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Radiation imagery chemistry: process, composition, or product thereof inventions 12/06

Recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing format for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application.    12/28/2006 > 51 patent applications in 33 patent subcategories.

20060292453 - Hologram recording sheet, holographic optical element using said sheet, and its production process: The hologram recording sheet according to the invention is made up of a base film and hologram sensitive materials sensitive to different wavelength regions formed therein in a desired pattern, or a film and at least two hologram recording sensitive materials sensitive to different wavelength regions laminated on the film... Agent: Sughrue Mion, PLLC

20060292459 - Euv reflection mask and method for producing it: An EUV mask having elevated sections and trenches lying in between is disclosed. In one embodiment, the mask includes at least a substrate layer having a very low coefficient of thermal expansion, a multilayer, and a capping layer. The elevated sections of the EUV mask are arranged on a continuous... Agent: Dicke, Billig & Czaja, P.l.l.c.

20060292460 - Exposure method, exposure quantity calculating system using the exposure method and semiconductor device manufacturing method using the exposure method: An exposure method is disclosed, which comprises preparing a first mask in which a size of a mask pattern is measured in advance, calculating a first exposure quantity to be applied to the first mask to provide a first resist pattern by using the first mask, simulating optical intensity distributions... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20060292455 - Method for checking phase shift angle of phase shift mask, lithography process and phase shift mask: A method for checking a phase shift angle of a PSM is described. A calibration curve of a characteristic value of lithography performance with respect to the phase shift angle of a type of PSM is acquired. The patterns of a PSM of the type to be checked are transferred... Agent: Jianq Chyun Intellectual Property Office

20060292458 - Method of creating photo mask data, method of photo mask manufacturing, and method of manufacturing semiconductor device: A method of creating photo mask data includes preparing design data of a photo mask, generating drawing data of the photo mask by using the design data, generating inspection control information configured to control inspection of defect on the photo mask by using the drawing data, and generating drawing and... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20060292454 - Method of producing phase shift masks: A light-shielding film pattern 2a having a main opening 5 and auxiliary openings 6 is formed in a first process and, then, recess etching of a transparent substrate (formation of a substrate etched portion 8) is performed in a second process. Thus, the main opening and auxiliary openings can be... Agent: Sughrue Mion, PLLC

20060292456 - Reticle constructions, and methods for photo-processing photo-imageable material: The invention includes methods for photo-processing photo-imageable material. Locations of the photo-imageable material where flare hot spots are expected to occur are ascertained. A substantially uniform dose of light intensity is provided to at least the majority of the photo-imageable material other than the hot spot locations, and is not... Agent: Wells St. John P.s.

20060292457 - System for electrically connecting a mask to earth, a mask: A reticle includes an area provided with a conductive metal-based compound coating for electrically grounding the reticle. The reticle is suitable for use with a lithography apparatus whereby the reticle pattern is imaged using extreme ultra violet radiation. One or more conducting pins, held at zero potential, may be pressed... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20060292462 - Nir absorption and color compensating compositions: Disclosed herein is a composition for use as a film on an image display filter. In some embodiments, the composition includes a cyanine dye exhibiting an absorption maximum in the wavelength region from about 830 to about 880 nm or from about 580 to about 600 nm and an anthraquinone... Agent: Knobbe Martens Olson & Bear LLP

20060292461 - Optimized frame system for a liquid crystal display device: An image display device comprising an image display panel, a frame system including a framework operatively engaging the image display panel and a plurality of electronic components operatively engaging the framework, heat dispersion material operatively engaging the framework and in operative thermal contact with the electronic components, where the frame... Agent: Waddey & Patterson, P.C.

20060292463 - Device manufacturing method and a calibration substrate: The present invention relates to a device manufacturing method wherein a plurality of front side marks are manufactured on the front side of the substrate. These marks are used to locally align the substrate when exposing. After certain processing steps, the positions of the front side marks are measured and... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20060292465 - Curable resin composition, electrophotographic photoreceptor, process cartridge and image forming apparatus: A curable resin composition for use as a constituent material of an electrophotographic photoreceptor, the curable resin composition comprising: a phenolic resin having an (MwH/MwL) value of approximately 1.90 or less in a molecular weight distribution measured by gel permeation chromatography, wherein MwH is a peak area for a weight... Agent: Oliff & Berridge, PLC

20060292464 - Electrophotographic photoreceptor, image-forming device, process cartridge and image-forming method: An electrophotographic photoreceptor comprising: a conductive support; and a photo-sensitive layer on the conductive support, wherein the photo-sensitive layer comprises a functional layer comprising a cured product of a curable resin composition, the curable resin composition comprising an alcohol-soluble, curable resin and a polyether-modified silicone oil.... Agent: Oliff & Berridge, PLC

20060292466 - Photoreceptor with three-layer photoconductive layer: An imaging member includes a conductive substrate, a charge generating layer, a charge transport layer, and an intermediate layer between the charge generating layer and the charge transport layer, the intermediate layer including a hole transport material, such as three different hole transfer materials, dispersed in a film forming binder,... Agent: Oliff & Berridge, PLC.

20060292467 - Electrophotographic photoreceptor containing electron transporting material in a charge generating layer: wherein R1 and R2 are independently selected from the group consisting of a substituted or unsubstituted C1-C20 alkyl, substituted or unsubstituted C1-C20 alkoxy, substituted or unsubstituted C6-C30 aryl, substituted or unsubstituted C7-C30 aralkyl and a halogen; A is selected from the group consisting of nitro, cyano and sulfone; 1 is... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.

20060292468 - Electrophotographic photoreceptor for blue-violet exposure light source and electrophotographic imaging apparatus employing the photoreceptor: An electrophotographic photoreceptor and an electrophotographic imaging apparatus employing the photoreceptor are disclosed. The electrophotographic photoreceptor includes an electrically conductive substrate and a photosensitive layer formed on the electrically conductive substrate, wherein a latent image is formed on the photosensitive layer using a blue-violet exposure light source having a wavelength... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.

