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Photocopying December patent applications/inventions, industry category 12/12

20120327381 - Radiation source, lithographic apparatus and device manufacturing method: A radiation source for generating extreme ultraviolet radiation for a lithographic apparatus has a debris mitigation device comprising a nozzle arranged at or near an intermediate focus (IF) of the beam of radiation. The nozzle serves to direct a flow of gas (330) towards the radiation source or collector optic... Agent: Asml Netherlands B.v.

20120327382 - Projection objective for microlithography: A projection objective for imaging a pattern arranged in an object surface of the projection objective into an image surface of the projection objective with a demagnified imaging scale has a plurality of optical elements which are arranged along an optical axis of the projection objective and are configured so... Agent:

20120327384 - Mirror elements for euv lithography and production methods therefor: A method for the production of a mirror element (10) that has a reflective coating (10a) for the EUV wavelength range and a substrate (10b). The substrate (10b) is pre-compacted by hot isostatic pressing, and the reflective coating (10a) is applied to the pre-compacted substrate (10b). In the method, either... Agent: Carl Zeiss Smt Gmbh

20120327383 - System and method to ensure source and image stability: The present invention discloses various system and process embodiments where wafer-metrology and direct measurements of the lithography apparatus characteristics are combined to achieve temporal drift reduction in a lithography apparatus/process using a simulation model. The simulation model may have sub-components. For example, a sub-model may represent a first set of... Agent: Asml Netherlands B.v.

20120327385 - Optical system for semiconductor lithography: Semiconductor lithography system includes a plurality of optical components, including an optical component movable a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the... Agent: Carl Zeiss Smt Gmbh

20120327386 - Lithographic apparatus, method of deforming a substrate table and device manufacturing method: A lithographic apparatus includes a projection system, a substrate table, a plurality of sensors, an actuator and a controller. The projection system is configured to project a patterned beam of radiation onto a substrate. The substrate table is configured to support the substrate and to move relative to the projection... Agent: Asml Netherlands B.v.

20120327387 - Positioning device, lithographic apparatus, positioning method and device manufacturing method: A positioning device for positioning an object within a lithographic apparatus, including a support structure for supporting the object, at least two short-stroke units, each connected to the support structure, and a long-stroke unit. In the arrangement, each of the short-stroke units includes a short-stroke actuator system configured to provide... Agent: Asml Netherlands B.v.

20120327388 - Laser exposure method and product: Provided are a high-resolution laser exposure method and a product manufactured with use of the laser exposure method, the laser exposure method being capable of performing high-resolution laser plate-making in gravure plate-making, offset plate-making, flexo plate-making, and the like, and being usable in laser exposure of a circuit pattern in... Agent: Think Laboratory Co. Ltd.

20120320349 - Photolithography systems and associated methods of overlay error correction: Several embodiments of photolithography systems and associated methods of overlay error correction are disclosed herein. In one embodiment, a method for correcting overlay errors in a photolithography system includes measuring a plurality of first overlay errors that individually correspond to a microelectronic substrate in a first batch of microelectronic substrates.... Agent: Micron Technology, Inc.

20120320348 - Reflective mask for euv lithography: To improve the mask of an EUV lithography apparatus in view of its high reflectivity, a reflective mask is suggested for EUV lithography having a reflective multilayer system on a substrate configured for a working wavelength in the EUV range and having stacks with layers of at least two materials... Agent: Carl Zeiss Smt Gmbh

20120320350 - Exposure apparatus, exposure method, and device fabrication method: An exposure apparatus forms an immersion area by supplying a liquid onto a part of a substrate, and forms a prescribed pattern on the substrate through the liquid. A spare immersion area which is capable of holding part of the liquid on the substrate, is formed at the outer circumference... Agent: Nikon Corporation

20120320351 - Immersion lithography system using a sealed wafer bath: Immersion lithography system and method using a sealed wafer bottom are described. One embodiment is an immersion lithography apparatus comprising a lens assembly comprising an imaging lens and a wafer stage for retaining a wafer beneath the lens assembly, the wafer stage comprising a seal ring disposed on a seal... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20120320352 - Multibeam exposure scanning method and apparatus, and method of manufacturing printing plate: This invention is concerning a multibeam exposure scanning method and apparatus, and a method of manufacturing a printing plate. The problem to be solved is that angular small convex points are to be stably formed through multibeam exposure. The above problem is to be solved by a multibeam exposure scanning... Agent:

20120320353 - Projection exposure apparatus and optical system: The disclosure relates to a projection exposure apparatus and an optical system, such as a projection objective or an illumination system in a projection exposure apparatus for microlithography, that includes at least one optical element and at least one manipulator having a drive device for the optical element. The drive... Agent: Carl Zeiss Smt Gmbh

20120320357 - Clamping device, assembly and lithographic projection apparatus: A clamping device is constructed and arranged to clamp two parts together. The clamping device includes an aligner constructed and arranged to bring the two parts in an aligned position with respect to each other, a clamp constructed and arranged to maintain the two parts in the aligned position, a... Agent: Asml Netherlands B.v.

