|Photocopying patents - Monitor Patents|
USPTO Class 355 | Browse by Industry: Previous - Next | All
08/2012 | Recent | 13: May | Apr | Mar | Feb | Jan | 12: Dec | Nov | Oct | Sep | Aug | July | June | May | April | Mar | Feb | Jan | 11: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | 10: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | | 09: Dec | Nov | Oct | Sep | Aug | Jl | Jn | May | Apr | Mar | Fb | Jn | | 2008 | 2007 |
Photocopying August inventions list 08/12Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 08/30/2012 > 7 patent applications in 3 patent subcategories. inventions list
20120218531 - Developing method and apparatus using organic-solvent containing developer: Provided are a developing method and a developing apparatus that can reduce process time and improve throughput in a developing process using a developer containing organic solvent. The present invention relates to a developing method for performing developing by supplying a developer containing organic solvent to a substrate having its... Agent: Tokyo Electron Limited
20120218532 - Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufaturing method: A gas manifold to direct a gas flow between two parallel plates of an optical component of a lithographic apparatus, the gas manifold having an inlet to provide a gas flow to the gas manifold, a lattice comprising a plurality of through holes to homogenize the gas flow, a contractor... Agent: Asml Netherlands B.v.
20120218536 - Catadioptric projection objective including a reflective optical component and a measuring device: A catadioptric projection objective for images an object field onto an image field via imaging radiation. The projection objective includes at least one reflective optical component and a measuring device. The reflective optical component, during the operation of the projection objective, reflects a first part of the imaging radiation and... Agent: Carl Zeiss Smt Gmbh
20120218537 - Exposure apparatus and photomask used therein: In an exposure apparatus, a photomask 3 is provided with a plurality of mask pattern columns 15 formed by arranging a plurality of mask patterns 13 at a predetermined pitch in a direction substantially orthogonal to a conveying direction A of an object to be exposed and a plurality of... Agent:
20120218534 - Lithographic apparatus, a method of controlling the apparatus and a device manufacturing method: An immersion lithographic apparatus is disclosed having a projection system configured to direct a patterned beam of radiation onto a substrate and a liquid handling system configured to supply and confine immersion liquid to a space defined between the projection system and a substrate, or a substrate table, or both.... Agent: Asml Netherlands B.v.
20120218535 - Method and device for a spatially resolved introduction of an intensity pattern comprising electro-magnetic radiation into a photosensitive substance as well as applications thereof: A method for the spatially resolved introduction of an intensity pattern of electro-magnetic radiation by at least one optic display system into a photosensitive substance having properties which can be changed by photon exposure. These properties include a first, liquid and at least one second state, with the electro-magnetic radiation... Agent: Nanoscribe Gmbh
20120218533 - Method of calculating model parameters of a substrate, a lithographic apparatus and an apparatus for controlling lithographic processing by a lithographic apparatus: Estimating model parameters of a lithographic apparatus and controlling lithographic processing by a lithographic apparatus includes performing an exposure using a lithographic apparatus projecting a pattern onto a wafer. A set of predetermined wafer measurement locations is measured. Predetermined and measured locations of the marks are used to generate radial... Agent: Asml Netherlands B.v.08/23/2012 > 14 patent applications in 6 patent subcategories. inventions list
20120212713 - Lithographic apparatus and method having substrate and sensor tables: A lithographic apparatus includes a substrate table capable of holding a substrate, a projection system that projects a patterned beam of radiation onto the substrate held by the substrate table, and a sensor table that is not capable of holding a substrate but that includes a sensor capable of sensing... Agent: Nikon Corporation
20120212717 - Exposure apparatus and photo mask: The present invention provides an exposure apparatus in which a photo mask having a plurality of openings, each having a predetermined shape, formed in a light shielding film mounted on one surface of a transparent substrate 9 is disposed proximately and oppositely to a subject 6 to be exposed, and... Agent: V Technology Co., Ltd.
20120212715 - Lithographic apparatus and lithographic projection method: A lithographic apparatus, includes an illumination system configured to condition a radiation beam, a first support constructed to support a first patterning device and a second support to support a second patterning device, the first and second patterning device being capable of imparting the radiation beam with a pattern in... Agent: Asml Netherlands B.v.
20120212714 - Manufacturing device of a film patterned retarder for a three dimensional display device: The present disclosure relates to a manufacturing device of a film patterned retarder for a three dimensional display devices. The present disclosure suggests a device for manufacturing a film patterned retarder comprising: a light source configured to irradiate an ultra violet light to an exposure area; a left polarizer and... Agent: Lg Display Co., Ltd.
