Radiation imagery chemistry: process, composition, or product thereof inventions 09/06

20060210891 - Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same: The present invention generally relates to improved binary half tone (“BHT”) photomasks and microscopic three-dimensional structures (e.g., MEMS, micro-optics, photonics, micro-structures and other three-dimensional, microscopic devices) made from such BHT photomasks. More particularly, the present invention provides a method for designing a BHT photomask layout, transferring the layout to a...

20060210887 - Lithography mask and methods for producing a lithography mask: Lithography mask for the lithographic patterning of a resist layer on a substrate having first regions, in which the lithography mask has a nontransparent layer, and second and third regions, which differ in terms of the optical thickness of the lithography mask and in which the lithography mask is at...

20060210890 - Mask data generation method: In the mask data generation method, optical simulation is performed on a dual gate including a first gate portion doped with an impurity of a first conductivity type and a second gate portion doped with an impurity of a second conductivity type for correcting design data including the dual gate....

20060210885 - Measuring the effect of flare on line width: In photo-lithography, one may assess the effect of flare due to various exposure tools. In an example embodiment, in a photo-lithography process on a photo resist coated substrate, there is a method (600) for determining the effect of flare on line shortening. The method (600) comprises, at a first die...

20060210886 - Method for making grayscale photo masks and optical grayscale elements: A positive photo resist is provided on a surface of a photo mask blank. Light is then exposed onto the photo resist to form a predetermined pattern of unexposed and exposed portions in the photo-resist. After development, the exposed portions are removed and ions are implanted to obtain a modulated...

20060210889 - Pattern forming method, semiconductor device manufacturing method and phase shift photomask having dummy gate patterns: In a method for forming a plurality of gate patterns in parallel with each other on a photoresist layer within one circuit block, at least one dummy gate pattern is formed in parallel with the gate patterns when a pitch between said gate patterns is larger than a predetermined maximum...

20060210888 - Photomask to which phase shift is applied and exposure apparatus: A problem of a decrease in transmissive light, which partly occurs at a boundary between two polarization modulation regions of a polarized phase shift mask, is solved. A photomask for use in an exposure apparatus which forms an exposure pattern by illumination includes at least two polarization modulation regions which...

20060210892 - Color filter manufacturing method: A method of manufacturing a color filter comprises: applying a color filter material of a negative type onto a surface; an exposing treatment to the color filter material; a developing treatment for the exposed color filter material; a light irradiating step of irradiating a light on the developed color filter...

20060210893 - Method and system for overlay control using dual metrology sampling: A system and method are provided for determining an overlay of a first layer N−1 and a second layer N that are positioned one over the other on a substrate. The first layer includes a first overlay portion. The second layer includes a first complementary overlay portion. The first overlay...

20060210894 - Imaging members: Novel surface layers for photoreceptors are provided. The surface layers are a polymeric composition including a resin and a cyclic polymer....

20060210895 - Photosensitive material for electrophotography and image forming device having the same: An object of the invention is to provide a highly reliable electrophotographic photoreceptor having high sensitivity, excellent in light responsivity, not suffering from lowering of such characteristics even when it is used under a low temperature circumstance or in a high speed electrophotographic process, and with less fatigue degradation upon...

20060210896 - Aromatic amine-based charge transport materials having an n,n-divinyl group: where R1, R2, R3, R4, R5, and R6 comprise, each independently, H or an organic group; and Y comprises an aromatic group, such as an aryl group and an aromatic heterocyclic group. The methods of using the charge transport materials in organophotoreceptors, electrophotographic imaging apparatuses, and electrophotographic imaging processes are...

20060210897 - Charge transport materials having at least a metallocene group: e

20060210898 - Charge transport materials having at least a 1,3,6,8-tetraoxo-1,3,6,8-tetrahydrobenzo[lmn][3,8]phenanthroline-2,7-diyl group: Y1 and Y2 comprise, each independently, H or an organic group, such as an alkyl group, an aryl group, an aromatic heterocyclic group, and combinations thereof; and X comprises a bond, O, S, an aminylene group, a sulfonyl group, an organic linking group, or a combination thereof. The methods of...

20060210899 - Electrostatic latent image developing toner, production method thereof, electrostatic latent image developer, and image forming method: The present invention provides a toner for developing an electrostatic latent image comprising at least a core layer including at least a coloring agent and a first binder resin, and a shell layer for covering the core layer and including a second binder resin, wherein two local maximum values of...

20060210900 - Toner: A toner is formed of toner particles including a polyester resin as a principal component, and at least a colorant and a charge control agent, and externally added inorganic fine particles and organic fine particles. The toner has a volume-average diameter of 4 to 10 μm, contains the charge control...

20060210901 - Toner for developing electrostatic latent image, method for manufacturing toner, and developer for developing electrostatic latent image: The present invention provides a toner for developing an electrostatic latent image including: toner mother particles containing a binder resin and a colorant; and manganese compound particles having a γ-type crystalline structure, the production method thereof, and a developer containing the toner....

20060210902 - Toner and developer, toner container, process cartridge, image forming method and image forming apparatus: wherein FP100 is a maximum tensile strength (N) when a recording medium having the toner unfixed on is vertically separated from the surface of a substrate having a temperature of 160° C. at a constant speed after pressed thereto at a pressure of 100 kPa, and FP200 is same except...

20060210903 - Toner, developer, toner container, process cartridge, image forming apparatus and image forming method: The present invention provides a toner and a developer which includes the toner. The toner is produced in an aqueous medium and includes at least a binding resin, a colorant and a dispersant which disperses the colorant. The binding resin contains 50% by mass to 100% by mass of a...

20060210904 - Toner for electrostatic charge image developing, developer for electrostatic charge image developing, and image forming apparatus: wherein, in the equation (1) and the equation (2), G′(60) represents a storage elastic modulus (Pa) of the toner for electrostatic charge image developing measured under the conditions of a temperature of 60° C., a vibration frequency of 6.28 rad/sec, and a strain amount of 0.01 to 0.5%, and G′(80)...

20060210905 - Carrier for developer developing electrostatic image, developer including the carrier, and image forming method and process cartridge using the developer: A carrier including a magnetic core material; and a resin layer located on the core material, wherein the carrier has a weight average particle diameter (Dw) of from 22 μm to 32 μm, a ratio Dw/Dp of greater than 1.0 and less than 1.2, wherein Dp represents a number average...

