Radiation imagery chemistry: process, composition, or product thereof inventions 04/06

20060088771 - Anti-reflective sidewall coated alternating phase shift mask and fabrication method: A method for fabricating a phase shift mask is provided. A trenched phase shift mask having portions of a light-blocking layer thereon is formed. A layer of anti-reflective material is then formed on the trenched phase shift mask and the portions of the light-blocking layer. The anti-reflective material is then...

20060088770 - Method and apparatus for contact hole unit cell formation: A method for forming a contact hole unit cell is provided. A light transparent contact hole region of a first phase is positioned at a first plane. A light transparent phase-shifting region of a second phase is positioned at the first plane, the second phase being substantially out of phase...

20060088773 - Optical element with an opaque chrome coating having an aperture and method of making same: A substrate includes an opaque chrome coating on a surface of the substrate dry-etched to form an aperture, wherein chrome in the aperture is below detectable limit. A method of forming an opaque chrome coating on a substrate includes depositing an initial thickness of the opaque chrome coating on the...

20060088772 - Pattern-distributed mask: The present invention discloses a pattern-distributed mask. It comprises a plurality of mask regions whose images will be merged into a single image (e.g. by interleaving) on an image-carrier (e.g. wafer, mask blank). The pattern spacing on a pattern-distributed mask could be much larger than a conventional mask. For example,...

20060088774 - Photomask blank, photomask and fabrication method thereof: A light-shieldable film is formed on one principal plane of an optically transparent substrate, and the light-shieldable film has a first light-shieldable film and a second light-shieldable film overlying the first light-shieldable film. The first light-shieldable film is a film that is not substantially etched by fluorine-based (F-based) dry etching...

20060088775 - Color filter and liquid crystal display device: The present invention provides a color filter comprising a transmission area and reflection area in which at least one color pixel of red, green and blue pixels is formed of the same material, wherein a transparent area having no color layer is formed in a part of the reflection area,...

20060088776 - Image forming method and an image forming apparatus: developing a latent image formed on a cylindrical electrophotographic photoreceptor having a cylindricity of 5 to 40 μm, with a developer comprising toner in which a ratio Dv50/Dp50 of a 50% volume particle diameter Dv50 to a 50% number particle diameter Dp50 is 1.0 to 1.15, a ratio Dv75/Dp75 of...

20060088777 - Image forming method, a photoreceptor used for the apparatus, and an image forming unit: v

20060088778 - Image forming method, image forming apparatus and organic photoreceptor: An image forming method, comprising: forming an electrostatic latent image on a rotatable organic photoreceptor; forming a developing brush with a developing agent containing a toner on a rotatable developing sleeve; and bringing the developing brush in contact with the photoreceptor at a developing region so as to visualize the...

20060088779 - Toner compositions and processes for making same: A toner composition is provider including a branched amorphous polyester resin and a crystalline polyester resin, wherein the toner possesses rheological properties yielding desired characteristics....

20060088780 - Toner and image forming apparatus using the same: In a toner T of the present invention, the liberated mother particle ratio is set to be 10% or less and the liberated silica particle ratio is set to be 0.2-10%, thereby reducing the possibility that the liberated mother particles 18′ and the mother particles 18 with silica particles 19...

20060088781 - Hard magnetic core particles and a method of making same: Hard magnetic core particles for use in the development of electrostatic latent images are produced by combining ferric oxide, a strontium oxide precursor, an oxygenated boron compound and a binder to form a mixture, wherein the strontium oxide precursor is preferably present in an amount that provides SrO in a...

20060088782 - Method of preparing toner composition: A method of preparing a toner composition includes mixing a colorant dispersion and a latex solution and coagulating to form the core of the toner particle; adding a polymerization initiator to the core; and adding a monomer to the core to form a shell of the toner particle through polymerization...

20060088783 - Method of preparing an aggregate metal oxide particle dispersion having a desired aggregate particle diameter: A method of preparing a dispersion of aggregate metal oxide particles having a pre-selected average aggregate particle diameter comprising pre-selecting a desired percent-reduction in the average aggregate particle diameter of the metal oxide particles, providing a dispersion standard pertaining to a dispersion of the aggregate metal oxide particles, wherein the...

20060088784 - Effective photoresist stripping process for high dosage and high energy ion implantation: The present subject matter relates to a method of stripping a photoresist after the photoresist film has been subjected to a high dose and high energy ion implant process. The method involves soaking the photoresist film in DI water, dry etching with oxygen plasma, and immersing in Caro's acid solution...

