Radiation imagery chemistry: process, composition, or product thereof inventions 03/06

20060068300 - Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method: In a mask blank substrate to be chucked by a mask stage of an exposure system, the flatness of a rectangular flatness measurement area excluding an area of 2 mm inward from an outer peripheral end surface on a main surface of the mask blank substrate on its side to...

20060068302 - Method of patterning a substrate by feeding mask defect data forward for subsequent correction: A method is provided for patterning a substrate. In such method a first mask, for example, a front-end-of-line (“FEOL”) mask is fabricated, the first mask including a plurality of first features such as FEOL features which are usable to pattern regular elements and redundancy elements of a substrate such as...

20060068299 - Multi wavelength multi layer printing: A mask for exposing a first layer and a second layer on a process substrate, where the first and second layers are two separate layers of an integrated circuit. The mask includes a mask substrate that is substantially completely transmissive to a first wavelength of light and a second wavelength...

20060068301 - Pattern decision method and system, mask manufacturing method, image-forming performance adjusting method, exposure method and apparatus, program, and information recording medium: Based on adjustment information on the adjustment unit under predetermined exposure conditions and information on the corresponding image-forming performance of the projection optical system, pattern correction information, information on a permissible range of the image-forming performance, and the like, a calculation step (steps 114 to 118) and a setting step...

20060068298 - Transfer mask blank, transfer mask, and transfer method using the transfer mask: It is an object of the present invention to effectively manufacture a charged-particle beam lithography mask, an X-ray lithography mask, or an extreme ultraviolet beam lithography mask by using, for example, an existing writer such as an electron beam writer for photomasks, while achieving improvement in processing accuracy of a...

20060068303 - Color filter: The main objection of the present invention is to provide a high quality color filter having a colored layer formed by ink jet method and without color irregularity, a void, or the like. To achieve the object, the present invention provides a color filter comprising a base material, a light...

20060068304 - Alignment method of exposure mask and manufacturing method of thin film element substrate: A method for aligning an exposure mask comprises: using a plurality of hologram masks, on which an alignment mark is formed; aligning position of the hologram masks toward an object to be exposed and on which an alignment mark is also formed, with a plurality of times by using both...

20060068305 - Method for aligning exposure mask and method for manufacturing thin film device substrate: A method for aligning an exposure mask, comprises :using a plurality of hologram masks, on which alignment marks are formed,; aligning position of the hologram masks toward an object, which is exposed and on which alignment marks are also formed, a plurality of times by using both alignment marks, wherein...

20060068306 - Toner, image forming apparatus using the same, and image forming method: An image forming apparatus of the present invention includes a latent electrostatic image bearing member, a latent electrostatic image forming unit configured to form a latent electrostatic image on the latent electrostatic image bearing member, at least three developing units each configured to develop the latent electrostatic image using a...

20060068307 - Organic photoreceptor, an image forming method, an image forming apparatus and a process cartridge: An organic photoreceptor for an electro-photography, comprising a conductive support member and at least a light sensitive layer, an comprising a toner image forming surface of the photoreceptor having a surface roughness Ra between 0.02 μm and 0.1 μm and a surface roughness Rz between 0.1 μm and 1 μm,...

20060068308 - Image forming process, image forming apparatus, and process cartridge: An image forming process is provided, which is consisting of forming step for forming a latent electrostatic image on a photoconductor, developing step, transferring step, and fixing step, wherein the photoconductor contains the crosslinked charge transporting layer containing a cured product formed from at least a radical polymerizable compound having...

20060068309 - Imaging member: A charge transport layer for an imaging member comprising a charge transport material with a nitrogen molecular defense system not exhibiting early onset of charge transport layer fatigue cracking. The nitrogen molecular defense system includes attaching bulky organic groups to charge transport materials. The bulky groups aid in preventing recrystallization...

20060068310 - Electrophotographic photoreceptor, drum cartridge employing the electrophotographic photoreceptor, and image-forming apparatus: The present invention provides an electrophotographic photoreceptor which has high light resistance, has high durability in exposure to oxidizing gases such as ozone and NOx, is excellent in mechanical properties such as printing durability, wearing resistance, marring resistance, and slip properties in repetitions of use, and further has excellent electrical...

20060068311 - Toner composition: A toner composition includes toner particles containing a colorant, a binder, a charge control agent, a releasing agent, and an external additive containing silica, silicon carbide, magnesium stearate, and polyvinylidene fluoride. The toner composition of the present invention has a stable image density and no fogging/filming so that improved quality...

20060068313 - Electrophotography and image forming apparatus: The object of the present invention is to provide a developer having a sharp charge amount distribution and bringing out high-quality image without substantially smearing a charging unit, developing units, a photoconductor, and an intermediate transferring member by the developer, namely, a developer capable of providing an appropriate image density...

20060068312 - Toner and method for producing the same, and image-forming method using the same: There are provided: a method for producing a toner containing to granulate a toner and to subjecting the granulated toner to at least washing with an alkali washing solution, in which the total organic carbon amount extractable from the alkali-washed toner is 200 ppm/g or less; a toner comprising polyester...

20060068314 - Magnetic mono-component toner for developing electrostatic latent image and image forming method: e

20060068315 - Color forming compositions and associated methods: Compositions and methods for production of color images which are developable at desired wavelengths are disclosed and described. The color forming composition can include a color former which is a spiro dye. The color forming composition can include a radiation antenna admixed with or in thermal contact with the color...

20060068316 - Marked article and method of making the same: A method of marking a thermoplastic article can comprise: combining a thermoplastic with a light-marking additive to form a composition, forming the composition into an article having a maximum optical absorption wavelength; and illuminating, at a marking wavelength, at least a portion of the article with a device having a...

20060068325 - Oxime derivatives and the use thereof as latent acids: m

20060068323 - Photosensitive lithographic printing plate: A photosensitive lithographic printing plate comprising: a hydrophilic support; a photosensitive layer; and a protective layer, wherein the photosensitive layer contains a compound having an ethylenically unsaturated double bond, a high molecular binder having a crosslinking group and a hexaaryl biimidazole compound; and the protective layer has an oxygen permeability...

20060068318 - Pixelated photoresists: A deliberately engineered placement and size constraint (molecular weight distribution) of photoacid generators, solubility switches, photoimageable species, and quenchers forms individual pixels within a photoresist. Upon irradiation, a self-contained reaction occurs within each of the individual pixels that were irradiated to pattern the photoresist. These pixels may take on a...

20060068321 - Planographic printing plate precursor: In general formula (1), R1 represents an alkyl group or a cyclic group, x represents 0 or 1, and A represents a bivalent bonding group. According to the invention, a positive planographic printing plate precursor for use with infrared lasers having excellent chemical resistance and wide image development latitude can...

20060068317 - Poly(arylene ether) composition: A composition comprising poly(arylene ether), poly(alkenyl aromatic) resin, bis(hydroxy benzene) diphosphate, a hindered amine light stabilizer, and an ultra-violet light absorbing compound, wherein the composition has a color shift (dE) less than 6....

20060068324 - Positive photosensitive resin and novel dithiol compound: The positive photosensitive resin can alleviate the problems of conventional technique and, when used for formation of a fine patter in semiconductor production, can show a higher resist sensitivity than conventional products and can bring about effects such as reduction in impurities after development. The dithiol compound is novel and...

