SEARCH:      Monitor Keywords |  Custom RSS

Radiation imagery chemistry: process, composition, or product thereof May archived by USPTO category 05/06

20060110664 - Large pellicle: A pellicle is provided that comprises a pellicle frame that has an upper end face and a lower end face and is a quadrilateral having a side greater than 30 cm or a circle having a diameter of greater than 30 cm, a pellicle film stretched over the upper end...

20060110663 - Mask for depositing thin film of flat panel display and method of fabricating the mask: A mask for depositing a thin film of a flat panel display and a method of fabricating the mask are disclosed. Embodiments of the mask can improve position accuracy and prevent problems caused by thermal expansion of the mask by attaching a reinforcing member and mask pattern units arranged on...

20060110665 - Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus: A lithographic apparatus, a device manufacturing method, and a projection element for use in a lithographic apparatus are disclosed. The lithographic apparatus has a radiation system for providing a pulsed beam of radiation, a patterning device for imparting the beam with a pattern to form a patterned radiation beam, and...

20060110667 - Method of fabrication of semiconductor integrated circuit device and mask fabrication method: An area for fabricating a photomask having light-shielding patterns each formed of an organic film, and areas for fabricating a semiconductor integrated circuit device are provided within the same clean room. A manufacturing device and an inspecting device are commonly used during the fabrication of the photomask and the fabrication...

20060110666 - Stray light feedback for dose control in semiconductor lithography systems: A stray light feedback system and method for a lithography exposure tool. The stray light feedback helps control critical dimension (CD) within a stray light specification limit. A stray light dose control factor is calculated as a function of the stray light measured in the exposure tool and the sensitivity...

20060110668 - Electrophotographic photoreceptor and method of preparing the photoreceptor, and image forming method, image forming apparatus and process cartridge therefor using the photoreceptor: An electrophotographic photoreceptor, including an electroconductive substrate; and a photosensitive layer overlying the electroconductive substrate, which includes a crosslinked layer at the surface thereof, wherein the crosslinked layer is formed by a method including: coating a coating liquid, which includes a solvent; a radical polymerizing monomer having three or more...

20060110669 - Electrophotographic image member: An electrophotographic imaging member is disclosed which is provided with a charge transport layer comprising at least one polycarbonate polymer binder having a weight average molecular weight based on polystyrene units of from about 150,000 to about 190,000 and at least one polycarbonate binder having a weight average molecular weight...

20060110670 - In situ method for passivating the surface of a photoreceptor substrate: An electrophotographic photoreceptor is disclosed which is provided with a substrate with a coating with a metal oxide as an interface between the substrate and photoconductive layers. A process for applying the metal oxide layer to the substrate is also disclosed....

20060110671 - Photoreceptor member: An electrophotographic photoreceptor is disclosed which is provided with an anti-corrosion layer on the interface between the substrate surface and hole blocking layer. The photoreceptor has high mechanical strength and minimizes defects in print for longer periods of time....

20060110672 - Developing agent: A developing agent comprising color toners and a cyan toner, the color toners including a yellow toner, a magenta toner, and a black toner, wherein the black toner comprises a binder resin containing a crystalline polyester resin, and the yellow toner, the magenta toner and the cyan toner each comprise...

20060110673 - Electrophotographic developing agent: Provided is an electrophotographic developing agent including: toner particles including a binder resin, a colorant, and a charge control agent; and an external additive added to the surface of the toner particles, wherein the external additive includes at least one inorganic particulate component and at least two types of strontium...

20060110674 - Method of producing polyester, method of producing electrostatic developing toner and electrostatic developing toner: In the method of the present invention, a polyester is produced by a step of emulsifying or dispersing a polyvalent acid component having a hydrophobic parameter (Log(P)) of −0.5 or more and 20 or less, a polyhydric alcohol component having a hydrophobic parameter (Log(P)) of −0.5 or more and 20...

20060110675 - Image forming method and image forming apparatus: A toner image is formed while a developing sleeve is rotated in a direction counter to that of an organic photoreceptor at the developing section and a developing agent contains toner which contains toner particles having a particle diameter of 0.7×(Dp50) or less in an amount of 8 number %...

20060110682 - Antihalation compositions: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder....

20060110678 - Low-temperature curable photosensitive compositions: The invention relates to low-temperature curable photosensitive compositions containing a polyamic acid, which compositions are developable in aqueous alkaline solutions and are curable, at a temperature of at least 160° C. and up to 200° C., to low modulus polyimides suitable for use in electronic circuitry applications, and which are...

20060110679 - Low-temperature curable photosensitive compositions: The invention relates to low-temperature curable photosensitive compositions containing a polyamic acid, which compositions are developable in aqueous alkaline solutions and are curable, at a temperature of at least 160° C. and up to 200° C., to low modulus polyimides suitable for use in electronic circuitry applications, and which are...

20060110677 - Photoresist composition for deep uv and process thereof: The present invention relates to a novel chemically amplified photoresist, which is sensitive to wavelengths between 300 nm and 100 nm, and comprises a) a novel polymer comprising a sulfone group pendant from a polymer backbone that is insoluble in an aqueous alkaline solution and comprises at least one acidic...

