Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing method -> Monitor Keywords
Fresh Patents
Monitor Patents Patent Organizer How to File a Provisional Patent Browse Inventors Browse Industry Browse Agents Browse Locations
     new ** File a Provisional Patent ** 
site info Site News  |  monitor Monitor Keywords  |  monitor archive Monitor Archive  |  organizer Organizer  |  account info Account Info  |  
08/16/07 | 45 views | #20070186856 | Prev - Next | USPTO Class 118 | About this Page  118 rss/xml feed  monitor keywords

Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing method

USPTO Application #: 20070186856
Title: Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing method
Abstract: The plasma processing apparatus wherein the means for applying a high frequency voltage, which becomes a voltage waveform in which a positive constant voltage and a negative constant voltage alternate with each other at given cycles, is constituted by a DC power source and a switching circuit (a chopper circuit). (end of abstract)
Agent: Antonelli, Terry, Stout & Kraus, LLP - Arlington, VA, US
Inventors: NAOKI YASUI, Seiichi Watanabe, Masahiro Sumiya, Hitoshi Tamura
USPTO Applicaton #: 20070186856 - Class: 11872300E (USPTO)


[The Full Description and Claims for this patents is not available from FreshPatents.com temporarily]

We apologize for the inconvenience:
Normally the full description and claims of the patent you are viewing (20070186856, Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing method) would be available here (see sample below). However, this information from this patent is currently not available from our database.

Most likely, this is a temporary technical issue. We have logged this message and will attempt to resolve the issue. Please check back again soon.

sample




Click on the above for other options relating to this Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing method patent application.
###
monitor keywords

How KEYWORD MONITOR works... a FREE service from FreshPatents
1. Sign up (takes 30 seconds). 2. Fill in the keywords to be monitored.
3. Each week you receive an email with patent applications related to your keywords.  
Start now! - Receive info on patent apps like Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing method or other areas of interest.
###


Previous Patent Application:
Apparatus and method for plasma processing
Next Patent Application:
Plasma processing reactor with multiple capacitive and inductive power sources
Industry Class:
Coating apparatus

###

Design/code © 2008 FreshContext LLC/Freshpatents.com. Website Terms and Conditions - Also read: About this Page
Patent data source: patents published by the United States Patent and Trademark Office (USPTO)
Information published here is for research/educational purposes only (and in conjunction with our Keyword Monitor) and is not meant to be used in place of the full USPTO patent document/images or a comprehensive patent archive search. Complete official applications are on file at the USPTO and often contain additional data/images (Freshpatents is currently text-only). FreshPatents.com is not affiliated with or endorsed by the USPTO or firms/individuals or products/designs/ideas related to listed patents.
FreshPatents.com Support
Thank you for viewing the Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing method patent info.
IP-related news and info


Results in 0.86285 seconds


Other interesting Feshpatents.com categories:
Electronics: Semiconductor ,  Audio ,  Illumination ,  Connectors ,  Crypto ,