20060068322 - Positive resist composition and pattern forming method using the same: A positive resist composition satisfying high sensitivity, high resolution and good line edge roughness at the same time, and a pattern forming method using the composition, are provided, which is a positive resist composition comprising (A) a resin of which solubility in an alkali developer increases under the action of...

20060068319 - Processless lithographic printing plate: A positive-working, heat-sensitive material for making a lithographic printing plate by direct-to-plate recording is disclosed. The material comprises a hydrophobized grained and anodized aluminum support and a layer comprising a compound capable of converting light into heat provided onto said support, said support being obtainable by RF plasma treatment of...

20060068320 - Resist composition and method of pattern formation with the same: A resist composition comprises (A) a compound having a molecular weight of 3,000 or lower which has in its molecule a structure having two or more monovalent anions and a structure having two or more monovalent cations....

20060068326 - Optical information recording medium: wherein Dye represents a dye residue having an absorption as high as 10000 (cm−1·mol−1) or more as a molar extinction coefficient for light having a wavelength of 450 nm to 900 nm; L represents a divalent connecting group or a single bond; UV represents a dye residue having an absorption...

20060068327 - Lithographic printing plate precursor: A lithographic printing plate precursor comprising: a hydrophilic support; a photosensitive layer containing a sensitizing dye, a polymerization initiator, a chain transfer agent, a compound having an ethylenically unsaturated double bond and a polymer binder having a crosslinkable group; and a protective layer containing an inorganic stratiform compound, in this...

20060068328 - Photosensitive lithographic printing plate: in which R represents an alkyl group which may have a substituent or an aryl group which may have a substituent; and A represents an atomic group necessary for forming a 5-membered or 6-membered hetero ring containing a carbon atom together with the N═C—N linkage, and A may have a...

20060068329 - Antistatic layer for electrically modulated display: The present invention relates to a display comprising at least one substrate having at least one electrically modulated imaging layer thereon, at least one patterned electrically conductive layer, and at least one antistatic layer....

20060068331 - Exposure method: An exposure method includes the steps of providing a mask that arranges a contact-hole pattern and a pattern smaller than the contact-hole pattern, and illuminating the mask using plural kinds of light so as to resolve the contact-hole pattern and restrain the smaller pattern from resolving on an object to...

20060068330 - Method for forming photosensitive polyimide pattern and electronic devices having the pattern:

20060068332 - Method for fabricating carrier structure integrated with semiconductor element: A method for fabricating a carrier structure integrated with a semiconductor element is proposed. First, a carrier having at least one opening therein is provided, and at least one semiconductor element is embedded in the opening. Then, a photosensitive insulating layer is formed on the carrier and filled into a...

20060068333 - Manufacturing method of plasma display panel: At least one plasma display panel having barrier ribs for partitioning discharge cells is manufactured from first and second substrates. The manufacturing method includes forming the barrier ribs according to a process including forming a barrier rib forming layer on the first substrate, forming a resist covering the barrier rib...

20060068334 - Phase-shifting optical maskless lithography enabling asics at the 65 and 45 nm nodes: Phase stepped and paired piston SLM configurations are described, with attention to rasterization and image stability. In contrast to attenuated phase-shift reticle performance of simple titling mirror SLMs, these configuration have phase shifting capabilities emulating a hard phase shift reticle and beyond. To use a straight-forward rasterization architecture where individual...

20060068335 - Coating compositions for use with an overcoated photoresist: Compositions and methods are provided that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred coating composition and methods of the invention can provide enhanced resolution of a patterned overcoated photoresist layer and include use...

20060068336 - Pyrrolotriazole compound: Disclosed is a pyrrolotriazole compound represented by the following formula (I) and having an organic compound incorporated into crystals thereof or a pyrrolotriazole compound represented by the following formula (II) and having an alcohol incorporated into crystals thereof....

20060068337 - Substrate processing method: In the present invention, a substrate processing method, in which a developing treatment is performed after exposure processing of a pattern, includes a shaping step of shaping the shape of a resist pattern such that a side wall portion of the resist pattern after the developing treatment swells out to...

20060068338 - Silver halide color photographic light-sensitive material: The present invention relates to a silver halide color photographic light-sensitive material, in particular to a multilayer material which comprises a support provided with blue, green and red sensitive silver halide emulsion layers containing a yellow, a magenta and a cyan dye forming coupler, respectively. According to the present invention,...

20060068339 - Silver halide color photographic photosensitive material: A silver halide color photographic photosensitive material having, on a support, at least one layer of a blue sensitive emulsion layer unit containing a yellow color forming coupler, a green sensitive emulsion layer unit containing a magenta color forming coupler, and a red sensitive emulsion layer unit containing a cyan...

20060068340 - High bromide{111} tabular grain emulsions with improved dispersity: The invention relates to tabular silver halide emulsions that are useful in the field of photography and particularly to a process for preparing the tabular silver halide emulsions. The process of the invention relates to tabular grain formation process which is carried out in the presence of a compound which...

20060068343 - Method of producing organic silver salt dispersion, and photothermographic material: A method of producing an organic silver salt dispersion, the method comprising: mixing a first aqueous solution including a water-soluble silver ion supplier and a second aqueous solution including an alkali metal salt of an organic acid to form an organic silver salt dispersion; wherein, the mixing is conducted in...

20060068341 - Photothermographic material: The present invention provides a photothermographic material having: a support and an image-forming layer including a photosensitive silver halide, a non-photosensitive organic silver salt, a reducer, and a binder on at least one surface of the support, wherein the photothermographic material further contains a dye having a half breadth of...

20060068344 - Photothermographic material: A photothermographic material comprising a support and an image-forming layer, a non-photosensitive intermediate layer A, and an outermost layer provided in this order on at least one side of the support, wherein the image-forming layer comprises a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a...

20060068345 - Photothermographic material and image forming method: A photothermographic material comprising a support, and an image-forming layer and a non-image-forming layer provided on the support, wherein the image-forming layer comprises a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder; the non-image-forming layer includes a slipping agent having a melting point of...

20060068342 - Photothermographic material containing particular hydrophilic polymer: The present invention provides a photothermographic material, having a support and an image-forming layer containing a photosensitive silver halide, a non-photosensitive organic silver salt, and a reducer for the organic silver salt on at least one surface of the support, wherein the image-forming layer contains a hydrophilic polymer which has...

20060057467 - Hologram recording material and hologram recording method: A hologram recording material and a hologram recording method, capable of attaining a high sensitivity, a high diffraction efficiency, a satisfactory storability and a dry processability at the same time and applicable to a high-density optical recording medium, a three-dimensional display, a holographic optical element and the like, are provided....

20060057475 - Binary opc for assist feature layout optimization: A method of forming a photolithographic mask layout with Sub-Resolution Assist Feature (SRAF) elements on a mask for correcting for proximity effects for a pattern imaged comprising the steps of developing a layout of mask features for printing main pattern features. Provide a table of SRAF element data including spacing...

20060057471 - Lithographic apparatus and device manufacturing method: Improved complementary phase shift mask (c:PSM) imaging techniques are described, including a method in which scattering bars are provided on the trim mask in order to allow better CD uniformity to be achieved in the double exposure process. The number, size and position of the scattering bars can be optimised...