20060088785 - Silver salt photothermographic dry imaging material, thermal development method of the same, and thermal development apparatus for the same: A photothermographic imaging material comprising a support having thereon, (a) a photosensitive layer containing an organic silver salt, photosensitive silver halide grains, a reducing agent and a binder, (b) a light-insensitive layer, and (c) a protective layer, wherein a weight reducing value from 25° C. to 100° C. by a...

20060088786 - Rewritable optical information recording medium, recording and reproducing methods, as well as recording and reproducing apparatus: A rewritable optical information recording medium including a recording layer composed of an organic dye film is provided, in which recording and erasing information can be performed reversibly by laser light irradiation. A rewritable optical information recording medium including at least one organic dye film which is substantially made of...

20060088787 - Nanocomposite negative resists for next generation lithographies: The present invention provides new high resolution nanocomposite resists applicable to next generation lithographies, methods of making these novel resists, and methods of using these new resists in lithographic processes to effect state-of-the-art lithographies. New nanocomposite negative resists comprising a photoacid generating component, a styrene component, and an optional polyhedral...

20060088788 - Composition for coating over a photoresist pattern: The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing amino group. The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material...

20060088789 - Maskless photolithography for using photoreactive agents: The present invention relates to maskless photolithography using a patterned light generator for creating 2-D and 3-D patterns on objects using photoreactive chemicals. In an embodiment, the patterned light generator uses a micromirror array to direct pattern light on a target object. In an alternate embodiment, the patterned light generator...

20060088790 - Method of manufacturing liquid crystal display device: A method of manufacturing a liquid crystal display device is provided. The method of manufacturing a liquid crystal display device includes performing an overlapping partitioned exposure process in one or two processes selected from a mask process of forming a gate line, a mask process of forming an active layer,...

20060088791 - Apparatus for and method of processing substrate: A puddle of developer supplied from a developer discharge nozzle is placed on a substrate held stationary. Next, the substrate is held stationary for a predetermined length of time, with the puddle of developer allowed to remain on the substrate. This causes a development reaction to proceed. Subsequently, deionized water...

20060088792 - Pattern forming method, semiconductor device manufacturing method and exposure mask set: First, a first exposure process is performed using dipole illumination with only a grating-pattern forming region as a substantial object to be exposed. Next, a second exposure process is performed with only a standard-pattern forming region as a substantial object to be exposed. A development process is then performed to...

20060083996 - Apparatus for exposing a substrate, photomask and modified illuminating system of the apparatus, and method of forming a pattern on a substrate using the apparatus: An exposure apparatus and photo-mask of the exposure apparatus can form a perpendicular line/space circuit pattern through only a single exposure process. The photo-mask includes a first line/space pattern oriented in a first direction, a second line/space pattern oriented in a second direction and lattice patterns, operating as polarizers, occupying...

20060083994 - Method and apparatus for removing radiation side lobes: A method and structure for removing side lobes is provided by positioning first and second radiation transparent regions of respective first and second phases at a first plane with the first and second phases being substantially out of phase. Further, positioning the first and the second region to cause radiation...

20060083995 - Method of correcting mask data, method of manufacturing a mask and method of manufacturing a semiconductor device: A method of correcting mask data performs a proximity effect correction process to a pattern shape of a photomask to form a photosensitive material film provided on a substrate to be processed or a film to be processed by using the photosensitive material film as a mask into a pattern...

20060083997 - Photomask with wavelength reduction material and pellicle: Disclosed is a photomask comprising a transparent substrate, an absorption layer proximate to the transparent substrate, and a pellicle mounted proximate to the transparent substrate. The absorption layer has at least one opening formed therein for receiving a wavelength-reducing material (WRM). The wavelength-reducing material and the absorption layer form a...

20060083993 - Process for the production of photomasks for structuring semiconductor substrates by optical lithography: The invention relates to a process for the production of photomasks for structuring semiconductors. A resist that contains a polymer having silicon-containing groups is used. During the structuring in an oxygen-containing plasma, the silicon atoms are converted into silica which protects absorber parts arranged under the silica from removal by...

20060083998 - Use of chromeless phase shift features to pattern large area line/space geometries: Method for using chromeless phase shift lithography (CPL) masks to pattern large line/space geometries and corresponding CPL masks. The method comprises using a short wavelength light to illuminate a CPL mask comprising a reticle having a plurality of phase-shifting features interspersed with non-phase-arranged in a substantially alternating two-dimensional pattern. When...

