Radiation imagery chemistry: process, composition, or product thereof inventions 08/06

20060194122 - Hologram recording material and optical recording medium: A hologram recording material is provided and has: an optical refractive index-modulating component; and a curable polymer. The optical refractive index-modulating component performs at least one of: (1) a color development reaction; (2) a color development reaction amplified by a self-sensitization with a coloring material of a latent image; (3)...

20060194121 - Hologram recording material, hologram recording method: A hologram recording material is provided and has at least a silver halide, an organic refractive index-modulating agent, and a binder is provided. The silver halide undergoes sensitization in accordance with interference fringes caused by holographic exposure, to thus form a latent image. Thereafter the silver halide is subjected to...

20060194120 - Holographic recording medium with control of photopolymerization and dark reactions: The present invention relates to a system, as well as articles and holographic recording medium comprising the system, where the system comprises: a polymerizable component comprising at least one photoactive polymerizable material; and a photoinitiator component comprising at least one photoinitiator for causing the polymerizable component to polymerize to thereby...

20060194125 - Antireflection film and exposure method: An antireflection film wherein, even where exposure light enters obliquely in a liquid immersion lithography technique, a sufficiently reduced reflectance can be achieved at the interface between a resist layer and a silicon substrate. A two-layer antireflection film is used in exposure by an exposure system having a wavelength of...

20060194126 - Mask blank transparent substrate manufacturing method, mask blank manufacturing method, and exposure mask manufacturing method: A method includes a preparation step of preparing a transparent substrate having a precision-polished main surface, a surface shape information obtaining step of obtaining, as surface shape information, height information at a plurality of measurement points on the main surface of the transparent substrate that contacts a mask stage of...

20060194123 - Method of generating a photolithography patterning device, computer program, patterning device, method of determining the position of a target image on or proximate a substrate, measurement device, and lithographic apparatus: A method of generating a photolithography patterning device for transferring a pattern formed in the patterning device onto a substrate utilizing a lithographic projection apparatus includes defining features within the pattern formed in the device, wherein the features have dimensions and orientations chosen to create a desired image on the...

20060194124 - Semiconductor device, method of manufacturing the same, and phase shift mask: A main wall part is provided so as to surround an integrated circuit part. A sub-wall part which is in “L” shape is provided between each corner of the main wall part and the integrated circuit part. Therefore, even if the stress is concentrated due to heat treatment or the...

20060194128 - Dye-containing curable composition, color filter prepared using the same, and process of preparing color filter: wherein Dye represents an acid dye; X represents an amine compound having an OH group and having a molecular weight of less than 230, an amine compound having an oxygen atom that forms an ether bond and having a molecular weight of 300 or less, or an amine compound having...

20060194127 - Method and apparatus for producing color filter with a line-scan exposure technology by high-speed shutter control: A method and apparatus for producing a color filter is disclosed. It mainly uses an exposure apparatus which can produce a plurality of exposure light sources to do an exposure process. Through fast controlling the on/off time of the plurality of exposure light sources as well as making a relative...

20060194130 - Run to run control for lens aberrations: An exposure tool includes an illumination source, a blazed phase grating reticle, a reticle stage holding the blazed phase grating reticle, a lens system including at least one adjustable lens element, a wafer stage holding a sample, and a controller. The controller is configured to control the illumination source and...

20060194129 - Substrate edge focus compensation: A method for compensating a focus of an exposure field of view in an exposure tool. A height at a plurality of positions is measured across a substrate at a given layer using a tool other than the exposure tool. Edge positions on the substrate are identified where the height...

20060194131 - Electrophotographic photosensitive member: An electrophotographic photosensitive member is provided minimizing the absorption of image exposure having a short wavelength in a surface layer and keeping good electrophotographic properties including resolving power. The electrophotographic photosensitive member includes a conductive substrate, and a photoconductive layer and a surface region layer sequentially superimposed on the conductive...

20060194132 - Electrophotographic photosensitive member: An electrophotographic photosensitive member is provided in which electrophotographic properties including resolving power have been improved with minimized absorption of image exposure light at a short wavelength in a surface layer. The electrophotographic photosensitive member includes a photoconductive layer composed of a non-single-crystal silicon film and a surface region layer...

20060194133 - Magnetic one-component toner and magnetic one-component development method: wherein A represents a frictional charge amount (μC/g) after agitating 5 parts by weight of magnetic one-component toner and 95 parts by weight of non-coated ferrite carrier for one minute, B represents a frictional charge amount (μC/g) after agitating 5 parts by weight of magnetic one-component toner and 95 parts...

20060194134 - Toners and processes thereof: Disclosed is an oil-less toner composition exhibiting good low temperature release and stripping in fixing, enhanced surface gloss of fixed image, and/or OHP transparency. By controlling one or more properties, such as the relative thermal energy input during the EA aggregation/coalescence process, using a wax having a certain dispersion size...

20060194136 - Toner for electrophotography and developer for electrophotography, as well as image forming method: A toner for electrophotography contains a binder resin and a coloring agent, and is characterized in that the binder resin contains a crystalline polyester resin, and a low-molecular compound having at least one of a naphthalene skeleton and a biphenyl skeleton, and the crystalline polyester resin contains 0.5 to 30...

20060194135 - Toner and method of manufacturing the toner: A toner is disclosed, comprising a resin (A), a colorant (B) and an alkylidenecarboxylic acid (C)....

20060194137 - Irregular shaped ferrite carrier and electrophotographic developer using the ferrite carrier: It is contemplated to provide irregular shaped ferrite carrier which has a lower resistance, a high specific surface area, a low specific gravity and a longer operational life, and an electrophotographic developer comprising the ferrite carrier which prevents the toner scattering, has a high image density, and is responsive to...

20060194138 - Liquid toner methods of producing same: A liquid toner comprising a hydrocarbon carrier liquid; toner particles; wax particles; and a charge director. Methods of producing embodiments of the toner and components of the toner are disclosed....

20060194139 - Heat-sensitive lithographic printing plate: A heat-sensitive lithographic printing plate of the present invention, which enables image recording by infrared-ray scanning exposure based on digital data and has excellent on-press developability, high resistance to scumming and a long press life, the heat-sensitive lithographic printing plate having on a support with a hydrophilic surface an image-forming...

20060194140 - Chemical amplification type positive resist composition: There is provided a positive resist composition which enables the formation of a fine resist pattern, enables the angle of the taper shape within that resist pattern to be controlled to a suitable angle, and enables the formation of a resist pattern with an excellent depth width of focus. This...

20060194143 - Fluorine-containing polymerizable monomers, fluorine-containing polymer compounds, resist compositions using the same, and patterning process: wherein R1 is any one functional group of a hydrogen atom, a methyl group and a trifluoromethyl group; R2 is a hydrogen atom or a straight-chain, branched or cyclic alkyl group having 1 to 25 carbon atoms, which may contain a fluorine atom, an oxygen atom, a nitrogen atom, a...

20060194142 - Immersion lithography without using a topcoat: A novel immersion medium for immersion lithography is provided. The immersion medium is introduced to fill a gap in between a front surface of a projection lens of a stepper and a top surface of a photoresist layer coated on a substrate positioned on a wafer stage. The present invention...

