Radiation imagery chemistry: process, composition, or product thereof inventions 06/06

20060141365 - Designing method and device for phase shift mask: A planar pattern (11), having a plurality of apertures of the same size (Wx×Wy), is determined by a two-dimensional layout determination tool (10), and a three-dimensional structure, having a depth d and an undercut amount Uc for making the phase of the transmitted light be shifted by 180 degrees with...

20060141367 - Lithographic apparatus, device manufacturing method, and optical component: An optical component for use in a lithographic apparatus. The optical component includes an optical element having an optical surface for reflecting electromagnetic radiation, and a protective zone covering the optical surface. The protective zone is provided with a material that substantially protects the optical surface against sputtering when the...

20060141372 - Mask pattern and method for forming resist pattern using mask pattern thereof: A mask pattern for multiple exposure for forming a resist pattern with an unvarying pattern pitch on a semiconductor wafer, which is utilized as in case where a mask pattern under a design having the width of an aperture pattern smaller than the width of a light-shielding pattern is used...

20060141366 - Method and system for optimization of transistor sizing based on layout density: A method (300) for generating an optical proximity correction model for a mask layout having an asymmetric feature structure includes fabricating a mask (310) having a plurality of symmetric and asymmetric test structures thereon, and image processing one or more semiconductor wafers (320) using the fabricated mask to create a...

20060141369 - Method for correcting pattern data and method for manufacturing semiconductor device using same: A method for correcting pattern data is provided which is capable of making a proper correction to data of a pattern having a complicated layout. A correction is made to pattern data affected by a proximity effect when a pattern is formed on a phtomask or wafer according to design...

20060141368 - Method for detecting failure of database patterns of photo mask: A method for detecting failure of database patterns of a photo mask including designing the database patterns of the photo mask according to a design rule of a semiconductor element; performing optical proximity correction (OPC) of the designed database patterns; and detecting failure of the database patterns by obtaining a...

20060141371 - Method for making a photomask assembly incorporating a porous frame: A photomask assembly is described having a frame for supporting a transparent pellicle above a photomask substrate, defining a closed pellicle space overlaying the substrate. The frame is formed of a porous material configured to allow the pellicle space to be purged with an inert gas within a reasonable processing...

20060141370 - Photomasks and methods of manufacturing the same: A photomask may include a reflection layer including a material capable of reflecting electromagnetic radiation, and at least one ion region. The ion region may be formed by implanting ions of an absorbent capable of absorbing electromagnetic radiation. The reflection layer may have a stack structure including a plurality of...

20060141373 - Lithographic apparatus and device manufacturing method: A system and method use a substrate with a pattern of individual, indiscrete alignment marks, i.e., the marks are separate and distinct from each other, and each mark is not divided into component parts. The pattern of marks is distributed over an area of the substrate, and the method also...

20060141374 - Lithographic apparatus with multiple alignment arrangements and alignment measuring method: A lithographic apparatus has a plurality of different alignment arrangements that are used to perform an alignment measurement on the same mark(s) by: detecting a first alignment mark located on an object and producing a first alignment signal by a first detector; detecting the first mark and producing a second...

20060141375 - Exposure apparatus, a tilting device method for performing a tilted focus test, and a device manufactured accordingly: The present invention relates to an exposure apparatus that includes an illumination system for providing a projection beam of radiation, a support structure for supporting a device provided with a pattern, the device serving to impart the projection beam with a pattern in its cross-section; a table for holding a...

20060141376 - Methods and systems for controlling variation in dimensions of patterned features across a wafer: Methods and systems for controlling variation in dimensions of patterned features across a wafer are provided. One method includes measuring a characteristic of a latent image formed in a resist at more than one location across a wafer during a lithography process. The method also includes altering a parameter of...

20060141377 - Electrophotographic photoreceptor and image forming apparatus: t

20060141378 - Electrophotographic photoreceptor, image forming method, image forming apparatus and process cartridge for the image forming apparatus: A photoreceptor is provided having an electroconductive substrate and a photosensitive layer located overlying the electroconductive substrate, wherein an outermost layer of the photoreceptor contains a binder resin, wherein the binder resin solution satisfies the following relationship 2>(T0-T400)/C wherein T0 represents a initial transmittance (%) at 400 nm of the...

20060141379 - Magnetic toner and image forming method using the same: Magnetic toner involves magnetic powder 1 having the particle shape of an octahedron2 that is a convex polyhedron surrounded by eight triangles as a basis, each of the vertexes and edges of the octahedron being in a curved surface shape, and having a portion 3 that can be taken as...

20060141380 - Toner: To provide a toner which allows low temperature fixation irrespective of the configuration of a fuser, which is excellent in offset resistance, and which provides high image quality at high and low humidities in a stable manner without causing any image defect over time. A toner containing: a binder resin...

20060141386 - Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal: A chemically amplified positive photoresist composition for thick film that is used for forming a thick-film photoresist layer with a film thickness of 10 to 150 μm on top of a support, comprising (A) a compound that generates acid on irradiation with active light or radiation, (B) a resin that...

20060141387 - Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal: A chemically amplified positive photoresist composition for thick film that is used for forming a thick-film photoresist layer with a film thickness of 10 to 150 μm on top of a support, comprising (A) a compound that generates acid on irradiation with active light or radiation, (B) a resin that...

20060141388 - Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal: A chemically amplified positive photoresist composition for thick film that is used for forming a thick-film photoresist layer with a film thickness of 10 to 150 μm on top of a support, including (A) a compound that generates acid on irradiation with active light or radiation, and (B) a resin...

20060141389 - Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal: A chemically amplified positive photoresist composition for thick film that is used for forming a thick-film photoresist layer with a film thickness of 10 to 150 μm on top of a support, including (A) a compound that generates acid on irradiation with active light or radiation, and (B) a resin...

20060141390 - Composition for coating a photoresist pattern: c

20060141391 - Laser marking of documents of value: Disclosed are laser markings on a document of value and methods of preparing the same which are based on the interaction of the laser radiation with the printing-ink employed....

20060141385 - Method for producing an exposed substrate: Method for producing an exposed substrate, which has at least two different image areas. The substrate is provided with at least two photoresist layers, which are adjusted to the type of image areas to be produced....

