Radiation imagery chemistry: process, composition, or product thereof inventions 10/06

20060240332 - Chromeless phase-shifting mask for equal line/space dense line patterns: A phase-shifting mask suited for equal line/space, small pitched, dense line pattern is disclosed. The phase-shifting mask includes a transparent substrate, a partially shielded mesa line pattern of first phase formed on the substrate, and a clear recessed line pattern of second phase etched into the substrate and is disposed...

20060240330 - Exposure method, mask, semiconductor device manufacturing method, and semiconductor device: To provide an exposure method and mask capable of suppressing a fluctuation of a dimension of a resist pattern caused by a flexure of a membrane and a semiconductor device formed with a fine pattern in high accuracy and a method of producing the same. The exposure method placing an...

20060240339 - Forming an euv mask with a phase-shifter layer and an intensity balancer layer: The present invention describes a method including: providing a substrate, the substrate including a first region and a second region; forming a multilayer mirror over the substrate; forming a phase-shifter layer over the multilayer mirror; forming a capping layer over the phase-shifter layer; removing the capping layer and the phase-shifter...

20060240335 - Mask blank and process for producing and process for using the same, and mask and process for producing and process for using the same: By applying a transparent electroconductive film to a mask blank or by forming an electroconductive layer by doping metallic ions thereto, such a mask blank can be provided that an electrostatic chuck having a sufficient retaining force can be applied, the front and back surfaces of the mask blank can...

20060240341 - Mask, manufacturing method for mask, and manufacturing method for semiconductor device: Disclosed is a mask comprising a first area including a first surrounding area in which a halftone phase shift film or a stacked film of a halftone phase shift film and an opaque film is provided on a transparent substrate, and a first opening area surrounded by the first surrounding...

20060240337 - Method of exposure and attenuated type phase shift mask: A method of exposing a surface to be exposed and an attenuated type phase shift mask for use in the method are provided herein. The attenuated type phase shift mask has a reference area allowing a light radiated from a light source to pass through and an amplitude and phase...

20060240334 - Method of manufacturing euvl alternating phase-shift mask: A method of manufacturing an extreme ultra-violet lithography (EUVL) alternating phase-shift mask comprises preparing a substrate having a reflective layer, forming a light-shielding layer pattern on the reflective layer to cover part of the reflective layer while leaving a reflective region of the reflective layer exposed, forming a trench in...

20060240331 - Modifying merged sub-resolution assist features of a photolithographic mask: Modifying merged sub-resolution assist features includes receiving a mask pattern comprising the merged sub-resolution assist features, where a segmenting sub-resolution assist feature intersects a segmented sub-resolution assist feature at an intersection. Each sub-resolution assist feature is represented by an axis of the sub-resolution assist feature. The length of at least...

20060240338 - Pattern formation method, electronic circuit manufactured by the same, and electronic device using the same: There are a step for forming a mask layer 2 on a substrate 1; a step for forming an opening pattern in the mask layer 2; a step for forming a thin film 3 on the substrate 1 and on the mask layer 2; and a step for removing, from...

20060240333 - Phase-shifting mask for equal line/space dense line patterns: A phase-shifting mask suited for equal line/space, small pitched, dense line pattern is disclosed. The phase-shifting mask includes a transparent substrate, a partially shielded mesa line pattern of first phase formed on the substrate, and a 100% clear recessed line pattern of second phase etched into the substrate and is...

20060240340 - Prevention of photoresist scumming: A photo acid generator (PAG) or an acid is used to reduce resist scumming and footing. Diffusion of acid from photoresist into neighbors causes a decreased acid level, and thus causes resist scumming. An increased acid layer beneath the resist prevents acid diffusion. In one embodiment, the increased acid layer...

20060240342 - Resolution enhancing technology using phase assignment bridges: In one embodiment, a spacing is determined for each edge of a number of features in a photolithographic design. The edges have at least a partially predictable layout. Based on the spacing and the predictable layout, a bridge structure is generated. Each bridge of the bridge structure connects one of...

20060240336 - Systems and methods for mitigating variances on a patterned wafer using a prediction model: Disclosed are systems and methods for mitigating variances (e.g., critical dimension variances) on a patterned wafer are provided. In general, variances of a patterned wafer are predicted using one or more reticle fabrication and/or wafer processing models. The predicted variances are used to modify selected transparent portions of the reticle...

20060240343 - Digital press printing: A liquid toner digital press imaging composition contains, in addition to the toner, a security ingredient which is a reactant reactable in use with a complementary reactant carried by a printable substrate, so as to be detectably retained in or on the substrate in the event of fraudulent alteration or...

20060240344 - Method of manufacture of polymer arrays: The present invention provides methods to reduce bleed-over of transmitted light through a photolithographic mask during photolysis by reducing the gap between the mask and the substrate upon which photolithography is being performed. In a preferred embodiment of the invention, a leveling method in combination with a compressed gas is...

20060240345 - Photoreceptors: Methods for adjusting the rheology of dispersions utilized to form layers of photoreceptors are provided....

20060240346 - Image bearing member, and image forming apparatus and process cartridge using the same: An image bearing member including an electroconductive substrate, a charge blocking layer disposed overlying the electroconductive substrate, a moire prevention layer disposed overlying the charge blocking layer, and a photosensitive layer disposed overlying the moire prevention layer. The charge blocking layer contains N-alkoxymethylized nylon and optionally at least one of...

20060240348 - Magnetic monocomponent developer and image forming method: The present invention provides a magnetic monocomponent developer which can obtain a stable conveying performance for a long period and an image forming method which uses the developer. In a magnetic monocomponent developer which is used in a developing unit which includes a developing vessel which accommodates a magnetic monocomponent...

