Radiation imagery chemistry: process, composition, or product thereof inventions 02/07

20070042275 - Composition for optical recording, optical recording medium, and production method thereof: The invention relates to a composition for optical recording including: a matrix polymer formed by mixing an epoxide compound and a curing agent; a polymerizable monomer having an unsaturated carbon bond; and a photopolymerization initiator, wherein the curing agent includes at least one selected from a carboxylic acid, a carboxylic... Agent: Sughrue Mion, PLLC

20070042276 - Lithography apparatus and method for using the same: The lithography apparatus includes a dummy photomask comprising a substrate having a photomask pattern and a photomask. The photomask being detachable/attachable from the photomask is attached to a photomask so as to adjust field CD uniformity of the photomask.... Agent: Townsend And Townsend And Crew, LLP

20070042277 - Method and apparatus for performing model-based layout conversion for use with dipole illumination: A method of generating complementary masks for use in a multiple-exposure lithographic imaging process. The method includes the steps of: identifying a target pattern having a plurality of features comprising horizontal and vertical edges; generating a horizontal mask based on the target pattern; generating a vertical mask based on the... Agent: Mcdermott Will & Emery LLP

20070042279 - Method of manufacturing liquid crystal display device and the liquid crystal display device: A light blocking mask covering half of a picture element is formed on a first substrate. Thereafter, the first substrate and a second substrate are placed to face each other, and liquid crystals with negative dielectric anisotropy are sealed between these substrates, whereby a liquid crystal panel is formed. A... Agent: Nixon & Vanderhye, PC

20070042278 - Process for color filter array residual pigment removal: A method of fabricating a color filter array including the removal of unwanted residual color pigments. A substrate is coated with a colored photoresist layer. The photoresist layer is patterned. The substrate is then cured. A descumming step is performed after the curing step to remove the residual pigments without... Agent: Dickstein Shapiro LLP

20070042280 - Method, apparatus and media for displaying information: An apparatus for forming an image using an electrophoretic particle suspension containing media including: a transitioner for sufficiently lowering a viscosity of the suspension to facilitate mobility of at least some of the electrophoretic particles; and, imaging electrodes for selectively providing an imaging electric field associated with the image to... Agent: Eugene Ledonne Reed Smith LLP

20070042281 - Electrophotographic photoreceptor, and image forming apparatus and process cartridge therefor using the electrophotographic photoreceptor: An electrophotographic photoreceptor, including an electroconductive substrate; an intermediate layer, located overlying the electroconductive substrate; and a photosensitive layer, located overlying the intermediate layer, wherein the intermediate layer includes a N-alkoxymethylated nylon including a component having a molecular weight not greater than 5,000 in an amount of from 3 to... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070042282 - Condensation polymer photoconductive elements: The present invention relates to photoconductive elements having an electrically conductive support, an electrical barrier layer and, disposed over the barrier layer, a charge generation layer capable of generating positive charge carriers when exposed to actinic radiation. The electrical barrier layer, which restrains injection of positive charge carriers from the... Agent: Paul A. Leipold Patent Legal Staff

20070042283 - Toner for development and method of producing toner: According to the method of producing toner, toner is produced by (i) forming particles of a pigmented resin by applying shear stress to a mixture of a pigmented resin composition, an organic solvent, a polymer dispersing agent, and a hydrophobic medium, the organic solvent being capable of reducing viscosity of... Agent: Nixon & Vanderhye, PC

20070042284 - Toner for developing electrostatic image, method for manufacturing the toner, developer including the toner, container containing the toner, and color image forming method using the toner: A toner for developing an electrostatic image having a good combination of hot offset resistance and low temperature fixability. The toner includes (1) a resin having at least one group that can react with a compound having an active hydrogen in an amount of 2 pieces per molecule of the... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070042285 - Electrostatic image developing toner and image forming method: An electrostatic image developing toner is disclosed, comprising toner particles composed of a core containing resin and a colorant and a shell containing a resin, wherein the standard deviation of shape factor SF-1 of the toner particles and the standard deviation of shape factor SF-2 fall within the specific range,... Agent: Cantor Colburn, LLP

20070042286 - Toner processes: A toner process comprising aggregating or coagulating a latex emulsion comprising a resin, a colorant and wax particles using an amount of polymetal ion coagulant to provide core particles; heating the core particles to provide micron size aggregates; optionally adding a second resin emulsion; adding a sequestering or complexing component... Agent: Marylou J. Lavoie, Esq. LLC

20070042287 - Multi-layer photoresist and method for making the same and method for etching a substrate: The present invention relates to a multi-layer photoresist and the method for making the same and method for etching a substrate. The multi-layer photoresist comprises a plurality of photoresist layers, wherein the photoresist layers have different photoreceptive areas. Therefore, the multi-layer photoresist itself has different light transmitting effects. Thus, a... Agent: Volentine Francos, & Whitt PLLC

20070042289 - Coating compositions for use with an overcoated photoresist: Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactive groups that are reactive following crosslinking. In another aspect, underlying coating... Agent: Rohm And Haas Electronic Materials LLC

20070042293 - Lithographic printing plate precursor and lithographic printing process: A lithographic printing plate precursor, which comprises: a support; an image-recording layer; and a protective layer, in this order, wherein at least one of the image-recording layer and the protective layer comprises a phosphonium salt having a specific structure, and a lithographic printing process, which comprises: exposing a lithographic printing... Agent: Birch Stewart Kolasch & Birch

