SEARCH:      Monitor Keywords |  Custom RSS

Photocopying January recently filed with US Patent Office 01/13

20130027678 - Method and device for producing contact copies of reflection volume holograms: A method and a device are described for producing copies/replica of a volume reflection hologram wherein a holographic film (4) is guided over a drum with polygon cross-section having at least two planar (polygon) master surfaces (3) to each of which at least one master (7) is attached in the... Agent: Hologram Industries Research Gmbh

20130027679 - Focus detection apparatus for projection lithography system: Disclosed is a focus detection apparatus for a projection lithography system. The apparatus comprises: a laser; a focus optical unit configured to focusing the emitted laser beam; a force detection unit configured to reflect the focused laser beam at the backside; a position detection unit configured to detect variations in... Agent: The Institute Of Optics And Electronics, The Chinese Academy Of Sciences

20130027683 - Electron-beam exposure method and electron-beam exposure apparatus: An effective region of the light-sensitive film to be exposed is divided in a radial direction of the substrate, into at least a first region, and a second region adjacent to the first region and provided at more outer peripheral side of the substrate than the first region, and a... Agent: Hoya Corporation

20130027681 - Euv collector: A collector transfers an emission of an EUV radiation source to a main intensity spot. The collector has at least one collector subunit including at least one grazing incidence mirror. The grazing incidence mirror transfers EUV radiation from the radiation source to an intensity spot. At least one ellipsoid mirror... Agent: Carl Zeiss Smt Gmbh

20130027682 - Exposure apparatus, exposure method, and method for producing device: A part of exposure beam through a liquid via a projection optical system enters a light-transmitting section, enters an optical member without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of... Agent: Nikon Corporation

20130027684 - Exposure apparatus, substrate processing apparatus, and device manufacturing method: An exposure apparatus that transfers a pattern provided along a predetermined cylindrical surface onto a substrate while rotating the pattern in a circumferential direction of the cylindrical surface is provided, which includes a first projection optical system that projects an image of a first partial pattern of the pattern which... Agent:

20130027680 - Measurement method, measurement apparatus, exposure method, and exposure apparatus: To perform high-speed and highly accurate measurement by setting desired measuring conditions for each measuring object. In an alignment sensor of exposure apparatus, in the case of performing position measurement for a plurality of sample shots, measurement is performed by changing the measuring conditions, in response to a measuring axis... Agent: Nikon Corporation

20130021588 - Measurement apparatus, exposure apparatus, and method of manufacturing device: A measurement apparatus includes a beam splitter that splits light from a light source into measurement light to be directed to an object to be measured and reference light to be directed to a reference surface, a beam combiner that combines the measurement light reflected by the object and the... Agent: Canon Kabushiki Kaisha

20130021589 - Projection optical system, exposure apparatus, exposure method, display manufacturing method, mask, and mask manufacturing method: An exposure apparatus of the present invention is an exposure apparatus for, while moving a first object M and a second object P along a scanning direction, performing projection exposure on the second object, which has a first projection optical system PL10 for forming an enlargement image of a portion... Agent: Nikon Corporation

20130021591 - Illumination system of a microlithographic projection exposure apparatus: An illumination system of a microlithographic projection exposure apparatus includes a spatial light modulator which varies an intensity distribution in a pupil surface. The modulator includes an array of mirrors that reflect impinging projection light into directions that depend on control signals applied to the mirrors. A prism, which directs... Agent: Carl Zeiss Smt Gmbh

20130021590 - Light exposure apparatus and method of controlling the same: The present invention relates to a method of controlling a light exposure apparatus including an exposure beam generator equipped with a prism or a bend minor and a vacuum chamber through which light generated in the exposure beam generator passes. The method includes, generating an exposure beam; measuring a deviation... Agent: Samsung Electronics Co., Ltd.

