A polymeric radiation-absorbing material comprises units of a polymerizable benzotriazole-based radiation-absorbing compound and a monomer, and is capable of absorbing UV radiation, at least about 90 percent of light having wavelength of 425 nm, less than about 50 percent of light having wavelength of 450 nm, and less than about... Agent: Bausch & Lomb Incorporated
20070092831 - Radiation-absorbing polymeric materials and ophthalmic devices comprising same: A radiation-absorbing polymeric material comprises units of a polymerizable UV-absorbing compound, a violet light-absorbing compound, and a monomer, and is capable of absorbing UV radiation, at least about 90 percent of light having wavelength of 425 nm, less than about 50 percent of light having wavelength of 450 nm, and... Agent: Bausch & Lomb Incorporated
20070092837 - Optical disc embossed features: A method for forming an optical disc includes forming a first disc portion, forming a second disc portion, coupling the first disc portion to the second disc portion, wherein forming the first disc portion includes forming a data recording layer, and wherein forming the second disc portion includes forming a... Agent: Hewlett Packard Company
20070092838 - Sulfur-containing dispersant and sulfide phosphor paste composition comprising the same: A sulfide phosphor paste composition comprising a sulfur-containing dispersant, and a fluorescent film prepared therefrom, are provided. The sulfur-containing dispersant has a dual head structure containing both a carboxyl group and a thiol group or a structure containing a thiol or thiophene group as a head group. An oligomeric sulfur-containing... Agent: Cantor Colburn, LLP
20070092841 - Exposure method: An exposure method includes the step of illuminating a mask having a contact hole pattern that includes a hybrid pattern using an illumination light that forms an effective source that has plural poles, and projecting an image of the mask onto a plate through a projection optics. The hybrid pattern... Agent: Morgan & Finnegan, L.L.P.
20070092839 - Polarizing photolithography system: A polarizing photolithography reticle system is provided including providing a reticle substrate, forming polarization structures on the reticle substrate, and etching circuit patterns on the reticle substrate on a side opposite the polarization structures.... Agent: Ishimaru & Zahrt LLP
20070092840 - System and method for photolithography in semiconductor manufacturing: A method for photolithography in semiconductor manufacturing includes providing a substrate for a wafer and providing a mask for exposing the wafer. The wafer is exposed by utilizing a combination of high angle illumination and focus drift exposure methods.... Agent: Haynes And Boone, LLP
20070092842 - Method of recording and reading digital data on a photographic support: The invention relates to a method of recording data on a photographic support (10), comprising the formation on the support of many encoding marks (14a, 14b), linked to many data items to be recorded, each encoding mark being formed with an exsposure energy that is preset function of a data... Agent: Patent Legal Staff
20070092844 - Method to form photo patterns: A method for forming photo patterns on a photoresist layer is disclosed. A photoresist layer is formed over a substrate. The photoresist layer has a first photo region and a second photo region. A first exposure is performed to define a through pitch pattern at the first photo region and... Agent: Martine Penilla & Gencarella, LLP
20070092843 - Method to prevent anti-assist feature and side lobe from printing out: A method for forming photo patterns on a photoresist layer is disclosed. A photoresist layer is formed over a substrate. The photoresist layer is then treated with a basic compound and is exposed. The photoresist layer can be treated with a basic compound first, and then exposed. The photoresist layer... Agent: Martine Penilla & Gencarella, LLP
20070092845 - Image recording media and image layers: Imaging layers, image recording media, and methods of preparation of each, are disclosed.... Agent: Hewlett Packard Company04/19/2007 > patent applications in patent subcategories.