20060110681 - Photosensitive lithographic printing plate and method for making a printing plate: A photosensitive lithographic printing plate comprises a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate...

20060110680 - Photosensitive resin composition: This invention relates to a positive photosensitive resin composition allowing development with an alkaline aqueous solution and excellent in resolution, photosensitivity and pattern form even if the film formed from the resin is thick. Furthermore, this invention relates to a photosensitive resin composition comprising (a) a polymer having one or...

20060110676 - Resist material for liquid immersion lithography process and method for forming resist pattern using the resist material: A negative resist material for a liquid immersion lithography process containing a resin component and a crosslinker component for this resin component, wherein the crosslinker component is poorly soluble in a liquid immersion medium, and a method for forming a resist pattern by the use thereof are provided. These simultaneously...

20060110684 - Photomask for forming small contact hole array and methods of fabricating and using the same: Photomasks that are used to form a fine contact hole array, a method of fabricating the photomask, and use of the photomask. The photomask includes a transparent substrate; a plurality of line-type opaque patterns being formed on the transparent substrate, for defining floodlighting portions for forming patterns; and phase-shifting regions...

20060110683 - Process of improved grayscale lithography: Methods for minimizing the errors associated with substrate etching are presented. The methods use intentional defocusing of the pattern image on the photoresist to minimize errors in the etching process particularly grayscale etching and/or multiple exposure contributions from neighboring patterns....

20060110685 - Apparatus and method to improve resist line roughness in semiconductor wafer processing: A process for prohibiting amino group transport from the top surface of a layered semiconductor wafer to a photoresist layer introduces a thin film oxynitride over the silicon nitride layer using a high temperature step of nitrous oxide (N2O) plus oxygen (O2) at approximately 300° C. for about 50 to...

20060110686 - Method for forming metal pattern by using metal nanocrystals: Disclosed herein is a method for forming a metal pattern by using metal nanocrystals. The method comprises the steps of: (i) coating a photosensitive compound having a substituent, which is converted into a free carboxyl group by light exposure, on a substrate to form a photosensitive film; (ii) selectively exposing...

20060110687 - Pattern forming method and a semiconductor device manufacturing method: A pattern forming method is disclosed, which comprises forming a photo resist film on a substrate, irradiating the photo resist film with an energy ray to form a desired latent image pattern, placing the substrate on a spacer provided on a hot plate, heating the photo resist film by using...

20060110688 - Etching process compatible with duv lithography: An etching process compatible with DUV lithography is described. A mask layer is previously formed over a material layer to be etched through a DUV lithography process of 193 nm or 157 nm. Then, plasma etching is performed to pattern the material layer using the mask layer as an etching...

20060110689 - Immersion photolithography with megasonic rinse: A method comprises forming a photoresist on a substrate, rinsing the photoresist using a rinse liquid agitated with at least one megasonic source, exposing the photoresist to radiation while immersed in a liquid, and developing the photoresist....

20060110690 - Treating liquid for photoresist removal, and method for treating substrate: Disclosed are a treating liquid for photoresist removal, containing (a) an oxidizing agent (e.g., aqueous hydrogen peroxide), (b) at least one selected from alkylene carbonates and their derivatives (e.g., propylene carbonate), and (c) water; and a method for treating with the treating liquid a substrate having a photoresist film deteriorated...

20060110692 - Image forming method for the photothermographic material: An image forming method comprising: imagewise exposing and thermal developing a photothermographic material using an image recording apparatus, wherein a part of the sheet is exposed and, in parallel with the exposure, development is started on a part of the sheet having been already exposed: wherein the photothermographic material comprises...

20060110691 - Photothermographic material:

20060110693 - Exposure method and apparatus, exposure mask, and device manufacturing method: Disclosed is an exposure method and apparatus, an exposure mask and a device manufacturing method, wherein a first surface of a light blocking member having a plurality of openings formed in a mutually adjoining relation is placed at an exposure object side, and light is projected to the light blocking...

20060110694 - Novel method and systems to print contact hole patterns: A method for forming an arbitrary pattern of sub-micron contact holes in a substrate using a combination of interferometric photolithography and optical photolithography with a non-critical mask. The substrate is covered with a photosensitive material and is exposed by a standing wave interference pattern produced by the superposition of two...

20060105249 - Exposure mask and method of manufacturing the same: A method of manufacturing an exposure mask, which has the steps of: obtaining the form data D1 of device exposure patterns by applying optical proximity effect correction to the form data D0 of device patterns; obtaining the form data D2 of monitor exposure patterns, where the rising amount of corners...

20060105248 - Method of reducing the average process bias during production of a reticle: We are able to reduce the average process bias in a patterned reticle by treating the developed, patterned photoresist which is used to transfer a pattern to the reticle with a silicon-containing reagent prior to the pattern transfer. The process bias is a measure of the difference between a nominal...

20060105247 - Microstructure comprising an adhesive layer and method of fabrication of said microstructure: The invention concerns a microstructure comprising an adhesive layer between a substrate and a photo-patternable layer, arranged on at least one face of the substrate. The adhesive layer is photosensitive and consists of a negative resin comprising at least one polymer of the family of elastomers and at least one...