20060141394 - Photoresist formulation for high aspect ratio plating: SU-8 photoresist compositions are modified to improve their adhesion properties by adding 1% to 6% of an adhesion promoter selected from the group consisting of glycidoxypropanetrimethoxysilane, mercatopropyltrimethoxysilane, and aminopropyltrimethoxysilane. SU-8 photoresist compositions are modified to improve their resistance to cracking and film stress by adding 0.5% to 3% of a...

20060141381 - Photosensitive resin composition, and photosensitive element, method for forming resist pattern and printed wiring board using the composition: A photosensitive resin composition, characterized in comprising: (A) a polymer having a carbon hydrocarbon double bond and carboxyl group, formed by the reaction of an acid anhydride with the reaction product of an epoxy compound having a structure wherein a glycidyloxy group is bonded to a main chain comprising an...

20060141392 - Photosensitive resin composition, method for preparing the same, and dry film resist comprising the same: The present invention relates to a photosensitive resin composition, a preparation method thereof, and a dry film resist comprising the same. More particularly, the photosensitive resin composition of the present invention is directed to a photosensitive resin composition including a) an alkali-soluble acrylate resin, b) a cross-linking monomer having at...

20060141393 - Photosensitive resin composition, thin film panel made with photosensitive composition, and method for manufacturing thin film panel: e

20060141384 - Process for refining crude resin for electronic material: A process is provided for effectively removing by-products such as oligomers contained within a crude resin for an electronic material, thus producing a resin for an electronic material. In this process, a crude resin for an electronic material containing (a1) structural units derived from a (meth)acrylate ester with a hydrophilic...

20060141382 - Resist composition and method of forming resist pattern using same: There are provided a resist composition that produces a resist pattern of good shape, and a method of forming a resist pattern that uses such a resist composition. The resist composition comprises a resin component (A) that undergoes a change in alkali solubility under the action of acid, an acid...

20060141383 - Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions: e

20060141395 - Metal complexes as light-absorbing compounds in the information layer of optical data carriers: Novel metal complexes for optical data carriers which comprise a preferably transparent substrate which may, if desired, have preivously been coated with one or more reflection layers and to whose surface a light-writable information layer, if desired one or more reflection layers and if desired a protective layer or a...

20060141396 - Electron beam lithography method using new material: An electron beam (EB) lithography method using a new material is provided. The method includes forming a thin layer using a Pb-based material; and patterning the thin layer by partially volatilizing the thin layer by irradiating electron beams. In this method, the thin layer formed of the Pb-based material is...

20060141397 - Resist exposure system and method of forming a pattern on a resist: A resist exposure system and a method of forming a pattern on a resist are provided and include an exposure source, a photoresist composition, and a mask positioned therebetween. The resist composition comprises a first photoresist X and a second photoresist Y. The first photoresist X absorbs at a higher...

20060141398 - Method of producing semiconductor device: A method of producing a semiconductor device is disclosed, in which a through hole is formed in the upper surface of a semiconductor substrate from the lower surface thereof, and an opening of a desired size is formed in a desired position on the upper surface of the substrate. A...

20060141399 - Supercritical developing for a lithographic process: A method of creating a resist image on a semiconductor substrate includes exposing a layer of photoresist on the semiconductor substrate and developing the exposed layer of photoresist using a first fluid including supercritical carbon dioxide and a base such as Tetra-Methyl Ammonium Hydroxide (TMAH). Additionally, the developed photoresist can...

20060141400 - Immersion exposure process-use resist protection film forming material, composite film, and resist pattern forming method: Provided are a material for forming a resist protecting film which is for use in a liquid immersion lithography process and which is formed on a resist film, wherein the material has the following properties of: being transparent with respect to exposure light; having substantially no compatibility with a liquid...

20060141401 - Silver halide color photosensitive material: A silver halide color photosensitive material comprising a support and, superimposed thereon, a blue-sensitive layer unit, a green-sensitive layer unit and a red-sensitive layer unit, each of these light-sensitive layer units composed of at least one silver halide emulsion layer, together with at least one non-sensitive layer, wherein compound (A)...

20060141402 - Aqueous-based photothermographic materials containing tetrafluoroborate salts: Black-and-white, aqueous-based, silver halide-containing photothermographic materials have increased stability both prior to use and after imaging with the incorporation of at least 0.005 g/m2 of a tetrafluoroborate salt....

20060141403 - Blocked aliphatic thiol stabilizers for photothermographic materials: Photothermographic materials contain one or more blocked aliphatic thiol compounds in an amount of at least 1 mg/m2 as stabilizers. These compounds have a calculated octanol-water partition coefficient (c log P value) of 2.0 or greater, and an N value equal to or greater than 6.5....

20060141404 - Boron compounds as stabilizers in photothermographic materials: Thermally developable materials such as photothermographic and thermographic materials contain one or more boron compounds in an amount of at least 0.001 g/m2 as stabilizers. These boron compounds have an X—B(OL)-Z moiety....

20060141405 - Photothermographic material: A photothermographic material including, on at least one side of a support, an image forming layer including at least a photosensitive silver halide, a first non-photosensitive organic silver salt, a reducing agent, and a binder, and a non-photosensitive layer, wherein the non-photosensitive layer comprises a compound containing two or more...

20060141406 - Photothermographic material and manufacturing method: A photothermographic material containing an image forming layer having at least a photosensitive silver halide, a non-photosensitive organic silver salt, and a reducing agent for the organic silver salt on one side of a support, and a first non-photosensitive layer containing a dye fixing agent for a water-soluble dye, a...

20060134531 - Mask for electromagnetic radiation and method of fabricating the same: A mask for lithography and a method of manufacturing the same. The mask may include a substrate, a reflection layer formed of a material capable of reflecting electromagnetic rays on the substrate and an absorption pattern formed in a desired pattern such that absorbing regions with respect to electromagnetic rays...

20060134532 - Method for correcting mask pattern, photomask, method for fabricating photomask, electron beam writing method for fabricating photomask, exposure method, semiconductor device, and method for fabricating semiconductor device: A method is provided for correcting a mask pattern to be formed on a photomask used in a lithographic step of a semiconductor device fabrication process. The method includes the steps of extracting an isolated pattern having an optically isolated portion from the mask pattern and providing, in an adjacent...