20070087273 - Alternating phase shift mask: One inventive aspect relates to a phase shift mask suitable for lithographic processing of a device, to a method of making such a mask and to lithographic processing using such a mask. The phase shift mask is made taking into account the threshold or dose that will be used for... Agent: Knobbe Martens Olson & Bear LLP
20070087272 - Method for preparing a phase-shifting mask and method for preparing a semiconductor device using the phase-shifting mask: A phase-shifting mask comprises a substrate and a plurality of phase-shifting patterns made of polymer material and positioned on the substrate in an array manner. Preferably, the space between phase-shifting patterns is smaller than the width of the phase-shifting pattern along a first direction, and the space between two line-shaped... Agent: Oliff & Berridge, PLC
20070087271 - Phase-shifting mask: The present phase-shifting mask comprises a substrate and a plurality of phase-shifting patterns made of polymer material and positioned on the substrate in an array manner. Preferably, the space between phase-shifting patterns is smaller than the width of the phase-shifting pattern along a first direction, and the space between two... Agent: Oliff & Berridge, PLC
20070087274 - Wiring correction method: The presence of defects in a wiring pattern is checked by a visual method, by image processing, or the like, and when a defect is detected, information such as the position, coordinates, and size of the defect is confirmed, the type of defect is confirmed, and a processing method and... Agent: Sughrue Mion, PLLC
20070087275 - Method of fabricating liquid crystal display device: In a method of fabricating a liquid crystal display device, when a photoresist film formed on a substrate for the liquid crystal display device is exposed and developed, protrusions are formed on the substrate for increasing a viewing angle of the liquid crystal display device. Although the substrate is formed... Agent: F. Chau & Associates, LLC
20070087277 - Photoconductive members: A photoconductive imaging member including at least a charge generating layer, a charge transport layer, and an overcoat layer. The overcoat layer includes a cured or substantially crosslinked product of at least a phenol compound and a charge transport compound.... Agent: Oliff & Berridge, PLC.
20070087276 - Phenolic hole transport polymers: A polymer having hole transport functionality and antioxidant properties is disclosed. The polymer comprises a phenolic segment and a hole transport segment. The polymer is suitable for use in the charge transport layer of an imaging member. Processes for producing the polymer are also disclosed.... Agent: Richard M. Klein, Esq. Fay, Sharpe, Fagan, Minnich & Mckee, LLP
20070087278 - Electrophotographic photoconductor: An electrophotographic photoconductor in which generation of a ghost phenomenon caused by exposure is avoided and potential change before and after continuous printings is insignificant. A functionally separated type electrophotographic photoconductor comprises at least a charge generation layer containing a charge generation agent and a charge transport layer containing a... Agent: Rabin & Berdo, PC
20070087279 - Transfer apparatus and transfer method: There is provided a transfer apparatus 10 which transfers many chips C on a dicing tape DT stretched in a first ring frame 20 to a transfer sheet S stuck in a second ring frame 24. This transfer apparatus 10 is provided with a pressing member 15 which presses the... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20070087280 - Emulsion aggregation toner incorporating aluminized silica as a coagulating agent: The toner includes emulsion aggregation toner particles having a core and a shell. The core includes binder including a first non-crosslinked styrene acrylate polymer and a crosslinked styrene acrylate polymer, at least one colorant, at least one wax, and aluminized silica. The shell includes a second non-crosslinked styrene acrylate polymer... Agent: Oliff & Berridge, PLC.
20070087281 - High gloss emulsion aggregation toner incorporating aluminized silica as a coagulating agent: The toner includes emulsion aggregation toner particles of a binder including a non-crosslinked styrene acrylate polymer, at least one colorant, at least one wax, and aluminized silica, wherein an amount of aluminum metal in the toner particles is from about 50 ppm to about 600 ppm. Such toner is able... Agent: Oliff & Berridge, PLC.