20070042288 - Positive photoresist composition and method for forming resist pattern: The invention provides a positive photoresist composition which exhibits a high level of etching resistance and attains high resolution, and enables the formation of a fine pattern using an electron beam exposure step, as well as a method for forming a resist pattern that uses the positive photoresist composition. This... Agent: Knobbe Martens Olson & Bear LLP

20070042291 - Positive resist composition and a pattern forming method using the same: A positive resist composition comprises (A) a compound capable of generating sulfonic acid, bis(alkylsulfonyl)amide, or tris(alkylsulfonyl)methine upon irradiation with actinic ray or radiation, and (B) a resin capable of increasing the solubility in an alkali developer by action of an acid having specific repeating units, and a pattern forming method... Agent: Sughrue-265550

20070042290 - Positive resist composition for immersion exposure and pattern-forming method using the same: A positive resist composition for immersion exposure comprises: (A) a resin capable of increasing its solubility in an alkali developer by an action of an acid, and (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, wherein the acid satisfies conditions of V≧230 and... Agent: Sughrue-265550

20070042292 - Radiation sensitive resin composition: in the formula (1-1), R1 represents a methyl group and the like and X represents a specific polycyclic alicyclic hydrocarbon group and the like, in the formula (1-2), R1 represents a methyl group and the like and Z represents an acid-dissociable group which is dissociable by the action of an... Agent: Merchant & Gould PC

20070042294 - Optical disc, optical disc manufacturing method, and optical disc apparatus: According to one embodiment, an optical disc is the following the distance between a light incidence plane and the first recording layer is a minimum of 550 μm. The distance between the first and the third recording layer is a maximum of 72 μm. The distance between the second and... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070042295 - Optical data carrier comprising a polymeric network in the information layer: Optical data carriers having at least one information layer which comprises a polymeric network comprising covalently bound light-absorbent compounds.... Agent: Lanxess Corporation Law And Intellectual Property Department

20070042296 - Positive photosensitive insulating resin composition, cured product thereof, and electronic component: Disclosed is a positive photosensitive insulating resin composition including: (A) an alkali soluble resin, (B) a compound having a quinonediazide group, and (C) an epoxy resin having a softening point of not lower than 30° C.; and a cured product which is obtained by curing the composition. The cured product... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070042298 - Method for manufacturing semiconductor device using immersion lithography process: Disclosed is a method for manufacturing a semiconductor device using an immersion lithography process comprising rapidly accelerating the rotation of a wafer after exposing and before developing steps to remove an immersion lithography solution, thereby effectively reducing water mark defects.... Agent: Marshall, Gerstein & Borun LLP

20070042299 - Method to print photoresist lines with negative sidewalls: It is very difficult to produce a negative wall angle from either negative or positive-tone chemically amplified resists, especially by e-beam lithography. This problem has now been overcome by first forming a photoresist pedestal in the conventional way, followed by flood exposing with electrons. Then, a second development treatment is... Agent: Saile Ackerman LLC

20070042297 - Resist pattern forming method and manufacturing method of semiconductor device: According to an aspect of the invention, there is provided a resist pattern forming method of forming a resist pattern by immersion exposure, comprising forming a resist film on a substrate to be treated, a contact angle between the resist film and an immersion liquid being a first angle, forming... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070037065 - Seamless holographic embossing substrate produced by laser ablation: Laser ablation to direct write dot matrix holographic patterns onto the surface of polymeric coatings deposited on an embossing cylinder is described. The desired holographic pattern is ablated by interfering at least two laser beams directly onto the polymeric coating of the embossing cylinder in the pixel-by-pixel manner. The direct... Agent: Houston Eliseeva

20070037068 - Barrier coating compositions for photoresist and methods of forming photoresist patterns using the same: Provided are barrier polymers, barrier coating compositions incorporating such polymers and methods for utilizing such barrier coating compositions for suppressing dissolution of photoresist components during immersion photolithography. The barrier polymers may be synthesized from one or more monomers including at least one monomer having a tris(trimethylsiloxy)silyl group and will have... Agent: Harness, Dickey & Pierce, P.L.C

20070037069 - Exposure mask: o

20070037072 - Levenson type phase shift mask and manufacturing method thereof: A Levenson type phase shift mask has a light shielding portion and openings formed on a transparent substrate. The transparent substrate at the openings is partially dug in or a transparent film is partially disposed on the transparent substrate at the openings to form shifter openings and non-shifter openings. The... Agent: Staas & Halsey LLP

20070037070 - Light exposure mask and method for manufacturing semiconductor device using the same: The present invention provides a light exposure mask which can form a photoresist layer in a semi-transmissive portion with uniform thickness, and a method for manufacturing a semiconductor device in which the number of photolithography steps (the number of masks) necessary for manufacturing a TFT substrate is reduced by using... Agent: Fish & Richardson P.C.