20060210906 - Electrophotographic carrier, developer, developer container, process cartridge, image forming apparatus and image forming method: A carrier contains a core; and a cover layer located overlying the core, wherein the cover layer comprises a binder resin, a first particulate material and a second particulate material,wherein the following relationships are satisfied: 1<(D1/h)<10, and 0.001<(D2/h)<1, wherein D1 (μm) represents a volume average particle diameter of the first...

20060210907 - Process for manufacturing an image recording body and apparatus for manufacturing the same: The present invention provides a method for manufacturing an image recording body comprising: image-forming, to form an image on a surface of a film by an electrophotographic method; positioning, by overlaying the film onto a support so that at least one side of the support and a side of the...

20060210908 - Image forming method, image forming apparatus, and process cartridge: To provide an image forming method including: forming a latent electrostatic image on a photoconductor; developing the latent electrostatic image using a toner to form a visible image; transferring the visible image onto a recording medium; fixing the transferred visible image to the recording medium; and removing toner particles remained...

20060210909 - Method for producing a toner, and toner: The object of the present invention is to provide a method for producing a toner which includes ejecting a toner composition fluid containing a toner composition which contains a toner and a colorant, from a nozzle vibrated at a constant frequency to make the toner composition fluid into droplets, and...

20060210910 - Photo-conductor layer for constituting radiation imaging panels: A photo-conductor layer for constituting a radiation imaging panel, which photo-conductor layer is capable of recording radiation image information as an electrostatic latent image, contains a polycrystal constituted of BixMOy, in which M represents at least one kind of element selected from the group consisting of Ge, Si, and Ti,...

20060210911 - Exposure apparatus and method, measuring apparatus, and device manufacturing method: An exposure apparatus includes an illumination optical system for illuminating the reticle using the ultraviolet light from the light source, and a polarization measuring unit measuring the polarization state of the ultraviolet light, the polarization measuring unit including an optical unit for providing at least three different phase differences to...

20060210915 - Composition for forming lower layer film for lithography comprising compound having protected carboxyl group: There is provided an underlayer coating forming composition for lithography, and an underlayer coating having a high dry-etching rate compared with photoresist, and causing no intermixing with the photoresist, which are used in lithography process of manufacture of semiconductor device. Concretely it is an underlayer coating forming composition comprising a...

20060210918 - Negative working light sensitive planographic printing plate material and planographic printing plate manufacturing process: Disclosed is a negative working light sensitive planographic printing plate material comprising a support and provieded thereon, a light sensitive layer containing a spectral sensitizing agent, a polymerization initiator, a polymerizable compound, and a polymer as a polymeric binder, wherein the polymer has in the molecule a monomer unit with...

20060210913 - Photoresist composition and, used in the photoresist composition, low-molecular compound and high-molecular compound: A high-molecular compound and a low-molecular compound or both having an alkali-soluble site (i) wherein at least a part of the alkali-soluble site (i) is protected with (ii) a halogen atom-containing acetal type acid-dissociative, dissolution inhibiting group, as well as a photoresist composition comprising the same. The photoresist composition is...

20060210920 - Photosensitive composition and lithographic printing plate precursor: A photosensitive composition comprising: a polymer obtained by polymerization of a monomer having a structure represented by the formula (I) as defined herein; a polymerizable compound having an unsaturated double bond; and a radical polymerization initiator selected from a hexaarylbiimidazole compound and a metallocene compound....

20060210919 - Photosensitive composition and pattern-forming method using the same: A photosensitive composition comprises (A) a specific compound, which is excellent in sensitivity, resolution, and defocus latitude (DOF), and a pattern-forming method using the photosensitive composition is provided....

20060210923 - Photosensitive composition, image-recording material and image-recording method: A photosensitive composition comprising: a hexaarylbiimidazole compound represented by the following formula (I) as defined herein; a sensitizing dye having an absorption maximum in a wavelength range of from 350 to 850 nm; and an addition-polymerizable compound capable of reacting by at least one of a radical and an acid....

20060210912 - Photosensitive resin film and cured film made therefrom: The photosensitive resin film in an uncured state of the invention comprises (A) a specific alkali-soluble copolymer, (B) a compound having at least one ethylenically unsaturated double bond and (C) a radiation-sensitive radical polymerization initiator by the use of which a coating film having a dry film thickness of 70...

20060210924 - Photostorage solid drawing medium: The invention provides a photostorage solid drawing medium comprising a solvent, a resin soluble in the solvent, a photostorage pigment and a gelling agent, wherein the photostorage pigment comprises a long afterglow fluorescent substance comprising an alkaline earth aluminosilicate as a matrix activated with a rare earth element wherein the...

20060210914 - Positive photoresist composition and method of forming resist pattern: There is provided a positive photoresist composition capable of forming a pattern with excellent resolution, excellent resistance to reflection off the substrate, and excellent perpendicularity. The positive photoresist composition comprises (A) an alkali-soluble novolak resin in which a portion of the hydrogen atoms of all the phenolic hydroxyl groups are...

20060210916 - Positive photoresist composition and method of forming resist pattern: A positive resist composition that includes a resin component (A), which contains acid dissociable, dissolution inhibiting groups and exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure, wherein the resin component (A) is a copolymer (A1) containing a first...

20060210921 - Positive photosensitive composition and image recording material using the same: In the formula, R represents an alkyl, cycloalkyl, aralkyl or aryl group having an acid group, Y represents a bivalent to tetravalent connecting group having at least one partial structure selected from the following group of partial structures or a terminal group selected from one of the partial structures and...

20060210922 - Positive resist composition and pattern forming method using the resist composition: A positive resist composition comprising: (A) a resin insoluble or sparingly soluble in an alkali but capable of decomposing under an action of an acid to increase a solubility in an alkali developer, the resin having a β-(meth)acroyloxy-γ-butyrolactone repeating unit represented by the following formula (1) containing a lactone ring...

20060210917 - Positive-working, thermally sensitive imageable element: Imageable elements that contain copolymers soluble in alkaline solutions are disclosed and methods for forming imaging using the imageable elements are disclosed. The alkali soluble copolymers comprise about 3 to about 50 mol % of one or more of the monomers of the formula: CH2═CH(R1)—C(O)—X—Y—R2; in which: R1 is H...

