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Photocopying October categorized by USPTO classification 10/11

20110261334 - Apparatus for method for immersion lithography: An apparatus for immersion lithography that includes an imaging lens which has a front surface, a fluid-containing wafer stage for supporting a wafer that has a top surface to be exposed positioned spaced-apart and juxtaposed to the front surface of the imaging lens, and a fluid that has a refractive... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20110261331 - Exposure apparatus and device manufacturing method: A lithographic apparatus includes a substrate table which holds a substrate, a projection optical system which projects a patterned beam of radiation onto the substrate, a liquid supply member which supplies a liquid to a space between the projection optical system and the substrate, and a liquid detector which detects... Agent: Nikon Corporation

20110261333 - Exposure apparatus, device manufacturing method using same, and gas supply device: The exposure apparatus includes a purge member that includes a humidifier that humidifies supplied gas; a first regulator that regulates a flow rate of first gas which passes through the humidifier; a second regulator that regulates a flow rate of second gas which does not pass through the humidifier; a... Agent: Canon Kabushiki Kaisha

20110261332 - Fluid handling structure, lithographic apparatus and device manufacturing method: A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that,... Agent: Asml Netherlands B.v.

20110261329 - Method and system for determining a suppression factor of a suppression system and a lithographic apparatus: The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a... Agent: Asml Netherlands B.v.

20110261330 - Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure apparatus and exposure method, device manufacturing method: A lithographic projection apparatus includes a substrate table configured to hold a substrate, a projection system arranged to project a patterned beam of radiation onto the substrate, a liquid supply system configured to supply liquid to a space between the projection system and the substrate, and a residual liquid detector... Agent: Zao Nikon Co., Ltd.

20110261335 - Systems and methods for thermally-induced aberration correction in immersion lithography: Immersion lithography aberration control systems and methods that compensate for a heating effect of exposure energy in an immersion fluid across an exposure zone are provided. An aberration control system includes actuators that adjust optical elements within the immersion lithography system and a fluid heating compensation module coupled to the... Agent: Asml Holding N.v.

20110261338 - Microlithography projection system with an accessible diaphragm or aperture stop: The invention relates to a microlithography projection lens for wavelengths <=248 nm <=, preferably <=193 mm, in particular EUV lithography for wavelengths ranging from 1-30 nm for imaging an object field in an object plane onto an image field in an image plane, the microlithography projection lens developed in such... Agent: Carl Zeiss Smt Gmbh

20110261337 - Photosensing device for digital stereo spliced picture projection imaging and operation method thereof: A photosensing device for digital stereo spliced picture projection imaging comprises a base (16), a front (43) and a back (25) wall plates located on the base (16), an light sensing platform (24) located slidably on the base (16), an exposure head (1) located above the front (43) and the... Agent:

20110261336 - System for patterning flexible foils: According to one aspect, the invention provides a table for compensating deformation in flexible foils (1) The table comprises a supportive base (2) and a deformation compensation system (3). This system comprises a plurality of movable elements (4), supported by the base (2), wherein the movable elements form a surface... Agent: Nederlandse Organisatie Voor Toegepastnatuurwetenschappelijk Onderzoek Tno

20110261339 - Scatterometer and lithographic apparatus: A scatterometer for measuring a property of a substrate includes a focus sensing arrangement including an arrangement (65) that directs a first beam of radiation onto a focusing arrangement, to be detected by a focus sensor arrangement (61). A focus controller (67) provides control signals representative of the relative positions... Agent: Asml Netherlands B.v.

20110261340 - Modulation device and charged particle multi-beamlet lithography system using the same: The invention relates to a charged-particle multi-beamlet lithography system for transferring a pattern onto the surface of a target using a plurality of charged particle beamlets. The system includes a beam generator, a beamlet blanker array, a shielding structure and a projection system. The beam generator is arranged for generating... Agent: Mapper LithographyIPB.v.

20110261341 - Optical module with an adjustable optical element: An optical module, in particular for microlithography, includes an optical element and a support unit. The optical element has at least one optically utilised area, which defines a rotational axis of symmetry. To support the optical element the support unit has a plurality of more than three support elements. Each... Agent: Carl Zeiss Smt Gmbh

20110261342 - Optical unit, illumination optical apparatus, exposure appartus, exposure method, and device manufacturing method: An optical unit comprises a first optical path in which a spatial light modulator with a plurality of optical elements arranged two-dimensionally and controlled individually can be arranged; a second optical path including a mechanism for insertion of an angle distribution providing element including a predetermined fixed pattern on a... Agent: Nikon Corporation

20110261343 - Reflective optical element, optical system euv and lithography device: In order to obtain optimal reflectivity on optical elements for the EUV and the soft X-ray range, multilayers constructed of a number of layers are used. Contamination or degradation of the surface leads to imaging defects and transmission losses. In the prior art, it has been attempted to counter a... Agent: Carl Zeiss Smt Gmbh

20110261344 - Exposure method: A method for exposing a surface of a target in a system comprising a set of sensors (30) for measuring distance to the target. The method comprises clamping the target to a moveable table (134), moving the target to a plurality of positions in which one or more of the... Agent: Mapper LithographyIPB.v.

