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Photocopying February patent applications/inventions, industry category 02/12

20120044469 - Exposure method, exposure apparatus, and device manufacturing method: A liquid immersion device that has an mixing mechanism that mixes and dissolves a predetermined substance for adjusting specific resistance of the liquid, which is supplied onto a liquid repellent film on the surface of an object (member) of a projection optical system placed on the light emitting side of... Agent: Nikon Corporation

20120044468 - Lithographic apparatus and device manufacturing method: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature... Agent: Asml Netherlands B.v.

20120044471 - Lithographic apparatus and method: A method of projecting a patterned beam onto a substrate using an EUV lithographic apparatus having a projection system including a plurality of mirrors. The method includes the following steps. Using the projection system to project the patterned beam onto the substrate while moving a final mirror of the projection... Agent: Asml Netherlands B.v.

20120044470 - Substrate for use in metrology, metrology method and device manufacturing method: A pattern from a patterning device is applied to a substrate. The applied pattern includes device functional areas and metrology target areas. Each metrology target area comprises a plurality of individual grating portions, which are used for diffraction based overlay measurements or other diffraction based measurements. The gratings are of... Agent: Asml Netherlands B.v.

20120044472 - Inspection method for lithography: A method is used to determine focus of a lithographic apparatus used in a lithographic process on a substrate. The lithographic process is used to form at least two periodic structures on the substrate. Each structure has at least one feature that has an asymmetry between opposing side wall angles... Agent: Asml Netherlands B.v.

20120044473 - Optical element for uv or euv lithography: m

20120044474 - Optical module for guiding a radiation beam: An optical module is used to guide an EUV radiation beam. The optical module has a chamber that can be evacuated and at least one mirror accommodated in the chamber. The mirror has a plurality of individual mirrors, the reflection faces of which complement one another to form an overall... Agent: Carl Zeiss Smt Gmbh

20120038894 - Lens cleaning module: A lens cleaning module for a lithography system having an exposure apparatus including an objective lens is disclosed. The lens cleaning module includes a scanning stage for supporting a wafer beneath the objective lens. A cleaning module is provided adjacent to the scanning stage for cleaning the objective lens in... Agent: Taiwan Semiconductor Manufacturing Company, Ltd

20120038895 - Lens heating compensation in photolithography: Photolithographic apparatus and methods are disclosed. One such apparatus includes an optical path configured to provide a first diffraction pattern in a portion of an optical system and to provide a second diffraction pattern to the portion of the optical system after providing the first diffraction pattern. Meanwhile, one such... Agent:

20120038896 - Maskless vortex phase shift optical direct write lithography: The present invention provides methods and apparatus for accomplishing optical direct write phase shift lithography. A lithography system and method are provided wherein a mirror array is configured to generate vortex phase shift optical patterns that are directed onto a photosensitive layer of a substrate. The lithography methods and systems... Agent: Lsi Corporation

20120038897 - Optical element with an antireflection coating, projection objective, and exposure apparatus comprising such an element: An optical element (14) transparent for radiation with a wavelength λ in the ultraviolet wavelength range below 250 nm, in particular at 193 nm, comprises a substrate (17) with a refractive index ns larger than 1.6, and an antireflection coating (16) formed on at least part of the surface of... Agent:

20120038898 - Lithographic apparatus and alignment method: A lithographic apparatus comprising a source collector module including a collector, configured to collect radiation from a radiation source; an illuminator configured to condition the radiation collected by the collector and to provide a radiation beam; and a detector arrangement comprising a reflector arrangement disposed in a fixed positional relationship... Agent: Asml Netherlands B.v.

20120038899 - Exposure apparatus and alignment error compensation method using the same: In one embodiment, a center of rotation and a slippage amount are estimated when slippage occurs due to radial runout during planar rotation θ to align the mask and the substrate. The slippage amount is estimated after rotation is reflected in a movement command value of a stage as a... Agent: Samsung Electronics Co., Ltd.