20060083999 - Negative charge controlling agent and static charge image developing toner using the same, and method for producing the same: A negative charge controlling agent, wherein: the negative charge controlling agent comprises polycondensation product obtained by a polycondensation reaction of phenols and aldehydes; and the phenols comprises a (A) mononucleus phenolic compound which has one phenolic hydroxy group in which a hydrogen is bonded at the ortho position of a...

20060084000 - Toner composition for electrophotographic imaging apparatus and method of preparing the same: A toner composition and a method of preparing the same provide a toner composition that includes a coloring agent, a charge control agent, a binder, a wax and an internal additive, wherein the coloring agent and wax are contained as a master batch, and the internal additive includes toner particles...

20060084001 - Polyester resin for toner, toner for developing electrostatic charge image and method for forming image: A polyester resin for toner, wherein an acid component of the polyester comprises (1) disproportionated rosin and (2) terephthalic acid and/or isophthalic acid, an alcohol component of the polyester comprises (3) glycidyl ester of tertiary fatty acid and (4) an aliphatic diol containing from 2 to 10 carbon atoms, and...

20060084002 - Two-component developer and image formation method: A two-component developer and an image formation method for two-component development type are provided. With this developer and this method, even if toners have a small grain diameter and a high density of pigments for economizing the toner consumption, cracking and toner spent caused by the stress from carriers are...

20060084003 - Two-component developer and image formation method: A two-component developer and an image formation method for two-component development type are provided. With this developer and this method, even if toners have a small grain diameter and a high density of pigments for economizing the toner consumption, cracking and toner spent caused by the stress from carriers are...

20060084004 - Developer, developer cartridge, and image forming apparatus: A method of producing a developer includes the steps of: kneading at least a resin and a colorant; reducing the kneaded resin and colorant to coarse powders; adding an additive agent to the coarse powders; reducing the coarse powders with the additive agent to fine powders; and classifying the fine...

20060084005 - Means to enable slitting of micro-encapsulated media: A continuous finishing operation that utilizes a method of slitting microencapsulation imaging media entails irradiating microencapsulated imaging media with a light sensitive side forming a first polymerization pattern. The light sensitive side comprises an emulsion with capsules containing leuco forming dyes suspended in a matrix containing developer. A frequency of...

20060084006 - Donor substrate and fabrication method of organic light emitting display using the same: A donor substrate for use in an organic light emitting display comprises a base substrate and a transfer layer disposed on the base substrate. A selective heat generation structure is interposed between the base substrate and the transfer layer. The selective heat generation structure has a heat generation region from...

20060084007 - Method for curing aminoplasts: A method for curing aminoplasts, during which layers having layer thicknesses of up to 300 um or filaments and fiber fibrids having a diameter of up to 300 um, which consist of: i) 95 to 99.95% by mass of solvent-free meltable aminoplast polycondensates with molar masses ranging from 1000 to...

20060084008 - Compressible flexographic printing plate construction: The present invention relates to an improved compressible flexographic printing plate that uses a compressible layer comprising a polyurethane (meth)acrylate resin and microspheres. The process of the invention produces a chemically fused printing plate that eliminates the need for an adhesive to secure the compressible layer to the back of...

20060084010 - Lithographic process: In a lithographic process for producing microstructures by means of a direct write system, predefined areas are exposed by means of a focussed beam, particularly a laser beam, in order to produce microstructures. This process is to be further developed such that structures can be produced which are smaller than...

20060084009 - Method for forming self-synthesizing conductive or conjugated polymer film and application: The present invention discloses a method by utilizing chemical reaction or specific attractive forces (complexation or hydrogen bonding) for forming self-synthesizing conductive or conjugated polymer film and its application. First of all, at least one photoresist layer with a first functional group and a specific pattern is formed, so that...

20060084011 - Printed wiring board manufacturing method: According to this manufacturing method, a copper foil is attached to both sides of an insulating material to form a substrate. First, a large number of through-holes is made in the substrate and the inside of the through-holes is made electrically conductive. Then, after one side of the substrate is...

20060084012 - Decal transfer lithography: A method of making a microstructure includes selectively activating a portion of a surface of a silicon-containing elastomer, contacting the activated portion with a substance, and bonding the activated portion and the substance, such that the activated portion of the surface and the substance in contact with the activated portion...

20060084013 - Developing solution composition and process for forming image using the composition: A developer composition for developing a lithographic printing plate having a negative recording layer on which an image is recorded via an infrared laser, the composition containing a nonionic surfactant, and a process for forming an image on a lithographic printing plate. The process comprises the steps of imagewise exposing...