20070087282 - Mg-based ferrite, an electrophotographic development carrier containing the ferrite, and developer containing the carrier: This invention provides an Mg-based ferrite having a high dielectric breakdown voltage and a saturation magnetization suitable for electrophotographic development, a carrier containing the ferrite, and an electrophotographic developer containing the carrier. The Mg-based ferrite material of this invention comprises Li, Na, K, Rb, Cs, Ca, Sr, Ba, Y, La,... Agent: Browdy And Neimark, P.l.l.c. 624 Ninth Street, Nw
20070087283 - Electrostatographic method: The present invention is a method of forming a toner image on a receiving sheet. he method includes forming an electrostatic image on a primary image member and toning the image with a dry toner to form a toner image. The toner includes toner particles having a diameter of between... Agent: Paul A. Leipold Patent Legal Staff
20070087284 - Multipass multiphoton absorption method and apparatus: A method of increasing the efficiency of a multiphoton absorption process and apparatus. The method includes: providing a photoreactive composition; providing a source of sufficient light for simultaneous absorption of at least two photons; exposing the photoreactive composition to at least one transit of light from the light source; and... Agent: 3m Innovative Properties Company
20070087287 - Amine compound, chemically amplified resist composition and patterning process: Chemically amplified resist compositions comprising amine compounds having a fluorinated alkyl group offer an excellent resolution and a precise pattern profile and are useful in microfabrication by KrF, ArF, F2, EUV, EB or X-ray lithography. They are also effective in the immersion lithography.... Agent: Birch Stewart Kolasch & Birch
20070087286 - Compositions and processes for photolithography: Overcoating layer compositions that are applied above a photoresist composition including for immersion lithography processing as well as non-immersion imaging.... Agent: S. Matthew Cairns Rohm And Haas Electronic Materials LLC
20070087288 - Positive-working photosensitive composition and pattern forming method using the same: A positive-working photosensitive composition that includes (A) a resin containing repeating units having diamantane structures and capable of decomposing under action of an acid to increase solubility in an alkali developer, (B) a compound capable of generating a specific organic acid upon irradiation with an actinic ray or radiation, and... Agent: Sughrue-265550
20070087285 - Top antireflective coating composition with low refractive index at 193nm radiation wavelength: Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and a refractive index value n of less than 1.5 with respect to a radiation wavelength of 193 nm have been found which are especially useful as top antireflective coatings in 193 nm dry lithographic processes. Polymers... Agent: Steve Capella IBM Corporation
20070087289 - Printing form and method for imaging a printing form: A printing form and method for imaging a printing form, in particular a printing sleeve or printing plate, is disclosed. The printing form, having a printing form carrier and a polymer layer which is applied to the printing form carrier, can be imaged and can be erased, it being possible... Agent: Crowell & Moring LLP Intellectual Property Group
20070087290 - High resolution printing technique: A pattern having exceptionally small features is printed on a partially fabricated integrated circuit during integrated circuit fabrication. The pattern is printed using an array of probes, each probe having: 1) a photocatalytic nanodot at its tip; and 2) an individually controlled light source. The surface of the partially fabricated... Agent: Knobbe Martens Olson & Bear LLP
20070087291 - Lithography process to reduce interference: A method and associated masks for carrying out a lithographic imaging process to reduce or avoid a strong interference effect in off-axis illumination, the method including providing a resist layer on a substrate; illuminating a first group of line patterns through a first mask on the resist layer; illuminating a... Agent: Tung & Associates
20070087293 - Color forming composition: The present disclosure discloses a color former phase. According to one exemplary embodiment discussed herein, an exemplary color former phase includes at least one color former, a radiation absorber, and an acrylic resin, in which the color former, the radiation absorber, and the acrylic resin form an amorphous solid.... Agent: Hewlett Packard Company
20070087292 - Color forming compositions: A color forming composition is provided herein. According to one exemplary embodiment, a color forming composition includes a polymer matrix; an aromatic sulfonylurea activator, a radiation absorber, and an isobenzofuranone color former dye.... Agent: Hewlett Packard Company
20070087294 - Imaged anti-copy film: An anti-copy film is disclosed. The film has a light transmissive imageable substrate having opposing first and second surfaces. Each surface has an image receptive coating. Complementary positive and negative images are disposed on the first and second surfaces such that an imaged area on the first surface is in... Agent: 3m Innovative Properties Company
20070087295 - Radiographic materials with antifoggant precursors: A radiographic material containing tabular silver halide grains also includes an amido compound as an antifoggant precursor that can slowly release an antifoggant over time. These compounds are present in reactive association with the silver halide in tabular silver halide emulsion layers, and are present in an amount of at... Agent: Paul A. Leipold Patent Legal Staff04/12/2007 > 32 patent applications in 17 patent subcategories.
