| Processing apparatus and processing method -> Monitor Keywords |
|
|
  Processing apparatus and processing methodUSPTO Application #: 20080056861Title: Processing apparatus and processing method Abstract: A processing apparatus according to the present invention comprises: a container 3 that contains a plurality of objects to be processed w, the container including an outlet port 3a formed in a front surface thereof for taking out the object to be processed w, and a lid 3b for hermetically sealing the outlet port 3a; a loading area Sa into which the container 3 is loaded; a conveying area Sb whose atmosphere differs from an atmosphere in the loading area Sa; a partition wall 6 that separates the loading area Sa and the conveying area Sb from each other, and has an opening 13; a door 14 for opening and closing the opening 13 in the partition wall 6; and a stage 10 for placing the container 3 at a position near the opening 13 in the loading area Sa. Parts to be pressed 20 are provided on opposite sides on a side of the front surface of the container 3. The partition wall 6 is provided with a pressing and holding mechanism 23 having a pressing roller 22 that rides on the part to be pressed 20 of the container 3 from a lateral side to press the container 3 against the opening 13 in the partition wall 6 and hold the container 3 tightly in place. (end of abstract) Agent: Smith, Gambrell & Russell - Washington, DC, US Inventors: Kiichi Takahashi, Katsuhiko Oyama USPTO Applicaton #: 20080056861 - Class: 414222040 (USPTO) Related Patent Categories: Material Or Article Handling, Apparatus For Charging A Load Holding Or Supporting Element From A Source, And Means For Transporting And Presenting Element To A Working, Treating, Or Inspecting Station, Device Engages Load Handling Or Supporting Element Or Load On Element To Align Load At Station The Patent Description & Claims data below is from USPTO Patent Application 20080056861. Brief Patent Description - Full Patent Description - Patent Application Claims
CROSS REFERENCE TO RELATED APPLICATIONS [0001] This application is based upon and claims the benefit of priority from the prior Japanese Patent Application No. 2006-239045 filed on Sep. 4, 2006, the entire contents of which are incorporated herein by reference. BACKGROUND OF THE INVENTION [0002] 1. Field of the Invention [0003] The present invention relates to a processing apparatus and a processing method for taking out an object to be processed from a container covered with a lid, and subjecting the object to be processed to a predetermined process such as a heating process. In particular, the present invention relates to an art for pressing the container against an opening in a partition wall and holding the container tightly in place. [0004] 2. Related Art [0005] As one of semiconductor manufacturing apparatuses, there is a batch-type heat-processing apparatus that thermally processes a number of semiconductor wafers (hereinafter referred to as "wafer"). The heat-processing apparatus includes a carrying-in region into which a carrier as a container containing a plurality of wafers is carried by an automatic transfer robot or an operator, and a loading area as a conveying region in which the wafers in the carrier are conveyed to a boat as a holder, and the boat is loaded into a heat furnace and unloaded therefrom. [0006] In this heat-processing apparatus, in order to make cleaner an atmosphere in the loading area than an atmosphere in the carrying-in region and to prevent generation of a natural oxide film on a wafer, it is preferable to separate the carrying-in region on an atmospheric side and the loading area from each other by a partition wall, and that an inside of the loading area is filled with an inert gas such as a nitrogen (N.sub.2) gas to form an inert gas atmosphere. In this case, with a view to preventing particle contamination of a wafer, it is more preferable to employ a carrier (also referred to as FOUP: Front Opening Unified Pod) of a hermetically closable type, whose wafer outlet port in a front surface of a carrier body can be hermetically closed by a lid. [0007] FIG. 7(a) shows that a hermetically-closable type carrier is in contact with the above-described partition wall. The reference number 6 depicts the partition wall that separates a carrying-in region Sa and a loading area Sb from each other. The reference number 13 depicts an opening formed in the partition wall 6. The reference number 14 depicts a door for opening and closing the opening 13. After the carrier 3 is placed on a conveying table (stage) 10 disposed in the carrying-in region Sa, the conveying table 10 is moved forward so that a front peripheral part of the carrier 3 comes into contact with an opening peripheral part of the opening 13, and thereafter a lid 3b is opened. In this case, the following procedures are further preferred from the viewpoint of preventing increase in oxygen density in the loading area Sb. That is to say, the lid 3b is opened by a lid opening/closing mechanism while the door 14 is being closed, and then an atmosphere in the carrier 3 is replaced with a nitrogen gas by a nitrogen replacing unit, not shown. Thereafter, the door 14 and the lid 3b are retracted from the opening 13, and a wafer w in the carrier 3 is loaded into the loading area Sb. Such an art is described in JP11-264267A. [0008] A related art is described in JP2004-6804A. [0009] For the purpose of preventing sucking of particles from outside into the loading area Sb, and increase in oxygen density in the loading area Sb, it is desirable that an inside of the loading area Sb is maintained at a pressure sufficiently higher than an atmospheric pressure. However, in the heat-processing apparatus, the carrier 3 is merely fixed on the conveying table 10 by means of a fixing mechanism having a locking part 40 of an inverted L-shape, which locks a bottom part of the carrier 3 on the conveying table 10. Thus, when the door 14 of the partition wall 6 is opened (i.e., when the lid 3b of the carrier 3 is opened), as shown in FIG. 7(b), because of a pressure applied from the loading area Sb to the carrier 3, an upper part of the carrier 3 is inclined toward the carrying-in region Sa to invite the following disadvantages. Namely, the nitrogen gas may leak from the loading area Sb toward the carrying-in region Sa to increase an oxidation density in the loading area Sb. In addition, it may be necessary to control the pressure in the loading area Sb to prevent the inclination of the carrier 3. Further, TAT is deteriorated. Furthermore, erroneous opening and closing operations of the lid 3b of the carrier, and a wrong