20060084015 - Color diffusion transfer film unit and image-forming method using the color diffusion transfer film unit: A color diffusion transfer film unit, containing a light-sensitive sheet, a transparent cover sheet provided and an alkaline processing composition-containing material, in which a silver halide emulsion contained in the light-sensitive sheet is a negative type silver halide emulsion, and in which a total coating amount of the silver halide...

20060084014 - Photographic colour material containing a resorcinol derivative as black coupler: A colour photographic material is disclosed comprising a black image forming coupler substituted in the 2, 4 and/or 6 position shown by formula (I) or formula (II), where in LINK represents a divalent linking group, BALL represents a group that prevents the coupler from diffusing away from the layer containing...

20060084016 - Photothermographic imaging material and method for forming image: A photothermographic imaging material including a support; an image forming layer containing an organic silver salt, a photosensitive silver halide, a binder and a silver ion reducing agent, the image forming layer being provided on the support; and a cyan coloring leuco dye. The photosensitive silver halide contains silver halide...

20060078803 - Hologram recording material, hologram recording method and optical recording medium: A hologram recording material is provided and includes at least a sensitizing dye capable of absorbing light having a hologram recording wavelength to generate an excited state thereof, and an interference fringe-recording component capable of recording interference fringes providing a refractive index modulation by an electron transfer or an energy...

20060078802 - Holographic storage medium: Disclosed herein is a method of manufacturing a data storage media comprising mixing a photoactive material, a photosensitizer and an organic binder material to form a holographic composition, wherein the photoactive material undergoes a change in color upon reaction with the photosensitizer; and molding the holographic composition into holographic data...

20060078804 - Calibration of optical line shortening measurements: A system and method of calibrating optical line shortening measurements, and lithography mask for same. The lithography mask comprises a plurality of gratings, with a calibration marker disposed within each grating. The mask is used to pattern resist on a semiconductor wafer for purposes of measuring and calibrating line shortening....

20060078805 - Lithographic apparatus and device manufacturing method: By proper selection of illumination configuration, mask transmission, and mask bias, complex patterns of contact holes may be imaged with sufficient latitude for manufacturing at minimum half-pitches of k1=0.40 or below. In an embodiment, a method of transferring an image of a mask pattern onto a substrate with a lithographic...

20060078806 - Lithographic apparatus and device manufacturing method: A method for transferring an image of a mask pattern through a pitch range onto a substrate is presented. In an embodiment, the method includes illuminating the mask pattern of an attenuated phase shift mask using a multipole illumination that includes an on-axis component and an off-axis component, the mask...

20060078807 - Lithographic mask alignment: Systems and methods of aligning a lithographic mask are described. In one aspect, a substrate and a lithographic mask are aligned based at least in part on a motive force between a substrate alignment mark on the substrate and a mask alignment mark on the lithographic mask that induces movement...

20060078808 - Method for measuring overlay and overlay mark used therefor: An overlay measurement method and related apparatus are provided in which overlay measurement data is calculated on the basis of distances measured in disparate manners in relation to whether the current process is an initial process or a subsequent process. Related overlay marks are also described....

20060078810 - Electrophotographic photoreceptor: An electrophotographic photoreceptor comprising an electroconductive substrate and a photosensitive layer formed thereon, characterized in that the photosensitive layer contains a polyester resin which is a copolymerized polyester resin having a repeating ester structure (A) comprising a bivalent phenol residue represented by the following formula (1) and an aromatic dicarboxylic...

20060078809 - Electrophotographic photoreceptor, and image forming method, image forming apparatus and process cartridge using the electrophotographic photoreceptor: wherein Ar1 represents a substituted or an unsubstituted monovalent group or bivalent group formed of an aromatic hydrocarbon skeleton; Ar2 represents a monovalent group or a bivalent group formed of an aromatic hydrocarbon skeleton or heterocyclic compound skeleton having one or more tertiaryamino group; and at least one of B1...

20060078811 - Magnetic toner: According to the present invention, a magnetic toner comprising magnetic toner particles including at least a binder resin and magnetic particles is provided, wherein an isoelectric point of the magnetic particles is pH 4.0 or less, in order to provide a magnetic toner stably having an optimum charged amount regardless...

20060078812 - Magnetic toner: To provide a magnetic toner which is excellent in durability and developability even in the case of being applied to high-speed developing process or being used in a large-capacity process cartridge amount of toner in which is increased, and which has high degree of blackness. Provided is a magnetic toner...

20060078813 - Magnetic toner and image forming method using the same: Magnetic toner involves magnetic powder 1 having the particle shape of an octahedron 2 that is a convex polyhedron surrounded by eight triangles as a basis, each of the vertexes and edges of the octahedron being in a curved surface shape, and having a portion 3 that can be taken...