20060057473 - Mask for exposure and method of manufacturing the same: There is provided a method of manufacturing a mask for exposure, which is capable of measuring the phase difference between a shifter portion and a non-shifter portion with good accuracy. A mask for exposure having: two first light-shielding device patterns, which are formed on a quartz substrate (transparent substrate) in...

20060057472 - Method for making chrome photo mask: A method for making a chrome photo-mask is disclosed. A photo-mask blank is activated with activator on its upper surface for electroless chrome plating Next, the activated photo-mask blank is then immersed in the electroless chrome plating solution for being coated with a thin chrome layer. The electroless chrome plating...

20060057470 - Method for producing mask blank and method for producing transfer mask: To obtain a mask blank capable of suppressing build-ups after removing a resist film on a peripheral edge of a substrate and free of resist residues, even if using any kind of resist. In an unnecessary film removing step of a mask blank manufacturing steps, for removing the unnecessary resist...

20060057468 - Method of pattern formation using ultrahigh heat resistant positive photosensitive composition: In the process wherein a high heat resistance is required for a photoresist pattern such as a manufacture of a TFT active matrix substrate, a super high heat resistant positive pattern is formed using a positive-working photosensitive composition. The pattern forming method of the present invention comprising steps of: applying...

20060057476 - Method of patterning photoresist on a wafer using a reflective mask with a multi-layer arc: A patterned reflective semiconductor mask uses a multiple layer ARC overlying an absorber stack that overlies a reflective substrate. The absorber stack has more than one layer and an upper layer of the absorber stack has a predetermined metal. The multiple layer ARC overlying the upper layer of the absorber...

20060057469 - Photomask blank, photomask, and pattern transfer method using photomask: A low reflective photomask blank suitable for shortened exposure wavelengths is disclosed. A photomask blank (1) having a single-layer or multilayer light-shielding film (3) arranged on a translucent substrate (2) and mainly containing a metal is characterized by comprising an antireflective film (6), which at least contains silicon and oxygen...

20060057474 - Transparent substrate for mask blank and mask blank: In a transparent substrate for a mask blank, which is required to have a predetermined optical characteristic, a substrate mark is formed by cutting off a predetermined corner portion into an oblique section. The shape of the mark is determined in accordance with the optical characteristic of he substrate....

20060057477 - Color filter and method for manufacturing the same: (wherein n is a number of the coordinate points in the coordinate data) when Xi is a distance from each coordinate point to the approximate line is 0.2 or less; and in a graph of the coordinate data, when an apex of a peak projecting upward is referred to as...

20060057478 - Panel for display device and manufacturing method thereof: A panel for a display device is provided, which includes a substrate, a sidewall member formed on the substrate and having a plurality of openings, a plurality of color filters formed into the openings and representing a color by incident light, and at least one inspection pattern inspecting a misalignment...

20060057479 - Coating liquid for intermediate layer in electrophotographic photoconductor, electrophotographic photoconductor utilizing the same, image forming apparatus and process cartridge for image forming apparatus: A coating liquid for an intermediate layer of an electrophotographic photoconductor comprises at least one of alcohol solvents; and N-methoxymethylated nylon, in which the N-methoxymethylated nylon has solution viscosity within a range from 43 mPa·s to 50 mPa·s when dissolving into methanol at 30° C. in a concentration of 20%...

20060057480 - Photoconductive imaging members: A photoconductive member containing a hole blocking layer, a photogenerating layer, and a charge transport layer, and wherein the hole blocking layer contains a metallic component like a titanium oxide and a polymeric binder....

20060057481 - Hydrazone compound, electrophotographic photoreceptor comprising the hydrazone compound, and image forming apparatus equipped with the electrophotographic photoreceptor: A hydrazone compound capable of realizing an electrophotographic photoreceptor having good electric properties such as good sensitivity and light responsibility, good electric and mechanical durability and good environment stability, is provided. The hydrazone compound is represented by the following general formula (1). The compound is contained in the charge transporting...

20060057482 - Toner, two-component developer, and image forming method: A toner of the present invention is a toner comprising an additive and a toner matrix that contains a binder resin, a colorant, and a wax, in which the additive contains an inorganic micropowder to whose surface polysiloxane and at least one selected from fatty acids and derivatives thereof are...

20060057483 - Toner: An object of the present invention is to provide a toner excellent in durability and storage stability, and having good fixing performance in a wide fixing temperature region even at a high process speed. According to the present invention, there is provided a toner containing: a binder resin; a colorant;...

20060057485 - Process for producing colorant dispersoid: A process for producing a colorant comprises the step of mixing a coloring material and a block copolymer in a flow channel of a microreactor to obtain a dispersion comprising a colorant as a dispersoid. The flow-mixing channel may have a cross-sectional area of not less than 0.5 mm2, and...

20060057484 - Toner for developing electrostatic latent image, developer for developing electrostatic latent image, and process for producing toner for developing electrostatic latent image: A toner for developing an electrostatic latent image includes a binder resin, a colorant and a releasing agent. The releasing agent contains a hydrocarbon component including a linear hydrocarbon component, and the liner hydrocarbon component has a carbon number distribution and an average carbon number N. An amount of a...

20060057486 - Crystalline polyester for toner: The present invention relates to a crystalline polyester for toner, obtained by a process comprising the step of polymerizing raw material monomers in the presence of a wax, wherein the crystalline polyester has a number-average molecular weight of from 3000 to 10000 and a weight-average molecular weight of from 150000...

20060057487 - Developer for use in electrophotography, image forming method and process cartridge: Electro-photographic images having high picture quality and low carrier adhesion can be obtained using a two-component developer containing a carrier containing (A) a carrier containing a core containing a magnetic material, the core being coated with at least one resin layer; and (B) a toner; wherein the carrier has a...

20060057488 - Toner and image forming method using the toner: wherein T1 represents a glass transition temperature of the toner and Q1 represents an endothermic quantity at a melting point thereof before melting when heated from −20° C. to 150° C. at a heating speed of 10° C./min, and T2 represents a glass transition temperature thereof and Q2 represents a...

20060057491 - Coating compositions for use with an overcoated photoresist: Compositions (particularly antireflective coating compositions or “ARCs”) are provided that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. More particularly, the invention relates to organic coating compositions, particularly antireflective coating compositions, that contain a polyester...

20060057490 - Colpolymer of alicyclic olefin having secondary hydroxyl group and acryl compound, and chemically amplified resist composition containing the same: The present invention provides a polymer represented by the following formula 1 and a chemically amplified resist composition including the polymer, which resist composition is excellent in adhesion, storage stability and dry etch resistance, with good resolution in both C/H and L/S patterns, and provides a good pattern profile irrespective...

20060057489 - Lactone compounds, lactone-containing monomers, their polymers, resist compositions using same, and processes for forming patterns using same: in the formula, X represents CH2, CH2CH2, O, S or NR1, and R1 represents hydrogen atom, a straight-chain, branched or cyclic alkyl group of a carbon number of 1-10. Hydrogen(s) of the alkyl group may partially or entirely be replaced with fluorine atom(s). Furthermore, a part of the alkyl group...

20060057495 - Negative-working photosensitive resin composition and photosensitive resin plate using the same: wherein —X represents —OR2, —COOH, —SO3H, —CONHR2, —COR2, —SO2NHR2, —HNCONHR2, or —HNCOOR2; R1 and R2, which may be the same or different, each represents a hydrogen atom, a substituted or unsubstituted, saturated or unsaturated hydrocarbon group, provided that it does not contain a radical polymerizable ethylenic double bond, a substituted...