20120212716 - Optical element and exposure apparatus: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the... Agent: Nikon Corporation
20120212720 - Device for guiding electromagnetic radiation into a projection exposure apparatus: A device for guiding electromagnetic radiation into a projection exposure apparatus for semiconductor lithography includes an optical fibre and an actuator for the mechanical manipulation of a section of the fibre as a result of which a temporally averaged homogenization of an intensity profile of electromagnetic radiation emerging at an... Agent: Carl Zeiss Smt Gmbh
20120212723 - Electromagnetic actuator, stage apparatus and lithographic apparatus: An electromagnetic actuator includes a first and second magnetic members that are displaceable relative to each other and are arranged to provide a magnetic circuit; and a coil configured to, in use, receive a current to generate a magnetic flux through the magnetic circuit, thereby generating a force between the... Agent: Asml Netherlands B.v.
20120212718 - Optical apparatus, method of scanning, lithographic apparatus and device manufacturing method: An apparatus measures positions of marks on a lithographic substrate. A measurement optical system comprises illumination subsystem for illuminating the mark with a spot of radiation and a detecting subsystem for detecting radiation diffracted by the mark. A tilting mirror moves the spot of radiation relative to the reference frame... Agent: Asml Netherlands B.v.
20120212721 - Substrates and mirrors for euv microlithography, and methods for producing them: Mirrors having a reflecting coating for the EUV wavelength region and a substrate. A surface region of the substrate extends uniformly below the reflecting coating along this coating and, seen from the surface of the substrate, has a depth of down to 5 μm. Here, this surface region has a... Agent: Carl Zeiss Smt Gmbh
20120212719 - Thermal management systems, assemblies and methods for grazing incidence collectors for euv lithography: Systems, assemblies and methods for thermally managing a grazing incidence collector (GIC) for EUV lithography applications are disclosed. The GIC thermal management assembly includes a GIC mirror shell interfaced with a jacket to form a sealed chamber. An open cell, heat transfer (OCHT) material is disposed within the metal chamber... Agent:
20120212724 - Illumination optical system, exposure apparatus, and method of manufacturing device: An illumination optical system comprises plural rod integrators, a combining optical system and a light transmission unit. The rod integrators uniformize light intensity distributions of the light beams. The combining optical system combines the light beams emitted from the rod integrators, so that the light beams are adjacent to each... Agent: Canon Kabushiki Kaisha
20120212725 - Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The thin film stack comprises an (optional) isolation layer, a metal layer forming an electrode,... Agent: Asml Netherlands B.v.
20120212726 - Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method: Positional information of a movement plane of a wafer stage is measured using an encoder system such as, for example, an X head and a Y head, and the wafer stage is controlled based on the measurement results. At the same time, positional information of the wafer stage is measured... Agent: Nikon Corporation08/16/2012 > 6 patent applications in 4 patent subcategories. inventions list
20120206700 - Apparatus for manufacturing a photomask: A method for manufacturing a photomask based on design data includes the steps of forming a figure element group including a figure element in a layout pattern on the photomask and a figure element affecting the figure element due to the optical proximity effect, adding identical identification data to a... Agent: Fujitsu Semiconductor Limited
20120206701 - Aberration measurement method, exposure apparatus, and device manufacturing method: A method for measuring a spherical aberration amount of a projection optical system that projects an image of a pattern formed on an original plate onto a substrate, includes: obtaining a first focal position in a direction of an optical axis of the projection optical system under a first measurement... Agent: Canon Kabushiki Kaisha
20120206702 - Computer-readable recording medium recording exposing condition determination program: Certain embodiments provide a computer-readable recording medium recording an exposing condition determination program. The program allows a computer to perform: a first step of dividing an illumination pupil into a plurality of regions; a second step of calculating, for each region, an imaging performance response indicative of relation between a... Agent:
20120206704 - Illumination optical unit for projection lithography: An illumination optical unit for projection lithography for illuminating an object field, in which an object to be imaged can be arranged, with illumination light has a field facet mirror having a plurality of field facets. A pupil facet mirror of the illumination optical unit has a plurality of pupil... Agent: Carl Zeiss Smt Gmbh
20120206703 - Inspection apparatus and method, lithographic apparatus, lithographic processing cell and device manufacturing method: Asymmetry properties of a periodic target on a substrate, such as a grating on a wafer, are determined. An inspection apparatus has a broadband illumination source with illumination beams point mirrored in the pupil plane of a high numerical aperture objective lens. The substrate and target are illuminated via the... Agent: Asml Netherlands B.v.
