Radiation imagery chemistry: process, composition, or product thereof inventions 03/07

20070072088 - Composition for hologram recording media, hologram recording medium and method for producing the same, hologram recording method and hologram reproducing method: The objects of the present invention are to provide a composition for hologram recording media that can produce high-quality hologram recording media efficiently with less time-consuming and without being affected by moisture, to provide volume-type hologram recording media that are adapted to high-density recording, to provide a method for producing... Agent: Sughrue Mion, PLLC

20070072089 - Holographic recording medium: A holographic recording medium has a recording layer, the recording layer including a matrix material, a polymerizable monomer having at least one ethylenic unsaturated bond, a photo-iniferter, and a photoinitiator.... Agent: Nixon & Vanderhye, PC

20070072095 - Apparatus and method for argon plasma induced ultraviolet light curing step for increasing silicon-containing photoresist selectivity: Provided is a method and apparatus for increasing an etching selectivity of photoresist material. An exemplary method initiates with providing a substrate with a developed photoresist layer. The developed photoresist layer on the substrate includes polymer chains containing silicon. Next, the substrate and developed photoresist layer are exposed to an... Agent: Martine Penilla & Gencarella, LLP

20070072093 - Manufacturing method of pattern formed body, and photomask for vacuum-ultraviolet light: A main object of the present invention is to provide a manufacturing method of a pattern formed body which makes it possible to form property varied patterns having a desired line width, even when plural pattern formed bodies are manufactured. To achieve the object, the invention provides a manufacturing method... Agent: Ladas & Parry LLP

20070072094 - Photomask features with chromeless nonprinting phase shifting window: Aspects of the present invention provide for a novel photomask for patterning features for an integrated circuit, the photomask including a first area transmitting light in a first phase surrounded by second area, the second area transmitting light in a second phase, the second phase opposite the first phase. No... Agent: James A. Scheeer

20070072091 - Reference wafer and process for manufacturing same: An apparatus and method for manufacturing and using a calibrated registration reference wafer in a semiconductor manufacturing facility where an archive media includes etched alignment attributes. Exposing a pattern of complementary alignment attributes onto the archive media such that the pattern of complementary alignment attributes overlay and interlock with the... Agent: Heller Ehrman LLP

20070072090 - Reticle having a protection layer: A reticle includes a reticle body having a first surface, a pattern disposed on the first surface of the reticle body, and at least a protection layer disposed on the first surface of the reticle body. The protection layer is in contact with the first surface of the reticle body.... Agent: North America Intellectual Property Corporation

20070072092 - Rinse treatment method, developing treatment method and developing apparatus: In the present invention, in a rinse treatment method of cleaning a substrate after an exposed pattern thereon has been subjected to developing treatment, the following steps are performed such as supplying pure water onto the substrate to clean the substrate with the pure water; supplying a first rinse solution... Agent: Smith, Gambrell & Russell

20070072096 - Negative curable dye-containing composition, color filter, and method of manufacturing the same: The invention provides a negative curable dye-containing composition including at least one compound selected from amine and pyridine compounds, a phthalocyanine dye soluble in an organic solvent, a photopolymerization initiator, and a radical polymerizable monomer, a color filter formed by using the same, and a manufacturing method of the color... Agent: Sughrue Mion, PLLC

20070072097 - Substrate, method of exposing a substrate, machine readable medium: A multiple exposure method for enhancing the image resolution in a lithographic system is disclosed. The method comprises, for example, decomposing a desired pattern to be printed on the substrate into at least two constituent sub-patterns that are capable of being optically resolved by the lithographic system, coating the substrate... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070072098 - Optical recording medium: Disclosed is an optical recording medium comprising inorganic particles of nanometer size capable to undergo a change in size upon heating at a temperature above room temperature; and comprising a polymer in which the inorganic particles are dispersed to form a composite polymer. According to a preferred embodiment, the change... Agent: Philips Intellectual Property & Standards

20070072099 - Method of aligning a particle-beam-generated pattern to a pattern on a pre-patterned substrate: A significant improvement in the alignment of a particle-beam-generated pattern relative to a pre-existing pattern present on a substrate has been accomplished using optical measurement to register the particle beam to the pre-existing pattern. Use of a position fiducial which can be accurately measured by both an optical microscope and... Agent: Patent Counsel Applied Materials, Inc.

20070072100 - Manufacturing method of color cathode ray tube and exposure device used for the manufacturing method: In a manufacturing method of a color cathode ray tube, as an exposure light source which is used in the exposure for forming a phosphor screen, an ultra-high pressure mercury lamp having an arc length of 35 to 60 mm is used. According to the present invention, it is possible... Agent: Milbank, Tweed, Hadley & Mccloy

20070072101 - Photoreceptor with improved overcoat layer: An electrophotographic imaging member includes a substrate, a charge generating layer, a charge transport layer, and an overcoating layer, the overcoating layer including a cured polyester polyol or cured acrylated polyol film forming resin and a charge transport material.... Agent: Oliff & Berridge, PLC.

20070072102 - Magnetic toner: To provide a magnetic toner which: enables a stable image density to be obtained irrespective of a use environment; and exhibits excellent low-temperature fixability, little image deterioration upon fixation, high coloring power, and a reduced toner consumption. The present invention relates to a magnetic toner containing at least: a binder... Agent: Fitzpatrick Cella Harper & Scinto

20070072103 - Method for producing toner and positively chargeable non-magnetic single component toner: Methods are described for rendering toner particles that are capable of being sufficiently and uniformly charged. The particles may be positively chargeable, non-magnetic, single component toner particles. At least one production method includes emulsifying a charge-controlling agent formed of a synthetic resin in an aqueous medium, the charge-controlling agent having... Agent: Banner & Witcoff, Ltd. Attorneys For Client Nos. 0166889, 006760

20070072104 - Toner and image forming method: When a titanium oxide surface-treated with a titanate-based coupling agent is used as an external additive on the surface of toner particles, titanium oxides are likely to be aggregated with each other and aggregated titanium oxide particles are likely to fall off from the surface of the toner. As a... Agent: Clark & Brody

20070072105 - Toners and processes thereof: Disclosed are toner compositions comprised of a polymer, an optional colorant, and an UV light curable oligomer. Also disclosed are methods for producing a UV curable toner compositions, the toner compositions produced thereby, and methods of utilizing the UV curable toner compositions in various painting applications.... Agent: Fay Sharpe / Xerox - Rochester

20070072106 - Method of preparing toner using reformed plant oil and toner prepared using the method: A method of preparing a toner is provided, including: polymerizing a toner composition including a chemically reformed or modified plant oil or a fatty acid, one or more polymerizable monomers, and a colorant with a free radical initiator; and separating and drying the polymerized toner. Also, provided are a toner... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.

20070072107 - Method of preparing toner and toner prepared using the method: A method of preparing a toner, includes: preparing a core by mixing a polyester resin and a colorant with at least one material selected from the group consisting of a macromonomer having hydrophilic group, hydrophobic group, and at least one reactive functional group and a reactive emulsifying agent. A shell... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.

20070072108 - Synthetic carriers: A carrier includes at least one magnetic material and a conductive material. The conductive material is at least one carbon nanotube. A developer includes a toner and the carrier.... Agent: Oliff & Berridge, PLC.

