Radiation imagery chemistry: process, composition, or product thereof inventions 01/07

20070020530 - Methods of producing diffractive structures in security documents: Various methods of producing a security document or article including a diffractive optical microstructure are disclosed. One method includes applying an opacifying layer (102) to at least one surface of a transparent substrate (100). An area of the opacifying layer (102) is exposed to laser radiation (108) to ablate apertures... Agent: Andrus, Sceales, Starke & Sawall, LLP

20070020536 - Laser beam pattern mask and crystallization method using the same: A laser beam pattern mask includes at least one or more transmitting parts, each transmitting part having a central portion and a pair of edge portions provided to both sides of the central portion, each having a substantially triangular shape defined by a virtual boundary line between the central portion... Agent: Mckenna Long & Aldridge LLP

20070020532 - Method for designing photomask: The present invention provides a method for designing a mask. First, a main pattern including at least a strip pattern is formed on the mask substrate. A shift feature is added to one end of the strip pattern of the main pattern. Either the phase shift or the optical transmission... Agent: Jianq Chyun Intellectual Property Office

20070020535 - Method of forming a pattern using a polarized reticle in conjuction with polarized light: Polarized reticles, photolithography systems utilizing a polarized reticle, and methods of using such a system are disclosed. A polarized reticle is formed having a reticle containing at least one first patterned region at least partially surrounded by at least one second patterned region. The first patterned region of the polarized... Agent: Trask Britt

20070020533 - Method of manufacturing rim type of photomask and photomask made by such method: A method of forming a rim type of photomask prevents a chrome pattern formed in the 0°-phase shift region of the mask substrate from being irregular and hence, ensures that the border of the 0°-phase shift region has a uniform width. First, a light blocking layer is formed on a... Agent: Volentine Francos, & Whitt PLLC

20070020531 - Phase shift mask for patterning ultra-small hole features: A phase shift mask includes a light transparent substrate; an opaque material layer coated on the main surface of the light transparent substrate, wherein the opaque material layer has an window opening exposing a light transparent area of the light transparent substrate; a cruciform first phase shifting region of the... Agent: North America Intellectual Property Corporation

20070020534 - Photomask blank, photomask and fabrication method thereof: A light-shielding film for exposure light is formed on one principal plane of a transparent substrate made of quartz or the like that serves as a photomask substrate. The light-shielding film can serve not only as the so-called “light-shielding film” but also as an anti-reflection film. In addition, the light-shielding... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070020537 - Exposure apparatus correction system, exposure apparatus correcting method, and manufacturing method of semiconductor device: An exposure apparatus correction system comprising: a displacement calculator which calculates matching displacements between a first inspection pattern and a second inspection pattern, the first inspection pattern being transferred by an external first exposure apparatus, the second inspection pattern being positioned with respect to the first inspection pattern and transferred... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070020538 - Electrophotographic image forming apparatus for printing photographic image and method for printing photographic image using the same: An electrophotographic image forming apparatus for printing a photographic image and a photographic image printing method by using the same are provided. The electrophotographic image forming apparatus for printing a photographic image includes a photosensitive medium having a surface on which a color-image electrostatic latent image and a transparent-image electrostatic... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.

20070020539 - Imaging member: Provided are a silane-phenol compound, a crosslinked siloxane outmost protective layer thereof, and an electrophotographic imaging member such as photoreceptor. The silane-phenol compound comprises (i) a phenol group and (ii) a silane group selected from the group consisting of alkoxysilyl, arylalkoxysilyl, aryloxysilyl, alkylaryloxysilyl, and combination thereof. The crosslinked siloxane outmost... Agent: Fay, Sharpe, Fagan, Minnich & Mckee, LLP

20070020540 - Silane-phenol compound, overcoat formulation, and electrophotographic imaging member: Provided are a silane-phenol compound, a crosslinked silxoane-phenolic protective overcoat layer thereof, and an electrophotographic imaging member such as photoreceptor. The silane-phenol compound comprises (i) a phenol group and (ii) a silane group selected from the group consisting of alkoxysilyl, arylalkoxysilyl, aryloxysilyl, alkylaryloxysilyl, and combination thereof. The silicone overcoat is... Agent: Fay, Sharpe, Fagan, Minnich & Mckee, LLP

20070020541 - Electrostatic latent image developing toner, manufacturing method for electrostatic latent image developing toner, electrostatic latent image developing developer, and image forming method: The present invention provides an electrostatic latent image developing toner including a binding resin having an acidic polar group, a magnetic powder, and a carboxylic acid group-containing compound, the toner having a shape factor (SF1) of 110 to 140, wherein the carboxylic acid group-containing compound has a weight-average molecular weight... Agent: Oliff & Berridge, PLC

20070020542 - Emulsion aggregation, developer, and method of making the same: A polyester toner includes particles of a resin, a colorant, an optional wax, and a polyion coagulant, where the toner is prepared by an emulsion aggregation process.... Agent: Oliff & Berridge, PLC.

20070020545 - Black toner: A black toner particle for use in a printing toner, the particle comprising: a polymer: carbon black; and a plurality of different colored pigments; wherein the carbon black and pigments are dispersed in the polymer.... Agent: Hewlett Packard Company

20070020546 - Toner, developer including the toner, container containing the toner or the developer and method of producing the toner: A toner comprising toner particles comprising a first binder resin; a second binder resin different from said first binder resin and having a glass transition temperature of from 40 to 55 ° C.; a colorant; and a release agent, and a particulate resin material which is located on surface of... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070020547 - Mono azo iron complex compound, and charge controlling agent and toner using the same: t

20070020543 - Toner: The toner of the present invention, comprising a colored resin particle and an external additive, wherein said external additive contains a silica fine particle (A) having a Dv50/Dv10 of 1.8 or more, in which Dv10 represents a particle diameter at which a volume cumulative total from small particle diameter side... Agent: Armstrong, Kratz, Quintos, Hanson & Brooks, LLP

20070020544 - Method for preparing of non-magnetic monocomponent color toner having superior long term stability: The present invention relates to a non-magnetic monocomponent color toner composition and a method for preparing the same, and more particularly to a non-magnetic monocomponent color toner composition having a narrow charge distribution, good charging characteristics, good environmental independence, superior image characteristics, high transfer efficiency and long-term stability caused by... Agent: Cantor Colburn, LLP

20070020548 - Toner, production process for the same, and image forming method: To provide a toner production process in which at least radically polymerizable monomers are polymerized in at least one of a supercritical fluid and a subcritical fluid to thereby produce toner particles, wherein a polymer of the radically polymerizable monomers is insoluble in at least one of the supercritical fluid... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070020549 - Method of manufacturing toner, toner, and image forming method: A method of manufacturing a toner comprising the steps of: (i) forming oil droplets in an aqueous medium comprising a surfactant having a long chain hydrocarbon group and an acid group, the oil droplets comprising: (i-a) a polycarboxylic acid having two or more carboxyl groups, (1-b) a polyalcohol having two... Agent: Lucas & Mercanti, LLP