20060134533 - Method of fabricating one-way transparent optical system: A method of fabricating a one-way transparent optical system by which external light is effectively intercepted and internal light passes nearly without loss is provided. The method includes: forming a silver halide on a transparent substrate; aligning a mask in which a predetermined pattern is formed, on the transparent substrate...

20060134530 - Multi-transmission phase mask and exposure method using the same: A multi-transmission phase mask, and an exposure method using the same are disclosed. The mask comprises a transparent substrate, a light shielding film formed on the transparent substrate and defining a light transmission region and a light shielding region, and a phase inversion region formed on a predetermined portion of...

20060134529 - Optimization to avoid sidelobe printing: A method for configuring the optical transfer of a mask pattern onto a substrate using a lithographic apparatus is presented. In an embodiment of the invention, the method includes calculating a size of a printed sidelobe to be generated as a result of optical transfer of the mask pattern onto...

20060134534 - Photomask and method for maintaining optical properties of the same: A photomask and method for maintaining optical properties of the same are disclosed. The method includes providing a substrate including a first surface having an absorber layer formed thereon and a second surface located opposite the first surface. A pattern is formed in the absorber layer to create a photomask...

20060134535 - Lensed fiber array for sub-micron optical lithography patterning: In accordance with various embodiments, there is an exposure system for writing a pattern on a photosensitive material. The exposure system can include a waveguide array and a light modulator. The waveguide array can include a plurality of optical fibers that focuses light on the radiation sensitive material. The light...

20060134536 - Method and system for determining post exposure bake endpoint: A method of detecting post exposure bake endpoint during processing of a semiconductor substrate. The method includes providing a radiation source coupled to a post exposure bake station and providing a radiation detector coupled to the post exposure bake station. The method also includes directing a radiation signal generated by...

20060134538 - Aromatic chalcogen compounds and their use: This invention relates to dibenzothiophene, dibenzofuran, dibenzopyran, and dibenzothiapyran compounds. This invention also relates to layers and devices including at least one of the above compounds....

20060134537 - Increased silicon microspheres in charge transfer layers: A photoconductor having silicone microspheres in its outer, charge transport layer that are at least about 10 percent by weight of the layer and of diameter of about 3 to 6 microns, the amount larger than the typical 3 percent by weight of the microspheres displacing binder, not charge transfer...

20060134539 - Charge-transfer material and process for producing the same, electron-transfer agent, photoreceptor for electrophotography and organic electroluminescence element using said charge-transfer material: wherein R1 through R4 are each independently selected from the group consisting of hydrogen, cyano, nitro, halogen, hydroxyl, alkyl, aryl, heterocyclic ring, ester, alkoxy, aralkyl, allyl, amide, amino, acyl, alkenyl, alkynyl, carboxyl, carbonyl, and carboxylic acid; X is selected from the group consisting of oxygen, sulfur, and ═C(CN)2; and W...

20060134540 - Coating liquid and electrophotographic photoreceptor prepared using the coating liquid: A coating liquid including an N-alkoxymethylated nylon and a solvent, wherein the N-alkoxymethylated nylon includes one or more ions in an amount of from 200 to 500 ppm based on a weight of the N-alkoxymethylated nylon or one or more alkylamines in an amount of from 15 to 100 ppm...

20060134541 - Electrophotographic photoreceptor: A subject for the invention is to provide an electrophotographic photoreceptor which has high durability in exposure to ozone, NOx, etc., is excellent in mechanical properties including printing durability, wearing resistance, scratch resistance, and slip properties in repetitions of use, and further has excellent electrophotographic properties. The invention relates to...

20060134542 - Magnetic black toner for electrophotography, magnetic two-component developer for electrophotography containing the same, image forming apparatus, and image forming method: A magnetic black toner for electrophotography comprising a binding resin, a magnetic substance, and a pigment, wherein the pigment is at least one of phthalocyanine pigment and Mn containing hematite, and the content ratio of the magnetic substance and the pigment in the toner satisfy the following formulae: 10≦A≦30, 0.1≦B≦3,...

20060134543 - Toner, image forming method and process-cartridge: A toner formed of at least a binder resin, a colorant, a charge control agent and a wax, is provided with a uniform state of dispersion of the wax and good balance of low-temperature fixability and anti-high-temperature offset characteristic, while exhibiting good developing performances over wide environmental conditions. The toner...

20060134544 - Radiographic image conversion panel, method for manufacturing the same, method for forming phosphor particle, method for forming photostimulable phosphor precursor, phosphor precursor and photostimulable phosphor: A radiographic image conversion panel includes: a support; and at least one photostimulable phosphor layer provided on the support, wherein at least one layer of the photostimulable phosphor layers contains a photostimulable phosphor using an alkali halide represented by a general formula....

20060134550 - Light sensitive planographic printing plate precursor and its processing method: Disclosed are a light sensitive planographic printing plate precursor and its processing method, the precursor comprising a hydrophilic support and provided thereon, a photopolymerizable light sensitive layer containing a compound represented by the following formula (1) or (2) and a compound represented by the following formula (3) or (4):...

20060134551 - Lithium salt of polyacetylene as radiation sensitive filaments and preparation and use thereof: This invention relates to photochromic filaments composed of the lithium salt of a conjugated, polymerizable polyacetylene having a carboxylic acid or carboxylate terminal group wherein the length to width ratio of said filaments is between about 5000:1 and about 5:1 and the average length of the filament is up to...

20060134546 - Low refractive index polymers as underlayers for silicon-containing photoresists: where each R1 is independently selected from an organic moiety or a halogen; each A is independently a single bond or an organic moiety; R2 is hydrogen or a methyl group; and each X, Y and Z is an integer of 0 to 7, and Y+Z is 7 or less....

20060134547 - Low refractive index polymers as underlayers for silicon-containing photoresists: where each R1 is independently selected from an organic moiety or a halogen; each A is independently a single bond or an organic moiety; R2 is hydrogen or a methyl group; and each X, Y and Z is an integer of 0 to 7, and Y+Z is 7 or less....