20060240347 - Magnetic monocomponent developing toner and image forming method: The present invention provides a magnetic monocomponent developing toner which can acquire the stable transport performance for a long period and an image forming method which uses the magnetic monocomponent developing toner. In a magnetic monocomponent developing toner comprising 45 to 65 weight % of a binder resin, 1 to...

20060240351 - Toner for developing electrostatic images, developer, image forming method, and image forming apparatus: The object of the present invention is to provide a toner which has sufficiently high chargeability and less toner spent to a carrier or the like even when several tens of thousands of image sheets are output, is capable of keeping high-charge property and flowability without causing substantial background smear...

20060240349 - Toner, developer including the toner, and method for fixing toner image: A toner composition including toner particles including a binder resin including a modified polyester resin, and a second resin having a weight average molecular weight of from 2,000 to 10,000; a colorant; a release agent; and a particulate material which is present at least a surface portion of the toner...

20060240350 - Developer, and image forming apparatus and process cartridge using the developer: A developer contains a toner; and a carrier, wherein the toner contains toner particles containing a binder resin; and a colorant, and a titanium oxide as an external additive, wherein an amount of free titanium oxide particles released from the toner determined by a ultrasonic vibration method is from 5...

20060240352 - Toner: The invention is to provide a toner excellent in fixing property, high-temperature offset resistance and blocking resistance, and having an excellent developing property. The invention provides a toner including at least a binder resin and a colorant, wherein: the binder resin contains a hybrid resin which contains a polyester-type resin...

20060240353 - Toner for developing electrostatic image, production method thereof, resin particle dispersion, and electrostatic image developer: Provided are a toner for developing an electrostatic image comprising a crystalline resin having an ester bond and at least one of a sulfide bond or a disulfide bond in the main-chain, an electrostatic image developer and an image-forming process by using the same, a method of producing the toner...

20060240354 - Toner, method of preparing the toner and apparatus for preparing the toner: A toner, a method of and an apparatus for preparing a permanently-charged electret toner, including discharging a solution or dispersion including a resin and a colorant through a nozzle vibrating at a constant frequency to form a droplet; applying a direct potential to an electrode facing the nozzle to positively...

20060240355 - Positive resist composition and resist laminate for low-acceleration electron beam and mehod of pattern formation: A positive resist composition and resist laminate for a low-acceleration electron beam, which exhibit excellent resolution and dry etching resistance, reduced thickness loss, and can be used favorably in a method of forming a resist pattern that includes a step of conducting exposure using a low-acceleration electron beam. This positive...

20060240356 - Positive type photosensitive epoxy resin composition and printed circuit board using the same: A positive type, photosensitive epoxy resin composition comprising (a) an epoxy resin having two or more epoxy groups in one molecule, (b) a modified phenolic resin having a triazine ring, (c) a latent basic curing agent and (d) a photosensitive acid generator; and a preferably multilayered printed circuit board of...

20060240357 - Hybrid recordable optical record carrier: The present invention relates to a recordable optical record carrier which can be used to make a back-up of the full content of a SA-CD disc. The proposed record, carrier comprises: a first transparent substrate layer (1), a first semi-transparent recordable information layer (2) including an organic dye material having...

20060240358 - Pretreatment compositions:  wherein, V is selected from CH and N, Y is selected from O and NR3 wherein R3 is selected from H, CH3 and C2H5, R1 and R2 are each independently selected from H, a C1-C4 alkyl group, a C1-C4 alkoxy group, cyclopentyl and cyclohexyl, or alternatively, R1 and R2 can...

20060240361 - Method of forming small pitch pattern using double spacers: A method of forming a small pitch pattern using double spacers is provided. A material layer and first hard masks are used and characterized by a line pattern having a smaller line width than a separation distance between adjacent mask elements. A first spacer layer covering sidewall portions of the...

20060240360 - Method of manufacturing printed circuit board using imprinting process: The present invention relates to a method of manufacturing a printed circuit board using an imprinting process, in which a pattern having a large area can be uniformly formed using a plurality of molds, and the plurality of molds is sequentially removed, thereby solving problems occurring in release of the...

20060240362 - Method to align mask patterns: Alignment tolerances between narrow mask lines, for forming interconnects in the array region of an integrated circuit, and wider mask lines, for forming interconnects in the periphery of the integrated circuit, are increased. The narrow mask lines are formed by pitch multiplication and the wider mask lines are formed by...

20060240359 - Patterning process and contact structure: A patterning process is described. A substrate formed with a material layer and a photoresist layer thereon is provided, and then a photomask is provided having a main opaque pattern and a partial-exposure pattern at the periphery of the main opaque pattern thereon. The photoresist layer is exposed through the...

20060240363 - Semiconductor device with robust polysilicon fuse: A new method is provided to create a polysilicon fuse. The invention provides for applying a first oxide plasma treatment to the surface of the created polysilicon fuse, creating a thin layer of native oxide over the surface of the created polysilicon fuse, followed by a DI water rinse. This...

20060240364 - Apparatus and method for making circuitized substrates having photo-imageable dielectric layers in a continuous manner: Apparatus and method for making circuitized substrates using a continuous roll format in which a layer of conductor is fed into the apparatus, layers of photo-imageable dielectric are applied to opposite sides of the conductor layer, thru-holes are formed through the composite, and then metal layers are added over the...

20060240365 - Side seal for wet lens elements: A method for protecting a wet lens element from liquid degradation is provided. The method includes applying a thin coating of an organoxy-metallic compound to the side portions of a wet lens element to leave behind an optically inert, light absorbing metal oxide film. A liquid shield coating is applied...

20060240367 - Silver salt photothermographic dry imaging material: A silver salt photothermographic dry imaging material comprising a support having: (i) a photosensitive layer comprising photosensitive silver halide grains, an organic silver salt and a reducing agent for silver ions on one side of the support; and (ii) a backing layer on a side of the support opposite the...

