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Photocopying April category listing, related patent applications 04/12Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 04/26/2012 > 8 patent applications in 6 patent subcategories. category listing, related patent applications
20120099088 - High heat load optics with a liquid metal interface for use in an extreme ultraviolet lithography system: Methods and apparatus for cooling mirrors in an extreme ultraviolet (EUV) lithography system using a liquid metal interface are described. According to one aspect of the present invention, an apparatus which may be used in an EUV lithography system includes a heat exchanger, a mirror assembly, and a first liquid... Agent:
20120099089 - Apparatus and methods for measuring thermally induced reticle distortion: An apparatus and method for measuring thermo-mechanically induced reticle distortion or other distortion in a lithography device enables detecting distortion at the nanometer level in situ. The techniques described use relatively simple optical detectors and data acquisition electronics that are capable of monitoring the distortion in real time, during operation... Agent: Nikon Corporation
20120099090 - System and methods related to generating electromegnetic radiation interference patterns: Systems and methods related to the generation of interference patterns using electromagnetic radiation are generally described. Some embodiments are directed to the use of such systems and methods to perform interference lithography.... Agent: Massachusetts Institute Of Technology
20120099092 - Detection of contamination in euv systems: A sensor for sensing contamination in an application system is disclosed. In one aspect, the sensor comprises a capping layer. The sensor is adapted to cause a first reflectivity change upon initial formation of a first contamination layer on the capping layer when the sensor is provided in the system.... Agent: Imec
20120099091 - Method of optimizing a lithographic process, device manufacturing method, lithographic apparatus, computer program product and simulation apparatus: A method of optimizing a lithographic process for imaging a pattern, including a plurality of features, onto a substrate using a lithographic apparatus, the lithographic apparatus having a controllable illumination system to illuminate a patterning device and a controllable projection system to project an image of the patterning device onto... Agent: Asml Netherlands B.v.
20120099093 - Polarization actuator: The present invention relates to an apparatus for influencing a light beam arrangement comprising a plurality of light beams (4) arranged alongside one another, wherein provision is made of at least one optical element (5, 15, 25) which is movable transversely with respect to the light beams and by which... Agent: Carl Zeiss Smt Gmbh
20120099094 - Dual-stage exchange system for lithographic apparatus: A dual-stage exchange system for a lithographic apparatus comprises a silicon chip stage (10) operating in an exposure workstation (6) and a silicon chip stage (12) operating in a pre-processing workstation (7). Each silicon chip stage (10, 12) is supported by a six-freedom micro-motion stage, respectively. The silicon chip stage... Agent: Tsinghua University
20120099095 - Dual-stage exchange system for lithographic apparatus: A dual-stage exchange system for a lithographic apparatus comprises a silicon chip stage (13) operating in an exposure workstation (3) and a silicon chip (14) stage operating in a pre-processing workstation (4). The two silicon chip stages (13, 14) are provided on the same base stage (1), and suspended on... Agent: Tsinghua University04/19/2012 > 11 patent applications in 4 patent subcategories. category listing, related patent applications
20120092631 - Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufacturing method: A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of... Agent: Asml Netherlands B.v.
20120092632 - Diffraction unlimited photolithography: Methods, devices, systems, and materials are disclosed for diffraction unlimited photofabrication. A method is provided where a photoresponsive material is illuminated with a first optical pattern at a first wavelength of light. The first wavelength of light alters a solubility of the photoresponsive organic material. The photoresponsive material is also... Agent: The Regents Of The University Of Colorado, A Body Corporate
20120092633 - Reflective film interface to restore transverse magnetic wave contrast in lithographic processing: A system for exposing a resist layer to an image that includes a layer reflective to imaging tool radiation and a resist layer having a region of photosensitivity over the reflective layer. An imaging tool projects radiation containing an aerial image onto the resist layer, with a portion of the... Agent: International Business Machines Corporation
20120092634 - Method and apparatus for printing periodic patterns: A method for printing a pattern of features including the steps of providing a substrate having a recording layer disposed thereon, providing a mask bearing a periodic pattern of features, arranging the substrate parallel to the mask and with a separation having an initial value, providing an illumination system for... Agent:
20120092635 - Method and apparatus for printing periodic patterns: A method for printing a pattern of features including the steps of providing a substrate having a recording layer disposed thereon, providing a mask bearing a periodic pattern of features, arranging the substrate parallel to the mask and with a separation having an initial value, providing an illumination system for... Agent:
20120092636 - Metrology apparatus, lithography apparatus and method of measuring a property of a substrate: A metrology apparatus is configured to measure a property of a substrate. The metrology apparatus includes an illumination system configured to condition a radiation beam, an objective lens configured to project radiation onto the substrate, a detector configured to detect radiation reflected from a surface of the substrate, and an... Agent: Asml Netherlands B.v.
20120092637 - Microlithographic projection exposure apparatus: The disclosure relates to a microlithographic projection exposure apparatus and a microlithographic projection exposure apparatus, as well as related components, methods and articles made by the methods. The microlithographic projection exposure apparatus includes an illumination system and a projection objective. The illumination system can illuminate a mask arranged in an... Agent: Carl Zeiss Smt Gmbh
20120092641 - Method for positioning an object by an electromagnetic motor, stage apparatus and lithographic apparatus: A method to enable positioning of an object by a positioning device that includes an electromagnetic motor to control the position of the object in a lithographic apparatus, the method including receiving desired motor signals at the electromagnetic motor to produce a plurality of primary forces and a pitch torque... Agent: Asml Netherlands B.v.