20070020550 - Toner for electrostatic image development and process for preparing the same: A process for preparing a toner for electrostatic image development, the process comprising the steps of: (S1) mixing an aqueous pigment dispersion with an aqueous resin particle dispersion containing two or more kinds of self-dispersible polyester resin particles as binder resins to prepare a mixture; and (S2) adding a polyvalent... Agent: Nixon & Vanderhye, PC

20070020552 - Carrier and developer for electrostatic image development, and image formation method and apparatus: The present invention provides a carrier for electrostatic image development, and a developer, an image formation method and an image formation apparatus using the carrier. The carrier is carrier particles. When the carrier particles each have a coating layer on a magnetic particle, the carrier has a total energy amount... Agent: Oliff & Berridge, PLC

20070020551 - Resin particle liquid dispersion for electrostatic image developing toner, electrostatic image developing toner, production method thereof, developer and image forming method: A resin particle liquid dispersion for an electrostatic image developing toner, comprising: an aqueous medium; and a resin particle dispersed in the aqueous medium to have a median diameter of 0.05 to 2.0 μm, the resin particle comprising a polycondensable polymer obtained by polycondensing polycondensable monomers, wherein a storage modulus... Agent: Oliff & Berridge, PLC

20070020553 - Toner preparation processes: A method of making toner particles, includes: mixing a latex emulsion, a colorant emulsion an optional was emulsion, and optional additives in a first reactor to form a slurry; discharging the slurry from the first reactor to a second reactor through a homogenizer; heating the slurry in the second reactor... Agent: Oliff & Berridge, PLC.

20070020554 - Toner process: A dual coagulant toner process comprising adding a first component comprising an ionic salt to a latex emulsion of resin having a colorant mixed therein, to form a latex emulsion; adding a second component comprising an organo-metallic aggregating agent to the latex emulsion by agitation at a temperature above a... Agent: Marylou J. Lavoie, Esq. LLC

20070020557 - New organic bottom antireflective polymer compositions: The present invention relates to bottom antireflective coating compositions, polymers useful in making such compositions, and their use in image processing by forming a thin layer between a reflective substrate and a photoresist coating.... Agent: Alan P. Kass Az Electronic Materials Usa Corp.

20070020556 - Photosensitive articles and related manufacturing process: A decorative photosensitive article having a design formed of a plurality of polyvinyl chloride plasticizers. At least one of the polyvinyl chloride plasticizers includes a photochromic pigment such that when exposed to light, the polyvinyl chloride plasticizer portion of the design having the photochromic pigment changes color, whereas the other... Agent: Kelly Lowry & Kelley, LLP

20070020555 - Photosensitive composition, photosensitive lithography plate and method for producing lithography plate: Disclosed is a light sensitive composition containing a compound A having a group capable of undergoing radical polymerization, a compound B having a group capable of undergoing cationic polymerization, a photopolymerization initiator C, and a polymer binder D, the light sensitive composition being characterized in that the photopolymerization initiator C... Agent: Frishauf, Holtz, Goodman & Chick, PC

20070020559 - Positive-type photosensitive resin composition and cured film manufactured therefrom: A positive-type photosensitive resin composition comprising component (A): an alkali-soluble resin having a functional group which undergoes heat crosslinking reaction with a compound of component (B), a functional group for film curing which undergoes thermoset reaction with a compound of component (C), and a number average molecular weight of 2,000... Agent: Oliff & Berridge, PLC

20070020558 - Process for the preparation of a photoresist solution: The invention relates to a process for the preparation of a photosensitive photoresist solution, characterized in that a novolak resin and a diazonaphthoquinonesulphonyl chloride are dissolved in a solvent from the group consisting of the photoresist solvents, a proportion of from 1 to 70 mol % of the phenolic hydroxyl... Agent: Frommer Lawrence & Haug

20070020560 - Limited play optical discs: An optical disc having machine-readable, information encoding features includes a coating comprising a dye irreversibly bleachable by light. The dye, once bleached, is operative to change the index of refraction of the dye to inhibit reading of the information encoding features.... Agent: Intellectual Property Group Fredrikson & Byron, P.A.

20070020561 - Manufacturing method and manufacturing apparatus for an optical data recording medium, and an optical data recording medium: A manufacturing method for an optical data recording medium having a substrate with at least one signal recording layer and a resin layer for passing light, the manufacturing method includes: coating a radiation-curable resin on the substrate; and forming the resin layer by curing at least a part of the... Agent: Wenderoth, Lind & Ponack L.L.P.

20070020562 - Optical information-recording medium, novel oxonol compound and method of recording information: An optical information-recording medium which contains a dye having at least two chromophores bonded to each other without any conjugated bond intervening between those chromophores.... Agent: Sughrue Mion, PLLC

20070020563 - Method for preparation of lithographic printing plate and lithographic printing plate precursor: A method for preparation of a lithographic printing plate comprising: exposing a lithographic printing plate precursor comprising a hydrophilic support, a photosensitive layer containing (A) a sensitizing dye having an absorption maximum in a wavelength range of from 350 to 450 nm, (B) a hexaarylbiimidazole compound, (C) a polymerizable compound,... Agent: Sughrue Mion, PLLC

20070020564 - Method for manufacturing photoresist having nanoparticles: An exemplary method for manufacturing photoresist includes the steps of: adding a metal salt into an aqueous solution, whereby the aqueous solution contains metallic ions (211); adding a sulfide containing sulfur ions (231) into the aqueous solution; adding a polymerizable surfactant (220) into the aqueous solution thereby forming metallic ion... Agent: Wei Te Chung Foxconn International, Inc.

