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Photocopying September class, title,number 09/12

20120242967 - Lithographic apparatus and method: A lithographic apparatus comprising an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, the patterning device serving to impart the radiation beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the... Agent: Asml Netherlands B.v.

20120242968 - Method for adjusting an illumination system of a projection exposure apparatus for projection lithography: A method includes moving a correction device into a neutral position; subsequently ascertaining, for a given arrangement of imaging light channels in the illumination optical unit of the projection exposure apparatus, intensity distributions of at least some of the individual imaging light partial beams along a transverse coordinate transverse to... Agent: Carl Zeiss Smt Gmbh

20120242969 - Lithographic apparatus: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first... Agent: Asml Netherlands B.v.

20120242970 - Metrology method and apparatus, and device manufacturing method: Methods are disclosed for measuring target structures formed by a lithographic process on a substrate. A grating or other structure within the target is smaller than an illumination spot and field of view of a measurement optical system. The position of an image of the component structure varies between measurements,... Agent: Asml Netherlands B.v.

20120236272 - Combination stop for catoptric projection arrangement: The disclosure relates to an optical projection arrangement that can be used to image a reticle onto a substrate. The projection arrangement includes reflective elements, by which a ray path is defined. A combination stop is in a pupil of the ray path. The combination stop has a first opening... Agent: Carl Zeiss Smt Gmbh

20120236276 - Immersion lithography system using direction-controlling fluid inlets: Immersion lithography system and method using direction-controlling fluid inlets are described. According to one embodiment of the present disclosure, an immersion lithography apparatus includes a lens assembly having an imaging lens disposed therein and a wafer stage configured to retain a wafer beneath the lens assembly. The apparatus also includes... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20120236274 - Liquid crystal panel manufacturing apparatus and method for manufacturing the liquid crystal panel: According to one embodiment, a liquid crystal panel manufacturing apparatus includes a treatment bath, a light transmissive window, a liquid flowing unit, and a light irradiation unit. The treatment bath is configured to contain a liquid and to treat a panel in the liquid, wherein the panel includes a liquid... Agent: Harison Toshiba Lighting Corp.

20120236275 - Projection system, lithographic apparatus and device manufacturing method: Various configurations of a projection system, of a lithographic apparatus, and of a device manufacturing method are disclosed. According to a disclosed configuration, the projection system is configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes an optical element having a... Agent: Asml Netherlands B.v.

20120236273 - Target supply unit: A target supply unit may include: a reservoir for storing a target material; a heater provided inside the reservoir for heating the target material stored in the reservoir; a heater power supply for supplying current to the heater; and a target outlet for outputting the target material stored inside the... Agent: Gigaphoton Inc

20120236277 - Catadioptric projection objective comprising deflection mirrors and projection exposure method: A catadioptric projection objective has a multiplicity of lenses and at least one concave mirror, and also two deflection mirrors in order to separate a partial beam path running from the object field to the concave mirror from the partial beam path running from the concave mirror to the image... Agent: Carl Zeiss Smt Gmbh

20120236278 - Image processing-based lithography system and method of coating target object: A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus... Agent: Snu R&db Foundation

20120236279 - Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure: In view of realizing a lithographic process which makes it possible to estimate and correct flare with an extremely high accuracy, and causes only an extremely small dimensional variation in width, over the entire portion not only of a single shot region, but also of a single chip region, a... Agent: Fujitsu Semiconductor Ltd

20120236283 - Exposure apparatus: Exposure apparatus includes photomasks on which a mask pattern having the same shape as that of an exposure pattern exposed onto a surface of a TFT substrate held on a stage is formed, lens assemblies in which unit lens groups in each of which a plurality of convex lenses are... Agent: V Technology Co., Ltd.

20120236280 - Exposure device and image forming apparatus: An exposure device includes at least one light emitting element that emits light in a normal direction of the substrate; at least one hologram element that is recorded on a recording layer arranged on the substrate to diffract light emitted from the light emitting element and condense the diffracted light... Agent: Fuji Xerox Co., Ltd.

20120236284 - Illumination optical system, exposure apparatus, and device manufacturing method: An illumination optical system for illuminating an irradiated plane M with illumination light provided from a light source includes a spatial light modulator, which is arranged in an optical path of the illumination optical system and forms a desired light intensity distribution at a pupil position of the illumination optical... Agent: Nikon Corporation

20120236282 - Imaging optical system: The disclosure generally relates to imaging optical systems that include a plurality of mirrors, which image an object field lying in an object plane in an image field lying in an image plane, where at least one of the mirrors has a through-hole for imaging light to pass through. The... Agent: Carl Zeiss Smt Gmbh

20120236281 - Source multiplexing illumination for mask inspection: Methods and systems for source multiplexing illumination for mask inspection are disclosed. Such illumination systems enable EUV sources of small brightness to be used for EUV mask defect inspection at nodes below the 22 nm. Utilizing the multiple plane or conic mirrors that are either attached to a continuously rotating... Agent: Kla-tencor Corporation

20120236285 - Illumination optical system, exposure apparatus, and exposure method: An illumination optical system illuminates an irradiated surface with light supplied from a light source. The illumination optical system includes a diffractive optical element disposed in an optical path of linearly polarized light supplied from the light source. The diffractive optical element forms a multipole illumination field. including a plurality... Agent: Nikon Corporation

20120229782 - Lithographic apparatus and device manufacturing method: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to... Agent: Asml Netherlands B.v.