20070082278 - Halftone phase shift mask blank, halftone phase shift mask, and method of producing the same: A halftone phase shift mask blank for use in manufacturing a halftone phase shift mask comprises a transparent substrate, a light transmitting portion formed on the substrate for transmitting an exposure light beam, a phase shifter portion formed on the substrate for transmitting a part of the exposure light beam... Agent: Sughrue Mion, PLLC
20070082274 - High-transmittance attenuated phase-shift mask blank: The present invention discloses a HT-AttPSM (high-transmittance attenuated phase-shift mask) blank with phase-shifters composed of the (Al2O3)x/(TiO2)1-x superlattice film stacks, wherein x preferably ranges 79˜84%. Particularly, the four-stacked superlattice films of the present invention perform superior optical properties including transmittance of 19.9% and a reflectance of 3.2% at the wavelength... Agent: Rosenberg, Klein & Lee
20070082272 - Masks, lithography device and semiconductor component: The invention relates to masks comprising a multilayer coating of a specified period thickness distribution such as those used in lithography devices for producing semiconductor components. One problem of projection optics concerns pupil apodization which leads to imaging defects. The invention provides that the period thickness in the mask plane... Agent: Hudak, Shunk & Farine, Co., L.p.a.
20070082276 - Notched trim mask for phase shifting mask: A phase shifting mask (PSM) and a trim mask can be used in a dual exposure to form circuits on an integrated circuit. The trim mask can include first structures that define non-critical features of a design (e.g. line ends), second structures that protect areas exposed by phase shifters, wherein... Agent: Bever, Hoffman & Harms, LLP
20070082275 - Optical proximity correction photomasks: An optical proximity correction photomask comprises a transparent substrate, a main feature having a first transmitivity disposed on the transparent substrate and at least one assist feature having a second transmitivity disposed beside the main feature and on the transparent substrate, wherein the first transmitivity is not equal to the... Agent: Thomas, Kayden, Horstemeyer & Risley, LLP
20070082273 - Photomask and image device manufacturing method: In a photomask formed with a device pattern made of a light-shielding film pattern in a transfer area on a front surface of an optically transparent substrate, the photomask includes a non-device pattern such as a product identification pattern composed of a light-shielding film pattern in a non-transfer area at... Agent: Sughrue Mion, PLLC
20070082277 - Process margin using discrete assist features: The subject invention provides a system and method for improving the process margin of a lithographic imaging system. The process margin improvement is achieved through the novel placement of discrete assist features and/or the use of forbidden pitches and specific pitch orientations. Novel geometries are utilized, which take advantage of... Agent: Amin, Turocy & Calvin, LLP
20070082281 - Compensating for effects of topography variation by using a variable intensity-threshold: One embodiment of the present invention provides a system that accurately determines a critical dimension of a feature in a layout by compensating for the effects of topography variation on the performance of an optical lithography process. During operation, the system first receives a layout. Next, the system computes an... Agent: Synopsys, Inc C/o Park, Vaughan & Fleming LLP
20070082280 - Method and arrangement for correcting thermally-induced field deformations of a lithographically exposed substrate: The invention provides a method for correcting thermally-induced field deformations of a lithographically exposed substrate. First, a model is provided to predict thermally-induced field deformation information of a plurality of fields of the substrate. The pre-specified exposure information used to configure an exposure of the fields is then modified based... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20070082279 - Near-field exposure method and device manufacturing method using the same: Disclosed is a near-field exposure method including a process of bringing a light blocking film with a plurality of small openings each having an opening width not greater than a wavelength of exposure light, into close contact with a photoresist layer provided on a surface of a substrate, and a... Agent: Fitzpatrick Cella Harper & Scinto
20070082282 - Imaging members: An electrophotographic imaging member having a charge generating layer and a charge transport layer overlayed thereon is provided. The charge transport layer has a lower surface and an upper surface, wherein the lower surface is in contiguous contact with the charge generating layer. The charge transport layer comprises a film... Agent: Fay Sharpe / Xerox - Rochester
20070082283 - Photoreceptor with improved electron transport: The presently disclosed embodiments relate in general to electrophotographic imaging members, such as layered photoreceptor structures, and processes for making and using the same. More particularly, the embodiments pertain to a photoreceptor that incorporates copolymers to that provide electron transporting functionality to improve image quality.... Agent: Pillsbury Winthrop Shaw Pittman LLP
20070082284 - Metal complexes with bipodal ligands: The present invention describes novel metal complexes with bipolar ligands. Compounds of this type can be employed as functional materials in a number of different applications which can be ascribed to the electronics industry in the broadest sense.... Agent: Connolly Bove Lodge & Hutz, LLP
20070082285 - Resin microparticle as raw material for toner, aqueous dispersed system thereof and toner: A resin microparticle for a toner raw material that has a small particle diameter and a narrow particle diameter distribution and has a low odor is provided. The resin microparticle for a toner raw material has the following requirements (i) to (iii) satisfied: Requirement (i): A particle diameter of 50%... Agent: Buchanan, Ingersoll & Rooney PC
20070082286 - Carrier, developer including the carrier, and image forming apparatus using the develper: A carrier including a magnetic core material and a layer located on a surface of the magnetic core material, wherein the carrier satisfies the following relationships (1) to (3): 0.90≦(σa/σb)<1.00 (1); 200≦(σb·ρc)≦400 (2); 10≦(σb/ρc)≦20 (3), wherein σb represents a magnetization of the carrier at 1,000 Oe, σa represents a magnetization... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.