20060240366 - Thermally developable materials containing thermal solvents: Black-and-white, dry processable thermally developable materials have increased stability after imaging with the incorporation of at least 0.0001 mol/m2 of a thermal solvent having one or more >N—C(═O)— groups. Such thermally developable materials include both thermographic and photothermographic materials....

20060234132 - Holographic sensors and their production: A sensor comprising a medium and, disposed throughout the volume thereof, a holographic element whose fringes are defined by different degrees of swellability in a liquid....

20060234133 - Optical information recording media, method for manufacturing the same and method for recording/reproducing optical information: An optical information recording medium has inner and outer spacers at least one of which is formed as an integral part of either one of the top and bottom substrates for defining a cell between the top and bottom substrates by bonding the top and bottom substrates through the spacers...

20060234138 - Hard mask arrangement: An interconnect connection structure having first and second interconnects and multiple connection elements that electrically connect the first interconnect to the second interconnect is described. The multiple connection elements are formed laterally in a lateral region of the first and second interconnects relative to an overlay orientation of the interconnects....

20060234140 - Method and device for checking lithography data: Devices and methods are provided that include advantages such as the ability to identify sizes, shapes and locations of frequently unwanted additional features that occur as a result of photolithographic interference. The additional feature information is obtained through use of simulation methods with reduced processing time or solving a system...

20060234135 - Method for repairing mask-blank defects using repair-zone compensation: A method for repairing mask-blank defects uses repair-zone compensation. Local disturbances are compensated over the post-defect-repair repair-zone by altering a portion of the absorber pattern on the surface of the mask blank. This enables the fabrication of defect-free (since repaired) X-ray Mo—Si multilayer mirrors. Repairing Mo—Si multilayer-film defects on mask...

20060234142 - Methods of forming reticles: The invention includes reticle constructions and methods of forming reticle constructions. In a particular aspect, a method of forming a reticle includes provision of a reticle substrate having a defined main-field region and a defined boundary region. The substrate has a relatively transparent base and a relatively opaque material over...

20060234137 - Photomask structures providing improved photolithographic process windows and methods of manufacturing same: Photolithographic methods for semiconductor manufacturing are provided wherein photomask structures are designed to provide increased lithographic process windows for printing sub-wavelength features. In one aspect, a photomask includes a mask substrate transparent to exposure light of a given wavelength, and a mask pattern formed on a surface of the substrate....

20060234134 - Radiation stability of polymer pellicles: An embodiment of the present invention includes a technique to improve stability of a pellicle. The pellicle is pre-baked at a predetermined temperature substantially below a glass transition temperature. The pre-baked pellicle is purged with an inert gas. The purged pellicle is radiated by a radiation at a wavelength. In...

20060234141 - Single trench repair method with etched quartz for attenuated phase shifting mask: In accordance with the objectives of the invention a new method is provided for the repair of an attenuated phase shifting mask having a contact pattern. The invention etches a single trench in the quartz substrate of the phase shifter mask and removes the impact of a void in the...

20060234136 - Systems and methods for detecting focus variation in photolithograph process using test features printed from photomask test pattern images: Systems and methods are provided for detecting focus variation in a lithographic process using photomasks having test patterns adapted to print test features with critical dimensions that can be measured and analyzed to determine magnitude and direction of defocus from a best focus position of an exposure tool during the...

20060234139 - Systems and methods for modifying a reticle's optical properties: Disclosed are systems and methods for modifying a reticle. In general, inspection results from a plurality of wafers or prediction results from a lithographic model are used to individually decrease the dose or any other optical property at specific locations of the reticle. In one embodiment, any suitable optical property...

20060234143 - Process for the preparation of novel dyes for use in imaging members: There are described novel rhodamine dye compounds and imaging members and imaging methods, including thermal imaging members and imaging methods, utilizing the compounds. The dye compounds exhibit a first color when in the crystalline form and a second color, different from the first color, when in the liquid, amorphous form....

20060234145 - Method for determining and correcting reticle variations: Disclosed are techniques for determining and correcting reticle variations using a reticle global variation map generated by comparing a set of measured reticle parameters to a set of reference reticle parameters. The measured reticle parameters are obtained by reticle inspection, and the variation map identifies reticle regions and associated levels...

20060234144 - Method for monitoring a reticle: Reticles may comprise shading elements (SEs) for locally altering the reticle optical properties. However, such reticles may degrade over time as a result of repeated exposure to radiation in a lithography process, as the radiation may “heal” the SEs. Disclosed are techniques for monitoring a reticle in order to maintain...

20060234146 - Electrophotographic photosensitive member, process cartridge and electrophotographic apparatus: The invention provides an electrophotographic photosensitive member including a conductive layer, an intermediate layer and a photosensitive layer in this order on a substrate, in which the conductive layer contains a binder resin and conductive particles, wherein the conductive particles are TiO2 particles coated with oxygen-deficient SnO2, the conductive particles...

20060234147 - Photosensitive member having two layer undercoat: An imaging member having a substrate, an electroconducting layer having an electroconducting particle of a core and outer shell, an interfacial layer, and a charge transport layer with charge transport materials dispersed therein....

20060234148 - Pyrrole derivative and photosensitive film using the same: The present invention relates to pyrrole derivatives and photosensitive film using the same and more particularly, the pyrrole derivatives consist of pyrrole units to allow polymerization chemically and electrochemically and a perylene diimide unit to absorb light so that perylene diimide film can be produced by crosslinking the pyrrole units...

20060234149 - Cyan toner and method of producing cyan toner: A cyan toner is provided which is brighter and more greenish in hue than conventional cyan toners and highly translucency. A cyan toner characterized by comprising toner particles at least having a coloring compound represented by the Formula (1):...

20060234150 - Liquid developer: A liquid developer contains an insulation liquid containing as its main component a glyceride of an unsaturated fatty acid, toner particles dispersed in the insulation liquid; and an oxidation polymerization accelerator for accelerating oxidation polymerization reaction of the glyceride during fixing process of the toner particles. The oxidation polymerization accelerator...