20060292469 - Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus: An electrophotographic photosensitive member having a charge generation layer containing a phenanthrene compound, a phenanthroline compound or an acenaphthene compound. Also disclosed are a process cartridge and an electrophotographic apparatus which have the electrophotographic photosensitive member.... Agent: Fitzpatrick Cella Harper & Scinto

20060292470 - Image forming apparatus and image forming method: Provided is an image forming apparatus containing a latent electrostatic image bearing member, a latent electrostatic image forming unit configured to form a latent electrostatic image on the latent electrostatic image bearing member, a developing unit configured to develop the latent electrostatic image using a toner to form a toner... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20060292471 - Charge control resin particles and toner for developing electrostatic images: Charge control resin particles comprising a mixture of at least a charge control agent and a resin, wherein a crystalline zinc 3,5-di-tert-butylsalicylate represented by General Formula below, and having major peaks of X-ray diffraction using the CuKα-characteristic X-ray at Bragg angles 2θ of at least 6.4±0.2° and 15.4±0.2°, is contained... Agent: Mcglew & Tuttle, PC

20060292472 - Electrophotographic toner using metal containing compound: a

20060292473 - Electrostatic latent image developing toner:

20060292474 - Toner, fixing method and image forming method using the toner: A toner including a binder resin, a wax, and a colorant, wherein particles of the wax having a particle diameter of less than 1.00 μm are included in the toner in an amount of not less than 35% by number and less than 55% by number, and wherein the wax... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20060292475 - Toner and developer compositions: A toner having a crystalline polyester resin, an amorphous resin and a colorant. The toner preferably exhibits a resistivity of at least 1×1011 ohm-cm. A developer may be produced including the toner and optionally a carrier. If a carrier is included, the carrier preferably exhibits a resistivity of greater than... Agent: Oliff & Berridge, PLC.

20060292477 - Electrophotographic toner, method for producing the same, electrophotographic developer, method for producing the developer, and image forming method: Provided are an electrophotographic toner, comprising a binder resin containing a coloring agent, a crystalline resin and an amorphous resin, wherein the crystalline resin has two or more peaks in weight-average molecular weight as determined by gel permeation chromatography, one of the peaks has a weight-average molecular weight in the... Agent: Oliff & Berridge, PLC

20060292476 - Electrostatic developing toner, method of producing the same, electrostatic developer and image forming method: An electrostatic image developing toner comprising a non-crystalline polyester resin, wherein the non-crystalline polyester resin is obtained by copolymerizing monomers in the presence of a titanium catalyst; the monomers comprise a polyhydric alcohol component and a monomer containing a sulfonic acid group, the polyhydric alcohol component comprises a propylene oxide... Agent: Oliff & Berridge, PLC

20060292478 - Carrier composition: Carrier particles comprise a core and a polymer coating that comprises a mixture of polymethyl methacrlyate (PMMA) and melamine. The coating compositions comprise from about 60 to about 80 percent by weight of PMMA and from about 20 to about 40 percent by weight of melamine. The carriers may be... Agent: Fay, Sharpe, Fagan, Minnich & Mckee, LLP

20060292479 - System and method for applying spacer elements: A method comprising transferring first liquid toner having one or more spacer elements to a first discharged portion of the photoconductor drum to form a first image on the photoconductor drum and transferring the first image to a substrate is provided.... Agent: Hewlett Packard Company

20060292480 - Image forming apparatus and image forming method: An image forming apparatus, including an electrostatic latent image bearer bearing an electrostatic latent image; an electrostatic latent image former forming the electrostatic latent image on a surface of the latent image bearer; an image developer developing the electrostatic latent image with a developer including a toner to form a... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20060292481 - Toner and method of manufacturing toner: Disclosed is a method of manufacturing toner comprising the steps of adding oil-droplets containing a radically polymerizable monomer into an associated particle dispersion formed by association-fusing resin particles and colorant particles, and forming a shell by coating a resin produced via polymerization on a surface of the associated particle by... Agent: Lucas & Mercanti, LLP

20060292482 - Toner composition and method for manufacturing the toner composition: A toner composition including toner particles including a binder resin; and a colorant, and a charge controlling agent which is at least located on a surface of the toner particles, wherein the toner composition has a spherical degree of from 0.96 to 0.99, and wherein the toner composition satisfies the... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20060292483 - Organic electroluminescent transfer medium provided with pattern transfer layer, organic electroluminescent transfer object provided with pattern transfer layer, and process for producing organic electroluminescent device: There are provided an organic electroluminescent transfer medium, an organic electroluminescent transfer object, and a production process of an organic electroluminescent device using the organic electroluminescent transfer medium or the organic electroluminescent transfer object, in which a pattern can be transferred from an organic electroluminescent transfer medium onto an organic... Agent: Oliff & Berridge, PLC

20060292488 - Composition for formation of antireflection film, and antireflection film in which the same is used: A composition for formation of an antireflection film having an excellent etching resistant characteristic and ability to prevent reflection of short-wavelength light (absorption ability of short-wavelength light) as well as excellent time dependent stability, and an antireflection film in which the same is used, are provided. A composition for formation... Agent: Harness, Dickey & Pierce, P.L.C

20060292491 - Method of treating and removing a photoresist pattern and method of manufacturing a semiconductor device using the same: Example embodiments of the present invention relate to methods of treating and removing a photoresist pattern and a method of manufacturing a semiconductor device using the same. Other example embodiments of the present invention relate to a method of treating a photoresist pattern and a method of removing a photoresist... Agent: Harness, Dickey & Pierce, P.L.C

20060292489 - Photoresist monomer polymer thereof and photoresist composition including the same: a

20060292490 - Positive photosensitive composition and pattern forming method using the same: A positive photosensitive composition comprising: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B1) a resin of which solubility in an alkali developer increases under an action of an acid; and (B2) a resin that has at least one group selected from (a)... Agent: Sughrue Mion, PLLC

20060292484 - Preparation of topcoat compositions and methods of use thereof: A topcoat composition that includes a fluorine-containing polymer and a casting solvent selected from an alcohol is provided. Also provided is a method of forming an image on a photoresist that includes forming a photoresist over a substrate; applying a topcoat composition, the topcoat composition comprising at least one fluorine-containing... Agent: Schmeiser, Olsen & Watts

20060292487 - Printing plate and patterning method using the same: A patterning method includes depositing a pattern target layer on a surface of a substrate, providing a printing plate with concaves in a first side of a transparent substrate and an opaque layer on the first side except in the concaves of the first sides, filling resins into the concaves... Agent: Jenkens & Gilchrist, P.C.