20060194149 - Lithographic printing plate precursor and lithographic printing method: A lithographic printing plate precursor capable of forming an image without alkali development, comprising a hydrophilic support and a laser-sensitive photopolymerizable layer, wherein the photopolymerizable layer or other layer included in the lithographic printing plate precursor contains a copolymer containing at least a repeating unit having at least one ethylenically...

20060194150 - Lithographic printing plate precursor, method for preparation of lithographic printing plate precursor, and lithographic printing method: A lithographic printing plate precursor comprising: a support; an image-recording layer; and a protective layer containing an inorganic stratiform compound, provided in this order, wherein the inorganic stratiform compound contains an organic cation....

20060194144 - Low blur molecular resist: A molecular resist composition and method of use is disclosed wherein the composition includes no silicon containing material, no polymeric material, and a substituted oligosaccharide, wherein the substituted oligosaccharide is substituted with at least one acid-cleavable —OR group, wherein the substituted oligosaccharide has 2 to 10 monosaccharides, wherein the molecular...

20060194145 - Photogenerated polyelectrolyte bilayers from an aqueous-processible photoresist: A terpolymer of a hydrophobic polymer, for example, methyl methacrylate, a hydrophilic polymer, for example, poly(ethylene glycol) methacrylate, and a polymer having a sidegroup that is photocleavable to produce a carboxyl side chain, for example, o-nitrobenzyl methacrylate, is employed as a photoresist....

20060194146 - Planographic printing plate precursor: The planographic printing plate precursor of the present invention comprises a substrate, and a recording layer provided on the substrate, the recording layer comprises a polymer compound having a partial structure of (1) silicon-oxygen bonds and (2) alkali-soluble groups. This planographic printing plate precursor provides excellent inking property on the...

20060194141 - Positive resist composition and method for forming resist pattern using same: e

20060194148 - Positive resist composition and pattern forming method using the same: The invention provides a positive resist composition suitably usable at the time of using an ArF excimer laser light as the exposure light, source, assured of excellent performance in view of resist profile, sensitivity, resolution and line edge roughness, and free from occurrence of pattern falling and development defect, and...

20060194147 - Resist composition, compound for use in the resist composition and pattern forming method using the resist composition: e

20060194151 - Recording medium and information recording and reproducing method using the same: A recording medium comprises a substrate and a recording layer overlaid on the substrate. The recording layer comprises a material, which has properties such that, when recording light having a predetermined wavelength λ1 is irradiated to the material, the material is capable of being caused to change into a fluorescent...

20060194152 - Infra-red switchable mixture for producing lithographic printing plate: Water-based mixtures that can be applied to substrates to produce infra-red sensitive layers with hydrophilic surfaces, which may be switched by image-wise exposure in an infrared imaging plate-setter to give oleophilic printing areas, for producing processless offset lithographic printing plates....

20060194153 - Microlens manufacturing method and solid-state image pick-up unit manufacturing method: A method of manufacturing a microlens comprising the steps of: (a) applying a resist for an excimer laser, an ultraviolet exposure or an electron beam onto a surface, and carrying out an exposure with a light in an ultraviolet region or an electron beam and a development, so as to...

20060194154 - Developer composition: wherein, p and q are defined as in the description; wherein with respect to 100 parts by weight of water, the aforementioned component (a) is 0.1˜10 parts by weight, the aforementioned component (b) is 0.1˜10 parts by weight, the aforementioned component (c) is 0.1˜20 parts by weight, and the aforementioned...

20060194156 - Method for forming patterned insulating elements and methods for making electron source and image display device: A method for forming patterned insulating elements on a substrate includes a plurality of exposure steps of exposing a photosensitive paste provided on the substrate through at least one mask having a predetermined pattern; a developing step of developing the exposed photosensitive paste to form a precursor pattern; and a...

20060194155 - Resist pattern forming method and semiconductor device manufacturing method: A resist pattern forming method includes forming a resist film above a substrate. A first exposure is performed in which a specific region of an edge of the resist film is irradiated with light much enough to allow subsequent development to dissolve the resist film, thereby forming a latent image...

20060194158 - Antistatic properties for thermally developable materials: The use of metal antimonates at high metal antimonate to binder ratios in buried backside conductive layers of thermographic and photothermographic materials allows the use of thin backside overcoat layers. The combination provides antistatic constructions having excellent antistatic properties that show less change in resistivity with changes in humidity. The...

20060194157 - Thermally developable material package with dual indicator device: A package of thermographic or photothermographic materials has a primary packaging enclosure, and optionally a secondary packaging enclosure, containing one or more of the materials (such as individual sheets). A non-photosensitive indicator device is associated with either or both of the packaging enclosures. This non-photosensitive indicator device is adapted to...

20060188790 - Hologram recording material, hologram recording method, and optical recording medium: A hologram recording material is provided and has: a sensitizing dye absorbing light upon hologram exposure to generate an excited state thereof, and an interference fringes-recording component capable of causing color development reaction or discoloration by an electron or energy transfer (movement) form the excited state to record interference fringes...

20060188789 - Hologram recording material, hologram recording method, optical recording medium, and dye therefor: A hologram recording material is provided and has: a sensitizing dye represented by formula specified in the specification, capable of absorbing hologram recording light to generate an exited state thereof and discoloring itself when irradiated with light after hologram recording; and an interference fringe-recording component capable of undergoing electron or...

20060188793 - Adjustable transmission phase shift mask: A phase shift mask having transmission properties that are dependent at least in part on an intensity of an incident light beam. The phase shift mask has a mask substrate that is substantially transparent to the incident light beam. A first phase shift layer is disposed on the mask substrate....

20060188791 - Merging sub-resolution assist features of a photolithographic mask: Merging sub-resolution assist features includes receiving a mask pattern that includes the sub-resolution assist features. A first sub-resolution assist feature is selected to merge with a second sub-resolution assist feature. A merge bar width of a merge bar is established. A distance between the first sub-resolution assist feature and the...

20060188792 - Printing of design features using alternating psm technology with double mask exposure strategy: For cases where one edge of a design feature is to be printed through a shifter mask and another one is to be printed through a binary trim mask, and where no upsizing can be performed due to the local density of the design, it is proposed to add shifters...

20060188794 - Color conversion film and multicolor light-emitting device provided with the same: A color conversion film of the present invention is formed of a color-conversion material composition containing: an organic solvent having a pyrrolidone group represented by the following formula (I) (component A); a resin material containing at least one of optically active or inactive translucent monomer, oligomer and polymer (component B);...

20060188795 - Manufacturing method of color filter: The manufacturing method includes the steps of: continuously discharging a coloring matter from a nozzle to apply the coloring mater to between the banks 12 on the glass substrate while, with a nozzle being scanned with respect to a glass substrate 10 on which surface a predetermined pattern of light-blocking...

20060188797 - Apparatus and method for optical interference fringe based integrated circuit processing: An apparatus and method for processing an integrated circuit employing optical interference fringes. During processing, light is directed on the integrated circuit and based upon the detection of interference fringes, further processing may be controlled. One implementation involves charged particle beam processing of an integrated circuit as function of detection...