20060234151 - Functional organic thin film, organic thin-film transistor, and methods for producing these: A functional organic thin film comprising a network structure moiety 12 including silicon atoms and oxygen atoms and formed on a base 11; and a π-election conjugated system molecule 15 bonded to the network structure moiety 12 via an insulating molecule 14....

20060234152 - Method for thermal development of a photosensitive element using an oriented development medium: The invention relates to a method for forming a relief pattern from a photosensitive element containing a composition layer capable of being partially liquefied by heating. Liquefied portions of the composition layer are removed by contact with a development medium having a predetermined directionality. The directionality of the development medium...

20060234158 - Bottom resist layer composition and patterning process using the same: There is disclosed a bottom resist layer composition for a multilayer-resist film used in lithography which comprises, at least, a polymer having a repeating unit represented by the following general formula (1). Thereby, there can be provided a bottom resist layer composition which shows an antireflection effect against an exposure...

20060234157 - Composition and method for printing a patterned resist layer: The invention relates to a composition for printing a patterned resist layer onto an underlying, preferably etchable layer comprising: a) an acid-functional resin that is soluble in alkaline medium and insoluble in acidic medium, having an acid number of at least 100 mg KOH/g; b) a base solvent having a...

20060234156 - Composition for formation of underlayer film for lithography containing epoxy compound and carboxylic acid compound: There is provided an underlayer coating forming composition for lithography that is used in lithography process of manufacture of semiconductor device; and an underlayer coating having a high dry etching rate compared with photoresist. Concretely, it is a composition for forming an underlayer without use of crosslinking reaction by an...

20060234160 - Novel ester compounds, polymers, resist compositions and patterning process: Novel ester compounds having formula (1) wherein A1 is a polymerizable functional group having a double bond, A2 is furandiyl, tetrahydrofurandiyl or oxanorbornanediyl, R1 and R2 each are a monovalent hydrocarbon group, or R1 and R2 may bond together to form an aliphatic hydrocarbon ring with the carbon atom, and...

20060234159 - Photosensitive epoxy resin adhesive composition and use thereof: A photosensitive epoxy resin adhesive composition which is capable of forming a pattern by exposure to light through a photomask and development, and which, even after having formed a pattern in that manner, may still exhibit high adhesiveness when heated while keeping its pattern as such, as well as a...

20060234155 - Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon: Radiation-sensitive element comprising: (a) one or more types of monomers each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (b) at least one sensitizer, (c) at least one coinitiator capable of forming free radicals together with the sensitizer (b) and selected from the following classes of...

20060234153 - Radiation-sensitive resin composition: A radiation-sensitive resin composition suitable as a chemically-amplified resist useful for microfabrication utilizing various types of radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser. The radiation-sensitive resin composition of the present invention comprises: (A) a resin comprising a recurring unit (1-1) shown...

20060234154 - Radiation-sensitive resin composition: A radiation-sensitive resin composition comprising an acid-labile group-containing resin obtained by living radical polymerization having a specific structure which is insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid, and a photoacid generator, wherein the ratio of weight average molecular weight to number...

20060234162 - Lithographic printing with printing members including an oleophilic metal and plasma polymer layers: Printing members that include a plasma polymer layer exhibit enhanced tolerance for high imaging-power densities. The plasma polymer layer may contain or be adjacent to an oleophilic metal such as copper....

20060234161 - Method of making a lithographic printing plate precursor: A method of making a heat-sensitive lithographic printing plate precursor is disclosed which comprises the steps of (i) providing a web of a lithographic support having a hydrophilic surface; (ii) applying on the hydrophilic surface of the web a coating comprising a phenolic resin; (iii) drying the coating; (iv) a...

20060234163 - Laser-assisted deposition: A method is provided for depositing a patterning material onto an optically transparent substrate by the use of a laser beam. A solid layer of a patterning material is placed adjacent to a receiving surface of the substrate. A laser beam is directed at an incident angle between 0 and...

20060234164 - Norbornene-type polymers, compositions thereof and lithographic process using such compositions: Embodiments of the present invention relate generally to non-self imageable and imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and the immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to...

20060234166 - Method of forming pattern using fine pitch hard mask: A method of forming a fine pattern of a semiconductor device using a fine pitch hard mask is provided. A first hard mask pattern including first line patterns formed on an etch target layer of a substrate with a first pitch is formed. A first layer including a top surface...

20060234165 - Method of manufacturing a semiconductor device: A method of manufacturing a semiconductor device, comprises forming a first mask pattern on an under-layer region, forming a plurality of dummy-line patterns on the under-layer region, the dummy-line patterns being arranged at a first pitch, forming second mask patterns having mask parts provided on long sides of the dummy-line...

20060234167 - Semiconductor constructions: The invention includes a process whereby a solvent is utilized to remove soluble portions of a resist, and subsequently the solvent can be removed with a gas-fortified liquid. In particular aspects, the gas-fortified liquid emits bubbles during the removal of the solvent. Additionally, the gas-fortified liquid can be utilized to...

20060234168 - Pattern forming materials and pattern formation method using the materials: A pattern forming materials includes a thermal sensitive material layer formed on a target substrate, a first light-to-heat converting layer formed between the thermal sensitive material layer and the target substrate, and a second light-to-heat converting layer formed on a surface of the thermal sensitive material layer opposite to the...

20060234169 - Photo mask: A photo mask comprises a H-type light-shield pattern. In an exposure process, a photo mask is used to form a STAR (Step Asymmetry Recess) gate region, thereby stably securing a storage node contact region and improving a refresh characteristic of a semiconductor device....