20060057496 - Photoresist compositions comprising diamondoid derivatives: Novel positive-working photoresist compositions are disclosed. The monomers of the base resin of the resist contain diamondoid-containing pendant groups higher than adamantane in the polymantane series; for example, diamantane, triamantane, tetramantane, pentamantane, hexamantane, etc. The diamondoid-containing pendant group may have hydrophilic-enhancing substituents such as a hydroxyl group, and may contain...

20060057494 - Photoresist monomer having spiro cyclic ketal goup, polymer thereof and photoresit composition including the same: A photoresist polymer having a spiro cyclic ketal group, and a photoresist composition including the same is disclosed. The photoresist polymer and the photoresist composition can improve the resolution and the process margin due to its low activation energy of the deprotection reaction of the spiro cyclic ketal group, and...

20060057493 - Planographic printing plate precursor: p

20060057492 - Polymer having polymerizable group, polymerizable composition, planographic printing plate precursor, and planographic printing method using the same: A polymer having a polymerizable group and an alkyleneoxy groups on side chains thereof, and a polymerizable composition containing the polymer. The polymerizable composition preferably contains a polymerizable compound and a polymerization initiator. Also provided is a planographic printing plate precursor having a polymerizable layer on a hydrophilic support, the...

20060057497 - Apparatus for three-dimensional optical data storage and retrieval: A three dimensional optical data storage and retrieval system that includes a three dimensional optical data storage medium and an apparatus for providing access to data stored on the medium. The data storage medium includes an optical data storage material which either a low molecular weight or polymeric glassy solid...

20060057499 - Highly reflective substrates for the digital processing of photopolymer printing plates: An improved digitally imageable relief printing element having an increased direct-cure imaging speed upon exposure to lasers and other digital sources of actinic radiation. The printing elements of the invention comprise a reflective layer beneath a photosensitive resin layer so that instead of being absorbed by the reflective layer, photons...

20060057498 - Substituted benzene developing solvent for photopolymerizable printing plates: Flexographic printing plates are produced by exposing the photopolymer plates to a light source and washing out (developing) the masked out, non-exposed areas with a solvent. The invention provides substituted benzene solvents suitable for use in the development of photopolymer printing plates. The solvents, which include substituted benzene alone or...

20060057500 - Method of manufacturing lithographic printing plate support: Disclosed is a method of manufacturing a lithographic printing plate support including the step of: subjecting an aluminum plate at least to electrochemical graining treatment in which alternating current is passed through the aluminum plate in an aqueous solution containing hydrochloric acid so that the total amount of electricity when...

20060057501 - Antireflective compositions for photoresists: The present invention relates to a coating solution comprising a polymer obtained by reacting a glycoluril compound with a reactive compound containing hydroxy groups and/or acid groups, and further where the polymer is soluble in an organic solvent. The invention also relates to a process for imaging a photoresist coated...

20060057502 - Method of forming a conductive wiring pattern by laser irradiation and a conductive wiring pattern: Fine wirings are made by a method having the steps of painting a board with metal dispersion colloid including metal nanoparticles of 0.5 nm-200 nm diameters, drying the metal dispersion colloid into a metal-suspension film, irradiating the metal-suspension film with a laser beam of 300 nm-550 nm wavelengths, depicting arbitrary...

20060057503 - Process for making a micro-fluid ejection head structure: A device surface of a substrate is dry-sprayed with a polymeric material (e.g., a photoresist) to provide a spray-coated layer on the surface of the substrate. The spray-coated layer has a thickness ranging from about 0.5 to about 20 microns. Flow features are formed (e.g., imaged and developed) in the...

20060057504 - Slow wave structures for microwave amplifiers and oscillators and methods of micro-fabrication: Embodiments of the present invention include helical, ring bar and tunnel ladder slow wave structures (SWSs). Embodiments of methods of micro-fabricating such SWSs are also disclosed. Embodiments of high frequency electromagnetic devices including such SWSs are also disclosed. Exemplary high frequency electromagnetic devices may include a traveling wave tube, a...

20060057505 - Vacuum compatible high frequency electromagnetic and millimeter wave source components, devices and methods of micro-fabricating: Vacuum compatible high frequency electromagnetic and millimeter wave source components, devices and methods of micro-fabricating such components and devices are disclosed. Embodiments of the methods may include using a UV-curable photoresist, such as SU-8 to form structures having height up to and exceeding 1 mm. High frequency electromagnetic wave sources...

20060057506 - Controlling resist profiles through substrate modification: Photoresists may be formed over a structure that has been modified so as to poison a lower layer of the photoresist. Then, when the photoresist is patterned, it is only patterned down to the poisoned layer. The poisoned layer may be removed subsequently. However, because of the use of the...

20060057507 - Photolithography method to prevent photoresist pattern collapse: A method comprises forming a BARC layer on a substrate, treating the BARC layer to make its surface hydrophilic, forming a photoresist layer on the treated BARC layer, exposing the photoresist layer to a predetermined pattern, and developing the photoresist layer to form patterned photoresist....

20060057508 - Image forming method using photothermographic material: An image forming method using a photothermographic material including, on at least one side of a support, an image forming layer containing at least a photosensitive silver halide, a first non-photosensitive organic silver salt, a reducing agent, and a binder, and at least one non-photosensitive layer disposed on the same...

20060057509 - Silver halide photosensitive material and image forming method therefor: A silver halide photographic material, including a support having thereon a silver halide emulsion layer, the silver halide emulsion layer containing a binder and silver halide particles having a silver chloride content of more than or equal to 90 mol %, wherein a compound represented by Formula (S) is contained...

20060057513 - Organic silver salt composition and manufacturing method thereof and photothermographic material: An organic silver salt composition used for thermally developable photothermographic material is disclosed, comprising at least two organic acids differing in melting point and their silver salts, wherein a silver salt of a lower-melting organic acid account for 10 to 80 mol % of the silver salts and the lower...

20060057511 - Photothermographic material: wherein M represents a metal atom, R1, R4, R5, R8, R9, R12, R13 and R16 respectively represent a hydrogen atom or a substituent where at least one of R1, R4, R5, R8, R9, R12, R13 and R16 is an electron attractive group and R2, R3, R6, R7, R10, R11, R14...

20060057512 - Photothermographic material: A photothermographic material which includes, on at least one side of a support, an image forming layer containing a photosensitive silver halide, a non-photosensitive organic silver salt and a reducing agent for the organic silver salt, and at least one non-photosensitive layer, wherein the photothermographic material contains a water-soluble dye...

20060057514 - Photothermographic material and image forming method using the same: A photothermographic material comprising a support body provided on or above at least one surface thereof with an image forming layer, containing at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent and binder, and a non-photosensitive layer, wherein: 1) 50% or more of the binder...

20060057515 - Photothermographic material and image forming method using the same: p

20060057510 - Silver salt-toner co-precipitates and imaging materials: Thermally developable materials such as thermographic and photo-thermographic materials include a co-precipitate comprising first and second organic silver salts, the first organic silver salt comprising a silver salt of a nitrogen-containing heterocyclic compound containing an imino group, and the second organic silver salt comprising a silver salt of a mercaptotriazole....