20060134545 - Negative resist composition and process for formation of resist patterns: wherein, R1 and R2 represent alkyl chains having 0 to 8 carbon atoms, R3 represents a substituent having at least two or more alicyclic structures, and R4 and R5 represent hydrogen atoms or alkyl groups having 1 to 8 carbon atoms. A method for forming a resist pattern uses the...

20060134549 - Photosensitive polymer, photoresist composition including the photosensitive polymer and method of forming a photoresist pattern using the photoresist composition: wherein R1 represents hydrogen or an alkyl group having 1 to 10 carbon atoms, R2 represents an acid-labile hydrocarbon group having 3 to 12 carbon atoms, and n represents an integer greater than or equal to 1. The photoresist composition having good reproducibility and stability may form a photoresist film...

20060134548 - Planographic printing plate precursor, substrate for the same and surface hydrophilic material: A planographic printing plate precursor comprises a substrate having disposed thereon a hydrophilic layer which includes hydrophilic graft chains and a crosslinked structure formed through hydrolytic polycondensation of an alkoxide of an element selected from Si, Ti, Zr and Al. An aluminum substrate for a planographic printing plate includes a...

20060134552 - Positive type resist composition and resist pattern formation method using same: There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali...

20060134553 - Positive type resist composition and resist pattern formation method using same: There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali...

20060134554 - Radiationhardenable printing media, transfer pictures produced therewith, and method for producing ceramic decorations: The invention relates to a radiation-curable printing medium based on a thermoplastic polymer and at least one radiation-curable monomeric compound. By means of a compound which comprises a heterocyclic ring, it is possible to achieve a favourable combination of properties comprising reactivity and flexibility of the decoration. Preferred monomeric compounds...

20060134557 - Method and apparatus for thermal development having a textured support: The invention is a method and apparatus for forming a relief structure by thermally developing a photosensitive element containing a composition layer capable of being partially liquefied. During thermal development, the photosensitive element is supported on a base member having an exterior surface that is textured. The textures for the...

20060134556 - Methods and compositions for forming aperiodic patterned copolymer films: The present invention provides improved and compositions methods for replicating substrate patterns including patterns containing irregular features. The methods of the invention involve depositing block copolymer materials on a patterned substrate and ordering components in the material to replicate the pattern. In some embodiments, ordering is facilitated through the use...

20060134555 - Monolithic inkjet printhead and method of manufacturing the same: A method of manufacturing an inkjet printhead includes forming a first photoresist layer on a substrate having ink ejection devices disposed thereon by coating the substrate with a first negative photoresist, exposing the first photoresist layer through a first photomask formed that defines a pattern of ink chambers, forming a...

20060134558 - Polymer for forming anti-reflective coating layer: m

20060134559 - Method for forming patterns on a semiconductor device: A method for fabricating patterns of a semiconductor device to obtain the minute line width and to improve the characteristics of a device includes coating a first photoresist on a wafer, coating a second photoresist on the first photoresist, selectively exposing the second photoresist to light having a first wavelength,...

20060134560 - Method for fabricating semiconductor device: A method for fabricating a semiconductor device is provided. The method includes: preparing a substrate defined as active regions and inactive regions and provided with a plurality of conductive patterns; forming a buffer layer over the plurality of conductive patterns; forming an organic material having fluidity better than that of...

20060134561 - Electroplated three dimensional ink jet manifold and nozzle structures using successive lithography and electroplated sacrificial layers: Mechanical and/or structural devices are formed using electroplating techniques in conjunction with sacrifical materials that can also be formed using electroplated techniques. This can produce devices that are attached at only selected points to a substrate and/or structures having enclosed cavities on or above a working substrate. A particularly relevant...

20060134563 - Method for manufacturing semiconductor device: The present invention provides a method for manufacturing a semiconductor device, which includes a resist deposition step for forming a resist film on the surface of a semiconductor substrate provided with a plurality of chips disposed in matrix form, an exposure step for sequentially exposing chip patterns with respect to...

20060134562 - Method of forming micro-pattern: A method of forming a micro pattern. The method comprises the following steps: providing a substrate; forming a first micro-fluid layer of photo resistant material on the substrate; providing a first photo mask; and exposing the first micro-fluid layer to light via the first photo mask to form a micro...

20060134564 - Reflective display based on liquid crystal materials: The present invention relates to a high contrast reflective display comprising at least one substrate, at least one electrically conductive layer and at least one close-packed, ordered monolayer of domains of electrically modulated material in a fixed, preferably crosslinked, polymer matrix and a method of making the same....

20060134565 - Method of exposure for lithography process and mask therefor: An improved photolithography method and mask are disclosed. The method exposes a substrate coated with a photosensitive material using a first mask. The photosensitive material after said first exposure includes one or more under-exposed or incompletely exposed portions or one or more portions prone to peeling. The under-exposed or incompletely...

20060134566 - Silver halide photographic light-sensitive material: A silver halide photographic light-sensitive material comprising at least one compound (A), wherein the at least one compound (A) is a compound capable of releasing a sensitizing compound that increases a sensitivity of the silver halide photographic light-sensitive material in comparison with a case where a silver halide photographic light-sensitive...

20060134567 - Heat-developable photosensitive material and heat-developing method using the same: A heat-developable photosensitive material includes at least a photosensitive silver halide particle, a nonphotonsensitive organic silver salt, a developing accelerator, a reducing agent and a binder on a support, wherein the photosensitive silver halide includes silver iodide at 5 mold to 100 mold and the average particle size of the...

20060127780 - Forming a capping layer for a euv mask and structures formed thereby: Methods of forming a microelectronic structure are described. Embodiments of those methods include providing a substrate comprising a first reflective layer disposed on a second reflective layer, wherein the thickness of the first reflective layer and the thickness of the second reflective layer are less than about 100 angstroms, and...

20060127779 - Ultra-thin high-precision glass optic and method of manufacturing same: The present invention provides an ultra-thin high-precision glass optic and method of manufacturing the same. The optic has an axial thickness that is less than 1,000 microns. A pattern and/or coating is disposed on a surface of the optic to provide attenuation of light in an optical system. In an...

