SEARCH:      Monitor Keywords |  Custom RSS

Photocopying May archived by USPTO category 05/12

20120133913 - Adjustment method, substrate processing method, substrate processing apparatus, exposure apparatus, inspection apparatus, measurement and/or inspection system, processing apparatus, computer system, program and information recording medium: When a host issues an analysis order that specifically instructs the analytical contents to an analytical apparatus (step 401), the analytical apparatus collects two types of measurement and/or inspection results from a measurement and/or inspection instrument (steps 403 to 409), and in step 411, the analytical apparatus analyzes the measurement... Agent: Nikon Corporation

20120133912 - Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method: A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system comprises: a plate that has a first surface and a second surface on the side opposite the first surface; and a liquid recovery part, at least part of which opposes the second surface with a... Agent: Nikon Corporation

20120133914 - Method of operating a patterning device, lithographic apparatus and device manufacturing method: A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system... Agent: Asml Netherlands B.v.

20120133915 - Light source optimizing method, exposure method, device manufacturing method, program, exposure apparatus, lithography system, light source evaluation method, and light source modulation method: Disclosed is a light source optimizing method wherein: a light source shape obtained as the result of SMO is set as a target, the SMO being an optimizing calculation method for optimizing a mask pattern and illumination light source, a spatial light modulator is controlled such that a deviation from... Agent: Nikon Corporation

20120133916 - Wafer level optical elements and applications thereof: In one aspect, the present invention provides a wafer level optical assembly comprising a first wafer level optical element, the first wafer level optical element comprising a first alignment structure and a second wafer level optical element, the second wafer level optical element comprising a second alignment structure, wherein the... Agent:

20120127441 - Lithographic apparatus and device manufacturing method: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.... Agent: Asml Netherlands B.v.

20120127440 - Optical assembly for projection lithography: An optical assembly for projection lithography has an optical component to guide imaging or illumination light. The optical component has a reflective substrate that contains a fluorescent component. An excitation light source is used to produce fluorescence excitation light. An excitation optical system is used to guide the fluorescence excitation... Agent: Carl Zeiss Smt Gmbh

20120127442 - Determining lithographic set point using optical proximity correction verification simulation: The subject matter disclosed herein relates to determining a lithographic set point using simulations of optical proximity correction verification. In one embodiment, a computer-implemented method of determining a lithographic tool set point for a lithographic process is disclosed. The method may include: providing a model of a production lithographic process... Agent: International Business Machines Corporation

20120127443 - Method of producing a relief image for printing: The present invention involves a method for making a relief image. A film that includes a carrier sheet and an imageable material is used to form a mask image that is opaque to a curing radiation. In one embodiment, the mask image is formed on the carrier sheet while in... Agent:

20120127444 - Reflection mask for euv lithography, system for euv lithography, and method of fixing the reflection mask for euv lithography: Example embodiments of the inventive concepts relate to a reflection mask including an upper surface configured to reflect extreme ultraviolet EUV light, a lower surface opposite the upper surface, where the lower surface includes at least one alignment key. The reflection mask may include a conductive layer, a substrate on... Agent: Samsung Electronics Co., Ltd.

20120127445 - Isolation system for an optical element of an exposure apparatus: An optical isolation assembly (30) for reducing the transmission of vibration from an optical barrel (25) to an optical element assembly (28) includes an optical mover assembly (256), a first measurement system (258), a second measurement system (260), and a control system (24). The optical mover assembly (256) moves, positions... Agent:

20120127446 - Light exposure method, and light exposure apparatus: There is provided an EUV exposure apparatus which restrains its optical systems or a mask used therein from being polluted by contaminations generated in its chamber. An energy beam generating source is arranged near a wafer stage set in the chamber of the EUV exposure apparatus to decompose an emission... Agent: Renesas Electronics Corporation

20120127449 - Controller, lithographic apparatus, method of controlling the position of an object and device manufacturing method: A controller is provided that controls an actuator system having a plurality of actuators arranged to act on an object. The controller uses a gain balancing matrix to convert a first control signal, representing a set of forces desired to be provided to the centre of gravity of the object... Agent: Asml Netherlands B.v.

20120127448 - Dual wafer stage exchanging system for lithographic device: A dual wafer stage exchanging system for a lithographic device is disclosed, said system comprises two wafer stages running between an exposure workstation and a pre-processing workstation, and said two stages are set on a base and suspended above the upper surface of the base by air bearings. Each wafer... Agent: Tsinghua University

20120127452 - Method for coarse wafer alignment in a lithographic apparatus: A method for alignment of a substrate, in which the substrate includes a mark in a scribe lane, and the scribe lane extends along a longitudinal direction as a first direction. The mark has a periodic structure in the first direction. The method includes providing an illumination beam for scanning... Agent: Asml Netherlands B.v.

20120127447 - Method for determing a commutation offset and for determining a compensation map for a stage: A method for determining a commutation offset for a mover (250A) of a mover assembly (220C) that moves and positions a stage (220A) relative to a stage base (220B) includes controlling the mover assembly (220C) in a closed loop fashion to maintain the position of the stage (220A) along a... Agent:

20120127450 - Movable body drive method and movable body drive system, and pattern formation method and pattern formation apparatus: A first positional information of a wafer stage is measured using an interferometer system such as, for example, a Z interferometer. At the same time, a second positional information of the wafer stage is measured using a surface position measurement system such as, for example, two Z heads. Moving average... Agent: Nikon Corporation

20120127453 - Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method: A controller measures positional information of a stage within an XY plane using three encoders which at least include one each of an X encoder and a Y encoder of an encoder system, and the stage is driven in the XY plane, based on measurement results of the positional information... Agent: Nikon Corporation

20120127451 - Positioning system, a lithographic apparatus and a method for positional control: A positioning system for controlling a relative position between a first component and a second component of a lithographic apparatus, wherein a position of each component is defined by a set of orthogonal coordinates, the positioning system including: a measuring device configured to determine an error in the momentary position... Agent: Asml Netherlands B.v.

20120127454 - Pattern forming method: According to one embodiment, a pattern including first and second block phases is formed by self-assembling a block copolymer onto a film to be processed. The entire block copolymer present in a first region is removed under a first condition by carrying out energy beam irradiation and development, thereby leaving... Agent:

20120120378 - Component of an euv or uv lithography apparatus and method for producing it: To improve the bonding of two parts (401, 403) of a component (400) of an EUV or UV lithography apparatus such that the probability of occurrence of additional stress over time in the bonded parts (401, 403) is lessened, a component (400) of an EUV or UV lithography apparatus comprising... Agent: Carl Zeiss Smt Gmbh

20120120376 - Fluid handling structure, a lithographic apparatus and a device manufacturing method: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the... Agent: Asml Netherlands B.v.

20120120377 - Lithographic apparatus and device manufacturing method: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from... Agent: Asml Netherlands B.v.

20120120379 - System and method for controlling the distortion of a reticle: An apparatus for controlling the distortion of a reticle (28) includes a temperature adjuster (258) and a control system (226). The temperature adjuster (258) includes a plurality of adjuster elements (258E) that individually adjust the temperature of a plurality of regions (28R) of the reticle (28). The control system (226)... Agent:

20120120380 - Low and high pressure proximity sensors: A fluid proximity sensor for surface measurements having a measurement chamber (210) with a measurement nozzle (205), a reference chamber (220) with a reference nozzle (225), and a diaphragm (215) forming an interface between the reference chamber and the measurement chamber. A shroud (280) that encloses the measurement nozzle and... Agent: Asml Holding N.v.

20120120381 - Exposure apparatus, exposure method, and method for producing device: A liquid immersion exposure apparatus includes a projection system having a last optical element, the projection system projecting a beam onto a substrate through an immersion liquid; a movable stage having a holder by which the substrate is held; a measurement member provided on the movable stage, the measurement member... Agent: Nikon Corporation

20120113402 - Lithographic apparatus and device manufacturing method: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control... Agent: Asml Netherlands B.v.

20120113403 - Exposure method and exposure apparatus: In the present invention, when exposure on a first exposure area of the subject to be exposed by using a first mask pattern group of a photomask, is completed, the shutter is moved in synchronization with a conveying speed of the subject to be exposed to shut off source light,... Agent:

20120113404 - Optimization flows of source, mask and projection optics: Embodiments of the present invention provide methods for optimizing a lithographic projection apparatus including optimizing projection optics therein. The current embodiments include several flows including optimizing a source, a mask, and the projection optics and various sequential and iterative optimization steps combining any of the projection optics, mask and source.... Agent: Asml Netherlands B.v.

20120113405 - Method for determining a commutation offset and for determining a compensation map for a stage: A method for determining a commutation offset for a mover (250A) of a mover assembly (220C) that moves and positions a stage (220A) relative to a stage base (220B) includes controlling the mover assembly (220C) in a closed loop fashion to maintain the position of the stage (220A) along a... Agent:

20120105817 - Leaf spring, stage system, and lithographic apparatus: A leaf spring to be mounted between two objects, the leaf spring configured to have a high stiffness in two orthogonal directions, and a relative low stiffness in other degrees of freedom, wherein the leaf spring has a substantially panel-shaped body, the leaf spring including a first mounting location at... Agent: Asml Netherlands B.v.

20120105818 - Lithographic apparatus and method: An illumination system having a plurality of reflective elements, the reflective elements being movable between different orientations which direct radiation towards different locations in a pupil plane, thereby forming different illumination modes. Each reflective element is moveable to a first orientation in which it directs radiation to a location in... Agent: Asml Netherlands B.v.

20120105819 - Lithographic apparatus for transferring pattern from patterning device onto substrate, and damping method: A lithographic apparatus includes a support frame which is supported by a base via a vibration isolation system; a projection system arranged to transfer a pattern from a patterning device onto a substrate, wherein the projection system includes a first frame which is spring-supported by the support frame; and an... Agent: Asml Netherlands B.v.

20120105820 - Vibration control apparatus, lithography apparatus, and method of manufacturing article: A vibration control apparatus includes a first spring mechanism to support a first object as part of a first system. To control vibration of the first object, a first actuator applies a force to the first object via a command value generated by a first computing based on an output... Agent: Canon Kabushiki Kaisha