20060292486 - Processless lithographic printing plate precursor: A radiation-sensitive medium comprises hydrophilic polymer particles, the particles comprising a thermally softenable hydrophobic polymer, a hydrophilic polymer and a bonding compound capable of chemically bonding to the hydrophobic polymer and to the hydrophilic polymer. The radiation-sensitive medium further may comprise a substance capable of converting radiation into heat. The... Agent: Patent Legal Staff

20060292485 - Topcoat compositions and methods of use thereof: A topcoat composition that includes a fluorine-containing polymer and a casting solvent selected from the group consisting of α,α,α-trifluorotoluene, 2,2,3,3,4,4,5,5-octafluoropentyl-1,1,2,2-tetrafluoroethyl ether (OFP-TFEE), and a mixture consisting of a hydrophobic alkane and an alcohol is provided. Also provided is method of forming an image on a photoresist that includes forming a... Agent: Schmeiser, Olsen & Watts

20060292492 - Optical information recording medium and optical information reproducing apparatus: In an optical information recording medium to which a recording operation or reproducing operation of information is carried out by irradiating a laser beam, there are provided with two recording layers provided through a space layer. An absolute value of a change Δd of a film thickness of the space... Agent: Sughrue Mion, PLLC

20060292493 - Optical recording medium, and recording and reproducing method and optical recording and reproducing apparatus of optical recording medium: The present invention is aimed at providing a dual-layer phase-change optical recording medium which allows a high-density recording and a recording, where the optical recording medium has a high recording sensitivity even to a low power light with a short wavelength such as blue laser beam, does not cause noises... Agent: Dickstein Shapiro Morin And Oshinky LLP

20060292494 - Novel phthalocyanine derivatives, synthetic process thereof and their applications in optical recording media: wherein R1, R2, R3, and R4 each independently represents an alkyl group having 1 to 12 carbon atoms and may be substituted by 0 to 6 halogen atoms, a hydroxyl group, an alkoxyl group having 1 to 6 carbon atoms, an alkylamino group having 1 to 6 carbon atoms, a... Agent: Troxell Law Office PLLC

20060292495 - Thermal development system and method of using the same: An improved apparatus and a method of using the apparatus to remove non-crosslinked photopolymer from an imaged and exposed surface of a relief image printing element. Included are means for supporting and rotating the printing element, means for softening and/or melting non-crosslinked photopolymer on the imaged and exposed surface of... Agent: John L. Cordani Carmody & Torrance LLP

20060292496 - Circuit pattern forming method, circuit pattern forming device and printed circuit board: A circuit pattern forming method is provided which can reduce a possibility of undesired short-circuits being produced in the circuit by satellites formed when fabricating a conductive pattern and thereby can form a highly reliable printed circuit board. To that end, this invention overlappingly draws a conductive pattern and an... Agent: Fitzpatrick Cella Harper & Scinto

20060292497 - Method of forming minute pattern of semiconductor device: An embodiment of the invention provides a method of forming minute patterns of a semiconductor device. In one embodiment, after a first oxide film, a lower anti-reflection film, and a first photoresist film patterns are sequentially formed on a semiconductor substrate, the lower anti-reflection film and the first oxide film... Agent: Marshall, Gerstein & Borun LLP

20060292498 - Method for forming contact hole in semiconductor device: A method for forming a contact hole in a semiconductor device includes preparing a substrate including a bottom structure; forming an insulation layer such that the insulation layer covers the bottom structure; forming a silicon-rich oxynitride layer on the insulation layer; forming a photoresist pattern on the silicon-rich oxynitride layer;... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20060292499 - Optical information recording medium, method for manufacturing the same, and initialization device: An optical information recording medium includes a plurality of recording layers, a reflectance of at least one of the plurality of the recording layers in a non-initialized state with respect to a light beam for initialization being smaller than a reflectance of the same in an initialized state with respect... Agent: Hamre, Schumann, Mueller & Larson P.C.

20060292500 - Cure during rinse to prevent resist collapse: Numerous embodiments of a method to increase the mechanical strength of a photoresist structure are described. In one embodiment of the present invention, a photoresist material is dispensed over a substrate to form a photoresist layer. The photoresist material is exposed to a first radiation treatment to define a pattern... Agent: Michael A. Bernadicou Blakely, Sokoloff, Taylor & Zafman LLP

20060292501 - Lithography process with an enhanced depth-on-focus: Provided is a method for lithography processing. The method comprises forming a photoresist layer on a substrate and forming a resolution enhancement material (REM) layer on the photoresist layer. The REM layer comprises an acid component.... Agent: Haynes And Boone, LLP

20060292502 - Multicolor thermal imaging method and thermal printer: A multicolor direct thermal imaging method wherein a multicolor image is formed in a thermal imaging member comprising at least first and second different image-forming compositions and a thermal printer for use in practicing the method. Heat is applied to at least the second image-forming composition while the first image-forming... Agent: Foley & Lardner LLP

20060292503 - Photothermographic material and image forming method: The present invention provides a photothermographic material having, on at least one side of a support, an image forming layer including at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, and a non-photosensitive outermost layer which is disposed on the same side... Agent: Taiyo Corporation

  
12/21/2006 > 32 patent applications in 22 patent subcategories.

20060286461 - Micro lens array and method of manufacturing the same: A micro lens array and method of fabricating the micro lens array. The micro lens array includes: a substrate; a plurality of holes penetrating the substrate; and a plurality of lens units on a first surface of the substrate, each lens being at a respective one of the plurality of... Agent: Staas & Halsey LLP

20060286460 - Photomask, method of making a photomask and photolithography method and system using the same: A photomask according to the invention provides selective regional optimization of illumination type according to the type of image being formed using the photomask. The photomask include a light polarizing structure which polarizes the light incident on the polarizing structure. Light of a first illumination type from a source in... Agent: Mills & Onello LLP

20060286466 - Color filter substrate and method of fabricating the same: A color filter substrate comprising a substrate, a light blocking layer on the substrate having a plurality of wells with bottoms that contact the substrate, and a plurality of channels between the wells, and a color layer material which fills the wells and channels.... Agent: F. Chau & Associates, LLC

20060286465 - Film type filter and display apparatus comprising the same: Provided are a film type filter which is light and can reduce the problem of double image reflection in a plasma display apparatus, and a plasma display apparatus having the film type filter. The film type filter includes a non-glass base film and an antiglare layer located over the non-glass... Agent: Knobbe Martens Olson & Bear LLP

20060286464 - Liquid crystal display: An LCD according to an embodiment of the present invention includes: a first substrate; a first electrode disposed on the first substrate; a second substrate facing the first substrate; a second electrode disposed on the second substrate; a liquid crystal layer disposed between the first electrode and the second electrode;... Agent: Macpherson Kwok Chen & Heid LLP