20060188796 - Performing opc on structures with virtual edges: A method for compensating for optical distortions occurring in regions associated with non-phase-shifting regions in a mask or reticle. OPC or other resolution enhancement techniques are performed on one or more edge segments associated with adjacent phase-shifting regions in order to compensate for edge position errors occurring in areas corresponding...

20060188798 - Organic photoreceptor, image forming apparatus, image forming method and process cartridge: An organic photoreceptor, comprising a conductive support, an intermediate layer provided on the conductive support, having a thickness of 6 to 25 μm and containing inorganic particles having a number average primary particle diameter of 5 to 200 μm; and a photosensitive layer provided on the intermediate layer and having...

20060188799 - Electrophotographic photosensitive member and electrophotographic apparatus using the electrophotographic photosensitive member:

20060188800 - Magnetic toner: A magnetic toner is disclosed including magnetic toner particles containing at least a binder resin and a magnetic powder. The magnetic powder contains a specific amount of phosphorus elements, and a specific amount of silicon elements, based on the iron element, with the ratio of the phosphorous element to the...

20060188801 - Organometallic complex charge control agents: m

20060188802 - Electrostatic image developing toner: An electrostatic image developing toner comprising a binder resin and a colorant, wherein the toner contains a mixture of: (i) a compound represented by Formula (3); and (ii) a compound represented by Formula (1) and/or (2), wherein R1 to R8 each represent an alkyl group having 10 to 30 carbon...

20060188803 - Electrophotographic image forming apparatus, electrophotographic image forming method, and electrophotographic photoreceptor: An electrophotographic image forming apparatus having: a photoreceptor which has a intermediate layer containing inorganic particles and a binder between a electroconductive substrate and an uppermost layer; a developing unit for developing an electrostatic latent image formed on the photoreceptor to make a toner image, the developing unit utilizing a...

20060188810 - Chemically amplified positive resist composition and patterning process: A chemically amplified positive resist composition is provided comprising (A) a resin containing acid labile groups other than acetal type which changes its solubility in an alkaline developer as a result of the acid labile groups being eliminated under the action of acid and (B) specific sulfonium salts as a...

20060188816 - Fluorinated compound, fluoropolymer and process for its production: c

20060188813 - Hydrophilic film, and planographic printing material, stain-preventative member and defogging member using the same: The invention provides a hydrophilic film obtained by curing, by at least one energy source selected from heat and light, a composition comprising a compound that has, in a molecule thereof, two or more ring structures selected from the group consisting of five-membered structures and six-membered structures, wherein the ring...

20060188804 - Immersion topcoat materials with improved performance: e

20060188806 - Norbornene polymer for photoresist and photoresist composition comprising the same: Disclosed herein is a photoresist composition which includes a norbomene copolymer having an epoxy group, an acid generator, and an organic solvent. The norbomene polymer shows superior mechanical and thermal properties, high transparency, excellent insulating properties, and particularly, improved mechanical properties due to the presence of an epoxy group. The...

20060188812 - Phenolic hydroxyl group-containing copolymer and radiation-sensitive resin composition: s

20060188808 - Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same:

20060188814 - Photosensitive lithographic printing plate: A photosensitive lithographic printing plate comprising a hydrophilic support and a photopolymerizable photosensitive layer containing: (i) a sensitizing dye having an absorption maximum in a wavelength range of from 360 to 450 nm; (ii) a hexaarylbisimidazole compound; (iii) an addition polymerizable compound having an ethylenically unsaturated double bond; (iv) a...

20060188815 - Planographic printing plate material and printing method: An object of the present invention is to provide a planographic printing plate material as well as a printing method in which excellent properties of on-press development, exposure image visualization, scratch resistance, background contamination resistance, and printing durability are exhibited. Disclosed is a planographic printing plate material possessing a hydrophilic...

20060188811 - Planographic printing plate material and printing process: Disclosed is a planographic printing plate material comprising a support and provided thereon, a hydrophilic layer and an image formation layer containing heat melt particles or heat fusible particles, wherein the hydrophilic layer contains a starch derivative in an amount of from 0.1 to 10% by weight, or the image...

20060188809 - Resist composition and patterning process: A resist composition comprising a fullerene having five phenol derivatives is provided....

20060188805 - Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same: The present invention provides a resist pattern thickening material, which can utilize ArF excimer laser light; which, when applied over a resist pattern to be thickened e.g., in form of lines and spaces pattern, can thicken the resist pattern to be thickened regardless of the size of the resist pattern...

20060188807 - Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same: The present invention provides a resist pattern thickening material, which can utilize ArF excimer laser light; which, when applied over a resist pattern to be thickened e.g., in form of lines and spaces pattern, can thicken the resist pattern to be thickened regardless of the size of the resist pattern...

20060188817 - Storage medium, reproducing method, and recording method: According to an embodiment, a storage medium includes a transparent resin substrate having a concentric or spiral groove and a recording film formed on the groove on the transparent resin substrate, a recording mark being formed by irradiation of a laser beam, wherein a reproduction durability count in a case...

20060188818 - Storage medium, reproducing method, and recording method: According to one embodiment, in a storage medium using an organic dye material, a degree of modulation of a lead-in pre-pit portion is 0.2 or more....

20060188819 - Storage medium, reproducing method, and recording method: According to one embodiment, in a storage medium, a ratio of a minimum value of an amplitude of a wobble detection signal to a track shift detection signal is set to be equal to or greater than a predetermined value....

20060188822 - Off-axis projection optics and extreme ultraviolet lithography apparatus employing the same: c

20060188820 - Photosensitive resin composition and method of forming a pattern using the composition: (in the formura (1), X1 and X2 indicate a hydrogen atom, a halogen atom, a hydrocarbon group which may contain an oxygen atom or a halogen atom, or an alkoxy group to which a substituent may bond, and they may be identical to or different from one another. Y indicates...

20060188821 - Photosensitive resin, photoresist composition having the photosensitive resin and method of forming a photoresist pattern using the photoresist composition: In a photosensitive resin, a photoresist composition including the photosensitive resin and a method of forming a photoresist pattern using the photoresist composition, the photosensitive resin includes a hydrophobic terminal group having at least five carbon atoms and a blocking group. The photosensitive resin has a weight average molecular weight...

20060188823 - Method for forming an electronic device: Provided is a low cost system and method for forming electronic devices, especially large surface area devices. The process of imprint lithography is combined with alternate manufacturing techniques to fabricate the devices. Initially, a template imprints a three-dimensional pattern into a resist layer deposited on a flexible substrate. The resist...

20060188824 - Method for improving design window: A method of forming photo masks having rectangular patterns and a method for forming a semiconductor structure using the photo masks is provided. The method for forming the photo masks includes determining a minimum spacing and identifying vertical conductive feature patterns having a spacing less than the minimum spacing value....

20060188825 - Laser irradiation device and laser induced thermal imaging method: A laser irradiation device includes a laser generator for patterning and a laser generator for preheating. A laser induced thermal imaging (LITI) method, includes preparing an acceptor substrate, laminating a donor substrate on the acceptor substrate, and irradiating a laser beam onto a predetermined region of the donor substrate and...