20070082287 - Toner processes: Continuous processes for producing toner compositions are provided utilizing spinning disc reactors, rotating tubular reactors, or combinations thereof.... Agent: Carter, Deluca, Farrell & Schmidt, LLP
20070082288 - Radiation curable thermal transfer elements: Radiation curable thermal transfer elements including a substrate and a light-to-heat conversion layer overlaying the substrate, and processes to make the thermal transfer elements. The light-to-heat conversion layer is derived from a radiation curable material capable of being cured by exposure to radiation at a curing wavelength and an imaging... Agent: 3m Innovative Properties Company
20070082291 - Lithographic printing plate precursor and lithographic printing method: An image-recording material containing (A) a compound having a specific partial structure and at least one group selected from an acid group having a pKa of 11 or less, the derivative of the acid group and a group capable of generating the acid group, a lithographic printing plate precursor having... Agent: Birch Stewart Kolasch & Birch
20070082289 - Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition: A photosensitive composition comprising a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation; a pattern forming method using the photosensitive composition; a compound having a specific structure; and a compound capable of generating a compound having a specific structure upon irradiation... Agent: Sughrue Mion, PLLC
20070082290 - Planographic printing plate precursor: The invention provides a planographic printing plate precursor including a photosensitive layer containing an infrared absorbent, a polymerization initiator, a polymerizable compound, and a binder polymer, and a protective layer containing an inorganic layered compound, formed in this order on a surface of a hydrophilic aluminum support, wherein at least... Agent: Sughrue Mion, PLLC
20070082292 - Water-soluble material, chemically amplified resist and pattern formation method using the same: A water-soluble material used for forming a water-soluble film on a chemically amplified resist film includes a water-soluble polymer, an acid generator and a compound constructing an inclusion compound for incorporating the acid generator. Also, in a pattern formation method, a chemically amplified resist film is formed on a substrate,... Agent: Mcdermott Will & Emery LLP
20070082293 - Method of producting a fluorescent optical information carrier and the apparatus and carrier thereof: The present invention relates to a method of producing high contrast optical storage discs. The method comprises usage of so-called liquid embossing technology process steps that turn out to be beneficial for mass-producing fluorescent optical data storage discs. The present invention also relates to a high contrast optical storage disc... Agent: Philips Intellectual Property & Standards
20070082294 - Inorganic composition: The present invention provides an inorganic composition for use in information recording medium disc substrate and such, having an excellent surface property capable of sufficiently corresponding with a ramp load system for high density recording, a high degree of tolerability to high speed rotation, and high productivity at a low... Agent: Squire, Sanders & Dempsey L.L.P.
