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Photocopying February patent applications/inventions, industry category 02/13Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 02/28/2013 > 11 patent applications in 5 patent subcategories. patent applications/inventions, industry category
20130050666 - Exposure apparatus, liquid holding method, and device manufacturing method: An exposure apparatus exposes a substrate to exposure light through liquid. The exposure apparatus includes: a first member which is disposed in at least a portion of the periphery of a light path of the exposure light, and has a first surface that faces an upper surface of an object... Agent: Nikon Corporation
20130050665 - Fluid handling structure, a lithographic apparatus and a device manufacturing method: A fluid handling structure, lithographic apparatus and device manufacturing method are disclosed. According to a disclosed embodiment, the fluid handling structure is configured to confine an immersion fluid in a space between a final element of a projection system and a facing surface during movement of the facing surface relative... Agent: Asml Netherlands B.v.
20130050667 - Projection optical system, exposure apparatus, and method of manufacturing device: A projection optical system including a unity magnification reflecting optical system which forms an intermediate image of an object positioned on an object plane. The reflecting optical system includes a first mirror which reflects light emitted from the object plane, an optical system which reflects the light from the first... Agent: Canon Kabushiki Kaisha
20130050668 - Method of determining focus corrections, lithographic processing cell and device manufacturing method: A method of, and associated apparatus for, determining focus corrections for a lithographic projection apparatus. The method comprises exposing a plurality of global correction fields on a test substrate, each comprising a plurality of global correction marks, and each being exposed with a tilted focus offset across it; measuring a... Agent: Asml Netherlands B.v.
20130050672 - Apparatus for microlithographic projection exposure and apparatus for inspecting a surface of a substrate: An apparatus (10) for microlithographic projection exposure, which includes: an optical system (18) for imaging mask structures (16) onto a surface (21) of a substrate (20) by projecting the mask structures (16) with imaging radiation (13) onto an exposure area of the substrate surface, and various structure defining a measurement... Agent: Carl Zeiss Smt Gmbh
20130050671 - Imaging opticsiimaging optics, microlithography projection exposure apparatus having same and related methods: An imaging optics has a plurality of mirrors to image an object field in an object plane into an image field in an image plane. The imaging optics includes a first partial objective to image the object field onto an intermediate image, and the imaging optics includes a second partial... Agent: Carl Zeiss Smt Gmbh
20130050673 - Optical system of a microlithographic projection exposure apparatus: An optical system of a microlithographic projection exposure apparatus includes at least one mirror arrangement having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement. The optical system also includes a polarization-influencing optical arrangement... Agent: Carl Zeiss Smt Gmbh
20130050670 - Position measurement system, lithographic apparatus and device manufacturing method: A position measurement system includes a first part and a second part for determining a position of a first member relative to a second member by providing a position signal representing a position of the first part relative to the second part, and a computational unit comprising an input terminal... Agent: Asml Netherlands B.v.
20130050669 - Single-pass imaging system with anamorphic optical system: An single-pass imaging system utilizes a light source, a spatial light modulator and an anamorphic optical system to form a substantially one-dimensional high intensity line image on an imaging surface (e.g., the surface of a drum cylinder). The light source and the spatial light modulator are used to generate a... Agent: Palo Alto Research Center Incorporated
20130050675 - Lithographic apparatus, device manufacturing method, and method of calibrating a displacement measuring system: An interferometric displacement measuring system operable to measure displacements of a movable object of the lithographic apparatus in a first direction using a measurement beam of radiation and a reflector. The reflector being substantially planar and substantially perpendicular to the first direction. Calibration is obtained using a first set of... Agent: Asml Netherlands B.v.