20060051680 - Combining image imbalance compensation and optical proximity correction in designing phase shift masks: This application includes techniques for applying image imbalance compensation by aperture sizing and optical proximity approximation in designing a phase mask....

20060051679 - Lithographic method for wiring a side surface of a substrate: In a lithographic proximity method for wiring an end or internal side surface of a substrate the required exposure of strips (76), defining the wiring pattern, is performed by means of a mask (70) comprising a diffraction structure (74) to deflect exposure radiation (b) to the side surface. An exposure...

20060051683 - Method of manufacturing mask for exposure, mask for exposure, and package body of mask for exposure: There are provided a method of manufacturing a mask for exposure, which includes the step of patterning a light-shielding film formed on a quartz substrate to form a light-shielding pattern, and the step of directly measuring a step from the surface of the quartz substrate to the top surface of...

20060051681 - Method of repairing a photomask having an internal etch stop layer: A method of repairing a photomask having a pattern layer, an internal etch stop layer underlying the pattern layer and a substantially transparent substrate. After the mask has been partially or fully processed, the mask is inspected for defects. Defects which are appropriate to be repaired are identified, and openings...

20060051682 - Methods for simulating reticle layout data, inspecting reticle layout data, and generating a process for inspecting reticle layout data: Various computer-implemented methods are provided. One method for generating a process for inspecting reticle layout data includes identifying a first region in the reticle layout data. A printability of the first region is more sensitive to changes in process parameters than a printability of a second region in the reticle...

20060051684 - Photo-mask having exposure blocking region and methods of designing and fabricating the same: A photo-mask has a main mask pattern in a main region, a density correcting pattern in a peripheral region, and an exposure blocking pattern interposed between the main mask pattern and density correcting pattern. The exposure blocking pattern is configured to prevent the density correcting pattern from being transcribed to...

20060051685 - Negative dye-containing curable composition, color filter and method of producing the same: wherein R1 represents a hydrogen atom or a substituent group; R2 to R5 each represent a hydrogen atom or a substituent group, R6 to R7 each represent an alkyl group, alkenyl group, aryl group or heterocyclic group, Za and Zb each represent —N═ or —C(R8)═; R8 represents a hydrogen atom,...

20060051686 - Image structure, recording medium, image forming apparatus and post-process device: An image structure includes a normal toner image formed on an image support and comprising toner particles; and an adhesive toner image formed on or around the normal toner image, serving as a repeelable adhesive layer and comprising toner particles. The toner particles of the adhesive toner image have a...

20060051687 - Inspection system and inspection method for pattern profile: An inspection system includes a microscope configured to observe a mask pattern of a photomask and a projected image of the mask pattern on a substrate, a circuit data memory configured to store design data of a circuit pattern to be formed on the substrate by the mask pattern, a...

20060051689 - Image forming apparatus and process cartridge: An image forming apparatus including: an electrophotographic photoreceptor; a non-contact charger located close to the electrophotographic photoreceptor, charging the electrophotographic photoreceptor; an irradiator irradiating the electrophotographic photoreceptor to form an electrostatic latent image thereon; an image developer developing the electrostatic latent image with a toner to form a toner image...

20060051688 - Latent electrostatic image bearing member, process cartridge, image forming apparatus, and image forming process: An object is to provide a latent electrostatic image bearing member that can provide high-quality images for prolonged periods, owing to photosensitive layers and crosslinked surface layers having excellent flaw and wear resistance and appropriate electric properties, image forming method, image forming apparatus and process cartridge that employ latent electrostatic...

20060051690 - Aromatic heterocyclic-based charge transport materials having two amino groups: R1, R2, R3, and R4 comprise, each independently, H, an alkyl group, an acyl group, an ether group, an alkenyl group, an alkynyl group, a heterocyclic group, an aromatic group, or a part of a ring group; and (b) a charge generating compound. Corresponding electrophotographic apparatuses, electrophotographic imaging methods, and...

20060051691 - Toner for developing electrostatic latent image, process for producing the same, developer for developing electrostatic latent image, and process for forming image: A toner for developing an electrostatic latent image is provided that can prevent occurrence of blister even with coated paper having a coated surface, exhibits excellent releasing performance in oilless fixing, and realizes both high glossiness and OHP transparency for an image to be formed. A process for producing the...

20060051692 - Full color toner, and its use in electrophotography methods and apparatus: A full color toner containing a binder resin, a release agent and a colorant is provided, wherein the binder resin contains a polyester resin containing a hybrid resin containing one or more vinyl group polymer units and one or more polyester units, and wherein the content A of the hybrid...

20060051693 - Process for preparing toner for electrophotography: The present invention relates to a process for preparing a toner for electrophotography containing a resin binder and a colorant, including the step of preparing fine particles of the resin binder to have a volume-median particle size (D50) of from 0.05 to 3 μm in an aqueous medium in the...

20060051695 - Carrier for electrophotography: The present invention is a carrier for electrophotography in which a surface of at least a core material is coated with a resin, in which the coating resin contains a fluorine modified silicone resin and an aminosilane coupling agent, and in which the carrier charges a toner negatively. Consequently, a...

20060051694 - Image fixing method: e

20060051696 - Toner for developing electrostatic latent image and image-forming method: A toner for developing electrostatic latent images, having a specified volume-average particle size, an average degree of roundness, a standard deviation of the degree of roundness and surface properties D/d50 wherein a specified amount of fatty acid metal salt that has a specified volume-average particle size is externally added, and...

20060051697 - Process for manufacturing organic photoconductive drum for use in electrophotography: In a process for manufacturing an organic photoconductive drum there is sequentially formed on an electrically-conductive substrate that includes a cylindrical support of known weight the following layers: an optional dry undercoat layer, a dry barrier layer, a dry charge-generation layer, and a dry charge-transport layer. Following the formation of...

20060051700 - Imageable element with masking layer comprising betaine-containing co-polymers: Thermally imageable elements comprising a masking layer and a substrate are disclosed. The masking layer contains a sulfobetaine and/or a carboxybetaine containing co-polymer or a mixture of a sulfobetaine and/or a carboxybetaine containing co-polymers and absorbs both infrared and ultraviolet radiation. When the masking layer is on the substrate, the...

20060051705 - Method of imaging: The application, according to a desired image, of an absorbance controlling composition to a receiver having an imaging layer comprising a radiation absorbing component, such as a dye or pigment, with spectral absorbance properties susceptible to change on treatment with the absorbance controlling composition provides a method of imaging by...

20060051703 - Photosensitive film: A photosensitive film excellent in workability and making it possible, in a normal pressure laminating process, to laminate photosensitive films on the surface of substrate having a metallic surface with a reduced number of air voids generated and in a high product yield, said film comprising a support film (A),...

20060051698 - Photosensitive resin composition and photosensitive element employing using the same: A photosensitive resin composition for formation of a spacer layer in an optical disk comprising: two transparent substrates positioned opposite each other; and a recording layer and spacer layer positioned between the opposing sides of the transparent substrates, wherein the photosensitive resin composition comprises: a binder polymer; a photopolymerizable compound...