20070037066 - Method for correcting and configuring optical mask pattern: A method of correcting a mask pattern is described. A testing mask including a plurality of original patterns configured according to an original drawing data is provided. The original patterns in the testing mask are transferred to a photo-resistant layer to form a plurality of first post-development patterns and measure... Agent: Jianq Chyun Intellectual Property Office

20070037071 - Method for removing defect material of a lithography mask: The present invention relates to a method for removing defect material in a transmissive region of a lithography mask having transmissive carrier material and absorber material. A first method step involves removing defective material and absorber material in a processing region. A second method step involves applying an absorbent material... Agent: Morrison & Foerster LLP

20070037067 - Optical pellicle with a filter and a vent: The present invention provides an optical pellicle frame that includes an exterior surface and an interior surface, at least one vent extending through the frame from the exterior surface to the interior surface, and a filter, wherein the filter is located within the vent and is at least three times... Agent: Kolisch Hartwell, P.C.

20070037073 - Process for manufacturing half-tone phase shifting mask blanks: For efficiently manufacturing half-tone phase shifting mask blanks having uniform product qualities, which enables the prevention of optical property variations when the blanks are mass-produced, there is provided a process for manufacturing half-tone phase shifting mask blanks each having a phase shifting film containing at least one half-tone film on... Agent: Nixon & Vanderhye, PC

20070037074 - Use of alternative polymer materials for \"soft\" polymer pellicles: Disclosed are pellicle compositions and methods of making such pellicle compositions. The pellicle compositions provided include highly fluorinated polymers as well as fluorinated polymer/PVDF co-polymers.... Agent: Fish & Richardson, PC

20070037076 - Azo compound, colored curable composition, color filter and manufacturing method thereof: wherein in formula (I), R1 represents a heterocyclic group, and R2 represents a hydrogen atom or a substituent; R3, R4, R5, R6, R7, and R8 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heterocyclic group, an acyl group, an... Agent: Sughrue Mion, PLLC

20070037075 - Inkjet printhead and method of fabricating color filter: An inkjet printhead and a method of fabricating a color filter with a uniform thickness. In the method, a transparent substrate is prepared, and a black matrix of a pixel pattern is formed on the transparent substrate. At least one pixel on the transparent substrate is selected, and an ink... Agent: Stanzione & Kim, LLP

20070037077 - Substrate holder and device manufacturing method: A second substrate, e.g. a III/V compound semiconductor, is placed on a first substrate, e.g. a wafer, in the vicinity of placement marks on the first substrate. The second substrate is exposed to patterned radiation, e.g. for the manufacture of integrated circuits.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070037079 - Projection optical system, exposure apparatus, and exposure method: A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curvature of field, and being capable of securing... Agent: Oliff & Berridge, PLC

20070037080 - Projection optical system, exposure apparatus, and exposure method: A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curvature of field, and being capable of securing... Agent: Oliff & Berridge, PLC

20070037078 - Reference wafer for calibrating semiconductor equipment: A reference wafer for calibrating a laser and a camera and checking laser accuracy and spot size. The reference wafer may include a light absorption layer on a semiconductor substrate and a light reflection layer pattern on the light absorption layer. The light reflection layer pattern may include a first... Agent: Marger Johnson & Mccollom, P.C.

20070037081 - Anticurl backing layer for electrostatographic imaging members: The presently disclosed embodiments are directed to anticurl backing layers useful in electrostatography. More particularly, the embodiments pertain to an electrostatographic imaging member with an improved anticurl backing layer including a low surface energy polymeric material to prevent curling and reduce friction, and a process for making and using the... Agent: Pillsbury Winthrop Shaw Pittman LLP

20070037082 - Toner, toner cartridge that holds the toner therein, and image forming apparatus into which the toner cartridge is attached: A toner is used in an image-forming apparatus that incrporates a toner-collecting member. The toner-collecting member collects residual toner on a surface of an image-bearing body. The toner includes a spherical toner having at least a binder resin, and an irregularly-shaped particles mixed with the spherical toner. The irregularly shaped... Agent: Rabin & Berdo, PC

20070037083 - Positive electrified charge control agent and charge control method of toner using it: (in the formula (1), [A]− is a sulfate anion). A positive electrified toner for developing an electrostatic image comprises the positive electrified charge control agent. A charge control method of the positive electrified toner for developing the electrostatic image comprises a step for making the toner positively electrified by friction.... Agent: Steptoe & Johnson LLP

20070037084 - Carrier and developer compositions: A carrier composition having magnetite with a diameter of from about 80 microns to about 150 microns, and wherein the carrier has a conductivity of from about 10−8 to about 10−11 (ohms-cm)−1 and a carrier breakdown voltage of from about 20 to about 200 volts, and a developer composition with... Agent: Patent Documentation Center

20070037085 - Toner and method for producing the same, and, developer, toner-containing container, process cartridge, image forming apparatus and image forming method: A toner producing method is provided, which comprises preparing toner base particles in an aqueous medium, wherein the toner base particles comprise resin fine particles, and forming a coating layer on the surface of the toner base particles, wherein the coating layer is formed by attaching or coating a toner... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070037086 - Toner composition: Toner compositions having particles with a desired circularity and size are provided.... Agent: Carter, Deluca, Farrell & Schmidt

