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Photocopying November recently filed with US Patent Office 11/11

20110285974 - Printer: Tilt angle and tilt direction of lenticular lenses are detected precisely to correct attitude of a transported lenticular sheet with high accuracy. At least first to third lens sensors are disposed in a transport track of the lenticular sheet, aligned in a main scan direction and spaced at uneven intervals.... Agent:

20110285977 - Lithographic apparatus and device manufacturing method: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.... Agent: Asml Netherlands B.v.

20110285976 - Lithographic apparatus, fluid handling structure for use in a lithographic apparatus and device manufacturing method: A lithographic apparatus including a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of the substrate table and/or a substrate located in a recess of the substrate table, a cover having a planar main body that, in use, extends around a substrate... Agent: Asml Netherlands B.v.

20110285975 - Method of managing euv exposure mask and exposure method: According to one embodiment, there is provided a method of managing an EUV exposure mask to manage a cleaning period of the EUV exposure mask set in an exposure apparatus, including obtaining mark profile signals corresponding to two different directions of an alignment mark provided on the mask by irradiating... Agent:

20110285978 - Illumination system for a microlithographic projection exposure apparatus: An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of... Agent: Carl Zeiss Smt Gmbh

20110285979 - Projection objective with diaphragms: A projection objective for imaging an object arranged in an object plane of the projection objective into an image of the object lying in an image plane of the projection objective has a multiplicity of transparent optical elements and holding devices for holding the optical elements at prescribable positions along... Agent: Carl Zeiss Smt Gmbh

20110279793 - Method for manufacturing optical disc master and method for manufacturing optical disc: An apparatus for manufacturing an optical disc master, having (a) a turntable upon which is received a disc having a resist layer composed of a resist material, the resist material comprising an incomplete oxide of a transition metal on a substrate, the oxygen content of the incomplete oxide being smaller... Agent: Sony Corporation

20110279794 - Exposure apparatus and device manufacturing method: An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage, a supply mechanism, a recovery mechanism and an auxiliary recovery mechanism. The substrate stage mounts the substrate and moves within a... Agent: Nikon Corporation

20110279795 - Lithographic apparatus and device manufacturing method: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface... Agent: Asml Netherlands B.v.

20110279796 - Lithographic apparatus and device manufacturing method: In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a... Agent: Asml Netherlands B.v.

20110279797 - Apparatus and method for calibrating lithography process: A calibration wafer may bear one or more different mark types to facilitate inspection of a lithography process. A first mark type may be located on the outer peripheral portion of the wafer to indicate the desired boundary of an edge bead removal (EBR) region. A second mark type may... Agent: Semiconductor Manufacturing International (shanghai) Corporation

20110279799 - Euv lithography device and method for processing an optical element: An EUV lithography device including an illumination device for illuminating a mask at an illumination position in the EUV lithography device and a projection device for imaging a structure provided on the mask onto a light-sensitive substrate. The EUV lithography device has a processing device (15) for processing an optical... Agent: Carl Zeiss Smt Gmbh

20110279800 - Lithographic apparatus and device manufacturing method: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.... Agent: Asml Netherlands B.v.

20110279798 - Method of exposing a semiconductor wafer and exposure apparatus: An exposure method includes the following processes. An autofocus scan process is performed to detect a defocused portion of a first resist film over a semiconductor wafer and to generate a detection signal that indicates the defocused portion detected. A first exposure scan process is performed while selectively blinding the... Agent: Elpida Memory, Inc.

20110279801 - Apparatus and a method for illuminating a light-sensitive medium: A system for illumination of a light sensitive medium includes means for patterning each of a plurality of beams using an illumination unit having at least one illumination head, the illumination head including at least two arrays of individually controllable light valves, means for projecting the patterned beams onto the... Agent: Huntsman Advanced Materials (switzerland) Gmbh

20110279802 - Device for an optical arrangement and method for positioning an optical element of an optical arrangement: A device for an optical arrangement includes an optical element and a holding structure. The optical element makes contact with the holding structure at six discrete contact points. Coupling elements are provided, by which it is possible to apply a force at the contact points. A component of the force... Agent: Carl Zeiss Smt Gmbh

20110279804 - Lithographic apparatus and device manufacturing method: In a single or multiple stage lithography apparatus, a table provides a confining surface to a liquid supply system during, for example, substrate table exchange and/or substrate loading and unloading. In an embodiment, the table has a sensor to make a measurement of the projection beam during, for example, substrate... Agent: Asml Netherlands B.v.