20070020565 - Methods of fabricating a semiconductor device: Methods of fabricating a semiconductor device are provided. Methods of forming a finer pattern of a semiconductor device using a buffer layer for retarding, or preventing, bridge formation between patterns in the formation of a finer pattern below resolution limits of a photolithography process by double patterning are also provided.... Agent: Harness, Dickey & Pierce, P.L.C

20070020566 - Photothermographic material and image forming method: A photothermographic material having, on at least one side of a support, an image forming layer containing at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, wherein (1) the photosensitive silver halide comprises tabular grains having a mean aspect ratio of 2... Agent: Taiyo Corporation

20070015064 - Cr-capped chromeless phase lithography: A photolithographic mask is adapted for use in imparting a pattern to a substrate. The pattern comprises a plurality of features. At least one of the plurality of features (201) is implemented in the mask as a phase shifting structure (205) with a unitary layer of opaque material (207) disposed... Agent: Fortkort Grether & Kelton LLP

20070015069 - Crystallization mask, crystallization method, and method of manufacturing thin film transistor including crystallized semiconductor: A crystallization mask for laser illumination for converting amorphous silicon into polysilicon is provided, which includes: a plurality of transmissive areas having a plurality of first slits for adjusting energy of the laser illumination passing through the mask; and an opaque area.... Agent: Macpherson Kwok Chen & Heid LLP

20070015065 - Euv exposure mask blanks and their fabrication process, and euv exposure mask: The invention provides a mask blank for EUV exposure wherein a substrate is provided at its flank with an electrically conductive film unlikely to peel off in EUV exposure mask fabrication process steps, etc. and its fabrication process, and provide a mask for EUV exposure which is readily attachable to... Agent: Patenttm.us

20070015067 - Filter exposure apparatus, and device manufacturing method: A filter used for an exposure apparatus that exposes a plate using a light from a light source includes a light transmitting film configured to transmit the light from the light source, a first rod member that includes plural first rod members, and thermally contacts the light transmitting film, the... Agent: Morgan & Finnegan, L.L.P.

20070015066 - Mask for sequential lateral solidification (sls) process and a method for crystallizing amorphous silicon by using the same: A mask for sequential lateral solidification (SLS) processes including at least one first window, one second window, one third window, and one fourth window is provided. Each window has a length extending longitude on the mask. The second window is aligned to the first window. The width of the first... Agent: Birch Stewart Kolasch & Birch

20070015068 - Method for producing transmissive screen, apparatus for producing transmissive screen, and transmissive screen: A method for producing a transmissive screen which includes a lens sheet having a lens formed on one side and a light shielding layer formed on the other side, the light shielding layer having openings formed in regions at which light is condensed by the lens is provided. The method... Agent: Bell, Boyd & Lloyd, LLC

20070015070 - Manufacturing apparatus for oriented film, liquid crystal device, and electronic device: A manufacturing apparatus for manufacturing an oriented film, comprising: a film formation chamber; an evaporation section having an evaporation source, evaporating an oriented film material on the substrate by a physical vapor deposition, and forming the oriented film in the film formation chamber; a shielding plate arranged between the evaporation... Agent: Harness, Dickey & Pierce, P.L.C

20070015071 - Image forming apparatus for forming a color image, and image forming method for forming a color image: An image forming apparatus configured (a) to charge uniformly an image bearing member once, (b) to form a latent image including n levels of electric potential on the image bearing member with a single exposure, (c) to adhere a first toner on a portion of the image bearing member which... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070015072 - Imaging members: A silicone overcoat (SOC) layer having a crosslinked polysiloxane composition comprising a perfluoropolyether segment are disclosed. The polysiloxane composition is the product of the hydrolysis and condensation of a SOC formulation comprising a perfluoropolyether compound, an aromatic silicon-containing compound, and a silicon-containing hole transport compound. An electrophotographic imaging member having... Agent: Fay, Sharpe, Fagan, Minnich & Mckee, LLP

20070015073 - Imaging members: An electrophotographic imaging member having a thermoplastic charge transport layer comprising a charge transport compound, a polycarbonate polymer binder, a particulate dispersion, and a high boiler compatible organic liquid. The disclosed charge transport layer exhibits enhanced wear resistance, excellent photoelectrical properties, and good print quality.... Agent: Fay, Sharpe, Fagan, Minnich & Mckee, LLP

20070015074 - Electrostatic latent image bearer, and image forming method, image forming apparatus and process cartridge using the electrostatic latent image bearer: An electrostatic latent image bearer, comprising a substrate; a photosensitive layer overlying the substrate; and a protective layer overlying the photosensitive layer, wherein the protective layer includes a binder resin comprising a polyol, a polyisocyanate and an organic silicon compound having a hydroxyl or a hydrolyzable group.... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070015075 - Readily deinkable toners: Broadly the invention provides for a deinkable toner composition, an image made with the deinkable toner, and a method for making the toner including a coloring agent; a thermoplastic polymer; and a protein. In another embodiment the toner includes a coloring agent and a thermoplastic polymer where the protein has... Agent: Frost Brown Todd, LLC

20070015076 - Method of manufacturing toner, toner, and image forming method: Disclosed is a method of manufacturing toner possessing the steps of conducting a polymerization process for acquiring wax-containing polyester resin particles via condensation-polymerization of carboxylic acid and alcohol employing oil droplets after forming the oil droplets made of wax and a polymerizable monomer containing at least one kind of carboxylic... Agent: Squire, Sanders & Dempsey L.L.P.

20070015077 - Toner, developer, image forming method, and toner container: A toner is provided manufactured by a method having the steps: dispersing toner constituents including a resin, in an aqueous medium containing a particulate resin, wherein the resin has a polyester skeleton formed by a ring-opening addition reaction of a cyclic ester with a first compound having an active hydrogen... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070015078 - Carrier for electrophotography, developer using the same, and developer container, image forming method, image forming apparatus, and process cartridge: The object of the present invention is to provide a carrier for electrophotography which includes a core material and a coating layer comprising particles on a surface of the core material, in which the carrier for electrophotography comprises indium (In) in an amount of 0.0001% by mass to 0.5% by... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070015079 - Laser induced thermal imaging business models and methods: Various processes and models are provided for laser induced thermal imaging for use in manufacturing display elements. The processes and models set forth criteria for manufacture and delivery of donor film for use in laser induced thermal imaging, and licensing of related information for an imaging process using the donor... Agent: 3m Innovative Properties Company

20070015083 - Antireflective composition and process of making a lithographic structure: wherein 1≦x≦2; 1≦y≦5; 1≧0; m>0; n>0; R is a chromophore, M is a metal selected from Group IIIB to Group VIB, lanthanides, Group IIIA, Group IVA except silicon; and L is an optional ligand. The invention is also directed to a process of making a lithographic structure including a silicon-metal... Agent: Connolly Bove Lodge & Hutz LLP

20070015084 - Photoactive compounds: The present application relates to a compound of formula A-X-B, where (i) A-X-B form an ionic compound Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula Q-R500—SO3− or (ii) A-X-B form a non-ionic compound Ac-Xc-Bc, where Ai, Bi,... Agent: Alan P. Kass Az Alectronic Materials Usa Corp.

20070015080 - Photoresist composition for imaging thick films: The present invention provides for a light-sensitive photoresist composition useful for imaging thick films, comprising a polymer which is insoluble in an aqueous alkali developer but becomes soluble prior to development, a photoacid generator which produces a strong acid upon irradiation and a photobleachable dye. The invention further provides for... Agent: Sangya Jain Az Electronic Materials Usa Corp.