20070037087 - Photoresist stripping solution and a method of stripping photoresists using the same: A photoresist stripping solution which comprises (a) a salt of hydrofluoric acid with a base free from metal ions, (b) a water-soluble organic solvent, (c) a mercapto group containing corrosion inhibitor, and (d) water, and a method of stripping photoresists with the use of the same are disclosed. In case... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070037091 - Chemically amplified positive resist composition and patterning process: A chemically amplified positive resist composition comprising a specific 2,4,6-triisopropylbenzenesulfonate compound as a photoacid generator, a polymer which changes its solubility in an alkaline developer under the action of acid, and a basic compound has a high sensitivity, a high contrast of dissolution of resist film, a high resolution, and... Agent: Birch Stewart Kolasch & Birch

20070037088 - Color forming composition containing a plurality of antenna dyes: A radiation image-able coating includes a first phase including a radiation curable polymer matrix and an activator disposed in the radiation curable polymer matrix, a second phase insolubly distributed in the first phase, the second phase including a color-former, and a hybrid antenna dye package distributed in at least one... Agent: Hewlett Packard Company

20070037090 - Radiation sensitive material and method for forming pattern: was obtained by loading adamantyl methacrylate monomer and t-butyl acrylate monomer by 1:1, then conducting polymerization, adding AIBN as a polymerization initiator, and then conducting precipitation purification with methanol. Then to the copolymer, triphenylsulfonium hexafluoroantimonate was added to prepare a cyclohexanone solution. This solution was applied to a wafer, and... Agent: Arent Fox PLLC

20070037089 - Structure and method for improving photoresist pattern adhesion: An anti-reflective coating comprises a plurality of main backbone chains, and at least one long free polymer chain coupled to at least one of the plurality of main backbone chains.... Agent: Haynes And Boone, LLP

20070037092 - Method for manufacturing optical recording medium: A method for manufacturing a multi-layer optical recording medium that allows a transferring substrate to be reused is provided. The manufacturing method includes the steps of: forming a pattern with recesses and projections on a surface of a photopolymerizable (2P) resin layer, which is applied on a flat transferring substrate;... Agent: Fitzpatrick Cella Harper & Scinto

20070037093 - Information-recording medium: An phase-change optical disk comprises a substrate, a first protective layer, a first thermostable layer, a recording layer, a second thermostable layer, a second protective layer, an absorptance control layer, and a heat-diffusing layer which are provided in this order from a side on which a laser beam comes thereinto,... Agent: Oliff & Berridge, PLC

20070037094 - Information storage medium, and reproducing method and recording method therefor: According to one embodiment, an information storage medium comprising a substrate having a groove in a form of concentric circle or spiral and a recording film formed on the substrate, wherein a change rate of signal level in reproduction of 1,000 times at a predetermined power is 0.1% or more... Agent: Knobbe Martens Olson & Bear LLP

20070037095 - Write-once-read-many optical disk having low-to-high recording property accommodating short wavelength recording: A write-only-read-many type optical recording medium includes a substrate, an organic material layer having a light absorption function that is sufficient for recording in the recording/reproduction wavelength range, the organic material layer being situated on the substrate, and a reflection layer being situated on the organic material layer. The recording... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070037096 - Photo radical generator, photo sensitive resin composition and article: The invention provides a radical generator, although being a self-cleavage type initiator, which is capable of suppressing volatilization of low molecular weight decomposition materials at the time of light radiation and post-baking, and leaving no low molecular weight decomposition materials in the final product, a photosensitive resin composition and an... Agent: Seyfarth Shaw LLP

20070037097 - Process for preparing a flexographic printing plate: A flexographic printing plate is prepared from a photosensitive element having a photopolymerizable elastomeric layer with specific rheological properties. The element is imagewise exposed and thermally treated to form a relief structure suitable for flexographic printing.... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20070037099 - Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing metho: A manufacturing method of an alkaline solution, comprising dissolving a gaseous molecule having oxidizing properties or reducing properties in an aqueous alkaline solution.... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070037098 - Systems and methods for modifying features in a semi-conductor device: Systems and methods for modifying features of a semiconductor device. The systems and methods of the invention modify features of a semiconductor device according to the amount of exposure dose of light to which a common reticle field of a semiconductor device is exposed. A mask, or a thin film... Agent: Scully, Scott, Murphy & Pressner

20070037100 - High aspect ratio mask open without hardmask: A method of etching a stack of dielectric mask layers by reactive ion etch steps in order to open an aperture for etching into a semiconductor substrate improves the selectivity of the reactive ion etch relative to photoresist to the extent that an etch of an equivalent of 2000 nm... Agent: International Business Machines Corporation Dept. 18g

20070037101 - Manufacture method for micro structure: A micro structure manufacture method includes the steps of: (a) preparing an etching object having an etching target film, provided with a lower hard mask layer and an upper hard mask layer stacked on the etching target film; (b) forming a resist pattern above the etching object; (c) etching the... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070037102 - System, apparatus, and method for increasing media storage capacity: A system, an apparatus, or a method is provided for increasing media storage capacity of an image-recording material. A system, an apparatus, or a method is further provided for increasing media storage capacity and for increasing emulsion bearing surface area of an image-recording material.... Agent: Woodcock Washburn LLP

20070037103 - Bisphenol compound and photothermographic material: A photothermographic material is disclosed, comprising on at least one side of a support a light-sensitive layer containing a light-sensitive silver halide and a light-insensitive organic silver salt, wherein the photothermographic material further comprises at least a reducing agent represented by the following formula (1):... Agent: Lucas & Mercanti, LLP