20060286463 - Manufacturing method of display device: A manufacturing method of a display device is provided, which includes applying first electric charges on a surface of a printing drum to form an electric charge film, patterning the electric charge film to form an electric charge film pattern, applying development material having second electric charges to the electric... Agent: Patent Law Group LLP

20060286462 - System and method for transferring features to a substrate: A method comprising generating a clear layer on a first surface using a transparent liquid toner, generating a color layer using a pigmented liquid toner over the clear layer on the first surface, and transferring the clear layer and the color layer from the first surface to a substrate is... Agent: Hewlett Packard Company

20060286467 - Laser ablation of welded seam area: A seamless flexible electrophotographic imaging member comprising a flexible substrate strip material having an unmelted photodecomposed seam of carbon-black loaded polyimide polymer.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20060286472 - Photoconductive member: A photoconductive imaging member containing a photogenerating layer, and a charge transport layer, and wherein the charge transport layer is comprised of an arylamine containing a moiety that minimizes oxidation.... Agent: Patent Documentation Center

20060286468 - Hydroxygallium phthalocyanines: Methods for preparing Type V hydroxygallium phthalocyanine are provided.... Agent: Carter, Deluca, Farrell & Schmidt, LLP Suite 225

20060286470 - Imaging member: A photoconductive imaging member is provided comprising a substrate, an optional hole blocking layer, a charge generation layer, and a charge transport layer. The charge generation layer includes a charge generating material and a binder, wherein the binder comprises an electron transport material chemically attached to a polymeric binder material.... Agent: Richard M. Klein, Esq. Fay, Sharpe, Fagan, Minnich & Mckee, LLP

20060286471 - Imaging member: An imaging member includes a charge generating layer and a charge transport layer. The charge transport layer includes a first surface in contact with the charge generating layer and a second surface. The charge transport layer includes a film forming polymer binder and a charge transport component dispersed therein. The... Agent: Fay, Sharpe, Fagan, Minnich & Mckee, LLP

20060286469 - Imaging members: Methods for preparing phthalocyanine pigments having a high surface area are provided.... Agent: Carter, Deluca, Farrell & Schmidt, LLP Suite 225

20060286473 - Latent electrostatic image bearing member, and process cartridge, image forming apparatus and image forming method: A latent electrostatic image bearing member including at least a support, a photoconductive layer on the support and a surface layer on the photoconductive layer, wherein a film having the same composition as the surface layer is formed on a slide glass such that the film had a thickness of... Agent: Cooper & Dunham, LLP

20060286474 - Electrophotographic photosensive element and image forming device provided with it: An electrophotographic photoreceptor which is excellent in the cleaning property and does not deteriorates the image quality for the formed images during long time use, and capable of forming images at high sensitivity, high resolution and high image quality, is provided. A photosensitive layer provided on a conductive substrate of... Agent: Nixon & Vanderhye, PC

20060286477 - Methanesulfoamide azo dyes:

20060286475 - Developing agent and image forming apparatus using the same: Disclosed is a developing agent, wherein temperature T2, at which the developing agent exhibits a viscosity of 0.5×105 (Pa·s) after receipt of a thermal history that, after once being heated at a prescribed temperature, the developing agent is cooled to room temperature, falls within a range of 100 to 140°... Agent: Foley And Lardner LLP Suite 500

20060286476 - Low molecular weight latex and toner compositions comprising the same: Provided are a latex process and a toner process, both of which include the preparation of a latex having weight average molecular weight of from about 12×103 to about 24×103. The latex is manufactured under monomer-starved polymerization condition such as monomer feeding rate equal to or less than 0.5166% per... Agent: Fay, Sharpe, Fagan, Minnich & Mckee, LLP

20060286478 - Toner processes: Processes for continuously forming latex emulsions and preparing toners with said emulsions are provided.... Agent: Carter, Deluca, Farrell & Schmidt, LLP Suite 225

20060286479 - Toner for developing electrostatic latent image: o

20060286480 - Method of producing toner, and toner: Spherical-shaped liquid droplets are made by dispersing oil phase containing: a resin with an acid group, a first hydrophobic solvent effecting dissolution of the resin, a colorant, and a charge control agent which is positively charged in an aqueous dispersion medium in the presence of a base; and the liquid... Agent: Banner & Witcoff, Ltd. Attorneys For Client Nos. 0166889, 006760

20060286482 - Lithographic apparatus and device manufacturing method utilizing a resettable or reversible contrast enhancing layer in a multiple exposure system: A device manufacturing system and method are used to perform multiple exposures utilizing a resettable or reversible contrast enhancing layer. A radiation sensitive layer is formed on a substrate. A resettable or reversible contrast enhancing layer is formed on the radiation sensitive layer. The resettable or reversible contrast enhancing layer... Agent: Sterne, Kessler, Goldstein & Fox PLLC

20060286481 - Thermochromic recording medium: A thermochromic reimageable recording medium comprises a substrate and thermochromic composition comprising a photochromic material, a transition metal salt and a binder. The thermochromic composition changes color from a colorless state to a colored state upon application of heat. The thermochromic recording medium may be used to display a viewable... Agent: Richard M. Klein, Esq. Fay, Sharpe, Fagan, Minnich & Mckee, LLP

20060286483 - Cyanine compounds, optical recording materials and optical recording media: wherein ring A and B each represent a benzene or naphthalene ring that may be substituted; at least one of the pair of adjacent groups R1 and R2 and the pair of adjacent groups R3 and R4 represent a pair of benzyl groups, and the other paired groups each represent... Agent: Young & Thompson

20060286484 - Pretreatment compositions: (b) at least one organic solvent, and optionally, (c) at least one adhesion promoter; wherein the amount of the compound of Structure VI present in the composition is effective to inhibit residue from forming when the photosensitive composition is coated on a substrate and the coated substrate is processed to... Agent: Paul D. Greeley, Esq. Ohlandt, Greeley, Ruggiero & Perle, L.L.P.

