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Photocopying June invention type 06/12

20120162617 - Stereoscopic image printing device with enhanced printing efficiency and related printing method: A stereoscopic image printing device includes an actuating unit for moving a grating structure, a print head for transferring a plurality of target image data onto corresponding positions of the grating structure, a first detecting module, a second detecting module, and a controller coupled to the print head, a first... Agent:

20120162619 - Liquid immersion member, immersion exposure apparatus, exposing method, device fabricating method, program, and storage medium: A liquid immersion member inside an immersion exposure apparatus that is disposed at least partly around an optical member and an optical path of exposure light wherethrough a first liquid between the optical member and an object passes includes a first liquid immersion member, which is disposed at least partly... Agent: Nikon Corporation

20120162618 - Substrate processing device and method: A semiconductor processing device sprays a liquid chemical agent onto a film on a spinning semiconductor substrate. The spray nozzle is moved horizontally from a first upper position comparatively distant from the substrate to a second upper position closer to the substrate, then vertically downward to a lower position. All... Agent: Lapis Semiconductor Co., Ltd.

20120162620 - Lithographic apparatus and method of modifying a beam of radiation within a lithographic apparatus: A lithographic apparatus comprises a beam modifying apparatus mounted in the path of a beam of radiation. The beam modifying apparatus comprises a conduit configured to allow the flow of a fluid through it, the conduit being arranged such that, in use, the beam of radiation passes through the conduit... Agent: Asml Netherlands B.v.

20120162621 - Lithographic apparatus and removable member: A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, the lithographic apparatus having a first object and a planar member mounted on the first object to improve thermal transfer to/from a second object.... Agent: Asml Netherlands B.v.

20120162622 - Field extension to reduce non-yielding exposures of wafer: Techniques are provided for efficient lithography processing and wafer layout. In particular, the techniques can be used to reduce the number of sacrificial exposures along the wafer perimeter region. In one example embodiment, an exposure system reticle is configured with both a normal area (die yielding area) and a dumification... Agent:

20120162623 - Surface position detection apparatus, exposure apparatus, and exposure method: A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional displacement due to a polarization component occurring in a light flux having passed through a reflective surface. In the apparatus, a projection system has... Agent: Nikon Corporation

20120162625 - Catadioptric projection objective with intermediate images: A catadioptric projection objective has a first objective part, defining a first part of the optical axis and imaging an object field to form a first real intermediate image. It also has a second, catadioptric objective part forming a second real intermediate image using the radiation from the first objective... Agent: Carl Zeiss Smt Gmbh

20120162624 - Illumination system for a lithographic apparatus: An illumination system for a lithographic apparatus comprises a radiation intensity filter for controlling the intensity distribution of a beam of radiation travelling along an optical axis (Z), the radiation intensity filter comprising a first member and a second member. Each of the first and second members comprise a plurality... Agent: Asml Netherlands B.v.

20120162627 - Illumination optical unit for microlithography: An illumination optical unit includes a collector mirror which produces a polarization distribution that is applied to the first faceted optical element during the operation of the illumination optical unit. There are at least two first facet elements to which radiation having a differing polarization is applied. The first faceted... Agent: Carl Zeiss Smt Gmbh

20120162626 - Shutter device for a lithography apparatus and lithography apparatus: A shutter device for a lithography apparatus includes a housing for maintaining an ultrahigh vacuum. A disk within the housing is rotatable about a rotation axis. The disk has at least one opening arranged on a circumferential line around the rotation axis and serving for transmitting ultraviolet light. A lithography... Agent: Carl Zeiss Smt Gmbh

20120162628 - Actuator: An actuator comprising a first part and a second part, the first part being configured to move relative to the second part, wherein a labyrinth seal is provided between the first part and the second part, the labyrinth seal being configured to restrict the flow of gas from a first... Agent: Asml Netherlands B.v.

20120162629 - Large area nanopatterning method and apparatus: Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a rotatable mask is used to image a radiation-sensitive material. Typically the rotatable mask comprises a cylinder. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the... Agent: Rolith, Inc.

20120154769 - Method and apparatus of aligning alignment layer, and method of manufacturing liquid crystal display using the same: A method of aligning an alignment layer of a liquid crystal display (LCD) includes positioning a substrate on a stage; the substrate having the alignment layer provided thereon and the alignment layer including a plurality of alignment regions. Data identifying positions of the alignment regions relative to the alignment layer... Agent:

20120154770 - Stereoscopic image printing device with enhanced positioning accuracy and related printing method: A stereoscopic image printing device includes an actuating unit for moving a grating structure, and a positioning module. The positioning module includes a plurality of shelters, a planar light source for emitting light to pass through the grating structure and an interval between the adjacent shelters, and a photosensitive component... Agent:

20120154771 - Immersion multiple-exposure method and immersion exposure system for separately performing multiple exposure of micropatterns and non-micropatterns: This invention discloses an immersion multiple-exposure method including a first exposure step of performing, using a first mask, immersion exposure of a photoresist film formed on a substrate, a cleaning step of clearing the surface of the substrate, and a second exposure step of performing immersion exposure of the photoresist... Agent: Kabushiki Kaisha Toshiba

20120154772 - Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus: An optical arrangement in an optical system, such as a microlithographic projection exposure apparatus, includes: at least one heat-emitting subsystem which emits heat during the operation of the optical system; a first heat shield which is arranged such that it at least partly absorbs the heat emitted by the heat-emitting... Agent: Carl Zeiss Smt Gmbh

20120154773 - Method and apparatus for correcting errors on a wafer processed by a photolithographic mask: A method for correcting errors on a wafer processed by a photolithographic mask at a wafer processing site is provided. The method comprises measuring errors on the wafer, and modifying a pattern placement on the photolithographic mask by locally applying femtosecond light pulses of a laser system to the photolithographic... Agent: Carl Zeiss Sms Gmbh

20120154774 - Lithographic apparatus and device manufacturing method: Lithography apparatus and device manufacturing methods are disclosed in which means are provided for reducing the extent to which vibrations propagate between a first element of a projection system and a second element of a projection system. Approaches disclosed include the use of plural resilient members in series as part... Agent: Asml Netherlands B.v.

20120154775 - Euv radiation source and method of generating euv radiation: An EUV radiation source comprising a fuel supply configured to deliver droplets of fuel to a plasma formation location, and a collector configured to collect EUV radiation emitted by a plasma at the plasma formation location, wherein the collector has a reflective surface that is a modified ellipsoid shape, the... Agent: Asml Netherlands B.v.

20120154777 - Illumination system, lithographic apparatus and method of adjusting an illumination mode: An illumination system is disclosed that had a plurality of moveable reflective elements and associated actuators which may be configured to form an illumination mode. One or more of the actuators is arranged to move between first, second and third positions, and so move an associated moveable reflective element between... Agent: Asml Netherlands B.v.

20120154776 - Lithographic projection apparatus and device manufacturing method: An electrical connector suitable, for example, for connecting high voltage carrying cables in a low pressure environment comprises a housing having a conducting surface and a plurality of cable insertion parts, each cable insertion part comprising an electrical conductor configured to connect to an electrical cable and an insulating sleeve... Agent: Asml Netherlands B.v.

20120154778 - Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter: A method of forming a spectral purity filter having a plurality of apertures configured to transmit extreme ultraviolet radiation and suppress transmission of a second type of radiation, in which trenches are formed in a base material in a pattern corresponding to the walls to be formed between the apertures.... Agent: Asml Netherlands B.v.

20120154779 - Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter: A method for manufacturing a spectral purity filter is provided in which openings in a first surface of a base material, corresponding to a plurality of apertures of the spectral purity filter, are formed. At least the surfaces of the base material surrounding the openings in the first surface are... Agent: Asml Netherlands B.v.

20120154780 - Cyclic error compensation in interferometric encoder systems: Methods and apparatuses for performing the same, where the methods include obtaining, from an interferometer, a time-varying interference signal S(t) based on a combination of a first beam and a second beam, the first beam being diffracted from an encoder scale, in which at least one of the encoder scale... Agent: Zygo Corporation

20120154781 - Substrate table, a lithographic apparatus and a device manufacturing method: A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.... Agent: Asml Netherlands B.v.

20120147343 - Alignment method, alignment apparatus, and exposure apparatus: In the present invention, a number of times the brightness changes detected at the same position while a substrate conveys are added up in the conveying direction, thereby obtaining a plurality of edge count data, and then, a plurality of positions of long sides of patterns parallel to the conveying... Agent:

20120147344 - Actuators and microlithography projection exposure systems and methods using the same: An actuator includes a housing, a movable part, and an advancing unit that is at least temporarily connected to the movable part. The advancing unit includes a deformation unit and a deformer configured to deform the deformation unit with a vector component perpendicular to an effective direction of the actuator... Agent: Carl Zeiss Smt Gmbh

20120147345 - Optical apparatus, and method of orienting a reflective element: An optical apparatus has a moveable reflective element and associated actuator. The actuator includes a first magnet which is connected to the moveable reflective element such that movement of the first magnet will cause the moveable reflective element to move, and a second magnet which is connected to a motor... Agent: Asml Netherlands B.v.

20120147349 - Euv radiation system and lithographic apparatus: A lithographic projection apparatus is provided with a EUV radiation system that includes a source chamber, a supply constructed and arranged to supply a target material to a predetermined plasma formation position, an optical system formed by three or more mirrors arranged to establish a beam path extending to the... Agent: Asml Netherlands B.v.