20070072111 - Antireflective hardmask composition and methods for using same: c

20070072112 - Coating compositions: In one aspect, coating compositions are provided that comprise a component a component that comprises one or more silicon, antimony, aluminum, yttrium, cerium, lanthanum, tin, titanium, zirconium, hafnium, indium or zinc compounds. In another aspect, coating compositions are provided that comprise a plurality of discrete particles. Preferred coating compositions of... Agent: Peter F. Corless Rohm And Haas Electronic Material LLC

20070072114 - Infrared-sensitvive planographic printing plate precursor: According to an aspect of the invention, there is provided an infrared-sensitive planographic printing plate precursor including: a support; a recording layer on one surface of the support, which recording layer contains a water-insoluble and alkali-soluble resin and an infrared absorber, and is capable of forming an image by infrared... Agent: Sughrue Mion, PLLC

20070072116 - Lithographic printing plate precursor and lithographic printing method: A lithographic printing plate precursor comprising a hydrophilic support, an undercoat layer and a laser-sensitive photopolymerizable layer, wherein the undercoat layer contains a copolymer containing (a1) a repeating unit having at least one ethylenically unsaturated bond and (a2) a repeating unit having at least one functional group capable of interacting... Agent: Birch Stewart Kolasch & Birch

20070072119 - Lithographic printing plate precursor and lithographic printing method: A lithographic printing plate precursor comprising a support and an image-recording layer containing at least one infrared absorbing agent of a cyanine dye in which a HOMO energy level of each of substituents present on both terminal nitrogen atoms is −10.0 eV or higher.... Agent: Birch Stewart Kolasch & Birch

20070072120 - Method for producing resin for chemically amplified positive resist: A method for producing a resin for a chemically amplified positive resist by polymerizing at least one monomer and/or at least one oligomer which is polymerized to provide a resin for a chemically amplified positive resist, in which two or more polymerization initiators are used to initiate the polymerization, thereby... Agent: Birch Stewart Kolasch & Birch

20070072113 - Photosensitive composition, and lithographic printing plate precursor and image-recording method using the same: A photosensitive composition comprising: a compound having two or more mercapto groups directly connected to a hetero ring; a hexaarylbiimidazole compound; a sensitizing dye; and a polymerizable compound having an ethylenically unsaturated double bond.... Agent: Sughrue-265550

20070072122 - Photosensitive polymer composition, method of forming relief patterns, and electronic equipment: A photosensitive polymer composition, having (a) a polymer selected from polyimide precursors and polyimides having an acid group protected by a protecting group and having no amino group (—NH2) at the end; and (b) a compound that generates an acid when exposed to light and capable of deprotecting the protecting... Agent: Antonelli, Terry, Stout & Kraus, LLP

20070072118 - Positive photosensitive composition and pattern forming method using the same: p

20070072117 - Positive resist composition and pattern forming method using the same: A positive resist composition comprising: a compound having at least two acid-decomposable groups, an aromatic ring and an alkylene or cycloalkylene chain and having a molecular weight of 2,000 or less, of which solubility in an alkali developer increases under an action of an acid; and a compound represented by... Agent: Sughrue-265550

20070072121 - Positive resist composition and pattern forming method using the same: p

20070072115 - Positive resist compositions and patterning process: A polymer is obtained from (meth)acrylate having a bridged ring lactone group, (meth)acrylate having an acid-labile leaving group, and (meth)acrylate having a hydroxynaphthyl pendant. A positive resist composition comprising the polymer as a base resin, when exposed to high-energy radiation and developed, exhibits a high sensitivity, a high resolution, and... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070072110 - Reimageable paper: An image forming medium includes a substrate and a mixture including a photochromic material and a solvent wherein the mixture is coated on the substrate, such that the photochromic material exhibits a reversible homogeneous-heterogeneous transition between a colorless state and a colored state in the solvent.... Agent: Oliff & Berridge, PLC.

20070072109 - Thick film or ultrathick film responsive chemical amplification type photosensitive resin composition: [Solving means] A chemically amplified photosensitive resin composition including an alkali soluble novolak resin (A), a resin or compound (B) which in itself is insoluble or slightly soluble in alkali, but becomes soluble in alkali by the action of an acid, that is acid generating agent (C), and a photosensitizing... Agent: Az Electronic Materials Usa Corp. Attention: Industrial Property Dept.

20070072123 - Optical record carrier recording method, optical record carrier and apparatus for writing information: Described is an optical record carrier recording method, optical record carrier (11) and an apparatus for writing information to an optical record carrier (11). The optical record carrier recording method forms pits and lands by controlling a radiation source to direct a radiation beam onto a recording surface of an... Agent: Philips Intellectual Property & Standards

20070072124 - Optical recording composition, production method thereof and optical recording medium: A optical recording composition is provided that comprises a matrix and a monomer, wherein the matrix comprises a polyfunctional isocyanate, a radical-polymerizable compound and a polyfunctional alcohol, and the radical-polymerizable compound contains at least one of an amino group, a carboxyl group, an acid anhydride and an isocyanate group; and... Agent: Sughrue Mion, PLLC

20070072125 - Phase change memory element with improved cyclability: A phase-change memory cell including, between two electrical contacts, a portion in a memory material with amorphous-crystalline phase-change and vice versa, as a stack with a central area located between two outmost areas. An interface, inert or quasi-inert from a physico-chemical point of view, is present between the active central... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070072126 - Method of producing photosensitive planographic printing plate precursor: The invention provides a method of producing a photosensitive planographic printing plate precursor including preparing a coating liquid by dissolving at least a compound having an addition polymerizable ethylenic double bond and a polymerization initiator in an organic solvent, and applying the coating liquid to a support, wherein the dissolved... Agent: Sughrue Mion, PLLC

20070072127 - On-press developable lithographic printing plate having darker aluminum substrate: An on-press ink and/or fountain solution developable lithographic printing plate comprising a photosensitive layer over an electrochemically grained, anodized, hydrophilically treated aluminum substrate with a reflection optical density of at least 0.30 is disclosed. The photosensitive layer is soluble or dispersible in ink and/or fountain solution and capable of hardening... Agent: Gary Ganghui Teng

20070072129 - Method for forming flexible printed circuit boards: The present invention provides a method for forming flexible printed circuit boards. The method includes the following steps: providing a substrate with a copper film formed on at least one surface of the substrate; and forming a number of copper holes in the copper film through a photolithography process. The... Agent: PCe Industry, Inc. Att. Cheng-ju Chiang Jeffrey T. Knapp

20070072128 - Method of manufacturing an integrated circuit to obtain uniform exposure in a photolithographic process: A method of manufacturing an integrated circuit in which the method comprises exposing a wafer to an energy source defining a focal plane with which a depth of focus is associated and conforming the wafer to substantially correspond with the focal plane.... Agent: Hitt Gaines, PC Agere Systems Inc.

