Radiation imagery chemistry: process, composition, or product thereof inventions 07/06

20060166104 - Equipment and method of manufacturing a holographic recording medium and precursors thereof: A laminated holographic recording medium having (a) a first substrate having a through-hole and (b) a solid polymer matrix layer that records holographic data laminated to the first substrate and a method of manufacturing thereof are disclosed. The method of manufacturing preferably requires injecting a precursor material through the through-hole...

20060166105 - Differential alternating phase shift mask optimization: A method of designing a mask for projecting an image of an integrated circuit design in lithographic processing, wherein the integrated circuit layout has a plurality of segments of critical width. The method comprises creating a first mask design by aligning mask features used to assist in projecting critical width...

20060166111 - Mask, mask forming method, pattern forming method, and wiring pattern forming method: A mask, which is used to form predetermined patterns on a substrate, includes a pattern forming member that is provided with openings corresponding to the predetermined patterns; and a pattern holding member that overlaps one surface of the pattern forming member....

20060166110 - Method and apparatus for improving depth of focus during optical lithography: One embodiment of the present invention provides a system that improves the depth of focus during an optical lithography process. During operation, the system receives a mask layout. The system then selects an edge in the mask layout. Next, the system adds a notch to the edge to improve the...

20060166108 - Method for etching a molybdenum layer suitable for photomask fabrication: Methods for fabricating a photomask are disclosed herein. In one embodiment, a method for fabricating a photomask includes providing a filmstack having a molybdenum layer and a light-shielding layer in a processing chamber, patterning a first resist layer on the light-shielding layer, etching the light-shielding layer using the first resist...

20060166106 - Method for photomask plasma etching using a protected mask: A method for etching chromium and forming a photomask is provided. In one embodiment, a method for etching chromium includes providing a film stack in a processing chamber having a chromium layer, patterning a photoresist layer on the film stack, depositing a conformal protective layer on the patterned photoresist layer,...

20060166107 - Method for plasma etching a chromium layer suitable for photomask fabrication: A method for etching a chromium layer is provided herein. In one embodiment, a method for etching a chromium layer includes providing a filmstack in an etching chamber, the filmstack having a chromium layer partially exposed through a patterned layer, providing at least one halogen containing process gas to a...

20060166109 - Method to correct euvl mask substrate non-flatness: Methods to correct a non-flatness of a mask substrate are described. At least a pair of correction layers are formed on the substrate over a non-flat region of a front surface of a substrate. A thickness of the at least the pair of the correction layers is determined by a...

20060166112 - Photomask for nearfield exposure, method for making pattern using the photomask, and apparatus for making pattern including the photomask: A photomask for near-field light exposure includes a transparent substrate, and a shading member on the substrate, the shading member having a mask pattern including an aperture with a width not greater than the wavelength of light from a light source. The shading member has a thickness that provides a...

20060166113 - Photosensitive paste composition and plasma display panel manufactured using the same: A photosensitive paste composition for forming a black layer on top of plasma display panel (PDP) barrier ribs includes black pigment nanoparticles for contrast enhancement and a cyclic acid anhydride for fundamentally preventing the gelation of the paste composition. The photosensitive paste composition prevents electrical or optical crosstalk between adjacent...

20060166114 - Photosensitive resin composition for black matrix: p

20060166115 - Imaging members: An imaging member having a charge transport layer is provided. The charge transport layer includes a plurality of charge transport layers coated from solutions of similar or different compositions or concentrations, wherein the upper or additional transport layer(s) comprise a lower concentration of charge transport compound than the first (bottom)...

20060166116 - Photoconductive imaging members: A photoconductive member comprised of a hole blocking layer, a photogenerating layer, and a charge transport layer comprised of a polymer with a low dielectric constant and a charge transport component....

20060166117 - Wet-developing electrophotographic photoconductor and wet-developing image: It is an object of the present invention to provide a wet-developing electrophotographic photoconductor which can be manufactured stably by making use of particular physical property indexes of an electron transport agent and a binding resin and possesses the excellent durability and the excellent solvent resistance and a wet-developing image...

20060166118 - Heterocycle-hydrazone based charge transport materials: R2, R3, R4, R5, and R6 comprise, each independently, H, an alkyl group, an alkenyl group, an alkynyl group, an aromatic group, a heterocyclic group, or a part of a ring group; X is a bond or a linking group; and Q is O, S, or NR where R is...

20060166119 - Method for producing electrophotographic toner: A method for producing an electrophotographic toner comprising the step of polymerizing two or more polymerizable monomers under existence of a non-polar liquid hydrocarbon, wherein at least one the polymerizable monomers comprises a polar group; a dynamic viscosity of the liquid hydrocarbon at 40° C. is in the range of...

20060166120 - Toner, image forming method, and process cartridge: 1.0×104 dN/m2≦G″(140° C.)≦2.0×105 dN/m2; and the binder resin is chiefly composed of a vinyl type copolymer. This can provide a toner with which images kept to have gloss within a preferable state can be obtained without changing fixing speed and fixing temperature even when transfer materials of different types are...

20060166121 - Hybrid toner processes: A toner process that includes a first heating of a colorant dispersion, a first polyester resin free latex emulsion, a second polyester latex emulsion, and a wax dispersion in the presence of a coagulant containing a metal ion; adding a third polyester free latex; adding an organic sequestering compound or...

20060166122 - Toner processes: A toner process comprised of a first heating of a mixture of an acicular magnetite dispersion, a colorant dispersion, a wax dispersion, and a core latex comprised of a first latex containing a vinyl crystalline polyester resin substantially free of crosslinking, and wherein said polyester is substantially dissolved in a...

20060166124 - Coated carriers and processes thereof: A carrier comprised of a core and a polymer generated from a mixture of two latexes, and wherein the first latex enables a polymer with a high molecular weight, and the second latex enables a polymer with a low molecular weight, and wherein high represents a weight average molecular weight...

20060166125 - Coated carrier: A carrier comprised of a core, and thereover a polymer coating containing antimony tin oxide with an average diameter of from about 5 to about 90 nanometers....

20060166123 - Toner, toner container, and toner feeding device and image forming apparatus using the toner container: A toner is provided having binder resin and colorant, wherein the toner satisfies the following relationship T<−0.05ε+0.032 wherein ε represents a void ratio of a bulk toner formed by consolidating the toner with a load of 500 to 3000 N/m2, and T represents a torque (Nm) needed for intruding a...

