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Photocopying March listing by industry category 03/12

20120075600 - Imaging apparatus, imaging system, and method for controlling imaging apparatus: An imaging apparatus includes a detector in which a plurality of pixels are arranged in a matrix; each pixel includes a conversion element that converts radiation or light into an electric charge. The detector performs an exposure imaging operation for outputting exposure image data, a correction imaging operation for outputting... Agent: Canon Kabushiki Kaisha

20120075607 - Detector module, cooling arrangement and lithographic apparatus comprising a detector module: A detector module (20) is described that includes at least one detector (30) for sensing photon radiation, an electronic circuit (40) coupled to the at least one detector (30), and a housing (50) having a first and a second body (60, 70), each having a bottom part (62, 72) and... Agent: Asml Netherlands B.v.

20120075601 - Inspection apparatus and method, lithographic apparatus and lithographic processing cell: An “angle-resolved” version of FD-OCT is used to measure reflectance properties. An inspection apparatus comprises an illumination source configured to provide an illumination beam, an interferometer configured to use the illumination beam to illuminate a target on a substrate at an incidence angle and to use radiation reflected from the... Agent: Asml Netherlands B.v.

20120075610 - Lithographic apparatus and method for reducing stray radiation: A lithographic apparatus includes an illumination system for providing a beam of extreme ultra-violet radiation, a masking device for controlling the illumination of a patterning device by the beam of radiation, a support for supporting the patterning device, the patterning device configured to impart a pattern to the beam of... Agent: Asml Netherlands B.v.

20120075606 - Mask inspection with fourier filtering and image compare: A mask inspection system with Fourier filtering and image compare can include a first detector, a dynamic Fourier filter, a controller, and a second detector. The first detector can be located at a Fourier plane of the inspection system and can detect a first portion of patterned light produced by... Agent:

20120075604 - Methods and systems for evaluating extreme ultraviolet mask flatness: Disclosed are methods and systems for determining a topography of a lithographic optical element and/or a holder of a lithographic optical element. In one embodiment, the method includes directing electromagnetic radiation towards a lithographic optical element, where the electromagnetic radiation comprises electromagnetic radiation in a first predetermined wavelength range and... Agent: Imec

20120075602 - Optical arrangement in a projection objective of a microlithographic projection exposure apparatus: The disclosure relates to an optical arrangement in a projection objective of a microlithographic projection exposure apparatus which is designed for operation in EUV. The optical arrangement includes first and second mirrors that are in direct succession to each other along the projection beam direction. The second mirror is rigidly... Agent: Carl Zeiss Smt Gmbh

20120075609 - Optical arrangement of autofocus elements for use with immersion lithography: A lithographic projection apparatus includes a projection system having a spherical lens element from which an exposure light is projected through liquid in a space under the spherical lens element, a member disposed adjacent to a surface of the spherical lens element through which the exposure light does not pass,... Agent: Nikon Corporation

20120075603 - Process tuning with polarization: A method for configuring an illumination source of a lithographic apparatus, the method including dividing the illumination source into pixel groups, each pixel group including one or more illumination source points in a pupil plane of the illumination source; changing a polarization state of each pixel group and determining an... Agent: Asml Netherlands B.v.

20120075608 - Projection objective and projection exposure apparatus with negative back focus of the entry pupil: The disclosure concerns a projection objective, which can include an object plane in which an object field is formed, an entry pupil, a mirrored entry pupil (RE) in a mirrored entry pupil plane obtained by mirroring the entry pupil (VE) at the object plane, an image plane, an optical axis,... Agent: Carl Zeiss Smt Gmbh

20120075605 - Source polarization optimization: A lithographic simulation process is described, where each source point in a preselected group of source points at a pupil plane of an illumination source is represented by one or more variable parameters, wherein at least some of the variable parameters characterize a polarization state at the source point. One... Agent: Asml Netherlands B.v.

20120075611 - Diaphragm changing device: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has... Agent: Carl Zeiss Smt Gmbh

20120075612 - Exposure method and exposure apparatus: In the present invention, while conveying a subject to be exposed, when exposure on a first exposure area of the subject to be exposed is completed, the exposure being performed by using a first mask pattern group of a photomask in which a plurality of types of mask pattern groups... Agent:

20120075613 - Lithographic apparatus having an encoder type position sensor system: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises... Agent: Asml Netherlands B.v.

20120075614 - Exposure method and storage medium: The present invention provides an exposure method including the steps of generating a plurality of element light sources formed on a pupil plane of an illumination optical system, setting a plurality of aberration states which are expected to exist in a projection optical system, calculating, for each of all combinations... Agent: Canon Kabushiki Kaisha

20120069309 - Fluid handling structure, module for an immersion lithographic apparatus, lithographic apparatus and device manufacturing method: A fluid handling structure successively having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a fluid supply opening radially... Agent: Asml Netherlands B.v.