20060234170 - Thermally developable photosensitive material: p

20060228634 - Beam-induced etching: A method and apparatus for local beam processing using a beam activated gas to etch material are described. Compounds are disclosed that are suitable for beam-induced etching. The invention is particularly suitable for electron beam induced etching of chromium materials on lithography masks. In one embodiment, a polar compound, such...

20060228635 - Method and apparatus for fabricating shaped structures and shaped structures including one- , two- or three-dimensional patterns incorporated therein: The invention includes a template useful for the fabrication of devices having one, two, or three dimensional geometries. The template can include at least a first patterned surface and a mask integrated into the template for creating an interference pattern when radiation is passed through the mask. The template can...

20060228633 - Method of resolving phase conflicts in an alternating phase shift mask and the alternating phase shift mask: A method of resolving phase conflict in an alternating phase shift mask and the alternating phase shift mask are disclosed, which are characterized by that a transparent slit region is formed on an non-transparent region placed in a phase conflict area encountered at layout in an alternating phase shift mask...

20060228636 - Pattern layout for forming integrated circuit: A pattern layout for forming an integrated circuit includes a first device pattern, a second device pattern, and an auxiliary pattern. The first device pattern includes a line and a space alternately arrayed on a fixed pitch having regular intervals in a first direction. The second device pattern is disposed...

20060228637 - Color filter: One embodiment of a color filter includes a substrate and a color filter pattern formed on the substrate, the color filter pattern including at least two, substantially identical patterned layers....

20060228638 - Photoconductor with protective overcoat: Photoconductors are disclosed having an overcoat layer of silsesquioxane substituted with 4-[3-(triethoxysilylpropoxy]-2-hydroxybenzophenone. The degree of substitution is believed not critical. Similarly, the thickness of the coating is not critical and may vary according to the wear anticipated, as well as the electrical requirements of the specific application. Improvements are realized...

20060228640 - Preparation of azo colorants in microreactors and their use in electrophotographic toners and developers, powder coatings, ink jet inks and electronic medias: The invention is directed to an electrophotographic toner or developer, powder coating, ink jet ink or an electronic media having an azo colorant prepared by conducting the diazotization of aromatic or hetaromatic amines or the azo coupling reaction or the diazotization and the azo coupling reaction in a microreactor....

20060228639 - Toner containing low melt wax stripping enhancing agent: Toners including a low melt wax and a carnauba wax are described. The toners include at least one binder, at least one colorant, at least one wax having a melting point of 135° C. or less, and a compatibilizer wax (e.g., carnauba wax). The low melt wax is preferably polyethylene...

20060228641 - Carrier and developer for latent electrostatic image development, container housing developer, image forming process, image forming apparatus, and processing cartridge: A carrier for electrostatic development contains a core particle and a coating layer covering the core particle, and the core particle is a ferrite particle containing at least one of Zr in an amount of 0.005% by mass to 5% by mass and Bi in an amount of 0.001% by...

20060228642 - Method for preparing polymer latex particles having core/shell structure: A method for preparing polymer latex particles having a core/shell structure includes the steps of: forming a dispersion of colorant; heating and mixing an organic phase comprising core monomers and wax to form a blend of the wax and monomers; mixing the dispersion of colorant with the blend of wax...

20060228643 - Heat-sensitive positive working lithographic printing plate precursor: Heat-sensitive element comprising a) an optionally pretreated substrate; b) a positive working coating comprising (i) at least 40 wt.-%, based on the dry weight of the coating, of at least one polymer soluble in aqueous alkaline developer selected from novolak resins, functionalized novolak resins, polyvinylphenol resins, polyvinyl cresols and poly(meth)acrylates...

20060228646 - Coating compositions for use with an overcoated photoresist: Organic coating composition are provided including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred compositions of the invention comprise contain a crosslinker component that is resistant to sublimination or other...

20060228644 - Nanocomposite photoresist composition for imaging thick films: The present invention relates to a photoresist composition suitable for image-wise exposure and development as a positive photoresist comprising a positive photoresist composition and an inorganic particle material having an average particle size equal or greater than 10 nanometers, wherein the thickness of the photoresist coating film is greater than...

20060228645 - Nanocomposite photosensitive composition and use thereof: The present invention relates to a photoresist composition suitable for image-wise exposure and development as a negative photoresist comprising a negative photoresist composition and an inorganic particle material having an average particle size equal or greater than 10 nanometers, wherein the thickness of the photoresist coating film is greater than...

20060228648 - Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process: Sulfonate salts have the formula: CF3—CH(OCOR)—CF2SO3−M+ wherein R is C1-C20 alkyl or C6-C14 aryl, and M+ is a lithium, sodium, potassium, ammonium or tetramethylammonium ion. Onium salts, oximesulfonates and sulfonyloxyimides and other compounds derived from these sulfonate salts are effective photoacid generators in chemically amplified resist compositions....

20060228647 - Photoresist composition: Photoresist compositions having a resin binder with an acid labile blocking group with an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon photolysis and optionally, a base....

20060228649 - Optical recording medium: An object of the present invention is to provide an optical recording medium for high speed recording corresponding to 3× speed to 10× speed (10 m/s to 36 m/s) of DVD with a favorable recording sensitivity and overwriting performance (or characteristic). Therefore, the optical recording medium is characterized by providing...

20060228650 - Manufacturing method of laser processed parts and protective sheet for laser processing: Providing a method of manufacturing a laser processed part by using a protective sheet for laser processing capable of effectively suppressing contamination of surface of workpiece by decomposition product, and processing at high precision, when processing the workpiece by optical absorption ablation of laser beam. It is also an object...

20060228651 - Method of writing identifying information on wafer: A method of writing identifying information comprises: the step of forming a metal film on a wafer; the step of forming a resist layer on the metal film; the step of exposing the resist layer by projecting a pattern for an alignment mark on the resist layer; the first development...