20060051701 - Polymerizable composition and planographic printing plate precursor: The present invention provides a polymerizable composition comprising (A) a compound represented by the following formula (I), (B) an infrared absorbent, and (C) a compound having at least one addition-polymerizable ethylenically unsaturated bond, and a negative planographic printing plate precursor having a recording layer containing the polymerizable composition. In the...

20060051706 - Radiation sensitive compositions and methods: The present invention provides radiation sensitive compositions and methods that comprise novel means for providing relief images of enhanced resolution. In one aspect the invention provides a method for controlling diffusion of photogenerated acid comprising adding a polar compound to a radiation sensitive composition and applying a layer of the...

20060051699 - Radiation-sensitive elements and their storage stability: Radiation-sensitive element comprising (a) a substrate with at least one hydrophilic surface and (b) a radiation-sensitive coating on at least one hydrophilic surface of the substrate, wherein the coating comprises: (i) at least one free-radical polymerizable monomer and/or oligomer and/or polymer with at least one ethylenically unsaturated group each, (ii)...

20060051704 - Resin plate: A resin plate comprising a first and at least one second layers is provided. The first layer comprises a resin having 75% by weight or larger of styrene-based unit on the basis of resin (A), and the second layer comprises an ultraviolet absorber and a resin having 50% by weight...

20060051702 - Resist material and pattern formation method: A resist material includes a first polymer in which part of alkali-soluble groups are protected by an acid labile group labilized by an acid; a second polymer in which substantially all alkali-soluble groups are protected by an acid labile group labilized by an acid; and an acid generator....

20060051707 - Conductive lithographic polymer and method of making devices using same: A conductive photolithographic film and method of forming a device using the conductive photolithographic film. The method includes depositing a conductive photolithographic film on a top surface of a substrate; and patterning the conductive photolithographic film to create a desired circuit pattern using a lithographic process. The conductive photolithographic film...

20060051708 - Plasma display panel and manufacturing method thereof: The present invention relates to a plasma display panel and a manufacturing method thereof, and more particularly, to a plasma display panel including barrier ribs and a manufacturing method thereof. A method of manufacturing a plasma display panel according to the present invention comprises the steps of stacking a plurality...

20060051709 - Exposure system and pattern formation method: An exposure system includes an exposure section provided within a chamber for irradiating a resist film formed on a wafer with exposing light through a mask with an immersion liquid provided on the resist film. It further includes a drying section for drying the surface of the resist film after...

20060051710 - Compound containing an anthranilic acid blocking group: where G is a group in which the bond to the timing group is cleaved upon reaction with oxidized developer; TG1 and TG2 represent any known timing or switching group and may be the same or different; q and p are independently 0 or 1; AATG represents an anthranilic acid...

20060051711 - Silver halide color photographic light-sensitive material: A silver halide color photographic light-sensitive material having, on a support, a yellow dye-forming light-sensitive silver halide emulsion layer, a magenta dye-forming light-sensitive silver halide emulsion layer and a cyan dye-forming light-sensitive silver halide emulsion layer, and a light-insensitive hydrophilic colloid layer that does not develop a color, wherein a...

20060051713 - Thermally developable materials containing cationic overcoat polymer: Thermally developable imaging materials have an outermost protective layer that is composed of one or more hydrophilic film-forming components. The predominant film-forming component is a positively-charged latex polymer that has cationic groups. The charged latex polymer is present as latex particles that have prepared in the presence of a non-ionic...

20060051712 - Thermally developable materials containing ionic polymer interlayer: Thermally developable imaging materials have an outermost protective layer that is composed of one or more hydrophilic film-forming components. Between the outermost protective layer and the underlying thermally developable imaging layers is an interlayer containing a film-forming ionic latex polymer other than a carboxy-containing latex polymer. This ionic polymer can...

20060051714 - Developer dispersions for thermally developable materials: Solid particle dispersions of certain ascorbic acid esters are prepared in the presence of at least 0.5 and less than 50 weight % of a particle growth modifier based on the weight of the ascorbic acid ester. The particle growth modifier is an alkyl carboxylic acid having from 8 to...

20060046156 - Method for manufacturing a microstructure, exposure device, and electronic apparatus: Aspects of the invention can provide a method for manufacturing a microstructure, including forming a photosensitive film above a work piece, exposing the photosensitive film, as a first exposure, by irradiating interference light generated by intersecting two laser beams having a wavelength shorter than a wavelength of visible light, developing...

20060046162 - Manufacturing method of semiconductor device: Various problems caused by a pattern difference in a semiconductor device manufactured by divided exposure are solved. When a chip area 161 on a wafer is exposed by being divided into two areas 161a and 161b, the center position of a mask pattern 1a formed on a reticle 1A used...

20060046159 - Methods of manufacturing substrates with multiple images: The present application is directed methods of manufacturing dual image substrates. In one embodiment, a light transmitting film is coated with a light shielding substance to provide light shielding areas and a major surface of the film is structured. In another embodiment, a light shielding film is structured to provide...

20060046161 - Prevention of photoresist scumming: A photo acid generator (PAG) or an acid is used to reduce resist scumming and footing. Diffusion of acid from photoresist into neighbors causes a decreased acid level, and thus causes resist scumming. An increased acid layer beneath the resist prevents acid diffusion. In one embodiment, the increased acid layer...

20060046160 - Sub-resolution assist features: Systems and techniques relating to the layout and use of sub-resolution assist features. In one implementation, a mask includes a first feature and a second feature separated from each other by a gap and a sub-resolution assist feature bridging the gap between the first feature and the second feature....

20060046158 - Substrates with multiple images: The present application is directed to substrates comprsing light shielding areas and light transmitting areas. In one embodiment, the present application is directed to a substrate comprising a film comprising a light shielding additive. The film comprises a structured surface resulting in thick light shielding areas and relatively thin light...

20060046157 - [phase shift photomask]: A phase shift photomask is described, including a transparent substrate, and at least one isolated linear pattern, dense linear patterns and a transparent phase-shift region on the substrate. The isolated linear pattern includes a transparent end portion with a phase shift of 180° relative to the substrate. The transparent phase-shift...

20060046163 - Color filter and liquid crystal display device comprising such filter: A color filter includes first, second and third regions for providing polarized light of a first, for example red, a second for example green and a third for example blue color respectively. To provide polarized light, a region comprises an isotropic colorant for selectively transmitting the first, the second or...

20060046164 - Method of making inlaid color filter arrays: A method of making a color filter array on a first substrate comprising the steps of: providing at least one transferable colorant layer on a second substrate and positioning such transferable layers in transferable relationship with but spaced a distance from the first substrate; and heating the second substrate sufficiently...

20060046167 - Characterizing flare of a projection lens: Flare of an imaging system is measured using resist by employing the imaging system to directly expose a first part of the resist at an image plane of the imaging system to a first dose of radiation and to indirectly expose a second part of the resist as a result...

20060046166 - Controlling critical dimensions of structures formed on a wafer in semiconductor processing: In semiconductor processing, the critical dimensions of structures formed on a wafer are controlled by first developing photoresist on top of a film layer on a wafer using a developer tool, the photoresist development being a function of developer tool process variables including temperature and length of time of development....

20060046165 - Lithographic apparatus, device manufacturing method, calibration method and computer program product: To calibrate a lithographic apparatus contrast in the aerial image is measured for a plurality of different settings of available manipulators of the projection system. Appropriate settings of the manipulators are determined as those giving the maximum contrast values....