20120069310 - Semiconductor microlithography projection exposure apparatus: The disclosure relates to an optical correction arrangement including at least one optical element and at least one irradiation mechanism for the targeted local irradiation of the optical element with electromagnetic heating radiation for the targeted local heating of the optical element. The optical correction arrangement also includes a mechanism... Agent: Carl Zeiss Smt Gmbh

20120069311 - Passivation of multi-layer mirror for extreme ultraviolet lithography: A reflector structure suitable for extreme ultraviolet lithography (EUVL) is provided. The structure comprises a substrate having a multi-layer reflector. A capping layer is formed over the multi-layer reflector to prevent oxidation. In an embodiment, the capping layer is formed of an inert oxide, such as Al2O3, HfO2, ZrO2, Ta2O5,... Agent: Infineon Technologies Ag

20120069313 - Euv microlithography illumination optical system and euv attenuator for same: An illumination optical system for EUV microlithography is used to direct an illumination light beam from a radiation source to an object field. At least one EUV mirror has a reflective face with a nonplanar mirror topography for forming the illumination light beam. The EUV mirror has at least one... Agent: Carl Zeiss Smt Gmbh

20120069312 - Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type: An imaging optical system has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. The imaging optical system has a pupil obscuration. The last mirror in the beam path of the imaging light between the object field and... Agent: Carl Zeiss Smt Gmbh

20120069315 - Imaging optics and projection exposure installation for microlithography with an imaging optics: Imaging optics includes a first mirror in the imaging beam path after the object field, a last mirror in the imaging beam path before the image field, and a fourth to last mirror in the imaging beam path before the image field. In an unfolded imaging beam path between the... Agent: Carl Zeiss Smt Gmbh

20120069314 - Imaging optics and projection exposure installation for microlithography with an imaging optics of this type: An imaging optics has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. A pupil plane is arranged in the imaging beam path between the object field and the image field. A stop is arranged in the pupil... Agent: Carl Zeiss Smt Gmbh

20120069317 - Lithography system arranged on a foundation, and method for arranging a lithography system on said foundation: The invention relates to a vibration isolation requiring system, such as a lithography system, arranged on a foundation, for example part of the floor in the room where the lithography system is arranged, and a method for arranging a lithography system on a foundation. The lithography system is arranged on... Agent:

20120069316 - Methods for limiting counter-mass trim-motor force and stage assemblies incorporating same: An exemplary stage assembly has movable stage mass and counter-mass. A stage motor is coupled to the stage mass and counter-mass such that stage-mass motion imparted by the stage motor causes a reactive motion of the counter-mass counter to the motion of the stage mass. At least one trim-motor is... Agent: Nikon Corporation

20120069318 - Projection exposure method and projection exposure system therefor: The disclosure provides a projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask. The mask has a first pattern area with a first subpattern, and at least one second pattern area, arranged laterally offset from the first pattern area, with... Agent: Carl Zeiss Smt Gmbh

20120062858 - Cleaning method, device manufacturing method, exposure apparatus, and device manufacturing system: A cleaning method comprises: cleaning the liquid contact member by supplying a first liquid for cleaning to the liquid contact member; recovering the first liquid supplied to the liquid contact member; supplying a second liquid different from the first liquid to the liquid contact member after the liquid contact member... Agent: Nikon Corporation

20120062860 - Exposure apparatus, exposure method, and device manufacturing method: An exposure apparatus exposes a substrate with exposure light via a liquid. The exposure apparatus includes an optical system including an emission surface from which the exposure light is emitted; a liquid supply port that supplies the liquid in order to fill an optical path of the exposure light emitted... Agent: Nikon Corporation

20120062861 - Exposure apparatus, exposure method, and device manufacturing method: An exposure apparatus includes an immersion space forming member (70) which fills an optical path space (K1) for exposure light (EL) with a first liquid (LQ) to form an immersion space, and a temperature regulating mechanism (60) which suppresses a change in the temperature of the immersion space forming member... Agent: Nikon Corporation

20120062859 - Polishing device, polishing method, exposure apparatus and device manufacturing method: An exposure apparatus includes a projection optical system and a liquid supply device. The projection optical system includes an image plane side optical member, which is arranged in an optical path of exposure light, and a lens barrel, which supports the image plane side optical member. The liquid supply device... Agent: Nikon Corporation

20120062862 - Apparatuses and methods for compensation of carrier distortions from measurement machines: In a method for generating a pattern on a workpiece having at least one die placed thereon, positions of the at least one die and at least two global alignment marks on the workpiece are measured, pattern adjustment data is generated, pattern image data associated with the pattern to be... Agent: Micronic Mydata Ab

20120062863 - Alignment measurement system, lithographic apparatus, and a method to determine alignment in a lithographic apparatus: An alignment measurement system measures an alignment target on an object. A measurement illuminates the target and is reflected. The reflected measurement beam is split and its parts are differently polarized. A detector receives the reflected measurement beam. A processing unit determines alignment on the basis of the measurement beam... Agent: Asml Netherlands B.v.