20060228652 - Method of fabricating flash memory device: A method of fabricating a memory device includes forming first and second gate stacks, each gate stack having a floating gate and a control gate. A contact plug comprising metal is formed to contact a doped region provided between the first and second gate stacks. A first insulation layer is...

20060228653 - Development or removal of block copolymer or pmma-b-s-based resist using polar supercritical solvent: Methods of developing or removing a select region of block copolymer films using a polar supercritical solvent to dissolve a select portion are disclosed. In one embodiment, the polar supercritical solvent includes chlorodifluoromethane, which may be exposed to the block copolymer film using supercritical carbon dioxide (CO2) as a carrier...

20060228654 - Solution builder wizard: A computing solution is defined by displaying to a user in a graphical user interface a palette of icons representing available computing system components for potential use in a computing solution, each of which has an associated partially-defined behavioral model. The partially-defined behavioral models contain configurable behavioral and interface parameters....

20060228655 - Stabilized silver halide photographic element: A photographic element comprises a silver halide emulsion layer having associated therewith a dye forming coupler and a combination of a carbonamide compound, a phenolic compound, and an electron-rich compound. Such a combination provides improved dye stability....

20060228656 - Squalirium compound, thermally developable photographic material containing said compound, and image forming method thereof: A thermally developable photographic material containing a support, provided thereon: (i) a photosensitive layer containing photosensitive silver halide particles, and (ii) a layer containing at least one represented by formula below on one or both surfaces of the support....

20060228657 - Electrically responsive device: Electrically responsive devices and methods for fabricating electrically responsive devices involves applying an electrically responsive material (e.g., an electroactive material) over at least a portion of a surface of a substrate material and applying an electrode material over at least a portion of a surface of the electrically responsive material....

20060222960 - Hologram recording sheet, holographic optical element using said sheet, and its production process: The hologram recording sheet according to the invention is made up of a base film and hologram sensitive materials sensitive to different wavelength regions formed therein in a desired pattern, or a film and at least two hologram recording sensitive materials sensitive to different wavelength regions laminated on the film...

20060222961 - Leaky absorber for extreme ultraviolet mask: The present invention discloses a method of forming a mask including: providing a substrate; forming a multilayer mirror for EUV light over the substrate; forming a leaky absorber for the EUV light over the multilayer mirror; and patterning the leaky absorber into a first region that is strongly reflective and...

20060222968 - Lithographic template and method of formation and use: This invention relates to semiconductor devices, microelectronic devices, micro electro mechanical devices, microfluidic devices, photonic devices, and more particularly to a lithographic template, a method of forming the lithographic template and a method for forming devices with the lithographic template. The lithographic template (10) is formed having a substrate (12),...

20060222966 - Mask layout and method of forming contact pad using the same: Provided are contact photomasks and methods using such photomasks for fabricating semiconductor devices and forming contact plugs on portions of active regions exposed between gate lines. The elongated active regions are arrayed in a series of parallel groups with each group being, in turn, aligned along their longitudinal axes to...

20060222965 - Mask, method for producing mask, and method for producing wired board: A mask, through which a plurality of slender through-holes are formed, has a reinforcing section which is formed to span the through-holes, wherein recesses are provided at portions of the reinforcing section to cover the through-holes. Accordingly, a metal, which is subjected to the sputtering, easily makes the detour around...

20060222962 - Masking of repeated overlay and alignment marks to allow reuse of photomasks in a vertical structure: In formation of monolithic three dimensional memory arrays, a photomask may be used more than once. Reuse of a photomask creates second, third or more instances of reference marks used by the stepper to achieve alignment (alignment marks) and to measure alignment achieved (overlay marks) directly above prior instances of...

20060222964 - Method for manufacturing photomask and method for manufacturing semiconductor device using photomask: A method for manufacturing a photomask based on design data includes the steps of forming a figure element group including a figure element in a layout pattern on the photomask and a figure element affecting the figure element due to the optical proximity effect, adding identical identification data to a...

20060222963 - Methods of forming patterns in substrates: The invention includes methods of forming a pattern in a substrate. A feature location is defined where a square corner is desired to be patterned into the substrate. A mask is generated which is to be utilized in creating a substantially square corner at the feature location. The mask has...

20060222967 - Reticle, method for manufacturing magnetic disk medium using reticle, and magnetic disk medium: It is made possible to obtain a reticle which has a high strength even it is formed in a doughnut shape, a method for manufacturing a magnetic disk medium using the reticle, and a magnetic disk medium using the same. The magnetic disk medium has a toroidal pattern pattern. A...

20060222970 - Color filter and method of producing same: The main object of the present invention is to provide an efficient color filter with no white spots and the like generated in colored layer, and a method of producing the same. To achiever the object, the invention provides a method of producing a color filter, comprising: a liquid repellent...

20060222971 - Display apparatus substrate and manufacturing method, and a display apparatus thereof: A substrate includes a hydrophobic body, a hydrophilic body portion and a hydrophilic thin film. The hydrophilic body portion is formed on the hydrophobic body. The hydrophilic thin film is formed on the hydrophilic body portion to form a display element. In a method of manufacturing the substrate, a bare...

20060222969 - Photosensitive colored composition and color filter: s

20060222972 - Dual-layer protected transient document: A reimageable medium including a transparent substrate having a first side and any opposing side, a protective layer and an imaging layer. The protective layer can be located on the first side of the transparent substrate and the imaging layer can be located on the opposing side of the transparent...

20060222973 - Multicolor electronic paper: A reimagable medium and a method for “writing” to a reimagable medium are disclosed. The reimagable medium includes a liquid crystal layer, one or more photochromic layers and an electric field generating apparatus. The electric field generating apparatus supplies voltage levels across the liquid crystal layer causing the liquid crystal...