20060105250 - Test photomask and compensation method using the same: A test photomask and a compensation method using the same are disclosed. The present invention employs several groups of parallel lines in the longitudinal direction and in the traverse direction on the test photomask to fabricate the test photomask. The parallel lines have different widths thereof and widths of pitches....

20060105251 - Black matrix, method for preparing the same, and flat panel display and electromagnetic interference filter using the same: A black matrix, a method for preparing the black matrix, a flat panel display and an electromagnetic interference filter using the black matrix. The black matrix may comprise a substrate, a titanium oxide layer, a Ni plating layer, and a Ni/Pd alloy layer. The method may comprise the steps of...

20060105252 - Photosensitive member having an elastomeric transport layer with a thin overcoat layer: An imaging member having a substrate, a charge transport layer having a polymer and a first charge transport material dispersed therein, and wherein the charge transport layer has a glass transition temperature of from about 10 to about 45° C.; and an overcoat layer on the charge transport layer, wherein...

20060105253 - Non-halogenated polymeric binder: A non-halogenated binder material, such as for an electrophotographic imaging member binder, includes a copolymer of vinyl acetate and vinyl acid....

20060105255 - Electrophotographic image forming apparatus: An electrophotographic image forming apparatus comprising: an electrophotographic photoreceptor comprising: an electroconductive substrate; a charge generation layer; and a charge transport layer in this order, a charger; an irradiator; an image developer; and a transferer applying an electric current not less than 65 μA to the electrophotographic photoreceptor, wherein the...

20060105254 - Processes for the preparation of high sensitivity titanium phthalocyanines photogenerating pigments: A process for preparing a high sensitivity titanyl phthalocyanine (TiOPc) pigment includes dissolving a Type I TiOPc in a suitable solvent, precipitating an intermediate TiOPc pigment by quenching the solution comprising the dissolved Type I TiOPc in a solvent system comprising an alcohol and alkylene chloride such as, for example,...

20060105256 - Substrate with plywood suppression: The present disclosure provides photoreceptors and methods for fabricating photoreceptors. Photoreceptor device surfaces and fabrication methods have been designed to suppress a “plywood effect.” One method includes providing a substrate, rotating the substrate, lathing the substrate with a cutting tool and a cutting fluid by at least one pass, cleaning...

20060105257 - Indolenine compound, near infrared absorber, and toner containing the same: e

20060105258 - Electrostatic latent image developing toner and manufacturing method thereof: An electrostatic latent image developing toner including, as a binder resin, a crystalline resin and at least one kind of non-crystalline resin, wherein, in a dynamic viscoelasticity measurement by a sine wave vibration method, a minimum value of the relaxation elasticity H in a relaxation spectrum obtained from frequency dispersion...

20060105259 - Toner, process for producing a toner, image forming method and image forming apparatus: An electrophotographic toner is formed as a blend of toner particles and external additives. The external additives include (1) first inorganic fine particles having an average primary particle size of 80-800 nm of oxide of a metal selected from the group consisting of titanium, aluminum, zinc and zirconium, (2) second...

20060105260 - Non-magnetic monocomponent positive toner composition having superior transfer efficiency: The present invention relates to a non-magnetic mono-component toner composition, which comprises a) a non-magnetic toner particle comprising a binding resin comprising a binder resin and a copolymer of a cyclic olefin and an acyclic olefin polymerized in the presence of a metallocene catalyst and a cocatalyst, a colorant, and...

20060105261 - Toner process: The present disclosure relates to a process including a first heating of a latomer mixture including at least one free radical polymerizable monomer, and at least one alkylene anhydride; a second heating of the latomer mixture to form polymeric particles; and combining the polymeric particles with at least one amine....

20060105262 - Process for preparing toner for electrophotography: A process for preparing a toner for electrophotography comprising a resin binder and a colorant, including the steps of (1) forming primary particles containing the resin binder and the colorant in an aqueous medium in the presence of a nonionic surfactant; and (2) aggregating the primary particles, and unifying the...

20060105263 - Toner composition: Improved toner particles having a core-shell structure and related processes thereof are provided. The core of the toner comprises a first polymer, a complexed cationic dye pigment, and a heteropoly acid, and the shell comprises a second polymer. The heteropoly acid can effectively retain the complexed cationic dye pigment within...

20060105264 - Process for preparing photosensitive outer layer using prepolymer with reactive groups and melamine formaldehyde crosslinking agent: A process for preparing an overcoat for an imaging member having a substrate, a charge transport layer, and an overcoat positioned on the charge transport layer, and the process includes combining a prepolymer having a reactive group selected from the group consisting of hydroxyl, carboxylic acid and amide groups, a...

20060105265 - Blue dye with particularly high purity and positive triboelectric control effect: The dye base sulphate of formula (I) is produced with a residual amine content of less than 2000 ppm, as determined by HPLC, by precipitation of the dye base, made by Friedel-Crafts alkylation, substitution and hydrolysis, as the dye base sulphate and a) taken up in water and subjecting to...