20060188826 - Method for utilizing dry film: A method for utilizing a dry film is provided. A dry film is pressed onto a substrate, such as a wafer. The dry film includes a photoresist layer tightly attached to the substrate and an exposed carrier film with light transmission. Before exposure and development, the carrier film of the...

20060188827 - Selective surface exposure, cleans and conditioning of the germanium film in a ge photodetector: A method of protecting a sensitive layer from harsh chemistries. The method includes forming a first sensitive layer, forming a second layer upon the first layer, then forming a third layer over the second layer. The third layer is utilized as a mask during patterning of the second layer. During...

20060188828 - Media for laser imaging: A method and a medium for laser imaging is herein disclosed. The medium incorporates one or more types of microstructures having a predetermined heat or radiation modifiable optical characteristic such as color, scattering, diffusion, diffraction, interference and iridescence. Associated intimately with the microstructures is a radiation antenna that acts to...

20060188829 - Silver halide emulsion and silver halide photographic light-sensitive material: wherein, in formulas (2) to (5), Z represents a hydrogen atom or a substituent; A1 and A2 each represent an oxygen atom, etc.; and R10 to R16 each represent a hydrogen atom or a substituent; W represents a substituent; n is an integer from 0 to 4; L represents a...

20060188830 - Photothermographic material: e

20060183032 - method for forming generating mask data: A mask pattern to be provided on a transparent substrate 2 includes a semi-light-shielding portion 3 which transmits exposure light in the same phase as that of the light-transmitting portion 4 and a phase shifter 5 which transmits exposure light in a phase opposite to that of the light-transmitting portion...

20060183026 - Masking for wafer fabrication: The invention comprises a method of preparing masks for wafer fabrication comprising the steps of determining the length of the required mask image size along one axis, determining the length of the required mask image size along a second axis, comparing the length of the required mask image size to...

20060183033 - Method for forming pattern: A mask pattern to be provided on a transparent substrate 2 includes a semi-light-shielding portion 3 which transmits exposure light in the same phase as that of the light-transmitting portion 4 and a phase shifter 5 which transmits exposure light in a phase opposite to that of the light-transmitting portion...

20060183035 - Method for forming pattern using a photomask: A photomask has a semi-light-shielding portion having a light-shielding property and a light-transmitting portion surrounded by the semi-light-shielding portion, and a peripheral portion positioned in the periphery of the light-transmitting portion. The semi-light-shielding portion and the light-transmitting portion transmit exposure light in the same phase, whereas the peripheral portion transmits...

20060183029 - Method for producing a mask arrangement and use of the mask arrangement: A method is provided for producing a mask arrangement that is used for additive forming of organic semiconductor material regions on a substrate. The mask arrangement is formed by applying a photocrosslinkable polymer material to a mask carrier region, exposing it in a controlled and selective and thereby patterned manner...

20060183028 - Method for producing a mask layout avoiding imaging errors for a mask: In a method for producing a final mask layout for a mask, a provisional auxiliary mask layout is generated in accordance with an electrical circuit diagram. The provisional mask layout includes a main structure that extends in a longitudinal direction. The provisional auxiliary mask layout is converted into a final...

20060183025 - Methods of forming mask patterns, methods of correcting feature dimension variation, microlithography methods, recording medium and electron beam exposure system: The invention includes methods of forming reticles. A mask blank is provided having a plurality of regions defined within a main-field area. Exposure to an electron beam is initiated at an initial locus within an interior region of the main-field. The invention includes a method of correcting feature dimension variation....

20060183027 - Novel method to form a microlens: A method of manufacturing a microlens includes forming a photoresist layer over a substrate having a photo sensor located therein and exposing the photoresist layer in an exposure system having a lower resolution. The exposure uses a photomask having a microlens pattern comprising a plurality of dark regions and clear...

20060183031 - Optical proximity correction method: An integrated circuit layout includes dense figures and at least one isolated figure. A plurality of dummy patterns are formed to surround the isolated figure, so as to reduce the difference in pattern density of the integrated circuit layout. A transmitted light of the dummy patterns provides a phase difference...

20060183034 - Photomask: A mask pattern to be provided on a transparent substrate 2 includes a semi-light-shielding portion 3 which transmits exposure light in the same phase as that of the light-transmitting portion 4 and a phase shifter 5 which transmits exposure light in a phase opposite to that of the light-transmitting portion...

20060183030 - Photomask, method of generating mask pattern, and method of manufacturing semiconductor device: A photomask includes a pair of light-transmission opening patterns extending in parallel and each having a substantially identical line width with a center light-shielding linear portion extending linearly therebetween, and semi-transmissive regions arranged to sandwich the pair of light-transmission opening patterns from opposing sides in a direction of width. The...

20060183036 - Method of forming film pattern, method of manufacturing device, electro-optical device, and electronic apparatus: A method of forming a film pattern by disposing a functional liquid on a substrate includes: forming banks corresponding to the film pattern on the substrate; forming irregularities on bottoms between the banks by using the banks as a mask; and disposing the functional liquid between the banks and on...

20060183037 - Color layer material, color filter substrate, electro-optic device and electronic device, fabrication method of color filter substrate, and manufacturing method of electro-optic device: A liquid crystal device has a liquid crystal panel having liquid crystals sandwiched between a counter substrate and a color filter substrate. A backlight using a white LED irradiates light onto the liquid crystal panel as a light source. The color filter substrate has a red color layer, a blue...

20060183038 - Color layer material, color filter substrate, electro-optic device and electronic device, fabrication method of color filter substrate, and manufacturing method of electro-optic device: A liquid crystal device has a liquid crystal panel having liquid crystals sandwiched between a counter substrate and a color filter substrate. A backlight using a white LED irradiates light onto the liquid crystal panel as a light source. The color filter substrate has a red color layer, a blue...

20060183039 - Method and systems for utilizing simplified resist process models to perform optical and process corrections: A method and system for utilizing a simplified resist process model to perform optical and process corrections. More specifically, the present invention provides a fast and easy post exposure bake (PEB) effects calculation which can be used in connection with OPC. The model can be used to increase OPC modeling...

20060183040 - Method for controlling semiconductor device production process and a method for producing semiconductor devices: In order to realize individually and easily optimization of exposure conditions such as exposure dose and focus by photolithography in a production process of semiconductor devices, the present invention is such that: light is radiated onto a pattern on a semiconductor wafer; by an optical system that detects information on...

20060183042 - Substituted oligofluorene for organic light-emitting diode and organic photoconductor:

20060183041 - Photoconductor member with bound silicone oil: A charge transfer layer system that encapsulates or surrounds high viscosity silicone oils (polysiloxanes) using silicone microspheres, fluoropolymers such as polytetrafluoroethylene or inorganic particles such as silica, or metal soaps (zinc stearate). The encapsulation of the silicone oil results in aggregation or agglomeration of the silicone microspheres, fluoropolymers, or inorganic...