20070082296 - Method of forming micro-patterns using multiple photolithography process: Provided is a method of forming micro-patterns using a multi-photolithography process, including: providing an etch target layer where micro-patterns are to be formed; forming a mask layer on the etch target layer; forming a first mask pattern including engraved portions and embossed portions by etching a predetermined region of the... Agent: Mills & Onello LLP
20070082295 - Method of manufacturing semiconductor device: A method of manufacturing a semiconductor device using immersion exposure in which exposure is carried out with an immersion exposure liquid interposed between a projection lens and a substrate, includes preparing a photomask on which a plurality of patterns are formed, projecting the patterns formed on the photomask, on a... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20070082297 - Polymer, top coating layer, top coating composition and immersion lithography process using the same: A polymer, a top coating layer, a top coating composition and an immersion lithography process using the same are provided. The polymer used as a top coating layer covering (or formed on) a photoresist may include a specific chemical structure. The top coating composition may include a solvent and a... Agent: Harness, Dickey & Pierce, P.L.C
20070082298 - Method of manufacturing semiconductor device from semiconductor wafer: In a method of manufacturing a semiconductor device, a semiconductor wafer is provided. The wafer has semiconductor chip regions, a scribing line region and a predetermined region. A passivation layer is formed on the wafer. A photoresist film is formed on the passivation layer. A first pattern in a reticle... Agent: Sughrue Mion, PLLC
20070082299 - Methods and apparatus for fabricating conductive features on glass substrates used in liquid crystal displays: Methods and systems for defining metal features to be part of a liquid crystal display (LCD) is provided. The method is applied to a glass substrate, and the glass substrate has a blanket conductive metal layer (e.g., a barrier layer) defined on the glass substrate or a layer of the... Agent: Martine Penilla & Gencarella, LLP
20070082300 - Image forming method: A method of forming an image comprising the steps of: (a) irradiating an silver salt photothermographic material with a laser beam emitted by a scanning exposing device in a laser imager, provided that the scanning exposing device comprises a laser diode, a polygon mirror, and an imaging lens made of... Agent: Cantor Colburn, LLP
20070082301 - Image forming method using photothermographic material: Provided is an image forming method including providing a photothermographic material having image forming layers containing at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder on both surfaces of a support, imagewise exposing the photothermographic material with a fluorescent intensifying screen, and... Agent: Taiyo Corporation
20070082302 - Thermally developable imaging material: A photothermographic material having a Dmin and Dmax optical density. The material includes a support having hereon one or more thermally-developable imaging layers which are developable to produce an image when the photothermographic material is thermally processed; and an area disposed along a length of at least one edge of... Agent: Pamela R. Crocker Patent Legal Staff
20070082303 - Silver salt particle of nitrogen-containing heterocyclic compound and photothermographic material containing the same: A) a rectangular particle in which a major axis a, a medium axis b, and a minor axis c of the rectangle satisfy a≧b, and a ratio of the medium axis b to the minor axis c (b/c) is from 1.1 to 10; B) a rod-like particle in which a... Agent: Taiyo Corporation04/05/2007 > 30 patent applications in 18 patent subcategories.
20070077498 - Optical recording composition, optical recording medium and production method thereof, optical recording method and optical recording apparatus: Provided are optical recording compositions that bring about optical recording media capable of multiple-recording interference images formed by an informing light and a reference light with higher sensitivity, the methods for producing the same, and optical recording methods and optical recording apparatuses that utilize the optical recording media. The optical... Agent: Sughrue Mion, PLLC
20070077499 - Method for depositing multi-layer film of mask blank for euv lithography and method for producing mask blank for euv lithography: A method for depositing, by ion beam sputtering, a multilayer reflective coating of a reflective mask blank for EUV lithography on a substrate having a concave defect formed thereon, characterized in that the method comprises carrying out ion beam sputtering so that an absolute value of an angle α formed... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.
