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Photocopying December patent applications/inventions, industry category 12/11

20110317139 - Exposure apparatus and exposure method, and device manufacturing method: An exposure apparatus includes: a supply port through which a liquid is supplied to an optical path space of exposure light; and a supply passage in which the liquid flows and which is in fluid communication with the supply port. An amount of a predetermined substance mixed into the liquid... Agent: Nikon Corporation

20110317136 - Inspection apparatus employing wide angle objective lens with optical window: An optical window is used to facilitate best performance for imaging an object placed in a separate ambiance. The window can be in a particle detection system, comprising a separator between first and second environments. The separator comprises an opening and an optical element located within the opening. An object... Agent: Asml Netherlands B.v.

20110317138 - Lithographic apparatus and device manufacturing method: A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.... Agent: Asml Netherlands B.v.

20110317137 - Lithographic apparatus and lithographic apparatus cooling method: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a... Agent: Asml Netherlands B.v.

20110317140 - Projection exposure apparatus for semiconductor lithography including an actuator system: The disclosure relates to a projection exposure apparatus for semiconductor lithography which includes an actuator system to mechanically actuate a component of the projection exposure apparatus. The actuator system has at least one mechanism to reduce and/or dampen the heat input into the component that is due to heat arising... Agent: Carl Zeiss Smt Gmbh

20110317141 - Lithographic apparatus: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the device being capable of imparting the beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a... Agent: Asml Netherlands B.v.

20110317143 - Lithographic apparatus and device manufacturing method: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation... Agent: Asml Netherlands B.v.

20110317142 - Measurement system, method and litographic apparatus: A measurement system is configured to derive a position quantity of an object, the measurement system includes at least one position quantity sensor configured to provide respective position quantity measurement signals; a position quantity calculator configured to determine a position quantity of the object from the position quantity measurement signal,... Agent: Asml Netherlands B.v.

20110317145 - Driving apparatus and exposure apparatus and device fabrication method: A guide includes a brittle material layer and a magnetically attracting magnetic body, e.g., a metal layer. A recess and a projection are formed on the metal layer. The brittle material layer is made of, e.g., a sprayed ceramic material and covers the recess formed on the magnetically attracting metal... Agent: Canon Kabushiki Kaisha

20110317144 - Table for a printer: g

20110310365 - Chamber apparatus and method of maintaining target supply unit: A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet for introducing thereinto a laser beam outputted from the laser apparatus; a target supply unit provided to the chamber for supplying a target material to a predetermined region in the chamber; a... Agent:

20110310366 - Exposure apparatus and article manufacturing method: An apparatus for exposing a substrate to an energy in a vacuum includes a substrate stage having a mirror surface; a mirror configured to deflect a light into a Z axis direction; a measuring device configured to measure the stage position in the Z axis direction with the light in... Agent: Canon Kabushiki Kaisha

20110310367 - Lithographic apparatus and device manufacturing method: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous... Agent: Asml Netherlands B.v.

20110310370 - Device and method for processing light-polymerizable material for building up an object in layers: A method and a device for processing light-polymerizable material for the assembly of a mold, utilizing a lithography-based generative manufacturing technique wherein a layer of a light-polymerizable material, the material being located in at least one trough (4) having a particularly light-transmissive, horizontal bottom (6), is polymerized by illumination on... Agent: Ivoclar Vivadent Ag

20110310369 - Lithographic method and apparatus: A lithographic method for irradiating resist on a substrate, the resist filling a region located between a first element located on the substrate, and a second element located on the substrate, the first element having a first length, a first width, and a first height, the second element having a... Agent: Asml Netherlands B.v.

20110310368 - Method and system for thermally conditioning an optical element: A method for thermally conditioning an optical element includes irradiating the optical element with radiation, not-irradiating the optical element with the radiation, allowing heat flow between the optical element and a conditioning fluid that is held in a conditioning fluid reservoir, and providing a fluid flow of the conditioning fluid,... Agent: Asml Netherlands B.v.

20110310371 - System and method employing secondary back exposure of flexographic plate: A system for forming a relief image on a flexographic print plate comprises a laminator configured to laminate an imaged mask having a mask image to a front surface of a flexographic printing plate precursor. The mask image has mask image areas, each having a highlight value. The system also... Agent:

20110310372 - Illumination system and lithographic apparatus: An illumination system having an array of individually controllable optical elements is disclosed, wherein each element is moveable between a plurality of orientations which may be selected in order to form desired illumination modes. The illumination system includes a controller to control orientation of one or more of the elements,... Agent: Asml Netherlands B.v.