20120206705 - Optical element and exposure apparatus: An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the... Agent: Nikon Corporation08/09/2012 > 5 patent applications in 3 patent subcategories. inventions list
20120200836 - Exposure apparatus and device manufacturing method: An exposure apparatus exposes a substrate by forming a liquid immersion region on the substrate, and projecting a pattern image onto the substrate via a projection optical system and a liquid that forms the liquid immersion region. The exposure apparatus includes a projection optical system having a plurality of optical... Agent: Nikon Corporation
20120200837 - Exposure apparatus, and device manufacturing method: A lithographic projection apparatus includes an illumination system that conditions a radiation beam, a support structure that holds a patterning device, the patterning device being capable of imparting the radiation beam with a pattern, a substrate table that holds a substrate, and a projection system that projects the patterned radiation... Agent: Nikon Corporation
20120200835 - Reticle protection member, reticle carrying device, exposure device and method for carrying reticle: A position measurement device measures the position of a position measurement mark formed on the lower surface of a reticle, thereby measuring the position of the reticle. A position measurement device measures the position of the position measurement mark formed on the lower surface of a lower lid, thereby measuring... Agent:
20120200838 - Method for a lithographic apparatus: A method of increasing a depth of focus of a lithographic apparatus is disclosed. The method includes forming diffracted beams of radiation using a patterning device pattern; and transforming a phase-wavefront of a portion of the diffracted beams into a first phase-wavefront having a first focal plane for the lithographic... Agent: Asml Netherlands B.v.
20120200839 - Pulse to pulse energy equalization of light beam intensity: A system for equalizing pulse to pulse energy of a light beam includes a group of optical devices including an optical device configured to exhibit nonlinear properties, e.g., higher order or third order nonlinear properties. Transmission properties of an unequalized light beam passing through the group of optical devices change... Agent: Asml Holding N.v.08/02/2012 > 8 patent applications in 6 patent subcategories. inventions list
20120194790 - Lithographic apparatus and device manufacturing method: An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The... Agent: Asml Netherlands B.v.
20120194791 - Device and method for processing printing substrate web into printed products: A method for processing a web to form printed products includes affixing a print mark assigned to a printed sheet of the web to a useful strip of the web. The print mark includes a coded print mark. An image is recorded that shows a region of the web in... Agent: Mueller Martini Holding Ag
20120194792 - Method and system to predict lithography focus error using simulated or measured topography: A method and system to predict lithography focus error using chip topography data is disclosed. The chip topography data may be measured or simulated topography data. A plane is best fitted to the topography data, and residuals are computed. The residuals are then used to make a prediction regarding the... Agent: International Business Machines Corporation
20120194794 - Illumination system, lithographic apparatus and method: An illumination system comprising an array of controllable mirrors configured to direct radiation towards a pupil plane and an array of lenses configured to direct radiation sub-beams towards the array of controllable mirrors, wherein a first lens of the array of lenses and a controllable mirror of the array of... Agent: Asml Netherlands B.v.
20120194793 - Optical apparatus for use in photolithography: An optical apparatus includes an interchange mechanism and an optical assembly of an illumination system or a projection objective. At least one of the plurality of optical elements of the optical assembly is selected from among a plurality of ones selectable from the interchange mechanism which facilitates exchange of one... Agent: Carl Zeiss Smt Gmbh
20120194795 - Optical element: An optical element has at least one additional element fitted thereon which dissipates the vibrational energy of the optical element by friction.... Agent: Carl Zeiss Smt Gmbh
20120194796 - Light quantity adjustment apparatus lens unit and optical apparatus provided with the same: This light quantity adjustment apparatus is provided with a pair of first and second boards each having, an exposure aperture, and a plurality of diaphragm blades supported between the pair of broads to be openable and closable to adjust a quantity of light passing through the exposure aperture, and each... Agent: Nisca Corporation
20120194797 - Lithographic apparatus and methods for determining an improved configuration of a lithographic apparatus: A method to determine an improved configuration for a lithography apparatus, a computer-readable medium for use in carrying out the method, and a lithography apparatus are disclosed. In an example, the method involves intelligent selection of one or more device features to measure and use in a routine to optimize... Agent: Asml Netherlands B.v.Previous industry: Optics: image projectors
Next industry: Optics: measuring and testing
RSS FEED for 20130509:
Integrate FreshPatents.com into your RSS reader/aggregator or website to track weekly updates.
For more info, read this article.
Thank you for viewing Photocopying patents on the FreshPatents.com website. These are patent applications which have been filed in the United States. There are a variety ways to browse Photocopying patent applications on our website including browsing by date, agent, inventor, and industry. If you are interested in receiving occasional emails regarding Photocopying patents we recommend signing up for free keyword monitoring by email.
FreshPatents.com Support - Terms & Conditions
Results in 0.428 seconds