20060210925 - Storage medium, reproducing method, and recording method: According to one embodiment, a write-once type information storage medium using a recording material which has a low to high characteristic that a light reflectivity in a recording mark increases with respect to a non-recording area and which has a recording characteristic in accordance with a principle of recording without...

20060210926 - Aluminum alloy blank for lithographic printing plate and support for lithographic printing plate: There is provided an aluminum alloy blank for a lithographic printing plate comprising iron in a range of 0.20 to 0.80 wt %; and the balance being aluminum, a crystal grain refining element, and unavoidable impurity elements. In the aluminum alloy blank, a content of silicon is in a range...

20060210927 - Lithographic printing plate support and method of manufacturing the same: A lithographic printing plate support capable of obtaining a presensitized plate which is excellent in scumming resistance and scratch resistance and achieves a good balance between sensitivity and press life, and a method of manufacturing the support are provided. The support includes a surface which has an arithmetic mean roughness...

20060210928 - Method for thermally processing photosensitive printing sleeves: An improved method of manufacturing a photosensitive printing element that minimizes relief variation and improves image fidelity. The method involves a step of pre-curing the first (floor layer) of photocurable material prior to depositing an additional layer or layers of photocurable material that may be imaged and developed to produce...

20060210929 - Photosensitive composition and forming process of structured material using the composition: The invention provides a photosensitive composition for forming a highly heat-resistant pattern of a micro phase separation structure. The photosensitive composition comprises: (A) a block copolymer containing a segment composed of an alkoxysilyl-group-containing monomer as a repeating unit, and (B) a photosensitive decomposition agent. The polydispersity index (Mw/Mn) of the...

20060210930 - Photomask, method for detecting pattern defect of the same, and method for making pattern using the same: There exist a pattern-dense region where patterns having an F-letter shape are dense and a pattern-interspersed region where small rectangular dummy patterns are interspersed. In the pattern-interspersed region, the dummy patterns are arranged in a manner that at least one dummy pattern exists in a scan target range of a...

20060210934 - Black and white photothermographic material: e

20060210932 - Photothermographic material: The invention provides a photothermographic material having at least a substrate, an image forming layer and a non-photosensitive outermost layer, in which the image forming layer and a non-photosensitive outermost layer are provided over a same side surface of the substrate. The image forming layer contains at least a photosensitive...

20060210933 - Photothermographic material: A photothermographic material having, on at least one side of a support, an image forming layer including at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, wherein an outermost layer on at least one side of the support includes a polymer latex...

20060210935 - Silver salt photothermographic dry imaging material, image recording method and image forming method for the same: A silver salt photothermographic dry imaging material including non-photosensitive aliphatic carboxylic acid silver salts; a photosensitive emulsion containing photosensitive silver halide grains; a silver ion reducing agent; a binder; and a cyan coloring leuco dye. A percentage of the photosensitive silver halide grains having a mean particle size of 0.01...

20060210931 - Thermally developable materials with narrow disperse amorphous silica: Thermally developable materials including photothermographic and thermographic materials having an outermost backside layer that includes amorphous silica particles having a narrow particle size distribution. The narrower particle size distribution provides reduced haze and increased surface roughness that reduces blocking and machine feeding at comparable weight percent. The materials can also...

20060204859 - An extra dose trim mask, method of manufacture, and lithographic process using the same: A mask structure and photolithographic method using the same for obtaining shorter and thinner line or feature lengths for optimizing power consumption and performance in semiconductor devices. According to a first aspect, a method for enabling trimming of semiconductor linewidth dimensions implements an extra dose trim mask. The lithographic method...

20060204860 - Interlayer film for etch stop in mask making: The formation of a lithographic mask (100) is disclosed, where the mask (100) can be used in forming integrated circuits onto a semiconductor substrate. A layer of etch stop material (106) is sandwiched between first (102) and second (108) layers of transmissive material that are substantially transparent to lithographic light....

20060204863 - Mask for light exposure: Light exposure areas 103 and light masking areas 104 in a sole reticle are arrayed in alternation to one another in both the longitudinal and transverse directions. Substrate is exposed to light by multi-domain light exposure using this reticle so that the respective areas of the reticle exposed to light...

20060204862 - Methods, systems and computer program products for correcting photomask using aerial images and boundary regions: A correction method and a system thereof automatically perform a measurement and an analysis for a photomask critical dimension (CD), to satisfy a desired CD uniformity and a desired mean-to-target (MTT) data. A correction for a portion where a CD error has occurred may be performed....

20060204861 - Optical mask for all-optical extended depth-of-field for imaging systems under incoherent illumination: A mask for enhancing the depth of focus of an optical imaging system is designed by optimizing an optical property (transmittance or reflectance) of the mask relative to the intensity distribution in the system's image plane. Preferably, a desired PSF intensity is selected, a desired misfocus parameter range is selected,...

20060204864 - Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation: Provided are a photomask, a method for manufacturing the photomask and a method for measuring optical characteristics of a wafer exposure system, the measuring method using the photomask during manufacture. The photomask includes a substrate and a measuring pattern including a light opaque region pattern formed on the substrate and...

20060204866 - Display device and display apparatus: To provide a display device which includes: a display electrode; a counter electrode provided to face the display electrode; a display layer provided on the counter electrode-side surface of the display electrode; and an electrolyte provided between the display electrode and the counter electrode, wherein the display layer comprises conductive...

20060204865 - Patterned light-emitting devices: Light-emitting devices (e.g., LEDs) and methods associated with such devices are provided. The devices may include a first pattern and a second pattern which are formed at one or more interfaces of the device (e.g., the emission surface). The patterns may be positioned such that light generated by the device...

20060204869 - Laser processing device: There is disclosed a laser processing device, comprising: a laser light source for emitting laser light; an irradiating optical system for irradiating laser light emitted from the laser light source substantially perpendicularly onto a processing surface of an object to be processed; a reflected light monitoring unit for monitoring the...

20060204868 - Material deposition method and/or system: Embodiments of a method and/or system for material deposition are disclosed....

20060204867 - Material deposition method and/or system for layers including repetitive features: Embodiments of a method and/or system for material deposition for layers that include repetitive features are disclosed....