20110279803 - Method for correcting a lithography projection objective, and such a projection objective: A method for correcting at least one image defect of a projection objective of a lithography projection exposure machine, the projection objective comprising an optical arrangement composed of a plurality of lenses and at least one mirror, the at least one mirror having an optically operative surface that can be... Agent: Carl Zeiss Smt Gmbh

20110279806 - Lithographic apparatus and device manufacturing method: In a single or multiple stage lithography apparatus, a table provides a confining surface to a liquid supply system during, for example, substrate table exchange and/or substrate loading and unloading. In an embodiment, the table has a sensor to make a measurement of the projection beam during, for example, substrate... Agent: Asml Netherlands B.v.

20110279807 - Movable body drive method and system, pattern formation method and apparatus, exposure method and apparatus for driving movable body based on measurement value of encoder and information on flatness of scale, and device manufacturing method: A drive unit drives a wafer stage in a Y-axis direction based on a measurement value of an encoder that measures position information of the wafer stage in the Y-axis direction and based on information on the flatness of a scale that is measured by the encoder. In this case,... Agent: Nikon Corporation

20110279805 - Optical system, inspection system and manufacturing method: Systems and methods for inspection are provided utilizing a wide angle optical system. The optical system includes a wide angle input lens group and an output lens group. The wide angle input lens group is configured to receive wide-angle radiation, e.g., having an angular spread of 60 degrees or more,... Agent: Asml Holding N.v.

20110273676 - Immersion photolithography system and method using microchannel nozzles: A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles... Agent: Asml Holding N.v.

20110273680 - Immersion photolithography system and method using microchannel nozzles: A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles... Agent: Asml Holding N.v.

20110273675 - Lithographic apparatus and device manufacturing method: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous... Agent: Asml Netherlands B.v.

20110273677 - Lithographic apparatus and device manufacturing method: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help... Agent: Asml Netherlands B.v.

20110273678 - Lithographic apparatus and device manufacturing method: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure... Agent: Asml Netherlands B.v.

20110273679 - Lithographic apparatus and device manufacturing method: A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at... Agent: Asml Netherlands B.v.

20110273683 - Lithographic apparatus and device manufacturing method: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface... Agent: Asml Netherlands B.v.

20110273682 - Lithographic apparatus and thermal optical manipulator control method: A control method is provided for controlling a heating of a thermal optical element, the thermal optical element having a matrix of heater elements. The method includes stabilizing a nominal temperature of the thermal optical element with a feedback loop to control the heating of heater elements; providing a desired... Agent: Asml Netherlands B.v.

20110273681 - Vacuum system for immersion photolithography: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The... Agent: Asml Netherlands B.v.

20110273686 - Exposure apparatus, exposure method, and method of manufacturing device: A scanning exposure apparatus measures levels of a substrate at a predetermined position on the substrate at a first measurement point during the acceleration period and a second measurement point during the constant velocity period, obtains a correction value for a measurement error due to factors associated with acceleration based... Agent: Canon Kabushiki Kaisha

20110273687 - Lithographic apparatus and device manufacturing method: In a solid immersion lithography apparatus, the final element of the projection system is maintained at a distance of less than about 50 nm from the substrate by an actuator system. The final element may be formed as two parts, with a fluid, e.g. a liquid, confined between them. The... Agent: Asml Netherlands B.v.

20110273688 - Method and device for imaging a radiation-sensitive substrate: A method and apparatus for imaging a radiation-sensitive substrate, wherein a programmable template is projected onto the radiation-sensitive substrate using coherent radiation having a wavelength at which the substrate is radiation sensitive. An overall image of the programmable template having an image grid is displaced simultaneously by an acoustic-optical or... Agent:

20110273684 - Nano-imprint method and apparatus: There is provided a nanoimprint method for pressing a template having a pattern of a rugged or uneven shape, to a substrate coated with a curable resin the method including a measuring step for measuring positions of preselected sample measurement points of a predetermined number, which are set for object... Agent: Nikon Corporation

20110273685 - Production of an alignment mark: A method of production of alignment marks uses a self-aligned double patterning process. An alignment mark pattern is provided with first and second sub-segmented elements. After selecting the dipolar illumination orientation, dipole-X is used to illuminate the pattern and to image the first elements on the wafer, but not the... Agent: Asml Netherlands B.v.

20110273692 - Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses: A beam transforming element for forming a predetermined light intensity distribution on a predetermined surface on the basis of an incident beam includes a first basic element made of an optical material with optical activity, for forming a first region distribution of the predetermined light intensity distribution on the basis... Agent: Nikon Corporation

20110273693 - Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses: A beam transforming element for forming a predetermined light intensity distribution on a predetermined surface on the basis of an incident beam includes a first basic element made of an optical material with optical activity, for forming a first region distribution of the predetermined light intensity distribution on the basis... Agent: Nikon Corporation

20110273694 - Individual mirror for constructing a faceted mirror, in particular for use in a projection exposure system for microlithography: An individual mirror is used to construct a facet mirror. A mirror body of the individual mirror is configured to be tiltable relative to a rigid carrier body about at least one tilting axis of a tilting joint. The tilting joint is configured as a solid-body joint. The solid-body joint,... Agent: Carl Zeiss Smt Gmbh

20110273695 - Lithographic apparatus and device manufacturing method: A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the... Agent: Asml Netherlands B.v.