20060286486 - Method of fabricating a semiconductor device: A method of fabricating a semiconductor device. A first organic layer, a silicon-containing sacrificial layer, and a second organic layer are sequentially formed on a substrate. A photolithography process is performed for forming a predetermined pattern in the second organic layer. Thereafter, the second organic layer is utilized as an... Agent: North America Intellectual Property Corporation

20060286485 - Substrate structure and the fabrication method thereof: The present invention provides a substrate structure and the fabrication method thereof. First, a laminate is provided, wherein there are arranged a conductive layer, or an adhesive layer and a conductive layer on the surface of the laminate from bottom to top. A patterned through hole is formed to penetrate... Agent: Rosenberg, Klein & Lee

20060286487 - Process for coating thick resist over polymer features: An embodiment of a process is disclosed comprising depositing a sealing layer on a first photoresist layer formed on a substrate, the first photoresist layer having a form patterned and etched therein, depositing a second photoresist layer on the sealing layer, and curing the second photoresist layer by changing its... Agent: Blakely Sokoloff Taylor & Zafman

20060286488 - Methods and devices for fabricating three-dimensional nanoscale structures: The present invention provides methods and devices for fabricating 3D structures and patterns of 3D structures on substrate surfaces, including symmetrical and asymmetrical patterns of 3D structures. Methods of the present invention provide a means of fabricating 3D structures having accurately selected physical dimensions, including lateral and vertical dimensions ranging... Agent: Greenlee Winner And Sullivan P C

20060286489 - System and method for adaptive marking and coding of film prints: The present invention provides a system and method for marking, coding and tracking a film print in an efficient, adaptive and customized manner for providing unique and robust identification of each individual film print and facilitating accurate tracking of the origin of a pirated copy. A film print to be... Agent: Thomson Licensing Inc.

20060286490 - Methods of making templates for use in imprint lithography and related structures: A method of forming a template for use in imprint lithography. The method comprises providing an ultraviolet (“UV”) wavelength radiation transparent layer and forming a pattern in the UV transparent layer by photolithography. The pattern may be formed by anisotropically etching the UV transparent layer and may have feature dimensions... Agent: Trask Britt, P.C.

20060286491 - Formation of a mask on an integrated electronic circuit: An integrated electronic circuit includes a cavity buried in a substrate. A surface of the substrate has a depression aligned above the buried cavity. The depression is filled with a material selected so that reflection of a lithography radiation on the substrate surface is attenuated. A resist layer is deposited... Agent: Jenkens & Gilchrist, PC

  
12/14/2006 > 20 patent applications in 13 patent subcategories.

20060281013 - System for copy protection of an information carrier: The present invention relates to a system for copy protection of an information carrier, said system comprising a diffractive layer for delivering a speckle pattern when illuminated by a light source, a spatial filter, which is aligned with respect to the diffractive layer, for delivering a filtered optical signal from... Agent: Philips Intellectual Property & Standards

20060281018 - Light modulation device: A first reflecting body, which has semi-transmissive semi-reflective characteristics, a light transmissive fine hole body having a plurality of fine holes, which are adapted to be filled with a light transmissive substance and have diameters sufficiently smaller than wavelengths of incident light, and a second reflecting body, which has perfect... Agent: Sughrue Mion, PLLC

20060281014 - Method and apparatus for protecting a reticle used in chip production from contamination: A transparent pellicle member (1), comprising an inner or central portion (1A) and an out peripheral portion (1B) mounted across a reticle for use in semiconductor chip fabrication, substantially parallel thereto and with a space (9) therebetween. The central portion (1A) of the pellicle (1) is fixed with regard to... Agent: Philips Intellectual Property & Standards

20060281016 - Modifying sub-resolution assist features according to rule-based and model-based techniques: Modifying sub-resolution assist features includes receiving a mask pattern for a photolithographic mask. The mask pattern includes main features, and the photolithographic mask is operable to pattern a wafer pattern for a semiconductor wafer. Placement of sub-resolution assist features for the main features is estimated. The following is repeated for... Agent: Texas Instruments Incorporated

20060281017 - Reflection mask for euv photolithography and method of fabricating the reflection mask: A reflection mask for extreme ultraviolet (EUV) photolithography and a method of fabricating the same, in which the reflection mask includes a substrate, a lower reflection layer formed in a multi-layer structure on the substrate and including a material reflecting EUV light, an upper reflection layer formed in a multi-layer... Agent: F. Chau & Associates, LLC

20060281015 - Verifying a process margin of a mask pattern using intermediate stage models: Verifying a process margin for a mask pattern includes receiving the mask pattern for patterning features on a semiconductor wafer. The mask pattern is modified according to a wafer pattern model operable to estimate a wafer pattern resulting from the mask pattern. An intermediate stage model is selected to apply... Agent: Texas Instruments Incorporated

20060281019 - Photomask and method of manufacturing the same: A photomask for defining a photoresist layer formed on a wafer having at least an alignment mark region, wherein each alignment mark region has an alignment mark. The photomask comprises a shot region and an alignment mark pattern region. The alignment mark pattern region has a profile equal to the... Agent: J C Patents, Inc.

20060281020 - Electrophotographic photoreceptor containing naphthalenetetracarboxylic acid diimide derivatives as electron transport materials in charge generating layer and the electrophotographic imaging apparatus using the photoreceptor: p

20060281021 - Illuminative treatment of holographic media: The present invention relates to embodiments of a process for subjecting a holographic storage medium to illuminative treatment to: (1) enhance or optimize recording of holographic data; (2) enhance or optimize reading of recorded holographic data; and/or (3) erase recorded holographic data. The present invention also relates to embodiments of... Agent: Jagtiani + Guttag

20060281025 - Chemically amplified resist material and pattern formation method using the same: In a pattern formation method, a resist film made of a chemically amplified resist material including a first polymer having hemiacetal or hemiketal is formed on a substrate. Then, with a liquid provided on the resist film, pattern exposure is performed by selectively irradiating the resist film with exposing light.... Agent: Mcdermott Will & Emery LLP

20060281023 - Negative photoresist composition: There is provided a negative photoresist composition, which is used in a method of forming a pattern in which an underlayer film is provided on a substrate, a photoresist film formed from the negative photoresist composition is provided on top of the underlayer film, the photoresist film is selectively exposed,... Agent: Knobbe Martens Olson & Bear LLP

20060281022 - Polymeric compound containing a repeated unit having a 2-oxatricyclo [4.2.1.0 4.8] nonan-3-one ring and photoresist resin composition: wherein Ra is a hydrogen atom, a halogen atom, an alkyl group of 1 to 6 carbon atoms or an haloalkyl group of 1 to 6 carbon atoms; each of R1 and R2 is identical to or different from a hydrogen atom or a hydrocarbon group, provided that at least... Agent: Birch Stewart Kolasch & Birch

20060281024 - Printing element with an integral printing surface: A relief image printing element with an integral imageable printing surface and a method of preparing the relief image printing element are described. The relief image printing element comprises a dimensionally stable base layer; a floor layer comprised of a cured polymer selected from the group consisting of photopolymers, and... Agent: John L. Cordani Carmody & Torrance LLP