20060078814 - Toner processes and compositions thereof: The invention relates to color toner compositions prepared from a process for the preparation of a dry toner powder from an aqueous pigment concentrate dispersion comprising: blending at least an aqueous-based pigment concentrate dispersion and a resin to produce a paste; charging the paste to an extruder to generate an...

20060078815 - Polyester resin composition for toner and toner: A toner resin composition comprising a linear polyester resin (A) containing a C3 to C10 aliphatic diol component and a linear polyester resin (B) containing a C3 to C10 aliphatic diol component which differs from the linear polyester resin (A), or further comprising a vinyl-based resin (C), and a toner...

20060078816 - Binder resin for toner and electrophotographic toner for static charge image development containing the same: A polyester binder resin for a toner that excels in low-temperature fixing properties, offset resistance, development durability, long-term storability, electrification properties, pulverizability, etc.; and a toner containing the same. The binder resin for a toner is comprised of a polyester resin and, dispersed therein, a wax having a substituent selected...

20060078817 - Toner processes and compositions thereof: The invention relates to a process for the preparation of a dry toner powder from an aqueous pigment concentrate dispersion by blending at least an aqueous-based pigment concentrate dispersion and a resin compound to produce a paste; charging the paste to an extruder to generate a hot melt extrusion; dispersing...

20060078818 - Near-field exposure photoresist and fine pattern forming method using the same: A near-field photoresist for formation of a fine pattern with by near-field exposure includes an alkali-soluble novalac resin, a diazyde-type photosensitizer which is photoreactive by near-field exposure, a photoacid generator which generates acid by the near-field exposure, and a solvent....

20060078822 - Lithographic printing plate precursor requiring no dampening water: A lithographic printing plate precursor requiring no dampening water, which is prevented from the scratching of the non-image portion during the development processing step and the printing step to solve the problem of the ink stain on prints, is provided, which is a lithographic printing plate precursor requiring no dampening...

20060078819 - Photopolymer composition suitable for lithographic printing plates: Radiation-sensitive elements are described whose radiation-sensitive coating comprises both a photopolymerizable oligomer with a biuret structural unit and a photopolymerizable phosphazene oligomer....

20060078824 - Photosensitive element, photosensitive element roll, process for the preparation of resist pattern using the same, resist pattern, resist pattern laminated substrate, process for the preparation of wiring pattern and wiring pattern: There are disclosed a photosensitive element comprising a support film which comprises a biaxially oriented polyester film and a photosensitive resin composition layer formed on one surface of the polyester film; wherein a resin layer containing fine particles is formed on the opposite surface of the support film to which...

20060078823 - Positive resist composition and pattern-forming method using the same: A positive resist composition comprising (A) resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and capable of decomposing by the action of an acid to increase the solubility in an alkaline developer, (B) a compound capable of generating an acid upon treatment with one of an actinic ray and...

20060078821 - Positive-tone radiation-sensitive resin composition: p

20060078820 - Resist with reduced line edge roughness: Novel photoresists containing at least about 0.2 molar ratio of a base with respect to the concentration of a photoacid generator present and their preparation are described. It has been discovered that inclusion of a sufficient amount of base counteracts the detrimental effects of photoacid generators, thus providing resists having...

20060078825 - Optical recording medium and method for recording data in the same: An optical recording medium includes a substrate, two recording layers provided on the substrate and two dielectric layers each provided adjacent to one of the recording layers, the optical recording medium being constituted so that when it is irradiated with a laser beam having a wavelength λ via an objective...

20060078826 - Method for manufacture of lithographic printing plate precursor no dampening water: A method for manufacturing a lithographic printing plate precursor requiring no dampening water including: a support, a light-to heat conversion layer; and a silicone rubber layer in this order. The method includes: subjecting a surface of the support to a corona discharge treatment in a discharge amount of 0.01 to...

20060078827 - Method to restore hydrophobicity in dielectric films and materials: Silica dielectric films, whether nanoporous foamed silica dielectrics or nonporous silica dielectrics are readily damaged by fabrication methods and reagents that reduce or remove hydrophobic properties from the dielectric surface. The invention provides for methods of imparting hydrophobic properties to such damaged silica dielectric films present on a substrate. The...

20060078828 - System and method for exposure of partial edge die: According to one embodiment of the present invention, a method of forming a semiconductor device includes forming a photoresist layer on a surface of a wafer. The wafer includes an array of die that includes a plurality of complete die and at least one partial edge die. The wafer has...