20110261345 - Exposure apparatus and device manufacturing method: A lithographic projection apparatus includes a substrate table configured to hold a substrate, a projection system arranged to project a patterned beam of radiation onto the substrate, a liquid supply system configured to supply liquid to a space between the projection system and the substrate, and a residual liquid detector... Agent: Nikon Corporation

20110255061 - Compositions comprising base-reactive component and processes for photolithography: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have base-reactive groups. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography... Agent: Rohm And Haas Electronic Materials, L.L.C.

20110255062 - Fluid handling structure, lithographic apparatus and a device manufacturing method: A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. An undersurface of the fluid handling structure has a supply opening configured to supply fluid toward the facing surface, a plurality of... Agent: Asml Netherlands B.v.

20110255064 - Photolithography method and device: A photolithography method includes projecting a light beam through a mask onto a photosensitive layer to form on the photosensitive layer an image of a mask pattern formed by the mask, and controlling a layer of active elements of the mask so that the light beam after having traversed the... Agent: Stmicroelectronics (rousset) Sas

20110255063 - Seamless stitching of patterns formed by interference lithography: This invention addresses the scalability problem of periodic “nanostructured” surface treatments such as those formed by interference lithography. A novel but simple method is described that achieves seamless stitching of nanostructure surface textures at the pattern exposure level. The described tiling approach will enable scaling up of coherent nanostructured surfaces... Agent:

20110255065 - Method and apparatus for modifying a substrate surface of a photolithographic mask: Disclosed is a method of modifying of a surface of a substrate of a photolithographic mask for extreme ultraviolet radiation comprising the step of focusing femtosecond light pulses of a laser system onto the substrate so that a plurality of color centers is generated inside the substrate, wherein the color... Agent:

20110255066 - Apparatus and method for inspecting a substrate: An apparatus measures properties, such as overlay error, of a substrate divided into a plurality of fields. The apparatus includes a radiation source configured to direct radiation onto a first target of each field of the substrate. Each first target (T4G) has at least a first grating and a second... Agent: Asml Netherlands B.v.

20110255067 - Microlithography illumination systems, components and methods: The disclosure relates to microlithography systems, such as EUV micro-lithography illumination systems, as well as related components, systems and methods.... Agent: Carl Zeiss Smt Gmbh

20110255068 - Euv mirror module: An EUV mirror module is disclosed that comprises a substrate with a curved upper surface and a curved electroformed mirror. A self-adjusting bonding material is disposed between the substrate and the electroformed mirror. The bonding material is flowable at a melting temperature and self-adjusts to conformally fill the region between... Agent: Media Lario S.r.l

20110255069 - Compositions and processes for immersion lithography: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that can be substantially non-mixable with a resin component of the resist. Further preferred photoresist compositions of the invention comprise 1) Si substitution, 2) fluorine substitution; 3) hyperbranched... Agent: Rohm And Haas Electronic Materials LLC

20110249243 - Optical element for a lithographic apparatus, lithographic apparatus comprising such optical element and method for making the optical element: A lithographic apparatus includes an optical element that includes an oriented carbon nanotube sheet. The optical element has an element thickness in the range of about 20-500 nm and has a transmission for EUV radiation having a wavelength in the range of about 1-20 nm of at least about 20%... Agent: Asml Netherlands B.v.

20110249244 - Lithographic focus and dose measurement using a 2-d target: In order to determine whether an exposure apparatus is outputting the correct dose of radiation and its projection system is focusing the radiation correctly, a test pattern is used on a mask for printing a specific marker onto a substrate. This marker is then measured by an inspection apparatus, such... Agent: Asml Netherlands B.v.

20110249246 - Lithographic apparatus and device manufacturing method: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the... Agent: Asml Netherlands B.v.

20110249245 - Method of cooling an optical element, lithographic apparatus and method for manufacturing a device: A method of thermally conditioning an optical element operating in a vacuum environment. The optical element includes a first body having at least one optical surface and at least one heat transfer surface. The first body is dynamically controlled in position and/or orientation. The method includes controlling a temperature of... Agent: Asml Netherlands B.v.

20110249248 - Apparatus for moving stereo imaging lens and method for digital stereo projection: An apparatus for moving a stereo imaging lens, includes: a baseplate (1), a LCD displayer (15) for display an image source, a light source device (4) above the LCD displayer (15), and a lens (5) positioned under the LCD displayer (15). A display surface of the LCD displayer (15) is... Agent:

20110249247 - Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method: In order to determine whether an exposure apparatus is outputting the correct dose of radiation and a projection system of the exposure apparatus is focusing the radiation correctly, a test pattern is used on a mask for printing a specific marker onto a substrate. This marker may be measured by... Agent: Asml Netherlands B.v.