20070031741 - Euvl reflection device, method of fabricating the same, and mask, projection optics system and euvl apparatus using the euvl reflection device: A reflection device that may include a substrate and a multi-reflection layer formed on the substrate. The multi-reflection layer may be formed of a material capable of reflecting EUV rays. The multi-reflection layer may be formed by stacking a plurality of layer groups, each including a first material layer, a... Agent: Harness, Dickey & Pierce, P.L.C

20070031737 - Lithography masks and methods: Lithography masks and methods of lithography for manufacturing semiconductor devices are disclosed. Forbidden pitches are circumvented by dividing a main feature into a set of two or more sub-features. The sum of the widths of the sub-features and the spaces between the sub-features is substantially equal to the width of... Agent: Slater & Matsil LLP

20070031736 - Method and apparatus for compensating for the effects of gravity on pellicle used for protecting a reticle from contamination: A pellicle membrane (1) is connected to a frame (3), substantially parallel to a reticle base plate (5), so as to define an enclosure with a space (9) between the reticle carried on the base plate (5) and the pellicle membrane (1). A mask (6) is provided on the reticle... Agent: Philips Intellectual Property & Standards

20070031738 - Method and system for printing lithographic images with multiple exposures: System and method is disclosed for breaking a design to be printed into two or more exposures, each of which has at least the minimum pitch. Together, these multiple exposures print a design that could not be printed in one exposure alone.... Agent: Cadence Design Systems, Inc. C/o Bingham Mccutchen LLP

20070031740 - Method, program product and apparatus for performing mask feature pitch decomposition for use in a multiple exposure process: A method for forming exposure masks for imaging a target pattern having features to be imaged on a substrate in a multi-exposure process. The method includes the steps of generating a set of decomposition rules defining whether a given feature of the target pattern is assigned to a first exposure... Agent: Mcdermott Will & Emery LLP

20070031739 - Test mask for optical and electron optical systems.: A test mask 1 for microscopy is disclosed, which is formed on a substrate of quartz. The test mask 1 comprises a multiplicity of sub-masks 4, which are implemented such that each sub-mask 4 comprises structures which differ within a sub-mask 4 with regard to form and size. In addition,... Agent: Houston Eliseeva

20070031742 - Color filter structure and display device using the color filter, and manufacturing method thereof: A color filter being precisely and easily manufactured while solving an alignment problem is provided. Further, a method for manufacturing a color filter structure formed in a display panel that has front and rear substrates opposed to each other is provided. This method is provided with: a first step of... Agent: Birch Stewart Kolasch & Birch

20070031743 - Alignment and alignment marks: A lithographic substrate provided with an alignment mark, the alignment mark having a plurality of features spaced apart from one another, each feature being spaced apart from adjacent features by a different distance is disclosed. Further, there is disclosed a method of aligning a lithographic substrate provided with an alignment... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070031744 - Lithography process optimization and system: The first and second example embodiments are Pattern Fidelity Optimization Procedures for a Multiple Exposure Scheme. In the third example embodiment, the aperatures from the multiple exposure system can be combined into a single aperture by adding the apertures and modulating the relative transmission thru the respective apertures to match... Agent: William Stoffel

20070031745 - System and method for creating a focus-exposure model of a lithography process: A system and a method for creating a focus-exposure model of a lithography process are disclosed. The system and the method utilize calibration data along multiple dimensions of parameter variations, in particular within an exposure-defocus process window space. The system and the method provide a unified set of model parameter... Agent: White & Case LLP Patent Department

20070031746 - Electrophotographic photoconductor, process cartridge, and image forming method: The present invention provides an electrophotographic photoconductor which contains a substrate, at least a photosensitive layer and a surface layer being formed on the substrate in this order; the surface layer contains a cured material which is cured by irradiating with light a trifunctional or more radical polymerizable monomer having... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070031747 - Color toner, and full-color image-forming method: A yellow toner in which, in a spectral-distribution diagram in which the reflectance (%) is plotted as ordinate and the wavelength (nm) as abscissa, the reflectance determined for a toner in a state of powder ranges from 15% to 20% at a wavelength of 500 nm and ranges from 75%... Agent: Fitzpatrick Cella Harper & Scinto

20070031749 - External surface additive compositions: A toner having at least one binder, at least one colorant and external additives. The external additives include at least one fluoropolymer. An electrophotographic image forming machine and method includes the toner with at least one fluoropolymer.... Agent: Oliff & Berridge, PLC.

20070031748 - Toner, developer, toner container, process cartridge, image forming apparatus, and image forming method: To provide a toner that can provide long-term removability and high-definition images with reduced image layer thickness and densely-packed toner particles, a developer capable of forming high-quality images using the toner, a toner container for containing the toner, a process cartridge using the toner, an image forming apparatus using the... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070031750 - Carrier, method for producing the carrier, developer, and image forming method using the developer: The present invention provides a method for producing a carrier which includes forming a coating layer on a surface of a core material by dissolving or dispersing at least a coating resin in a supercritical or subcritical fluid, and a carrier produced by the method for producing a carrier.... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070031751 - Composition, method and device for liquid electrophotographic printing: A UV-curable composition and liquid toner useful for electrophotographic printing, a method of electrophotographic printing and a device for electrophotographic printing are disclosed. A UV-curable composition and UV-curable liquid toner useful for electrophotographic printing includes a higher-acrylate, i.e. a triacrylate or higher. Such a composition and toner provide for scratch... Agent: Hewlett Packard Company