20060166126 - Liquid developer: A liquid developer composition for electrophotography is disclosed which comprises a pigment, an acrylic-based thermoplastic resin, an electric insulating solvent and a dispersant, the acrylic-based thermoplastic resin having a degree of swelling of less than 0.5 g against the electric insulating solvent, the dispersant comprising at least one of modified...

20060166127 - Image forming method and image forming apparatus: There are described an image forming method and apparatus, which enable to form an electrophotographic image having high image density and excellent color reproducibility. The method includes: applying a uniform surface potential to an organic photoreceptor; irradiating light, having a wavelength in a range of 350-500 nm, on the photoreceptor,...

20060166129 - Fluorinated polymers useful as photoresists, and processes for microlithography: This invention provides a fluorine-containing copolymer having a repeat unit derived from at least one fluorinated olefin and a repeat unit derived from at least one polycyclic ethylenically unsaturated monomer having pendant hydroxyl or esterified hydroxyl groups, and optionally other repeat units, typically derived from an acrylate. These polymers have...

20060166128 - Lithographic materials based on polymers containing polyhedral oligomeric silsesquioxanes: Materials are described suitable for optical lithography in the ultraviolet region (including 157 nm and extreme ultraviolet region), and for electron beam lithography. These materials are based on new homopolymers and copolymers, they are characterized by the presence of polyhedral oligomeric silsequioxanes in their molecule, and they are suitable for...

20060166137 - Lithographic printing plate precursor, lithographic printing method and packaged body of lithographic printing plate precursors: (1) A packaged body of lithographic printing plate precursors, wherein an image-recording layer or a protective layer of the outermost surface layer contains an inorganic layered compound. (2) A lithographic printing plate precursor having a protective layer containing an inorganic layered compound, and an image-recording layer containing a binder polymer....

20060166133 - Negative resist composition and patterning process: A negative resist composition is provided comprising a polymer comprising recurring units having formula (1), a photoacid generator, and a crosslinker. In formula (1), X is alkyl or alkoxy, R1 and R2 are H, OH, alkyl, substitutable alkoxy or halogen, R3 and R4 are H or CH3, n is an...

20060166139 - Organic anti-reflective coating composition and method for forming photoresist patterns using the same: The present disclosure relates to an organic anti-reflective coating composition and a method for forming photoresist patterns using the same. The anti-reflective coating compositions are useful for preventing reflection of a lower film layer or a substrate of a photoresist film, reducing standing waves caused by light and variations in...

20060166130 - Photoresist composition and method for forming resist pattern using the same: A photoresist composition containing a polymer (A) containing an alkali-soluble constituent unit (a1) containing an alicyclic group having both a fluorine atom or a fluorinated alkyl group (i) and an alcoholic hydroxyl group (ii), whose alkali-solubility is changeable by an action of an acid; an acid generator (B) which generates...

20060166134 - Photoresist composition and method of forming a pattern using the same: A photoresist composition is provided. The photosensitive composition includes a photosensitive resin present in an amount of about 4% by weight to about 10% by weight, a photo-acid generator (PAG) present in an amount of about 0.1% by weight to about 0.5% by weight and a residual amount of a...

20060166135 - Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition: A photosensitive composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes, a compound for use in the photosensitive composition, and a pattern forming method using the...

20060166131 - Positive photoresist composition and method of forming resist pattern: A positive photoresist composition comprising an alkali-soluble novolak resin (A) containing a structural unit (a1) represented by a general formula (I) shown below, and a structural unit (a2) represented by a general formula (II) shown below, and a photosensitizer (B)....

20060166136 - Positive resist composition for immersion exposure and pattern-forming method using the same: A positive resist composition for immersion exposure comprising: (A) a resin having an alicyclic hydrocarbon structure, wherein the resin is capable of increasing a solubility of the resin (A) in an alkaline developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation...

20060166138 - Radiation-sensitive resin composition: p

20060166132 - Ultraviolet light transparent nanoparticles for photoresists: The transparency of photoresist films to ultraviolet light may be increased without sacrificing photospeed or resolution of the photoresist by including ultraviolet light transparent nanoparticles to the photoresist formulations. The ultraviolet light transparent nanoparticles may be included in the photoresist formulations as filler to “dilute” the ultraviolet light opacity of...

20060166140 - Active energy ray curable composition for coating optical disk and optical disk: The present invention relates to an active energy ray curable composition for coating optical disc, comprising a urethane(meth)acrylate compound having at least one amide group in the molecule, an ethylenically unsaturated compound other than the urethane(meth)acrylate compound and a photopolymerization initiator; and an optical disc having a cured coating layer...

20060166141 - Inkjet-imageable lithographic printing members and methods of preparing and imaging them: Lithographic printing plates are imaged using an inkjet printer to imagewise apply a chemical or masking agent onto the plate surface. In some embodiments, the chemical causes an affinity change, thereby facilitating lithographic printing....

20060166142 - Illuminant distribution evaluation method, optical member manufacturing method, illumination optical device, exposure apparatus, and exposure method: There is disclosed an evaluation method for evaluating a one-dimensional illumination distribution using polynomials, the method comprising steps of: setting up, as the polynomials, one-dimensional power polynomials which are orthogonal in a closed interval; and approximating the one-dimensional illumination distribution with the power polynomials to obtain the coefficients of respective...

20060166143 - Resist collapse prevention using immersed hardening: A method, tool, and machine for hardening a photoresist image while the photoresist image is immersed in a liquid....

20060166144 - Reduced loss high efficiency diffractive and associated methods: A sub-wavelength anti-reflective diffractive structure is incorporated with a base diffractive structure having a small period to form a high efficiency diffractive structure. In the high efficiency diffractive structure, the anti-reflective structure and/or the base diffractive structure are altered from their ideal solo structure to provide both the desired performance...

20060166145 - Method providing an improved bi-layer photoresist pattern: A method for etching a feature in a layer is provided. An underlayer of a polymer material is formed over the layer. A top image layer is formed over the underlayer. The top image layer is exposed to patterned radiation. A pattern is developed in the top image layer. The...