20060127781 - Imaging member: A process for preparing a charge generating layer comprising dispersing photoconductive phthalocyanine particles in a polymer matrix, the matrix comprising a polymeric film-forming reaction product of vinyl chloride, vinyl acetate, maleic acid, and hydroxyalkyl acrylate, in a solution of n-butyl acetate and methyl isobutyl ketone. An electrophotographic imaging member is...

20060127782 - Electrophotographic photoreceptor, electrophotographic image forming method, electrophotographic image forming apparatus, and processing cartridge: wherein the support has on a surface of the support crystallizing material particles having a diameter of 0.3-10 μm in an amount of being 0.5-20 per (20 μm)2, the inorganic particles have a number average primary particle diameter of 5-300 nm, the intermediate layer is an insulating layer and covered...

20060127783 - Process for producing negative charging electrophotographic photosensive member, negative charging electrophotographic photosensitive member, and electrophotographic apparatus using same: The invention provides a process for producing a negative-charging electrophotographic photosensitive member which can improve the adherence between a first layer and a second layer without lowering the effect of lessening image defects and realize a reduction in overall costs, a negative-charging electrophotographic photosensitive member produced by the process, and...

20060127784 - Producing partially translucent packaging materials: Producing at least partially translucent packaging materials that contain natural dyes or pseudo-natural dyes, chlorophyll in particular. Natural dyes or pseudo-natural dyes are added to a toner and are applied to the packaging material in a printing step, preferably in an electrophotographic printing machine....

20060127785 - Developing agent: A developing agent comprising color toners and a cyan toner, the color toners including a yellow toner, a magenta toner, and a black toner, wherein the black toner comprises a binder resin containing a crystalline polyester resin, and the yellow toner, the magenta toner and the cyan toner each comprise...

20060127786 - Toner for developing electrostatic images: To provide a toner for developing electrostatic images which is not easily cause the phenomenon of toner-spent, constituent materials are so selected that a charge control resin has hardness which is the same as the hardness of a binder resin or the charge control resin is harder than the binder...

20060127787 - Color toner having low contamination of charging elements: The present invention relates to a non-magnetic mono-component toner comprising a toner mother particle, and a coating layer formed on the mother particle where the coating layer comprises fatty acid metal salt having average particle size of 0.05 to 3.0 μm, a first organic particle having average particle size of...

20060127789 - Binding resin for toner, toner and electrophotographic apparatus: In an electrophotographic apparatus, which forms a color image by transferring a plurality of toner images having different colors onto an image-receiving sheet so as to be stacked and fixed thereon, even in the case of carrying out an oil-less fixing process and allowing the process speed to vary within...

20060127788 - Toner for electrophotography, method of manufacturing the toner, developer, development method, transfer method, and process cartridge using the toner: The method of manufacturing toner for electrophotography includes the steps of dissolving or dispersing a toner composition containing a resin and a coloring agent into polymerizable monomers to provide a solution or a dispersed system, emulsifying the solution or the dispersed system with a first surface active agent in an...

20060127790 - Particle dispersion for electrostatic image-developing toners, electrostatic image-developing toner, and method for producing the same: The invention provides a particle dispersion for an electrostatic image-developing toner containing either polycondensation resin particles, which are prepared by polycondensation of polycondensable monomers in an aqueous medium, or condensation compound particles, which are prepared by dehydration condensation of a condensable compound in an aqueous medium. The particles have a...

20060127793 - Carrier, two-component developer, and image forming method: In a carrier comprising carrier particles; each carrier particle comprising a carrier core and a coat layer for coating the carrier core, the carrier core has a ferrite component containing i) a metal oxide having at least one of metallic elements Mg, Li and Ca, the total-sum content of which...

20060127791 - Creation of different gloss values in print: The use of a clear toner with a viscosity in the range of 6.2 Pa·s to 1.5 Pa·s at a temperature of 120° C. for creating a higher gloss value in the range of 28 to 47 at an angle of 60°....

20060127792 - Toner particles for image forming apparatus: An image forming apparatus includes an image bearing body and a developing section. An electrostatic latent image is formed on the image bearing body. The developing section includes a developing member and a toner supplying member. The developing member is in contact with the image bearing body and applies toner...

20060127794 - Linked dihydrazone-based charge transport compounds: B is a second linking group having the formula -Q-Z-Q′-, where Q and Q′ are, independently, O, S, or NR1; wherein when Q or Q′ is NR1 or Q=O and Q′=S, Z comprises an aryl group, and wherein when Q=Q′=S or Q=Q′=O, Z comprises a multi-ring conjugated group or —Y—W—Y′—...

20060127795 - Method of coating a cylindrical photoconductive element for an electrophotographic image forming apparatus and apparatus for the same: A method of coating a photoconductive element for an electrophotographic image forming apparatus and an apparatus therefore are disclosed. A plurality of cylindrical bodies are immersed in a bath, which stores a coating liquid, at the same time and then lifted out of the bath. As a result, a photoconductive...

20060127796 - Method of forming electrophotographic photoreceptor and method of drying coating film: m

20060127797 - Method and materials for patterning of an amorphous, non-polymeric, organic matrix with electrically active material disposed therein: In one method of making an organic electroluminescent device, a transfer layer is solution coated on a donor substrate. The transfer layer includes an amorphous, non-polymeric, organic matrix with a light emitting material disposed in the matrix. The transfer layer is then selectively patterned on a receptor. Examples of patterning...

20060127800 - High sensitivity resist compositions for electron-based lithography: The resist compositions having an acid sensitive imaging polymer and a radiation sensitive acid generator component comprising: (i) a first radiation sensitive acid generator selected from the group consisting of dissolution-inhibiting acid generators, and (ii) a second radiation sensitive acid generator selected from the group consisting of unprotected acidic group-functionalized...

20060127805 - Kit for making relief images: A kit for making a relief image that includes a film made of an infrared-imageable material and a separate imageable article comprising a photosensitive material disposed on a substrate. The film may be used to form a mask image that is opaque to a curing radiation by exposing the infrared-imageable...

20060127799 - Method for forming resist pattern and resist pattern: A resist pattern forming method which can prevent a fine resist pattern from collapsing in a drying step after a development treatment in case of forming a resist pattern is provided. This method comprises applying a positive resist composition comprising a resin component (A), which has an alkali-soluble unit content...