20060281026 - Phthalocyanine derivatives and their applications in optical recording media: An optical recording medium is disclosed, which is composed of a substrate, a recording layer comprising an organic dye upon which information can be recorded by a laser beam, a reflective layer and a protective layer formed in such order; whereas the aforementioned organic dye is a substituted phthalocyanine compound... Agent: Troxell Law Office PLLC

20060281027 - Aspherical-polymer fine particles and production method thereof, and method for producing lithographic printing plate, ink composition and electrophoretic particle composition: Aspherical-polymer fine particles are resin particles synthesized by polymerizing radically radical polymerizable monomers in a non-aqueous solvent in the presence of a resin for dispersal stability, wherein the aspherical-polymer fine particles have a sphericity of 0.95 or less.... Agent: Sughrue Mion, PLLC

20060281028 - Processes and devices using polycyclic fluoroalkanes in vacuum and deep ultraviolet applications: Processes and apparatuses using polycyclic fluoroalkanes that are highly transparent to UV wavelengths ranging from about 190 nm to 260 nm are provided. The polycylic fluoroalkanes are useful in a wide variety of applications, including optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices, and... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20060281029 - Resin for under-layer material, under-layer material, laminate and method for forming resist pattern: A resin for an undercoating material for forming an underlying film between a substrate and a photoresist layer, wherein the resin is a novolac resin containing 1% by mass or less, as measured by gel permeation chromatography, of low molecular weight components having a molecular weight of 500 or less.... Agent: Knobbe Martens Olson & Bear LLP

20060281030 - Method for forming an anti-etching shielding layer of resist patterns in semiconductor fabrication: A method is disclosed for forming a photoresist pattern with enhanced etch resistance on a semiconductor substrate. A photoresist pattern is first formed on the substrate. A silicon-containing polymer layer is deposited over the photoresist pattern on the substrate. A thermal treatment is performed to form a cross-linked anti-etch shielding... Agent: Howard Chen Preston Gates & Ellis LLP

20060281031 - Production of two superposed elements within an integrated electronic circuit: A method is presented for forming two superposed elements within an integrated electronic circuit. In accordance with the method, a first circuit element, which is reflective with respect to lithography radiation, is formed. A first layer, which is attenuating with respect to lithography radiation, is formed above the first circuit... Agent: Jenkens & Gilchrist, PC

20060281032 - Lithographic apparatus and device manufacturing method for writing a digital image: First pluralities of radiation spots generated by an array of individually controllable elements are exposed on a substrate. The radiation spots are equally spaced across an entire area of the substrate to be exposed. The substrate is then shifted relative to the array of individually controllable elements in a direction... Agent: Sterne, Kessler, Goldstein & Fox PLLC

  
12/07/2006 > 47 patent applications in 26 patent subcategories.

20060275669 - Composition and a process for the preparation of coloured holograms: A process of producing a coloured hologram is provided. The process comprises preparing a lacquer composition comprising a UV/EB-hardening acrylic resin and at least one pigment, said resin providing instant hardening upon irradiation; applying said lacquer composition to selected areas of a flexible support by means of a rotary printing... Agent: Ratnerprestia

20060275670 - Post-curing of holographic media: The present invention relates to embodiments of a process for subjecting a holographic storage medium to illuminative treatment to: (1) enhance or optimize recording of holographic data; (2) enhance or optimize reading of recorded holographic data; and/or (3) erase recorded holographic data. The present invention also relates to embodiments of... Agent: Jagtiani + Guttag

20060275671 - Volume hologram transfer foil, and volume hologram multilayer structure: The invention provides (1) a volume hologram transfer foil comprising a substrate and protective layer, a volume hologram layer and a heat seal layer stacked on the substrate in this order, wherein a multilayer structure comprising the protective layer, the volume hologram layer and the heat seal layer in this... Agent: Sughrue Mion, PLLC

20060275674 - Apparatus and method for fabricating flat panel display device: A method and apparatus for fabricating a flat panel display device is disclosed. A thin film is patterned in a patterning process using a soft mold without using a photo process. A thin film layer and a resist are sequentially formed on a substrate. A designated resist pattern is formed... Agent: Brinks Hofer Gilson & Lione

20060275675 - Method for determining an optimal absorber stack geometry of a lithographic reflection mask: The present invention relates to a method for determining an optimal absorber stack geometry of a lithographic reflection mask comprising a reflection layer and a patterned absorber stack provided on the reflection layer, the absorber stack having a buffer layer and an absorber layer. The method is based on simulating... Agent: Morrison & Foerster LLP

20060275673 - Phase shifter for laser annealing: An object of the present invention is to provide a phase shifter for laser annealing which is capable of effectively preventing the sticking of particles. A first layer and a third layer are made of quartz glass, and a two-dimensional pattern of fine grooves is formed in the surfaces of... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20060275672 - Photomask with controllable patterns: A photomask with controllable patterns is a panel, which can be controlled to change the shading patterns. The panel is composed of a plurality of optical controlled elements and has various portions of transparent, gray-scale or opaque patterns by controlling the optical controlled elements. When light passes through the photomask,... Agent: Birch Stewart Kolasch & Birch

20060275676 - Pigment-containing heat-curable composition, color filter, image-recording material, and method of producing color filter: The invention provides a pigment-containing heat-curable composition includeing a pigment dispersion solution obtained by dispersing a composition containing a heat-curable resin, a solvent, and a pigment, wherein the concentration of the pigment is 50% or more and less than 100% with respect to the total solid contents.... Agent: Sughrue Mion, PLLC

20060275677 - Imaging forming method, printed product and image forming medium: An image forming method includes the steps of forming a mirror image on a transparent substrate by an electrophotographic process, and laminating a light reflecting material having an adhering or tacking layer onto an image bearing surface of the transparent substrate, wherein the transparent substrate and the light reflecting material... Agent: Cantor Colburn, LLP

20060275678 - Phase difference specifying method: A phase shift mask comprises first and second mask patterns. The first mask pattern is a backing film enabling a first optical image to be formed on a substrate. The first optical image forms a resist pattern having a width that changes depending on the distance between the phase shift... Agent: GlobalIPCounselors, LLP

20060275679 - Color image forming method and color toner forming method: The invention provides a color image forming method including charging, developing, transferring and fixing. The fixing includes thermally fixing a toner image to paper by using a heating body and a pressurizing member which is positioned opposite to the heating body via a film-like member. The color toner includes a... Agent: Oliff & Berridge, PLC