20060204870 - Substrate carrying method and substrate carrying apparatus: A substrate carrying method for removing the electrical charges on a substrate and then carrying the substrate includes forming a conductive layer with conductivity on a part of the surface of the substrate, and carrying the substrate while supporting a conductive layer-forming region of the substrate by a grounded substrate...

20060204871 - Organic photoconductive material and, using the same, electrophotographic photoreceptor and image forming device: According to the present invention, an enamine compound having a specific structure is used as an organic photoconductive material. This enamine compound is obtained based on asymmetrical secondary naphtylamine which is readily available at a lowest price, by introducing phenyl groups containing substituents, as constituents units of the enamine part...

20060204872 - Hydrolyzed semi-conductive nanoparticles for imaging member undercoating layers: An imaging member includes a substrate, an intermediate layer, and a photoconductor layer, where the intermediate layer includes hydrolyzed semi-conductive nanoparticles, such as hydrolyzed semi-conductive nanoparticles formed by reaction of a metal alkoxide and an amine....

20060204873 - Electron conductive overcoat layer for photoreceptors: An imaging member includes a substrate, a charge generating layer, a charge transport layer, and an outer overcoat layer including an electron conductive material....

20060204874 - Quinone compound, electrophotographic photoconductor, and electrophotographic apparatus: (wherein R1, R2, R3, R4, R5, R6, R7 and R8 each denote hydrogen or an alkyl; R9 and R10 each denote hydrogen, an alkyl, aryl, or heterocyclic group; R11 and R12 each denote a halogen, an alkyl, alkoxy, alkyl halide, nitro, aryl, or heterocyclic group; n and m each denote...

20060204875 - Charge transport materials having a 1,3,6,8-tetraoxo-1,3,6,8-tetrahydrobenzo[lmn][3,8]phenanthroline-2,7-diyl group: where E comprises a functional group selected from the group consisting of a reactive ring group, a vinyl ether group, an acrylamido group, and a methacrylamido group; X comprises a bond, O, S, an aminylene group, a sulfonyl group, an organic linking group, or a combination thereof; Z comprises a...

20060204876 - Process for producing toner particles, and toner: In a process for producing toner particles by dispersing in an aqueous medium a polymerizable monomer composition containing at least a polymerizable monomer and a colorant and carrying out polymerization by the use of a polymerization initiator, the concentration of alcohol having 4 to 6 carbon atoms in the aqueous...

20060204877 - Developing agent: A developing agent including an additive added to adhere on the surface of a toner particle, wherein the additive comprises a first silica whose primary particle has a first mean volume diameter ranging from 10 to 15 nm, and a second silica whose primary particle has a second mean volume...

20060204878 - Electrostatic charge image developing toner: Disclosed is an electrostatic charge image developing toner containing external additives possessing at least amorphous silica and a crystallized metal oxide selected from titanium oxide, aluminum oxide, zirconium oxide, or calcium oxide, wherein the amorphous silica is placed as a nucleus, and the crystallized metal oxide is present on the...

20060204879 - Electrostatic charge image developing toner: Disclosed is an electrostatic charge image developing toner containing external additives comprising at least amorphous silica and a crystallized metal oxide selected from titanium oxide, aluminum oxide, zirconium oxide, or calcium oxide, wherein the amorphous silica is present on the crystallized metal....

20060204880 - Toner for developing electrostatic images, electrostatic image developer, and image-forming method: s

20060204881 - Electrophotographic toner and manufacturing method thereof: The electrophotographic toner of the present invention comprises toner particles and inorganic fine powder externally added to the toner particles. The toner particles comprise a core particle containing at least a resin, a coloring agent and wax, a first shell layer that is formed on the surface of the core...

20060204882 - Toner, toner manufacturing method, developer, image forming apparatus, and process cartridge for the image forming apparatus: A toner having a core containing a colorant, a release agent and a binder resin (A), and a shell containing a binder resin (B), the shell overlying the core, wherein the binder resin (A) contains a resin having a polyester skeleton, the binder resin (B) contains a vinyl copolymer resin,...

20060204883 - Toner, and, developer, toner container, process cartridge, image forming apparatus and image forming method: where ΔTm represents Tma (° C.)−Tmb (° C.), Tma (° C.) is ½ flown-out temperature of the toner by a capillary type flow tester, and Tmb (° C.) is ½ flown-out temperature of a melt kneaded mixture of the toner by the capillary type flow tester, and wherein Tma is...

20060204884 - Method of producing liquid developer and liquid developer produced by the method: A method of producing a liquid developer which comprises an insulation liquid and toner particles dispersed in the solution is provided. The method comprises the steps of: preparing a kneaded material containing a coloring agent and a resin material; dispersing the kneaded material into an insulation liquid to obtain a...

20060204885 - Coating solution containing cocrystals and or crystals of a charge-generation pigment or a mixture of charge-generation pigments: A method for preparing a coating solution containing a cocrystallized titanyl phthalocyanine-titanyl fluorophthalocyanine, the method comprising: dry milling a charge-generation pigment or mixtures of charge-generation pigments; increasing the amorphousness of the pigment mixture as determined by X-ray crystallography using X-radiation characteristic of Cu Kα at a wavelength of 1.541 Å...

20060204892 - Dyed photoresists and methods and articles of manufacture comprising same: The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such...

20060204886 - Heat transfer sheet, image forming material and image forming method: The present invention provides a heat transfer sheet comprising a support, a light-to-heat converting layer and an image forming layer, wherein the image forming layer contains at least a white pigment and an amorphous organic polymer having a softening point of 40° C. to 150° C., an average particle size...

20060204893 - Novel fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer: the structural unit N is a structural unit derived from a monomer copolymerizable with the monomers to introduce the structural units M1 and M2a, and the structural units M1, M2a and N are contained in amounts of from 1 to 99% by mole, from 1 to 99% by mole and...

20060204891 - Photoresist undercoat-forming material and patterning process: A material comprising a specific bisphenol compound with a group of many carbon atoms is useful in forming a photoresist undercoat. The undercoat-forming material, optionally combined with an intermediate layer having an antireflective effect, has an absorptivity coefficient sufficient to provide an antireflective effect at a thickness of at least...

