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Photocopying

20130114055 - Mask and optical filter manufacturing apparatus including the same: A mask and an optical filter manufacturing apparatus having the same are provided. The optical filter manufacturing apparatus includes a roll used in a roll-to-roll process, a base film wound around the roll, a light source that generates light for exposure, a polarizing plate that is installed at an emission... Agent: Lg Chem Ltd

20130114056 - Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus: A method is disclosed for improving an optical imaging property, for example spherical aberration or the focal length, of a projection objective of a microlithographic projection exposure apparatus. First, an immersion liquid is introduced into an interspace between a photosensitive surface and an end face of the projection objective. Then... Agent: Carl Zeiss Smt Gmbh

20130114057 - Optical imaging device with thermal attenuation: An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the... Agent: Carl Zeiss Smt Gmbh

20130114059 - Components for euv lithographic apparatus, euv lithographic apparatus including such components and method for manufacturing such components: A metal component (262M, 300M) is designed for use in an EUV lithography apparatus, for example as a spectral purity filter (260) or a heating element (300) in a hydrogen radical generator. An exposed surface of the metal is treated (262P, 300P) to inhibit the formation of an oxide of... Agent: Asml Netherlands B.v.

20130114058 - Illumination optics apparatus, exposure method, exposure apparatus, and method of manufacturing electronic device: An illumination optical apparatus which constantly controls a plurality of polarization states with high accuracy. An illumination optical system, which illuminates a pattern surface of a mask with illumination light, includes a polarization optical system and a depolarizer. The polarization optical system includes a half wavelength plate and PBS, which... Agent: Nikon Corporation

20130114060 - Illumination system of a microlithographic projection exposure apparatus: An illumination system of a microlithographic projection exposure apparatus includes an optical integrator that includes an array of optical raster elements. A condenser superimposes the light beams associated with the optical raster elements in a common field plane. A modulator modifies a field dependency of an angular irradiance distribution in... Agent: Carl Zeiss Smt Gmbh

20130114062 - Compact encoder head for interferometric encoder system: An encoder system includes an encoder scale and an encoder head, in which the encoder head is configured to combine each twice-diffracted measurement beam of multiple twice-diffracted measurement beams with a corresponding reference beam to form multiple output beams, where the encoder head includes a monolithic optical component having multiple... Agent: Zygo Corporation

20130114061 - Double pass interferometric encoder system: An encoder head includes one or more components arranged to: i) direct a first incident beam to the diffractive encoder scale at a first incident angle with respect to the encoder scale; ii) receive a first return beam from the encoder scale at a first return angle, the first return... Agent: Zygo Corporation

20130107235 - Pattern-forming method: A pattern-forming method includes applying a photoresist composition to a substrate to form a resist film. The photoresist composition includes an acid generator and a first polymer that includes an acid-dissociable group. The resist film is exposed. The resist film is developed using a developer having an organic solvent content... Agent: Jsr Corporation

20130107236 - Lithographic apparatus and device manufacturing method: A lithographic apparatus includes a substrate table constructed to hold a substrate; a compartment configured to receive the substrate table; a thermal conditioning unit arranged to receive a substrate to be exposed and thermally condition the substrate; and a transfer system for transferring a thermally conditioned substrate to the substrate... Agent: Asml Netherlands B.v.

20130107237 - Method of slimming radiation-sensitive material lines in lithographic applications: A method and system for patterning a substrate using a radiation-sensitive material is described. The method and system include forming a layer of radiation-sensitive material on a substrate, exposing the layer of radiation-sensitive material to a pattern of radiation, and then performing a post-exposure bake following the exposing. The imaged... Agent: Tokyo Electron Limited

20130107238 - Lithographic apparatus and device manufacturing method: A apparatus having a projection system to project a plurality of radiation beams onto a substrate, wherein the plurality of radiation beams includes a first group of one or more radiation beams formed from radiation within a first wavelength range and a second group of one or more radiation beams... Agent: Asml Netherlands B.v.

20130107240 - Maskless vortex phase shift optical direct write lithography: The present invention provides methods and apparatus for accomplishing optical direct write phase shift lithography. A lithography system and method are provided wherein a mirror array is configured to generate vortex phase shift optical patterns that are directed onto a photosensitive layer of a substrate. The lithography methods and systems... Agent: Lsi Corporation

20130107239 - Optical arrangement for euv lithography and method for configuring such an optical arrangement: An optical arrangement, e.g. projection lens, for EUV lithography, provided with: a first optical element (22) having a reflective surface (31a) and a first substrate (32) composed of TiO2-doped quartz glass, which has a temperature-dependent coefficient of thermal expansion having a zero crossing at a first zero crossing temperature (TZC1),... Agent: Carl Zeiss Smt Gmbh

20130107241 - Lithographic apparatus and substrate handling method: A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, the lithographic apparatus including a substrate table constructed to hold a substrate and a gripper arranged to position the substrate on the substrate table. The gripper includes a vacuum clamp arranged to clamp the substrate... Agent: Asml Netherlands B.v.