20070072131 - Method of manufacturing semiconductor device: There are provided a semiconductor device manufacturing method including: forming a film to be processed above a substrate; forming a resist layer above the film to be processed; transferring a transfer pattern to the resist layer using a reticle including the transfer pattern having a space having a width that... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070072130 - Process for fabricating micro-display: A process for fabricating a micro-display is provided. First, a wafer having a driving circuit thereon is provided. Then, a metallic reflective layer is formed on the wafer. Thereafter, an anti-reflection layer and a patterned photoresist layer are sequentially formed on the metallic reflective layer. Using the patterned photoresist layer... Agent: Jianq Chyun Intellectual Property Office

20070072132 - Method of forming device structure, method of manufacturing magnetoresistive element, and method of manufacturing thin film magnetic head: The present invention provides a method of forming a device structure realizing a narrowed pattern width without using a lift off method. A first device layer is selectively etched through using a photoresist pattern, thereby forming a first device layer pattern. After that, a second device layer is formed so... Agent: Oliff & Berridge, PLC

20070072133 - Substrate, method of exposing a substrate, machine readable medium: A double exposure method for enhancing the image resolution in a lithographic system, is presented herein. The invention comprises decomposing a desired pattern to be printed on the substrate into at least two constituent sub-patterns that are capable of being optically resolved by the lithographic system, coating the substrate with... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070072134 - Semiconductor device fabrication method: Circuit elements, such as aluminum interconnects, and a protective film for protecting these circuit elements are formed on a surface of a semiconductor substrate. Resist is formed covering the protective film. The semiconductor substrate on which the resist covering the protective film is formed is dipped into pure water so... Agent: Rabin & Berdo, PC

20070072135 - Photothermographic material: The present invention provides a photothermographic material having, on at least one side of a support, an image forming layer including at least a photosensitive silver halide, a first non-photosensitive organic silver salt, a reducing agent, and a binder, and a non-photosensitive layer including a second non-photosensitive organic silver salt... Agent: Taiyo Corporation

20070072136 - Photothermographic material: A photothermographic material containing, on a support, an image forming layer having at least a photosensitive silver halide, a non-photosensitive organic silver salt, and a reducing agent for silver ions, and a non-photosensitive layer, wherein the non-photosensitive layers contains at least an anionic water-soluble dye, a fixing agent for the... Agent: Taiyo Corporation

20070065733 - Cpl mask and a method and program product for generating the same: A method of generating a mask for printing a pattern including a plurality of features. The method includes the steps of obtaining data representing the plurality of features; and forming at least one of the plurality of features by etching a substrate to form a mesa and depositing a chrome... Agent: Mcdermott Will & Emery LLP

20070065734 - Exposure method, exposure mask, and exposure apparatus: An exposure method for exposing a workpiece on the basis of near-field light escaping from an opening of a mask. The method includes projecting non-polarized exposure light having a predetermined wavelength, emitted from a laser light source and passed through a depolarization device and a diffusion device, onto an exposure... Agent: Fitzpatrick Cella Harper & Scinto

20070065729 - Method for correcting critical dimension variations in photomasks: A method for compensating for critical dimension (CD) variations of pattern lines of a wafer, by the correcting the CD of the corresponding photomask. The photomask comprises a transparent substrate having two substantially opposite surfaces, a first back surface and a second front surface on which front surface an absorbing... Agent: Pearl Cohen Zedek, LLP Pearl Cohen Zedek Latzer, LLP

20070065730 - Photomask and pattern formation method and mask data generation method using the same: A pattern 121 provided on a transparent substrate 100 as a mask pattern includes partial patterns 121A and 121B. Each of the partial patterns 121A and 121B has a mask enhancer structure including a phase shifter 102 for transmitting exposing light in an opposite phase with respect to a transparent... Agent: Mcdermott Will & Emery LLP

20070065732 - Photomask providing uniform critical dimension on semiconductor device and method of manufacturing the same: An approach to correcting non-uniformity of critical dimension (CD) in a semiconductor wafer includes measuring 0th-order light transmitted through or reflected from a photomask in a plurality of regions of the photomask. The photomask is altered to equalize the 0th-order light from the photomask such that the wafer CD is... Agent: Mills & Onello LLP

20070065731 - Photomask, method for fabricating photomask, and method for fabricating semiconductor device: A method for fabricating a photomask includes the steps of forming a phase shift layer, a light-shielding layer, and a negative resist layer in that order on a transparent substrate, forming a first resist pattern including a pattern corresponding to a transfer pattern by performing first exposure and development on... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070065735 - Apparatus and method for manufacturing color filter adsorbing toner nano particles by using electrostatic force: Provided is an apparatus and method of manufacturing a color filter adsorbing toner nano-particles by using electrostatic force. In the apparatus for manufacturing the color filter, a laser driver generates at least one laser control signal according to electrification data, at least one laser device forming a laser irradiation unit... Agent: Staas & Halsey LLP

20070065736 - Pigment dispersion composition for color filter, production method thereof, and color filter for display: The present invention is to provide a pigment dispersion composition for a color filter having the excellent pigment dispersing property and dispersion stability, good developing property and reactivity, and an extremely small residue generation amount after development, a production method capable of stably producing such a pigment dispersion composition, and... Agent: Ladas & Parry LLP

20070065737 - Multilayer imageable elements having good solvent resistance: Multilayer thermally imageable elements useful as lithographic printing plate precursors are disclosed. The imageable elements comprise a substrate, an underlayer over the substrate, and a top layer over the underlayer. The top layer contains a polymer containing anhydride groups. This polymer is present in the top layer in an amount... Agent: Andrew J. Anderson Patent Legal Staff

20070065738 - Photosensitive body, developing unit, and image forming apparatus: A photosensitive body according to this invention includes a photosensitive layer formed on a surface thereof for being electrically charged and having an electrostatic latent image formed thereon by being exposed to light irradiation, and wherein the photosensitive layer has an initial dynamic friction coefficient μk0 of 0.6 or less... Agent: Akin Gump Strauss Hauer & Feld L.L.P.

20070065739 - Electrophotographic photoreceptor, and image forming apparatus and process cartridge therefor using the electrophotographic photoreceptor: p

20070065740 - Electrophotographic photoreceptor containing naphthalenetetracarboxylic acid diimide derivative as electron transporting material in a charge generating layer and electrophotographic image forming apparatus employing the photoreceptor: An electrophotographic photoreceptor including: an electrically conductive substrate; a charge generating layer disposed on the electrically conductive substrate and includes a charge generating material dispersed or dissolved in a binder resin and an asymmetric naphthalenetetracarboxylic acid diimide derivative having a nitro group dispersed or dissolved in the binder resin. The... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.

20070065741 - Electrophotographic photoreceptor, process cartridge, and image forming apparatus: An electrophotographic photoreceptor comprises: an electroconductive support; and a photosensitive layer on the electroconductive support, wherein the photosensitive layer having a dynamic hardness of from 20×109 to 150×109 N/m2 and an elastic deformation ratio of from 15 to 80%.... Agent: Oliff & Berridge, PLC

20070065742 - Single-component magnetic developer, developing method and image-forming method: The present invention discloses a single-component magnetic developer having a total energy amount, measured with a powder rheometer at a rotor tip end speed of 100 mm/sec at a rotor helix angle of −5° at a ventilation rate of 20 ml/min, of 10 to 100 mJ; and a developing method,... Agent: Oliff & Berridge, PLC

20070065743 - Photo-stable and surface-functionalizable colorant particles: A composition and method for encapsulating colorant molecules in polymeric particles are described. Colorant molecules, such as dye, are doped or embedded in a particle, at least in part, composed of a halogen-containing polymeric matrix that can effectively isolate the dye molecules from reaction with photo-oxidizing or reducing agents. The... Agent: Kimberly-clark Worldwide, Inc.

20070065744 - Toner for the development of electrostatic image and the production process thereof: A toner for the development of an electrostatic image is provided wherein at least one layer of a particulate resin is coated onto a substantial portion of the surface of an agglomerate of particles made from at least primary polymer particles and primary colorant particles, wherein at least one of... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070065745 - Toner having bumpy surface morphology: The toner described herein contains toner particles containing polymer, colorant and cross-linked polymer. The cross-linked polymer is incorporated at least in the shell of the toner particles. Incorporating cross-linked polymer in the shell of the toner particles provide bumps in the surface of the toner particles. These bumps can behave... Agent: Oliff & Berridge, PLC.