20060105269 - Fluorinated photoresist materials with improved etch resistant properties: where R1 represents hydrogen (H), a linear, branched or cyclo alkyl group of 1 to 20 carbons, a semi- or perfluorinated linear, branched or cyclo alkyl group of 1 to 20 carbons or CN; R2 represents an alicyclic group of 5 or more carbon atoms; X represents a methylene, ether,...

20060105266 - Low activation energy positive resist: Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation (and possibly other radiation) at low energy levels are obtained using a polymer having acrylate/methacrylate monomeric units comprising a low activation energy moiety preferably attached to a naphthalene ester group. The resist allows the performance benefit of acrylate/methacrylate polymers...

20060105268 - Method for thermally processing photosensitive printing sleeves: An improved method of manufacturing a photosensitive printing element that minimizes relief variation and improves image fidelity. The method involves a step of pre-curing the first (floor layer) of photocurable material prior to depositing an additional layer or layers of photocurable material that may be imaged and developed to produce...

20060105267 - Positive resist containing naphthol functionality: Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation are obtained using a polymer having acrylate/methacrylate monomeric units comprising a naphthol ester group. The resist may optionally contain polymer having acrylate/methacrylate monomeric units with fluorine-containing functional groups. The resists containing the polymer having acrylate/methacrylate monomeric units comprising a...

20060105270 - Method of recording information on an optical information recording medium: An optical information recording medium includes a substrate having disposed thereon a recording layer that is recordable by irradiating the recording layer with a laser having a wavelength of 450 nm or less. The recording layer contains a specific phthalocyanine derivative. An optical information recording method uses the medium....

20060105271 - Edge cure prevention process: An automated method of preventing edge curing of cut surfaces of photosensitive printing elements is disclosed. Once a photosensitive printing element is cut in a pattern of a desired size and shape, a portion of the coversheet on a periphery of the cut edges of the printing plate is removed,...

20060105272 - Compositions and processes for immersion lithography: The present invention relates to barrier layer compositions that are applied above a photoresist composition for immersion lithography processing. In a further aspect, new methods are provided for immersion lithography processing....

20060105274 - Method for forming a lithography mask: A method for forming a lithography mask on a surface region of a wafer is presented. In one embodiment of the method according to the invention time periods from the end of an exposure operation until the beginning of a thermal aftertreatment for the sections of the semiconductor material region...

20060105273 - Method for producing electronic device: There is a problem in that when the demand accuracy with respect to a semiconductor pattern dimension comes close to a resist molecule size with miniaturization, the device performance is deteriorated due to edge roughness of a resist pattern to exert a bad influence on the system performance. The present...

20060105275 - Fabrication methods and structures for micro-reservoir devices: Methods are provided for making a multi-reservoir device comprising (i) patterning one or more photoresist layers on a substrate; (ii) depositing onto the substrate at least one metal layer by a sputtering process to form a plurality of reservoir caps and conductive traces; (iii) removing the photoresist layers using a...

20060099516 - Switchable volume hologram materials and devices: A new photopolymerizable material allows single-step, fast recording of volume holograms with properties that can be electrically controlled. Polymer-dispersed liquid crystals (PDLCs) in accordance with the invention preferably comprise a homogeneous mixture of a nematic liquid crystal and a multifunctional pentaacrylate monomer, in combination with photoinitiator, coinitiator and cross-linking agent....

20060099521 - Half tone mask, method for fabricating the same, and flat panel display using the same: A half tone mask having a transparent substrate, a light semitransmission layer, and a light shield layer, a method for fabricating the same, and a flat panel display using the same. The half tone mask is applied to multiple cycles of a photolithography process, thus shortening a time taken to...

20060099522 - Mask used in manufacturing highly-integrated circuit device, method of creating layout thereof, manufacturing method thereof, and manufacturing method for highly-integrated circuit device using the same: A set of masks including an alternating phase shifting mask (APSM) and a halftone phase shifting trim mask (HPSTM) is provided. The APSM includes first and second phase shifting areas and a first opaque pattern. The first and second phase shifting areas are disposed adjacent to each other and have...

20060099520 - Method and resulting structure for mosaic of multi-transmission rate optical mask structures: A reticle device. The device has a quartz substrate, which has a surface region. A first region comprising a plurality of binary mask patterns is formed on a first portion of the surface region. A second region comprising a plurality of first phase shift mask patterns is formed on a...

20060099523 - Method for forming pattern using photomask: A photomask includes a semi-light-shielding portion having a light-shielding property, a light-transmitting portion surrounded by the semi-light-shielding portion and a peripheral portion positioned in a periphery of the light-transmitting portion on a transparent substrate. The semi-light-shielding portion and the light-transmitting portion transmit the exposure light in the same phase each...

20060099519 - Method of depositing a material providing a specified attenuation and phase shift: The invention allows for the control of the attenuation and the phase of light transmitted through a deposited material. The invention is particularly applicable to the repair of attenuated phase shift photomasks. The transmission and the phase of the repaired area can be controlled. In a preferred embodiment, the phase...

20060099518 - Method to resolve line end distortion for alternating phase shift mask: A embodiment method for forming a layout for a phase shift mask. A embodiment comprises providing a layout comprising a first feature, a first shifter region and a second shifter region. The first feature preferably has a L-shape portion with an elbow region. The first shifter region is on the...