20110310374 - Lithographic fabrication of general periodic structures: A lithographic method related to Talbot imaging for printing a desired pattern of features that is periodic or quasi-periodic in at least one direction onto a substrate surface, which method includes providing a mask bearing a pattern of mask features, arranging the substrate parallel and in proximity to the mask,... Agent:

20110310373 - Lithography apparatus and device manufacturing method: A lithography apparatus includes a first measurement device which measures a position of a mark on a substrate with light, a second measurement device which measures a position of a reference mark on a stage with a charged-particle, a detector which detects the position of the stage in a first... Agent: Canon Kabushiki Kaisha

20110310375 - Illumination optical system, exposure apparatus and device manufacturing method: According to an embodiment, the illumination optical system for illuminating an illumination target surface with light from a light source is provided with a polarization converting member which converts a polarization state of incident light so as to form a pupil intensity distribution in a predetermined polarization state on an... Agent: Nikon Corporation

20110304836 - Method for creating drive pattern for galvano-scanner system: A visible laser beam scanned by a galvano-scanner system is aligned at each of positioning points on the top surface of a master work by manual operation to record sensor position signals of position sensors on galvano-scanners. The sensor position signals on each positioning point are recorded to create a... Agent: Harmonic Drive Systems Inc.

20110304837 - Projection exposure method, projection exposure apparatus, laser radiation source and bandwidth narrowing module for a laser radiation source: The laser radiation is introduced into an illumination system for generating an illumination radiation directed onto the mask, and the pattern is imaged onto the substrate with the aid of a projection objective. The spectral intensity distribution is set so that ατ2≦0.3. The influence of temporally varying speckles on image... Agent: Carl Zeiss Smt Gmbh

20110304835 - System and method for optical shearing: A method of exposing a pattern on a light sensitive surface comprises forming a spatially modulated light beam including a rectangular matrix pattern of rows and columns of image data over a surface, wherein the spatially modulated light beam is operable to expose contiguous sub-exposure areas of the surface, each... Agent: Orbotech Ltd.

20110304838 - Exposure system and adjustment method thereof: An exposure system including a first laser light source, a second laser light source, a focusing module, an astigmatism generating element, and a photo detector, and an adjustment method thereof are provided. The first laser light source emits a first laser beam. The second laser light source emits a second... Agent: Industrial Technology Research Institute

20110304839 - Position sensor and lithographic apparatus: A position sensor is configured to measure a position data of a target. The position sensor includes a radiation source configured to irradiate a radiation beam, a first grating configured to diffract the radiation beam in a first diffraction direction into at least a first order diffraction beam, and a... Agent: Asml Netherlands B.v.

20110299050 - Lithographic system, lithographic method and device manufacturing method: A lithographic system includes a lithographic apparatus and a scatterometer. In an embodiment, the lithographic apparatus includes an illumination optical system arranged to illuminate a pattern and a projection optical system arranged to project an image of the pattern on to a substrate. In an embodiment, the scatterometer includes a... Agent: Asml Netherlands B.v.

20110299051 - Fluid supply system, a lithographic apparatus, a method of varying fluid flow rate and a device manufacturing method: A fluid supply system for a lithographic apparatus includes a first fluid flow path for fluid between a fluid source and a first component and a drain fluid flow path for fluid flow from a junction in the first fluid flow path to a drain component. A controller is provided... Agent: Asml Netherlands B.v.

20110299052 - Measuring apparatus and method, processing apparatus and method, pattern forming apparatus and method, exposure apparatus and method, and device manufacturing method: Position information of a movable body within an XY plane is measured with high accuracy by an encoder system whose measurement values have favorable short-term stability, without being affected by air fluctuations, and also position information of the movable body in a Z-axis direction orthogonal to the XY plane is... Agent: Nikon Corporation

20110299055 - Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses: A beam transforming element for forming a predetermined light intensity distribution on a predetermined surface on the basis of an incident beam includes a first basic element made of an optical material with optical activity, for forming a first region distribution of the predetermined light intensity distribution on the basis... Agent: Nikon Corporation

20110299054 - Displacement device, lithographic apparatus and positioning method: A displacement device with a first and second part which are displaceable relative to one another, the first part being provided with a system of magnets, the second part being provided with a set of coil block units including: at least three first coil block units having current conductors oriented... Agent: Asml Netherlands B.v.

20110299053 - Optical device having a deformable optical element: The disclosure relates to an optical device, in particular for microlithography. The optical device includes an optical module and a support structure that supports the optical module. The optical module includes an optical element and a holding device that holds the optical element. The holding device includes a deformation device... Agent: Carl Zeiss Smt Gmbh

20110299056 - System and method configured to provide predetermined depth of focus and to control irradiance distribution: A system and method for illuminating an imaging optical system are provided, designed to spread the irradiance distribution at a pupil located at a mirror, to decrease the maximum irradiance on the mirror in the pupil, while maintaining a predetermined depth of focus of the imaging optical system (i.e. a... Agent: Nikon Corporation

20110299058 - Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method: Positional information of a wafer stage in a Z-axis direction and a tilt direction with respect to the XY plane (for example, a θy direction) is measured, using a surface position measurement system, such as, for example, a Z head and the like, and the wafer stage is driven based... Agent: Nikon Corporation

20110299057 - Stage apparatus and lithographic apparatus comprising such stage apparatus: A stage apparatus to position an object, the stage apparatus including a table configured to hold the object, a support structure configured to support the table, the table being displaceable relative to the support structure, the support structure including one of a first data clock and a second data clock... Agent: Asml Netherlands B.v.

