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Photocopying July category listing 07/12Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 07/26/2012 > 8 patent applications in 6 patent subcategories. category listing
20120188521 - Cleaning method, liquid immersion member, immersion exposure apparatus, device fabricating method, program and storage medium: A liquid immersion member includes: a first liquid immersion member, which is disposed at least partly around an optical path, that forms a first immersion space of a first liquid at an emergent surface side of an optical member such that the optical path of exposure light between the optical... Agent: Nikon Corporation
20120188522 - Reflective optical components for lithographic apparatus and device manufacturing method: A reflective optical component is configured to reflect EUV radiation. The reflective optical component has a reflective layer with a bimetal cap layer of differing first and second metals selected to ensure that the outer surface of the cap layer is substantially unreactive or non-adsorptive to sulfur. The bimetal cap... Agent: Asml Netherlands B.v.
20120188523 - Optical arrangement in a projection exposure apparatus for euv lithography: An optical arrangement includes a multiplicity of optical elements and a carrier structure which carries the optical elements. The carrier structure is composed of at least two releasably interconnected modules. Each module is composed of at least one carrier structure subelement. A subhousing is produced by a multiplicity of carrier... Agent: Carl Zeiss Smt Gmbh
20120188525 - Catoptric objectives and systems using catoptric objectives: In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength λ from an object plane to an image... Agent: Carl Zeiss Smt Gmbh
20120188526 - Illumination optical apparatus, exposure apparatus, and device manufacturing method: An illumination optical apparatus includes an integrator optical device that includes a first element group (230A) prescribing a first illumination condition and a second element group (230B) prescribing a second illumination condition other than the first illumination condition and an irradiation device (40) that selectively directs light to the first... Agent:
20120188524 - Projection exposure apparatus with optimized adjustment possibility: A microlithography projection objective includes an optical element, a manipulator configured to manipulate the optical element, and a control unit configured to control the manipulator. The control unit includes a first device configured to control movement of the manipulator, a memory comprising an upper bound for a range of movement... Agent: Carl Zeiss Smt Gmbh
20120188527 - Illumination system of a microlithographic projection exposure apparatus: An illumination system of a microlithographic projection exposure apparatus can include at least one transmission filter which has a different transmittance at least at two positions and which is arranged between a pupil plane and a field plane). The transmittance distribution can be determined such that it has field dependent... Agent: Carl Zeiss Smt Gmbh
20120188528 - Lithographic apparatus and device manufacturing method: A lithographic apparatus comprises an object table for receiving an object, an actuator for moving the object table and a handler for transferring the object to or from the object table. The apparatus is provided with a controller operable connected with the actuator and/or the handler. The controller is programmed... Agent: Asml Netherlands B.v.07/19/2012 > 6 patent applications in 4 patent subcategories. category listing
20120182533 - Optical arrangement and microlithographic projection exposure apparatus including same: An optical arrangement includes at least one optical element and a support element for the optical element. The optical element and the support element are connected together by way of at least three decoupling elements. The decoupling elements are formed monolithically with the optical element and with the support element.... Agent: Carl Zeiss Smt Gmbh
20120182534 - Lithographic apparatus and device manufacturing method: A lithographic apparatus includes a phase adjuster to adjust a phase of an optical wave traversing an optical element of the phase adjuster during exposure of a pattern on a substrate. In an embodiment, the optical element is a heat controllable optical element in a projection system of the lithographic... Agent: Asml Netherlands B.v.
20120182535 - Optical device, exposure apparatus and laser apparatus: As a spatial light modulator 35 is disposed between a wavelength conversion part 315 and an exit surface 311b in a ferroelectric crystal substrate 31, only zeroth-order light which is at a particular wavelength is guided to a substrate while laser light from the wavelength conversion part 315 is being... Agent:
20120182536 - Source collector, lithographic apparatus and device manufacturing method: An EUV lithographic apparatus includes a source collector apparatus in which the extreme ultraviolet radiation is generated by exciting a fuel to provide a plasma emitting the radiation. The source collector apparatus includes a chamber in fluid communication with a guide way external to the chamber. A pump for circulating... Agent: Asml Netherlands B.v.
20120182537 - Spectral purity filter, lithographic apparatus, and device manufacturing method: A spectral purity filter, in particular for use in a lithographic apparatus using EUV radiation for the projection beam, includes a plurality of apertures in a substrate. The apertures are defined by walls having side surfaces that are inclined to the normal to a front surface of the substrate.... Agent: Asml Netherlands B.v.