20130021592 - Arrangement for and method of characterising the polarisation properties of an optical system: An arrangement for and a method of characterising the polarisation properties of an optical system, in particular an optical system of a microlithographic projection exposure apparatus. The arrangement includes at least one polarisation state generator (130, 230, 330) which sets a defined polarisation state of radiation incident on the optical... Agent: Carl Zeiss Smt Gmbh

20130021593 - Substrate handling apparatus and lithographic apparatus: A substrate handling apparatus for handling a substrate is disclosed. The substrate handling apparatus includes a substrate feeding device to feed the substrate towards an exposure area, a substrate receiving device to receive the substrate from the exposure area, and a substrate stabilization device to maintain, at least in the... Agent: Asml Netherlands B.v.

20130021594 - Exposure apparatus and device manufacturing method: The exposure apparatus of the present invention has an original holding unit including a holding frame that holds an original M by attracting the outer peripheral portion thereof and a drive unit that is capable of moving the holding frame while changing an irradiation area of the light to be... Agent: Canon Kabushiki Kaisha

20130016327 - Lithography system and method for storing positional data of a target: The invention relates to a lithography system for patterning a target, said system comprising a feedback control system comprising an actuator for displacing the target, a measurement system for measuring a position of said target, and a control unit adapted for controlling the actuator based on the position measured by... Agent:

20130016328 - Dispersing immersion liquid for high resolution imaging and lithography: Methods and apparatus are described for delivering index-matching immersion liquid in high numerical-aperture optical microscopy and lithography. An array of immersion liquid droplets is delivered to a specimen substrate or specimen substrate cover by an immersion liquid printing apparatus. An immersion liquid reservoir provides immersion liquid to the printer by... Agent: Applied Precision, Inc.

20130016329 - Exposure apparatus, exposure method, measurement method, and device manufacturing method: An exposure apparatus includes: an optical member which has an emission surface and in which a liquid immersion space is formed; a measurement member has a conductive first film and an upper surface, the upper surface includes a first portion and a second portion, the first portion being capable of... Agent: Nikon Corporation

20130016330 - Digital exposure apparatus and method of exposing a substrate using the same: A digital exposure apparatus includes a displaceable stage, a light source part, a digital micro mirror part and a micro lens part. A substrate is disposed on the stage. The light source part generates a first light. The digital micro mirror part is disposed over the stage. The digital micro... Agent:

20130016331 - Optical system of microlithographic projection exposure apparatus and method of correcting wavefront deformation in same: An optical system of a microlithographic projection exposure apparatus includes a wavefront correction device which has a plurality of fluid outlet apertures. The apertures are arranged so that fluid flows emerging from the outlet apertures enter a space through which projection light propagates during operation of the apparatus. A temperature... Agent: Carl Zeiss Smt Gmbh

20130016332 - Fluid handling structure, a lithographic apparatus and a device manufacturing method: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the... Agent: Asml Netherlands B.v.

20130016333 - Fluid handling structure, a lithographic apparatus and a device manufacturing method: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the... Agent: Asml Netherlands B.v.

20130010271 - Apparatus and methods for recovering fluid in immersion lithography: An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confinement... Agent: Nikon Corporation

20130010270 - Lithographic apparatus and device manufacturing method: A lithographic apparatus having a component that moves in a first direction, the component including a passive gas flow system. The passive gas flow system has a gas inlet to drive gas into the passive gas flow system when the component moves in the first direction and a gas outlet,... Agent: Asml Netherlands B.v.

20130010272 - Determination method, storage medium and information processing apparatus: The present invention provides a determination method of determining exposure conditions of an exposure apparatus including an illumination optical system which illuminates a mask, and a projection optical system which projects a pattern of the mask onto a substrate, the method including a step of setting an illumination parameter for... Agent: Canon Kabushiki Kaisha

20130010273 - Linear motor magnetic shield apparatus: A magnetic shield having non-magnetic gaps provides reduced magnetic cross-talk for a linear motor array in a precision positioning system. Redirecting the leakage flux limits the cross-talk and associated deleterious effects. Such preferred magnetic circuit paths for the leakage are affixed to the moving magnet system of the linear motor.... Agent: Asml Holding N.v.