20060222974 - Optical element with homeotropically aligned liquid crystal molecules, and a liquid crystal display using the optical element: An optical element has a base material with an optically transparent base plate, and a refractive functional layer capable of refracting light that is laminated to the base material. The refractive functional layer has liquid crystal molecules fixed in homeotropic alignment, and the optical element has a haze of 0.1...

20060222975 - Integrated optical metrology and lithographic process track for dynamic critical dimension control: A method and apparatus for improving a yield and throughput of a lithographic process track, the method including providing a first resist layer on a first process wafer; forming a first resist pattern in the first resist layer including a heating process according to a first temperature profile wherein the...

20060222976 - Particles for electrophoretic media: Compositions of encapsulated triboelectrically charged particles and methods for making them using a spinning disc process are disclosed. The methods can be used to make charged pigment particles embedded in a neutral polymer matrix. The polymer matrix keeps oppositely charged pigment particle from agglomerating. The particles can be used for...

20060222977 - Process for arylamine production: A process for synthesizing acrylamine compounds is provided. The process includes producing a dicarboxylic acid salt of an arylamine molecule by reacting a dicarboxylic acid arylamine with an alkyl salt to produce the dicarboxylic acid arylamine salt....

20060222978 - Photoconductive imaging members: An imaging member comprised of a hole blocking layer, a photogenerating layer, and a charge transport layer, and wherein the hole blocking layer is comprised of a metal alkyoxide, an amino siloxane, and at least one polymer binder containing epoxy groups....

20060222979 - Electrophotographic photoreceptor, electrophotographic image forming method, and electrophotographic device: An object of the invention is to provide an electrophotographic photoreceptor showing high responsivity even under a low temperature and low humidity circumstance and capable of compatibilize the decrease of the size and the increase in the image forming speed of an electrophotographic apparatus. In a photosensitive layer of an...

20060222980 - Particles and manufacturing method thereof, toner and manufacturing method thereof, and developer, toner container, process cartridge, image forming method and image forming apparatus: The present invention provides a method for manufacturing particles, where a viscous material is sprayed with a high-pressure gas for atomization while the viscous material is being discharged in a chamber, and cooling air is introduced in the chamber for granulation. The present invention also provides a method for manufacturing...

20060222982 - Developer and image forming method: The present invention provides a developer suitable for a hybrid developing device which may provide a high-quality clear image by suppressing the occurrence of a ghost phenomenon, the occurrence of a carrier-jumping phenomenon and the occurrence of a current leaking phenomenon, and an image forming method which uses such a...

20060222981 - Electrophotographic developer: A developer for electrophotography comprising of a carrier and a magnetic toner containing cyclo-olefin copolymer resin as a binder resin. A carrier in which a surface of the core particle is coated by resin coating agent or a magnetic material dispersed resin carrier, is desirable. In the case in which...

20060222983 - Magnetic toner for two-component developer and image forming method using the developer: The object is to provide a magnetic toner with which toner scattering, toner spent to carrier, development of scratch streaks by the magnetic brush on the photoreceptor drum can be prevented for a prolonged period and a good image characteristic (in image density and background fogging) can be maintained for...

20060222984 - Toner for developing electrostatic latent image and image forming method using the same: The toner of the present invention is characterized in that the charges rise up rapidly, the charge quantity is not insufficient nor excessive, the photoreceptor contamination is minimized and the toner is endurable under harsh conditions and against the high stress usage. The magnetic particle contained in the toner is...

20060222985 - Recording material, toner, liquid developer and image forming method using the same: It is an object of the present invention to provide a recording material which contains at least a colorant and a resin wherein the colorant contains silver, and a toner which contains at least a colorant and a resin wherein the colorant is an alloy containing silver, zinc and aluminum....

20060222986 - Particle external surface additive compositions: A toner having at least one binder, at least one colorant and external additives. The external additives include at least one of silica and titania, and at least two metal stearates. A developer may be produced including the toner having at least two metal stearates and a carrier. An electrophotographic...

20060222987 - Image-forming color toner, developing agent, image-forming apparatus, toner container, image-forming process cartridge and image-forming process: An image-forming color toner contains at least a colorant, a resin (A), a modified resin (B) and a wax (a) as a mold releasing agent, the image-forming color toner having a phase separated structure comprising the modified resin (B) as a domain in the resin (A) as a continuous phase,...

20060222988 - Electrophotographic toner: The electrophotographic toner of the present invention comprises toner particles containing at least a binder resin, wax, a charge control agent and a pigment, and at least titanium oxide externally added to the toner particles as an external additive. The titanium oxide has an aspect ratio of 2 to 5...

20060222989 - Emulsion/aggregation based toners containing a novel latex resin: A toner is disclosed that includes a toner binder of a styrene/acrylate resin containing carboxylic acid substituents and epoxy substituents, and optionally a colorant and/or wax. The carboxylic acid substituents act as a curing agent and react with the epoxy substituents, causing rapid crosslinking of the toner. Curing occurs during...

20060222990 - Control of particle growth with complexing agents: A method of making particles suitable for use as toners includes forming a mixture of sulfonated olyester resin, a colorant dispersion and optionally a wax dispersion, homogenizing the mixture, adding a coagulant to the mixture to aggregate the mixture to form aggregated particles, and coalescing the aggregated particles to form...

20060222991 - Toner compositions and process thereof: wherein R is an alkylene group; X is an aromatic hydrocarbon; Y is selected from the group consisting of an alkali and an alkaline earth metal salt of an arylenesulfonate or an alkylenesulfonate; R′ is a hydrophobic group, and m and n represent the number of random segments of from...

20060222992 - Toner for electrostatic image development and process for preparing the same: A process for preparing a toner for electrostatic image development, the process comprising the steps of: (S1) mixing an aqueous pigment dispersion and an aqueous resin particle dispersion containing self-dispersible polyester resin particles as a binder resin to prepare a mixture; and (S2) adding a polyvalent metal salt as a...