20060204889 - Photosensitive composition: A photosensitive composition comprising (A) a sensitizing dye having a specific structure, (B) a initiating compound capable of generating a radical, an acid or a base, and (C) a polymerizable compound capable of reaction by at least one of a radical, an acid and a base....

20060204887 - Planographic printing plate precursor: The planographic printing plate precursor of the present invention comprises a support, an intermediate layer containing a polymer having an aromatic ring having two or more carboxylic acid groups on a side chain, which is provided on the support, and an infrared-ray layer photosensitive positive-type recording layer provided on the...

20060204890 - Positive photosensitive composition and pattern-forming method using the same: A positive photosensitive composition comprising: (A) a resin having at least one repeating unit having a specific lactone structure at a side chain and being capable of decomposing by the action of an acid to increase the solubility in an alkali developer; and (B) a compound capable of generating a...

20060204888 - Positive photosensitive resin, process for production thereof, and resist composition containing positive photosensitive resin: (wherein X1 and X2 may be the same or different and are each independently a straight chain or branched chain hydrocarbon group having 1 to 30 carbon atoms, an alicyclic hydrocarbon group, an aromatic hydrocarbon group or a heterocyclic group, and these groups may be substituted with straight chain or...

20060204894 - Optical recording medium and displaying method on surface of the medium: In a method in the related art in which recording is performed using the data recording area and the drawing area, the areas being different from each other, since a surface of a data recording area on which recording is performed using laser light is different from a surface of...

20060204895 - Photocrosslinkable polyurethanes: Linear crosslinkable polyurethanes obtained from (a) at least one diisocyanate having 2 to 30 carbon atoms, (b) at least one aliphatic or cycloaliphatic diol having 2 to 30 carbon atoms, to whose carbon chain at least one carboxyl group is covalently bonded, and some or all of said carboxyl groups...

20060204896 - Composition for stripping photoresist and method for manufacturing thin transistor array panel using the same: The present invention provides a photoresist stripper comprising about 5 wt % to about 20 wt % alcohol amine, about 40 wt % to about 70 wt % glycol ether, about 20 wt % to about 40 wt % N-methyl pyrrolidone, and about 0.2 wt % to about 6 wt...

20060204897 - Negative resist composition comprising base polymer having epoxy ring and si-containing crosslinker and patterning method for semiconductor device using the same: A negative resist composition and a patterning method for semiconductor devices using the composition are provided. In one aspect, a negative resist composition comprises an alkali-soluble base polymer having an epoxy ring substituent, a silicon-containing crosslinker having multiple hydroxy groups, and a photoacid generator. In another aspect, a patterning method...

20060204899 - Fine pattern forming method: A fine pattern forming method includes the first step of depositing a plasma reaction products on a sidewall of a patterned mask layer to increase a pattern width thereof, the second step of etching a first etching target layer by using as a mask the mask layer, the pattern width...

20060204898 - Process for producing sublithographic structures: A layer structure and process for providing sublithographic structures are provided. A first auxiliary layer is formed over a surface of a carrier layer. A lithographically patterned second auxiliary layer structure is formed on a surface of the first auxiliary layer. The first auxiliary layer is anisotropically etched using the...

20060204900 - Green sheet, plasma display panel (pdp) and manufacturing method of pdp: The present invention relates to a green sheet, a plasma display panel (PDP) and a method of manufacturing a PDP. A black matrix or an electrode is formed using different adhesive forces of a green sheet exposed to light. Accordingly, the number of manufacturing processes can be reduced, and the...

20060204902 - Method for manufacturing organic electroluminescence display: A method for manufacturing an organic electroluminescence display includes the steps of forming a plurality of strip-shaped first electrodes on a substrate, forming a positive photoresist layer on an entire surface of the substrate, patterning the positive photoresist layer to remain on a first area crossing the first electrodes and...

20060204903 - Method for manufacturing organic electroluminescence display: A method for manufacturing an organic electroluminescence display includes forming a plurality of first electrodes on a substrate in a shape of stripe; forming a photoresist layer on an entire surface of the substrate; performing a first exposure of a first area on the photoresist layer crossing the first electrodes;...

20060204901 - Method of manufacturing a microlens substrate, a microlens substrate, a transmission screen, and a rear projection: A method of manufacturing a microlens substrate 1 is disclosed. The microlens substrate 1 is composed of a base substrate 4 having two major surfaces and having light transparency and a lens portion 2 having a plurality of microlenses 21. The lens portion 2 is provided on one of the...

20060204904 - Metal mask and manufacturing method thereof: A method for manufacturing a metal mask that facilitates easy dimensional control in the manufacturing process and can manufacture multiple metal masks having high and consistent precision. A Cr film 2 having a mask pattern 2a is formed on the surface of a glass plate 1, a dry film 4...

20060204905 - Silver halide photosensitive material: A silver halide photosensitive material containing at least one of the following compound (A), compound (A) being a 6-membered heterocyclic compound having one or two hetero atoms with ClogP of 4 or less, which when added, is capable of enhancing the sensitivity of the silver halide photosensitive material by addition...

20060204906 - Silver halide photographi emulsion and silver halide photosensitive material using thereof: A silver halide photographic emulsion, wherein 70% or more of the total projected area of silver halide grains is occupied by silver halide grains satisfying the following requirements (a) to (d). (a) It is composed of a tabular silver halide host grain with an aspect ratio of 12 or more...

20060204907 - Color photothermographic material: s

20060204908 - Photothermographic material: Provided is a photothermographic material comprising, on a support, at least a non-photosensitive layer, and an image forming layer comprising at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, wherein a content of the binder in the image forming layer is from...

20060199081 - Holographic storage medium, article and method: Disclosed are a holographic storage medium, a method for producing a holographic storage medium, a method for storing data on a holographic storage medium, and an optical reading method. The holographic storage medium comprises an dimensionally stable film that is formed by partially curing a mixture, wherein said mixture comprises...

20060199084 - Chromeless phase shifting mask for integrated circuits: A system for creating mask layout pattern data in order to create a number of desired features on a semiconductor wafer. Critical features and features that are adjacent to or abut critical features are formed as phase shifting regions on a mask. Larger, non-critical features can be formed as annular...

20060199082 - Mask repair: A photomask repair method is provided which has the spatial resolution of a focused energy beam process without the corresponding potential for damage to the photomask pattern and underlying transparent substrate. A photomask defect is repaired by first providing a masking film over the photomask pattern. Next, a high spatial...