20070031752 - Toner, developer including the toner, and method for mixing toner image: A toner composition including toner particles including a binder resin including a modified polyester resin, and a second resin having a weight average molecular weight of from 2,000 to 10,000; a colorant; a release agent; and a particulate material which is present at least a surface portion of the toner... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070031753 - Polyurethane member for use in electrophotographic apparatus: The invention provides an electrophotography polyurethane member which exhibits small temperature dependency of characteristics, excellent mechanical characteristics, and high wear resistance. The cast-type electrophotography polyurethane member produced through hardening and molding a polyurethane composition containing at least polyol, polyisocyanate, and a diamino compound, wherein the diamino compound has a melting... Agent: Sughrue Mion, PLLC

20070031754 - Kneading and pulverizing method and apparatus for producing a toner, and a mixture for use in the method and apparatus: A mixture including at least a binder resin and a colorant and a kneader configured to knead such a mixture. The mixture may include air bubbles having a density from 104 to 108 pieces/cm3 and constituting from 65 to 95% of said mixture by volume. The kneader may be configured... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070031755 - Material for forming resist-protecting film for immersion exposure process, resist-protecting film made of such material, and method for forming resist pattern using such resist-protec- ting film: The resist protective film forming material for liquid immersion lithography is provided, which is suitable when the non-aqueous solution with a high transparency and high refractive index exemplified by the fluorinated liquid is used. The resist protective film forming material includes at least one component selected from water-soluble and alkali-soluble... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070031756 - Photosensitive resin composition, method of forming level difference pattern using the photosensitive resin composition, and method of producing ink jet head: To provide a positive type photosensitive resin composition, containing at least an acrylic resin having a carboxylic anhydride structure in a molecule, and a compound that generates an acid when irradiated with light.... Agent: Fitzpatrick Cella Harper & Scinto

20070031757 - Positive photosensitive composition and method of pattern formation with the same: A positive photosensitive composition comprising: (A) a compound which generates an acid upon irradiation with actinic rays or a radiation; (B) a resin which decomposes by an action of an acid to come to have an enhanced solubility in an alkaline developing solution; and (F) a solvent, wherein the resin... Agent: Sughrue Mion, PLLC

20070031758 - Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material: The positive-type radiation-sensitive resin composition for producing a metal-plating formed material relating to the present invention comprises (A) a polymer containing a structural unit having an acid-dissociative functional group, which is dissociated in the presence of an acid to generate an acidic functional group, and a crosslinking structure; (B) a... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070031760 - Immersion lithography watermark reduction: A method of performing immersion lithography on a semiconductor substrate includes providing a layer of resist onto a surface of the semiconductor substrate and exposing the resist layer using an immersion lithography exposure system. The immersion lithography exposure system utilizes a fluid during exposure and may be capable of removing... Agent: Haynes And Boone, LLP

20070031761 - Polymers, methods of use thereof, and methods of decomposition thereof: Polymers, methods of use thereof, and methods of decomposition thereof, are provided. One exemplary polymer, among others, includes, a photodefinable polymer having a sacrificial polymer and a photoinitiator.... Agent: The Webb Law Firm, P.C.

20070031759 - Radiation curable polymer films having improved laser ablation properties and radiation curable sensitizers therefor: Disclosed are coating formulations that include a copolyester and a vinyl ether in which the copolyester is produced by copolymerizing a monomer composition that includes a fused aromatic diacid monomer, an unsaturated diacid monomer, and a polyol. Also disclosed are methods for producing a laser-ablatable film on a surface of... Agent: Peter Rogalskyj, Esq. Rogalskyj & Weyand, LLP

20070031763 - Method of fabricating semiconductor device: A method of fabricating a semiconductor device is provided. The method includes forming at least one etch target film on a substrate, forming a first reflowable etch mask on the at least one etch target film, patterning the etch target film using the first reflowable etch mask. The method further... Agent: F. Chau & Associates, LLC

20070031762 - Methods of patterning substrates; and templates comprising one or both of cds and cdse: The invention includes a template comprising one or both of CdS and CdSe adhered to a base in a desired pattern. The base can be any transparent or translucent material, and the desired pattern can include two or more separated segments. The template can be utilized for patterning a plurality... Agent: Wells St. John P.s.

20070031764 - Exposure process: An exposure process is provided. First, a plurality of optical modules is provided. The optical modules are arranged in order and a partially overlap areas is formed at the overlapping region between each two adjacent optical modules. A photo mask with pluralities of first device patterns and pluralities of second... Agent: Jianq Chyun Intellectual Property Office

20070031765 - Black and white photothermographic material: The present invention provides a black and white photothermographic material including at least a photosensitive silver halide, a non-photosensitive organic silver salt, and a binder on a support, wherein the black and white photothermographic material contains a reducing agent represented by formula (1) and a coupler which reacts with an... Agent: Taiyo Corporation

20070031766 - Photothermographic material: The present invention provides a photothermographic material having, on at least one side of a support, an image forming layer including at least a photosensitive silver halide, a first non-photosensitive organic silver salt, a reducing agent, and a binder, and a non-photosensitive layer including a second non-photosensitive organic silver salt... Agent: Taiyo Corporation