20060275680 - Toner, production method thereof, and image forming apparatus using same: The present invention provides toners of different colors in which coloring agents of at least four unicolors are internally added to, respectively, and hydrophobic silica particles and metallic soap particles are externally added to toner mother particles, wherein color superposition of the toners is conducted during development of latent images... Agent: Sughrue Mion, PLLC

20060275681 - Plasticized photoconductor: Plasticizers in a charge transfer layer to reduce surface cracking and crazing having a hydrocarbon chain, attached to a hindered phenol containing triazole or triazine moiety. Plasticizers found useful for this application can be used in a concentration (by weight of the charge transfer layer) in the order of magnitude... Agent: Lexmark International, Inc. Intellectual Property Law Department

20060275682 - Hole transport polymers for photoreceptor devices: Hole transport polymers are disclosed. The polymers include modified triarylamine groups attached to a polymeric material such as, for example, poly(vinyl butyral). The polymers are particularly suited for use in multilayered photoreceptors. The polymers can be readily synthesized. Also disclosed are photoreceptors containing one or more layers that include the... Agent: Richard M. Klein, Esq. Fay, Sharpe, Fagan, Minnich & Mckee, LLP

20060275683 - Asymmetric bis-hydroxyenamine compound, electrophotographic photoreceptor and image forming apparatus: There is provided an organic photoconductive material that can realize an electrophotographic photoreceptor which is not only excellent in charge transporting ability but also excellent in solubility in a solvent and compatibility with a resin and moreover, which is excellent in both electric properties and durability, and the organic photoconductive... Agent: Nixon & Vanderhye, PC

20060275684 - Photoconductor with ceramer overcoat: A polyurethane-silica hybrid, or polyurethane-silica/silsesquioxane hybrid overcoat improves the life of the photoconductor drum without significantly altering the electrophotographic properties of the PC drum. Wear can be caused by a variety of factors, which include contact with the cleaner blade, paper, or intermediate transfer member or by erosion or scratching... Agent: Lexmark International, Inc. Intellectual Property Law Department

20060275685 - Image formation device and image formation process: An image formation device including: a charge conservation member including a transparent conductive substrate, a photoconductive layer formed on the transparent conductive substrate, and microscopic isolated island-form charge sites, numerous microelectrodes for charge conservation being formed on the photoconductive layer to be distributed more finely than individual pixels; a conductive... Agent: Morgan Lewis & Bockius LLP

20060275686 - Toner for electrostatic development, developer, image forming method, image-forming apparatus and process for cartridge using the same: It is an object of the present invention to provide a toner containing toner particles and inorganic fine particles wherein the inorganic fine particles are externally added to the toner particles which contain a binder resin and a colorant and at least one type of the inorganic fine particles is... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20060275687 - Toner and image forming apparatus using the same: In a toner T of the present invention, the liberated mother particle ratio is set to be 10% or less and the liberated silica particle ratio is set to be 0.2-10%, thereby reducing the possibility that the liberated mother particles 18′ and the mother particles 18 with silica particles 19... Agent: Sughrue Mion, PLLC

20060275688 - Image forming method and image forming apparatus for same: An electrophotographic image forming apparatus capable of reliably forming an image with density gradation, one which does not have a low-quality appearance. The estimated average halftone granularity of the toner image after developing but before electrostatic transfer was set at 0.25 or less. The average halftone granularity was found by... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20060275689 - Chemically prepared toners with size limiting binders: Chemically prepared toner is manufactured by aggregation in which the binder resin is a latex copolymer having a methacrylic acid ester of long chain, saturated alkyl, which may be lauryl methacrylate. This binder resin has a small amount by weight of acrylic acid component and has other nonionic components, which... Agent: Lexmark International, Inc. Intellectual Property Law Department

20060275691 - Microgels combined with functional additives: The invention relates to a composition comprising at least one microgel and at least one functional additive, to processes for the preparation thereof, to uses of the compositions, and to microgel-containing polymers, rubbers, lubricants, coatings, etc. prepared therefrom.... Agent: Lanxess Corporation

20060275690 - Use of crosslinked microgels for modifying the temperature-dependent behavior of non-crosslinkable organic media: The invention relates to the use of microgels for modifying the temperature behavior of non-crosslinkable organic media, in particular in high temperature applications at least about 100° C., for example in engine oils, gear oils, etc.... Agent: Lanxess Corporation

20060275692 - Method for forming concavo-convex pattern, method for manufacturing master disk, method for manufacturing stamper, and method for manufacturing magnetic recording medium: A method for forming a concavo-convex pattern that can form a fine and complex concavo-convex pattern such as that corresponding to servo information with high precision, a method for manufacturing a master disk, a method for manufacturing a stamper, and a method for manufacturing a magnetic recording medium using that... Agent: Oliff & Berridge, PLC

20060275696 - Coating compositions for use with an overcoated photoresist: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a resin component with a blend of distinct resins, wherein at least one resin of the mixture comprises chromophore groups and at least one resin of the mixture is at least substantially or completely... Agent: Peter F. Corless Rohm And Haas Electronic Material LLC

20060275693 - Compositions, systems, and methods for imaging: A composition, method, and system for recording an image. The system includes a multiphase imaging material in which energy is absorbed by an antenna material. The absorbed energy causes the reaction of an activator and a color-forming material.... Agent: Hewlett Packard Company

20060275701 - Fluorinated vinyl ethers, copolymers thereof, and use in lithographic photoresist compositions: Copolymers prepared by copolymerization of at least one fluorinated vinyl ether are provided. In one embodiment, the at least one fluorinated vinyl ether comprises ethylene directly substituted at an olefinic carbon atom with a moiety —OR* and optionally substituted with one, two, or three additional nonhydrogen substituents, wherein R* comprises... Agent: Mintz, Levin, Cohn, Ferris, Glovsky And Popeo, P.c

20060275694 - High resolution silicon-containing resist: Non-chemically amplified radiation sensitive resist compositions containing silicon are especially useful for lithographic applications, especially E-beam lithography. More particularly, radiation-sensitive resist compositions comprising a polymer having at least one silicon-containing moiety and at least one radiation-sensitive moiety cleavable upon radiation exposure to form aqueous base soluble moiety can be used... Agent: Steve Capella IBM Corporation

20060275702 - Negative-working photosensitive resin composition and photosensitive resin plate using the same: wherein -X represents —OR2, —COOH, —SO3H, —CONHR2, —COR2, —SO2NHR2, —HNCONHR2, or —HNCOOR2; R1 and R2, which may be the same or different, each represents a hydrogen atom, a substituted or unsubstituted, saturated or unsaturated hydrocarbon group, provided that it does not contain a radical polymerizable ethylenic double bond, a substituted... Agent: Wenderoth, Lind & Ponack, L.L.P.