20060183044 - Electrophotographic photoreceptor containing asymmetric naphthalenetetracarboxylic acid diimide derivatives and electrophotographic imaging apparatus employing the same: An electrophotographic photoreceptor and an electrophotographic imaging apparatus include an asymmetric naphthalenetetracarboxylic acid diimide derivative. The asymmetric naphthalenetetracarboxylic acid diimide derivative has increased solubility in organic solvents and improved compatibility with binder resins, thus providing excellent electron transporting ability. The electrophotographic photoreceptor containing the asymmetric naphthalenetetracarboxylic acid diimide compound according...

20060183043 - Electrophotographic photoreceptor containing pyridine-substituted asymmetric naphthalenetetracarboxylic acid diimide derivatives and electrophotographic imaging apparatus: An electrophotographic photoreceptor includes a pyridine-substituted asymmetric naphthalenetetracarboxylic acid diimide derivative. The pyridine-substituted asymmetric naphthalenetetracarboxylic acid diimide derivative has increased solubility in organic solvents, improved compatibility with binder resins and enhanced resistance for nitrogen oxides. The electrophotographic photoreceptor containing the asymmetric naphthalenetetracarboxylic acid diimide compound according to the present invention...

20060183045 - Developing agent and process for producing the same: A method for manufacturing a developing agent comprising dissolving a binder resin component in a supercritical fluid or a subcritical fluid, mixing it with a colorant component, reducing the solubility of the binder resin component in the supercritical fluid or subcritical fluid, and causing the binder resin component to be...

20060183046 - Novel coloring compound and recording material using the same: Disclosed herein are a coloring compound represented by the general formula: A-L1-X-L2-B (1) wherein A is a coloring moiety, B is a stabilizing moiety having fading-preventing ability, L1 and L2 are linkers for linking A, X and B by covalent bonding and denote, independently of each other, any group of...

20060183047 - Toner production method, toner and toner production apparatus: In a toner production method, a volatile solvent gas is jetted into a dispersion of aggregated resin particles where at least resin particles dispersed in a continuous phase are aggregated. A form of the aggregated resin particles is controlled by jetting the volatile solvent gas into the dispersion of aggregated...

20060183048 - Positive photoresist composition and resist pattern formation: A means for increasing development velocity of a positive photoresist composition is provided which contains a photosensitive novolak resin formed by replacing some hydrogen atoms within those of all phenolic hydroxyl groups of alkali soluble novolak resin by 1,2-naphthoquinonediazide sulfonyl group. This means is positive photoresist composition and a formation...

20060183049 - On-press development of high speed laser sensitive lithographic printing plates: A method of on-press developing a laser sensitive lithographic printing plate with ink and/or fountain solution is described. The printing member comprises on a substrate a photosensitive layer soluble or dispersible in ink and/or fountain solution and capable of hardening upon exposure to a laser. The plate is exposed with...

20060183051 - Positive resist composition, and patterning process using the same: The present invention-provides a positive resist composition wherein at least a polymer included in a base resin has a repeating unit with an acid labile group having absorption at the 248 nm wavelength light and the repeating unit is included with a ratio of 1-10% of all repeating units of...

20060183050 - Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator: A process of forming ultra fine patterns using bottom anti-reflective coating containing acid generator. More particularly, a process of forming vertical patterns using an organic bottom anti-reflective coating containing excessive amount of acid generator, in order to prevent formation of sloping patterns due to photoresist resins absorbing wavelength of light...

20060183052 - Optical recording medium: where Rb is a reflectance of an unrecorded area, and Ra is a reflectance of the top of an eye pattern after ten cycles of recording. In one recording mode therefor, the disc is rotated at a constant angular velocity so as to have a linear velocity of 3-4 m/s...

20060183053 - Method for recording information on a record carrier, a record carrier and a recording device: A record carrier comprises two layers that react with each other when irradiated to form a mark on the record carrier. The two layers are separated by a third layer that prevents direct contact of the two layers thus providing stability to the record carrier. By irradiating the third layer...

20060183054 - Method to remove unwanted, unexposed, positive-working, ir radiation sensitive layer: A method for eliminating unwanted ink-receptive sections in positive working printing plates resulting from shading of the surface layer during exposure by the clamps holding the plate on the exposure apparatus following development of an imagewise exposed precursor. Accordingly the areas that are shaded are identified prior to development and...

20060183055 - Method for defining a feature on a substrate: An improved method of forming a feature in a semiconductor substrate is described. The method comprises the steps of forming a porous dielectric layer on a substrate; removing a first portion of the porous dielectric layer to form a first etched region; filling the first etched region with a porous...

20060183056 - Method for isotropic etching of copper: Copper and copper alloys are etched to provide uniform and smooth surface by employing an aqueous composition that comprises an oxidant, a mixture of at least one weak complexant and at least one strong complexant for the copper or copper alloy, and water and has a pH of about 6...

20060183057 - Patterning method: Formation of a photomask in the conventional art requires significant cost and time. The invention provides a patterning method of forming a desired latent image pattern by irradiating a resist film formed on a substrate with focused light beam. The method comprising adjusting intensity of the focused light beam or...

20060183059 - System and method for absorbance modulation lithography: A lithography system is disclosed that provides an array of areas of imaging electromagnetic energy that are directed toward a recording medium. The reversible contrast-enhancement material is disposed between the recording medium and the array of areas of imaging electromagnetic energy....

20060183058 - System and method for contrast enhanced zone plate array lithography: A lithography system is disclosed that includes an array of focusing elements for directing focused illumination toward a recording medium, and a reversible contrast-enhancement material disposed between the recording medium and the array of focusing elements....

20060183060 - Nano-imprint lithography method involving substrate pressing: The inventive method includes a preparation step during which the substrate is covered with a layer, a pressing step in which a mould including a pattern of recesses and protrusions is pressed into part of the thickness of the aforementioned layer, at least one etching step in which the layer...

20060183061 - Method for forming positive metal pattern and emi filter using the same: A method for forming a positive metal pattern that includes the steps of (i) coating a photocatalytic compound on a substrate to form a photocatalytic film, (ii) coating a composition comprising a water-soluble polymer and a Pd compound on the photocatalytic film to form a photosensitive layer, (iii) selectively exposing...

20060183062 - Method to create region specific exposure in a layer: A method of selectively altering material properties of a substrate in one region while making a different alteration of material properties in an adjoining region is provided. The method includes selectively masking a first portion of the substrate during a first exposure and selectively masking a second portion of the...

20060183063 - Photothermographic material and image forming method: wherein R1, R2, R3, and R4 each independently represent a hydrogen atom or a substituent; R5 and R6 each independently represent an alkyl group, an aryl group, a heterocyclic group, an acyl group, or a sulfonyl group; and R7 represents R11—O—CO—, R12—CO—CO—, R13—NH—CO—, R14—SO2—, R15—W—C(R16)(R17)—, R19—SO2NHCO—, R20—CONHCO—, R21—SO2NHSO2—, R22—CONHSO2— or...

20060177746 - Half-tone stacked film, photomask-blank, photomask and fabrication method thereof: A half-tone stacked film is designed so as to have a stacked structure of a first half-tone film and a second half-tone film, and the film thickness d, the refractive index n to exposure light and the extinction coefficient k of these half-tone films are designed so that one of...