20060127804 - Photoacid generating polymer, its preparation method and top anti-reflective coating composition comprising the same: wherein R1 is a C1-10 hydrocarbon or a C1-10 hydrocarbon in which the hydrogen atoms are wholly or partly replaced by fluorine atoms; R2 is hydrogen or a methyl group; and a, b, c and d represent the mole fraction of each monomer and are in the range between about...

20060127809 - Polymerizable composition and planographic printing plate precursor using the same: wherein Z− represents COCOO−, COO−, SO3−, or SO2—N−—R where R represents a monovalent organic group and M+represents an onium cation. The present invention also provides a negative type planographic printing plate precursor responsive to an infrared laser, the precursor being superior in recording sensitivity and printing durability and using the...

20060127806 - Positive type resist composition and resist pattern formation method using same: There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali...

20060127807 - Positive type resist composition and resist pattern formation method using same: There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali...

20060127808 - Positive type resist composition and resist pattern formation method using same: There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali...

20060127802 - Positive working thermal plates: The invention generally relates to positive-working coating compositions and to a substrate formed with a coating of that composition. Advantageous versions of the invention provide an infrared imageable, positive lithographic printing plate having a coating comprising a hydroxy substituted polymer, a diphenylcarbinol solubility suppressing compound and an infrared radiation absorbing...

20060127798 - Resist and method of forming resist pattern: The resist according to the present invention includes any one of tetrachloromethyl tetramethoxycalix [4] arene and trichloromethyl tetramethoxycalix [4] arene. The resist including such kind of components is soluble in the solvent having less effect to worsen a working environment, namely, ethyl lactate (EL), propylene glycol monomethyl ether (PGME), propylene...

20060127801 - Resist polymer and resist composition: The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam...

20060127803 - Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same: wherein R1 and R2 are independently, hydrogen, methyl or fluoromethyl; R3 and R4 are independently, a C1-10hydrocarbon or a C1-10 hydrocarbon in which the hydrogen atoms are wholly or partly replaced by fluorine atoms; and a, b, c, d and e represent the mole fraction of each monomer and are...

20060127810 - Lithographic printing plate precursor and method of producing printing plate: A lithographic printing plate precursor is provided and has a porous aluminum support, (1) a layer containing a water-soluble polymer resin having a hydrophilic substituent adsorbable to a surface of the porous aluminum support and a sulfonic acid, and (2) an image recording layer from which unexposed areas can be...

20060127811 - Lithographic apparatus and device manufacturing method: A device manufacturing method includes projecting a patterned beam of radiation through an optics compartment and a channel that provides an open connection between the optics compartment and a substrate compartment onto a substrate, maintaining an ionized flush gas at a higher pressure in the channel than in the substrate...

20060127812 - Barrier film material and pattern formation method using the same: A resist film is first formed on a substrate. Subsequently, a barrier film including a basic compound of, for example, dicyclohexylamine is formed on the resist film. Thereafter, with an immersion liquid including cesium sulfate provided on the barrier film, pattern exposure is carried out by selectively irradiating the resist...

20060127814 - Mandrel with controlled release layer for multi-layer electroformed ink-jet orifice plates: A system and method are provided for fabricating an orifice plate for use in an ink jet printing system. Initially, a substrate base is provided, and a controlled-release layer is applied to a surface of the substrate base. A conductive metal layer is adherently coated on the controlled-release layer. At...

20060127813 - Pattern forming method and method of manufacturing ink jet recording head: The present invention has as its object to provide a pattern forming method which, even if a pattern is formed by photolithography, can keep the edge of the opening portion of the pattern in a sharp state and yet, can make the wall surface of the recess of the pattern...

20060127816 - Double photolithography methods with reduced intermixing of solvents: The present invention provides a double photolithography method in which, after a first photoresist pattern including a crosslinkable agent is formed on a semiconductor substrate, a crosslinkage is formed in a molecular structure of the first photoresist pattern. A second photoresist film may be formed on a surface of the...

20060127815 - Pattern forming method and method of manufacturing semiconductor device: According to an aspect of the invention, there is provided a pattern forming method comprising forming a first resist film on a film to be worked formed on a semiconductor substrate, forming a second resist film on the first resist film, forming a resist pattern from the second resist film,...

20060127817 - In-line fabrication of curved surface transistors: A method for in-line fabrication of curved surface transistors (10) forms a flexible substrate (12) into a predetermined shape. A first passivation layer (14) is deposited. A first metal layer (16) in a first pattern is deposited. An insulator layer (18) in a second pattern is deposited. A first semiconductor...

20060127818 - Method for manufacturing high-transmittance optical filter for image display devices: A method for manufacturing a high-transmittance optical filter for image display devices, which may include the steps of coating a photocatalytic compound on a transparent substrate to form a photocatalytic film, selectively exposing the photocatalytic film to light and growing a metal crystal thereon by plating to form a metal...

20060127819 - Method for producing optical fiber: The method for processing an entrance face of an optical fiber, through which a light beam is to be introduced into the optical fiber. The method includes forming a negative photoresist layer on the entrance and selectively exposing the photoresist layer located substantially above a core of the optical fiber...

20060127820 - Method for forming photoresist pattern and method for triming photoresist pattern: A method for forming a photoresist pattern is described. A photoresist layer is first formed over a substrate, and then an exposure process and a development process are performed to pattern the photoresist layer so as to form a patterned photoresist layer. Next, a multiple-trimming process is performed to trim...

20060127821 - Method of forming a photoresist pattern: A method is provided that, when forming color filters of color photoresist for a solid-state imaging device, pigments are prevented from sublimating out of the photoresist during exposing light thereto to attach to the inside of a photolithography machine. Color photoresist is first applied onto a semiconductor substrate formed with...

20060127822 - Methods and apparatus for dispensing semiconductor processing solutions with multi-syringe fluid delivery systems: Methods and apparatus for controllably dispensing photoresist solutions and other fluids in semiconductor manufacturing equipment from an array of syringe-based fluid dispensers. A multi-syringe fluid dispensing system is provided for photoresist coating within a wafer track coating module. The coating module may contain a spin chuck that is positioned within...