20120092638 - Method of aligning a wafer stage and apparatus for performing the same: In a method of aligning a wafer stage, the wafer stage may be moved in an X-axis direction. A first coordinate of the wafer stage may be measured from a first measurement position inclined to the X-axis. The wafer stage may be moved in a Y-axis direction. A second coordinate... Agent: Samsung Electronics Co., Ltd.
20120092640 - Shared compliance in a rapid exchange device for reticles, and reticle stage: Provided is a method to load a patterning device (1010) onto a reticle stage (RS) of a lithography system, a Rapid Exchange Device (RED) configured to load a patterning device (1010) onto a reticle stage (RS) of a lithography system, and a system for manufacturing a semiconductor device lithographically. The... Agent: Asml Holding N.v.04/12/2012 > 7 patent applications in 3 patent subcategories. category listing, related patent applications
20120086927 - Detection device, movable body apparatus, pattern formation apparatus and pattern formation method, exposure apparatus and exposure method, and device manufacturing method: By irradiating a detection beam from an irradiation system of a detection device to a scale used for measuring the position of a wafer stage, and detecting the detection beam via the scale by a photodetection system, a surface state (an existence state of foreign substance) of the scale is... Agent: Nikon Corporation
20120086926 - Lithographic apparatus and device manufacturing method: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from... Agent: Asml Netherlands B.v.
20120086928 - Lithographic apparatus and device manufacturing method: A lithographic apparatus, includes a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion... Agent: Asml Netherlands B.v.
20120086929 - Lithographic apparatus and device manufacturing method: A lithographic projection apparatus includes a laser cleaning device. The laser cleaning device is constructed and arranged to clean a surface. The laser cleaning device includes a laser source constructed and arranged to generate radiation, and an optical element constructed and arranged to focus the radiation in a focal point... Agent: Asml Netherlands B.v.
20120086925 - Method for avoiding contamination and euv-lithography-system: A method for preventing contaminating gaseous substances (18) from passing through an opening (17b) in a housing (4a) of an EUV lithography apparatus (1), wherein at least one optical element for guiding EUV radiation (6) is arranged in the housing (4a). The method involves: generating at least one gas flow... Agent: Carl Zeiss Smt Gmbh
20120086930 - Photolithography exposure apparatus having blinding plates and method of driving the same: An exposure apparatus includes a light source for providing bursts of photolithographic exposure light, a mask for applying a pattern to the photolithographic exposure light, a variable length blind for blocking parts of an exposure window from receiving the photolithographic exposure light and a blind driver for controllably driving the... Agent:
20120086931 - Stage device including a heat insulating sheet supported by an auxiliary member: A stage device that includes a base. A stage movable portion is movable along a surface of the base. An interferometer measures a position of the stage movable portion using measurement light. At least one of a piping element and a wiring element are connected to the stage movable portion.... Agent: Canon Kabushiki Kaisha04/05/2012 > 9 patent applications in 4 patent subcategories. category listing, related patent applications
20120081681 - Drawing device and drawing method: A drawing device draws a pattern on a substrate by radiating light from an optical head part on a target object (for example, substrate) which relatively moves with respect to the optical head part. Here, the optical head part has a spatial modulating unit which spatially modulates light from a... Agent:
20120081683 - Lithographic apparatus and detector apparatus: A detector including a layer of scintillation material, a layer of spacer material on the scintillation material, and a spectral purity filter layer on the spacer material. A method includes directing EUV radiation through a spectral purity filter layer, directing the EUV radiation through a spacer material layer provided beneath... Agent: Asml Netherlands B.v.
20120081682 - Maskless exposure apparatus and method to determine exposure start position and orientation in maskless lithography: According to an example embodiment, a method to determine an exposure start position and orientation includes loading a substrate on a moving table. The substrate includes at least one alignment mark of a first set of alignment marks of a first pattern layer patterned thereon. At least one alignment mark... Agent: Samsung Electronics Co., Ltd.
20120081685 - Microlithographic projection exposure apparatus illumination optics: Optics, such as, for example, microlithographic projection exposure apparatus illumination optics, as well as related systems, methods, components and devices are disclosed.... Agent: Carl Zeiss Smt Gmbh
20120081686 - Microlithographic projection exposure apparatus illumination optics: Optics, such as, for example, microlithographic projection exposure apparatus illumination optics, as well as related systems, methods, components and devices are disclosed.... Agent: Carl Zeiss Smt Gmbh
20120081684 - Object inspection systems and methods: Disclosed are systems and methods for object inspection, in particular for inspection of reticles used in a lithography process. The method includes interferometrically combining a reference radiation beam with a probe radiation beam, and storing their complex field images. The complex field image of one object is then compared with... Agent: Asml Holding N.v.
20120081687 - Interference projection exposure system and method of using same: An exemplary embodiment of the present invention provides an interference projection exposure system comprising a beam-providing subsystem and an objective lens subsystem that can provide a plurality of light beams which intersect and interfere at an image plane to produce a high spatial frequency periodic optical-intensity distribution. The interference projection... Agent: Georgia Tech Research Corporation
20120081688 - Apparatus and method for preparing lenticular sheet: An apparatus for preparing a lenticular sheet includes a photoconductor, a light emitting section for forming an electrostatic latent image on the photoconductor, a developing section for forming a transparent toner layer by applying a transparent toner to the electrostatic latent image on the photoconductor, a transferring section for transferring... Agent: Sharp Kabushiki Kaisha
20120081689 - Method for determining exposure condition and computer-readable storage media storing program for determining exposure condition: A method for determining an exposure condition for use in projecting an image of a pattern of an original on a substrate includes a setting step of setting an exposure condition, an image calculating step of calculating a dimension of an image to be projected on the substrate under the... Agent: Canon Kabushiki KaishaPrevious industry: Optics: image projectors
Next industry: Optics: measuring and testing
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