20060177744 - Method for producing a mask layout avoiding imaging errors for a mask: A method for producing a final mask layout (20′) avoids imaging errors. A provisional auxiliary mask layout (110) is produced, in particular in accordance with a predefined electrical circuit diagram, and is converted into the final mask layout (20′) with the aid of an OPC method. A main structure (120,...

20060177745 - Phase shift masks: A phase shift mask (PSM) is provided. The PSM includes a light-transmitting substrate, a light-blocking region, a first light-transmitting region, and a second light-transmitting region. The light-blocking region is formed in the light-transmitting substrate. The first light-transmitting region is formed as both a first phase shift region for transmitting 0°-phase...

20060177747 - Photomask, method for forming the same, and method for forming pattern using the photomask: A mask pattern 40 including a light-shielding portion 41 constituted by a light-shielding film made of a chromium film or the like and phase shifters 42 and 43 is formed on a transparent substrate 30. The phase shifters 42 and 43 generate a phase difference of 180 degrees with respect...

20060177743 - Photomask, photomask fabrication method, and semiconductor device fabrication method: A photomask capable of preventing a pattern outside a chip region from being transferred onto a wafer. A non-circuit pattern (a monitor pattern for measuring the accuracy of the position of a mask pattern, for example) formed by making openings in which a phase shift layer is exposed only in...

20060177748 - High-performance surface layer for photoreceptors: An imaging member includes a substrate, a charge generating layer, and a charge transport layer, wherein an external of the imaging member includes a polyhedral oligomeric silsesquioxane modified silicone dispersed therein....

20060177749 - Electrophotographic photoreceptor, and image forming apparatus and process cartridge therefor using the electrophotographic photoreceptor:

20060177750 - Electrophotographic photoreceptor, and image forming apparatus and process cartridge therefor using the electrophotographic photoreceptor: R1, R2, and R3 comprise, each independently, H or an organic group; X is a bond or a linking group, with the proviso that when E comprises a reactive ring group, X is a linking group; and Y is a nitrogen-containing aromatic heterocyclic group; and (b) a charge generating compound....

20060177751 - Imaging members: An imaging member comprising a supporting substrate; a single layer photoreceptor for both charge generation and charge transport disposed on the supporting substrate, the single layer photoreceptor comprising a binder containing a polyhedral oligomeric silsesquioxane; a cross-linking agent; a charge component; an electron transport component; and a charge generating component....

20060177752 - Toner and developer for developing electrostatic image and image forming method: A toner for developing an electrostatic image is disclosed. The toner contains an amount of not less than 0.1% by weight of an element selected from elements of the Groups of 1B, 2B, 4B, 5B, 6B, 7B, 8, 3A and 4A of the fourth and fifth periodic of the long...

20060177753 - Toner: A toner of the present invention comprises at least a binder resin comprising as a main component a polyester resin, a wax, and a colorant, in which in case of measuring a wettability of the toner with respect to a mixed solvent of methanol and water in terms of an...

20060177754 - Negatively chargeable spherical toner, color image forming apparatus, and process for producing negatively chargeable spherical toner: The present invention provides a negatively chargeable spherical toner having: a toner mother particle having a binder resin and a colorant, which has: a number average particle size of from 4.5 to 9 μm; a particle size distribution that has an integrated value of particle sizes of 3 μm or...

20060177755 - Electrophotographic toner: Provided is a toner not undergoing the effect of change of temperature and humidity, with high charging stability and having good fixing property and releasability. This is an electrophotographic toner containing at least a binder resin, a colorant, a charge controller and a wax in which the binder resin comprises...

20060177756 - Toner and image forming method using the same: A toner formed of a toner composition containing a resin and a plasticizer, wherein the following relationships (1) and (2) are satisfied: Tg2r>Tg2t (1), and Tg1t−Tg2t>Tg1r−Tg2r (2), wherein Tg1r represents the peak of the resin for the first temperature rise and Tg2r represents the peak of the resin for the...

20060177757 - Toner for electrostatic latent image development, electrostatic latent image developer containing the toner, and image formation method using the developer: t

20060177758 - Stabilization of fluorinated silicone fuser release agents using mercapto functional silicones: wherein m is a number of from about 0 to about 25 and n is a number of from about 1 to about 25; x/(x+y) is from about 1 percent to about 100 percent; R1 and R2 are selected from the group consisting of alkyl, aryl, arylalkyl, and alkylamino groups;...

20060177759 - Process for producing toner particles: e

20060177760 - Computer to plate color sensor and drying/curing system and method: A printing plate curing system includes a color sensor that measures at least one color value of a printing plate. The color value is used to control a parameter of a curing system, such as energy output or conveyor speed. Multiple color sensors may be used to measure color values...

20060177761 - Chemical rinse composition: The present invention relates to a thinner composition for removing resist used in TFT-LCD manufacturing processes, and more particularly to a thinner composition for removing resist that comprises: a) 0.1 to 5 wt % of an inorganic alkali compound; b) 0.1 to 5 wt % ofan organic amine; c) 0.1...

20060177763 - Method for producing compound having acid-labile group: e

20060177762 - Negative photosensitive resin composition and negative photosensitive element: An object of the present invention is to provide a negative photosensitive resin composition, which is capable of forming projections for controlling liquid crystal alignment that exhibit a higher level of precision than that attained by projections formed mug a positive photosensitive resin composition, as well as a photosensitive element...

20060177766 - Photoresist for enhanced patterning performance: A photoresist is composed of an alkali soluble resin, a photosensitive agent and a solvent. The alkali soluble resin includes a first type novolak resin synthesized from meta-cresol, and the first novolak resin has an average molecular weight of about 8000 to 25000 and a polydispersity index of four or...

20060177767 - Photosensitive resin composition, thin film panel including a layer made from photosensitive resin composition, and method for manufacturing thin film panel: A photosensitive resin composition includes an acrylic resin, a quinone diazide, and a solvent. The solvent includes a propylene glycol alkyl ether acetate and a trimethyl pentanediol monoisobutyrate (2,2,4-trimethyl-1,3-pentanediol monoisobutyrate). The propylene glycol alkyl ether acetate includes an alkyl group preferably containing about 1-5 carbon atoms. The resin composition may...

20060177765 - Polymer, resist composition and patterning process: A fluorinated polymer comprising recurring units of formulae (1a) to (1d) and having a Mw of 1,000-500,000 is provided. R1 is an acid labile group, R2 is a single bond or methylene, a1, a2, a3, and a4 are numbers from more than 0 to less than 1, and 0<a1+a2+a3+a4≦1, b...

20060177764 - Positive-tone photosensitivity resin composition: f

20060177769 - Information recording medium and its manufacturing method: A phase change recording medium comprising an as-deposited first recording layer configured to undergo a reversible phase change between an amorphous state and a crystalline state due to light irradiation and thereby change an optical characteristic. The as-deposited first recording layer includes a plurality of fine nuclei having an average...

20060177768 - Recording film for use in optical information recording medium, optical information recording medium, and sputtering target: A recording film for an optical information recording medium excellent in the productivity and also excellent in the durability (recording retainability), as well as an optical information recording medium, including: (1) a recording film for use in an optical information recording medium having a heat conductivity of 0.8 W/Kcm or...