20130010274 - Masks for use in lithography including image reversal assist features, lithography systems including such masks, and methods of forming such masks: Microlithography masks are disclosed, such as those that include one or more image reversal assist features disposed between at least two primary mask features. The one or more image reversal assist features may be defined by a patterned relatively non-transparent material on a mask substrate. Microlithography systems include such masks.... Agent: Micron Technology, Inc.

20130010275 - Lithographic apparatus and spectral purity filter: A reflector includes a multi layer mirror structure configured to reflect radiation at a first wavelength, and one or more additional layers. The absorbance and refractive index at a second wavelength of the multi layer mirror structure and the one or more additional layers, and the thickness of the multi... Agent: Asml Netherlands Bv

20130010276 - Exposure apparatus, exposure method, and device manufacturing method: An exposure apparatus includes a first optical member from which an exposure beam is emitted; a first object movable at a light-exit side of the first optical member; a second object movable, independently of the first object, at the light-exit side of the first optical member; and a driving unit... Agent: Nikon Corporation

20130010277 - System and method for using a two part cover and a box for protecting a reticle: Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside... Agent: Asml Holding N.v.

20130003030 - Laser ablation tooling via distributed patterned masks: A distributed patterned mask for use in a laser ablation process to image a complete pattern onto a substrate. The mask has a plurality of apertures for transmission of light and non-transmissive areas around the apertures. When the apertures for the distributed pattern are repeatedly imaged on a substrate, structures... Agent: 3m Innovative Properties Company

20130003029 - Optical imaging writer system: System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the method includes providing a parallel imaging writer system which has a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, receiving a mask... Agent: Pinebrook Imaging Systems Corporation

20130003031 - Method of measuring focus of a lithographic projection apparatus: A method of measuring focus of a lithographic projection apparatus includes exposure of a photoresist covered test substrate with a plurality of verification fields. Each of the verification fields includes a plurality of verification markers, and the verification fields are exposed using a predetermined focus offset. After developing, an alignment... Agent: Asml Netherlands B.v.

20130003034 - Active shield for capacitive measurement system: A capacitive measurement system for generating a measurement signal representative of a measured position or distance to a target. The system has a first circuit comprising a thin film capacitive sensor (1a) arranged for providing a sensor capacitance in dependence on the measured position or distance; a cable (30a) comprising... Agent: Mapper LithographyIPB.v.

20130003033 - Exposure device, photo-mask, and method for manufacturing liquid crystal display: The present invention is directed to an exposure apparatus and photo-mask, and method for manufacturing liquid crystal display using the same. An exposure apparatus according to an exemplary embodiment of the present invention provides an exposure apparatus which includes: a first photo-mask comprising a plurality of transmission parts; and a... Agent: Samsung Electronics Co., Ltd.

20130003032 - Pulsed laser source with high repetition rate: Methods and systems for generating pulses of laser radiation at higher repetition rates than those of available excimer lasers are disclosed that use multiple electronic triggers for multiple laser units and arrange the timings of the different triggers with successive delays, each delay being a fraction of the interval between... Agent: Anvik Corporation

20130003035 - Apparatus and method for lithography: A lithography apparatus is provided. The lithography apparatus includes: a polarizing filter that converts incident light to first polarized light having a single polarizing direction; and a photo mask that is disposed to be separated from the polarizing filter and in which a polarizing pattern having a polarization axis of... Agent: Korea Institute Of Machinery & Materials

20130003036 - Photo mask unit comprising a photomask and a pellicle and a method for manufacturing the same: It is an object of the present invention to provide a photomask unit suitable for forming a microscopic pattern of 32 nm or smaller on a photoresist film using the EUV exposure technique and being able to reliably prevent the flatness of a photomask from being lowered. The photomask unit... Agent: Shin-etsu Chemical Co., Ltd.