20060199083 - Method and apparatus for identifying and correcting phase conflicts: One embodiment of the present invention provides a system that identifies a substantially minimal set of phase conflicts in a PSM-layout that when corrected renders the layout phase-assignable. During operation, the system constructs a phase-conflict graph from a PSM-layout such that the PSM-layout is phase-assignable if and only if the...

20060199085 - Method and device for adjusting an alignment microscope by means of a reflective alignment mask: The present invention provides for a method for adjusting an alignment microscope. In the method of the present invention an alignment mask is used in which the one side comprises at least one alignment mark and the other side is reflective. For the adjustment, the microscope is first focused to...

20060199086 - System and method for creating a color filter for a display panel: A system for generating a color filter for a display panel is provided. The system comprises a photoconductor drum, a first liquid toner cartridge configured to transfer first liquid toner to a first discharged portion of the photoconductor drum to form a first image on the photoconductor drum, a cylindrical...

20060199088 - Laser etched fiducials in roll-roll display: The present invention relates to a method of aligning comprising providing a support, applying a transparent layer, patterning at least the transparent layer to produce a pattern and an alignment feature capable of scattering light, illuminating the support and the transparent layer with oblique lighting, providing an analysis system capable...

20060199089 - Method for manufacturing a semiconductor device: A method for manufacturing a semiconductor device is disclosed. The method can assess exposure conditions by forming a predetermined assessment pattern on a principal surface of a semiconductor wafer. The predetermined assessment pattern includes a first assessment pattern having a remaining pattern, and a second assessment pattern which includes a...

20060199087 - Method of making an integrated circuit by modifying a design layout by accounting for a parameter that varies based on a location within an exposure field: An original layout of an integrated circuit is modified using optical proximity correction (OPC) to obtain a second layout. During OPC, a sensitivity to flare for each feature is conveniently identified. To map the flare, the amplitude of intensity is mapped over a field of exposure, which is typically a...

20060199090 - Method of setting focus condition at time of exposure, apparatus for setting focus condition at time of exposure, program, and computer readable recording medium: In the present invention, in the photolithography process in which a certain focus condition has been already set, a film on a substrate is exposed to only zero-order light of a light source transmitted, and then developed to reduce a first portion of the film on the substrate. Further, the...

20060199091 - Printing a mask with maximum possible process window through adjustment of the source distribution: Disclosed is a method for illuminating a lithographic mask with light from different directions, in such a way that the intensities of the various incident beams provide the largest possible integrated process window. The process window is defined in terms of allowable ranges for printed shapes. For example, boundaries of...

20060199092 - Electrostatic latent image bearer, and image forming method, image forming apparatus and process cartridge using the electrostatic latent image bearer: s

20060199093 - Mg-based ferrite, an electrophotographic development carrier containing the ferrite, and a developer containing the carrier: This invention provides an Mg-based ferrite carrier composed of an environment-friendly material meeting environmental regulations, and an electrophotographic developer comprising the carrier. The carrier and the developer of this invention realize high image quality and improved gradation properties. This invention also provides a method for producing the Mg-based ferrite material...

20060199094 - Carrier and developer compositions: A developer composition comprising a magnetic toner and a mixture comprised of bare carrier core particles free of a coating and coated carrier particles, and wherein said bare carrier core particles are present in an amount of from about 50 weight percent to about 90 weight percent, and said coated...

20060199095 - Curable acrylate compositions, methods of making the compositions and articles made therefrom: A composition comprising a phenylthioethylacrylate, a multifunctional (meth)acrylate, a curing agent, wherein the phenylthioethylacrylate comprises less than about 400 parts per million tin and less than about 2 percent by weight of the corresponding phenylthioethanol. The composition may further comprise at least one unsaturated acid....

20060199096 - Process for thick film circuit patterning: A process for patterning thick film electrically functional patterns using a photosensitive polymer layer. A tacky photosensitive layer is applied onto a substrate surface. The photosensitive layer is imaged with a pattern using actinic radiation, the exposed areas of the photosensitive layer become hardened and non-tacky. A subsequent application of...

20060199097 - Lithographic printing plate precursor: A lithographic printing plate precursor having a good press life with a practical energy amount, which can be on-press developed without passing through a development processing step after recording an image by a laser of emitting an infrared ray, is provided, which is a lithographic printing plate precursor capable of...

20060199101 - Lithographic printing plate precursor: A lithographic printing plate precursor comprising: a support; and a photosensitive layer containing (A) a sensitizing dye represented by the formula (I) as defined herein, (B) a polymerization initiator, (C) a polymerizable compound, and (D) a binder polymer having a crosslinkable group....

20060199098 - Negative-type photosensitive resin composition containing epoxy-containing material: Provided are negative-type photosensitive resin compositions which may be used in forming interlayer insulating layers on a silicon wafer or printed wiring board. The compositions include a vinylphenol resin, a biphenyl-phenol resin and epoxy-containing materials. Also provided are methods of forming patterned dielectric films using such compositions. The resin compositions...

20060199099 - Negative-type photosensitive resin composition containing epoxy-containing material: Provided are negative-type photosensitive resin compositions which may be used as interlayer insulating layers on a silicon wafer. The compositions include a urea crosslinking agent together with an epoxy-containing material and vinylphenol resin. Also provided are methods of forming patterned insulating layers using such compositions. The resin compositions can be...

20060199102 - Positive photosensitive resin composition: o

20060199100 - Positive resist composition and pattern-forming method using the same: A positive resist composition, which comprises a resin having a structure showing a basicity and capable of increasing the solubility in an alkali developer by the action of an acid, and a pattern-forming method using the same....

20060199103 - Process for producing an image using a first minimum bottom antireflective coating composition: Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a second layer of a photoresist composition onto the first layer of the antireflective composition; (c) selectively exposing the...

20060199104 - Resist material and nanofabrication method: A resist material and a nanofabrication method provide high-resolution nanofabrication without an expensive irradiation apparatus using, for example, electron beams or ion beams. That is, the resist material and the nanofabrication method provide finer processing using exposure apparatuses currently in use. A resist layer of an incompletely oxidized transition metal...