20060166146 - Developer regenerators: The present invention provides an aqueous regenerator for addition to an aqueous developer that contains an organic solvent, a dispersing agent and a weak base, and has a pH of between about 8 and less than about 13. The aqueous regenerator includes an organic solvent, dispersing agent, and an effective...

20060166147 - Developer composition: e

20060166148 - Method of producing liquid developer and liquid developer produced by the method: A method of producing a liquid developer which comprises a high insulation solution and toner particles dispersed in the solution is provided. The method comprises the steps of: a kneading step for kneading a material containing a pigment and a resin material to obtain a kneaded material; a water-based emulsion...

20060166149 - Silver halide color photosensitive material: A silver halide color photosensitive material containing at least one compound selected from the below defined compound (A-1) and/or (A-2) which does not substantially react with a developing agent oxidation product, and which is capable of substantially enhancing the sensitivity of the photosensitive material by addition thereof as compared with...

20060166150 - Photothermographic material: A photothermographic materials, containing a support having thereon an image forming layer containing, light photosensitive silver halide grains; a binder; a reducing agent for silver ions represented by Formula (1); and a leuco dye represented by Formula (2):...

20060166151 - Thermally developable materials with improved conductive layer: Backside conductive layers with increased conductive efficiency can be provided for thermally developable materials by formulating hydrophilic metal oxide clusters in a hydrophobic environment using low shear mixing conditions. The dry thickness and coating weight of the conductive layer are thereby reduced....

20060160001 - Systems and methods for determining width/space limits for mask layout: Systems for determining width/space limits for product mask layouts. A mask writer generates a first pattern on a test mask corresponding to a test mask layout. A lithography tool generates a second pattern on a wafer corresponding to a first pattern on a test mask by a lithography process using...

20060160002 - Crosslinked siloxane composite overcoat for photoreceptors: A crosslinked siloxane composite overcoat for electrophotographic photoreceptors, containing at least one siloxane-containing compound, a resin and metal oxide particles; photoreceptors containing the crosslinked siloxane composite overcoat; and image process cartridge and image forming apparatuses containing photoreceptors containing the crosslinked siloxane composite overcoat....

20060160003 - Electrophotographic photoreceptor, and image forming method, image forming apparatus and process cartridge therefor using the electrophotographic photoreceptor: An electrophotographic photoreceptor including an electroconductive substrate and a photosensitive layer located overlying the electroconductive substrate, wherein the photosensitive layer comprises units obtained from a radical polymerizing monomer, in which an aliphatic group having two radical polymerizing groups and a charge transporting group including no radical polymerizing group are connected...

20060160004 - Electrophotographic photosensitive member: An electrophotographic photosensitive member is provided which can keep at a minimum the absorption of image exposure light of 380 to 500 nm in wavelength in its surface layer and concurrently can satisfactorily keep electrophotographic properties including resolving power. The electrophotographic photosensitive member has a substrate, and a photoconductive layer...

20060160005 - Single layer type electrophotographic photoconductor and image forming device: The present invention provides a single layer type electrophotographic photoconductor which exhibits the small number of generated black spots in a formed image and exhibits the excellent sensitivity characteristic even when the photoconductor is used for a long time or a photoconductor drum is rotated at a high speed and...

20060160006 - Positively chargeable developer: A positively chargeable developer is provided which is capable of providing stable image quality without causing any image defect even in long-term use. The developer includes at least positively chargeable toner particles each containing at least a binder resin and magnetic iron oxide, silica and an inorganic fine powder. A...

20060160009 - Color toner and developer compositions and processes for making and using such compositions: The invention provides novel colored toner and developer compositions containing polymeric colorants. Such compositions may contain poly(oxyalkylene) or poly(alkylester) substituted color chromophores which are attached to relatively long chained ologomers. The color toner and developer compositions of the invention resist color bleeding and aggregation, and may retain their color fidelity...

20060160007 - Surface particle attachment process, and particles made therefrom: A method of forming toner particles having surface particles attached thereto includes the steps of aggregating a material of at least one binder material and at least one colorant to produce toner particles, following aggregation, forming a mixture of the surface particles and the toner particles, and subjecting the mixture...

20060160008 - Color toner for non-magnetic mono-component system for increasing printing quality and a method for preparing the same: The present invention relates to a color toner for a nonmagnetic mono-component printing system that improves the printing characteristics, and a preparation method thereof. More specifically, the present invention provides a color toner including a first coating layer and a second coating layer formed on a toner mother particle, wherein...

20060160010 - Super low melt and ultra low melt toners containing crystalline sulfonated polyester: A toner is disclosed that includes a toner binder of crystalline sulfonated polyester, wherein the crystalline sulfonated polyester is 90% by weight or more of the toner binder, and a colorant. In other embodiments, the toner includes a crystalline sulfonated polyester and a linear amorphous sulfonated polyester, and a colorant....

20060160011 - Toner and production method of the same, and image forming method: The object of the present invention is to provide a toner having a uniform composition of toner materials among toner particles, excelling in charge stability, enabling high-quality images without substantially causing fog and toner scattering, and having a small diameter and a narrow particle size distribution. The present invention also...

20060160012 - Toner production method and toner production apparatus: A toner production method includes the step of: controlling a shape of toner particles in a shape controlling region to control the shape of toner particles in a water based medium, wherein the shape controlling region has a toner channel for the toner particles and a temperature controller capable of...

20060160013 - Method and apparatus for recording image: An image is formed on a non-flexible sheet member by laying and tightly adhering an image transfer sheet having a photo-thermal conversion layer and an image forming layer onto the non-flexible sheet member, scanning the image transfer sheet from the back with laser spots so that only areas of the...

20060160017 - Chemically amplified positive resist composition:

20060160018 - Electrode-forming composition for field emission type of display device, and method using such a composition: A composition utilized in and a method for forming an electrode used in field emission type of display devices said composition is a photosensitive copper conductive composition comprising: a mixture of (a) copper powder at least 70 wt % out of 100 wt % copper powders having a particle size...

20060160024 - Imaging methods: An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts....

20060160016 - Inkjet-imageable lithographic printing members and methods of preparing and imaging them: Lithographic printing plates are imaged using an inkjet printer to imagewise apply a chemical agent onto the plate surface. The chemical causes a change that facilitates lithographic printing....