20120147347 - Imaging optical system and illumination optical system: An imaging optical system has a plurality of mirrors, which image an object field in an object plane into an image field in an image plane. A reflection face of at least one of the mirrors is configured as a free form face which cannot be described by a rotationally... Agent: Carl Zeiss Smt Gmbh

20120147348 - Lithographic apparatus and device manufacturing method: A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or,... Agent: Asml Netherlands B.v.

20120147346 - Lithographic apparatus and method: A lithographic apparatus comprising a source that generates a beam of radiation, a support structure supporting a patterning device, a substrate table for holding a substrate, and a projection system projecting the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a vibration measurement... Agent: Asml Netherlands B.v.

20120147350 - Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter: A transmissive spectral purity filter configured to transmit extreme ultraviolet radiation includes a filter part having a plurality of apertures to transmit extreme ultraviolet radiation and to suppress transmission of a second type of radiation. The apertures may be manufactured in semiconductor material such as silicon by an anisotropic etching... Agent: Asml Netherlands B.v

20120147351 - Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter: A transmissive spectral purity filter is configured to transmit extreme ultraviolet radiation (λ<20 nm). The filter comprises a grid-like structure comprising a plurality of microscopic apertures fabricated in a carrier material such as silicon. The grid-like structure in at least part of its area is formed so as to have,... Agent: Asml Netherlands B.v.

20120147354 - Lithographic apparatus having a lorentz actuator with a composite carrier: An actuator is configured to produce a displacement force between a first and a second part to displace the first and second parts relative to each other. The Actuator includes a first magnet subassembly, attached to one of a first and a second part, and an electrically conductive element, attached... Agent: Asml Netherlands B.v.

20120147355 - Positioning system, lithographic apparatus and device manufacturing method: A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb... Agent: Asml Netherlands B.v.

20120147352 - Stage apparatus, exposure apparatus and device fabrication method: The present invention provides a stage apparatus including a first Y-axis interferometer which is supported by a base portion, and configured to detect a position of a first end surface of a table in a Y-axis direction, a second Y-axis interferometer which is supported by the base portion, and configured... Agent: Canon Kabushiki Kaisha

20120147353 - Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer... Agent: Asml Netherlands B.v.

20120140191 - Coating and developing apparatus, coating and developing method, and storage medium: A coating and developing apparatus has: a treatment block-including a water repellent module performing water repellent treatment on a substrate, a coating module, and a developing module; a substrate side-surface portion water repellent module for performing water repellent treatment on a side surface of a substrate; and a control unit... Agent: Tokyo Electron Limited

20120140192 - Lithographic apparatus and device manufacturing method: An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes... Agent: Asml Netherlands B.v.

20120140193 - Dynamic wafer alignment method in exposure scanner system: A dynamic wafer alignment method and an exposure scanner system are provided. The exposure scanner system having a scan path, includes an exposure apparatus, an optical sensor apparatus and a wafer stage. The method comprises the steps of: (a) providing a wafer, having a plurality of shot areas, wherein each... Agent: Nanya Technology Corporation

20120140194 - Maskless exposure apparatus: According to example embodiments, a maskless exposure apparatus includes a light source array including a plurality of light sources, a focusing element array including a plurality of focusing elements, and an image forming lens unit between the focusing element array and a substrate. The focusing element array is configured to... Agent: Samsung Electronics Co., Ltd.

20120140195 - Actuation system and lithographic apparatus: Actuation systems and lithographic apparatus which address the issue of uncontrolled return of common mode currents are provided. In a main an embodiment such systems aim to prevent the occurrence of corona and discharge between high voltage electric cables in low pressure environments. An exemplary actuation system comprises an actuator... Agent: Asml Netherlands B.v.

20120140196 - Ex-situ removal of deposition on an optical element: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector... Agent: Asml Netherlands B.v.

20120140197 - Optical element and lithographic apparatus: An optical element includes a surface including a tilted profile having height differences, thereby providing cavities and elevations having a predetermined maximum height difference, and a transmissive layer that covers the cavities and the elevations of the optical element. A first height of the transmissive layer in the cavities is... Agent: Asml Netherlands B. V.

20120140198 - Patterning device support: In a lithographic apparatus, slippage of a patterning device is substantially eliminated during movement of a patterning device stage by providing a magnetostrictive actuator to apply an accelerating force to the patterning device to compensate for forces that would otherwise tend to cause slippage when the patterning device stage moves,... Agent: Asml Holding N.v.

20120140199 - Mechanical fixture of pellicle to lithographic photomask: A pellicle frame is mechanically attached to a reticle, without use of an adhesive. An embodiment includes mechanically attaching a pellicle frame to a front surface of a reticle, removing the pellicle frame from the reticle, cleaning the reticle, and mechanically reattaching the pellicle frame to the reticle. Embodiments further... Agent: Globalfoundries Inc.

20120140200 - Immersion photolithography system and method using microchannel nozzles: A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles... Agent: Asml Holding N.v.