20130050674 - Lithographic apparatus, substrate table and device manufacturing method: A substrate table with a sensor that includes a block of material provided with a layer of material opaque to radiation. The layer of material has at least one window configured to allow the transmission of the radiation. The sensor includes a wavelength conversion material located at the window, and... Agent: Asml Netherlands B.v.02/21/2013 > 10 patent applications in 5 patent subcategories. patent applications/inventions, industry category
20130044299 - Projection-type photolithography system using composite photon sieve: The present disclosure relates to the field of micro-nano fabrication, and provides a projection-type photolithography system using a composite photon sieve. The system comprises: a lighting system, a mask plate, a composite photon sieve and a substrate, which are arranged in order. The lighting system is adapted to generate incident... Agent: Institute Of Microelectronics, Chinese Academy Of Sciences
20130044300 - Double-sided maskless exposure system and method: A double-sided maskless exposure system and method consists of light sources which includes two light wavelength segments, maskless optical engines in which a 2D spatial light modulation(spatial light modulator) device, such as DMD, is generating a plurality of pixel array of the pattern, vision system, moving substrate and computer control... Agent:
20130044302 - Lithographic apparatus and method: A lithographic apparatus includes an illumination system, a patterning device, and a projection system. The illumination system provides a radiation beam. The patterning device imparts the radiation beam with a pattern in its cross-section. The substrate holder holds a substrate. The projection system projects the patterned radiation beam onto a... Agent: Asml Netherlands B.v.
20130044303 - Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system: A projection exposure system and a method for operating a projection exposure system for microlithography with an illumination system are disclosed. The illumination system includes at least one variably adjustable pupil-defining element. The illumination stress of at least one optical element of the projection exposure system is determined automatically in... Agent: Carl Zeiss Smt Gmbh
20130044304 - Optical projection system: An optical projection unit comprising a first optical element module and at least one second optical element module is provided. The first optical element module comprises a first housing unit and at least a first optical element, the first optical element being received within the first housing unit and having... Agent: Carl Zeiss Smt Gmbh
20130044301 - Programmable illuminator for a photolithography system: A programmable illuminator for a photolithography system includes a light source, a first optical system having a light uniformizing element, a programmable micro-mirror device, and a second optical system that forms an illumination field that illuminates a reticle. The programmable micro-mirror device can be configured to perform shutter and edge-exposure-blocking... Agent: Ultratech, Inc.
20130044305 - Apparatus for transferring a substrate in a lithography system: An apparatus for transferring substrates within a lithography system, the lithography system comprising a substrate preparation unit for clamping a substrate onto a substrate support structure to form a clamped substrate, and an interface with a substrate supply system for receiving unclamped substrates. The apparatus comprises a body provided with... Agent: Mapper LithographyIPB.v.
20130044306 - Exposure apparatus and method of manufacturing device: An exposure apparatus includes: a substrate stage configured to move upon holding the substrate; a structural member configured to support a substrate stage; a first counter mass stage configured to cancel a driving reaction force that is generated due to driving of the substrate stage and acts on the structural... Agent: Canon Kabushiki Kaisha
20130044307 - Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method: A drive system drives a movable body, based on measurement results of a first measurement system which measures the position of the movable body in an XY plane by irradiating a measurement beam from an arm member on a grating placed on a surface parallel to the XY plane of... Agent: Nikon Corporation
20130044308 - System and method for an adjusting optical proximity effect for an exposure apparatus: A method for matching a first OPE curve (700) for a first exposure apparatus (10A) used to transfer an image to a wafer (28) to a second OPE curve (702) of a second exposure apparatus (10B). The method can include the step of adjusting a tilt of a wafer stage... Agent: Nikon Precision Inc.02/14/2013 > 8 patent applications in 6 patent subcategories. patent applications/inventions, industry category
20130038848 - Optical devices having kinematic components: Optical devices that have at least one optical element and a plurality of kinematic components are disclosed. The number m of the kinematic components of one type exceed the number n of degrees of freedom in which the optical element can be manipulated. At least one of the n degrees... Agent: Carl Zeiss Smt Gmbh
20130038851 - Discharge lamp, connecting cable, light source apparatus, and exposure apparatus: A light source device having a large cooling action on the base member of a discharge lamp. A connector on the sides of the power supply and the air blower and the base-side connector of a discharge lamp are connected to each other through a connection cable having a power... Agent:
20130038850 - Illumination system and projection objective of a mask inspection apparatus: An illumination system and a projection objective of a mask inspection apparatus are provided. During operation of the mask inspection apparatus, the illumination system illuminates a mask with an illumination bundle of rays having a centroid ray that has a direction dependent on the location of the incidence of the... Agent: Carl Zeiss Smt Gmbh
20130038849 - Optical component comprising radiation protective layer: An optical component for transmitting radiation includes a radiation protective layer, which includes at least one oxide material selected from germanium dioxide (GeO2), antimony pentoxide (Sb2O5), aluminum oxide (Al2O3), niobium(V) oxide (Nb2O5), tin oxide (SnO2), metal oxides of rare earths, in particular lanthanum oxide (La2O3) or cerium oxide (CeO2), yttrium... Agent: Carl Zeiss Smt Gmbh
20130038852 - Reticle removing apparatus and reticle removing method using the same: A reticle removing apparatus adapted to remove a reticle in a reticle library of an exposure apparatus is provided. The reticle removing apparatus includes a bracket and a reticle removing module movably coupled to the bracket, wherein the reticle removing module is configured to be moved into the reticle library... Agent: United Microelectronics Corporation
20130038853 - Nanometer-precision six-degree-of-freedom magnetic suspension micro-motion table and application thereof: A nanometer precision six-DOF magnetic suspension micro-stage and the application thereof are provided which are mainly used in semiconductor photolithography devices. The micro-stage includes a cross support and four two-DOF actuators. Each 2-DOF actuator comprises a vertically polarized permanent magnet, a horizontal force coil and a vertical force coil; the... Agent:
20130038854 - Substrate table assembly, an immersion lithographic apparatus and a device manufacturing method: A substrate table assembly, an immersion lithographic apparatus and a device manufacturing method are disclosed. The substrate table assembly includes a substrate table to support a substrate; and a gas handling system to provide a gas to a region between the substrate table and a substrate mounted on the substrate... Agent: Asml Netherlands B.v.