20060046168 - Method for designing an illumination light source, method for designing a mask pattern, method for manufacturing a photomask, method for manufacturing a semiconductor device and a computer program product: A method for designing an illumination light source, includes acquiring a control feature to control a dimension of a transferred pattern of a mask pattern; designating a plurality of illumination elements illuminating the mask pattern; designating first illumination lights to each of first polarization states of a light emitted from...

20060046169 - Aromatic polyester resin, and electrophotographic photoconductor and image forming apparatus using thereof: wherein R1 represents any one of a hydrogen atom, an unsubstituted or substituted alkyl group and an unsubstituted or substituted aryl group; Ar1 represents an unsubstituted or substituted aryl group; Ar2 and Ar3 may be the same as or different from each other and represent respectively an unsubstituted or substituted...

20060046170 - Electrophotographic photoreceptor, image forming apparatus and image forming method: An electrophotographic photoreceptor includes a surface layer having a contact angle of 90 to 130° on a cylindrical conductive substrate having a cylindricity of 5 to 40 μm....

20060046171 - Hydrazone-based charge transport materials having an unsaturated acyl group: R1, R2, R3, R4, and R5 comprise, each independently, H, an alkyl group, an alkenyl group, an alkynyl group, an aromatic group, a heterocyclic group, or a part of a ring group; and (b) a charge generating compound. Corresponding electrophotographic apparatuses and imaging methods are described....

20060046172 - Polymeric charge transport materials having carbazolyl repeating units: where n is a distribution of integers between 1 and 100,000 with an average value of greater than one; Y comprises an aromatic group; and X is a bond or a linking group; and (b) a charge generating compound. Corresponding electrophotographic apparatuses and imaging methods and methods of making the...

20060046173 - Electrophotographic toner, process for producing the same, and process for forming image: e

20060046177 - Metal complex dye, color toner and color filter:

20060046178 - Electrostatic latent image developing magenta toner, electrostatic latent image developer, toner manufacturing method, and image forming method:

20060046174 - Toner, method for preparing the toner, and developer including the toner: A toner including a binder resin comprising a polyester resin in an amount of from 50 to 100% by weight, wherein the polyester resin includes an unsaturated polyester resin which is preferably a crystalline polyester resin; a colorant; and a fatty acid metal salt which is preferably microencapsulated. A method...

20060046175 - Toner for electrostatic latent image development and image forming method: A toner for electrostatic latent image development, in which the image quality is fine, toner blister would not occur, and furthermore, the image quality which can fulfill customer's satisfaction can be obtained regardless of the temperature humidity environment in the image forming. The toner for electrostatic latent image development is...

20060046176 - Toner for electrostatic image development: A toner for electrostatic image development, containing a resin binder comprising a polyester having a softening point of from 125° to 160° C.; a releasing agent containing a paraffin wax having a melting point of from 70° to 90° C. and a penetration at 25° C. of from 4 to...

20060046179 - Process for preparing toner particles and toner particles: Toner particles are prepared by a process comprising providing an extrusion apparatus; adding resin particles and additive particles to a supply means in the extrusion apparatus; adding the resin particles and the additive particles to a blending chamber in the extrusion apparatus, which blending chamber is maintained at a temperature...

20060046180 - Method of applying spot varnish to xerographic image and emulsion aggregation toners for use therein: A method of forming a xerographic image having at least one portion with a gloss different from a gloss of another portion of the xerographic image includes xerographically forming a toner image on a surface of a substrate and forming a finish over the toner image at the at least...

20060046181 - Donor substrate for laser induced thermal imaging method, method of fabricating the donor substrate, and method of fabricating organic light emitting display using the donor substrate: A donor substrate for a laser induced thermal imaging method and an organic light emitting display (OLED) fabricated using the donor substrate are provided. There is also provided a method of fabricating an OLED capable of controlling static electricity when an organic layer is formed using an laser induced thermal...

20060046182 - Methods of fabricating organic light emitting display and donor substrate: Methods of fabricating an OLED and a donor substrate are provided. The method includes: preparing a base substrate of a donor substrate; forming a light to heat conversion layer and a transfer layer on the base substrate; preparing a donor substrate including performing a dry cleaning process after forming the...

20060046189 - Color image-forming material and lithographic printing plate precursor: A color image-forming material capable of drawing an image by infrared laser exposure and excellent in image visibility, storage stability and white light stability, and an on-press development or non-processing (non-development) type lithographic printing plate precursor ensuring high sensitivity and high press life and being excellent in image visibility, on-press...

20060046183 - Photoresist formulation with surfactant additive: A composition including a photoresist formulation and a surfactant additive is described herein....

20060046188 - Photosensitive lithographic printing plate: A photosensitive lithographic printing plate comprising a support and a photopolymerizable photosensitive layer, wherein the photopolymerizable photosensitive layer contains a compound having three or more ethylenically unsaturated double bonds and containing four or more structural units selected from an ethyleneoxy structural unit and a propyleneoxy structural unit in one molecule...

20060046191 - Photosensitive lithographic printing plate: A photosensitive lithographic printing plate to be exposed by laser, which comprises a hydrophilic support and at least one polymerizable photosensitive layer, wherein the photosensitive layer has an absorbance of an emitting wavelength of the laser for exposure of not more than 0.4....

20060046187 - Planographic printing plate material: Disclosed is a planographic printing plate material comprising a support and provided thereon, a photopolymerizable light sensitive layer and a protective layer in the order, wherein the protective layer contains a polyvinyl alcohol derivative A having a saponification degree of 90 to 100 mol % and a solubility of 0.1...

20060046192 - Planographic printing plate precursor: In Formula (i), R1 represents a hydrogen atom or a methyl group; R2 represents a connecting group having two or more types of atom selected from the group consisting of a carbon atom, a hydrogen atom, an oxygen atom, a nitrogen atom, and a sulfur atom and having 2 to...

20060046185 - Planographic printing plate precursor and method of making planographic printing plate: Disclosed is a planographic printing plate precursor including a photosensitive layer containing an infrared absorber, a polymerization initiator, a polymerizable compound and a binder polymer and a protective layer laminated on a support in this order, wherein the protective layer contains a mica compound and at least one polyvinyl alcohol...

20060046186 - Planographic printing plate precursors, stacks of planographic printing plate precursors, and methods of making planographic printing plates: A planographic printing plate precursor comprising an aluminum support having a hydrophilic front surface, and a negative recording layer provided on the front surface, wherein the negative recording layer includes a polymerizable compound, a radiation absorber, and a compound that generates a radical upon application of radiation or heat, and...

20060046193 - Polymerizable composition, hydrophilic film using it and planographic printing plate precursor: A polymerizable composition including a hydrophilic polymer (A) having a radical polymerizable group on the terminal, a radical polymerizable compound (B), and a polymerization initiator (C); a hydrophilic film formed by curing a film by application of light or heat, which film includes the polymerizable composition; and a planographic printing...

20060046195 - Positive resist composition and pattern forming method using the same: A positive resist composition satisfying high sensitivity, high resolution and good line edge roughness at the same time, and a pattern forming method using the resist composition are provided, which are a positive resist composition comprising (A) a resin which becomes soluble in alkali developer increases under the action of...