20120320355 - Light source apparatus and image projection apparatus: A light source apparatus includes a light source unit that includes plural sets of a laser and a coupling lens corresponding to the laser, which are circumferentially provided to form a circle; and a reflecting unit placed within the circle and provided with plural reflecting surfaces corresponding to the lasers... Agent: Ricoh Company, Ltd.

20120320359 - Lithographic apparatus and device manufacturing method: A lithographic apparatus having a substrate table constructed to hold a substrate and an optical column capable of creating a pattern on a target portion of the substrate. The optical column may include a programmable patterning device configured to provide a plurality of radiation beams and a projection system configured... Agent: Asml Netherlands B.v.

20120320358 - Method for operating a projection exposure apparatus with correction of imaging aberrations induced by the mask: The disclosure relates to a method for adapting a projection exposure apparatus for microlithography to a mask having structures with different pitches and/or different structure widths in different structure directions. Wavefront aberrations induced by the mask are reduced by a manipulator of the projection exposure apparatus for microlithography.... Agent: Carl Zeiss Smt Gmbh

20120320354 - Multilayer mirror and lithographic apparatus: A multilayer mirror constructed to reflect radiation having a wavelength in the range of 6.4 nm to 7.2 nm. The multilayer mirror has alternating layers, including a first layer and a second layer. The first and second layers are selected from the group consisting of: U, or a compound or... Agent: Asml Netherlands B.v.

20120320356 - Wavefront modification apparatus, lithographic apparatus and method: A wavefront modification apparatus that has a plurality of acoustic emitters, the acoustic emitters configured to emit acoustic waves which travel at least partially across a radiation beam conduit. The acoustic emitters may be configured to establish a standing acoustic wave which extends at least partially across the radiation beam... Agent: Asml Netherlands B.v.

20120320360 - Exposure apparatus and device fabrication method: The present invention provides an exposure apparatus including a light shielding plate which is placed on a plane conjugate to an object plane of a projection optical system in an illumination optical system, includes, on an edge thereof, an arc that overlaps a circular boundary line inside an outer periphery... Agent: Canon Kabushiki Kaisha

20120320361 - Cluster tool architecture for processing a substrate: Embodiments of the invention generally include a robot assembly comprising a robot operable to position a substrate at one or more points within a plane, and a motion assembly having a motor operable to position the robot in a direction generally parallel to a first direction. The motion assembly comprises... Agent:

20120320362 - Multiple-blade holding devices: An exemplary device includes first and second portions that are movably connected together by first and second sets, respectively, of multiple blades interleaved with each other at an overlap region. When the overlap region is compressed, displacement of the first and second portions relative to each other is prevented so... Agent: Nikon Corporation

20120314193 - Exposure apparatus, exposure method, exposure apparatus maintenance method, exposure apparatus adjustment method and device manufacturing method: An exposure apparatus exposes a substrate using exposure light via a liquid. The exposure apparatus comprises a substrate holding part, which releasably holds and is capable of moving a substrate, a management apparatus, which manages a status of usage of a dummy substrate that the substrate holding part is capable... Agent: Nikon Corporation

20120314194 - Lithographic apparatus and device manufacturing method: A lithographic apparatus having an optical column capable of creating a pattern on a target portion of the substrate. The optical column may be provided with a self-emissive contrast device configured to emit a beam and a projection system configured to project the beam onto the target portion. The apparatus... Agent: Asml Netherlands B.v.

20120314196 - Lithography wave-front control system and method: Some embodiments include system and methods to obtain information for adjusting variations in features formed on a substrate of a semiconductor device. Such methods can include determining a first pupil in an illumination system used to form a first feature, and determining a second pupil used to form a second... Agent: Micron Technology, Inc

20120314197 - Maskless processing apparatus: Disclosed herein is a maskless processing apparatus including: an illumination optical system providing light illuminated to a substrate; a spatial light modulator (SLM) including a plurality of light conversion devices and controlling corresponding light conversion devices to selectively reflect or transmit the light illuminated from the illumination optical system according... Agent: Samsung Electro-mechanics Co., Ltd.