20060199105 - Infrared dye compositions: in which a and b are integers with a ranging from 0 to 3 and b ranging from 1 to 4 and a+b=4; X, which may be identical or different, are each a halogen atom, an OH functional group, or a C1 to C20 alkyl or alicyclic radical, and Y,...

20060199106 - Polymer for forming anti-reflective coating layer:

20060199107 - Polymer for forming anti-reflective coating layer:

20060199108 - Polymer for forming anti-reflective coating layer:

20060199109 - Phase shift photomask and method for improving printability of a structure on a wafer: A phase shift photomask and method for improving printability of a structure on a wafer are disclosed. The method includes providing a photomask including a zero degree PSW formed on a top surface of a substrate and a 180 degree PSW formed in a first region of the substrate. An...

20060199110 - Method of making an address plate: A method of producing an address plate comprising the steps of, coating a layer of conducting inorganic material onto a substrate, coating a layer of photoresist above this layer of conductive material and curing this layer, exposing, through a mask, the desired pattern of the conductors onto the layer of...

20060199111 - Method for manufacturing semiconductor devices using a photo acid generator: Provided is a method for manufacturing a semiconductor device. In one example, the method includes providing a substrate, forming a photo acid generator (PAG) layer over the substrate, where the PAG layer includes at least one PAG, and forming a photoresist layer over the PAG layer....

20060199112 - Method for forming photoresist pattern and method for manufacturing semiconductor device: With the objective of suppressing resist pattern collapse generated at dry etching, energy rays are applied to a photoresist structure including an antireflection film provided on a base and a resist pattern brought into contact with the antireflection film and comprised of a chemical-amplification photoresist provided on the antireflection film....

20060199113 - Image forming method using photothermographic material: An image forming method using a photothermographic material including, on a support, at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent for silver ions, and a binder, wherein the photothermographic material includes at least two image forming layers having spectral sensitivities that are different from...

20060199114 - Exposure method: An exposure method for exposing a resist film disposed on one surface of a wafer includes a first exposure step of locating an exposure mask at a first predetermined position with respect to the wafer, and exposing the resist film. The exposure method further includes a second exposure step of...

20060199116 - Photothermographic material: A photothermographic material including, on a support, at least two image forming layers each including at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent for silver ions, and a binder, wherein the image forming layers have spectral sensitivities that are different from each other, at...

20060199117 - Photothermographic material: The invention provides a photothermographic material having, on a surface of a substrate, an image forming layer and a non-photosensitive layer. The image forming layer has a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent and a binder. At least one of the image forming layer and...

20060199115 - Photothermographic material and image forming method: wherein R11 and R11′ each independently represent an alkyl group having 1 to 20 carbon atoms, R12, R12′, X1 and X11 each independently represent a hydrogen atom or a substituent, L represents a —S— group or a —CHR13 — group, and R13 represents a hydrogen atom or an alkyl group...

20060199081 - Holographic storage medium, article and method: Disclosed are a holographic storage medium, a method for producing a holographic storage medium, a method for storing data on a holographic storage medium, and an optical reading method. The holographic storage medium comprises an dimensionally stable film that is formed by partially curing a mixture, wherein said mixture comprises...

20060199084 - Chromeless phase shifting mask for integrated circuits: A system for creating mask layout pattern data in order to create a number of desired features on a semiconductor wafer. Critical features and features that are adjacent to or abut critical features are formed as phase shifting regions on a mask. Larger, non-critical features can be formed as annular...

20060199082 - Mask repair: A photomask repair method is provided which has the spatial resolution of a focused energy beam process without the corresponding potential for damage to the photomask pattern and underlying transparent substrate. A photomask defect is repaired by first providing a masking film over the photomask pattern. Next, a high spatial...

20060199083 - Method and apparatus for identifying and correcting phase conflicts: One embodiment of the present invention provides a system that identifies a substantially minimal set of phase conflicts in a PSM-layout that when corrected renders the layout phase-assignable. During operation, the system constructs a phase-conflict graph from a PSM-layout such that the PSM-layout is phase-assignable if and only if the...

20060199085 - Method and device for adjusting an alignment microscope by means of a reflective alignment mask: The present invention provides for a method for adjusting an alignment microscope. In the method of the present invention an alignment mask is used in which the one side comprises at least one alignment mark and the other side is reflective. For the adjustment, the microscope is first focused to...

20060199086 - System and method for creating a color filter for a display panel: A system for generating a color filter for a display panel is provided. The system comprises a photoconductor drum, a first liquid toner cartridge configured to transfer first liquid toner to a first discharged portion of the photoconductor drum to form a first image on the photoconductor drum, a cylindrical...

20060199088 - Laser etched fiducials in roll-roll display: The present invention relates to a method of aligning comprising providing a support, applying a transparent layer, patterning at least the transparent layer to produce a pattern and an alignment feature capable of scattering light, illuminating the support and the transparent layer with oblique lighting, providing an analysis system capable...

20060199089 - Method for manufacturing a semiconductor device: A method for manufacturing a semiconductor device is disclosed. The method can assess exposure conditions by forming a predetermined assessment pattern on a principal surface of a semiconductor wafer. The predetermined assessment pattern includes a first assessment pattern having a remaining pattern, and a second assessment pattern which includes a...

20060199087 - Method of making an integrated circuit by modifying a design layout by accounting for a parameter that varies based on a location within an exposure field: An original layout of an integrated circuit is modified using optical proximity correction (OPC) to obtain a second layout. During OPC, a sensitivity to flare for each feature is conveniently identified. To map the flare, the amplitude of intensity is mapped over a field of exposure, which is typically a...

20060199090 - Method of setting focus condition at time of exposure, apparatus for setting focus condition at time of exposure, program, and computer readable recording medium: In the present invention, in the photolithography process in which a certain focus condition has been already set, a film on a substrate is exposed to only zero-order light of a light source transmitted, and then developed to reduce a first portion of the film on the substrate. Further, the...

20060199091 - Printing a mask with maximum possible process window through adjustment of the source distribution: Disclosed is a method for illuminating a lithographic mask with light from different directions, in such a way that the intensities of the various incident beams provide the largest possible integrated process window. The process window is defined in terms of allowable ranges for printed shapes. For example, boundaries of...

