Photocopying inventions

20090262316 - Exposure apparatus and method for producing device: An exposure apparatus EX includes a recovery port which recovers a liquid, a blow port which is provided outside the recovery port with respect to an optical path space and which blows a gas therefrom, and a gas discharge port which is provided between the recovery port and blow port... Agent: Oliff & Berridge, PLC

20090262318 - Lithographic apparatus: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090262317 - Test method for determining reticle transmission stability: Methods, systems and apparatus for monitoring the state of a reticle by providing a reticle having a device exposure region in an imaging tool, defining one or more image fields across the device exposure region, and transmitting energy through the device exposure region. A detector detects the energy in the... Agent: Law Office Of Delio & Peterson, LLC.

20090262319 - Maskless exposure method: A maskless exposure method of drawing a circuit pattern includes: moving a substrate with respect to a projection optical system; scanning, by the projection optical system, the substrate in a first direction; shifting a scanning region in a second direction; scanning the substrate in the first direction so that an... Agent: Antonelli, Terry, Stout & Kraus, LLP

20090262320 - Method and lithographic apparatus for acquiring height data relating to a substrate surface: A method of positioning a target portion of a substrate with respect to a focal plane of a projection system uses a level sensor to perform height measurements of at least part of the substrate to generate height data. Specified and/or predetermined correction heights are used to compute corrected height... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090262322 - Optical arrangement of autofocus elements for use with immersion lithography: A lithographic projection apparatus includes an optical element through which a substrate is exposed with an exposure beam. A space between the optical element and the substrate is filled with liquid during the exposure. In addition, a gap is formed between a member and a surface, through which the exposure... Agent: Oliff & Berridge, PLC

20090262321 - Position measuring system and position measuring method, movable body apparatus, movable body drive method, exposure apparatus and exposure method, pattern forming apparatus, and device maufacturing method: A mirror block on which moving gratings are arranged is fixed to the lower surface of a stage. Fixed gratings are placed on the upper surface of a stage platform that is opposed to the lower surface of the stage. A Y encoder that measures Y positional information of the... Agent: Oliff & Berridge, PLC

20090262324 - Illumination optics for projection microlithography and related methods: A microlithographic projection exposure apparatus (1) comprises an illumination system (4) with an illumination optics (5) for illuminating an illumination field in a reticle plane (6). The illumination optics (5) further includes a light distribution device (12a) which comprises a light deflection array (12) of separate elements and an optical... Agent: Fish & Richardson PC

20090262323 - Measurement apparatus, exposure apparatus, and device manufacturing method: A measurement apparatus which measures a surface position of an object comprises a first measurement device configured to make measurement light from the object and reference light from a reference mirror interfere with each other on a light receiving surface of a photo-electric conversion device to form an interference pattern,... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090262325 - Positioning system, lithographic apparatus and device manufacturing method: A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090262326 - Stage system calibration method, stage system and lithographic apparatus comprising such stage system: A calibration method to calibrate an encoder position measurement system of a stage, the encoder position measurement system including an encoder grid and at least two sensor heads cooperating with the encoder grid, each sensor head providing a sensor head output signal showing a position sensitivity in a horizontal and... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090262327 - Mask transport system configured to transport a mask into and out of a lithographic apparatus: A mask transport system is configured to transport a mask into and out of a lithographic apparatus. The mask transport system includes a first container configured to shield a top side and a bottom side of the mask. At least a portion of the container is at least partially translucent... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090262328 - Illumination system and lithographic method: An illumination system of a lithographic apparatus is disclosed that includes a first optical element to receive a radiation beam, the first optical element comprising first raster elements that partition the radiation beam into a plurality of radiation channels, and a second optical element to receive the plurality of radiation... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090257032 - Optical element and method: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.... Agent: Fish & Richardson PC

20090257036 - Alignment apparatus for aligning multi-layer structures: An exemplary alignment apparatus can align a first layer with a second layer. The first layer has a first alignment pattern. The second layer has a second alignment pattern. The alignment apparatus includes a supporting device for supporting the first layer and the second layer, a light pervious reference plate,... Agent: PCe Industry, Inc. Att. Steven Reiss

20090257035 - Exposure apparatus, measurement method, stabilization method, and device fabrication method: The present invention provides an exposure apparatus including a projection optical system configured to project a reticle pattern onto a wafer, a selector configured to select a dummy wafer to be placed near an image plane of the projection optical system, from a plurality of dummy wafers having the same... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090257033 - Exposure method, exposure apparatus, and method for producing device: A method for exposing a substrate includes arranging, in a direction, pattern areas to projection systems respectively arranged at an interval and each having a magnifying magnification, the pattern areas having area widths each smaller than the interval and greater than a width obtained by dividing an exposure width of... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090257034 - Lithographic apparatus and device manufacturing method: In a lithographic apparatus, a control system is provided to automatically reduce throughput in the event that lens-heating aberrations exceed a certain threshold. The determination of whether lens-heating aberrations will exceed the threshold may be based upon a prediction, e.g. using a lens-heating model, or on measurements taken from a... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090257037 - Measurement method, measurement apparatus, exposure apparatus, and device fabrication method: The present invention provides a measurement method of measuring imaging performance of a projection optics which projects a reticle pattern onto a substrate, including a measurement step of measuring the imaging performance of the projection optics, and a calculation step of calculating the imaging performance of the projection optics in... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090257039 - Exposure apparatus and device manufacturing method: An exposure apparatus which exposes a substrate coated with a photoresist to form a latent image to the photoresist, comprises an original holding unit configured to hold an original including a phase-modulation diffraction grating so that an interference pattern is formed on a surface of the substrate by a light... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090257038 - Exposure apparatus and method of manufacturing device: An exposure apparatus (100) which exposes a substrate to light having a set light source shape via a mask (400) includes a plurality of light sources (201) arrayed two-dimensionally, and a light source control unit (700) which controls turning on and off of each of the plurality of light sources... Agent: Fitzpatrick Cella Harper & Scinto

