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08/16/07 - USPTO Class 118 |  145 views | #20070186856 | Prev - Next | About this Page  118 rss/xml feed  monitor keywords

Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing method

USPTO Application #: 20070186856
Title: Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing method
Abstract: The plasma processing apparatus wherein the means for applying a high frequency voltage, which becomes a voltage waveform in which a positive constant voltage and a negative constant voltage alternate with each other at given cycles, is constituted by a DC power source and a switching circuit (a chopper circuit). (end of abstract)



Agent: Antonelli, Terry, Stout & Kraus, LLP - Arlington, VA, US
Inventors: NAOKI YASUI, Seiichi Watanabe, Masahiro Sumiya, Hitoshi Tamura
USPTO Applicaton #: 20070186856 - Class: 11872300E (USPTO)

Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing method description/claims


The Patent Description & Claims data below is from USPTO Patent Application 20070186856, Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing method.

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Apparatus and method for plasma processing
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Plasma processing reactor with multiple capacitive and inductive power sources
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