20060222993 - Particle having conductive polymer surface additive: Particles, preferably toner particles comprised of at least binder and colorant, are described that include a doped conductive polymer material as a surface additive on the external surface of the particle. The presence of the doped external conductive polymer material enables the particles to retain a substantially uniform charge distribution...

20060222994 - Carrier compositions: Coated carrier particles are provided for use in developer compositions for electrophotographic imaging. The coated carrier particles include a carrier core and a resin coating that includes first and second polymer components. The coated carrier particles exhibit stable triboelectric charging during aging, decreased coating hardness, higher coating coverage, and an...

20060222995 - Method of forming fixed images: A method of forming fixed images, including the step of applying a two-component developer containing a carrier and a toner containing a wax and a resin binder containing a crystalline polyester to a two-component development device with a linear speed of from 500 to 5,000 mm/sec, to develop the toner,...

20060222996 - Toner processes: A process including mixing a sulfonated polyester resin, a colorant, and a coagulant; heating the resulting sulfonated polyester mixture; adding a polymetal halide and an anionic latex to form coated toner particles; and heating the coated toner particles is disclosed....

20060222997 - Adhesion improver for photosensitive resin composition and photosensitive resin composition containing same: An adhesion-improving agent comprising a sulfonyl group substituted nitrogen compound represented by the below described general formulae (1) to (5) or a thiadiazole compound represented by the below described general formulae (6) to (8) and a photosensitive resin composition containing an alkali-soluble resin and a photosensitizer, comprising said adhesion-improving agent....

20060223000 - Method of reducing sensitivity of euv photoresists to out-of-band radiation and euv photoresists formed according to the method: A modified EUV photoresist and a method of making the resist. The modified resist includes an EUV photoresist and a LAM incorporated into the EUV photoresist....

20060222999 - Photosensitive composition and cured products thereof: There is provided a photosensitive composition excellent in photo-curability which comprises an epoxy compound having two or more epoxy groups, a polynuclear phenol compound having a specific structure and an energy beam-sensitive cationic polymerization initiator, and optionally a predetermined percentage of a hydroxyl group-containing compound having one or more hydroxyl...

20060223002 - Planographic printing plate precursor having an image-recording layer containing an infrared ray absorbent, a polymerization initiator, a polymerizable compound, and a thiol compound: The present invention provides a planographic printing plate precursor having a support and, on the support, an image-recording layer containing an infrared ray absorbent, a polymerization initiator, a polymerizable compound, and a thiol compound. The planographic printing plate precursor preferably has a protective layer on the image-recording layer....

20060222998 - Positive photosensitive composition: There is provided a positive photosensitive composition which requires no burning, makes it possible to obtain necessary and sufficient adhesion when it is applied under a humidity of 25 to 60%, can be developed at a low alkali intensity, makes it possible to carry out development with keeping high sensitivity...

20060223001 - Radiation-sensitive resin composition: wherein A represents a substituted or unsubstituted divalent cyclic hydrocarbon group, R1 represents a monovalent acid-dissociable group, X represents a single bond or a substituted or unsubstituted divalent hydrocarbon group, Y represents a single bond or a divalent coupling means, and Z represents a single bond or a substituted or...

20060223003 - Optical recording medium and dye: e

20060223004 - Storage medium, reproducing method, and recording method: According to one embodiment, a storage medium comprises a transparent resin substrate on which a groove is formed, a recording layer formed on the groove on the transparent resin substrate, the recording layer using an organic dye material and recording information with a light beam of 620 nm or less...

20060223005 - Lithographic printing plate support and presensitized plate: in which Sx50 is the actual area of a 50 μm square region of the surface as determined by three-point approximation from three-dimensional data obtained by measuring the region with an atomic force microscope at 512×512 points and S050 is the geometrically measured area of the same region, is 20...

20060223006 - Method of producing a planographic printing plate: The method of producing the planographic printing plate of the present invention comprises forming a crosslinked hydrophilic layer on a substrate by hardening a hydrophilic polymer having a crosslinkable group at one terminal and a crosslinker by heat or light, and forming a hydrophobic image by ejecting an inkjet composition...

20060223008 - Composition for forming antireflection film, laminate, and method for forming resist pattern: e

20060223009 - Imaging methods: An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts....

20060223007 - Method and apparatus for lithographic imaging using asymmetric illumination: According to one aspect of the present invention, a method and apparatus for processing a substrate may be provided. A reticle may be positioned relative to a substrate. The reticle may have a plurality of features with dimensions extending in a first and a second direction and being asymmetric in...

20060223010 - Positive type radiation-sensitive resin composition: A positive type radiation-sensitive resin composition suitable as a chemically-amplified resist sensitive to active radiation particularly to deep ultraviolet rays represented by a KrF excimer laser, an ArF excimer laser, or an F2 excimer laser, excelling particularly in a process margin for the KrF excimer laser is provided. The positive...

20060223011 - Method for manufacturing optical semiconductor element, and optical semiconductor element: A method for manufacturing an optical semiconductor element having a light emitting element section and a functional section. The method includes conducting dry etching, and then conducting wet etching, when forming at least a part of the functional section....

20060223012 - Thermal processing method of silver salt photothermographic dry imaging material: A thermal processing method of a photothermographic material comprising light-insensitive aliphatic carboxylic acid silver salt particles, light-sensitive silver halide grains, a reducing agent for silver ions and a binder is disclosed, comprising (a) exposing the photothermographic material, and (b) developing the exposed photothermographic material at a development temperature of at...

20060223013 - Silver halide color photographic photosensitive material and image forming method: An image forming method including a step of imagewise exposing a silver halide color photographic photosensitive material having, on a support, photographic constituent layers including at least one blue sensitive silver halide emulsion layer, at least one green sensitive silver halide emulsion layer, at least one red sensitive silver halide...