20110292356 - Substrate processing system and substrate processing method: Provided is a substrate processing system including a group controller which determines a combination of processing apparatuses having the shortest total processing time including the processing end time in a final processing apparatus, determines a predictable elapsed time up to a processing start time by a predetermined downstream processing apparatus... Agent: Tokyo Electron Limited

20110292359 - Cleaning device and a lithographic apparatus cleaning method: A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to... Agent: Asml Netherlands B.v.

20110292357 - Fluid handling structure, a lithographic apparatus and a device manufacturing method: A fluid handling structure to confine immersion liquid in a space between a projection system and a facing surface of a substrate, of a table to support the substrate, or both, is disclosed. The fluid handling structure includes a transponder to dissolve at least some of the gas in a... Agent: Asml Netherlands B.v.

20110292358 - Lithographic apparatus and device manufacturing method: Various types of pressure regulating devices are disclosed to reduce a pressure gradient in a liquid supply system of a lithographic apparatus, the liquid supply system having a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic... Agent: Asml Netherlands B.v.

20110292360 - Patterning non-planar surfaces: A system for forming a pattern on a part comprises a chamber base, a pressure vessel and a retaining device. The retaining device is positionable between the chamber base and the pressure vessel to secure a deformable mask therebetween. The system further comprises a first pressure source, a second pressure... Agent: Battelle Memorial Institute

20110292361 - Exposure apparatus: An exposure apparatus including a warp deformation forming mechanism having a plane-parallel plate for warp deformation provided on a projection optical path of a mask pattern to be projected to a work substrate, and configured to be deformed by warping, a restraint member configured to cause an intermediate part of... Agent: Kabushiki Kaisha Topcon

20110292362 - Exposure apparatus: An exposure apparatus which forms a predetermined mask pattern on a target workpiece through exposure by: casting exposure light upon a mask in which the pattern and a mask-side alignment mark are formed, and forming an image of the mask on the target workpiece by projecting the exposure light, which... Agent: Kabushiki Kaisha Topcon

20110292363 - Exposure apparatus and methods: A light beam collimated by illumination optics (4) from a radiation source (6) illuminates the surface of a wave front modulator (8) such as an Spatial Light Modulator (SLM) or Computer Generated Hologram photomask (CGH). The resulting wave travels via projection optics (10) to the substrate (12), passing through a... Agent:

20110292364 - Imaging apparatus and method of controlling the apparatus: An imaging apparatus (1000) includes: an imaging device (110), a lens (120), an initial focal point detecting unit (130) detecting a positional relationship between the imaging device (110) and the lens (120) to specify an initial focal point which is a focal point found when an exposure start instruction is... Agent:

20110292365 - Calibration method, inspection method and apparatus, lithographic apparatus, and lithographic processing cell: Disclosed are methods, apparatuses, and lithographic systems for calibrating an inspection apparatus. Radiation is projected onto a pattern in a target position of a substrate. By making a plurality of measurements of the pattern and comparing the measured first or higher diffraction orders of radiation reflected from the pattern of... Agent: Asml Netherlands B.v.

20110292368 - Exposure apparatus: An exposure apparatus is provided with: a conveying device that conveys the subject to be exposed in a given direction; a spatial light modulating device having a plurality of light modulating elements, which are composed of an electro-optical crystalline material and arranged at least in one row in a direction... Agent:

20110292367 - Imaging optical system: The disclosure generally relates to imaging optical systems that include a plurality of mirrors, which image an object field lying in an object plane in an image field lying in an image plane, where at least one of the mirrors has a through-hole for imaging light to pass through. The... Agent: Carl Zeiss Smt Gmbh

20110292366 - Multilayer mirror and lithographic apparatus: A multilayer mirror to reflect radiation having a wavelength in the range of 2-8 nm has alternating layers. The alternating layers include a first layer and a second layer. The first and second layers are selected from the group consisting of: U and B4C layers, Th and B4C layers, La... Agent: Asml Netherlands B.v.

20110292369 - Substrate table, a lithographic apparatus, a method of flattening an edge of a substrate and a device manufacturing method: A substrate table to support a substrate is disclosed. The substrate table includes a substrate support to support the substrate and to apply a bending force to an edge of the substrate in a first direction. A substrate edge manipulator is provided that is configured to apply a variable bending... Agent: Asml Netherlands B.v.