20070077501 - Stencil masks, method of manufacturing stencil masks, and method of using stencil masks: The present invention presents a stencil mask in which various surface patterns can be formed, and in which deformation is suppressed when charged particles are introduced. A stencil mask of the present invention is provided with a semiconductor stack. A first penetrating hole corresponding to an ion introducing area is... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20070077500 - Sub-wavelength diffractive elements to reduce corner rounding: The present invention discloses a mask including: a first region near a corner of a feature, the first region including a first element, the first element being transparent to a light, the first element having a side that is smaller than a wavelength of said light; a second region near... Agent: Blakely Sokoloff Taylor & Zafman
20070077502 - Color filter, semi-transmissive semi-reflective liquid-crystal display device, method for forming phase difference control layer, and method for manufacturing color filter: A color filter of the present invention comprises a substrate having light transmissivity, a color layer provided on the lower surface of the substrate and comprising a plurality of color pattern layers, each transmitting visible light of different color, and a phase difference control layer comprising a plurality of phase... Agent: Oliff & Berridge, PLC
20070077503 - Overlay key, method of forming the overlay key and method of measuring overlay accuracy using the overlay key: In an overlay key used for measuring overlay accuracy between first and second layers on a substrate, a first mark may be formed in the first layer, and a second mark may be formed on the second layer. The first mark may include first patterns having a first pitch and... Agent: Harness, Dickey & Pierce, P.L.C
20070077504 - Method for opc model generation: A method for generating or refining an OPC model for use in wafer fabrication. A predetermined feature layout is used to prepare a mask for use in, for example, a photolithographic process. The mask is used to create structures corresponding to mask features on a semiconductor wafer using the mask.... Agent: Slater & Matsil LLP
20070077505 - Imaging member: The presently disclosed embodiments relate in general to electrophotographic imaging members, such as layered photoreceptor structures, and processes for making and using the same. More particularly, the embodiments pertain to a photoreceptor that incorporates electron transport additives in an imaging layer to improve background and print image quality.... Agent: Pillsbury Winthrop Shaw Pittman LLP
20070077506 - Electrophotographic photoreceptor and image forming apparatus provided with the same: An electrophotographic photoreceptor having excellent electric characteristics such as sensitivity characteristic and light responsiveness with an excellent life duration of abrasion resistance so that no flaw and density unevenness are generated on to-be-formed images for a long period of time, is provided. In an electrophotographic photoreceptor (1), an enamine compound... Agent: Nixon & Vanderhye, PC
20070077507 - Electrophotographic photoconductor and manufacturing method of electrophotographic photoconductor: The present invention provides an electrophotographic photoconductor which can reduce the generation of fogging under a high-temperature and high-moisture condition and can be easily manufactured, and a method of manufacturing such an electrophotographic photoconductor. In an electrophotographic photoconductor which includes a support base body, an intermediate layer and a photoconductor... Agent: Arthur G. Schaier Carmody & Torrance LLP
20070077508 - Method of treating an electrophotographic-imaging member with a rare earth material: This invention relates to a method for improving chemical stability in a metal or metallized substrate, such as an aluminum substrate, of an electrophotographic-imaging member by treating the substrate with a composition containing a rare-earth metal.... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20070077509 - Color toner for electro printing and process for producing glass plate provided with ceramic color print: A color toner for electro printing, which comprises from 10 to 50 parts by mass of fine inorganic pigment particles, from 5 to 40 parts by mass of a heat decomposable binder resin having an acid value of at least 5, and from 40 to 85 parts by mass of... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.
20070077510 - Sulfonated polyester toner: A toner of a sulfonated polyester resin and at least one colorant is made to contain from about 0.01% by weigh to about 3% by weight of dry toner in total of lithium, sodium, zinc and calcium. The sulfonated polyester resin may be an alkali metal sulfonated polyester resin, wherein... Agent: Oliff & Berridge, PLC.