20060160023 - Photo acid generator, chemical amplification resist material and pattern formation method: A high resolution resist material comprising an acid generator is provided so that high sensitivity and high resolution for high energy rays of 300 nm or less, small line-edge roughness, and excellence in heat stability and storage stability are obtained. Moreover, a pattern formation method using this resist material are...

20060160021 - Photoresist composition and method of forming a photoresist pattern using the same: In a photoresist composition for a semiconductor manufacturing process and a method of forming a photoresist pattern using the photoresist composition, the photoresist composition includes an organic dispersing agent for dispersing acid (H+). The photoresist film may have enough spaces among photosensitive polymers so that acid may be dispersed sufficiently...

20060160022 - Photoresist compositions comprising resin blends: New positive photoresist compositions are provided that contain a photoactive component and blend of at least two distinct resins: i) a first resin that comprises carbocyclic aryl units with hetero substitution (particularly hydroxy or thio) and ii) a second cross-linked resin. Preferred photoresists of the invention can be imaged at...

20060160014 - Photosensitive composition for interlayer dielectric and method of forming patterned interlayer dielectric: A change in dimension of a pattern formed of a polysilsesquiazane photosensitive composition containing a photoacid generating agent is prevented. The photosensitive composition according to the present invention is characterized by comprising: a modified polysilsesquiazane having a weight average molecular weight of 500 to 200,000 comprising basic constitutional units represented...

20060160020 - Photosensitive polymer, photoresist composition having the photosensitive polymer and method of forming a photoresist pattern using the photoresist composition: c

20060160019 - Photosensitive resin, photoresist composition having the photosensitive resin and method of forming a photoresist pattern by using the photoresist composition: In a photosensitive resin, a photoresist composition having the photosensitive resin, and a method of forming a photoresist pattern by using the photoresist, the photosensitive resin includes a blocking group substituted for an acid. The photosensitive resin has a weight-average molecular weight of from about 6,000 up to about 8,000....

20060160015 - Water soluble resin composition, method of pattern formation and method of inspecting resist pattern: A water-soluble resin composition of the present invention comprises at least a water-soluble resin, an acid generator capable of generating an acid by heating and a solvent containing water. The water-soluble resin composition is applied on a highly water-repellant resist pattern 3 formed by a resist such as an ArF-responsive...

20060160025 - Process for preparing a flexographic printing plate from a photopolymerizable element: This invention relates to a photosensitive element for use as a flexographic printing plate and a process for preparing the plate from the element. The photosensitive element has at least one photopolymerizable elastomeric layer that comprises a binder, a monomer, a photoinitiator, an onium salt, and a leuco dye. Upon...

20060160026 - Device and method of forming film: A film forming device includes a mask member that is made of silicon and has first openings of predetermined patterns; a magnetic member that is made of a magnetic material and has a second opening, and that is aligned with the mask member so that the first openings are arranged...

20060160027 - Electroforming mold and method for manufacturing the same, and method for manufacturing electroformed component: To provide an electroforming mold for manufacturing a multi-step structure minute component and a method for manufacturing the same, for which height control is possible and manufacturing process does not become complicated. On the upper face of a film of an electroconductive layer 2 formed on the upper face of...

20060160029 - Lithographic method of manufacturing a device: For lithographically manufacturing a device with a very high density, a design mask pattern (120) is distributed on a number of sub-patterns (120a, 120b, 120c) by means of a new method. The sub-patterns do not comprise “forbidden” structures (135) and can be transferred by conventional apparatus to a substrate layer...

20060160028 - Method of forming fine patterns of a semiconductor device: Methods of forming fine patterns of a semiconductor device include forming a positive first photoresist layer on a semiconductor substrate, including initiating an exposure reaction at a first dose. The first photoresist layer is exposed and developed to form first photoresist patterns. A second photoresist layer is formed on a...

20060160030 - Single polisilicon emitter bipolar junction transistor processing technique using cumulative photo resist application and patterning: A process for forming a bipolar transistor where the doping implantation of the extrinsic base regions does not affect the emitter doping levels. The techniques is to not remove the photoresist layer used to defme the poly emitter contact. The photoresist layer for defining the extrinsic base regions overlays the...

20060160031 - Euv lithography filter: Filters for EUV lithography, methods of manufacture thereof, and methods of filtering in an EUV lithography system are disclosed. The filter comprises a nanotube material layer sandwiched by two thin material layers that are highly transmissive and provide structural support for the nanotube material layer. The filter is supported on...

20060160032 - Pattern formation method and exposure system: After forming a resist film made from a chemically amplified resist material, pattern exposure is carried out by irradiating the resist film with exposing light while supplying, between a projection lens and the resist film, a solution of water (having a refractive index of 1.44) that includes an antifoaming agent...

20060160033 - Method for printing by printed pattern and production equipment for printing printed pattern: A method for printing a printed pattern, comprising the steps of a printed pattern forming process for forming the printed pattern such as a resist made of an etching resistant member on an etching film formed on a substrate, and thereafter, a thinning process for thinning the resist in a...

20060160034 - Methods of forming capping layers on reflective materials: A reflective material is heated to reduce internal stress, and then a capping layer is formed over the reflective material. Heating the reflective material reduces the internal stress of the reflective material. Because the reflective material has reduced internal stress, a more continuous, stable and reliable capping layer is formed...

20060160035 - Image forming method using photothermographic material: wherein R1, R2, R3, and R4 each independently represent a hydrogen atom or a substituent; R5 and R6 each independently represent an alkyl group, an aryl group, a heterocyclic group, an acyl group, or a sulfonyl group; R7 represents R11—O—CO—, R12—CO—CO—, R13—NH—CO—, R14—SO2—, R15—W—C(R16)(R17)(R18)—, R19—SO2NHCO—, R20—CONHCO—, R21—SO2NHSO2—, R22—CONHSO2— or (M)1/nOSO2—;...

20060160037 - Automated sub-field blading for leveling optimization in lithography exposure tool: A method of exposing images on a wafer having varying topography during lithographic production of microelectronic devices. The method initially includes determining topography of a wafer, dividing the wafer into two or more separate regions based on the wafer topography, and determining desired focus distance for exposing a desired image...

20060160036 - Near-field exposure method and apparatus, near-field exposure mask, and device manufacturing method: Disclosed is a near-field exposure method and apparatus, a near-field exposure mask, and a device manufacturing method, wherein exposure is carried out on the basis of near field light. Specifically, the near-field exposure method disclosed is arranged so that a pressure difference is applied to between a front face and...