20130038855 - Lithography apparatus and manufacturing method of commodities: The present invention provides a lithography apparatus which transfers a pattern onto a substrate using an original including a pattern region in which the pattern is formed, the apparatus including a stocker configured to store the original, a processing unit configured to perform a transfer process of transferring the pattern... Agent: Canon Kabushiki Kaisha02/07/2013 > 8 patent applications in 4 patent subcategories. patent applications/inventions, industry category
20130033686 - Direct application of dampening fluid for a variable data lithographic apparatus: A system and corresponding methods are disclosed for applying a dampening fluid to a reimageable surface of an imaging member in a variable data lithography system, without a form roller. In one embodiment, the system includes subsystems for converting a dampening fluid from a liquid phase to a dispersed fluid... Agent: Palo Alto Research Center Incorporated
20130033687 - Method for direct application of dampening fluid for a variable data lithographic apparatus: A system and corresponding methods are disclosed for applying a dampening fluid to a reimageable surface of an imaging member in a variable data lithography system, without a form roller. In one embodiment, the system includes subsystems for converting a dampening fluid from a liquid phase to a dispersed fluid... Agent: Palo Alto Research Center Incorporated
20130033688 - System for direct application of dampening fluid for a variable data lithographic apparatus: A system and corresponding methods are disclosed for applying a dampening fluid to a reimageable surface of an imaging member in a variable data lithography system, without a form roller. In one embodiment, the system includes subsystems for converting a dampening fluid from a liquid phase to a dispersed fluid... Agent: Palo Alto Research Center Incorporated
20130033689 - Dynamic masking method for micro-truss foam fabrication: A system for fabricating a radiation-cured structure is provided. The system includes a radiation-sensitive material configured to at least one of initiate, polymerize, crosslink and dissociate with exposure to radiation. At least one radiation source is configured to project a radiation beam toward the radiation-sensitive material. A smart glass device... Agent: Gm Global Technology Operations, Inc.
20130033690 - Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp: An electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The clamp comprises a first layer of material, an electrode disposed over the first layer, an isolating, dielectric or semi-dielectric material deposited between portions of the electrode, and a second layer disposed over... Agent: Asml Holding N.v.
20130033691 - Method and apparatus for loading a substrate: A method and apparatus for loading a substrate (W) onto a substrate table (WT) then moving the substrate table such that, in the reference frame of the substrate, the substrate table accelerates downwards with an acceleration which is at least 10% of the acceleration due to gravity, thereby reducing friction... Agent: Asml Netherlands B.v.
20130033692 - Fluid handling structure, a lithographic apparatus and a device manufacturing method: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary of a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the... Agent: Asml Netherlands B.v.
20130033693 - Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus, and device manufacturing method: Positional information of a movable body in a Y-axis direction is measured using an interferometer and an encoder whose short-term stability of measurement values excels when compared with the interferometer, and based on the measurement results, a predetermined calibration operation for obtaining correction information for correcting measurement values of the... Agent: Nikon CorporationPrevious industry: Optics: image projectors
Next industry: Optics: measuring and testing
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