20090257040 - Optical element with multiple primary light sources: The disclosure relates to an illumination system, such as an illumination system for use in microlithography. The illumination system can include an optical element with multiple primary light sources. The illumination system can illuminate a field in a field plane having a field contour. The illumination system can be configured... Agent: Fish & Richardson PC

20090257042 - Exposure apparatus and electronic device manufacturing method: An exposure apparatus including a field stop is provided. The exposure apparatus includes an illumination optical system that guides light from a light source to a pattern forming section, a projection optical system that projects, onto an exposed surface, a pattern image formed by the pattern forming section with light... Agent: Staas & Halsey LLP

20090257043 - Illumination optical system, exposure apparatus, device manufacturing method, and exposure optical system: An illumination optical system to illuminate an illumination target surface with light from a light source comprises a distribution forming optical system including an optical integrator and forming a pupil intensity distribution on an illumination pupil located behind the optical integrator; and a transmission filter with a transmittance characteristic varying... Agent: Staas & Halsey LLP

20090257041 - Illuminator for a photolithography device: The invention relates to an illuminator for a photolithography device. The invention comprises: a source (1′) of a light beam (10) which is used to illuminate a mask (8) and to expose an area of a wafer (W); at least one main array (4) of microlenses; and a shutter (6)... Agent: Harness, Dickey & Pierce, P.L.C

20090257044 - Lithographic apparatus and device manufacturing method: A lithographic apparatus and method for simultaneously exposing two patterning devices onto a substrate is disclosed. In an embodiment, a lithographic apparatus includes a plurality of illumination systems for receiving and conditioning a pulsed radiation beam, a beam director arranged between a source of the pulsed radiation and the illumination... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090257045 - Measuring method, adjustment method for stage movement characteristics, exposure method, and device manufacturing method: Provided is a measuring method including: transferring a measuring mark disposed on an original to a substrate at a plurality of locations; moving a substrate stage for holding the substrate so that the substrate is rotated by 90 degrees about a rotation axis parallel to an optical axis of a... Agent: Fitzpatrick Cella Harper & Scinto

20090251672 - Exposure apparatus, device production method, cleaning apparatus, cleaning method, and exposure method: An exposure apparatus exposes a substrate with an exposure light through an exposure liquid. The exposure apparatus includes an optical element from which the exposure light exits; a stage which is movable on the light-exit side of the optical element; a certain member which is provided on the stage; and... Agent: Oliff & Berridge, PLC

20090251673 - Transmitting optical element with low foreign-element contamination: A transmitting optical element of polycrystalline material that includes crystallites of magnesium spinel MgAl2O4 or lutetium-aluminum garnet Lu3Al5O12, wherein the polycrystalline material includes an average total concentration of foreign element contamination caused by Y, Sc, Co, Ni, Zr, Mo, Sn and/or Nb of less than 50 ppm, preferably of less... Agent: Sughrue Mion, PLLC

20090251674 - Lithographic apparatus and device manufacturing method: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090251675 - Exposure device: In an exposure device having tiny light emitting elements aligned, a space required for drive circuits and wires is secured without affecting the size or alignment of the light emitting elements for arrangement and wiring of the drive circuits. In this exposure device, the drive circuits are separately arranged outside... Agent: Greenblum & Bernstein, P.L.C

20090251676 - Exposure apparatus and exposure method: An exposure image is accurately projected. An exposure apparatus includes a light source for emitting exposure light, a DMD, which includes a plurality of two-dimensionally-arranged pixel portions, and a telecentric optical system for collimating principal rays of the exposure light. The telecentric optical system is positioned in an optical path... Agent: Mcginn Intellectual Property Law Group, PLLC

20090251677 - Illuminating optical unit and projection exposure apparatus for microlithography: A projection exposure apparatus for microlithography has an illumination system with an EUV light source and an illumination optical unit to expose an object field in an object plane. A projection optical unit images the object field into an image field in an image plane. A pupil facet mirror in... Agent: Fish & Richardson PC

20090251679 - Exposure method and exposure apparatus, stage unit, and device manufacturing method having two substrate stages with one stage temporarily positioned below the other stage: By an exposure method including a process where in parallel with an exposure operation performed on a wafer on one of the wafer stages, the other wafer stage is temporarily positioned under the one wafer stage in order to interchange both wafer stages, a part of the interchange operation (exchange... Agent: Oliff & Berridge, PLC

20090251678 - Stage unit, exposure apparatus, and device manufacturing method: A stage unit includes the following elements. A stator includes a first coil array in which first coils extending in the x direction are arranged in the y direction, a second coil array in which second coils extending in the x direction are arranged in the y direction and which... Agent: Canon U.s.a. Inc. Intellectual Property Division