20060099517 - Phase shift mask fabrication method thereof and fabrication method of semiconductor apparatus: There is disclosed an extreme ultraviolet phase shift mask that may be constituted practically by obtaining an appropriate combination of a refractive index with an absorption coefficient, even in the case of a reflection of an extreme ultraviolet radiation. When constituting a phase shift mask (10) having a reflective mask...

20060099524 - Organic photoreceptor, an image forming method and an image forming apparatus employing the same: e

20060099525 - Imaging member: An electrostatographic imaging member formulated with a liquid carbonate is provided. The imaging electrostatographic member exhibits improved service life....

20060099526 - Organic thin film transistor, method of manufacturing the same, and flat panel display having the same: Provided are an organic TFT, a method of manufacturing the same, and a flat panel display having the same. The organic TFT includes source and drain electrodes formed on the surface of a substrate, an organic semiconductor layer that includes source and drain regions and a channel region, located on...

20060099527 - Photoconductive imaging members: A photoconductive imaging member comprised of an optional supporting substrate, a hole blocking layer thereover, a photogenerating layer, and a charge transport layer, and wherein the hole blocking layer is comprised of a pyrolyzed polyacrylonitrile....

20060099528 - Carrier composition: A carrier particle for an electrostatographic process, and a developer employing such carrier particle, is provided. The carrier particle includes an irregular shaped ferrite core, and a coating applied to the core. The developer includes a carrier particle comprising the irregular shaped ferrite core and a toner. The irregular shaped...

20060099529 - Toner and method for producing the same, and image-forming method using the same: There are provided a method for producing a toner which includes: emulsifying and dispersing an oil phase in an aqueous phase so as to form oil droplets; and aggregating the oil droplets so as to associate each other, wherein the oil droplets exhibit non-Newtonian viscosity at the time of aggregating,...

20060099530 - Polymerized toner and method for preparing the same: The present invention relates to a polymerized toner prepared by suspension polymerization. Provided is a method for preparing a toner comprising the steps of (1) preparing a toner by suspension polymerization using a water-based dispersant that adjusts size of emulsion particles, which are formed as byproduct, to 0.05-2 μm; and...

20060099531 - Derivatized polyhydroxystyrenes (dphs) with a novolak type structure and blocked dphs (bdphs) and processes for preparing the same: A process for preparing a blocked derivatized poly(4-hydroxystryrene)-DPHS having a novolak type structure which comprises the steps of (i) supplying a solution of methanol containing 4-hydroxyphenylmethylcarbinol, (ii) subjecting said solution to an acid catalyzed displacement reaction for a sufficient period of time and under suitable conditions of temperature and pressure...

20060099532 - Method for manufacturing a substrate for use in a stamper manufacturing process, as well as a substrate obtained by using such a method: A method for manufacturing a substrate for use in a stamper manufacturing process and a substrate which is used in stamper manufacturing process to be used in producing optical discs, includes exposing, developing and heating of a photosensitive film that has been coated onto a substrate....

20060099533 - Optical wavelength converting device and process for producing the same: A photosensitive resist layer is formed on one surface of a single-polarized ferroelectric substance having nonlinear optical effects. The resist layer has properties such that, when light is irradiated to the resist layer, only exposed areas of the resist layer or only unexposed areas of the resist layer become soluble...

20060099534 - Method for fabricating optical devices in photonic crystal structures: A method for manufacturing optical components in a three-dimensional photonic crystal lattice. A first resist (9) is coated on a substrate (10) and exposed to an e-beam (11), to produce an imaged area (12). Another resist coating is applied to thicken the resist (13) and an interference exposure (15) is...

20060099535 - Pattern forming method and pattern forming apparatus: A pattern forming apparatus (1) comprises an ejection part (41) for ejecting a patterning material to a main surface of a substrate (9) from a plurality of outlets. The ejection part (41) moves relative to the substrate (9) in a direction along the main surface of the substrate (9) by...

20060099536 - Patterned structures of high refractive index materials: A process for forming a polymer template includes exposing a photoresist having polymer molecules to a light pattern and baking the photoresist to chemically react polymer molecules in portions of the photoresist that were exposed to light of the light pattern. The reacted polymer molecules have a different solubility in...

20060099537 - Heat developing apparatus and heat developing method: The heat developing apparatus heats and conveys a film with a heat developing photosensitive material coated on one side of a supporting substrate and makes a latent image formed on the film visible, which includes a first zone composed of stationary guides 51b and 52b having a heater and opposing...

20060099538 - Methods of performing a photolithography process for forming asymmetric patterns and methods of forming a semiconductor device using the same: There are provided methods of performing a photolithography process for forming asymmetric semiconductor patterns and methods of forming a semiconductor device using the same. These methods provide a way of forming asymmetric semiconductor patterns on a photoresist layer through two exposure processes. To this end, a semiconductor substrate is prepared....