20060078829 - Method of patterning a thick-film paste material layer, method of manufacturing cold- cathode field electron emission device, and method of manufacturing a cold-cathode field electrin emission display: In a method of manufacturing a cold cathode field emission device, a cathode electrode 11, an insulating layer 12 and a gate electrode 13 are formed; an opening portion 14 is formed through the gate electrode 13 and the insulating layer 12 to expose the cathode electrode 11; a resist-material...

20060078830 - Bank structure, method of forming bank structure, device, electro-optical device and electronic apparatus: A bank structure in which a recess corresponding to a pattern formed of a functional liquid is provided includes first recess provided corresponding to a first pattern, and a second recess provided on part of the first recess and corresponding to a second pattern. The second recess has a shape...

20060078831 - Multiphoton curing to provide encapsulated optical elements: Methods of fabricating optical elements that are encapsulated in monolithic matrices. The present invention is based, at least in one aspect, upon the concept of using multiphoton, multi-step photocuring to fabricate encapsulated optical element(s) within a body of a photopolymerizable composition. Imagewise, multi-photon polymerization techniques are used to form the...

20060078832 - Compositions for multi-color, light activated imaging: This invention relates to a direct, multi-color imaging composition, comprising a radiation absorber (antenna), a color former mixture of at least two color formers, and one or more activators, wherein one of the color formers reacts at a first elevated temperature to create a first color and another of the...

20060078833 - Photothermographic materials containing silver halide sensitized with combination of compounds: Photothermographic materials are designed with increased photospeed by chemical sensitizing the photosensitive silver halide grains with a combination of compounds. A first chemical sensitizer is a specific gold(III)-containing compound and a second chemical sensitizer is a sulfur-containing compound that is a diphenylphosphine sulfide. The molar ratio of the gold (III)-containing...

20060078835 - Photothermographic material and image forming method: A photothermographic material including, on at least one surface of a support, at least a photosensitive silver halide containing a silver iodide at 40 mol % or more, a non-photosensitive organic silver salt, and a reducing agent, wherein the photothermographic material contains two or more kinds of the reducing agent...

20060078834 - Squarylium compound and photothermograhic material containing the same: p

20060073392 - Holographic storage medium: Disclosed herein is a method of manufacturing a data storage media comprising mixing a photochromic dye with an organic material or an inorganic material to form a holographic composition; and molding the holographic composition into holographic data storage media. Disclosed herein too is an article comprising a photochromic dye and...

20060073393 - Switchable holographic gratings: The present invention includes systems and compositions of holographic grating structures devices and methods for fabricating such holographic grating structures. The method comprises the steps of preparing a composite mixture comprising a polymerizable matrix, a liquid crystal, and a photo-oxidant dye, producing an interference pattern from two interference beams, wherein...

20060073395 - Contact material and system for ultra-clean applications: Techniques for minimizing contamination by particles that wear off of components that come into and out of contact with each other. The invention involves forming at least one of the components out of a magnetic material so that the particles that wear off of the component are magnetic themselves. Then...

20060073397 - Masking arrangement and method for producing integrated circuit arrangements: A masking arrangement and method for producing integrated circuit. arrangements are described. The masking arrangement includes a substrate with lithographic patterns. The lithographic patterns are arranged in different partial regions for integrated circuits that have mutually different wiring of components as well as for test patterns. Auxiliary patterns are provided...

20060073396 - Multi-exposure semiconductor fabrication mask sets and methods of fabricating such multi-exposure mask sets: Mask sets are provided which may be used to define a first pattern region that has a first pitch pattern and a second pattern region that has a second pitch pattern during the fabrication of a semiconductor device. These mask sets may include a first mask that has a first...

20060073394 - Reduced mask count gate conductor definition: A combined wide-image and loop-cutter pattern is provided for both cutting and forming a wide-image section to a hard mask on a substrate formed by sidewall imaging techniques in a reduced number of photolithographic steps. A single mask is formed which provides a wide mask section while additionally providing a...

20060073398 - Black matrix composition, black matrix prepared using the same, method of forming a black matrix pattern using the same and method of manufacturing a color filter substrate using the same: A black matrix composition includes about 40 parts by weight of a pigment dispersion, about 0.1 to about 1.0 part by weight of a photoinitiator, about 5 to about 20 parts by weight of a photo-polymerizable monomer, about 5 to about 20 parts by weight of a binder resin including...