20060160038 - Photothermographic material: The invention provides a photothermographic material containing, on a support, an image forming layer having at least a photosensitive silver halide, a non-photosensitive organic silver salt and a reducing agent, and at least one non-photosensitive layer, in which the non-photosensitive layer contains a crosslinking agent precursor, in which the crosslinking...

20060160039 - Photothermographic material: The invention provides a photothermographic material containing an image forming layer having at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder on at least one side of a support, an outermost layer on the same side of the support as the image...

20060154150 - Arrangement for the production of photomasks: An arrangement and a method for the production of photomasks in which at least one defect control system is connected to at least one repair system by a stationary data connection or online connection, and the defect control system and repair system are connected to one another by data in...

20060154153 - Anti-esd photomask blank: An anti-electrostatic discharge photomask blank for fabrication of an anti-electrostatic discharge photomask is disclosed. The anti-electrostatic discharge photomask blank includes a mask substrate, a conductive layer provided on the mask substrate and an opaque patterning layer provided on the conductive layer. The conductive layer prevents charges of opposite polarity from...

20060154152 - Flare reduction in photolithography: Lithography masks that include sub-resolution features to reduce flare are disclosed and described herein....

20060154156 - Interferometric imaging with reduced aperture: This invention concerns enhancing the resolution of optical imaging systems....

20060154154 - Mask and method of manufacturing a poly-silicon layer using the same: A mask and method of manufacturing a poly-silicon layer using the same are provided. The mask has a first, a second, a third, and a fourth region. The first region has first opaque portions and first slits. The second region has second slits and second opaque portions. The third region...

20060154151 - Method for quartz photomask plasma etching: A method for etching quartz is provided herein. In one embodiment, a method of etching quartz includes providing a filmstack in an etching chamber, the filmstack having a quartz layer partially exposed through a patterned layer, providing at least one fluorocarbon process gas to a processing chamber, biasing a quartz...

20060154155 - Optical masks and methods for measuring aberration of a beam: An optical mask for use with an exposure beam includes a mask substrate adapted to be placed on a traveling path of the exposure beam. A reference pattern is formed on the mask substrate. The reference pattern is adapted to direct the exposure beam to travel in a predetermined reference...

20060154157 - Photo mask and method of manufacturing the same, and method of forming photosensitive film pattern of using the photo mask: The present invention relates to a photo mask and a method of manufacturing the same, and a method of forming a photosensitive film pattern using the photo mask. A photo mask pattern having an exposure region, a phase-inverse region and a photosensitive region is provided. The predetermined size and shape...

20060154158 - Developer composition for resists and method for formation of resist pattern: e

20060154159 - Electrophotographic photoreceptor and electrophotographic imaging apparatus: The invention is directed to an electrophotographic photoreceptor, and an electrophotographic cartridge and an electrophotographic imaging apparatus including the electrophotographic photoreceptor. The electrophotographic photoreceptor includes: an electrically conductive substrate; a charge generating layer formed on the electrically conductive substrate and comprising μ-oxo-gallium phthalocyanine dimer as a charge generating material dispersed...

20060154160 - Photoconductors: A photoconductor. The photoconductor includes a substrate, a charge generation layer thereon, and a charge transfer layer on the charge generation layer comprising a resin modified by a reactive silane....

20060154161 - Crosslinked siloxane outmost layer having aromatic siliconcontaining compounds for photoreceptors: where Ar represents an aromatic group, X represents a divalent or trivalent group; L represents a divalent linking group; R represents a hydrogen atom, an alkyl group or an aryl group; R′ represents an alkyl group having 1 to 5 carbon atoms; n is an integer of from 0 to...

20060154162 - Toner particles and methods of preparing the same: Toner particles comprise resin, wax and optionally colorants, and the wax is substantially excluded from the interior core of the toner particles. Processes for preparing such toner particles comprise providing an aqueous dispersion of resin particles and optionally colorants, mixing the aqueous dispersion in presence of a coagulant, aggregating to...

20060154163 - Toner for electrostatic image development: The toner for developing the electrostatic latent image of the present invention is composed of a toner particles containing at least a binder resin, a colorant, a charge control agent and a parting agent, the toner particles having a volume mode diameter (a) in the range from 5 to 10...

20060154165 - Electric charge controlling agent, toner for developing electrostatic charge image containing the same, and method for forming image using the toner: (in the chemical formula [VI], B+ is (H+)x(Na+)1-x and x is mole ratio and 0.6 to 0.9, or B+ is (H+)y(Na+)1-y and y is mole ratio and 0 to 0.2) and the aggregate particles have 0.5 to 5.0 microns of an average particle size. A toner for developing an electrostatic...

20060154164 - Toner and process for producing the same: The toner of the present invention comprises at least a pigment and a binder resin, wherein a filtrate obtained by filtering a dispersion comprising 0.2 g of the toner dispersed in 100 ml of tetrahydrofuran through a filter with a pore size of 0.45 μm, when it is measured by...

20060154166 - Toner for electrophotographic imaging apparatus: A yellow toner for an electrophotographic imaging apparatus is provided where the toner includes: a binder resin; a pigment; and a charge control agent, wherein the pigment comprises 2-8% by weight of Pigment yellow 74 based on the weight of the toner. The toner is uniform and has small differences...

20060154167 - Emulsion aggregation toner compositions: A toner includes particles of a resin, a leveling agent, an optional colorant, and additional optional additives, where the leveling agent is selected from silicon containing leveling agents, and mixtures, thereof, and where the toner particles are prepared by an emulsion aggregation process....

20060154168 - Toner for developing latent electrostatic image, container having the same, developer using the same, process for developing using the same, image-forming process using the same, image-forming apparatus using the same, and image-forming process cartridge: A toner for developing a latent electrostatic image including a base of toner particle which contains a binder resin and a coloring agent, and an external additive. Herein, a plurality of the base of toner particle has a volume average particle diameter (Dv) of 3 μm to 7 μm, a...