20070015087 - Photosensitive composition: A photosensitive composition comprising: (A) a sensitizing dye selected from the group consisting of compounds represented by formulae (1) and (2) defined herein; (B) an initiator compound capable of generating a radical, an acid or a base; and (C) a compound capable of changing irreversibly its physical or chemical property... Agent: Sughrue Mion, PLLC

20070015086 - Photosensitive composition, photosensitive planographic printing plate material, and image forming method of photosensitive planographic printing plate material: A photosensitive composition containing: (A) a polymerizable compound containing an ethylenic double bond in the molecule; (B) a photopolymerization initiator; (C) a polymer binder; and (D) a dye exhibiting a maximum absorption wavelength of 350-450 nm, wherein the dye is represented by Formula (1):... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070015085 - Planographic printing plate material and method of forming visible image: A planographic printing plate material comprising a substrate having a hydrophilic surface and a thermosensitive image formation layer on the hydrophilic surface, the thermonsensitive image formation layer being capable of changing from hydrophilic to hydrophobic by applying heat or light, wherein an electron donating color former and a water soluble... Agent: Cantor Colburn, LLP

20070015081 - Polycarbonate compositions having infrared absorbance, method of manufacture, and articles prepared therefrom: A composition is disclosed, comprising a polycarbonate resin, an inorganic infrared shielding additive, and carbon black, wherein an article prepared from the composition has the inorganic infrared shielding additive present at about 0.01 to about 1.0 grams per square meter, and carbon black present at about 0.001 to about 2.0... Agent: Cantor Colburn, LLP

20070015082 - Process of making a lithographic structure using antireflective materials: A lithographic structure comprising: an organic antireflective material disposed on a substrate; and a silicon antireflective material disposed on the organic antireflective material. The silicon antireflective material comprises a crosslinked polymer with a SiOx backbone, a chromophore, and a transparent organic group that is substantially transparent to 193 nm or... Agent: Connolly Bove Lodge & Hutz LLP

20070015088 - Method for lithographically printing tightly nested and isolated hole features using double exposure: A mask pattern including a group of small-pitched contact hole features with pitch being less than a predetermined value and isolated contact hole features with pitch being greater than the predetermined value is provided. The mask pattern is split into two sub-mask patterns, one having about half of the group... Agent: North America Intellectual Property Corporation

20070015089 - Method of making a semiconductor device using a dual-tone phase shift mask: A method for making a semiconductor device is provided which comprises (a) providing a source of actinic radiation (601), (b) providing a reticle comprising (i) a substrate having a plurality of structures defined therein, said substrate being essentially transparent to the actinic radiation, and (ii) a layer of attenuating material... Agent: Fortkort Grether & Kelton LLP

20070015090 - Method of manufacturing a microlens substrate, a microlens substrate, a transmission screen, and a rear projection: A method of manufacturing a microlens substrate 1 is disclosed. The microlens substrate 1 is composed of a base substrate 4 having two major surfaces and having light transparency and a lens portion 2 having a plurality of microlenses 21. The lens portion 2 is provided on one of the... Agent: Harness, Dickey & Pierce, P.L.C

20070015091 - Photoconductive sheet and radiation imaging panel: A photoconductive layer for use in a radiation imaging panel which records an electrostatic latent image representing a radiographic image, formed of a bismuth-mixed metal oxide Bi12MO20 so as to exhibit a first light reflectance at a first wavelength of 750 nm and a second light reflectance at a second... Agent: Sughrue Mion, PLLC

20070015092 - Color forming compositions: A radiation image-able material includes a base matrix material, a thermally activated marking material, and at least one colorant. A light activated contains (a) at least one color-forming compd. and (b) at least one color developer of the formula R1SO2NHXNHABR2 [R1=(substituted) Ph, naphthyl, or C1-20 alkyl; X═CNH, CS, or CO;... Agent: Hewlett Packard Company

20070015093 - Method for manufacturing printing plate: A method for manufacturing a printing plate is realizes a precise and fine pattern by minimizing a variation of etching critical dimension. The method includes forming a hard mask having an opening on an insulating substrate; forming a first trench having a first depth in the insulating substrate using the... Agent: Birch Stewart Kolasch & Birch

20070015094 - Electromagnetic wave shielding material, method for manufacturing the same and electromagnetic wave shielding material for plasma display panel: A method of manufacturing an electromagnetic wave shielding material comprising the steps of: (a) forming an image of metallic silver grains by conducting exposure and photographic processing to a silver halide photographic material comprising a support, at least one near-infrared absorption layer thereon, and a silver halide emulsion layer containing... Agent: Lucas & Mercanti, LLP

20070015095 - Photothermographic material: wherein M represents a metal atom, R1, R4, R5, R8, R9, R12, R13 and R16 respectively represent a hydrogen atom or a substituent where at least one of R1, R4, R5, R8, R9, R12, R13 and R16 is an electron attractive group and R2, R3, R6, R7, R10, R11, R14... Agent: Taiyo Corporation

20070009807 - Volume hologram photosensitive composition: This invention provides a volume hologram photosensitive composition, which can realize a hologram having an excellent brightness and, at the same time, having excellent heat resistance and mechanical strength, and a photosensitive medium for volume hologram recording using the volume hologram photosensitive composition. The volume hologram photosensitive composition comprises at... Agent: Burr & Brown

20070009812 - Low-expansion glass substrate for a reflective mask and reflective mask: A low-expansion glass substrate for a reflective mask, wherein the glass substrate is suited for a base material of a reflective mask employed in a lithographic process in semiconductor fabrication, comprises a lateral surface, a chamfered portion and a notched portion formed along an outer periphery thereof, at least one... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070009811 - Mask pattern inspection method, exposure condition verification method, and manufacturing method of semiconductor device: A mask pattern inspection method includes: transferring a mask pattern onto a conductor substrate or a semiconductor substrate; preparing a sample including a substrate surface pattern in an electrically conductive state to the substrate, the substrate surface pattern being constituted of a convex pattern or a concave pattern each having... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070009810 - Phase shifter film and process for the same: In the formation of a halftone type phase shift mask, a reactive gas introduction inlet and an inert gas introduction inlet are provided so as to introduce the respective gases separately and by using a reactive low throw sputtering method a molybdenum silicide based phase shifter film is formed. Thereby,... Agent: Mcdermott Will & Emery LLP