20120182538 - Methods and apparatus for inspection of articles, euv lithography reticles, lithography apparatus and method of manufacturing devices: An article such as an EUV lithography reticle is inspected to detect contaminant particles. The method comprises applying a fluorescent dye material to the article, illuminating the article with radiation at wavelengths suitable for exciting the fluorescent dye, monitoring the article for emission of second radiation by the fluorescent dye... Agent: Asml Netherlands B.v.07/12/2012 > 4 patent applications in 3 patent subcategories. category listing
20120176589 - Exposure apparatus, exposure method, and method for producing device: An exposure apparatus is provided with a projection optical system, and the projection optical system includes a first optical element disposed most closely to an image plane of the projection optical system. The exposure apparatus includes a first liquid immersion mechanism which forms a first liquid immersion area of a... Agent: Nikon Corporation
20120176588 - Immersion lithography apparatus and tank thereof: A tank for an immersion lithography apparatus provided. The tank has a container with a bottom plate and side plates connected to each, wherein the side plates surround and connect all edges of the bottom plate. The container is filled in at least a liquid having a refractive index thereof... Agent: National Chiao Tung University
20120176590 - Exposure method, exposure apparatus, light converging pattern formation member, mask, and device manufacturing method: An exposure method includes a first exposure step of irradiating a mask, which is arranged near a plate, with exposure light and exposing a predetermined pattern formed on the mask onto a plate; and a second exposure step of irradiating a light converging pattern formation member, which is arranged near... Agent: Nikon Corporation
20120176591 - Method and device for the correction of imaging defects: The disclosure relates to a microlithography projection exposure system having optical corrective elements configured to modify the imaging characteristics, as well as related systems and component.... Agent: Carl Zeiss Smt Gmbh07/05/2012 > 11 patent applications in 7 patent subcategories. category listing
20120170008 - Exposure apparatus and method of manufacturing device: A scanning exposure apparatus exposes a plurality of shot regions on a substrate to light while scanning an original and the substrate. The apparatus includes: a stage which holds the substrate and moves; and a controller which controls movement of the stage based on a driving profile that defines the... Agent: Canon Kabushiki Kaisha
20120170007 - Exposure apparatus, and method of manufacturing a device: The present invention provides an exposure apparatus including a projection optical system, and configured to expose a substrate to light via the projection optical system and a liquid, the apparatus including a plurality of recovery ports configured to recover the liquid supplied between the projection optical system and the substrate,... Agent: Canon Kabushiki Kaisha
20120170009 - Filter box, filter apparatus, and exposure apparatus: A plurality of filter boxes which hold chemical filters include: a first filter box having a frame which holds a chemical filter and which has a guide groove provided on a side surface of the frame; and a second filter box having a frame which holds a chemical filter and... Agent: Nikon Corporation
20120170011 - Alignment method, alignment apparatus, and exposure apparatus: In the present invention, the number of brightness changes detected at the same position while a substrate moves by a certain distance is added up, a plurality of edge count data arranged corresponding to the detected positions of the brightness changes is obtained, a plurality of correlation value data by... Agent:
20120170010 - Exposure apparatus and method of manufacturing device: An exposure apparatus which projects a pattern of an original onto a substrate via a liquid to expose the substrate, includes a substrate stage which holds the substrate and moves, the substrate stage including a peripheral member arranged to surround a region in which the substrate is arranged, the peripheral... Agent: Canon Kabushiki Kaisha
20120170013 - Illumination optical system, exposure apparatus, and method of manufacturing device: An illumination optical system which illuminates an illumination surface with light from a light source, includes a divider which divides light from the light source to generate a plurality of light beams, a first reflective integrator which uniformizes light intensity distributions of the plurality of light beams generated by the... Agent: Canon Kabushiki Kaisha
20120170012 - Mirror, method of manufacturing the same, exposure apparatus, and device manufacturing method: A method of manufacturing a mirror includes a first step of arranging, on a substrate, a shape adjusting layer having a layer thickness which changes by heat, a second step of arranging, on the shape adjusting layer, a reflection layer including a first layer, a second layer, and a barrier... Agent: Canon Kabushiki Kaisha
20120170014 - Photolithography system using a solid state light source: A photolithography system based on a solid-state light source having LEDs is provided. Solid-state photolithography using the solid state light source can achieve high quality patterns over a wide range of length scales at a fraction of the cost of contact mask aligners. 2D nanoscale and 1D microscale patterns can... Agent: Northwestern University
20120170015 - Spectral purity filter, lithographic apparatus, method for manufacturing a spectral purity filter and method of manufacturing a device using lithographic apparatus: A spectral purity filter includes a substrate, a plurality of apertures through the substrate, and a plurality of walls. The walls define the plurality of apertures through the substrate. The spectral purity filter also includes a first layer formed on the substrate to reflect radiation of a first wavelength, and... Agent: Asml Netherlands B.v.
20120170016 - System and method for design of linear motor for vacuum environment: A linear motor for vacuum environment includes a core and a housing. The core includes a plurality of cooling plates and a plurality of electrical coils sandwiched between the plurality of cooling plates. The core further includes a plurality of thermally conductive epoxy layers positioned between the plurality of electrical... Agent: Asml Netherlands B.v.
20120170017 - Asymmetric complementary dipole illuminator: An apparatus, a method of designing the apparatus, a tool using the apparatus and a method of using the apparatus for optimizing optical photolithography during formation of integrated circuits. The apparatus includes: an asymmetrical complementary dipole element including: first and second openings being equidistant and mirror images about a first... Agent: International Business Machines CorporationPrevious industry: Optics: image projectors
Next industry: Optics: measuring and testing
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