20070031767 - Photothermographic material: The present invention provides a photothermographic material having, on at least one side of a support, an image forming layer including at least a photosensitive silver halide, a non-photosensitive organic silver salt, a first reducing agent for silver ions, and a first binder, and a non-photosensitive outermost layer which is... Agent: Taiyo Corporation

20070026319 - Optical information recording media and method for manufacturing them: An optical information recording medium having a holographic recording layer between a first substrate and a second substrate in which optical information is holographically recorded and a method for manufacturing the recording medium are described. The recording medium comprises a disk-shaped recording sheet having a spindle hole which comprises a... Agent: Young & Thompson

20070026321 - Cluster tool and method for process integration in manufacturing of a photomask: A method and apparatus for process integration in manufacture of a photomask are disclosed. In one embodiment, a cluster tool suitable for process integration in manufacture of a photomask including a vacuum transfer chamber having coupled thereto at least one hard mask deposition chamber and at least one plasma chamber... Agent: Patterson & Sheridan, LLP

20070026322 - Integration system and the method for operating the same: A mixing-and-matching method for an optical environment group. The optical environment group has at least a primary optical environment having a first numerical aperture (NA) and a first off-axis illumination (OAI) mode and at least one backup optical environment having a second NA and a second OAI mode. The method... Agent: J C Patents, Inc.

20070026323 - Mask with minimum reflectivity over absorber layer: A reflective mask may include an anti-reflective (AR) coating on an absorber layer to improve inspection contrast in an inspection system using deep ultraviolet (DUV) light. A silicon nitride (Si3N4) AR coating may be used on a chromium (Cr) or tantalum nitride (TaN) absorber layer.... Agent: Intel Corporation C/o Intellevate, LLC

20070026320 - Phase shift photomask performance assurance method: A method for inspecting a phase shift photomask employs a phase shift photomask having an active pattern region. An optical property of the phase shift photomask is measured within the active pattern region, rather than, for example, a non-active pattern border region. By making the measurement within the active pattern... Agent: Tung & Associates

20070026324 - Substrate with light-shielding film, color filter substrate, method of manufacture of both, and display device having substrate with light-shielding film: A substrate with a light-shielding film according to one mode of the invention is obtained in a method of manufacture of a substrate with a light-shielding film having a light-shielding film pattern formed on a substrate, by depositing in order a first film having chromium oxide and a second film... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070026325 - Substrate distortion measurement: A distortion measurement apparatus comprising a detector arranged to measure distortion of a substrate, and a processor arranged to receive distortion data indicating the measured distortion of the substrate and to transform the distortion data into a frequency domain representation. The distortion data may alternatively be transformed into an orthogonal... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070026326 - Image sensor and method for fabricating the same: An image sensor and a method for fabricating the same are provided. The image sensor includes a first conductive type substrate including a trench formed in a predetermined portion of the first conductive type substrate, a second conductive type impurity region for use in a photodiode, formed below a bottom... Agent: Blakely Sokoloff Taylor & Zafman

20070026328 - Photoreceptor layer having phosphorus-containing lubricant: An imaging member containing a substrate, and an outer layer containing a phosphorous-containing lubricant, and an image forming apparatus for forming images on a recording medium including the imaging member above, a development component to apply a developer material to said charge-retentive surface to develop said electrostatic latent image to... Agent: Patent Documentation Center

20070026330 - Photoreceptor layer having solid and liquid lubricants: An imaging member containing a substrate, and an outer layer containing solid and liquid lubricants, and an image forming apparatus for forming images on a recording medium including the imaging member above, a development component to apply a developer material to said charge-retentive surface to develop said electrostatic latent image... Agent: Patent Documentation Center

20070026329 - Photoreceptor layer having thiophosphate lubricants: An imaging member containing a substrate, and an outer layer containing a thiophosphate, and an image forming apparatus for forming images on a recording medium including the imaging member above, a development component to apply a developer material to said charge-retentive surface to develop said electrostatic latent image to form... Agent: Patent Documentation Center

20070026331 - Composition for overcoat layer of organophotoreceptor, organophotoreceptor manufactured by employing the same and the electrophotographic imaging apparatus containing the same: A composition for an overcoat layer suitable for use in an organophotoreceptor for liquid toner, an organophotoreceptor manufactured by employing the composition and an electrophotographic imaging apparatus containing the organophotoreceptor. Since the organophotoreceptor can maintain higher charge potential and low residual or discharge potential, the lifetime of the organophotoreceptor can... Agent: Staas & Halsey LLP

20070026327 - Electrophotographic photoreceptor for preventing image deterioration from repeated use and electrophotographic image forming apparatus employing the photoreceptor: An electrophotographic photoreceptor is provided that includes an underlayer, a charge generating layer, and a charge transporting layer that are sequentially formed on an electrically conductive substrate. The underlayer includes a metal oxide, a binder resin, and a heat stabilizer; the charge generating layer includes a binder resin and a... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.