20110249249 - Digital stereo imaging photosensitive device for a grating and a photosensitive material and its method: A digital stereo imaging photosensitive device for a grating and a photosensitive material, includes: a photosensitive platform (8), connected with a base via a platform moving mechanism; a compressing mechanism (7) mounted on the photosensitive platform, wherein a grating (5) is positioned on the compressing mechanism; a LCD displayer (2)... Agent:

20110249250 - Ablation-type lithographic imaging with enhanced debris removal: Sequentially subjecting an imaged ablation-type printing member having a silicone topmost layer to, first, a cleaning liquid that is not a solvent for silicone, followed by subjecting to a second cleaning liquid that is a silicone solvent, conditions the printing member for subsequent printing with high-solids inks.... Agent: Presstek, Inc.

20110242508 - Interface system: An interface system includes: a first transfer chamber having a closable first transfer opening through which a substrate is transferred between the first transfer chamber and an exposure system and capable of being evacuated to a reduced pressure; a plurality of load-lock chambers each having a second transfer opening through... Agent: Tokyo Electron, Limited

20110242509 - Position detecting method: A method detects a position of a mark based on an image signal of the mark. The method includes steps of obtaining a first position of the mark by performing a first process for the image signal, extracting plural feature values from the image signal based on the first position,... Agent: Canon Kabushiki Kaisha

20110242510 - Substrate processing system, substrate surface processing apparatus, substrate surface inspecting apparatus, substrate surface inspecting method, and storage medium storing program for implementing the method: A substrate processing system which enables a minute piece of foreign matter attached to a substrate surface to be detected and are suitable for mass production of substrates. The substrate processing system has a substrate processing apparatus that carries out predetermined processing on a substrate. The substrate processing system comprises... Agent: Tokyo Electron Limited

20110242511 - Apparatus and methods for inhibiting immersion liquid from flowing below a sustrate: A substrate stage is provided with an immersion liquid collection member that surrounds at least an alignment feature of the substrate stage used to align the substrate on the stage by engaging alignment structure of the substrate. The collection member is located at least partly below the periphery of the... Agent: Nikon Corporation

20110242512 - Lithographic apparatus and device manufacturing method: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure... Agent: Asml Netherlands B.v.

20110242513 - Substrate processing method, computer-readable storage medium and substrate processing system: A processing temperature of thermal processing is corrected based on measurement of a first dimension of a resist pattern on a substrate from a previously obtained relation between a dimension of a resist pattern and a temperature of thermal processing, a second dimension of the resist pattern after thermal processing... Agent: Tokyo Electron Limited

20110242514 - 1.5d slm for lithography: This invention relates to an improved micro lithographic writer that sweeps a modulated pattern across the surface of a workpiece. The SLM disclosed works in a diffractive mode with a continuous or quasi-continuous radiation source. It uses a long and narrow SLM and takes advantage of diffractive effects along the... Agent: Micronic Mydata Systems Ab

20110242515 - Euv collector system with enhanced euv radiation collection: A collector system for extreme ultraviolet (EUV) radiation includes a collector mirror and a radiation-collection enhancement device (RCED) arranged adjacent an aperture member of an illuminator. The collector mirror directs EUV radiation from an EUV radiation source towards the aperture member. The RCED redirects a portion of the EUV radiation... Agent: Media Lario S.r.l

20110242516 - Lithographic apparatus, a radiation system, a device manufacturing method and a radiation generating method: A lithographic apparatus includes a radiation system for providing a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap for trapping material emanating from the radiation source. The rotation contaminant trap includes a multiple number of elements extending in a radial direction... Agent: Asml Netherlands B.v.

20110242517 - Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system: The invention relates to a projection exposure system, in particular for micro-lithography. The projection exposure system according to the invention comprises a light source for producing light in the EUV region. The projection exposure system further comprises a first optical system for illuminating a mask by the light of the... Agent: Carl Zeiss Smt Gmbh

20110242519 - Device for mounting a grating and a photosensitive material for stereoprojection imaging: A device for mounting a grating and a photosensitive material for stereoprojection imaging, includes: an enlarging-printing platform; and an exposure head positioned above the enlarging-printing platform; wherein the enlarging-printing platform is a chamber structure, and has a plurality of suction holes provided on an upper surface thereof and at least... Agent:

20110242518 - Lithographic apparatus, device manufacturing method, and substrate exchanging method: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; at least three substrate tables that are... Agent: Asml Netherlands B.v.

20110242520 - Optical properties measurement method, exposure method and device manufacturing method: An image of a pattern used for measurement formed on a reticle for testing is transferred onto a wafer for testing via a projection optical system, while gradually changing a position in an optical axis direction of the projection optical system. The image of the pattern used for measurement which... Agent: Nikon Corporation