20110273690 - Maskless exposure apparatus and method of alignment for overlay in maskless exposure: Example embodiments are directed to a maskless exposure device and an alignment method. The alignment method performs an overlay of each layer of a plurality of layers on a substrate using a virtual mask in a maskless exposure technique. The maskless exposure device and the alignment method use a virtual... Agent: Samsung Electronics Co., Ltd.

20110273689 - Method for increasing throughput and reducing blurriness due to movement: The invention relates to a method for illuminating printing plates (5) in which the light from a light source (2) is imaged on a two-dimensional light modulator (4) having a plurality of rows of light-modulated cells (8), and said light is modulated thereby, whereupon the light modulator (4) is imaged... Agent:

20110273696 - Method for manufacturing optical disc master and method for manufacturing optical disc: An apparatus for manufacturing an optical disc master with (a) a turntable upon which is received a disc having a resist layer composed of a resist material including an incomplete oxide of a transition metal on a substrate, the oxygen content of the incomplete oxide being smaller than the oxygen... Agent: Sony Corporation

20110273691 - Radiation source, method of controlling a radiation source, lithographic apparatus, and method for manufacturing a device: An EUV radiation source in the form of a plasma is focused at a virtual source point so as to pass through an exit aperture of a source collector module in an EUV lithographic apparatus. Plasma position is controlled in three directions, X, Y and Z using monitoring signals. By... Agent: Asml Netherlands B.v.

20110273698 - Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses: A beam transforming element for forming a predetermined light intensity distribution on a predetermined surface on the basis of an incident beam includes a first basic element made of an optical material with optical activity, for forming a first region distribution of the predetermined light intensity distribution on the basis... Agent: Nikon Corporation

20110273697 - Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method: There is disclosed a polarization-modulating element for modulating a polarization state of incident light into a predetermined polarization state, the polarization-modulating element being made of an optical material with optical activity and having a circumferentially varying thickness profile.... Agent: Nikon Corporation

20110267591 - Apparatus for method for immersion lithography: An apparatus for immersion lithography that includes an imaging lens which has a front surface, a fluid-containing wafer stage for supporting a wafer that has a top surface to be exposed positioned spaced-apart and juxtaposed to the front surface of the imaging lens, and a fluid that has a refractive... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20110267590 - Dual containment system for transporting a fluid through a \"rolling loop\" cable duct: Disclosed are systems and methods for a fluid transportation system having a first flexible tube with an inner wall. The fluid transportation system also has a second flexible tube with an outer wall. The second tube is located inside the first tube and a standoff is located between the inner... Agent: Asml Holding N.v.

20110267592 - Lithographic apparatus and substrate edge seal: A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate, helping to keep immersion liquid that is present at the top and edge... Agent: Asml Netherlands B.v.

20110267593 - Method and apparatus for maintaining depth of focus: A method includes directing a beam of radiation along an optical axis toward a workpiece support, measuring a spectrum of the beam at a first time to obtain a first profile, measuring the spectrum of the beam at a second time to obtain a second profile, determining a spectral difference... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20110267596 - Gravitation compensation for optical elements in projection exposure apparatuses: A gravitation compensator for mounting optical elements in a projection exposure apparatus and a corresponding projection exposure apparatus are disclosed. The gravitation compensator at least partly compensates for the weight force of a mounted optical element and simultaneously enables a change in the position of the optical element without the... Agent: Carl Zeiss Smt Gmbh

20110267595 - Lithographic apparatus and method of manufacturing article: A lithographic apparatus includes: a light-shielding plate which includes, on an edge thereof, an arc overlapping with a circular boundary line that defines a region onto which the pattern is transferred and is located inside an outer periphery of a substrate, and blocks the light to prevent the light from... Agent: Canon Kabushiki Kaisha

20110267594 - Maskless exposure apparatus and stitching exposure method using the same: Disclosed herein are a maskless exposure apparatus configured to perform exposure by tilting a beam spot array with respect to a scan direction (Y-axis direction) thus preventing stitching stripes and a stitching method using the same. A step distance, in which exposure dose uniformity in a stitching area is within... Agent: Samsung Electronics Co., Ltd.

20110267597 - Method of performing model-based scanner tuning: A model-based tuning method for tuning a first lithography system utilizing a reference lithography system, each of which has tunable parameters for controlling imaging performance. The method includes the steps of defining a test pattern and an imaging model; imaging the test pattern utilizing the reference lithography system and measuring... Agent: Asml Netherlands B.v.