20070009809 - Synthetic nanoparticle soil materials: The present invention relates to synthetic nanoparticle soil materials that comprises about 0.5% to about 20% metal powder by mass, and about 0.5% to about 30% mineral powder by mass, mixed together with quartz-rich sand and a polymorph mineral of aluminum silicate, creating a sand mixture that may be mixed... Agent: George Mason University Office Of Technology Transfer, Msn 5g5

20070009808 - Systems, masks, and methods for manufacturable masks: Photomask patterns are represented using contours defined by mask functions or other formats. Given target pattern, contours may be optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimized patterns or blocks may be simplified for mask manufacturing.... Agent: Wilson Sonsini Goodrich & Rosati

20070009813 - Method of manufacturing liquid crystal display device: A plurality of display areas are formed on an array substrate by stepper exposure. The array substrate is divided into array shot areas serving as shot units at the time of divided exposure. One display area is divided into four array shot areas. One array shot area is provided with... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070009816 - Method and system for photolithography: A transparent optical element in a region between a photo mask and a light source of a photolithographic apparatus is provided having a plurality of attenuating elements being arranged in accordance with a first intensity correction function. The first intensity correction function is calculated from variations of characteristic feature size... Agent: Slater & Matsil LLP

20070009814 - Method for calibrating or qualifying a lithographic apparatus or part thereof, and device manufacturing method: A system and method are provided for qualifying or calibrating lithographic apparatus or parts therefor, using a predetermined objective criterion such as Chauvenet's criterion is used to reject measurement points, individually, by field or by substrate.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070009815 - Method of wafer edge exposure: In an embodiment, a method of wafer edge exposure includes sensing a reference position of a wafer edge exposure. A boundary for the edge exposure is set at a predetermined distance from the reference position, and then the edge region of the wafer is exposed. A first boundary for the... Agent: Marger Johnson & Mccollom, P.C.

20070009817 - Semiconductive belt, method of manufacturing and electrophotographic imaging apparatus including the belt: A semiconductive belt for an electrophotographic imaging apparatus contains a side-chain liquid crystalline polymer and a liquid conductive polymer. A method of manufacturing the semiconductive belt pelletizes a mixture of a side-chain liquid crystalline polymer and a liquid conductive polymer and extrudes the mixture through a double bubble tubular injection... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.

20070009818 - Electrophotographic photoreceptor and method of preparing the photoreceptor, and image forming method, image forming apparatus and process cartridge therefor using the photoreceptor: An electrophotographic photoreceptor, including at lest an electroconductive substrate and a photosensitive layer including at least a tri- or more functional radical polymerizing monomer having no charge transport structure and a monofunctional radical polymerizing compound having a charge transport structure, wherein the photosensitive layer includes radical polymerizing functional groups in... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070009819 - Novel compound, and electrophotographic photoreceptor and electrophotographic apparatus made by using the same:

20070009820 - Display device and method of assembling the display device: A display device includes: a reflection plate; plural light sources disposed above the reflection plate; an optical member disposed above the plural light sources; a support member disposed standing on a bottom surface of the reflection plate; a frame member that houses the reflection plate and the light sources; and... Agent: Stanley P. Fisher Reed Smith LLP

20070009821 - Devices containing multi-bit data: Cross-point memory array devices containing an electric field programmable film with data stored in multi-bit format are provided. Also provided are data processing devices comprising cross-point memory array devices with data stored in multi-bit format. Further provided are methods of storing multi-bit data in cross-point memory array devices and methods... Agent: Rohm And Haas Company Patent Department

20070009822 - Toner for developing electrostatic latent image and production method thereof, electrostatic latent image developer, image forming method, and image forming apparatus: The invention provides a toner for developing electrostatic latent images containing at least a binder resin, a colorant, a releasing agent, and a graft polymer that has been made by graft polymerization of a resin matrix and a macromonomer including at least one group selected from the group consisting of... Agent: Oliff & Berridge, PLC

20070009823 - Toner and developer compositions: A toner composition includes toner particles of at least a resin, a wax, and a colorant, and external additives applied on an exterior surface of the toner particles, including silica, titania, and spacer particles.... Agent: Oliff & Berridge, PLC.

20070009824 - Electrostatic charge image developing toner: The toner for developing an electrostatic latent images of the present invention, comprising colored resin particles containing at least a binder resin and a colorant wherein said colored resin particles have a volume average particle diameter (Dv) in the range from 4 to 10 μm and an average circularity in... Agent: Armstrong, Kratz, Quintos, Hanson & Brooks, LLP

20070009825 - Bisstyryl compound and high density recording media utilizing the same: wherein Z1 and Z2 are benzene, naphthalene, or heterocyclic ring, R1 is H, C1-5 alkyl, hydroxyl, halogen atoms, or alkoxy, R2 is H, halogen atoms, C1-5 alkyl, nitro, ester, carboxyl, sulfo, sulfonamide, sulfuric ester, amide, C1-3 alkoxy, amino, alkylamino, cyano, C1-6 alkylsulfonyl, or C2-7 alkoxy carbonyl, R3, R4, R5, and... Agent: Birch Stewart Kolasch & Birch

20070009826 - Manufacturing method for donor film with improved surface roughness: A manufacturing method using an additional heat-treatment process for a donor film with improved surface roughness. The improved donor film, used in a laser induced thermal imaging method, is capable of enhancing the lifetime of products and reducing the defect rates thereof. A manufacturing method for a donor film according... Agent: Christie, Parker & Hale, LLP

20070009827 - Lamination and delamination technique for thin film processing: This invention discloses a releasable adhesion layer having good adhesion during high temperature fabrication process in the absence of light, and delaminating at a lower temperature in the presence of light. One embodiment of this invention is a film of polymer whose thermal decomposition temperature changes drastically upon photoexposure. These... Agent: Tue Nguyen

20070009832 - Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process: Silicon compounds having fluorinated hemiacetal structure are provided. Silicone resins having the same structure have an appropriate acidity to enable formation of a finer pattern by minimizing the pattern collapse by swelling, exhibit improved resistance to the etching used in the pattern transfer to an organic film, and are thus... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070009829 - Laser sensitive lithographic printing plate having a darker aluminum substrate: A laser sensitive lithographic printing plate comprises an electrochemically grained, anodized, hydrophilically treated aluminum substrate with a reflection optical density of 0.30 or higher; a free radical polymerizable photosensitive layer; and a water soluble or dispersible overcoat. The photosensitive layer comprises a polymeric binder, a free radical polymerizable monomer, a... Agent: Gary Ganghui Teng

20070009833 - Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same: A photoresist composition, a method for forming a film pattern using the photoresist composition, and a method for manufacturing a thin film transistor array panel using the photoresist composition are provided. In one embodiment, a photoresist composition includes an alkali-soluble resin, a photosensitive compound, and an additive, for advantageously providing... Agent: Macpherson Kwok Chen & Heid LLP