20070077511 - Laser resist transfer for microfabrication of electronic devices: A method for forming a resist pattern on a substrate (18) places a donor element (12) having a layer of thermoresist material proximate the substrate. A gap is maintained such that the surface of the layer of thermoresist material is spaced apart from the surface of the substrate by a... Agent: Mark G. Bocchetti Patent Legal Staff
20070077518 - Infrared-sensitive planographic printing plate precursor: Provided is an infrared-sensitive planographic printing plate precursor, including a supporting plate, a recording layer formed on one face of the supporting plate, the recording layer containing a water-insoluble and alkali-soluble resin and an infrared absorbent and forming an image by irradiation of infrared ray, and an organic polymer layer... Agent: Sughrue Mion, PLLC
20070077517 - Novel tarc material for immersion watermark reduction: A coating material disposed overlying a photo sensitive layer during an immersion lithography process includes a polymer that is substantially insoluble to an immersion fluid and an acid capable of neutralizing a base quencher from the photo sensitive layer.... Agent: Haynes And Boone, LLP
20070077519 - Pattern forming method and resist composition used therefor: A pattern forming method comprising: coating a resist composition on a substrate; adjusting a rotational speed of the substrate within a range of 500 to 1,500 rpm so that a film thickness of the resist composition coated is adjusted; and subjecting the resist composition to drying, exposure and development, wherein... Agent: Sughrue-265550
20070077513 - Positive-working lithographic printing plate precursor: A positive-working lithographic printing plate precursor is disclosed which comprises (i) a grained and anodized aluminum support having a hydrophilic surface and (ii) a heat-sensitive oleophilic coating provided on the hydrophilic surface, wherein said coating comprises (a) a hydrophobic polymer which is soluble in an aqueous alkaline developer and (b)... Agent: Leydig Voit & Mayer, Ltd
20070077520 - Recording medium, planographic printing plate using the same and production method thereof: The invention provides a recording medium for producing a direct-writing planographic printing plate comprising: a support; a hydrophilic layer; and an ink receiving layer laminated in this order, wherein the ink receiving layer contains one or more compounds selected from the group consisting of organic fluorine compounds having a fluoroalkyl... Agent: Sughrue Mion, PLLC
20070077515 - Reimageable printing member: A reimageable printing member such as for use in flexography, includes a layer having a multiplicity of holes, wherein the holes include therein a dimension change material and a printing material upon the dimension change material. Thus, the holes house vertically expandable units, the top portion of which is capable... Agent: Oliff & Berridge, PLC.
20070077512 - Resist composition for electron beam or euv: A resist composition and a method of forming a resist pattern that enable contamination within the exposure apparatus to be prevented in lithography processes using an electron beam or EUV (extreme ultraviolet light). In this method, an organic solvent containing, as the principal component, one or more compounds selected from... Agent: Knobbe Martens Olson & Bear LLP
20070077516 - Water mark defect prevention for immersion lithography: A photoresist material having a polymer that turns soluble to a base solution in response to reaction with acid. The material includes a photo-acid generator (PAG) that decomposes to form acid in response to radiation energy and a quencher capable of neutralizing acid and having a reduced mobility. The photoresist... Agent: Haynes And Boone, LLP
20070077521 - Optical information recording medium and method for manufacturing the same: An optical information recording medium having a plurality of information layers, with which stable recording and reproduction can be achieved in all information layers, and good recording sensitivity can be maintained in the innermost layer when viewed from the laser incidence side, as well as a method for manufacturing such... Agent: Wenderoth, Lind & Ponack L.L.P.
20070077522 - Optical recording medium, method for reproducing information and optical information reproducing apparatus: An optical recording medium includes a plurality of information layers and an absorption variation layer. Information is recorded in the plurality of information layers. The absorption variation layer is disposed between respective two adjacent information layers. Light transmittance of each absorption variation layer varies in accordance with light applied thereto.... Agent: Nixon & Vanderhye, PC
20070077523 - Method of patterning a positive tone resist layer overlaying a lithographic substrate: A single exposure method and a double exposure method for reducing mask error factor and for enhancing lithographic printing-process resolution is presented. The invention comprises decomposing a desired pattern of dense lines and spaces in two sub patterns of semi dense spaces that are printed in interlaced position with respect... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20070077524 - Method for forming patterns of semiconductor device: Provided is a method for forming patterns of a semiconductor device. According to the method, first mask patterns may be formed on a substrate, and second mask patterns may be formed on sidewalls of each first mask pattern. Third mask patterns may fill spaces formed between adjacent second mask patterns,... Agent: Harness, Dickey & Pierce, P.L.C
20070077526 - Method of patterning a positive tone resist layer overlaying a lithographic substrate: A single exposure method and a double exposure method for reducing mask error factor and for enhancing lithographic printing-process resolution is presented. The invention comprises decomposing a desired pattern of dense lines and spaces in two sub patterns of semi-dense spaces that are printed in interlaced position with respect to... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20070077525 - Multi-level layer: Various methods and apparatus relating to a multi-level layer are disclosed.... Agent: Hewlett Packard Company
20070077527 - Silver halide color photosensitive material: rPrevious industry: Chemistry: electrical current producing apparatus, product, and process
Next industry: Combustion
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