20060154169 - Radiation-sensitive compositions comprising a 1,4-dihydropyridine sensitizer and imageable elements based thereon: t

20060154172 - 1-4-dihydropyridine-containing ir-sensitive composition and use thereof for the production of imageable elements:

20060154171 - Photoresist composition and method of forming resist pattern: [wherein, X, Y, and Z each represent, independently, an alkyl group that may contain an aryl group bonded to a terminal (although two terminals from the groups X, Y, and Z may also be bonded together to form a cyclic structure), at least one of X, Y, and Z contains...

20060154176 - Photoresist composition, method of forming a photoresist pattern and method of forming a protection layer in a semiconductor device using the photoresist composition: A photoresist composition comprising a hydrogen-bonding compound and a thermosetting resin is provided. A method of forming a photoresist pattern is also provided. The method comprises forming a photoresist film on an object by coating the object with a photoresist composition including a hydrogen-bonding compound and a thermosetting resin. Then,...

20060154173 - Resist composition: There is provided a resist composition used for the production of printed boards, which comprises (A) a resin component, (B) a photopolymerization initiator, (C) water and (D) an organic solvent, wherein the organic solvent (D) contains: (D-1) at least one organic solvent selected from the group consisting of an α-hydroxycarboxylate...

20060154170 - Resist composition for liquid immersion exposure process and method of forming resist pattern therewith: A resist composition for liquid immersion lithography process, which comprises: (A) a polymer comprising (a1) alkali-soluble constitutional units each comprising an alicyclic group having both (i) a fluorine atom or a fluoroalkyl group and (ii) an alcoholic hydroxyl group, wherein the polymer changes in alkali-solubility due to the action of...

20060154174 - Resist composition, multilayer body, and method for forming resist pattern: A resist composition is disclosed that enables formation of a favorable resist pattern using a shrink process in which, following formation of the resist pattern, a treatment such as heating is used to narrow the resist pattern, and also disclosed are a laminate and a method for forming a resist...

20060154175 - Solid imaging compositions for preparing polypropylene-like articles: This invention discloses compositions adapted to produce, through solid imaging means, excellent quality objects having material properties that simulate the look and feel of polypropylene articles....

20060154177 - Water soluble negative tone photoresist: A method is described for reducing the space width of holes in a first resist pattern and simultaneously removing unwanted holes to change the pattern density in the resulting second pattern. This technique provides holes with a uniform space width as small as 100 nm or less that is independent...

20060154180 - Imaging element for use as a recording element and process of using the imaging element: The invention relates to an imaging element and a method of using the imaging element to form a recording element. The imaging element includes a composition sensitive to actinic radiation at a first wavelength and a photoluminescent tag that is responsive to radiation at a second wavelength different from the...

20060154179 - Imprint lithography: An imprinting method is disclosed which involves irradiating a photo-curable imprintable medium in a flowable state on a substrate with radiation to initiate curing of the medium, after the irradiating, contacting the medium with a template to form an imprint in the medium, allowing the medium to substantially cure such...

20060154178 - Method for the production of photoresist structures: The optical element (3) is a polyhedron with planar or curved surfaces which largely prevents refraction of the light beams on the surface of the volume of photosensitive material (5) when the beams are fed-in and/or fed-out of the volume of photosensitive material (5), so that the angle of refraction...

20060154183 - Exposure apparatus and method for producing device: An exposure apparatus which performs an exposure while filling a space between a projection optical system and a substrate with liquid, and in which deterioration of a device caused by adherent liquid on the substrate is suppressed is provided. A device manufacturing system (SYS) includes a main body of an...

20060154182 - Method for post lithographic critical dimension shrinking using post overcoat planarization: A method for post lithographic critical dimension shrinking of a patterned semiconductor feature includes forming an overcoat layer over a patterned photoresist layer, and removing portions of the overcoat layer initially formed over top surfaces of the patterned photoresist layer. The remaining portions of the overcoat layer on sidewalls of...

20060154181 - Method of forming resist pattern, positive resist composition, and layered product: There are provided a method of forming a resist pattern that enables the resist pattern to be formed with good control of the pattern size, as well as a positive resist composition used in the method, and a layered product formed using the positive resist composition. In the above method...

20060154184 - Method for reducing feature line edge roughness: A method of patterning a feature in a substrate to reduce edge roughness comprises forming a resist layer overlying a substrate, exposing the resist layer to create an image of a feature, and developing the exposed resist layer to leave a portion of the resist layer that creates the image...

20060154185 - Method for forming a finely patterned resist: A method for reducing a critical dimension of a photoresist pattern while improving a line spacing between distal end portions of pattern lines wherein the method includes providing a substrate including an overlying resist; exposing the resist to an activating light source; baking the resist in a first baking process...

20060154186 - Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings: An aqueous-based composition and process for removing hardened photoresist and/or bottom anti-reflective coating (BARC) material from a substrate having same thereon. The aqueous-based composition includes at least one chaotropic solute, at least one alkaline base, and deionized water. The composition achieves high-efficiency removal of hardened photoresist and/or BARC material in...

20060154187 - Development of radiation-sensitive elements: An aqueous alkaline developer for use with an imaged lithographic printing precursor comprises an aqueous alkaline medium, sodium metasilicate, a steric or electrosteric stabilizer, and a rinse aid or a phase stabilizer. It is suited for developing a lithographic printing precursor comprising, on a substrate, a coated and dried layer...

20060154188 - Immersion fluid for use in liquid immersion lithography and method of forming resist pattern using the immersion fluid: An immersion fluid for use in liquid immersion lithography in which a resist film is exposed to light via a fluid. The fluid is transparent to the exposure light used in the liquid immersion lithography and comprises a fluorine-based liquid having a boiling point of 70 to 270° C. A...

20060147810 - Holographic optical elements, devices and methods: Holographic optical elements, devices and methods are disclosed. The holographic optical elements include calamitic materials. This is advantageous because the holographic medium in which the holographic image is formed is latent or very nearly latent, has little or no Rayleigh scattering, has high refractive index contrast, and is fabricated with...

20060147811 - Method and apparatus for writing grating structures using controlled phase delay between beams: A method of writing a grating structure with at least one of predetermined amplitude, period and phase properties in a photosensitive waveguide, the method comprising providing at least two light beams which overlap in an overlap region to form an interference pattern; moving the photosensitive waveguide through the overlap region;...