20070009831 - Planographic printing plate material and image formation method: Disclosed is a planographic printing plate material comprising an aluminum support and provided thereon, a light sensitive layer containing an acid-generating agent composition generating an acid on violet laser beam exposure, a cationically polymerizable monomer which polymerizes by action of an acid, and an alkali-soluble polymeric binder, wherein the light... Agent: Lucas & Mercanti, LLP

20070009828 - Positive resist composition, resist laminates and process for forming resist patterns: A positive resist composition, comprising a resin component (A) that exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure, wherein the component (A) includes either a silsesquioxane resin (A1) containing structural units (a1) represented by a general formula (I)... Agent: Knobbe Martens Olson & Bear LLP

20070009830 - Underlayer compositons containing heterocyclic aromatic structures: A composition suitable for use as a planarizing underlayer in a multilayer lithographic process is disclosed. The inventive composition comprises a polymer containing heterocyclic aromatic moieties. In another aspect, the composition further comprises an acid generator. In yet another aspect, the composition further comprises a crosslinker. The inventive compositions provide... Agent: Scully Scott Murphy & Presser, PC

20070009834 - Photosensitive thermosetting resin composition, and photosensitive cover lay and flexible printed wiring board using the composition: An object of the present invention is to provide a photosensitive thermosetting resin composition that has a long shelf life and has excellent normal temperature storage stability, has good solder heat resistance after curing, and according to which high adhesive strength can be maintained. The present invention provides a photosensitive... Agent: Gardner Carton & Douglas LLP Attn: Patent Docket Dept.

20070009837 - Electronic substrate and its manufacturing method, electro-optical device manufacturing method, and electronic apparatus manufacturing method: An electronic substrate manufacturing method includes: forming a wiring pattern on a substrate; providing a mask with an opening for the substrate on which the wiring pattern has been formed; performing a specified treatment in a part area of the wiring pattern through the opening of the mask. The opening... Agent: Harness, Dickey & Pierce, P.L.C

20070009836 - Method of manufacturing semiconductor device: A method of manufacturing a semiconductor device includes: (A) providing a wafer to which a photo-resist is applied; (B) forming a reacted portion in the photo-resist by exposing the wafer to a light through a mask having a translucent section, the reacted portion being a portion reacted with the light;... Agent: Foley And Lardner LLP Suite 500

20070009835 - Solvent for printing, pattern composition for printing comprising the solvent, and patterning method using the composition: Disclosed is a solvent for printing which comprises a first solvent selected from the group consisting of acetone, methyl ethyl ketone, methyl acetate, ethyl acetate, methanol and mixtures thereof, and a second solvent selected from the group consisting of propylene glycol monomethyl ether acetate (PGMEA), propylene glycol monomethyl ether (PGME),... Agent: Brinks Hofer Gilson & Lione

20070009840 - Method of fabricating a semiconductor device: A method of fabricating a semiconductor device comprising a method of forming an etching mask used for etching a semiconductor base material is disclosed. The method of fabricating a semiconductor device comprises forming hard mask patterns on a semiconductor base material; forming material layers covering the lateral and top surfaces... Agent: Volentine Francos, & Whitt PLLC

20070009838 - Method of manufacturing a pattern structure and method of forming a trench using the same: A method of manufacturing a pattern structure and a method of forming a trench using the same are provided. A mask pattern structure having mask patterns spaced apart from one another may be formed on a layer. The mask pattern structure may be divided into a first region having a... Agent: Harness, Dickey & Pierce, P.L.C

20070009839 - Pattern forming method, film forming apparatus and pattern forming apparatus: A pattern forming method for forming a predetermined pattern on a substrate includes the steps of supplying a developer to a photosensitive film coating the substrate and having a latent image of the pattern formed thereon, to form a pattern of the photosensitive film, replacing the developer with a rinsing... Agent: Ostrolenk Faber Gerb & Soffen

20070009841 - Semiconductor fabrication apparatus and pattern formation method using the same: The semiconductor fabrication apparatus of this invention includes an exposure section provided within a chamber for exposing a design pattern on a resist film applied on a wafer, and a liquid recycle section for supplying, onto the wafer, a liquid for use in immersion lithography for increasing the numerical aperture... Agent: Mcdermott Will & Emery LLP

20070003839 - $m(c)method for producing inclined flank patterns by photolithography: The invention concerns a photolithography fabrication method enabling production of patterns in a photosensitive resin layer (601) placed on a substrate (600). The patterns (607) comprise flanks (608) inclined relative to a normal ({right arrow over (n)}) relative to the principal plane of the substrate and which have an angle... Agent: Thelen Reid & Priest, LLP

20070003843 - Defect inspection method for a glass substrate for a mask blank, glass substrate for a mask blank, mask blank, exposure mask, method of producing a glass substrate for a mask blank, method of producing a mask blank, and method of producing an exposure mas: On inspecting a glass substrate for a mask blank which substrate has surfaces including one end face, the glass substrate is prepared to have the one end face which has a chamfered surface and a remaining surface serving as a side surface. The chamfered surface of the one end face... Agent: Sughrue Mion, PLLC

20070003841 - Double exposure method and photomask for same: A double exposure method forms first and second patterns on a cell region and a peripheral circuit region of a wafer, respectively. The method comprises performing a primary exposure through two-beam imaging of 0 order light and −1 order light or +1 order light using a photomask to form the... Agent: Townsend And Townsend And Crew, LLP

20070003840 - Focus determination method, device manufacturing method, and mask: One or more focus settings for use in a device manufacturing method is determined by printing a plurality of target markers at different focus settings and using a scatterometer, e.g. off-line, to measure a property of the target markers that is indicative of focus.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070003844 - Method for adjusting dimensions of photomask features: A method for adjusting one or more dimensions of a photomask subsequent to etching of a defective pattern in the chrome-containing layer thereof is provided. The method includes subjecting the chrome-containing layer of a photomask to a wet etch process utilizing a solution comprising deionized water and ozone. The length... Agent: Trask Britt

20070003842 - Software sequencer to dynamically adjust wafer transfer decision: A method of operating a track lithography tool. The track lithography tool is adapted to process a plurality of substrates according to a recipe, the recipe including a plurality of process steps and a plurality of transfer steps. The method includes determining a process time associated with a time critical... Agent: Townsend And Townsend And Crew LLP / Amat

20070003845 - Color filter substrate and fabricating method thereof: A color filter substrate including a substrate, a black matrix, a plurality of color filter patterns and a common electrode is provided. The substrate has a plurality of pixel regions thereon. The black matrix comprises a plurality of strip patterns, wherein the strip patterns are disposed between the pixel regions... Agent: Jianq Chyun Intellectual Property Office