20120314195 - Method for determining illumination source with optimized depth of focus: A method for determining an illumination source with optimized depth of focus includes the following steps. First, a simulated optimal correlation and a simulated defocus correlation of each illumination source are provided. Second, an optimal peak is determined, a defocus peak is determined, and an optimal correlation slope and a... Agent:

20120314198 - Methods of estimating point spread functions in electron-beam lithography processes: In a method of estimating a PSF in the electron-beam lithography process, a linear resist test pattern may be formed on a substrate. A line response function (LRF) may be determined using a cross-sectional profile of the linear resist test pattern. A development rate distribution in a first direction, the... Agent:

20120307215 - Flow through mems package: A flow through Micro-Electromechanical Systems (MEMS) package and methods of operating a MEMS packaged using the same are provided. Generally, the package includes a cavity in which the MEMS is enclosed, an inlet through which a fluid is introduced to the cavity during operation of the MEMS and an outlet... Agent:

20120307217 - System and method for treating substrate: A method and system for treating a substrate are provided. The system includes a coating unit, a pre/post-exposure treatment unit, and a developing unit. Each of the units includes a load port and an index module. The pre/post-exposure treatment unit includes first and second modules that are arranged in different... Agent:

20120307216 - Temperature sensing probe, burl plate, lithographic apparatus and method: A temperature sensing probe including a temperature sensor in an elongate housing wherein the elongate housing of the probe is elongate in a first direction and the elongate housing is comprised of a material which has a thermal conductivity of at least 500 W/mK at 20° C. in at least... Agent: Asml Netherlands B.v.

20120307218 - Method of correcting defects in a reflection-type mask and mask-defect correction apparatus: According to one embodiment, a method of correcting defects in a reflection-type mask is provided, which comprises acquiring a mask-pattern image of the mask, by using a mask-defect correction apparatus includes a mechanism configured to detect a defect in the mask and a mechanism configured to correct the defect, acquiring... Agent:

20120307219 - Criss-cross writing strategy: In general, one aspect of the technology described can be embodied in methods that include the action of applying a writing mechanism having non-isotropic writing properties resulting from different degrees of coherence interaction in a sweep direction and a cross-sweep direction, writing an image pattern twice on a work piece... Agent: Micronic Mydata Ab

20120307220 - Maintenance method, exposure method, exposure apparatus, and method for producing device: An exposure apparatus irradiates an exposure light beam EL in a state that a space KS, between predetermined optical elements LS1 and LS2 among a plurality of optical elements included in a projection optical system, is filled with a liquid LQ. When the exposure light beam EL is not irradiated... Agent: Nikon Corporation

20120307221 - Imaging device with varying optical signal: Example embodiments disclosed herein relate to an imaging device. The imaging device includes a multi-dimensional array of light sensitive elements, an illumination source that outputs an optical signal, an optical element that focuses the optical signal on the array, and an illumination controller. The illumination controller varies the output of... Agent:

20120307222 - Lithographic apparatus and device manufacturing method: A lithographic apparatus having an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column may have a self-emissive contrast device configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus... Agent:

20120307223 - Lithographic apparatus and device manufacturing method: A lithographic apparatus having an optical column capable of projecting a beam on a target portion on a substrate held by the substrate support. The optical column may have a self-emissive contrast device to emit the beam. The optical column may include a projection system to project the beam onto... Agent: Asml Netherlands B.v.

20120307225 - Optical imaging writer system: System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, a parallel imaging writer system includes a plurality of spatial light modulator (SLM) imaging units, where each of the plurality of SLM imaging units includes one or more illumination sources,... Agent: Pinebrook Imaging Technology, Ltd. (formerly Pinebrook Imaging Systems Corporation)

20120307224 - Spectral purity filter: A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of... Agent: Asml Netherlands B.v.

20120307226 - Detection apparatus, exposure apparatus, device fabrication method and filter: The present invention provides a detection apparatus which detects an object to be detected, the apparatus including an illumination system configured to illuminate the object with light containing a first wavelength range and a second wavelength range different from the first wavelength range, a detector configured to detect light from... Agent: Canon Kabushiki Kaisha

20120307227 - Movable body drive method, pattern formation method, exposure method, and device manufacturing method for maintaining position coordinate before and after switching encoder head: Positional information of a stage within a movement plane is measured, using three encoders which include at least one each of an X encoder and a Y encoder. Based on position measurement values of the stage, the encoder used in position measurement is switched from an encoder (Enc1, Enc2 and... Agent: Nikon Corporation

20120307228 - Positioning apparatus, exposure apparatus and device manufacturing method: A positioning apparatus includes a stage, a base, a supporting mechanism which is arranged between the stage and the base and supports the stage with a supporting portion having a spring characteristic, an actuator which is arranged between the stage and the base so as to drive the stage, and... Agent: Canon Kabushiki Kaisha