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Photocopying October categorized by USPTO classification 10/12

20120268721 - Apparatus for and method of wafer edge exposure: An apparatus for wafer edge exposure comprises a first exposure unit and a second exposure unit. The first exposure unit includes a first light source to emit first light of multiple wavelengths, and a first mask to direct the first light toward a first area at an edge portion of... Agent: Macronix International Co., Ltd.

20120268723 - Exposure apparatus and image forming apparatus: An exposure apparatus according to this invention uses both a first light source which outputs a light beam corresponding to a drive current corresponding to image information, and a second light source to irradiate the surface of a photosensitive drum with a plurality of light beams. The second laser light... Agent: Canon Kabushiki Kaisha

20120268722 - Radiation detector, method of manufacturing a radiation detector, and lithographic apparatus comprising a radiation detector: In one an embodiment, there is provided an assembly comprising at least one detector. Each of the at least one detector includes a substrate having a doped region of a first conduction type, a layer of dopant material of a second conduction type located on the substrate, a diffusion layer... Agent: Asml Netherlands B.v.

20120268724 - Lithography system for processing a target, such as a wafer, a method for operating a lithography system for processing a target, such as a wafer and a substrate for use in such a lithography system: The invention relates to a lithography system for processing a target, such as a wafer and a substrate for use in such a lithography system. The lithography system comprises a beam source arranged for providing a patterning beam, a final projection system arranged for projecting a pattern on the target... Agent:

20120268725 - Lithography system for processing a target, such as a wafer, and a method for operating a lithography system for processing a target, such as a wafer: The invention relates to a lithography system for processing a target, such as a wafer. The lithography system comprises a beam source arranged for providing a patterning beam, a final projection system arranged for projecting a pattern on the target surface, a chuck arranged for supporting the target and a... Agent:

20120268726 - Lyophobic run-off path to collect liquid for an immersion lithography apparatus: An exposure apparatus exposes a substrate by radiating a light onto the substrate through an optical assembly and a liquid provided on the substrate. The exposure apparatus includes a stage assembly which is movable relative to the optical assembly, the stage assembly including a support which supports the substrate, a... Agent: Nikon Corporation

20120262684 - Environmental system including vacuum scavenge for an immersion lithography apparatus: A liquid immersion lithography apparatus exposes a wafer through a liquid in a space under a lens. The apparatus includes a containment member provided such that the containment member surrounds the space under the lens, and a seal member provided between the lens and the containment member. The containment member... Agent: Nikon Corporation

20120262683 - Exposing method, exposure apparatus, and device fabricating method: An exposure apparatus comprises: a first detection apparatus, which detects the temperature of a liquid after the liquid contacts a prescribed object; and a processing apparatus that detects the relationship between the temperature of the liquid and the temperature of the object based on the detection result of the first... Agent: Nikon Corporation

20120262685 - Double euv illumination uniformity correction system and method: A lithographic apparatus includes a uniformity correction system located at a plane and configured to receive a substantially constant pupil when illuminated with the beam of radiation. The uniformity correction system includes fingers that move into and out of intersection with a beam so as to correct an intensity of... Agent: Asml Holding N.v.

20120262686 - Optical imaging writer system: System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the method includes providing a parallel imaging writer system having a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, receiving a mask data... Agent: Pinebrook Imaging Systems Corporation

20120262687 - Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine: Apparatus and methods keep immersion liquid in a space adjacent to an optical assembly. An optical assembly projects an image onto a substrate supported adjacent to the optical assembly by a substrate table. An insertion member insertable into the space between the optical assembly and the substrate, the substrate table,... Agent: Nikon Corporation

20120262690 - Illumination system, lithographic apparatus and illumination method: An illumination system includes a field-facet mirror-device and a pupil mirror configured to condition a beam of radiation incident on the field-facet mirror-device. The field-facet mirror-device includes reflective field facets movable between first and second orientations relative to the incident beam. The field facets in their first orientations are effective... Agent: Asml Netherlands B.v.

20120262689 - Lithographic apparatus and device manufacturing method: In a lithographic apparatus, an illumination mode is set using a field mirror that includes a plurality of movable facets to direct radiation to selectable positions on a pupil facet mirror. A base illumination mode is selected from a set of predetermined illumination modes and the movable facets are set... Agent: Asml Netherlands B.v.