20060073399 - Silicon layers for electrophotographic photoreceptors and methods for making the same: Silicon-containing layers for electrophotographic photoreceptors which have high mechanical strength, improved electrophotographic characteristics and improved image deletion characteristics even under conditions of high temperature and high humidity are provided. Such silicon-containing layers include silicon-containing compounds, which may be crosslinked, and antioxidants that can be selected from hindered phenol antioxidants, hindered...

20060073400 - Electrophotographic photoreceptor: l

20060073403 - Azomethine dye and metal complex dye, as well as color toner and ink-jet ink using the same:

20060073401 - Electrostatic charge image developing toner: wherein X represents H or —CO—R4; R4 represents an alkyl group having 1 to 4 carbon atoms and the alkyl group may have a substituent; R1 though R3 independently represent an alkyl group having 10 to 30 carbon atoms and the alkyl group may have a substituent; and R1 through...

20060073402 - Polymerized toner: An object of the present invention is to provide a polymerized toner which has low-temperature fixing ability and is not likely to leak the toner from a developing cartridge, especially, when the toner is used for a high-speed image-forming device. A polymerized toner produced by polymerizing a polymerizable monomer composition...

20060073404 - Process for preparing toner: A process for preparing a toner comprising the steps of (1) pulverizing a pulverized product of a composition comprising a resin binder and a colorant with a jet type pulverizer in the presence of fine inorganic oxide particles, to give an upper limit cut-off classification powder; and (2) classifying the...

20060073405 - Carrier for developer for developing electrostatic latent image, image forming method using same and image forming apparatus using same: p

20060073406 - Method of fabricating donor substrate and method of fabricating oled using the donor substrate: A method of fabricating a donor substrate and a method of fabricating an organic light emitting display (OLED) using the donor substrate. The method of fabricating the donor substrate includes preparing a base substrate that includes at least one transfer region and at least one non-transfer region, forming a light-to-heat...

20060073408 - Alicyclic unsaturated compound, polymer, chemically amplified resist composition and method for forming pattern using said composition: A noble alicyclic unsaturated compound represented by the general formula (1): wherein at least one of R1 and R2 is a fluorine atom or a fluorinated alkyl group; a polymer formed by the polymerization of a polymer precursor comprising the alicyclic compound. The polymer is useful, in the lithography using...

20060073411 - Chemically amplified resist composition: The present invention provides a chemically amplified resist composition comprising a treated resin (1), an acid generator and a solvent, wherein resin (1) is (a) a (meth)acrylic resin which is insoluble or poorly soluble in an alkali aqueous solution and becomes soluble in an alkali aqueous solution by the action...

20060073407 - Coloring matter absorbing near-infrared light and filter for cutting off near-infrared ray: The coloring matter absorbing a near-infrared ray is excellent in the resistance to heat and moisture, and thus exhibits an ability of absorbing a near-infrared ray not lowering for a long period of time. A filter for cutting off a near-infrared ray manufactured by using the coloring matter can be...

20060073414 - Hydrophilic polymer having silane coupling group terminal and lithographic printing plate base: A polymer compound includes i) a polymerization unit represented by —(CHR3—CR4(-L1-Y1))x—(CHR5—CR6(-L2-Y2))y-; and ii) a silane coupling group represented by —S—(CH2)n—Si—(R1)m(OR2)3-m, as a terminal of the polymer, wherein R1, R2, R3, R4, R5, R6, n, x, y, L1, L2, Y1 and Y2 are defined in the specification. A lithographic printing plate...

20060073409 - Imaging compositions and methods: An imaging composition, article and method of imaging are disclosed. The imaging composition is energy sensitive such that upon application of a sufficient amount of energy to the composition a color or shade change is affected. The imaging composition is coated on an article to form an energy sensitive article,...

20060073410 - Photosensitive composition: in which A represents an optionally substituted aromatic ring or an optionally substituted hetero ring; X represents an oxygen atoms a sulfur atom, or —N(R6)—; and R1, R2, R3, R4, R5, and R6 each independently represents a hydrogen atom or a monovalent non-metal atomic group; an activator compound being capable...

20060073412 - Positive type photosensitive paste composition for pdp electrode, pdp electrode prepared therefrom, and pdp comprising the pdp electrode: where R1 is H or CH3; R2 is a saturated or unsaturated C1-C6 alkyl group or a C1-C6 group containing an ether group, a carbonyl group or an ester group; R3 is a group having a hydroxyl group; R4 is hydrogen or a group having a carboxylic group; and R5...

20060073413 - Silicon-containing resist composition and patterning process: A resist composition is provided comprising a polysiloxane, a specific acid generator, a nitrogen-containing organic compound, and a solvent. The resist composition exerts high-resolution performance without the problem of a T-top profile and is suited for the bilayer resist process using ArF exposure....