20060099539 - Micro-particle dispersion having hydrophobic protective colloid and method of manufacture thereof, photosensitive emulsion and method of manufacturing thereof, and silver salt photohermographic dry imaging material utilizing the same: A method of manufacturing a micro-particle dispersion having a hydrophobic protective colloid comprising the steps of: (a) dispensing micro-particles in a hydrophilic dispersant to form a hydrophilic micro-particle dispersion having the hydrophilic dispersant as a protective colloid, and (b) adding a dispersant to the hydrophilic micro-particle dispersion, the dispersant having...

20060093926 - Mask pattern data generating method, photo mask manufacturing method, and semiconductor device manufacturing method: A mask pattern data generating method is disclosed, which comprises preparing mask pattern data which corresponds to a design pattern including a pair of line patterns formed of two line patterns, and disposing an auxiliary pattern which is un-transferable to a resist film at a center of a space region...

20060093924 - Method and apparatus for correction of defects in lithography masks: A method for correction of defects in lithography masks includes determining the existence of mask defects on an original mask, and identifying a stitchable zone around each of the mask defects found on the original mask. Each of the identified stitchable zones on the original mask is blocked out such...

20060093925 - Method for repairing opaque defects in photolithography masks: A method of repairing opaque defects on a photolithography mask avoids damage to the mask substrate while providing improved repair results. The chrome mask pattern is first covered with a layer of carbon, following which the entire mask is covered with a layer of photoresist. Portions of the photoresist are...

20060093927 - Pattern mask with features to minimize the effect of aberrations: A semiconductor pattern mask that might otherwise exhibit three-fold symmetry, which could give rise to distorted semiconductor features in the presence of three-leaf aberration in the optical system used to expose a semiconductor wafer through the mask, is altered to break up the three-fold symmetry without altering the semiconductor features...

20060093928 - Manufacturing method of color filter on tft array and manufacturing method of lcd panel: A method of fabricating a color filter over a TFT array and a method of fabricating a liquid crystal display panel comprising the same are disclosed. First, a substrate having a TFT array thereon is provided. Next, a black matrix is formed over the TFT array for defining a plurality...

20060093929 - Method for fabricating a color filter: A method for fabricating a color filter (CF) is provided. The method includes steps of providing a substrate and forming a dielectric layer thereon, performing a first lithography process with a first photoresist on the dielectric layer to form a plurality of first pixels, performing a second lithography process with...

20060093930 - Toner kit and color-image-forming method: m

20060093931 - Organic photoconductor, image forming method, image forming apparatus and process cartridge: An organic photoconductor containing a conductive support having thereon a photoconductor layer, wherein the creep ratio of the surface of the photoconductor layer is not less than 1% and less than 3.5%, and the surface roughness Ra is not less than 0.02 μm and less than 0.1 μm....

20060093932 - Bisazo-based charge transport materials having 4-oxo-2,5-cyclohexadiene-1-ylidinyl groups:

20060093933 - Polysilane-based charge transport materials:

20060093934 - Dry toners comprising amphipathic copolymeric binder and non-volatile plasticizer: A low temperature fusing dry electrographic toner composition has a plurality of dry toner particles, wherein the toner particles comprise polymeric binder comprising at least one amphipathic copolymer comprising one or more S material portions and one or more D material portions. The dry electrographic toner composition comprises a non-volatile...

20060093935 - Electrophotographic toner and image forming method: An electrophotographic toner exhibiting superior color reproducibility and transparency and improved characteristics is disclosed, comprising a thermoplastic resin and colored microparticles dispersed in the thermoplastic resin and containing a dye and a resin differing in composition from the thermoplastic resin. An image forming method by use of the toner is...

20060093936 - Printing a light emitting element: A charged toner particle for use in printing a light emitting device, the particle comprising: a polymer; and electroluminescent particles dispersed in the polymer, wherein when the toner is printed the electroluminescent particles in the printed toner are spatially substantially static....

20060093937 - Printing semiconducting components: A toner particle for use in electrostatic printing of a semiconducting electronic device, the particle comprising: a resin; and non-organic semiconductor particles dispersed in the resin....

20060093943 - Magenta color toner, toner cartridge, and process cartridge and image forming apparatus using the magenta color toner: A magenta color toner including toner particles including a binder resin including a polyester resin including an inorganic tin (II) compound; a colorant having one of naphthol compounds having one of specific formulae. A process cartridge in which includes a photoreceptor bearing an electrostatic latent image; and a developing device...

20060093938 - Dry toner blended with wax: Dry electrographic toner compositions are provided comprising a plurality of dry toner particles, wherein the toner particles comprise polymeric binder comprising at least one amphipathic copolymer comprising one or more S material portions and one or more D material portions. The dry electrographic toner composition comprises a wax associated with...

20060093939 - Dry toner comprising entrained wax: Dry electrographic toner compositions are provided comprising a plurality of dry toner particles, wherein the toner particles comprise polymeric binder comprising at least one amphipathic copolymer comprising one or more S material portions and one or more D material portions. The dry electrographic toner composition comprises a wax associated with...

20060093940 - Dry toner comprising wax: Dry electrographic toner compositions are provided comprising a plurality of dry toner particles, wherein the toner particles comprise polymeric binder comprising at least one amphipathic copolymer comprising one or more S material portions and one or more D material portions. The dry electrographic toner composition comprises a wax associated with...