20120262691 - Movable body drive system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method: A stage device is equipped with a first scale which is placed with a Y-axis direction serving as its longitudinal direction and in which a first grating whose periodic direction is in an X-axis direction is formed and a second scale which is placed with the X-axis direction serving as... Agent: Nikon Corporation

20120262688 - Optical apparatus for conditioning a radiation beam for use by an object, lithography apparatus and method of manufacturing devices: In an EUV (extreme ultraviolet) lithography apparatus, an illumination system includes a multifaceted field mirror and a multifaceted pupil mirror. A field facet mirror within mirror focuses EUV radiation onto a particular associated pupil facet mirror, from where it is directed to a target area. Each field facet mirror is... Agent: Asml Netherlands B.v.

20120257175 - Control method for stereolithography structure: Disclosed is a control method for stereolithography structure, including the steps of: providing a stereolithography structure including a main circuit system, an interface system, and a USB transmission interface. The main circuit system controls the interface system and the interface system includes a printing driving platform for allowing an user... Agent: Microjet Technology Co., Ltd

20120257176 - Substrate transport method, substrate transport apparatus, and coating and developing system: A substrate transporting method includes: after a holding unit of a substrate holding apparatus receives a substrate from one placement location for a substrate and holds it, detecting a first positional deviation of the substrate from a reference position of the substrate on the holding unit; transporting the substrate held... Agent: Tokyo Electron Limited

20120257179 - Apparatus and methods to recover liquid in immersion lithography: Methods and apparatus remove liquid from a surface of a substrate, a substrate table, or both, by applying a vacuum to a passage having first and second opposite ends while the first end is in contact with or close to the liquid. This causes the liquid to flow into the... Agent: Nikon Corporation

20120257177 - Illumination design for lens heating mitigation: A method for reducing the effects of lens heating of a lens in an imaging process includes determining heat load locations on the lens according to an illumination source and a reticle design, obtaining a lens response characterization according to the heat load locations, and utilizing the heat load locations... Agent:

20120257178 - Lithographic apparatus and device manufacturing method: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the... Agent: Asml Netherlands B.v.

20120257180 - Method of cleaning pipe of immersion exposure apparatus, and method of manufacturing device: A method of cleaning a supply pipe of an immersion exposure apparatus includes a cycle including a step of increasing a flow rate of a cleaning liquid via a supply pipe, which supplies a liquid to a gap between a substrate and a final surface of a projection optical system,... Agent: Canon Kabushiki Kaisha

20120257181 - Substrate treatment device: A single-wafer substrate processing device is provided which does not spill a processing liquid and the vapors thereof to an exterior when directly supplying the process liquid to a surface of a substrate to process the substrate and which prevents the process liquid and the vapors, etc., thereof to adhere... Agent:

20120257182 - Lithographic method and assembly: A lithographic method of determining a sensitivity of a property of a pattern feature to change in optical aberrations of a lithographic apparatus used to provide that pattern feature. The method includes controlling a configuration of the lithographic apparatus to establish a first aberration state, forming a first image of... Agent: Asml Netherlands B.v.

20120257184 - Lithographic apparatus, device manufacturing method, and method of correcting a mask: A lithographic apparatus includes a mask correction system configured to controllably and locally alter a property of a mask, for example transmissivity, transmissivity to a particular polarization state, birefringence and/or geometry. The mask correction system, in an embodiment, directs a beam of radiation onto a spot of the mask, the... Agent: Asml Netherlands B.v.

20120257183 - Nanolithography system: A nanolithography system comprising a novel optical printing head suitable for high throughput nanolithography. This optical head enables a super-resolution lithographic exposure tool that is otherwise compatible with the optical lithographic process infrastructure. The exposing light is transmitted through specially designed super-resolution apertures, of which the “C-aperture” is one example,... Agent:

20120257185 - Apparatus for manufacturing a mask: A method of manufacturing a mask includes dividing an upper surface of a template having a design pattern into a plurality of regions, the template being arranged over a polymer layer on a mask substrate, correcting a distorted region among the regions, pressing the polymer layer with the template to... Agent:

20120249982 - Fluid handling structure, a lithographic apparatus and a device manufacturing method: A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure, wherein the fluid handling structure has a main body with an undersurface, a moveable member moveable relative to the main body, and a self-regulating... Agent: Asml Netherlands B.v.