20070003846 - Liquid crystal display device without bad pixel and method for removing bad pixel therefrom: A liquid crystal display (LCD) device and method for addressing a defective pixel of the liquid crystal display (LCD) device, are discussed. According to an embodiment, the method includes forming a black resin film on at least one LCD panel; operating the LCD panel to selectively harden a portion of... Agent: Birch Stewart Kolasch & Birch

20070003847 - Protective layer for reimageable medium: A reimageable recording medium includes a substrate, a display layer, and a protective layer. The protective layer comprises a microencapsulated diarylethene material that is capable of switching between a UV absorbing and UV transparent state. During an imaging process, the protective layer is switched from a UV absorbing state to... Agent: Fay, Sharpe, Fagan, Minnich & Mckee, LLP

20070003848 - Image forming method, a processing cartridge and an image forming method using the same: An image forming method is disclosed, the method includes forming a latent image by irradiating an organic photoreceptor by a semiconductor laser or a light emission diode emitting light of a wavelength of from 350 to 500 nm, and developing the latent image by a developer containing a toner to... Agent: Squire, Sanders & Dempsey L.L.P.

20070003849 - Image input apparatus for forming a composite image based on a photoelectric conversion signal and a saturation signal: At least one exemplary embodiment is directed to an image input apparatus including a plurality of pixel sections, each including a light-sensitive element configured to generate electric charge by photoelectric conversion, a semiconductor region configured to receive a signal transferred from the light-sensitive element, and a transfer switch configured to... Agent: Canon U.s.a. Inc. Intellectual Property Division

20070003850 - Curable resin composition, electrophotographic photoreceptor, process cartridge, and image-forming apparatus: A curable resin composition for use as a constituting material of an electrophotographic photoreceptor, comprises: a phenolic resin; a charge transportable material having a reactive functional group; and at least one of an organic sulfonic acid and its derivative.... Agent: Oliff & Berridge, PLC

20070003851 - Electrophotographic photosensitive member, and process cartridge and electrophotographic apparatus which have the electrophotographic photosensitive member: An electrophotographic apparatus is disclosed using an electrophotographic photosensitive member which employs light with a short wavelength (380 nm to 500 nm) as image exposure light and is good in photoelectric conversion efficiency on the whole at that wavelength. The electrophotographic photosensitive member is composed of a reflecting layer, a... Agent: Fitzpatrick Cella Harper & Scinto

20070003852 - Cyanoresin polymers and electrophotographic imaging members containing cyanoresin polymers: Cyanoresin polymer reaction products of a hydroxyl-containing polymers and acrylonitrile, where at least one side chain group of the cyanoresin polymer is a cyano group, and electropotographic imaging members containing cyanoresin polymers.... Agent: Oliff & Berridge, PLC.

20070003853 - Image forming method, photoreceptor: An image forming method comprising the steps of; forming a latent image by exposing an organic photoreceptor to light, and developing the latent image by a developer containing a toner to form a toner image, wherein the organic photoreceptor has a surface layer comprising a binder and fluororesin fine particles... Agent: Squire, Sanders & Dempsey L.L.P.

20070003854 - Two-component developer for developing electrostatic latent image: In order to provide a two-component developer, which suppresses deterioration of charging performance with time of a carrier as a surface treating agent of a toner, caused by adhesion of the toner onto the surface of the carrier, and also has long lifetime and is excellent in durability, a carrier... Agent: Smith, Gambrell & Russell

20070003855 - Toner containing silicate clay particles for improved relative humidity sensitivity: Toner particles, preferably emulsion aggregation toner particles, have improved relative humidity sensitivity through inclusion therein of silicate clay particles such as kaolin clay. The toner particles include a binder, preferably an acrylate-containing binder, at least one colorant, and silicate clay particles distributed in the binder. In a core-shell embodiment, the... Agent: Oliff & Berridge, PLC.

20070003856 - Ultra low melt toners having surface crosslinking: Ultra low melt toner compositions with improved non-additive heat cohesion are disclosed. These toner compositions include toner particles comprising amorphous resins containing at least one unsaturated moiety, and when the toner particles are surface treated with a peroxy compound and optionally with a peroxy promoter compound, the surface of the... Agent: Oliff & Berridge, PLC.

20070003857 - Process for preparing black toner for electrophotography: A process for preparing a black toner for electrophotography, including the steps of (I) melt-kneading a raw material mixture containing a resin binder and a black colorant with an open-roller type kneader; (II) cooling the melt-kneaded mixture obtained in the step (I) and pulverizing the cooled mixture; and (III) classifying... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070003858 - Toner, toner producing method, and image forming method: A toner is provided for forming an image on a sheet of ordinary paper using a small amount of toner which is favorable in the density, less in the difference in reflection between toner layers thereof in each color. Even when the toner is small in the consumption, its image... Agent: Nixon & Vanderhye, PC

20070003859 - Photoresist stripping solution and a method of stripping photoresists using the same: A photoresist stripping solution comprising (a) a carboxyl group-containing acidic compound, (b) at least one basic compound (for example, monoethanolamine, tetraalkylammonium) selected from among alkanolamines and specific quaternary ammonium hydroxides, (c) a sulfur-containing corrosion inhibitor and (d) water, and having a pH value of 3.5-5.5; and a method of stripping... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070003863 - Antireflective hardmask composition and methods for using same: wherein A is a bivalent radical selected from the group consisting of carbonyl, oxy, alkylene, fluoroalkylene, phenyldioxy, and any combination thereof; R1 and R2 are each independently a bivalent radical selected from the group consisting of an alkylene, an arylene, and any combination thereof; and x, y, and z are... Agent: Myers Bigel Sibley & Sajovec

20070003864 - Compositions and methods for image development of conventional chemically amplified photoresists: Methods for carrying out lithography with a carbon dioxide development system are described. This invention involves methods for preferential removal of the darkfield region of conventional chemically amplified positive tone resists. The carbon dioxide development systems include one or more derivatizing agents, which may be an onium salt or a... Agent: Myers Bigel Sibley & Sajovec

20070003870 - Heat-sensitive lithographic printing plate precursor: t

20070003869 - Heat-sensitive lithographic printing plate-precursor:

20070003865 - Imaging methods: An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts.... Agent: John J. Piskorski Rohm And Haas Electronic Material LLC

20070003866 - Photosensitive composition, photosensitive planographic printing plate material, and image forming method of the same: A photosensitive composition comprising: (A) an addition-polymerizable compound containing an ethylenic double bond in the molecule; (B) an iron-arene complex which acts as a photopolymerization initiator; (C) a polymer binder; and (E) a siloxane glycol copolymer.... Agent: Frishauf, Holtz, Goodman & Chick, PC

