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  Process for producing extremely flat microcrystalline diamond thin film by laser ablation methodUSPTO Application #: 20070020403Title: Process for producing extremely flat microcrystalline diamond thin film by laser ablation method Abstract: Diamond thin films deposited by known PLD processes are composed of diamond crystal grains with a size of about 1 μm and have an irregular surface. A process for producing an ultraflat nanocrystalline diamond thin film by laser ablation includes creating atomic hydrogen and a supersaturated state of carbon in a space between a target and a substrate in a hydrogen atmosphere inside a reaction chamber at a substrate temperature of 450° C. to 650° C., a laser energy of 100 mJ or more, and a target-substrate distance of 15 to 25 mm to enable the growth of an ultraflat, single-phase nanocrystalline diamond thin film containing substantially no non-diamond component. The hydrogen atmosphere has a sufficient pressure to selectively completely etch off sp2 bond fractions (graphite fractions) deposited on the substrate with sp3 bond fractions remaining. (end of abstract) Agent: Westerman, Hattori, Daniels & Adrian, LLP - Washington, DC, US Inventors: Tsuyoshi Yoshitake, Kunihito Nagayama, Takeshi Hara USPTO Applicaton #: 20070020403 - Class: 427586000 (USPTO) Related Patent Categories: Coating Processes, Direct Application Of Electrical, Magnetic, Wave, Or Particulate Energy, Chemical Vapor Deposition (e.g., Electron Beam Or Heating Using Ir, Inductance, Resistance, Etc.), Pyrolytic Use Of Laser Or Focused Light (e.g., Ir, Uv Lasers To Heat, Etc.) The Patent Description & Claims data below is from USPTO Patent Application 20070020403. Brief Patent Description - Full Patent Description - Patent Application Claims Continue reading... Full patent description for Process for producing extremely flat microcrystalline diamond thin film by laser ablation method Brief Patent Description - Full Patent Description - Patent Application Claims Click on the above for other options relating to this Process for producing extremely flat microcrystalline diamond thin film by laser ablation method patent application. ###  How KEYWORD MONITOR works... a FREE service from FreshPatents1. Sign up (takes 30 seconds). 2. Fill in the keywords to be monitored. 3. Each week you receive an email with patent applications related to your keywords. Start now! - Receive info on patent apps like Process for producing extremely flat microcrystalline diamond thin film by laser ablation method or other areas of interest. ### Previous Patent Application: Apparatus for removing rinse liquid and method for forming photoresist pattern using the same Next Patent Application: Topologically structured polymer coating Industry Class: Coating processes ### FreshPatents.com Support Thank you for viewing the Process for producing extremely flat microcrystalline diamond thin film by laser ablation method patent info. IP-related news and info Results in 1.32396 seconds Other interesting Feshpatents.com categories: Accenture , Agouron Pharmaceuticals , Amgen , AT&T , Bausch & Lomb , Callaway Golf |
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