20060127824 - Complementary masks and method of fabrication of same, exposure method, and semiconductor device and method of production of same: A complementary mask has a plurality of pattern forming regions 34a, 34 having arranged on them complementary patterns 26, 28 obtained by dividing first circuit patterns into complementary patterns 26, 28 complementary with each other and formed by openings. The complementary patterns 26, 28 are arranged in the pattern forming...

20060127823 - Multi reticle exposures: A method and file structure for exposing images from a plurality of reticles onto a wafer. Multiple images are effectively merged into the same file, which means the wafer need not be unloaded from a stage while exposing multiple reticles. For example, every odd numbered column can contain images from...

20060127825 - Developer composition for resists and method for formation of resist pattern: In the formula, at least one of R1 and R2 represents an alkyl or alkoxy group having 5 to 18 carbon atoms and the other one represents a hydrogen atom, or an alkyl or alkoxy group having 5 to 18 carbon atoms, and at least one of R3, R4 and...

20060127826 - Photothermographic material and image forming method: A photothermographic material including, on at least one side of a support, an image forming layer including at least a photosensitive silver halide, a first organic silver salt, a reducing agent, and a binder, and at least one non-photosensitive layer which is disposed on the same side as the image...

20060115740 - Hologram recording medium: A hologram recording medium includes: first and second translucent substrates; and a recording layer, which is formed between the first and second substrates, contains a three-dimensionally crosslinked polymer matrix, a radical polymerizable compound and a photoradical polymerization initiator, shows a rubber-like elasticity at the room temperature, and has a durometer...

20060115745 - Electron beam exposure mask, electron beam exposure method, and electron beam exposure system: An electron beam exposure system includes: an electron beam generation unit for generating an electron beam; an electron beam exposure mask having opening portions for proximity effect correction, which opening portions are arranged so that sizes of the opening portions change at a predetermined rate in order of arrangement; a...

20060115746 - Focus monitoring masks having multiple phase shifter units and methods for fabricating the same: A focus monitoring mask includes a transparent substrate, e.g., a quartz layer. A light blocking film, e.g., a chromium-containing film, is disposed on the transparent substrate and has an opening therein. A transparent unit is disposed in a portion of the substrate exposed by the opening. The transparent unit includes...

20060115744 - Method of producing a mask blank for photolithographic applications, and mask blank: the first layer (6) is exposed in the respective handling area (22; 22a-22c) so that, when the mask blank (1) is handled from the front side, the mechanical clamp or handling device bears against the first layer (6). The invention furthermore relates to a corresponding mask blank....

20060115741 - Pellicle with small gas generation amount: A pellicle which can prevent the formation of foreign-matter deposits on a photo-mask during laser beam irradiation or storage and keep a high pattern accuracy for an extended period of time even when an exposure is made using a KrF or ArF excimer laser beam by removing deposit-causing materials from...

20060115747 - Photo mask structure used during twice-performed photo process and methods of using the same: A photo mask structure used during a twice-performed photo process and methods of using the same. The photo mask structure may include first mask patterns that correspond to first photoresist patterns during a first photo process performed on a first photoresist layer and second mask patterns that correspond to second...

20060115743 - Reticle and method of fabricating semiconductor device: Dicing lines extending longitudinally and transversely, and chip areas surrounded by the dicing lines are formed in a resist mask. Critical-dimension patterns are formed in the dicing lines so as to be paired while placing the center line thereof in between. The dimensional measurement of the resist film having these...

20060115748 - Sidelobe suppression in radiated patterning: Methods and apparatus for sidelobe suppression in a radiation patterning tool. Sidelobe artifacts are mitigated by identifying elements as a function of the radiation wavelength for forming desired profiles on a semiconductor wafer. Diffraction rings are calculated about each of the elements to identify sidelobe interference zones and intersections of...

20060115742 - Tri-tone trim mask for an alternating phase-shift exposure system: A photolithographic trim mask includes a transparent region, an attenuated phase-shift region, and an opaque region. The transparent region substantially transmits received light. The attenuated phase-shift region attenuates and shifts the phase of the received light. The phase-shifted attenuated light patterns a coarse line region of a wafer. The opaque...

20060115749 - Color filter forming method: A color filter forming method, includes: forming a bank on a substrate; making the substrate and part or all of the bank lyophilic; and coating a liquid repellent on part or all of an upper surface of the bank....

20060115750 - Film for color compensation, multi-functional film for color compensation and near infrared absorption and plasma display panel filter comprising the same: where definition of R1 to R4 and A are given in the specification. The film for color compensation and the multi-functional film for color compensation and near IR absorption of the present invention selectively absorbs light in the 560-600 nm region, can improve film durability and can improve contrast and...

20060115751 - Automated overlay metrology system: Non-imaging measurement is made of misalignment of lithographic exposures by illuminating periodic features of a mark formed by two lithographic exposures with broadband light and detecting an interference pattern at different wavelengths using a specular spectroscopic scatterometer including a wavelength dispersive detector. Misalignment can be discriminated by inspection of a...

20060115753 - Method and apparatus for performing target-image-based optical proximity correction: A system that performs target-image-based optical proximity correction on masks that are used to generate an integrated circuit is presented. The system operates by first receiving a plurality of masks that are used to expose features on the integrated circuit. Next, the system computes a target image for a target...

20060115752 - System and method for generating pattern data used to control a pattern generator: A method and system are used to modify pattern data obtained in relation to a pattern on a static patterning device. It is suggested that, in an example when a maskless lithography tool is used, continuous OPC-enhanced features used for maskless lithography rasterization should include a variation in local amplitude...

20060115754 - Image forming method: An electrophotographic image forming method is disclosed. The method contains steps of forming an electrostatic latent image on an organic photoreceptor, and developing the electrostatic latent image by a developer containing toner to form a toner image on the photoreceptor. In this method the photoreceptor contains inorganic particles in a...

20060115755 - Silicon-containing layers for electrophotographic photoreceptors and methods for making the same: Silicon-containing layers for electrophotographic photoreceptors which have high mechanical strength, improved electrophotographic characteristics and improved image deletion characteristics even under conditions of high temperature and high humidity are provided. Such silicon-containing layers include silicon-containing compounds, which may be cross-linked, and siloxane-containing antioxidants that can be selected from hindered phenol antioxidants,...