20060073415 - Multilayer imageable element: Multilayer, thermally imageable elements useful as lithographic printing plate precursors are disclosed. The imageable elements comprise a substrate, an underlayer over the substrate, an underlayer over the substrate, and a top layer over the underlayer. The top layer contains a co-polymer that alkylene glycol side chains, polyalkylene glycol side chains,...

20060073416 - Mechanically robust interconnect for low-k dielectric material using post treatment: In an embodiment, a trench is formed above a via from a photo resist (PR) trench pattern in a dielectric layer. The trench is defined by two sidewall portions and base portions. The base portions of the sidewalls are locally treated by a post treatment using the PR trench pattern...

20060073418 - Method of making a negative-working lithographic printing plate: A method for preparing a negative-working lithographic printing plate is provided which comprises the steps of (1) providing a lithographic printing plate precursor comprising on a grained and anodized aluminum support, having a hydrophilic surface, a coating comprising (i) polymer particles which are core-shell particles having a hydrophobic heat-softenable core...

20060073417 - Photopolymer plate and method for imaging the surface of a photopolymer plate: A flexographic printing plate and a method for making a flexographic printing plate. According to one aspect, the method comprises the steps of providing a photopolymer substrate having a top surface pretreated with a non-gelatinous inkjet receptive coating; image-wise ink jetting an inkjet composition onto a portion of the pretreated...

20060073419 - Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for producing the same: The object of the present invention is to provide a process for forming a resist pattern that is capable to utilize excimer laser beam, the thickening level of the resist pattern is controllable uniformly, constantly and precisely, without being affected substantially by environmental changes such as temperatures and humidity, and...

20060073420 - Resist pattern thickening material, resist pattern and process for forming the same, and semiconductor device and process for manufacturing the same: The present invention provides a resist pattern thickening material and the like which can thicken a resist pattern and form a fine space pattern. The resist pattern thickening material contains: a resin; a crosslinking agent; and at least one type selected from cationic surfactants, amphoteric surfactants, and non-ionic surfactants selected...

20060073423 - Electronic device manufacture: Electronic devices having a metal line-containing layer including an air gap region and a low-k dielectric material region where the air gap region includes a dense packing of metal lines is provided. Methods of forming such electronic devices are also provided....

20060073421 - Method of forming a light guide plate insert mold: A substrate is provided, and a surface treating process is performed on the surface of the substrate. Then, a plurality of photo resist patterns are formed on the substrate, and a flow process is performed so that each photo resist pattern has a microlens surface. Finally, a metal layer is...

20060073422 - Portable conformable deep ultraviolet master mask: Mastering techniques are described that can improve the quality of a master used in data storage disk manufacturing. In particular, the techniques can improve resolution of the features created on the master. The techniques include coating a master substrate layer with a tri-layer structure composed of a top photoresist layer,...

20060073424 - Optical coatings: Systems and techniques involving optical coatings for semiconductor devices. An implementation includes a substantially isotropic, heterogeneous anti-reflective coating having a substantially equal thickness normal to any portion of a substrate independent of the orientation of the portion....

20060073425 - Pattern designing method, photomask manufacturing method, resist pattern forming method and semiconductor device manufacturing method: There is disclosed a method of designing a pattern comprising: preparing a first design pattern containing a first hole pattern, obtaining a distance between the first hole pattern and a pattern adjacent to the first hole pattern, obtaining an enlarged amount of the first hole pattern based on the distance...

20060073426 - Method for simulating spot varnish on a surprint proof: A method of forming a glossy area on a pre-press proof is provided, wherein the method includes printing a spot varnish layer, wherein the presence of the spot varnish enhances the glossiness of the overprinted color layers of the image. The method provides a pre-press proof simulating a printed spot...

20060073427 - Silver halide photographic sensitive material: The present invention relates to a silver halide photographic material exhibiting superior process stability even when processed at a relatively low replenishing rate. The silver halide photographic material comprising on a support at least one silver halide emulsion layer is characterized in that the silver halide emulsion layer contains at...

20060073429 - Photothermographic material: A photothermographic material having a support, an image forming layer which is disposed on the support and contains at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, at least one non-photosensitive layer which is disposed on the same side of the support...

20060073428 - Photothermographic material and image forming method: A photothermographic material having, on at least one side of a support, an image forming layer containing at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, wherein (1) the photosensitive silver halide comprises tabular grains having a mean aspect ratio of 2...