20060147813 - Mask and method to pattern chromeless phase lithography contact hole: A chromeless phase shift mask and Method for making and using. The A chromeless phase shift mask is used to pattern contact holes. The chromeless phase shift mask preferably comprises: a first phase shift region and a second phase shfit region; the first region is comprised of a unit cell...

20060147815 - Method and apparatus for placing assist features: One embodiment of the present invention provides a system that determines a location in a layout to place an assist feature. During operation, the system receives a layout of an integrated circuit. Next, the system selects an evaluation point in the layout. The system then chooses a candidate location in...

20060147812 - Method and system for measuring critical dimensions of a mask design pattern: The present invention provides a method and a system for measuring critical dimensions of a mask design pattern. The method includes: setting up a server comprising a measure system; establishing a connection between the server and a remote terminal through the Internet; and utilizing the remote terminal to login the...

20060147818 - Method of correcting deviations of critical dimensions of patterns formed on a wafer in a euvl process: An embodiment includes a method of correcting deviations of critical dimensions of patterns formed on a wafer in an extreme ultraviolet lithography (EUVL) process. The embodiment includes preparing a reflection photo mask having a reflection layer and absorption patterns that are formed on the reflection layer to define reflection regions...

20060147819 - Method of fabricating chrome-less phase shift mask: An embodiment of a method of fabricating a chrome-less phase shift mask includes forming a hard mask film on a surface of a mask body having a trench circuit area and a mesa circuit area. The hard mask film is patterned. The mask body is anisotropically etched using the hard...

20060147814 - Methods for repairing an alternating phase-shift mask: Methods to repair an APSM mask having undercut etch are described. An absorbing layer over a defect on the plate and a first portion of a defect on the plate are removed using a tip of an atomic force microscope. A second portion of the defect is removed using an...

20060147816 - Multi-transmission phase mask and method for manufacturing the same: A multi-transmission phase mask, and a method of manufacturing a multi-transmission phase mask are disclosed. The method comprises the steps of primarily patterning a light shielding layer after forming the light shielding layer on a light transmissive substrate, forming a plurality of pattern regions of a semiconductor by etching the...

20060147817 - Photomask and manufacturing method thereof, fabrication process of an electron device: A photomask made by using a negative photoresist includes a transparent substrate defined with a device chip area, an opaque device pattern formed on the transparent substrate in the device chip area, and a dummy opaque pattern provided on the transparent substrate outside of the device chip area....

20060147820 - Phase contrast alignment method and apparatus for nano imprint lithography: An apparatus (and method) for forming a pattern on a workpiece, includes an optical phase contrast image sensor, and an imprint lithography system coupled to the optical phase contrast image sensor for laterally aligning an imprint template feature relative to the workpiece....

20060147822 - Appartus and method for forming pattern: A pattern forming apparatus includes a drawing chamber having a drawing substrate on which an original pattern is drawn, a first temperature control unit having a first temperature regulator to make the temperature of the drawing chamber constant, and a constant-temperature member arranged near the drawing substrate. The pattern forming...

20060147821 - Lithographic apparatus and device manufacturing method: A method for correcting an exposure parameter of an immersion lithographic apparatus is provided. In the method, an exposure parameter is measured using a measuring beam projected through a liquid between the projection system and a substrate table of the immersion lithographic apparatus and offset is determined based on a...

20060147823 - Electrophotographic photoreceptor and charge-transporting material for electrophotographic photoreceptor: A charge transporting material for use in an electrophotographic photoreceptor, which comprises a compound represented by the formula (1); and an electrophotographic photoreceptor using this charge transporting material. As the electrophotographic photoreceptor using the charge transporting material, there are illustrated, for example, a lamination type photoreceptor having a charge generating...

20060147825 - Electrophotographic photoreceptor containing naphthalenetetracarboxylic acid diimide derivatives and electrophotographic imaging apparatus employing the photoreceptor: An electrophotographic photoreceptor is provided containing a specific asymmetric naphthalenetetracarboxylic acid diimide derivative having a nitro group. An electrophotographic imaging apparatus, an electrophotographic cartridge, and an electrophotographic drum employing the electrophotographic photoreceptor are also provided. The naphthalenetetracarboxylic acid diimide derivative has high solubility in an organic solvent, compatibility with a...

20060147824 - Lathe surface for coating streak suppression: A photoreceptor aluminum alloy substrate is prepared with specific roughness characteristics and an oxide layer for use in multi-layered electrophotographic photoreceptor. A photoreceptor substrate, or drum, is placed in a lathe and turned using a polycrystalline tool to achieve specific roughness characteristics. A oxide layer is then allowed to form...

20060147826 - Undercoat layer and method of forming the same and photoconductor comprising undercoat layer: An undercoat layer for photoconductor. The undercoat layer includes a resin and a plurality of powders dispersed therein. The powders include a first powder and at least one of a second and a third powders. The first powder is an inorganic powder covered by a conductive layer, the second powder...

20060147827 - Organophotoreceptor with charge transport compound having an epoxy group: where X is a divalent hydrocarbon group of 1 to 30 carbon atoms, or a divalent hydrocarbon group of 1 to 30 carbon atoms where there is at least one substitution of a carbon atom by a heteroatom provided that no two heteroatoms may be adjacent within the backbone of...

20060147828 - Toner, process for producing the same, two-component developing agent and method of image formation: Toner includes aggregated particles including at least resin particles, pigment particles, and wax particles. A fused film of the resin is formed on the surface of the toner. The wax is at least one selected from A: ester wax that has an iodine value of not more than 25, a...

20060147829 - Method for forming coating material and the material formed thereby: A method for forming a coating material capable of forming a hydrophobic, microstructured surface. The method comprises treating micro or nano-particles particles with a hydrophobic agent and an additive to form larger particles with the hydrophobic agent bonded thereto. The invention also comprises the coating material thus formed....

20060147830 - Electrophotographic toner containing polyalkylene wax or high crystallinity wax: Toner particles having at least one toner resin and at least one polyalkylene wax or a wax having a percent crystallinity of 80% or more are described. The wax that is present in the toner particles has a polydispersity of 2.0 or higher or a percent crystallinity of 80% or...

20060147831 - Two-component developer for electrophotography and developing method using same: A two-components developer for electrophotography comprises a toner containing at least cyclo-olefin copolymer resin as a binder resin and magnetic material dispersed resin carrier. It is desirable that the Vickers hardness of the toner be in a range from 19.0HV0.01 to 23.0HV0.01, and that the binder resin contain the cyclo-olefin...