20060177770 - Thin film transistor substrate and manufacturing method thereof: The present invention relates to a thin film transistor (TFT) substrate and method of making such a TFT substrate. The structure of the TFT substrate helps prevent damage to signal lines in non-display areas....

20060177771 - Laminated photosensitive relief printing original plate and method for producing the relief printing plate: A relief printing original plate including a substrate, a photosensitive resin layer thereon that is photosensitive to ultraviolet radiations, and a mask layer thereon having both ultraviolet and non-ultraviolet absorbability, the ultraviolet absorbability being deactivatable in response to receiving non-ultraviolet radiation. A method for producing a relief printing plate by...

20060177773 - Method for producing semiconductor patterns on a wafer: A method is used to produce semiconductor patterns (10′, 13′) on a wafer (15′). For this purpose, a mask (25) and a dipole aperture (2) with two aperture openings (2b) arranged behind one another in a dipole axis (y) are used. The mask (25) is imaged on the wafer (15′)...

20060177772 - Process of imaging a photoresist with multiple antireflective coatings: A process for imaging a photoresist comprising the steps of, a) forming a stack of multiple layers of organic antireflective coatings on a substrate; b) forming a coating of a photoresist over the upper layer of the stack of multiple layers of organic antireflective coatings; c) imagewise exposing the photoresist...

20060177774 - Process of imaging a photoresist with multiple antireflective coatings: A process for imaging a photoresist comprising the steps of, a) forming a stack of multiple layers of organic antireflective coatings on a substrate; b) forming a coating of a photoresist over the upper layer of the stack of multiple layers of organic antireflective coatings; c) imagewise exposing the photoresist...

20060177775 - Method for manufacturing plate having electrode with gaps: A method for manufacturing a plate (21) having an electrode (214) with a plurality of gaps (217) is provided. The method includes the steps of: providing a substrate (200) comprising a glass layer (210); coating a plurality of photo-resist protrusions (215) on the substrate; coating a transparent conductive layer (218)...

20060177776 - Immersion exposure method and apparatus, and manufacturing method of a semiconductor device: There is disclosed an immersion exposure method of carrying out an exposure process in a state that liquid is at least partly filled between a substrate to be exposed and a projection optical system of an exposure apparatus carrying out the exposure process, comprising carrying out a process of making...

20060177777 - Pattern forming method and method of manufacturing semiconductor device: A pattern forming method includes forming a resist film on a substrate, coating the resist film with a coating solution which forms a cover film on the resist film to form the cover film on the resist film, transferring a pattern onto the resist film by an immersion lithography method...

20060177778 - System and method for photolithography in semiconductor manufacturing: A method for photolithography in semiconductor manufacturing includes providing a mask with first and second focus planes for a wafer. The wafer includes corresponding first and second wafer regions. The first wafer region receives a first image during a first exposure utilizing the first focus plane. The second wafer region...

20060177779 - Color material and silver halide color photographic light-sensitive material: The present invention provides a color material and a silver halide color photographic light-sensitive material, particularly, a color material and a silver halide color photographic light-sensitive material which are excellent in a coloring capability, processing stability, dye image fastness and a white background. This invention is characterized by containing at...

20060177780 - Silver halide emulsion, method of preparing the same, and silver halide color photographic photosensitive material and image-forming method using the emulsion: A silver halide emulsion which exhibits high sensitivity, high contrast, little sensitivity variation with humidity conditions at the time of exposure, and excellent reciprocity law properties at high illumination intensities. Also, a method of preparing the emulsion in a stable manner, and a silver halide color photographic photosensitive material and...

20060177782 - Black and white photothermographic material and image forming method: The present invention provides a black and white photothermographic material having, on at least one side of a support, an image forming layer containing at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent for silver ions, and a binder, as well as an image forming...

20060177783 - Photothermographic imaging material: A photothermographic imaging material including an organic silver salt, a binder, a reducing agent, coupler and a main developing agent which forms coloring images by reacting with the coupler, those which are on a support wherein the reducing agent comprises a compound represented by the following Formula (1), the coupler...

20060177781 - Thermally developable materials with improved conductive layer: Buried backside conductive layers with increased conductive efficiency can be provided for thermally developable materials using a specific organic solvent mixture to coat a protective overcoat directly disposed over the conductive layer. This organic solvent mixture comprises an alcohol in which one or more film-forming polymers used in the formulation...

20060172203 - Hologram recording material, process for producing the same and hologram recording medium: P

20060172205 - Pattern forming method, photomask manufacturing method, semiconductor device manufacturing method, and computer program product: A pattern forming method includes developing a resist film on a main surface of a substrate by flowing a developing solution on the film to form a resist pattern, the developing the film including partitioning the surface into M (≧2) regions and determining correction exposure dose for each of the...

20060172204 - Systems, masks and methods for printing contact holes and other patterns: Contact hole patterns are disclosed having a plurality of peripheral regions formed around a target area in which a contact hole is to be formed. The peripheral regions visually resemble “lobes” or “leaves” extending outwards towards the periphery of the target area. The lobes may be disjoint or connected to...

20060172206 - Dye-containing resist composition and color filter using same: There is provided a color resist composition comprising a resin (A), a photoacid generator or a photobase generator (B), a crosslinking compound (C) and a dye mixture (D) containing a dye having a structure of amino sulfonate ester or ammonium sulfonate salt in a proportion of 40 to 95% by...

20060172207 - Exposure analyzing system, method for analyzing exposure condition, and method for manufacturing semiconductor device: An exposure analyzing system includes a microscope measuring CDs in resist patterns, each of the resist patterns being formed by specific defocus and dose conditions, an exposure condition calculator calculating functions of the specific defocus and dose conditions, each of the functions giving one of the CDs, an image arranger...

20060172208 - Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus: An electrophotographic photosensitive member capable of outputting an image in which a defect such as a ghost is suppressed even in a high-temperature-and-high-humidity environment, and in which a defect such as a change in density due to an abrupt change in light-area potential at an initial stage or a ghost...

20060172214 - Toner, method of making, method of using: The present invention relates to a toner useful, for example, for visualizing an electrostatic latent image formed on an image bearing member by a method such as electrophotography and electrostatic recording methods....

20060172209 - Toner for developing electrostatic image and method of forming image using the same: A toner for developing electrostatic image comprises a colored particle containing a binder resin, a colorant, a release agent and a charge control agent, wherein an absolute charge amount of the toner on a developing roll in an actual device |Q/M|a is in the range from 20 to 100 μC/g...

20060172215 - Toner for developing electrostatic latent image, developer using the toner, and process cartridge, image forming apparatus and image forming method using the developer: wherein the first colorant contains an organic pigment having a primary particle diameter distribution with a median diameter of from 0.08 to 0.12 μm, and the second colorant contains an organic pigment having a primary particle diameter distribution with a median diameter of from 0.01 to 0.06 μm, and each...

20060172210 - Positive electrostatic charge control agent and toner for developing electrostatic image: A positive electrified charge control agent comprises a silicon complex compound bonding with covalent of a central silicon atom and oxygen originated from a hydroxyl group, which bonds to an organic group, and bonding with coordination of the central silicon atom and a carbonyl group of equivalent to the oxygen,...