20130100424 - Integrated monolithic optical bench containing 3-d curved optical elements and methods of its fabrication: An optical system, such as an integrated monolithic optical bench, includes a three-dimensional curved optical element etched in a substrate such that the optical axis of the optical system lies within the substrate and is parallel to the plane of the substrate.... Agent: Si-ware Systems

20130100425 - Fluid handling structure, a lithographic apparatus and a device manufacturing method: A fluid handling structure for a lithographic apparatus, the fluid handling structure to confine liquid to a space, the fluid handling structure having, on an undersurface surrounding the space, a liquid supply opening to supply liquid onto an undersurface of the fluid handling structure and, radially inward with respect to... Agent: Asml Netherlands B.v.

20130100426 - Method for producing facet mirrors and projection exposure apparatus: The disclosure relates to methods for producing mirrors, in particular facet mirrors, and projection exposure apparatuses equipped with the mirrors.... Agent: Carl Zeiss Smt Gmbh

20130100428 - Mask for euv lithography, euv lithography system and method for optimising the imaging of a mask: A mask (105) for EUV lithography includes a substrate (107), a multi-layer coating (108) applied to the substrate (107) and a mask structure (109) which is applied to the multi-layer coating (108) and which has an absorber material, the mask structure (109) having a maximum thickness of less than 100... Agent: Carl Zeiss Smt Gmbh

20130100427 - Metrology method and apparatus, and device manufacturing method: An approach is used to estimate and correct the overlay variation as function of offset for each measurement. A target formed on a substrate includes periodic gratings. The substrate is illuminated with a circular spot on the substrate with a size larger than each grating. Radiation scattered by each grating... Agent: Asml Netherlands B.v.

20130100429 - Optical system and multi facet mirror of a microlithographic projection exposure apparatus: An optical system of a microlithographic projection exposure apparatus includes a multi facet mirror having a support plate and a plurality of mirror facets. Each mirror facet includes a mirror substrate and a reflective coating applied thereon, and is attached to the support plate. Actuators are provided that induce a... Agent: Carl Zeiss Smt Gmbh

20130100430 - Lithographic apparatus and device manufacturing method: An apparatus and a method to hold a patterning device configured to impart a beam of radiation with a pattern in its cross-section. The apparatus includes a base configured to support the patterning device and an inner cover couplable to the base. The inner cover includes a restraining mechanism that,... Agent: Asml Holding N.v.

20130100431 - Method and apparatus for alignment processing: A method for alignment processing including making a substrate 4, coated with an aligned film, closely face the photo mask 7 having a first mask pattern group having a plurality of elongated first openings formed at a fixed array pitch and a second mask pattern group provided in parallel with... Agent: V Technology Co., Ltd.

20130094004 - Method and system for producing flat three-dimensional images: A method and system for producing a flat three-dimensional image utilizing acoustic transfer assist. An image is first developed in image bearing material onto the image bearing surface of a rendering device. A three-dimensional plastic sheet can be provided to the transfer section of the rendering device. Transfer of the... Agent: Xerox Corporation

20130094007 - Device and method for drying a photomask: An object of the present invention is a photomask drying device which includes: a sealed chamber containing at least one photomask, a pumping unit to set up and maintain vacuum within said chamber, a support for the photomask placed within said chamber, infrared radiation means placed within said chamber, a... Agent: Adixen Vacuum Products

20130094006 - Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method: A substrate conveyance device that conveys a substrate having been exposed with a pattern image via a projection optical system and a liquid, the substrate conveyance device comprising: a liquid detector that detects the liquid adhering on the substrate.... Agent: Nikon Corporation

20130094005 - Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning... Agent: Asml Netherlands B.v.

20130094009 - Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The planarization layer is of substantially uniform thickness and/or its outer surface has a peak... Agent: Asml Netherlands B.v.

20130094008 - Target positioning device, method for driving a target positioning device, and a lithography system comprising such a target positioning device: A target positioning device, in particular for a lithography system, comprising a carrier for carrying a target, and a stage for carrying and moving the carrier along a first direction (X). The stage comprising two X-stage bases, both arranged on top of a common base plate, each X-stage base carries... Agent:

20130094010 - Lithographic systems and processes of making and using same: A lithographic system includes a projection system for projecting an object field through a projection system's pupil onto an image field. The projection system includes an optical element located at the projection system's pupil. The projection system's pupil is manipulable with respect to normalized pupil heights by the optical element.... Agent: Carl Zeiss Smt Gmbh