20070026332 - Vinyl polymer photoconductive elements: The present invention is a photoconductive element that includes an electrically conductive support, an electrical barrier layer disposed over said electrically conductive support, and disposed over said barrier layer, a charge generation layer capable of generating positive charge carriers when exposed to actinic radiation. The barrier layer includes a vinyl... Agent: Paul A. Leipold Patent Legal Staff

20070026333 - Photoreceptor layer having antioxidant lubricant additives: An imaging member containing a substrate, and an outer layer containing an antioxidant lubricant additive, and an image forming apparatus for forming images on a recording medium including the imaging member above, a development component to apply a developer material to said charge-retentive surface to develop said electrostatic latent image... Agent: Patent Documentation Center

20070026334 - Electrophotographic photoreceptor and image forming apparatus including the same: An electrophotographic photoreceptor of high durability capable of providing stable excellent electrical characteristics over a prolonged period of time which electrophotographic photoreceptor excels in mechanical strength. A photosensitive layer (14) of an electrophotographic photoreceptor (1) includes a polyarylate resin having structural units, for example, those of the aforementioned formula (1-3)... Agent: Birch Stewart Kolasch & Birch

20070026335 - Toner, image forming method and process cartridge: In the chemical structure, M represents one of Li, Na and K, R1, R2, R3 and R4 each, independently, represent one of a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, and a halogen atom, and n represents... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070026337 - Method of preparing toner and toner prepared using the method: A method of preparing a toner includes: preparing a toner composition including a macromonomer having a hydrophilic group, a hydrophobic group and at least one reactive functional group, at least one polymerizable monomer, and a colorant; emulsion-polymerizing the toner composition in a medium; and separating and drying the polymerized toner.... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.

20070026336 - Toner: Provided is a toner including at least: a binder resin; and a colorant, in which: the binder resin contains at least a polyester unit and a vinyl copolymer unit; a main peak MpA is present in the molecular weight region of 2,000 to 7,000 in a molecular weight distribution measured... Agent: Fitzpatrick Cella Harper & Scinto

20070026338 - Method for producing liquid developer, liquid developer, and image forming apparatus: A method for producing a liquid developer comprising an insulation liquid and toner particles dispersed in the insulation liquid is provided. The method comprising the steps of: a wet grinding step for grinding a toner material mainly composed of a resin material in a first liquid which contains as its... Agent: Hogan & Hartson L.L.P.

20070026343 - Chemical amplification-type resist composition and production process thereof: A production process of a chemical amplification-type resist composition, which is a process for producing a chemical amplification-type composition comprising: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin of which solubility in an alkali developer is changed under an action... Agent: Sughrue Mion, PLLC

20070026342 - Imageable printing plate for on-press development: A novel coating for lithographic printing plates can be imagewise exposed to radiation and then directly processed with only water to remove the non-exposed regions of the coating. The coating comprises a polymer, a monomer and/or oligomer, polymerization or cross link initiator, stabilizer, and dye or pigment, such that after... Agent: Alix Yale & Ristas LLP

20070026344 - Infrared-sensitive planographic printing plate precursor: The present invention provides an infrared-sensitive planographic printing plate precursor including: a support; a recording layer on one surface of the support, which recording layer contains a water-insoluble and alkali-soluble resin, an infrared absorber and a long-chain alkyl group-containing polymer, and is capable of forming an image by infrared irradiation;... Agent: Sughrue Mion, PLLC

20070026340 - Method of removing photoresist and photoresist rework method: A method of removing photoresist is provided. In the whole process of removing the photoresist, plasma is not used. Instead, a first solution is used in a first removal step to remove a photoresist layer. Then, a second solution is used in a second removal step to completely remove the... Agent: Jianq Chyun Intellectual Property Office

20070026339 - Negative resists based on a acid-catalyzed elimination of polar molecules: The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and... Agent: Mintz, Levin, Cohn, Ferris, Glovsky And Popeo, P.c

20070026341 - Resist protective coating material and patterning process: A resist protective coating material is provided comprising an α-trifluoromethylacrylic acid/norbornene copolymer having cyclic perfluoroalkyl groups as pendant. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable in alkaline developer and immiscible with the resist film, allowing for effective implementation of... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070026345 - Use of supercritical fluid to dry wafer and clean lens in immersion lithography: Disclosed are immersion lithography methods and systems involving irradiating a photoresist through a lens and an immersion liquid of an immersion lithography tool, the immersion liquid in an immersion space contacting the lens and the photoresist; removing the immersion liquid from the immersion space; charging the immersion space with a... Agent: Amin, Turocy & Calvin, LLP

20070026346 - Cleaning solution for lithography: Provided is a cleaning solution for lithography comprising (A) from 5 to 100% by mass of a lower alkyl ketone and (B) from 95 to 0% by mass of γ-butyrolactone which is a cleaning solution capable of exhibiting universally good cleaning power to a photoresist of an ArF formulation, for... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070026347 - Method for fabricating thin film transistor and pixel structure: A method for fabricating a TFT is provided. First, a poly-silicon layer is formed over a substrate. A photoresist layer is formed on the poly-silicon layer, wherein the photoresist layer has a pattern for exposing parts of the poly-silicon layer, and the pattern has a varied thickness. The poly-silicon layer... Agent: J.c. Patents, Inc.

20070026348 - Black and white photothermographic material and image forming method: m

20070026349 - Photothermographic material: The invention provides a photothermographic material having, on both sides of a support, an image forming layer including at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, which is to be exposed with X-rays using a fluorescent intensifying screen, wherein (1) a... Agent: Taiyo Corporation