20060115756 - Toner manufacturing method, toner manufacturing apparatus, and toner: A method of manufacturing a toner by using a liquid dispersion in which a dispersoid containing a material for manufacturing a toner is dispersed in a dispersion medium, and containing a dispersant having a function of improving the dispersibility of the dispersoid, the method including the steps of: preparing the...

20060115757 - Toner for development of electrostatic latent image, electrostatic latent image developer, and method for formation of image: m

20060115759 - Preparation method of a polyester particle dispersion and polyester particle dispersion prepared by the same: A preparation method of a polyester particle dispersion includes: under predetermined depolymerization conditions, mixing a polyester binder resin, a resin dissolvent and a polycondensation catalyst to depolymerize the polyester resin and form a first reaction mixture; adding a first monomer to the first reaction mixture to form a second reaction...

20060115758 - Toner including amorphous polyester, cross-linked polyester and crystalline polyester: A toner is disclosed that includes a binder and at least one colorant, wherein the binder includes an amorphous polyester material, a cross-linked polyester material, an optional embrittling agent material, and a crystalline polyester material. The toner may be mixed with a suitable carrier to form a developer....

20060115760 - Toner for developing electrostatic charge image: To provide a toner for developing an electrostatic charge image, that can realize low-temperature fixing with a wide fixing temperature range and is excellent in fixing strength and that presents little soiling such as filming onto a photoreceptor and is free from soiling in the interior of the apparatus due...

20060115761 - Image forming method and image forming apparatus: A toner image is formed while a developing sleeve is rotated in a direction counter to that of an organic photoreceptor at the developing section and a surface layer of the organic photoreceptor contains metal oxide particles which have a number average primary particle diameter of 3 to 150 nm...

20060115762 - Fixing solution, capsule structure, fixing method, fixing device and image forming apparatus: A fixing solution for fixing toner to a recording medium, includes aliphatic ester held by solvent in a soluble manner, and having solubility or swelling property with respect to resin included in the toner....

20060115763 - Method and device for processing powder: A powder is de-aerated in a collector and then transferred to a chamber via a valve. The chamber may then be injected with a low-pressure air stream carrying an additive for mixing with the de-aerated powder. The mixing of the powder with the air and additive stream may occur in...

20060115764 - Methods for washing and dewatering toner: Methods include washing and de-watering toner particles using a horizontal filter press....

20060115768 - Lithographic printing plate precursor, plate-making method, and lithographic printing method: A lithographic printing plate precursor comprising a support and a layer containing a compound represented by the formula having a specific structure that is discolored by heat or a photochromic compound, and a lithographic printing method using the lithographic printing plate precursor....

20060115767 - Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel: A photosensitive composition, which has a cross-linking monomer having at least two ethylenic double bonds, a photopolymerization initiator, and an organic solvent, and a method of preparing a barrier rib for a plasma display panel, wherein the photosensitive composition is used. The photosensitive composition provides improved adherence to an inorganic...

20060115765 - Photosensitive composition and color paste: A photosensitive composition and a color paste for making the photosensitive composition. The photosensitive resin composition comprises a photosensitive resin system; a pigment; a photo-reactive amphipathic molecule; and a solvent. The color paste for making the photosensitive composition comprises the pigment and the photo-reactive amphipathic molecule....

20060115766 - Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film: This invention provides a positive photosensitive siloxane composition having high photosensitivity and having such properties as high heat resistance, high transparency and low dielectric constant, used to form a planarization film for a TFT substrate, an interlayer dielectrics or a core or cladding of an optical waveguide. It is a...

20060115769 - Correction solution and image correction process of planographic printing plate: Provided is a correction solution accompanied with an image correction process used for a planographic printing plate, exhibiting an anti-stain property against fluctuation in printing conditions (such as change in ambient temperature, and so forth), in which not only stains on a printing plate surface can simply be removed stably,...

20060115771 - Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus: A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposition...

20060115772 - Polymeric tetrahedral carbon films, methods of forming the same and methods of forming fine patterns using the same: The present invention provides polymeric films including polymers having an sp3 carbon main frame including a tetrahedral center atom. Methods of forming the same, hard marks including the same and methods of forming fine patterns using the same are also provided....

20060115770 - Printed circuit board including embedded capacitor and method of fabricating same: Disclosed is a PCB including an embedded capacitor, in which a dielectric layer and an upper electrode layer are formed after a lower electrode layer of the embedded capacitor is formed, thereby providing a microcircuit pattern on a circuit layer having a lower electrode layer formed thereon, and a method...

20060115773 - Anti-reflection optical data storage disk master: Mastering techniques are described that can improve the quality of a master used in data storage disk manufacturing. In particular, the techniques described herein can improve resolution of the features created on the master by reducing mastering noise. The techniques include depositing a multi-layer structure adjacent a master substrate layer....

20060115774 - Method for reducing wafer charging during drying: A novel method for eliminating or reducing the accumulation of electrostatic charges on semiconductor wafers during spin-rinse-drying of the wafers is disclosed. The method includes rinsing a wafer; applying an ionic solution to the wafer; and spin-drying the wafer. During the spin-drying step, the ionic solution neutralizes electrostatic charges on...

20060115775 - Method for forming images and silver halide color photographic photosensitive material: A method for forming images on a silver halide color photographic photosensitive material having a substrate and photographic structural layers thereon, including at least three silver halide color photosensitive layers having different photosensitive regions, respectively, and at least one non-photosensitive hydrophilic colloid layer, is disclosed. At least one of the...

20060115776 - Photothermographic material: wherein, M represents a metal atom, at least one of R1, R4, R5, R8, R9, R12, R13, and R16 is an electron-attracting group, and R2, R3, R6, R7, R10, R11, R14, and R15 each independently represent a hydrogen atom or a substituent. The invention provides a photothermographic material which exhibits...

20060115777 - Photothermographic material: wherein, M represents a metal atom; R1, R2, R3, R4, R5, R6, R7, and R8 each independently represent a hydrogen atom or a substituent, with at least one of them being a substituent; X1, X2, X3, and X4 each independently represent a hydrogen atom or a substituent; and at least...