20060046190 - Positive resist composition and pattern forming method utilizing the same: A positive resist composition comprising: a resin that comprises a repeating unit including a specific norbornane lactone structure and a repeating unit including a specific alicyclic hydrocarbon structure, and that increases a solubility of the resin in an alkaline developer by an action of an acid; and a compound that...

20060046194 - Presensitized lithographic plate comprising support and hydrophilic image-recording layer: A presensitized lithographic plate comprises a support and a hydrophilic image-recording layer. The hydrophilic image-recording layer contains a hydrophilic polymer and an agent capable of converting hydrophilic to hydrophobic when the agent is heated. The hydrophilic polymer comprises a main chain and branched chains. Each of the branched chain comprises...

20060046184 - Top anti-reflective coating composition and method for pattern formation of semiconductor device using the same: wherein n is between 7 and 25. Since the top anti-reflective coating composition dissolves a portion of a photoacid generator present at the top of an underlying photosensitizer, particularly, upon formation of a top anti-reflective coating, it can prevent the top from being formed into a thick section. Therefore, the...

20060046196 - Adhesion promoting ingredients for on-press developable lithographic printing plate precursors: Imageable elements, useful as on press developable lithographic printing plate precursors, are disclosed. The elements comprise an imageable layer over a substrate and an one or more adhesion promoting ingredients. The imageable layer comprises a polymerizable compound and a polymeric binder. The adhesion promoting ingredients are titanium chelate and/or co-polymers...

20060046197 - Device and method of fabricating donor substrate for laser induced thermal imaging and method of fabricating oeld device using the same: A device of fabricating a donor substrate for a LITI includes a vacuum chamber; a donor substrate which moves in line and passes through an inside of the vacuum chamber; and a depositing device arranged in the vacuum chamber and forming a transfer layer on the donor substrate....

20060046198 - Alkali resistant polymeric interlayers for lithoplates: Substrates for lithographic printing plate precursors and lithographic printing plate precursors are disclosed. The substrates comprise an aluminum or aluminum alloy support and the a layer of interlayer material on the support. The interlayer material is a co-polymer that comprise (1) acid groups and/or phosphonic acid groups, and (2) silyl...

20060046199 - Production method of lithographic printing plate, lithographic printing plate precursor and lithographic printing method: A method for producing a lithographic printing plate is provided, wherein, in the non-alkaline development of a lithographic printing plate precursor having a protective layer, even if the protective layer components are mingled into the developer, the reduction in development removability of the image recording layer and the generation of...

20060046200 - Mask material conversion: The dimensions of mask patterns, such as pitch-multiplied spacers, are controlled by controlled growth of features in the patterns after they are formed. To form a pattern of pitch-multiplied spacers, a pattern of mandrels is first formed overlying a semiconductor substrate. Spacers are then formed on sidewalls of the mandrels...

20060046201 - Method to align mask patterns: Alignment tolerances between narrow mask lines, for forming interconnects in the array region of an integrated circuit, and wider mask lines, for forming interconnects in the periphery of the integrated circuit, are increased. The narrow mask lines are formed by pitch multiplication and the wider mask lines are formed by...

20060046202 - Integral plated resistor and method for the manufacture of printed circuit boards comprising the same: An integral plated resistor having an improved range of resistance is produced by uniformly dispersing an effective amount of various particles in an electroless nickel phosphorus plating composition so that the particles are codeposited with the electroless nickel phosphorus plating composition. Preferred particles include, polytetrafluoroethylene, silicon carbide, tungsten carbide, and...

20060046203 - Method for producing a thin film transistor and a device of the same: A method for producing a thin film transistor and including the following steps for preparing a glass substrate; having a negative photosensitive coating on the glass substrate; providing a transparent mold plate, having a plurality of opaque protrusions in accordance with a predetermined pattern; controlling the transparent mold plate downwardly...

20060046204 - Directly patternable microlens: A method of forming a microlens structure using a patternable lens material is provided. An organic-inorganic hybrid polymer comprising titanium dioxide is exposed to light using a defocused mask image and then developed to produce a lens-shaped region....

20060046205 - Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device: Provided are a mask pattern including a silicon-containing self-assembled molecular layer, a method of forming the same, and a method of fabricating a semiconductor device. The mask pattern includes a resist pattern formed on a semiconductor substrate and the self-assembled molecular layer formed on the resist pattern. The self-assembled molecular...

20060046206 - Photoactive resist capping layer: A cap may be formed anisotropically over a photoresist feature. For example, a material, such as a polymer, may be coated over the photoresist feature. If the coated material is photoactive, the cap may be grown preferentially in the vertical direction, creating high aspect ratio structures in some embodiments of...

20060046207 - Exposure method: Embodiments of the invention are directed to an exposure method for preventing wafer breakage, particularly of a trench-type power MOS device. In one embodiment, the exposure method includes: (a) providing a substrate; (b) forming a trench area and a non-trench area on the substrate; (c) carrying the substrate on a...

20060046208 - Film pattern producing method, and producing method for electronic device, electron-emitting device and electron source substrate utilizing the same: A method for producing a film pattern comprises a step of forming a resin film on a substrate surface; a step of incorporating into the resin film a constituent of a conductive film or a semiconductor film; a step of irradiating the resin film with an ultraviolet light; and a...

20060046209 - Image forming method: An image forming method is disclosed, comprising imagewise exposing a photothermographic material comprising on a support a light-sensitive layer containing an organic silver salt, silver halide, a binder and a reducing agent and a light-insensitive layer and subjecting the photothermographic material to thermal development while transporting it at a rate...

20060046210 - Mask complementary multiple exposure technique: A method for creating a pattern on an exposure site of a material blank using an exposure apparatus includes providing a mask having a first mask pattern. The mask is positioned between the exposure apparatus and the material blank. The exposure site of the material blank is exposed. One or...

20060046211 - Effectively water-free immersion lithography: A method and system is disclosed for conducting immersion photolithography. The system includes at least one lens for transmitting a predetermined radiation on a predetermined substrate with a distance between the lens and the substrate shorter than a predetermined threshold, and a fluid volume in contact with the lens on...

20060046212 - Integrated circuit lithography: A method of generating an imaging pattern using a mask having a mathematical (e.g., Fourier-space) representation of an imaging pattern in an imaging plane. In addition to the foregoing, other method aspects are described in the claims, drawings, and text forming a part of the present application. Other methods and...

20060046213 - Method for optimizing wafer edge patterning: A method of printing an image on a wafer. The method includes the steps of printing a main image, wherein the main image includes fields which are fully on the wafer, and printing an alternate image, wherein the alternate image includes fields which are only partially on the wafer. The...

20060046215 - Antistatic properties for thermally developable materials: The use of metal antimonates at high metal antimonate to binder ratios in buried backside conductive layers of thermographic and photothermographic materials allows the use of thin backside overcoat layers. The combination provides antistatic constructions having excellent antistatic properties that show less change in resistivity with changes in humidity. The...

20060046216 - Photothermographic material and image forming method: A photothermographic material having, on at least one side of a support, an image forming layer containing at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder and at least two non-photosensitive layers, as well as an image forming method using the photothermographic...

20060046214 - Photothermographic materials with reduced development time: Black-and-white photothermographic materials can be developed in shorter times (less than 15 seconds) with a combination of imaging components that include a reducing agent at up to 0.32 mol/mol of total silver and specific amounts of certain toning agents....