20060199092 - Electrostatic latent image bearer, and image forming method, image forming apparatus and process cartridge using the electrostatic latent image bearer: s

20060199093 - Mg-based ferrite, an electrophotographic development carrier containing the ferrite, and a developer containing the carrier: This invention provides an Mg-based ferrite carrier composed of an environment-friendly material meeting environmental regulations, and an electrophotographic developer comprising the carrier. The carrier and the developer of this invention realize high image quality and improved gradation properties. This invention also provides a method for producing the Mg-based ferrite material...

20060199094 - Carrier and developer compositions: A developer composition comprising a magnetic toner and a mixture comprised of bare carrier core particles free of a coating and coated carrier particles, and wherein said bare carrier core particles are present in an amount of from about 50 weight percent to about 90 weight percent, and said coated...

20060199095 - Curable acrylate compositions, methods of making the compositions and articles made therefrom: A composition comprising a phenylthioethylacrylate, a multifunctional (meth)acrylate, a curing agent, wherein the phenylthioethylacrylate comprises less than about 400 parts per million tin and less than about 2 percent by weight of the corresponding phenylthioethanol. The composition may further comprise at least one unsaturated acid....

20060199096 - Process for thick film circuit patterning: A process for patterning thick film electrically functional patterns using a photosensitive polymer layer. A tacky photosensitive layer is applied onto a substrate surface. The photosensitive layer is imaged with a pattern using actinic radiation, the exposed areas of the photosensitive layer become hardened and non-tacky. A subsequent application of...

20060199097 - Lithographic printing plate precursor: A lithographic printing plate precursor having a good press life with a practical energy amount, which can be on-press developed without passing through a development processing step after recording an image by a laser of emitting an infrared ray, is provided, which is a lithographic printing plate precursor capable of...

20060199101 - Lithographic printing plate precursor: A lithographic printing plate precursor comprising: a support; and a photosensitive layer containing (A) a sensitizing dye represented by the formula (I) as defined herein, (B) a polymerization initiator, (C) a polymerizable compound, and (D) a binder polymer having a crosslinkable group....

20060199098 - Negative-type photosensitive resin composition containing epoxy-containing material: Provided are negative-type photosensitive resin compositions which may be used in forming interlayer insulating layers on a silicon wafer or printed wiring board. The compositions include a vinylphenol resin, a biphenyl-phenol resin and epoxy-containing materials. Also provided are methods of forming patterned dielectric films using such compositions. The resin compositions...

20060199099 - Negative-type photosensitive resin composition containing epoxy-containing material: Provided are negative-type photosensitive resin compositions which may be used as interlayer insulating layers on a silicon wafer. The compositions include a urea crosslinking agent together with an epoxy-containing material and vinylphenol resin. Also provided are methods of forming patterned insulating layers using such compositions. The resin compositions can be...

20060199102 - Positive photosensitive resin composition: o

20060199100 - Positive resist composition and pattern-forming method using the same: A positive resist composition, which comprises a resin having a structure showing a basicity and capable of increasing the solubility in an alkali developer by the action of an acid, and a pattern-forming method using the same....

20060199103 - Process for producing an image using a first minimum bottom antireflective coating composition: Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a second layer of a photoresist composition onto the first layer of the antireflective composition; (c) selectively exposing the...

20060199104 - Resist material and nanofabrication method: A resist material and a nanofabrication method provide high-resolution nanofabrication without an expensive irradiation apparatus using, for example, electron beams or ion beams. That is, the resist material and the nanofabrication method provide finer processing using exposure apparatuses currently in use. A resist layer of an incompletely oxidized transition metal...

20060199105 - Infrared dye compositions: in which a and b are integers with a ranging from 0 to 3 and b ranging from 1 to 4 and a+b=4; X, which may be identical or different, are each a halogen atom, an OH functional group, or a C1 to C20 alkyl or alicyclic radical, and Y,...

20060199106 - Polymer for forming anti-reflective coating layer:

20060199107 - Polymer for forming anti-reflective coating layer:

20060199108 - Polymer for forming anti-reflective coating layer:

20060199109 - Phase shift photomask and method for improving printability of a structure on a wafer: A phase shift photomask and method for improving printability of a structure on a wafer are disclosed. The method includes providing a photomask including a zero degree PSW formed on a top surface of a substrate and a 180 degree PSW formed in a first region of the substrate. An...

20060199110 - Method of making an address plate: A method of producing an address plate comprising the steps of, coating a layer of conducting inorganic material onto a substrate, coating a layer of photoresist above this layer of conductive material and curing this layer, exposing, through a mask, the desired pattern of the conductors onto the layer of...

20060199111 - Method for manufacturing semiconductor devices using a photo acid generator: Provided is a method for manufacturing a semiconductor device. In one example, the method includes providing a substrate, forming a photo acid generator (PAG) layer over the substrate, where the PAG layer includes at least one PAG, and forming a photoresist layer over the PAG layer....

20060199112 - Method for forming photoresist pattern and method for manufacturing semiconductor device: With the objective of suppressing resist pattern collapse generated at dry etching, energy rays are applied to a photoresist structure including an antireflection film provided on a base and a resist pattern brought into contact with the antireflection film and comprised of a chemical-amplification photoresist provided on the antireflection film....

20060199113 - Image forming method using photothermographic material: An image forming method using a photothermographic material including, on a support, at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent for silver ions, and a binder, wherein the photothermographic material includes at least two image forming layers having spectral sensitivities that are different from...

20060199114 - Exposure method: An exposure method for exposing a resist film disposed on one surface of a wafer includes a first exposure step of locating an exposure mask at a first predetermined position with respect to the wafer, and exposing the resist film. The exposure method further includes a second exposure step of...

20060199116 - Photothermographic material: A photothermographic material including, on a support, at least two image forming layers each including at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent for silver ions, and a binder, wherein the image forming layers have spectral sensitivities that are different from each other, at...

20060199117 - Photothermographic material: The invention provides a photothermographic material having, on a surface of a substrate, an image forming layer and a non-photosensitive layer. The image forming layer has a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent and a binder. At least one of the image forming layer and...

20060199115 - Photothermographic material and image forming method: wherein R11 and R11′ each independently represent an alkyl group having 1 to 20 carbon atoms, R12, R12′, X1 and X11 each independently represent a hydrogen atom or a substituent, L represents a —S— group or a —CHR13 — group, and R13 represents a hydrogen atom or an alkyl group...