mapping operation of the wafers in the carrier may take place. [0010] Patent JP2004-6804A describes an art for stabilizing a posture of the carrier even when a feed rate of an inert gas is high so as not to break a sealing condition between the partition wall and the carrier, when an atmosphere in the carrier is replaced with an inert gas, after the carrier is brought into contact with the partition wall and a lid member is opened. That is to say, JP2004-6804A describes that a pressing member is disposed on the partition wall on a side facing the carrying-in region, the pressing member being rotatable about a horizontal axis between a position in which the pressing member stands and a position in which the pressing member lies to press an upper surface of the carrier. Thus, after the carrier is placed on the conveying table and is brought into contact with the partition wall, the pressing member is rotated to press the upper surface of the carrier. Under this state, the lid member of the carrier is opened, and an inert gas is supplied from an inert-gas supply pipe into the carrier. However, this art requires a sufficient space for installing the pressing member, above the carrier on the conveying table. When this installation space is not secured, it is impossible to employ this art. SUMMARY OF THE INVENTION [0011] The present invention has been made in view of the above circumstances. The object of the present invention is to provide a processing apparatus and a processing method capable of preventing a container from being inclined by a pressure applied from a side of a carrying-in region when a door of a partition wall is opened, so as to eliminate various disadvantages resulting from the inclination of the container. [0012] In order to achieve the above object, a processing apparatus of the present invention is a processing apparatus comprising: a container that contains a plurality of objects to be processed, the container including an outlet port formed in a front surface thereof for taking out the object to be processed, and a lid for hermetically sealing the outlet port; a loading area into which the container is loaded; a conveying area whose atmosphere differs from an atmosphere in the loading area; a partition wall that separates the loading area and the conveying area from each other, and has an opening; a door for opening and closing the opening in the partition wall; and a stage for placing the container at a position near the opening in the loading area; wherein parts to be pressed are provided on opposite sides on a side of the front surface of the container, and the partition wall is provided with a pressing and holding mechanism having a pressing roller that rides on the part to be pressed of the container from a lateral side to press the container against the opening in the partition wall and hold the container tightly in place. [0013] In the processing apparatus, after the container is placed on the stage, the container is brought into contact with the opening. Then, the door and the lid are opened, and the object to be processed in the container is transferred from the loading area to the conveying area. [0014] In the processing apparatus of the present invention, it is preferable that the pressing and holding mechanism includes: a vertically extended rotating shaft rotatably supported on the partition wall via a bracket; a flat spring member radially extended from the rotating shaft, the flat spring member holding the pressing roller at a distal end, and forwardly pressing and urging the pressing roller; and a driving part for rotating the rotating shaft. [0015] In the processing apparatus of the present invention, it is preferable that at least the pair of upper and lower pressing rollers are connected with the rotating shaft through the flat spring members. [0016] In the processing apparatus of the present invention, it is preferable that an atmosphere in the conveying area is an inert gas, and that a pressure in the conveying area is set higher than a pressure in the loading area. [0017] The processing apparatus of the present invention further comprises a guiding surface disposed on a rear surface of the partition wall on a side of the loading area, the guiding surface guiding the pressing roller of the pressing and holding mechanism positioned at a standby position toward the part to be pressed of the container. [0018] The processing apparatus of the present invention further comprises a restricting member extended from the rotating shaft along an outer surface of the flat spring member, the restricting member supporting the flat spring member from a side of the outer surface when the pressing roller rides on the part to be pressed of the container from a lateral side. [0019] The processing apparatus of the present invention further comprises a sealing member disposed on a rear surface of the partition wall on a side of the loading area, the sealing member sealing a gap between the partition wall and the container, when the container is brought into contact with the opening. [0020] The processing apparatus of the present invention further comprises an inert gas introducing passage disposed in the partition wall, the inert gas introducing passage introducing an inert gas into the container, when the lid of the container is opened while the door is being closed. [0021] In the processing apparatus of the present invention, it is preferable that the parts to be pressed are formed of flange portions projecting from a front surface of the container in opposite directions. Continue reading... Full patent description for Processing apparatus and processing method Brief Patent Description - Full Patent Description - Patent Application Claims Click on the above for other options relating to this Processing apparatus and processing method patent application. ###  How KEYWORD MONITOR works... a FREE service from FreshPatents1. Sign up (takes 30 seconds). 2. Fill in the keywords to be monitored. 3. Each week you receive an email with patent applications related to your keywords. Start now! - Receive info on patent apps like Processing apparatus and processing method or other areas of interest. ### Previous Patent Application: Load port device Next Patent Application: Apparatus for loading small objects into blisters of packaging foil Industry Class: Material or article handling ### FreshPatents.com Support Thank you for viewing the Processing apparatus and processing method patent info. IP-related news and info Results in 0.67554 seconds Other interesting Feshpatents.com categories: Electronics: Semiconductor , Audio , Illumination , Connectors , Crypto , |
||