20060093941 - Toner compositions with surface additives: A toner composition includes a binder, a colorant, and a surface additive package including a polydimethylsiloxane surface treated silica, a surface treated titania, and calcium sterate. The toner composition provides improved triboelectric charging properties....

20060093942 - Process for preparing toner: A process for preparing a toner including the steps of (I) melt-kneading a raw material mixture containing a resin binder, a colorant, and a positively chargeable charge control agent; (II) cooling the melt-kneaded mixture obtained in the step (I), and pulverizing the cooled mixture in the presence of a positively...

20060093945 - Dry toners comprising amphipathic copolymeric binder and volatile plasticizer: A low temperature fusing dry electrographic toner composition has a plurality of dry toner particles, wherein the toner particles comprise polymeric binder comprising at least one amphipathic copolymer comprising one or more S material portions and one or more D material portions. The dry electrographic toner composition comprises a volatile...

20060093944 - Dry toners comprising amphipathic copolymeric binder having non-sorptive components in the shell portion thereof: The invention provides dry electrographic toner compositions comprising toner particles. The toner particles comprise polymeric binder comprising at least one amphipathic copolymer comprising one or more S material portions and one or more D material portions prepared from an organosol reaction process utilizing a liquid carrier reaction medium having a...

20060093946 - Toner for use in electrophotography, image formation method using the toner, method of producing the toner, and apparatus for producing the toner: A toner is proposed which includes toner particles and a fluidity-imparting agent and which has characteristics that when the toner is sieved with a 500-mesh sieve, the residue of the toner on the sieve has a circularity of from 0.93 to 0.97 and when 100 g of the toner is...

20060093947 - Toner for electrostatic image development and image forming method using the same: A toner for electrostatic image development, which contains toner particles in which not more than 13 percent by number of the toner particles have a particle diameter of smaller than 4 μm, not less than 20 percent by number of the toner particles have a particle diameter of 4 μm...

20060093953 - Liquid toners comprising amphipathic copolymeric binder and dispersed wax for electrographic applications: The invention provides liquid electrographic toner compositions comprising a liquid carrier having toner particles dispersed in the liquid carrier. The liquid carrier has a Kauri-Butanol number less than about 30 mL. The toner particles comprise polymeric binder comprising at least one amphipathic copolymer comprising one or more S material portions...

20060093948 - Liquid toners comprising amphipathic copolymeric binder and soluble polymers for electrographic applications: The invention provides liquid electrographic toner compositions comprising a liquid carrier having toner particles and at least one soluble polymer dispersed in the liquid carrier. The liquid carrier has a Kauri-Butanol number less than about 30 mL. The toner particles comprise polymeric binder comprising at least one amphipathic copolymer comprising...

20060093949 - Liquid toners comprising amphipathic copolymeric binder having insoluble components in the shell portion thereof: The invention provides liquid electrographic toner compositions comprising a liquid carrier having toner particles dispersed in the liquid carrier. The liquid carrier has a Kauri-Butanol number less than about 30 mL. The toner particles comprise polymeric binder comprising at least one amphipathic copolymer comprising one or more S material portions...

20060093950 - Liquid toners comprising amphipathic copolymeric binder that have been prepared, dried and redispersed in the same carrier liquid: Methods of preparing a liquid electrographic toner composition are provided, wherein a polymeric binder comprising at least one amphipathic copolymer comprising one or more S material portions and one or more D material portions is first prepared in a reaction solvent, wherein the reaction solvent comprises less than about 10%...

20060093951 - Liquid toners comprising toner particles prepared in a solvent other than the carrier liquid: Methods of preparing a liquid electrographic toner composition are provided, wherein a polymeric binder comprising at least one amphipathic copolymer comprising one or more S material portions and one or more D material portions is first prepared in a hydrocarbon reaction solvent, wherein the hydrocarbon reaction solvent comprises less than...

20060093952 - Printing systems and methods for liquid toners comprising dispersed toner particles: Methods of printing with a liquid electrophotographic toner composition prepared within an electrophotgraphic printing apparatus are provided, wherein a polymeric binder comprising at least one amphipathic copolymer comprising one or more S material portions and one or more D material portions is first prepared in a reaction solvent, wherein the...

20060093954 - Liquid electrophotographic toners comprising amphipathic copolymers having acidic or basic functionality and wax having basic or acidic functionality: The invention provides liquid electrographic toner compositions comprising a liquid carrier having toner particles dispersed in the liquid carrier. The liquid carrier has a Kauri-Butanol number less than about 30 mL. The toner particles comprise polymeric binder comprising at least one amphipathic copolymer comprising one or more S material portions...

20060093955 - Image forming method, and image forming apparatus and process cartridge using the image forming method: An image forming method including forming a toner image on an image bearing member; transferring the toner image onto a receiving material; and then cleaning the surface of the image bearing member with a cleaning member while applying a voltage to the cleaning member such that the cleaning member electrostatically...

20060093956 - Fluidized bed spray coating of polyester chemical toners with additives: A process for manufacturing a toner having improved relative humidity sensitivity is described. The process comprises forming polyester toner particles by emulsion/aggratation, fluidizing the toner particles with a stream of inert gas while spraying the toner particles with a solution containing an additive affecting relative humidity sensitivity, and wherein the...

20060093957 - Method of blending toners using a high intensity blending tool with shaped risers for decreased toner agglomeration: The present invention relates to a method for high intensity blending of toner particles in order to cause additive materials to become firmly affixed to the surface of base toner particles. The method includes using a blending tool having a shank with riser members at each end, such risers being...

20060093958 - Color forming compositions and associated methods: Compositions and methods for production of color images which are developable at sub-infrared wavelengths are disclosed and described. The color forming composition can include a polymer matrix having a color former phase adjacent to or dispersed within the polymer matrix. The color former phase can include a color former and...

20060093960 - Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process: Cyclic structure-bearing fluorinated monomers having formula (1) wherein Z is a divalent organic group containing a polymerizable unsaturated group are useful to produce polymers for the manufacture of radiation-sensitive resist compositions which are fully transparent to radiation having a wavelength of up to 300 nm and have improved development properties....

20060093959 - Silicon containing tarc / barrier layer: c

20060093961 - Method of verifying electron beam data: A method of verifying electron beam data used to produce a photomask comprises dividing design data for the photomask into a plurality of repetitive regions, sequentially converting the sequential regions into electron beam data, and determining whether electron beam data corresponding to a current repetitive region is substantially identical to...

20060093962 - Edge cure prevention composition and process for using the same: An edge-covering composition for covering the cut surfaces of a photosensitive printing element to prevent premature curing of the cut surfaces during a process of manufacturing the printing element. The edge-covering composition is an emulsion comprising one or more emulsifiers, one or more-ultraviolet radiation-absorbing materials, optionally, a coloring agent, and...

20060093964 - Manufacturing method of microstructure, manufacturing method and manufacturing device of electronic device: The present invention provides a manufacturing method capable of obtaining minute structures. In order to achieve this, as shown in FIG. 1, a process target material (108) is exposed and the shape thereof is changed by relatively shifting a laser beam or electronic beam (101) against such process target material...

20060093963 - Manufacturing method of semiconductor device: After forming a resist film on a Si substrate, a circuit pattern for a semiconductor integrated circuit, a first L-shaped length measuring pattern and a cross-shaped monitor pattern for alignment are formed on the resist film. Next, based on these patterns, the Si substrate is patterned. Thereafter, a polysilicon film...

20060093965 - Variable mask field exposure: A method of fabricating a plurality of integrated circuits on a substrate according to a first integrated circuit design. Each of the integrated circuits is formed with a plurality of layer patterns. At least one first layer pattern of the layer patterns is common with a second integrated circuit design,...

20060093966 - Semiconductor devices with sidewall conductive patterns methods of fabricating the same: A gate pattern is disclosed that includes a semiconductor substrate, a lower conductive pattern, an upper conductive pattern, and a sidewall conductive pattern. The lower conductive pattern is on the substrate. The insulating pattern is on the lower conductive pattern. The upper conductive pattern is on the insulating pattern opposite...

20060093967 - Methods of making an integrated waveguide photodetector: An integrated waveguide and photodetector which are evanescently coupled, and methods of making such integrated waveguide and photodetector....

20060093968 - Method of processing substrate and chemical used in the same: A method of processing an organic film pattern formed on a substrate, includes, in sequence, a heating step of heating the organic film pattern, and a main step of contracting at least a part of the organic film pattern or removing a part of the organic film pattern....

20060093969 - Method of processing substrate and chemical used in the same: The method of processing an organic film pattern formed on a substrate, includes, in sequence, a heating step of heating the organic film pattern, a removal step of removing one of an alterated layer and a deposited layer both formed on the organic film pattern, and a fusion/deformation step of...

20060093970 - Combinations of preservatives and sequestrants to avoid formation of isonitrile malodor: The present invention relates to a developer for photographic materials comprising at least one antioxidant and at least one polyvalent metal ion sequestrant, wherein the developer has reduced malodor....

20060093971 - Transmission mask with differential attenuation to improve iso-dense proximity: An apparatus, system and method to compensate for the proximity effects in the imaging of patterns in a photolithography process. A light exposure of a photoresist layer is effectuated in predetermined patterns through an exposure mask having light-transmissive openings in correspondence to the predetermined patterns. The exposure mask has areas...

20060093972 - Active hardmask for lithographic patterning: In an implementation, energy reaching the lower surface of a photoresist may be redirected back into the photoresist material. This may be done by, for example, reflecting and/or fluorescing the energy from a hardmask provided on the wafer surface back into the photoresist....

20060093974 - Thermally developable materials processable at lower temperatures: Black-and-white direct thermographic materials and photothermographic materials can be processed or developed at lower temperatures because of the incorporation of a tertiary sulfonium or quaternary phosphonium salt in an amount of at least 0.5 mol % based on total silver in the material....

20060093973 - Thermally developable materials with improved conductive layer: Backside conductive layers with increased conductive efficiency can be provided for thermally developable materials by formulating hydrophilic metal oxide clusters in a hydrophobic environment using low shear mixing conditions. The dry thickness and coating weight of the conductive layer are thereby reduced....