20120033191 - Developer spraying device for reducing usage quantity of developer: A developer spraying device for reducing usage quantity of developer includes a hollow inner tube unit and a hollow outer tube unit. The hollow inner tube unit includes a hollow inner tube and a plurality of nozzles communicating an inner portion of the hollow inner tube with external world. The... Agent: Inotera Memories, Inc.

20120033192 - Exposure apparatus, exposure method, and device producing method: An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) via a projection optical system (PL) and a liquid (LQ) supplied from a liquid supply mechanism (10). The exposure apparatus (EX) has a pressure adjustment mechanism (90) for adjusting pressure of the liquid... Agent: Nikon Corporation

20120033193 - Inspection apparatus and method, lithographic apparatus and lithographic processing cell: An inspection apparatus measures a property of a substrate including a periodic structure. An illumination system provides a beam of radiation with an illumination profile including a plurality of illuminated portions. A radiation projector projects the beam of radiation onto the substrate. A detector detects radiation scattered from the periodic... Agent: Asml Netherlands B.v.

20120033194 - Decision method and storage medium: The present invention provides a decision method of causing a computer to decide an exposure condition to be set in an exposure apparatus including an illumination optical system that illuminates a pattern including a plurality of pattern elements, and a projection optical system that projects the pattern onto a substrate,... Agent: Canon Kabushiki Kaisha

20120026473 - Highly reflective, hardened silica titania article and method of making: The present disclosure is directed to improved silica-titania glass articles intended for use in EUV or other high energy reflective optic systems, and to a process for producing such improved silica-titania articles. The improved silica-titania glass articles provide a more stable surface for the coatings that are used in the... Agent:

20120026476 - Device for controlling temperature of an optical element: A device serves for controlling temperature of an optical element provided in vacuum atmosphere. The device has a cooling apparatus having a radiational cooling part, arranged apart from the optical element, for cooling the optical element by radiation heat transfer. A controller serves for controlling temperature of the radiational cooling... Agent: Carl Zeiss Smt Gmbh

20120026475 - Exposure apparatus, exposure method, and device producing method: An exposure apparatus EX is provided with a measuring unit 60 which measures at least one of property and components of a liquid LQ in a state that a liquid immersion area LR is formed on an object different from a substrate P to be exposed. There is provided an... Agent: Nikon Corporation

20120026474 - Reticle cooling in a lithographic apparatus: An apparatus and method reduce temperature variation across a reticle so as to reduce the expansion variation of the reticle. One method for realizing reduced temperature variation is to fill an inner space with backfill gas under pressure, using distribution trenches and walls (e.g., flow restriction dams), rather than providing... Agent: Asml Holding N.v.

20120026477 - Lithographic apparatus, aberration detector and device manufacturing method: An aberration detector for a lithographic apparatus is used. An imaging device captures an image of at least one pinhole feature of a target projected onto the imaging device by the projection system of the lithographic apparatus at two different locations separated in a direction parallel to the optical axis... Agent: Asml Neitherlands B.v.

20120026479 - Optical imaging device and method for reducing dynamic fluctuations in pressure difference: There is provided an optical imaging device, in particular for microlithography, comprising at least one optical element and at least one holding device associated to the optical element (109), wherein the holding device holds the optical element and a first part (109.1) of the optical element contacts a first atmosphere... Agent: Carl Zeiss Smt Gmbh

20120026478 - System and method for manufacturing three dimensional integrated circuits: System and method for manufacturing three-dimensional integrated circuits are disclosed. In one embodiment, the method includes providing an imaging writer system that includes a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, receiving mask data to be written to one or more layers... Agent: Pinebrook Imaging Systems Corporation

20120026480 - Image-compensating addressable electrostatic chuck system: An electrostatic chuck including a substrate, a support layer to support an object, an electrode layer comprising an electrode and being disposed between the substrate and the support layer configured to apply an electrostatic attraction force on the object upon energization of the electrode, and a plurality of actuators for... Agent: Asml Netherlands B.v.