20070065746 - Toner and manufacturing method thereof: A toner of excellent anti-hot offsetting property, with no variety of the charging performance and suitable as a toner for the development of electrostatic images, and a manufacturing method thereof are provided. At first, a crosslinked resin at least containing a tetrahydrofuran insoluble component and a colorant are dry-kneaded. Next,... Agent: Nixon & Vanderhye, PC

20070065747 - Norbornene derivative, norbornene polymer produced by ring-opening (co)polymerization, and process for producing the polymer by ring-opening (co)polymerization: According to the present invention, a novel norbornene derivative that is useful as a precursor monomer for preparing a cycloolefin polymer exhibiting excellent transparency, heat resistance and low-water absorption properties and having been freely controlled in the birefringence properties and the wavelength dispersion properties can be provided. According to the... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070065754 - Planographic printing plate material: The planographic printing plate material has a support and provided thereon, a photopolymerizable light sensitive layer and a protective layer in that order. The protective layer contains a polyvinyl alcohol derivative A having a saponification degree of 90 to 100 mol % and a solubility of 20 to 200 g... Agent: Lucas & Mercanti, LLP

20070065752 - Positive resist composition and pattern forming method using the same: A positive resist composition comprising: at least one compound selected from a compound capable of generating an acid represented by the formula (I) as defined herein upon irradiation with actinic rays or radiation and a compound capable of generating an acid represented by the following formula (II) upon irradiation with... Agent: Sughrue-265550

20070065753 - Positive resist composition for immersion exposure and pattern forming method using the same: A positive resist composition, comprising: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin having a repeating unit containing at least one alicyclic structure, of which solubility in an alkali developer increases under an action of an acid; and (C) an... Agent: Sughrue-265550

20070065750 - Process for highly purified polyhedral oligomeric silsesquioxane monomers: A synthesis process for polyhedral oligomeric silsesquioxanes that produces in high yield a low resin content, solvent free, and trace metal free monomer suitable for use in microelectronic applications. POSS silanols are reacted with a silane coupling agent in the presence of a solvent and a superbase.... Agent: Pillsbury Winthrop Shaw Pittman LLP

20070065749 - Radiation-markable coatings for printing and imaging: An light activated image recording medium, comprises a substrate, optionally, a color layer; and a layer of light-scattering pigment that becomes at least translucent when heated to a predetermined temperature.... Agent: Hewlett Packard Company

20070065748 - Resin for photoresist composition, photoresist composition and method for forming resist pattern: A resin for photoresist compositions is disclosed with excellent resolution and line edge roughness characteristics. A photoresist composition and a method for forming a resist pattern using such a resin are also disclosed. The resin has a hydroxyl group bonded to a carbon atom at a polymer terminal, and the... Agent: Knobbe Martens Olson & Bear LLP

20070065751 - Water-soluble photopolymer composition for flexographic printing and water-soluble photosensitive original printing plate for flexographic printing: A water-soluble photopolymer composition for flexographic printing is provided which can be water developed and can form a photosensitive original printing plate for flexographic printing having a good flexibility and impact resilience as well as an adequate Shore hardness value. The water-soluble photopolymer composition for flexographic printing contains a water-soluble... Agent: Harness, Dickey & Pierce, P.L.C

20070065755 - Method for controlling a multi-pulse record waveform at high velocity in a phase change optical medium: In an optical recording method and apparatus of the present invention, a driving power is applied to a light source to control emission of a light beam to a recording layer of an optical storage medium, the driving power including a sequence of mark and space portions, each mark portion... Agent: Dickstein Shapiro LLP

20070065756 - High sensitivity electron beam resist processing: A process for producing a pattern in a radiation sensitive fluoropolymer resist, comprises depositing a layer of the radiation sensitive fluoropolymer resist on a face of a substrate. The radiation sensitive fluoropolymer resist is exposed to an electron beam to define the pattern, the resist then having an exposed fluoropolymer... Agent: Fulbright & Jaworski L.L.P.

20070065757 - Photo-curable resin composition and a method for forming a pattern using the same: Provided is a new photo-curable resin composition which can be used in a photo nanoimprinting technology available for a photo nanoimprinting technology by which a substrate is processed with high accuracy. The photo-curable resin composition contains a photo-curable resin material essentially containing a (meth)acrylate, a reactive diluent, and a photo... Agent: Antonelli, Terry, Stout & Kraus, LLP

20070065758 - Multi-stack optical storage medium: The invention relates to an optical storage medium comprising below an entrance face (EF) a higher recording stack (ST0) comprising a higher recording layer (L0) and at least a lower recording stack (ST1), said lower recording stack (ST1) being recorded or read back by a radiation beam (4) entering into... Agent: Philips Intellectual Property & Standards

20070065759 - Optical information recording medium and method for manufacturing the same: The present invention provides a recording medium that has high reliability and affords good recording and reproduction characteristics over a wide linear velocity range and high density, as well as a method for manufacturing the recording medium. To this end, an optical information recording medium comprises at least a recording... Agent: Wenderoth, Lind & Ponack L.L.P.

20070065760 - Substrate processing apparatus and substrate processing method: A substrate processing apparatus has at least one of a developing processing apparatus that supplies a developing solution as a processing solution to a non-processed substrate to process and a resist coating processing apparatus that supplies a resist solution as a processing solution to the non-processed substrate. A transfer mechanism... Agent: Kanesaka Berner & Partners Patent Agents, LLP

20070065761 - Photographic element: The invention provides a photographic element, comprising a support, a photographic emulsion layer and, an anti-halation underlayer and/or a pelloid layer, the antihalation underlayer and/or pelloid layer being present in an amount of 1 g/m2 or less and comprises a vehicle and a solid particle dye.... Agent: Patent Legal Staff

20070065762 - Black and white photothermographic material and image forming method: e

20070065764 - Black and white photothermographic material and image forming method: wherein R101, R102, R104, and R105 each independently represent a hydrogen atom or a substituent; R103 represents a halogen atom, an alkyl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group, an acylamino group, or a sulfonylamino group; and P represents a group forming a phenol... Agent: Taiyo Corporation

20070065763 - Photothermographic material: The present invention provides a photothermographic material having, on at least one side of a support, an image forming layer including at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, wherein the photothermographic material includes a cyan color-forming compound, a maximum density... Agent: Taiyo Corporation

20070059611 - Mask and manufacturing method thereof: A mask and a manufacturing method thereof are provided. A transparent substrate having three regions is provided first. A non-transmitting layer is formed in a first region of the transparent substrate. Then, a first photoresist layer is formed on the transparent substrate, and the first photoresist layer exposes a second... Agent: J.c. Patents, Inc. Suite 250

20070059610 - Method of making and designing dummy patterns for semiconductor devices and semiconductor devices having dummy patterns: A semiconductor device with dummy patterns and methods of designing and making dummy patterns of a semiconductor device are provided. The method includes forming a first layout having main patterns, adding dot dummy patterns to the first layout to generate a second layout, and adding linked line/space dummy patterns to... Agent: Mills & Onello LLP

20070059609 - Optical proximity correction mask and method of fabricating color filter: An optical proximity correction mask used for fabricating a color filter includes a substrate, a mask pattern and a mending pattern. Wherein, the mask pattern is disposed on the substrate. The mask pattern and the transferred pattern, being transferred to the color filter, are not matched and cause occurrence of... Agent: J C Patents, Inc.

20070059608 - Photomask, photomask manufacturing method, and photomask processing device: A photomask is manufactured by a method including providing a substrate having a surface on which a predetermined pattern is to be formed, positioning the substrate in an exposure tool so as to obtain an amount of deformation of the surface due to an external force imposed on the substrate,... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070059612 - Black composition, black coating composition, resin black matrix, color filter for liquid crystal display and liquid crystal display: wherein I1 represents the maximum diffraction intensity of the titanium nitride oxide when the angle of diffraction 2θ, determined by using CuKα line as the X-ray source, is 25° to 26°, I2 represents the maximum diffraction intensity of the titanium nitride oxide when the angle of diffraction 2θ is 27°... Agent: Birch Stewart Kolasch & Birch

20070059613 - Repositionable photo card: The invention provides a repositionable photo card having a substrate comprising a base sheet having opposing first and second surfaces and an image receptive coating disposed on the first surface of the base sheet; and a repositionable adhesive disposed on the second surface of the base sheet. The substrate has... Agent: 3m Innovative Properties Company

20070059615 - Method and system for improved lithographic processing: A method is described for setting up the lithographic processing of a substrate. The lithographic processing typically is characterized by a set of selectable process parameters, such as the thickness, real refractive index, and absorption coefficient of a bottom anti-reflective layer. The method includes selecting a set of values for... Agent: Mcdonnell Boehnen Hulbert & Berghoff LLP

20070059614 - Method of determining an illumination profile and device manufacturing method: An illumination profile useable in a lithographic apparatus to match the output of a target lithographic apparatus is obtained by obtaining a reference CD vs. pitch function for the lithographic projection apparatus at at least a plurality of pitch values using a reference illumination profile; obtaining a target CD vs.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070059616 - Coated substrate for photoreceptor: An imaging member includes a conductive substrate, a SiOx layer coated over the conductive substrate, a charge generating layer coated over the SiOx layer, and a charge transport layer... Agent: Oliff & Berridge, PLC.

20070059617 - Latent electrostatic image bearing member, and the method for producing the same, image forming method, image forming apparatus, and process cartridge: The present invention provides a latent electrostatic image bearing member which includes a support, a charge generating layer, and a charge transporting layer, the charge generating layer and the charge transporting layer being arranged in this order on or above the support, wherein the charge transporting layer comprises at least... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070059618 - Electrophotographic photoconductor, and image forming apparatus, process cartridge and image forming method using the same: wherein, in the Structural Formula (1), “R1” and “R2” may be identical to each other or different, and represent any one of hydrogen atom, alkyl group which may be substituted, cycloalkyl group which may be substituted and aralkyl group which may be substituted. “R3”, “R4”, “R5”, “R6”, “R7”, “R8”, “R9”,... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070059619 - Electrophotographic photoconductor, image forming apparatus, image forming method, and process cartridge: where R1 and R2 independently represent any one of a hydrogen atom, substituted or unsubstituted alkyl group, substituted or unsubstituted cycloalkyl group and substituted or unsubstituted aralkyl group, and R3, R4, R5, R6, R7, R8, R9 and R10 independently represent any one of a hydrogen atom, halogen atom, cyano group,... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070059620 - High sensitive imaging member with intermediate and/or undercoat layer: An electrophotographic imaging member includes a substrate, an intermediate layer, and a photoconductor layer, where the intermediate layer includes surface treated oxide particles.... Agent: Oliff & Berridge, PLC.

20070059621 - Photoreceptor layer having vinylidene fluoride: The presently disclosed embodiments relate in general to electrophotographic imaging members, such as layered photoreceptor structures, and processes for making and using the same. More particularly, the embodiments pertain to a photoreceptor that incorporates a material with a high dielectric constant that improves background and print image quality.... Agent: Pillsbury Winthrop Shaw Pittman LLP

20070059622 - Mechanically robust imaging member overcoat: The presently disclosed embodiments relate in general to electrophotographic imaging members, such as layered photoreceptor structures, and processes for making and using the same. More particularly, the embodiments pertain to an improved electrophotographic imaging member having a protective overcoat layer comprising a low surface energy polymeric material to enhance the... Agent: Pillsbury Winthrop Shaw Pittman LLP

20070059623 - Anticurl back coating layer for electrophotographic imaging members: The presently disclosed embodiments are directed to anticurl back coatings useful in electrophotography. More particularly, the embodiments pertain to an electrophotographic imaging member with an improved anticurl back coating including a low surface energy polymeric material to prevent curling, render surface lubricity, eliminate electrostatic charge built-up, and reduce friction, and... Agent: Pillsbury Winthrop Shaw Pittman LLP

20070059624 - Method of preparing toner and toner prepared using the method: A method of preparing a toner is provided, including: preparing a colorant dispersion by mixing a reactive emulsifying agent and a colorant; preparing a toner composition by mixing a macromonomer having hydrophilic group, hydrophobic group and at least one reactive functional group, at least one polymerizable monomer, a multifunctional polyester,... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.

20070059625 - Toner for developing a latent electrostatic image, image-forming method, image-forming apparatus and process cartridge using the same: where “M1” represents a metal element selected from Sr, Mg, Zn, Co, Mn and Ce, “a” and “b” each represents an integer of 1 to 9 and “c” represents an integer of 3 to 9, wherein an average primary particle diameter of the compound oxide is 0.02 μm to 1.5... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070059626 - Toner, developer, image forming method, image forming apparatus, process cartridge, and toner container: A toner is provided including a binder resin and a wax having primarily C—H and C—C bonds, and having a melting point of 50 to 90° C., wherein the wax is present in a surface portion of the toner in an amount of from 0.1 to 4.0% by weight, wherein... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070059627 - Polymer having a sulfonic group or a sulfonate group and an amide group and method of producing same: A polymer is provided in which a sulfonic group or a derivative thereof is introduced. The polymer includes a unit represented by the following chemical formula (1): wherein R represents -A1-SO2R1; A1 is selected from an alkylene group, a heterocyclic ring, an aromatic ring; and —SO2R1 is a sulfonic group... Agent: Fitzpatrick Cella Harper & Scinto

20070059628 - Toner, method for producing the same, and image-forming method using the same: To provide a method for producing a toner in which at least monomers are polymerized in at least one of a supercritical fluid and a subcritical fluid to thereby produce toner particles, wherein at least one of the supercritical fluid and the subcritical fluid contains a fluorine-containing surfactant, and a... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070059629 - Carrier and developing agent for electrophotography: A two-component developing agent containing a carrier which can maintain a charge-imparting property to a toner at a high level for a long period of time, does not generate flying of the carrier and can correspond to an image forming apparatus of present day having a long operation life and... Agent: Nixon & Vanderhye, PC

20070059630 - Emulsion polymerization process: An emulsion polymerization process comprising polymerizing monomer in an emulsion in a reaction vessel at a first temperature to form a resin; cooling the reaction vessel to a second temperature that is above the softening point of the resin yet below the temperature required for significant depolymerization reaction to occur;... Agent: Marylou J. Lavoie, Esq. LLC

20070059631 - Repositionable glossy photo media: The present invention provides a photo media has an imageable substrate having opposing first and second surfaces. An image receptive coating is disposed on the first surface of the inkjet printable sheet. A repositionable adhesive is disposed on the second surface of the substrate, but the adhesive does not cover... Agent: 3m Innovative Properties Company

20070059635 - Antireflective hardmask composition and methods for using same: e

20070059636 - Light sensitive planographic printing plate material: Disclosed is a light sensitive planographic printing plate material comprising a support and provided thereon, a light sensitive layer, wherein the light sensitive layer contains a polymerizable ethylenically unsaturated compound, a photopolymerization initiator, a polymeric binder, a sensitizing dye, and a copolymer having a first unit represented by formula (1),... Agent: Frishauf, Holtz, Goodman & Chick, PC

20070059632 - Method of manufacturing a semiconductor device: s

20070059634 - Non-outgassing low activation energy resist: Numerous embodiments of a method to prevent outgassing from a low activation energy photoresist are described. In one embodiment of the present invention, a photoresist material is dispensed over a substrate to form a photoresist layer. The photoresist layer includes branched polymers coupled with acetal or ketal linkages. An exposed... Agent: Michael A. Bernadicou Blakely, Sokoloff, Taylor & Zafman LLP

20070059633 - Photoacid generator: m

20070059637 - Photosensitive resin composition: The present invention provides a photosensitive resin composition which can provide a printing plate material having superior image remaining property and printing durability, which can be subjected to alkaline development. The present invention relates to a photosensitive resin composition comprising an ethylenically unsaturated compound, an alkali-soluble resin, a near-infrared-absorbing dye,... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070059638 - Photosensitive resin composition: The present invention provides a photosensitive resin composition having improved stability in a bright room, which can provide a printing plate material having superior image remaining property and printing durability, which can be subjected to alkaline development. Accordingly, the present invention relates to a photosensitive resin composition comprising an ethylenically... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070059639 - Positive resist composition and pattern-forming method using the same: A positive resist composition comprises: (A) a resin capable of increasing its solubility in an alkali developer by action of an acid and not containing a silicon atom; (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, (C) a silicon atom-containing resin having at... Agent: Sughrue-265550

20070059640 - Processing method of substrate and processing apparatus of substrate: A processing method of a substrate is capable of improving wettability on a surface of a resist film with respect to a developer without adverse effect on processing size of resist pattern, or without damage on the resist film. In the processing method it is also unnecessary to make separate... Agent: Ostrolenk Faber Gerb & Soffen

20070059641 - Optical recording medium and polymethine complex for use in the recording layer of the optical recording medium: The present invention relates to a polymethine complex and an optical recording medium using said polymethine complex. Through using the polymethine complex formed by combining a polymethine cation with a heat-inhibiting anion as the optical recording material in the optical recording medium, not only the heat inference caused by thermal... Agent: Birch Stewart Kolasch & Birch

20070059642 - Method for thermal development of a photosensitive element using a development medium having a support: This invention relates to a method for thermally developing a photosensitive element to form a relief pattern. The method includes heating a composition layer of the element to cause a portion of the layer to liquefy and providing a development medium under tension to the element to absorb the liquefied... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20070059643 - Method of producing photosensitive planographic printing plate: A photosensitive planographic printing plate superior in sensitivity, developing efficiency, and printing durability is provided by a method of producing a photosensitive planographic printing plate, which comprises forming a photosensitive layer by applying a coating a solution containing a compound having an addition-polymerizable ethylenic double bond, a polymerization initiator, and... Agent: Sughrue Mion, PLLC

20070059647 - Capacitor for a semiconductor device: In a method for forming a photoresist pattern, a method for forming a capacitor, and a capacitor manufactured using the same, a light is selectively irradiated onto a selected portion of a photoresist film formed on a substrate. An interfered light generated from the irradiated light is transmitted through other... Agent: Lee & Morse, P.C.

20070059648 - Method for forming a capacitor: In a method for forming a photoresist pattern, a method for forming a capacitor, and a capacitor manufactured using the same, a light is selectively irradiated onto a selected portion of a photoresist film formed on a substrate. An interfered light generated from the irradiated light is transmitted through other... Agent: Lee & Morse, P.C.

20070059646 - Method of forming conductive tracks: A patterned electrical conductor having improved conductivity and controllably high resolution track and gap widths is obtained by exposing, to a desired conductive pattern, a pressure-sensitive or photosensitive element comprising a support and a pressure-sensitive or photosensitive material coated thereon being sensitive to the exposure (e.g. the wavelength of exposing... Agent: Andrew J. Anderson Patent Legal Staff

20070059645 - Methods for fabricating nanoscale electrodes and uses thereof: The present invention relates to methods for fabricating nanoscale electrodes separated by a nanogap, wherein the gap size may be controlled with high precision using a self-aligning aluminum oxide mask, such that the gap width depends upon the thickness of the aluminum oxide mask. The invention also provides methods for... Agent: Wilmerhale/columbia University

20070059644 - Micropattern formation material and method of micropattern formation: The present invention provides a method of forming a fine pattern, comprising the steps of forming a resist pattern 3 made of a chemically amplified photoresist on a substrate 1 with a diameter of 6 inches or more, applying a fine pattern forming material containing a water-soluble resin, a water-soluble... Agent: Az Electronic Materials Usa Corp. Attention: Industrial Property Dept.

20070059649 - Method for manufacturing semiconductor device: A method for manufacturing a semiconductor device effectively removes a solvent of a bottom antireflective coating film is using a porous material so as to prevent acid in a photoresist film from reacting with the solvent during a post exposure baking (PEB) process. The method includes forming a pattern formation... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070059650 - Method for manufacturing semiconductor device: There are provided a developing solution, which can develop a photosensitive composition in a simple manner while maintaining satisfactory sensitivity and resolution, and a method for pattern formation using said developing solution. This developing solution comprises a compound containing a hydrophilic group(s) selected from the group consisting of an amine-N-oxide... Agent: Az Electronic Materials Usa Corp. Attention: Industrial Property Dept.

20070059651 - Yield and line width performance for liquid polymers and other materials: Systems and methods are described for improved yield and line width performance for liquid polymers and other materials. A method for minimizing precipitation of developing reactant by lowering a sudden change in pH includes: developing at least a portion of a polymer layer on a substrate with an initial charge... Agent: Blakely Sokoloff Taylor & Zafman

20070059652 - Repositionable glossy photo media: The present invention provides a photo media has an imageable substrate having opposing first and second surfaces. An image receptive coating is disposed on the first surface of the inkjet printable sheet. A repositionable adhesive is disposed on the second surface of the substrate, but the adhesive does not cover... Agent: 3m Innovative Properties Company

20070054195 - Optical recording medium, method of producing the same, and, optical recording method and optical reproducing method: The present invention is intended to provide optical recording media of hologram type capable of high-density recording and capable of preventing noise even when the informing light and the reference light leak from filter layers formed of wavelength-selective reflection films. Accordingly, the present invention relates to optical recording media has... Agent: Sughrue Mion, Pllc

20070054200 - Binary photomask having a compensation layer and method of manufacturing the same: A binary photomask with an improved resolution and a method of manufacturing the same are provided. The binary photomask may include a substrate, a transmission-prevention pattern formed on the substrate to define a circuit pattern, and a compensation layer configured to change light transmitted through the binary photomask based on... Agent: Harness, Dickey & Pierce, P.L.C

20070054196 - Fabrication method of extreme ultraviolet radiation mask mirror using atomic force microscope lithography: The present invention relates to a method for manufacturing a reflective multi-layered thin film mirror for an extreme ultraviolet radiation (EUV) exposure process that is one of the next generation exposure process masks using an atomic force microscope (AFM). This reflective multi-layered thin film mirror for extreme ultraviolet radiation (EUV)... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070054197 - Mask and pattern forming method by using the same: The present invention provides a mask comprising a substrate, a plurality of strip patterns and at least an assist pattern. The strip patterns are disposed on the substrate and arranged in parallel to one another. The assist pattern is in a strip shape and disposed on the substrate. The assist... Agent: J C Patents, Inc.

20070054202 - Mask, method of producing mask, and method of producing semiconductor device: To provide a mask able to prevent a drop in pattern position accuracy due to the influence of internal stress of a membrane and able to align patterns including complementary divided patterns precisely, a method of producing the same, and a method of producing a semiconductor device. A stencil mask... Agent: Rader Fishman & Grauer Pllc

20070054203 - Mask, method of producing mask, and method of producing semiconductor device: To provide a mask able to prevent a drop in pattern position accuracy due to the influence of internal stress of a membrane and able to align patterns including complementary divided patterns precisely, a method of producing the same, and a method of producing a semiconductor device. A stencil mask... Agent: Rader Fishman & Grauer Pllc

20070054201 - Phase shifting mask for equal line/space dense line patterns: A phase shifting mask suited for equal line/space, small pitched, dense line pattern is disclosed. The phase shifting mask includes a transparent substrate, a partially shielded mesa line pattern of first phase formed on the substrate, and a transparent recessed line pattern of second phase etched into the substrate and... Agent: North America Intellectual Property Corporation

20070054198 - Photomask for double exposure and double exposure method using the same: A photomask for double exposure, and a double exposure method using the same are disclosed. The photomask for double exposure comprises a mask substrate divided into first and second regions equally arranged to upper and lower sideson different sides, respectively, a first mask pattern formed on the first region of... Agent: Townsend And Townsend And Crew, LLP

20070054204 - Photomask, method for producing the same, and method for forming pattern using the photomask: A photomask includes a semi-light-shielding portion having a light-shielding property, a light-transmitting portion surrounded by the semi-light-shielding portion and a peripheral portion positioned in a periphery of the light-transmitting portion on a transparent substrate. The semi-light-shielding portion and the light-transmitting portion transmit the exposure light in the same phase each... Agent: Mcdermott Will & Emery LLP

20070054199 - Semiconductor device manufacturing method, wafer and reticle: A semiconductor device manufacturing method allowing effective inspection at low cost of a wafer having formed thereon chips. When forming chips on the wafer, a reticle having formed thereon chip patterns, monitor element/circuit patterns and connection patterns is used according to a formation step of the chips. The reticle is... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070054205 - Process for forming anti-reflection coating and method for improving accuracy of overlay measurement and alignment: A method for forming an anti-reflection coating (ARC) with no hole over an overlay mark is described, which applies a fluid material of the ARC onto a substrate and then conducts at least two curing steps to convert the fluid material into the ARC. Such a bottom anti-reflection coating with... Agent: J C Patents, Inc.

20070054206 - Apparatus and method for applying coating liquid to cylindrical substrate, and electrophotographic photoreceptor produced by that method and electrophotographic apparatus provided with the same: A coating liquid to be used for coating has a loss tangent tan δ of from 1 to 10 at a frequency of 6.28 radians/sec. A coating liquid supplying roll has a fine concave portion in at least a part of the circumferential length thereof, and in the vicinities of... Agent: Edwards & Angell, LLP

20070054207 - Electrophotographic photoreceptor, image forming apparatus, and process cartridge: A photoreceptor is provided including an electroconductive substrate, and a charge transport layer located overlying the electroconductive substrate, wherein the charge transport layer includes a polydialkylsiloxane-containing polycarbonate resin having a specific formula, a charge transport material, and a cyclic ether solvent in an amount of from 20 to 5,000 ppm;... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.c.

20070054208 - Imaging member: An imaging member having an enhanced anti-curl back coating is disclosed. The anti-curl back coating comprises a liquid oligomer. Additionally, a slip agent can also be included. The resulting anti-curl back coating contains little to no residual solvent, shows improved resistance to wear and ozonolysis, and increased lubricity to prevent... Agent: Fay Sharpe LLP

20070054209 - Electrophotographic photoconductor:

20070054210 - Toner and developer using the toner: A toner is provided including a binder resin including at least one polyester resin in an amount of from 50 to 100% by weight, and a colorant having a specific formula, wherein the toner has a shape factor SF-1 of from 120 to 150 and a shape factor SF-2 of... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.c.

20070054211 - Chemically derived toner containing sublimation dyes: There is provided a toner composition including a sublimable dye and an optional non-sublimable pigment to produce full color imaging on all of the print engines commonly in use. The toner includes comprising a polymer binder, a wax, a charge control agent, a sublimable dye, and a non-sublimable pigment. The... Agent: Fay Sharpe LLP

20070054212 - Organic transistor active substrate, manufacturing method thereof, and electrophoretic display: A method of manufacturing an organic transistor active substrate is disclosed. The organic transistor active substrate includes an organic transistor in which a first electrode is formed on a substrate, a first insulating film is formed on the first electrode, a pair of second electrodes is formed on the first... Agent: Cooper & Dunham, LLP

20070054213 - Radiographic image conversion panel and production method thereof: A radiographic image conversion panel containing a substrate having thereon a phosphor layer formed by a vapor-accumulating method, wherein the phosphor layer has a thickness distribution of not more than ±20%, the thickness distribution being defined by the formula: ((Dmax−Dmin)/(Dmax+Dmin))×100, provided that Dmax is a maximum thickness of the phosphor... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070054214 - Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions: wherein R1 is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl, R2 to R4 are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5. Among the radiation-sensitive resin compositions, a positive one contains a resin having acid-dissociable... Agent: Merchant & Gould Pc

20070054216 - Near-infrared ray absorbing material and production method of the same: A method of producing a near-infrared ray absorbing material comprising the steps of: applying a coating liquid of a near-infrared ray absorbing layer comprising a near-infrared ray absorbing dye and a latex onto a support to form a coated layer; and drying the coated layer by heat to form a... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070054217 - Positive photosensitive composition and pattern-forming method using the same: A positive photosensitive composition comprises: (A) a compound capable of generating an acid upon irradiation with actinic ray or radiation; and (B) a resin having a group capable of decomposing by action of an acid to increase solubility of the group in an alkali developer, wherein the resin (B) comprises:... Agent: Sughrue-265550

20070054218 - Radiation curable resin composition for making colored three dimensional objects: A radiation curable resin composition suitable for making three dimensional objects comprising at least one epoxy compound, a cationic photoinitiator, wherein the resin composition has a first color or no color before cure and wherein a three dimensional object made from the resin by subjecting the resin to radiation shows... Agent: Nixon & Vanderhye, Pc

20070054215 - Reimageable paper: An image forming medium includes a substrate and an imaging layer including a photochromic material and a polymer binder coated on the substrate, where the photochromic material exhibits a reversible homogeneous-heterogeneous transition between a colorless state and a colored state in the polymer binder.... Agent: Oliff & Berridge, Plc

20070054219 - Azo-metal chelate dye and optical recording medium: The azo-metal chelate dye of the present invention is formed, for example, from zinc (divalent) as a center metal ion and an azo compound bonded with a coupler component having an amino group and a fluorine-substituted alkylsulfonylamino group subjected to condensed ring-formation to have a 1,3,4-thiazole ring as a diazo... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.c.

20070054220 - Polymeric material, containing a latent acid: Polymeric material, containing a latent acid which can be converted to an acid by irradiation by a laser and optionally further ingredients.... Agent: Ciba Specialty Chemicals Corporation Patent Department

20070054221 - Method of manufacturing nozzle plate: The method manufactures a nozzle plate including a nozzle having a tapered section where a diameter gradually decreases from a liquid supply side toward a liquid ejection side, and a straight section which is substantially cylindrical and is situated nearer a liquid ejection side of the tapered section. The method... Agent: Birch Stewart Kolasch & Birch

20070054222 - Self-forming polymer waveguide and waveguide material with reduced shrinkage: Disclosed is an optical device structure comprising a low shrinkage mixture wherein the shrinkage of the mixture is limited after the curing of the mixture during optical device formation. Disclosed also are methods for forming optical devices which comprise the low shrinkage mixture.... Agent: Patrick S. Yoder Fletcher Yoder

20070054223 - Method for preparing photochromic film or plate: The present invention relates to a method of preparing a photochromic film or plate comprising forming an embossed portion on a part or the whole of a basic material to be coated, coating a photochromic substance on a part or the whole of the basic material on which the embossed... Agent: Mckenna Long & Aldridge LLP

20070054224 - Silver halide color photographic light-sensitive material: e

20070054225 - Silver salt photothermographic dry imaging material: A silver salt photothermographic dry imaging material is disclosed, comprising on a support a light-sensitive layer comprising light-insensitive aliphatic carboxylic acid silver salt particles, light-sensitive silver halide grains, a binder and a reducing agent, wherein the reducing agent comprises a compound represented by the following formula and 80 to 100... Agent: Lucas & Mercanti, LLP

20070048624 - Magnetic recording head wiht overlaid leads: An embodiment of the invention is a magnetic head with overlaid lead pads that contact the top surface of the sensor between the hardbias structures and do not contact the hardbias structures which are electrically insulated from direct contact with the sensor. The lead pad contact area on the top... Agent: Marlin Knight

20070048626 - Device manufacturing method, mask and device: A method for use in manufacturing CCD or CMOS image sensors in which a substrate covered in a layer of colored radiation sensitive material has a patterned beam of radiation projected onto it. The patterned beam of radiation includes a pattern for forming device features in areas of a product... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070048625 - Lithographic template and method of formation and use: A lithographic template, a method of forming the lithographic template and a method for forming devices with the lithographic template is provided. The lithographic template (10) and the method of making comprises forming a transparent conductive layer (16) over a substrate (12). A SiCN layer (18) is formed over the... Agent: Ingrassia Fisher & Lorenz, P.C.

20070048631 - Mask defect repairing method and semiconductor device manufacturing method: According to an aspect of the invention, there is provided a mask defect repairing method of repairing a defect caused by a foreign object on a light transmissive photomask, the method including moving the foreign object on a light transmission section of the light transmissive photomask using a manipulator, and... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070048630 - Methods of forming capacitors: The invention includes methods of forming reticles configured for imprint lithography, methods of forming capacitor container openings, and methods in which capacitor container openings are incorporated into DRAM arrays. An exemplary method of forming a reticle includes formation of a radiation-imageable layer over a material. A lattice pattern is then... Agent: Wells St. John P.s.

20070048629 - Overlay target for polarized light lithography: A target and method for use in polarized light lithography. A preferred embodiment comprises a first structure located on a reference layer, wherein the first structure is visible through a second layer, and a second structure located on the second layer, wherein the second structure is formed from a photomask... Agent: Slater & Matsil LLP

20070048632 - Photomask and method for exposing chip pattern: A photomask includes a main mask pattern having first chip patterns and having a first size corresponding to a maximum exposure area of a projection exposure apparatus. The mask further includes a sub-mask pattern having second chip patterns different from the first chip patterns, having a second size smaller than... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070048628 - Plasmonic array for maskless lithography: In various embodiments, a photolithography system comprises a spatial light modulator and a plasmonic lens array. The spatial light modulator comprises a plurality of pixels, and the plasmonic lens array comprises a plurality of plasmonic lenses. The pixels are optically aligned with the plasmonic lenses such that light from the... Agent: Knobbe Martens Olson & Bear LLP

20070048627 - Systems and methods for implementing and manufacturing reticles for use in photolithography tools: Methods, systems, and tool sets involving reticles and photolithography processing. Several embodiments of the invention are directed toward obtaining qualitative data from within the pattern area of a reticle that is indicative of the physical characteristics of the pattern area. Additional embodiments of the invention are directed toward obtaining qualitative... Agent: Perkins Coie LLP Patent-sea

20070048633 - Method of fabricating color filter: A method of fabricating a color filter is provided. First, a substrate having a light shielding layer formed thereon is provided, wherein the light shielding layer is adopted for defining a plurality of sub-pixel regions on the substrate. Next, a hydrophobic layer is formed on the light shielding layer by... Agent: Jianq Chyun Intellectual Property Office

20070048634 - Method of manufacturing color filter substrate, color filter substrate, display device and electronic apparatus: A method of manufacturing a color filter substrate having a transparent conductive film and colorant material on a substrate includes: forming a bank on the substrate; disposing a liquid material including transparent conductive micro particles in an area defined by the bank; forming the transparent conductive film by baking the... Agent: Harness, Dickey & Pierce, P.L.C

20070048635 - Method and system for automatically detecting exposed substrates having a high probability for defocused exposure fields: By automatically estimating the focus status of individual substrates or lots on the basis of focus-specific tool information obtained from the exposure tool, such as tilt angle ranges used during the automatic focusing procedures, possible hot spot errors may be detected highly efficiently prior to releasing the substrates to a... Agent: Williams, Morgan & Amerson

20070048637 - Arylamine polymer and organic thin film transistor: In the chemical structure, Ar1, Ar3, and Ar4 independently represent a substituted or non-substituted divalent aromatic hydrocarbon group, Ar2 represents a substituted or non-substituted univalent aromatic hydrocarbon group, R1 and R2 independently represent a hydrogen atom, a substituted or non-substituted alkyl group, a substituted or non-substituted alkoxy group or a... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070048636 - Photoconductive imaging members: A photoconductive imaging including at least a substrate, a charge generating layer, a charge transport layer, and an overcoat layer. The overcoat layer includes a crosslinked product of at least a phenolic resin and a phenol compound.... Agent: Oliff & Berridge, PLC.

20070048638 - Charge generating composition and imaging member: A composition that finds particular utility in forming a charge generating layer of an imaging member includes at least one charge generating material, at least one polymer binder and at least one oxidized polyolefin polymer or copolymer. The oxidized polyolefin is able to impart a thixotropic rheology to the composition,... Agent: Oliff & Berridge, PLC.

20070048639 - Photoreceptor additive: The presently disclosed embodiments relate in general to electrophotographic imaging members, such as layered photoreceptor structures, and processes for making and using the same. More particularly, the embodiments pertain to a photoreceptor additive to improve image quality.... Agent: Pillsbury Winthrop Shaw Pittman LLP

20070048640 - Photoreceptor layer having rhodamine additive: The presently disclosed embodiments relate in general to electrophotographic imaging members, such as layered photoreceptor structures, and processes for making and using the same. More particularly, the embodiments pertain to a photoreceptor that incorporates a rhodamine compound that improves image quality.... Agent: Pillsbury Winthrop Shaw Pittman LLP

20070048641 - Method of producing an electrophotographic photoconductor and an electrophotographic photoconductor produced by this method: A method of producing an electrophotographic photoconductor, which prevents filler material in a coating liquid from aggregating onto etching pits formed on a surface of an aluminum raw drum. A photoconductor produced by the method of invention scarcely generates printing defects. The method includes steps of cutting a surface of... Agent: Rabin & Berdo, PC

20070048642 - Preparation of evaporative limited coalesence toners: The invention relates to a process for the preparation of a dry toner powder containing a wax component derived from the use of an aqueous wax dispersion and formed using an evaporative limited coalescence process. Both dry and aqueous dispersed pigments may be used. The resulting toner provides properties desired... Agent: Fay, Sharpe, Fagan, Minnich & Mckee, LLP

20070048643 - Single component developer of emulsion ag