20060172211 - Electrophotographic toner: An electrophotographic toner comprising a resin, a colorant and a release agent which comprises a first wax and a second wax, wherein: (i) the first wax exhibits: an endothermic peak appearing in the range 75-100° C., a peak width at half height of the endothermic peak of 10-40° C., an...

20060172213 - Electrostatic image developing toner:

20060172212 - Toners comprising modified pigments and processes for preparing the same: The present invention relates to toner compositions comprising a resin and a colorant. Various embodiments of the colorant used in the toner compositions are disclosed, including a modified pigment comprising a pigment having attached at least one organic group having the formula —X—I, wherein X, which is directly attached to...

20060172216 - Electrophotographic toner and method of development therewith: Cyclo-olefin copolymer resin is contained as a binder resin, and concentration of a charge controlling agent on the surface of the toner is not less than 0.1 mg/toner 1 g, and less than 1.0 mg/toner 1 g. Furthermore, the toner is held on a non-magnetic sleeve, an electric field is...

20060172217 - Toner for electrostatic charge image development: A toner for developing an electrostatic latent image, comprising a toner particles containing at least a binder resin, a colorant and a charge control agent, the toner particles having a volume mode diameter (a) from 5 to 10 μm, a ratio (Dv/Dp), of a volume average particle diameter (Dv) to...

20060172218 - Coated carrier: A carrier comprised of a core, and thereover a polymer coating containing a first polymer and a silicone resin, and which resin possesses an average diameter of from about 300 to about 3,000 nanometers....

20060172219 - Electrophotographic printing of electronic devices: A method of forming electrical devices can include electrophotographically printing a particulate material on a device substrate, and the particulate material can form at least a portion of the electrical device. An optional intermediate transfer member can also be used to improve reliability and performance of the process. Dry or...

20060172220 - Toner processes: A toner process involving the heating a mixture of an acicular magnetite dispersion, a colorant dispersion, a wax dispersion, a first latex containing a crosslinked resin, and a second latex containing a resin free of crosslinking in the presence of a coagulant to provide aggregates, stabilizing the aggregates with an...

20060172221 - Production process of polymerized toner: A process for producing a polymerized toner, comprising the step of polymerizing a polymerizable monomer composition containing a polymerizable monomer and a colorant in the presence of a polymerization initiator in an aqueous dispersion medium to form colored polymer particles, the process comprising the steps of mixing the polymerizable monomer...

20060172223 - Photoresist compositions: Chemically-amplified positive photoresist compositions are provided that contain an additive with acetal and alicyclic groups. Preferred photoresists of the invention comprise a resin component that includes a polymer with one or more photoacid-labile moieties, one or more photoacid generator compounds, and an additive that contains one or more alicyclic groups...

20060172224 - Photoresist compositions: Chemically-amplified positive photoresist compositions are provided that contain a resin that comprises acetal and alicyclic groups. Photoresists of the invention can exhibit notably enhanced lithographic properties. Preferred photoresists of the invention comprise one or more photoacid generator compounds and one or more phenolic resins comprise one or more photoacid-labile acetal...

20060172225 - Photoresist compositions: Photoresists of the invention contain an added acid reaction component together with one or more resins and a photoactive component. Preferred photoresists of the invention can provide processes substrates such as microelectronic wafers with desired iso-dense bias values. Particularly preferred photoresists of the invention are chemically-amplified positive-acting resists and contain...

20060172222 - Radiation-sensitive negative-type resist composition for pattern formation method: The radiation-sensitive negative-type resist composition for pattern formation containing an epoxy resin, a radiation-sensitive cationic polymerization initiator, and a solvent for dissolving the epoxy resin therein, characterized in that the resist composition, through drying, forms a resist film having a softening point falling within range of 30 to 120 C....

20060172226 - Resist composition and pattern forming method using the same: wherein S1 to S8 each independently represents a substituent; a, n, m, l, k, o, p, q and r each independently represents an integer of 0 to 2; X represents a single bond or a divalent linking group; R1 and R2 each independently represents a hydrogen atom or a substituent,...

20060172229 - Alignment system used in nano-imprint lithography and nano imprint lithography method using the alignment system: An alignment system used in nano-imprint lithography and a nano-imprint lithography method using the alignment system are provided. The alignment system includes: a plurality of electron emission devices, which are provided in the mold and emit electrons; and a plurality of electrodes, which are provided to face the electron emission...

20060172227 - Method for making fluid emitter orifice: A method of forming a tapered bore an orifice layer of a photo-resist comprises forming a lens in a surface of a first unexposed portion of the layer and exposing the first unexposed portion through a bore-hole mask to define an exposed portion and a second unexposed portion, wherein the...

20060172228 - Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition: The invention provides a photosensitive composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes, a pattern forming method using the photosensitive composition, and a specific organic...

20060172230 - Method and composition for reducing waste in photo-imaging applications: Waste reduction, including hazardous waste reduction in photoimaging processes can be accomplished by improving diffusional resolution of cationic curable compositions. The addition of fluorinated polymers including fluorinated surfactants provides improved diffusional resolution in cationic and/or radical based photoimaging formulations allowing for image accuracy improvements, and reduced product and process waste...

20060172231 - Use of an oxidizer to improve trace metals removal from photoresist and photoresist components: A process of removing trace levels of metallic impurities from resist or photoresist component solutions and obtaining a purer resist or resist component solution without isolating the resist or resist component as a solid by treating the resist or resist component solution with an aqueous solution of a water soluble...

20060172232 - Stabilization processing composition of silver halide light-sensitive color photographic material and processing method using the same: A stabilization processing composition for processing a silver halide light-sensitive color photographic material, wherein the stabilization processing composition contains a compound represented by Formula (I); and a molar ratio of ammonium ions in the stabilization processing composition to a total mole of cations in the stabilization processing composition is less...

20060172233 - Silver salt photothermographic dry imaging material, image recording method and image forming method for the same: A silver salt photothermographic dry imaging material including non-photosensitive aliphatic carboxylic acid silver salts; a photosensitive emulsion containing photosensitive silver halide grains; a silver ion reducing agent; a binder; and a cyan coloring leuco dye. A percentage of the photosensitive silver halide grains having a mean particle size of 0.01...

20060172234 - Photothermographic material: s

20060172235 - Photothermographic material and image forming method: wherein R1 and R1′ each independently represent a hydrogen atom, or a substituted or unsubstituted alkyl group, aryl group, or heterocyclic group, and R1 and R1′ are not simultaneously a hydrogen atom. The invention provides a photothermographic material which exhibits high sensitivity and excellent image storability, and an image forming...

20060172236 - Silver salt photothermographic dry imaging material and image forming method: A photothermographic material is disclosed, comprising a light-insensitive aliphatic carboxylic acid silver salt grains, light-sensitive silver halide grains, a reducing agent for silver ions and a binder, wherein the photothermographic material is packaged in a package of a packaging material exhibiting a water-vapor permeability of not more than 5.0 g/m2·24...