20070003871 - Positive photosensitive composition: A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.... Agent: Sughrue Mion, PLLC

20070003862 - Resist composition, method of forming resist pattern, semiconductor device and method of manufacturing thereof: The resist composition of the present invention contains at least one of a tannin and a derivative thereof. The method of forming a resist pattern of the present invention includes: forming a resist film on a surface of an object to be processed, by using the resist composition; and exposing... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070003867 - Resist protective coating material and patterning process: A resist protective coating material is provided comprising a polymer having a partial structure of formula (1) wherein R0 is H, F, alkyl or alkylene, and R1 is fluorinated alkyl or alkylene. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070003860 - Substrate adhesion improver for photosensitive resin composition and photosensitive resin composition containing the same: wherein R1 to R4 each independently represent a hydrogen atom, a halogen atom or a C1-5 alkyl group; R5 to R9 each independently represent a hydrogen atom, a hydroxyl group, a C1-10 alkyl group, an aryl group, a C7-12 aralkyl group, —R10COOR11, or —R10CO—(OCH2CH2)n-OH provided that at least one of... Agent: Az Electronic Materials Usa Corp. Attention: Industrial Property Dept.

20070003868 - Systems and methods for fabricating blanks for microstructure masters by imaging a radiation sensitive layer sandwiched between outer layers, and blanks for microstructure masters fabricated thereby: Microstructures are fabricated by imaging a microstructure master blank that includes a radiation sensitive layer sandwiched between a pair of outer layers, on an imaging platform, to define the microstructures in the radiation sensitive layer. At least one of the outer layers is then removed. The microstructures that were defined... Agent: Myers Bigel Sibley & Sajovec

20070003861 - Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same: wherein R1 and R2 are independently hydrogen, fluoro, methyl or fluoromethyl; R3 is a C1-10 hydrocarbon or a C1-10 hydrocarbon in which the hydrogen atoms are partly replaced by fluorine atoms; and a, b and c, representing the mole fraction of each monomer, are in the range between 0.05 and... Agent: Marshall, Gerstein & Borun LLP

20070003872 - Super resolution recording medium: A super-resolution medium having a stable carrier-to-noise ratio (CNR) includes a control layer that controls a super-resolution aperture region of a projected optical spot where a super-resolution phenomenon occurs.... Agent: Stein, Mcewen & Bui, LLP

20070003873 - Bis (indolestyryl) compound and high density recording media utilizing the same: wherein A and B comprise benzene, naphthalene, or heterocyclic ring containing O, S, or N, R1 and R1′ are H, halogen atoms, C1-5 alkyl, nitro, ester, carboxyl, sulfo, sulfonamide, amide, sulfo ester, C1-3 alkoxy, amino, alkylamino, cyano, C1-6 alkylsulfonyl, or C2-7 alkoxy carbonyl, R2, R2′, R3, and R3′ comprise H,... Agent: Birch Stewart Kolasch & Birch

20070003874 - Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system: Methods to reduce the write time for forming mask patterns having angled and non-angled features using electron beam lithography are disclosed. In one exemplary embodiment, non-angled features of the mask pattern are formed by exposure to an electron beam. The orientation of the substrate and a path of the generally... Agent: Trask Britt

20070003875 - Method for preparing a lithographic printing plate precursor: A method is disclosed wherein a positive-working heat-sensitive lithographic printing plate precursor is prepared comprising the steps of: (i) providing a support having a hydrophilic surface or which is provided with a hydrophilic layer, (ii) coating a first solution comprising a first polymer, said first polymer being soluble in an... Agent: Leydig Voit & Mayer, Ltd

20070003879 - Immersion lithography edge bead removal: A method of performing immersion lithography on a semiconductor wafer is provided. The method includes providing a layer of resist onto a surface of the semiconductor wafer. Next, an edge-bead removal process spins the wafer at a speed greater than 1000 revolutions per minute and dispenses solvent through a nozzle... Agent: Haynes And Boone, LLP

20070003877 - Inorganic semiconductive films and methods therefor: Inorganic semiconductive films are made by depositing a suitable precursor substance upon a substrate, irradiating the precursor substance with electromagnetic radiation to form a nascent film, and heating the nascent film at a predetermined temperature to form an inorganic semiconductive film.... Agent: Hewlett Packard Company

20070003876 - Microstructure and method for producing microstructures: Light-diffracting microstructures are produced by the superimposition of at least two relief structures, wherein the first relief structure is produced mechanically while at least one second relief structure is a photomechanically generated diffraction structure. A process for the production of light-diffracting microstructures which are additive superimpositions comprising a relief structure... Agent: Charles R Hoffmann Hoffmann & Baron

20070003880 - Negative photosensitive resin composition: A negative photosensitive resin composition comprising an alkali-soluble photosensitive resin (A) having acidic groups and having at least three ethylenic double bonds per molecule, an ink repellent (B) made of a polymer having polymerized units (b1) having a C20 or lower alkyl group in which at least one of its... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070003878 - Reduced pitch multiple exposure process: A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form an image having enhanced resolution.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070003881 - Method of manufacturing semiconductor device: A method of manufacturing a semiconductor device includes forming a plurality of dummy line patterns arranged at a first pitch on an underlying region, forming first mask patterns having predetermined mask portions formed on long sides of the dummy line patterns, each of the first mask patterns having a closed-loop... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070003882 - Photothermographic material, and image forming method using same: The present invention provides a photothermographic material comprising a substrate and a composition provided thereon. The composition includes a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent for thermal development and a binder. Each of organic compounds comprised in an amount of approximately 0.05 g/m2 or more... Agent: Taiyo Corporation

20070003883 - Developer for positive photosensitive composition: There is provided a developer for a positive photosensitive composition, which has a developing treatment capability enough to endure many times of use, is small in variations of a pH value for a long period of time, is excellent in durability, in particular has the developing capability enough to develop... Agent: Mcglew & Tuttle, PC

20070003885 - Black and white photothermographic material and image forming method: e

20070003884 - Photothermographic material:

20070003887 - Photothermographic material: A photothermographic material including, on one side of a support, an image forming layer containing at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent and a binder, and, on the other side of the support, a non-photosensitive back side layer. The total quantity of an... Agent: Taiyo Corporation

20070003886 - Silver salt photothermographic dry imaging material: A silver salt photothermographic dry imaging material wherein said material has photographic speeds (1) and (2) determined based on the predetermined conditions and the photographic speed (2) is not more than 1/10 of the photographic speed (1), and the coefficient of determination value R2 of the linear regression line is... Agent: Lucas & Mercanti, LLP