20060147835 - Chemically amplified photoresists and related methods: A chemically-amplified photoresist composition includes a polymer resin, a photo acid generator (PAG), and a thermal acid generator (TAG), where a thermal deprotection temperature of the polymer resin is greater than an acid generation temperature of the TAG. The photoresist composition may be utilized in a photolithography process which includes...

20060147833 - Color forming compositions with improved marking sensitivity and image contrast and associated methods: Compositions and methods for production of color images which are developable with improved marking sensitivity and image contrast are disclosed and described. Specifically, a color forming composition can comprise a polymeric activator phase including a polymer matrix and an activator dissolved therein, a color former phase including a color former,...

20060147838 - Negative-working photosensitive resin composition and photosensitive resin plate using the same: in a range of 3.5 wt % or less based on the weight of the photosensitive resin composition. A photosensitive resin plate using the photosensitive resin composition is also disclosed. By this invention, a negative-working photosensitive resin composition particularly excellent in the reproducibility of the highlight areas and the independent...

20060147839 - Photosensitive coating material for a substrate: A radiation-sensitive coating material, in addition to a base polymer, has a solvent and a radiation-active substance which forms an acid on irradiation by light (including energetic electrons or ions), a fluorescent substance which alters its fluorescence property subject to a change in the acid content of its surroundings. In...

20060147832 - Polymer and positive type resist composition: r

20060147837 - Resist composition: The resist composition of the present invention, ensuring excellent pattern profile and excellent isolation performance for use in the pattern formation by the irradiation of actinic rays or radiation, particularly, electron beam, X ray or EUV light, which comprising (A) a compound having a specific partial structure and a counter...

20060147836 - Resist composition and patterning process using the same: There is disclosed a resist composition which comprises, at least, a polymer in which a sulfonium salt having a polymerizable unsaturated bond, a (meth)acrylate having a lactone or a hydroxyl group as an adhesion group, and a (meth)acrylate having an ester substituted with an acid labile group are copolymerized. There...

20060147834 - Water-soluble composition for coating photoresist pattern and method for forming fine patterns using the same: wherein R1 and R2 are individually selected from the group consisting of H, linear or branched C1-C20 alkyl, linear or branched C2-C20 alkyl containing an ester linkage, linear or branched C2-C20 alkyl containing a ketone linkage, linear or branched C2-C20 alkyl containing a carboxylic acid group, linear or branched C7-C20...

20060147840 - Photopolymerizable composition, light sensitive planographic printing plate material and manufacturing method of planographic printing plate: Disclosed is a photopolymerizable composition containing an addition-polymerizable ethylenically unsaturated compound, a photopolymerization initiator, a polymer binder, and a sensitizing dye represented by the following formula (A),...

20060147842 - Laser-markable compositions: A laser-markable composition comprises a binder and an oxyanion of a multivalent metal....

20060147841 - Pattern plotting device and pattern plotting method: In a pattern writing method for writing a pattern on a substrate by the use of projection patterns output from a mirror device including two-dimensionally arranged micromirrors, exposure is implemented by ON/OFF controlling each micromirror and partly overlapping the projection patterns from the mirror device at least in a one-dimensional...

20060147843 - Fabrication process for ultra high density optical disc: A method for fabricating ultra high density optical discs is disclosed, which comprises the steps of: (a) providing a substrate; (b) coating a photoresist on the substrate; (c) forming patterns on the photoresist by irradiating the same with a light source; (d) developing the photoresist for enabling the photoresist with...

20060147844 - Mask, substrate with light reflective film, method for manufacturing light reflective film, liquid crystal display device, and electronic apparatus: A substrate is provided with a light reflective film including a base and a reflective layer, in which a plurality of concave portions or convex portions formed on the surface of the base are randomly arranged in the plane direction in 100 to 2,000 RGB dot units or a whole...

20060147845 - Electrically reconfigurable photolithography mask for semiconductor and micromechanical substrates: A mask useful for photolithography that can be electronically reconfigured is described. In one embodiment, a photolithography system has an illumination system, a reticle scanning stage, a wafer scanning stage, and a reticle mounted to the reticle scanning stage, the reticle having an electronically reconfigurable mask....

20060147846 - Method of forming photoresist pattern and semiconductor device employing the same: A method of forming a photoresist pattern includes forming a material layer on a substrate, coating a photoresist on the material layer, and forming photoresist patterns by performing at least two times a process of exposing and developing the coated photoresist. A semiconductor device includes a material layer formed on...

20060147847 - Antimicrobial compositions and methods: wherein X is a latent reactive group, Y is a polymeric backbone, and Z is a melamine group. In some aspects of the above formula, a is in the range of 0.5 to 90 mole percent, and b is in the range of 10 to 99.5 mole percent. The latent...

20060147848 - Method of patterning catalyst layer for synthesis of carbon nanotubes and method of fabricating field emission device using the method: A method of patterning a catalyst layer for synthesis of carbon nanotubes (CNTs) and a method of fabricating a field emission device (FED) using the method, whereby a catalyst layer formed of metal salt having a weak-acid negative ion group is formed on a substrate, a photoresist is formed on...

20060147849 - Method of preventing pinhole defects through co-polymerization: A method is provided for forming a stable thin film on a substrate. The method includes depositing a co-polymer composition having a first component and a second component onto a substrate to form a stable film having a first thickness. The first component has first dielectric properties not enabling the...

20060147850 - Plane waves to control critical dimension: The present invention describes an aperture including: an opaque plate; two sliver openings located in the opaque plate, the two sliver openings having rectangular shapes, the two sliver openings being parallel to each other. The present invention further describes a method including: decomposing a pattern into horizontal sub-features and vertical...

20060147851 - Silver halide color photosensitive material: A silver halide color photosensitive material comprising at least one silver halide emulsion layer on a support, wherein an ion complex compound formed by below-mentioned compound (A) and below-mentioned compound (B) is contained in the silver halide color photosensitive material, compound (A) being a heterocyclic compound which when added, is...

20060147852 - Photothermographic material: A photothermographic material including, on a support, a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent and a binder, wherein the photothermographic material contains a compound having a group adsorptive to silver halide and a reducible group or a precursor of the compound, and satisfies one of...