20120249983 - Lithographic apparatus and device manufacturing method: An apparatus, in an embodiment, having a patterning device support including a first planar element having a first flow-restricting surface; a second planar element including a second flow-restricting surface facing the first flow-restricting surface; a support driver to linearly move the support along a certain direction relative to the second... Agent: Asml Holding N.v.

20120249984 - Lithography system with differential interferometer module: The invention relates to a lithography system comprising an optical column, a moveable target carrier for displacing a target such as a wafer, and a differential interferometer module, wherein the interferometer module is adapted for emitting three reference beams towards a first mirror and three measurement beams towards a second... Agent:

20120249985 - Measurement of an imaging optical system by superposition of patterns: A device for measuring an imaging optical system, including: a first grating pattern (6), which is positionable in a beam path upstream of the imaging optical system, having a first grating structure (16), a second grating pattern (8), which is positionable in the beam path (4) downstream of the imaging... Agent: Carl Zeiss Smt Gmbh

20120249986 - Determination method, control method, determination apparatus, pattern forming system and program: A determination method, a control method, a determination apparatus, a pattern forming system, and a storage medium can determine a replacement time of a focus ring accurately and quickly. The determination method is capable of determining the replacement time of a focus ring that surrounds a substrate to increase uniformity... Agent: Tokyo Electron Limited

20120249987 - Lithographic apparatus and method: A lithographic apparatus includes: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a... Agent: Asml Netherlands B.v.

20120249988 - Optical beam deflecting element, illumination system including same, and related method: An optical beam deflecting element may be used effectively as an energy distribution manipulator in an illumination system to vary the energy distribution within a given spatial intensity distribution in a pupil plane of the illumination system substantially without changing the shape and size and position of illuminated areas in... Agent: Carl Zeiss Smt Gmbh

20120249989 - Illumination optical device, illumination method, and exposure method and device: An illumination optical apparatus includes a light splitting device which splits the beam into a plurality of beams with respective polarization states different from each other, a spatial light modulation device which is arranged on at least one of a first optical path in which a first beam out of... Agent: Nikon Corporation

20120249993 - Exposure method and exposure apparatus: An exposure method includes a step of moving a photomask by a predetermined distance and switching a first mask pattern group to a second mask pattern group when an exposure to a first exposure area on an object to be exposed by the first mask pattern group of the photomask... Agent: V Technology Co., Ltd.

20120249991 - Planar motor and lithographic apparatus comprising such planar motor: A motor includes a stator including a plurality of stator poles arranged in a repetitive arrangement with a first pitch, the stator poles facing a first side of a plane of movement, and a mover including a plurality of mover poles arranged in a repetitive arrangement with a second pitch,... Agent: Asml Netherlands B.v.

20120249990 - Substrate processing apparatus: A substrate processing apparatus includes an indexer block, a first processing block, a second processing block, and an interface block. The indexer block includes a pair of carrier platforms and a transport section. A carrier storing a plurality of substrates in multiple stages is placed in each of the carrier... Agent:

20120249992 - Substrate transfer apparatus and substrate transfer method: A substrate transfer apparatus includes: a transfer base; a plate-like holding member which is configured to hold a substrate and which is horizontally movable back and forth with respect to the transfer base; a piezoelectric body mounted to the holding member and which, when a voltage is applied thereto, contracts... Agent: Tokyo Electron Limited

20120249994 - Lithographic apparatus and a device manufacturing method: An immersion lithographic apparatus includes a surface having at least one active group (e.g., lyophobic group) which, during use, comes into contact with immersion liquid, and an immersion liquid supply system configured to provide immersion liquid comprising a protection component which is more reactive with a product of photoionization of... Agent: Asml Netherlands B.v.

20120249995 - Resist protective film material and pattern formation method: The invention is a protective film material for immersion lithography that enables desirable immersion lithography, can be removed simultaneously with development of a photoresist layer, and has excellent process adaptability. The invention also includes a method for forming a pattern using the material. More specifically, the invention is a protective... Agent: Shin-etsu Chemical Co. Ltd.