20120229783 - Lithographic apparatus and device manufacturing method: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to... Agent: Asml Netherlands B.v.

20120229784 - Mirror for use in a microlithography projection exposure apparatus: A mirror including a substrate and a reflective coating that includes a first group of layers and a second group of layers arranged between the substrate and the first group of layers. Both the first and second groups of layers include a plurality of alternating first material layers and second... Agent: Carl Zeiss Smt Gmbh

20120229785 - Multilayer mirror, lithograpic apparatus, and methods for manufacturing a multilayer mirror and a product: A multilayer mirror is configured to reflect extreme ultraviolet (EUV) radiation while absorbing a second radiation having a wavelength substantially-longer than that of the EUV radiation. The mirror includes a plurality of layer pairs stacked on a substrate. Each layer pair comprises a first layer that includes a first material,... Agent: Asml Netherlands B.v.

20120229786 - Method of controlling a lithographic apparatus, device manufacturing method, lithographic apparatus, computer program product and method of improving a mathematical model of a lithographic process: A method of controlling a lithographic apparatus, the method including setting an illumination system of the lithographic apparatus to effect a selected illumination mode, measuring a value of a first parameter of the lithographic apparatus, calculating a value of a second parameter of a projected image of a feature of... Agent: Asml Netherlands B.v.

20120229787 - Lithographic apparatus and device manufacturing method: In a lithographic apparatus, an illumination mode is set using a field mirror comprising a plurality of movable facets to direct radiation to selectable positions on a pupil facet mirror. In the event that a field facet mirror is defective and cannot be set to a desired position, another of... Agent: Asml Netherlands B.v.

20120224154 - Exposure apparatus, exposure method, and method for producing device: An exposure apparatus exposes a substrate by irradiating exposure light on the substrate through liquid. The exposure apparatus has a substrate holder for holding the substrate, a substrate stage capable of moving the substrate held by the substrate holder, and a temperature adjusting system for adjusting the temperature of the... Agent: Nikon Corporation

20120224153 - Optical arrangement, in particular in a projection exposure apparatus for euv lithography: An optical arrangement, in particular in a projection exposure apparatus for EUV lithography. In an aspect an optical arrangement has a housing (100, 200, 550, 780) in which at least one optical element is arranged, and at least one subhousing (140, 240, 560, 790, 811, 823, 824, 831, 841) which... Agent: Carl Zeiss Smt Gmbh

20120224155 - Direct write lithography system: The invention pertains to a direct write lithography system comprising: A converter comprising an array of light controllable electron sources, each field emitter being arranged for converting light into an electron beam, the field emitters having an element distance between each two adjacent field emitters, each field emitter having an... Agent: Mapper LithographyIPB.v.

20120224156 - Method of correcting flare and method of preparing extreme ultra violet mask: A method of correcting flare includes measuring flare of a test pattern, calculating point spread functions (PSFs) of the flare as a function of distance, and correcting the flare using corresponding PSFs for an influence range of the flare. The influence range is divided into a first range less than... Agent:

20120224157 - Movable body drive method and system, pattern formation method and apparatus, exposure method and apparatus for driving movable body based on measurement value of encoder and information on flatness of scale, and device manufacturing method: A drive unit drives a wafer stage in a Y-axis direction based on a measurement value of an encoder that measures position information of the wafer stage in the Y-axis direction and based on information on the flatness of a scale that is measured by the encoder. In this case,... Agent: Nikon Corporation

20120224159 - Method and apparatus for patterning a disk: An apparatus to carry out patterning of a disk includes a rotatable mask having a cone shape and a nanopattern on an exterior surface of said mask and a radiation source configured to supply radiation of a wavelength of 436 nm or less from said nanopattern, while said nanopattern is... Agent: Rolith, Inc.

20120224158 - Movable body drive method and system, pattern formation method and apparatus, exposure method and apparatus for driving movable body based on measurement value of encoder and information on flatness of scale, and device manufacturing method: A drive unit drives a wafer stage in a Y-axis direction based on a measurement value of an encoder that measures position information of the wafer stage in the Y-axis direction and based on information on the flatness of a scale that is measured by the encoder. In this case,... Agent: Nikon Corporation

20120224160 - Reflective optical imaging system: An optical imaging system serving for imaging a pattern arranged in an object plane of the imaging system into an image plane of the imaging system with the aid of electromagnetic radiation from a wavelength range around a main wavelength λ0 has a multiplicity of mirrors. Each mirror has a... Agent: Carl Zeiss Smt Gmbh

20120224162 - Image forming apparatus: Positions in a main scanning direction of points of exposure are determined by emission of light from two light-emitting points of each exposure device near predetermined endmost light-emitting points. A first exposure device of which a distance between the two light-emitting points is greatest is identified based on the determined... Agent: Brother Kogyo Kabushiki Kaisha

20120224161 - Lithographic apparatus and method: A lithographic apparatus comprising an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, the patterning device serving to impart the radiation beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the... Agent: Asml Netherlands B.v.

20120224163 - Exposure apparatus and method of manufacturing device: An apparatus includes original positioning mechanism which positions original stage, substrate positioning mechanism which positions substrate stage, measurement device mounted on the substrate stage, and controller. One of original and the original stage is provided with first measurement pattern including patterns, at least one of pitches and widths thereof being... Agent: Canon Kabushiki Kaisha