20060275699 - Novel photosensitive resin compositions: n is an integer from 1 to 5; and each R1 is defined as above; and (f) at least one solvent; wherein the amount of the compound of Structure VI present is an amount effective to inhibit residue from forming when the composition is coated on a substrate and the... Agent: Paul D. Greeley, Esq. Ohlandt, Greeley, Ruggiero & Perle, L.L.P.

20060275700 - Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same: A photosensitive resin composition for an organic layer pattern includes about 100 parts by weight of an acryl-based copolymer and about 5 to about 100 parts by weight of a 1,2-quinonediazide compound. The acryl-based copolymer is prepared by copolymerizing about 5 to about 60 percent by weight of an isobonyl... Agent: Macpherson Kwok Chen & Heid LLP

20060275695 - Polymer for immersion lithography, photoresist composition containing the same, method of manufacturing a semiconductor device, and semiconductor device: A polymer for immersion lithography comprising a repeating unit represented by Formula 1 and a photoresist composition containing the same. A photoresist film formed by the photoresist composition of the invention is highly resistant to dissolution, a photoacid generator in an aqueous solution for immersion lithography, thereby preventing contamination of... Agent: Marshall, Gerstein & Borun LLP

20060275698 - Thermally reactive near-infrared absorbing acetal copolymers, methods of preparation and methods of use: Described herein are novel thermally reactive near-infrared absorbing acetal copolymers that undergo chemical and physical changes upon exposure to near-infrared radiation. Also described are the methods of preparation of the novel acetal copolymers starting either with vinyl-alcohol polymers or with acetal copolymers. Also described are the methods of use of... Agent: Goudreau Gage Dubuc

20060275697 - Top coating composition for photoresist and method of forming photoresist pattern using the same: Provided are a top coating composition for a photoresist which can be used in immersion lithography, and a method of forming a photoresist pattern using the same. The top coating composition includes: a polymer including at least three different structural repeating units including a first repeating unit comprising a carboxy... Agent: Marger Johnson & Mccollom, P.C.

20060275703 - Recording medium, near field optical head, optical recording device, and method of manufacturing thereof: The object of the present invention is to provide an information recording/reproduction device for implementing high-density information recording and reading using mutual interaction of a recording medium with near field light, and particularly to a near field optical head with a high optical efficiency and a manufacturing method thereof. This... Agent: Bruce L. Adams, Esq.

20060275704 - Topcoats for use in immersion lithography: A method of forming a top coat layer and a topcoat material for use in immersion lithography. A topcoat layer is formed on a photoresist layer from an aqueous solution that is immiscible with the photoresist layer. The topcoat layer is then rendered insoluble in neutral water but remains soluble... Agent: Schmeiser, Olsen & Watts

20060275705 - Conductive patterning: Various embodiments of a method, coating and system for conductive patterning are disclosed.... Agent: Hewlett Packard Company

20060275706 - Immersion lithography contamination gettering layer: A method of forming an image in a photoresist layer. The method includes, providing a substrate; forming the photoresist layer over the substrate; forming a contamination gettering topcoat layer over the photoresist layer, the contamination gettering topcoat layer including one or more polymers and one or more cation complexing agents;... Agent: Schmeiser, Olsen & Watts

20060275709 - Lithographic apparatus and device manufacturing method: A lithographic apparatus has a plurality of patterning arrays (e.g., 2, 4, etc.), which are spaced apart in an object plane. A combined, overlapped image of the patterning arrays is projected onto the substrate. Because the image is formed from radiation produced from spaced apart patterning arrays, the image arrives... Agent: Sterne, Kessler, Goldstein & Fox PLLC

20060275708 - Lithographic printing with polarized light: The present invention provides systems and methods for improved lithographic printing with polarized light. In embodiments of the present invention, polarized light (radially or tangentially polarized) is used to illuminate a phase-shift mask (PSM) and produce an exposure beam. A negative photoresist layer is then exposed by light in the... Agent: Sterne, Kessler, Goldstein & Fox PLLC

20060275707 - Pattern formation method: In a pattern formation method, a resist film is formed on a substrate, an alkali-soluble first barrier film is formed on the resist film and an alkali-insoluble second barrier film is formed on the first barrier film. Subsequently, with a liquid provided on the second barrier film, pattern exposure is... Agent: Mcdermott Will & Emery LLP

20060275710 - Semiconductor device and manufacturing method thereof: To provide a semiconductor device having a circuit with high operating performance and high reliability, and improve the reliability of the semiconductor device, thereby improving the reliability of an electronic device having the same. The aforementioned object is achieved by combining a step of crystallizing a semiconductor layer by irradiation... Agent: Eric Robinson

20060275711 - Method of manufacturing a liga mold by backside exposure: A method of manufacturing a LIGA mold by backside exposure includes the steps of: disposing a mask layer at a side of a first substrate, wherein the first substrate is transparent to a predetermined light source and has a front side and a backside; forming a photoresist layer on the... Agent: Birch Stewart Kolasch & Birch

20060275713 - Hybrid type optical disc and manufacturing metod for hybrid type optical disc: A stamper which has a region information according to a destination is set to the resin molding machine for HDDVD and the resin molding machine for DVD, respectively. The contents information (contents A) of the same program is held in each stamper. The region information of each stamper is different... Agent: Mcdermott Will & Emery LLP

20060275712 - Method for fabrication of physical patterns and the method for fabrication of device using the same: Etching properties are improved in a processing method of a phase change material in which the regions of one state are removed by etching to form a fine physical pattern. The phase change film is subjected to an advance treatment conducted before the etching, and this advance treatment uses water,... Agent: Antonelli, Terry, Stout & Kraus, LLP

20060275714 - Methods for fabricating optical microstructures using a cylindrical platform and a rastered radiation beam: Optical microstructures, such as microlenses, are fabricated by rotating a cylindrical platform that includes a radiation sensitive layer thereon, about its axis, while simultaneously axially rastering a laser beam across at least a portion of the radiation sensitive layer. The cylindrical platform is also simultaneously translated axially while it is... Agent: Myers Bigel Sibley & Sajovec

20060275715 - Photothermographic material: A photothermographic material having, on at least one side of a support, an image forming layer containing at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, and at least one non-photosensitive layer which is disposed on the same side as the image... Agent: Taiyo Corporation

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