20120062865 - Optical imaging with reduced immersion liquid evaporation effects: An optical arrangement for use in an optical imaging process includes an optical element, an immersion zone and a liquid repelling device. During the optical imaging process, the immersion zone is located adjacent to the optical element and is filled with an immersion liquid. The optical element has a first... Agent: Carl Zeiss Smt Gmbh

20120062864 - Reflective imaging optical system, exposure apparatus, and method for producing device: An reflective imaging optical system of the far pupil type, which is applicable to an exposure apparatus using for example the EUV light, forms on a second plane an image of a predetermined area on a first plane and is provided with first to eighth reflecting mirrors arranged in an... Agent:

20120062866 - Microchannel-cooled coils of electromagnetic actuators exhibiting reduced eddy-current drag: Electromagnetic actuators are disclosed having at least one actively cooled coil assembly. Exemplary actuators are linear and planar motors of which the cooled coil assembly has a coil having first and second main surfaces. A respective thermally conductive cooling plate is in thermal contact with at least one main surface... Agent: Nikon Corporation

20120057139 - Cleaning method, device manufacturing method, cleaning substrate, liquid immersion member, liquid immersion exposure apparatus, and dummy substrate: A cleaning substrate and a liquid immersion member face each other in order to clean the liquid immersion member. The cleaning substrate has a first liquid-repellent portion which is liquid-repellent to a first cleaning liquid for cleaning and a lyophilic portion which is disposed in at least a part of... Agent: Nikon Corporation

20120057140 - Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method: In a substrate stage, when a Y coarse movement stage moves in the Y-axis direction, an X coarse movement stage, a weight cancellation device, and an X guide move integrally in the Y-axis direction with the Y coarse movement stage, and when the X coarse movement stage moves in the... Agent: Nikon Corporation

20120057141 - Pattern forming method and apparatus, exposure method and apparatus, and device manufacturing method and device: During a period after starting exposure to a plurality of shot areas subject to exposure on a wafer until completing the exposure, a light via a slit pair arranged on a stage that holds the wafer, of illumination light via a pattern generating device, is received, and information on a... Agent: Nikon Corporation

20120057143 - Illumination system for use in a stereolithography apparatus: The invention concerns an illumination system for use in a stereolithography apparatus, comprising: a planar support; a multilens projector array mechanically supported on the planar support over the array on a plano side, and having a work surface arranged to receive a resin applying device for applying a resin layer,... Agent: Nederlandse Organisatie Voor Toegepast-natuurwetenschappelijk Onderzoek Tno

20120057142 - Lithographic apparatus and device manufacturing method: A lithographic apparatus and method are used for manufacturing a device. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate. A Higher Order Wafer Alignment (HOWA) model is applied so as to model higher order distortions across the substrate. The model... Agent: Asml Netherlands B.v.

20120057144 - Lithographic apparatus, excimer laser and device manufacturing method: A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing... Agent: Asml Netherlands B.v.

20120050702 - Mask-less method and structure for patterning photosensitive material using optical fibers: An apparatus for patterning objects for the manufacture of semiconductor integrated circuits includes an optical source, multiple fiber cores coupled to the optical source, each of the fiber cores has an input end and an output end, and each of the input ends is coupled to the optical source. The... Agent: Semiconductor Manufacturing International (shanghai) Corporation

20120050703 - Euv collector: An EUV collector for collecting and transmitting radiation from an EUV radiation source includes at least one collector mirror for reflecting an emission of the EUV radiation source, which is rotationally symmetric with respect to a central axis. The EUV collector also includes a cooling device for cooling the at... Agent: Carl Zeiss Smt Gmbh

20120050705 - Photolithography system: A photolithography system is equipped with a light modulator that comprises a plurality of regularly arrayed light modulation elements; a scanning mechanism configured to move an exposure area relative to an object in a main scanning direction, in a state in which the exposure area is inclined in the main... Agent: Orc Manufacturing Co., Ltd.

20120050704 - Source-collector module with gic mirror and xenon liquid euv lpp target system: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a... Agent: Media Lario S.r.l

20120050707 - Source-collector module with gic mirror and tin wire euv lpp target system: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a... Agent: Media Lario S.r.l

20120050706 - Source-collector module with gic mirror and xenon ice euv lpp target system: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a... Agent: Media Lario S.r.l

20120050708 - Source-collector module with gic mirror and tin rod euv lpp target system: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a... Agent: Media Lario S.r.l

20120050709 - Stage apparatus, lithographic apparatus and method of positioning an object table: A measurement system configured to measure a position dependent signal of an object table, the measurement system including at least one sensor mountable on the object table and a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on... Agent: Asml Netherlands B.v.

20120050710 - Method of measuring mark position and measuring apparatus: A method and an apparatus are provided to measure a position of a mark with a less measurement error caused by a variation in a wafer process condition. The mark is illuminated with light and an image of the mark is formed, via an optical system, in a light receiving... Agent: Canon Kabushiki Kaisha

20120050711 - Chuck assembly back side reticle cleaner: An improved technique for fixedly holding a reticle in a reticle chuck of the reticle simplifies the process of cleaning the back surface of the reticle by exposing the entire back surface. The technique includes approaching the reticle chuck with the reticle held at an initial orientation, aligning the reticle... Agent: