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Photocopying June invention type 06/11

20110157567 - Liquid immersion scanning exposure system using an immersion liquid confined within a lens hood: A liquid immersion scanning exposure system utilizes an immersion liquid confined within a watertight lens hood having a base portion formed from a solid optical element. During operation, a bottom portion of a lens assembly is disposed within the immersion liquid and the solid optical element is placed upon a... Agent: Chartered Semiconductor Manufacturing, Ltd.

20110157568 - Lithographic apparatus and device manufacturing method: A manifold is provided between an outlet of a fluid supply system for an immersion lithographic apparatus and a separator. The manifold is provided with a pressure sensor which passes the measured pressure in the manifold to a mass flow controller. The mass flow controller controls a leak flow into... Agent: Asml Netherlands B.v.

20110157569 - Maskless exposure apparatus and control method thereof: Example embodiments are directed to a maskless exposure apparatus that generates and/or corrects exposure data using at least one information of intensity information, central position information, focus information, and/or shape information of a plurality of beams acquired using a measurement optical system, and a control method thereof. The maskless exposure... Agent: Samsung Electronics Co., Ltd.

20110157570 - Lithographic apparatus: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the... Agent: Asml Netherlands B.v.

20110157571 - Projection exposure system for microlithography and method of monitoring a lateral imaging stability: A projection exposure system (10) for microlithography. The system includes projection optics (12) configured to image mask structures into a substrate plane (16), an input diffraction element (28) which is configured to convert irradiated measurement radiation (21) into at least two test waves (30) directed onto the projection optics (12)... Agent: Carl Zeiss Smt Gmbh

20110157572 - Projection optics for microlithography: A projection optics for microlithography, which images an object field in an object plane into an image field in an image plane, where the projection optics include at least one curved mirror and including at least one refractive subunit, as well as related systems, components, methods and products prepared by... Agent: Carl Zeiss Smt Ag

20110157573 - Spectral purity filter, lithographic apparatus including such a spectral purity filter and device manufacturing method: A spectral purity filter includes an aperture. The spectral purity filter is configured to enhance the spectral purity of a radiation beam by being configured to absorb radiation of a first wavelength and allow at least a portion of radiation of a second wavelength to transmit through the aperture. The... Agent: Asml Netherlands B.v.

20110157574 - Endoscope: Provided is an endoscope that is capable of improving the ease of insertion by reducing the size of a distal end of an inserted portion, while ensuring a preferable observation field of view by improving the light distribution of illumination light. The endoscope employed has a tube-like inserted portion having... Agent:

20110157577 - Alignment system for various materials and material flows: A method and system for alignment of a tool to a workpiece in a continuous or discontinuous material flow are disclosed. The workpiece may be a portion of a web of material. An imaging system captures first and second images of the workpiece at first and second occasions respectively. Microscopic... Agent: Maskless Lithography, Inc.

20110157576 - Fluid gauge with multiple reference gaps: A fluid gauge (222) for measuring the position of a work piece (200) includes a gauge body (236), a fluid source assembly (238), and a gauge control system (240). The gauge body (236) includes a measurement conduit (246), a first reference conduit (248A), a second reference conduit (248B), a first... Agent:

20110157575 - Mask frame assembly for thin layer deposition and organic light emitting display device: A mask frame assembly for thin film deposition is disclosed. In one embodiment, the assembly includes: a frame, and a plurality of unit mask strips attached to the frame, wherein each of the unit mask strips includes a plurality of unit masking patterns which are spaced apart from each other.... Agent: Samsung Mobile Display Co., Ltd.

20110149259 - Lithographic apparatus: A container is provided for use within a lithographic apparatus. The container is configured to house at least one component of the lithographic apparatus within an internal space which is at least partially filled with a packing material that includes a plurality of gas cells.... Agent: Asml Netherlands B.v.

20110149257 - Lithographic apparatus and a device manufacturing method: An immersion lithographic apparatus is disclosed that has a fluid handling system configured to provide immersion liquid between a final element of a projection system and a surface which comprises, in cross-section, a feature, and an adjustment fluid source configured to locally change the composition of the immersion liquid to... Agent: Asml Netherlands B.v.

20110149258 - Lithographic apparatus and a device manufacturing method: An immersion lithographic apparatus is disclosed that includes a table having a surface and a sensor, or a target for a sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion liquid, and a... Agent: Asml Netherlands B.v.

20110149255 - Lithographic apparatus and method: A lithographic apparatus is provided with a sensor. The sensor comprises a frame that defines a space that is crossed multiple times by wire. Detection electronics are connected to the wire and configured to detect a change of temperature of the wire due to infrared radiation being incident upon the... Agent: Asml Netherlands B.v.

20110149256 - Object with an improved suitability for a plasma cleaning treatment: An object suitable for a plasma cleaning treatment in a plasma cleaning device, the object including a first outer surface area; a second outer surface area, wherein the object is constructed and arranged to cooperate with a removable cover such that the cover is connectable to the object to cover... Agent: Asml Netherlands B.v.

20110149260 - Plasma as a band pass filter for photo lithography: A band pass filter includes a first electrode, a second electrode, and a plasma generated by the first and second electrode. The plasma is confined to a region of space through which electromagnetic waves having a frequency above an intrinsic plasma frequency are transmitted, and electromagnetic waves having a frequency... Agent:

20110149261 - Optical system, in particular of a microlithographic projection exposure apparatus: An optical system, in particular of a microlithographic projection exposure apparatus, includes an optical system axis and a polarization-influencing optical arrangement, wherein said arrangement has a polarization-influencing optical element which includes an optically active material having an optical crystal axis and is of a thickness profile which varies in the... Agent: Carl Zeiss Smt Gmbh

20110149262 - Spectral purity filter and lithographic apparatus: A spectral purity filter is configured to reflect extreme ultraviolet radiation. The spectral purity filter includes a substrate, and an anti-reflective coating on a top surface of the substrate. The anti-reflective coating is configured to transmit infrared radiation. The filter also includes a multi-layer stack configured to reflect extreme ultraviolet... Agent: Asml Netherlands B.v.

20110149265 - Active mount, lithographic apparatus comprising such active mount and method for tuning such active mount: A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a... Agent: Asml Netherlands B.v.

20110149264 - Electrical connection system, lithographic projection apparatus, device manufacturing method and method for manufacturing an electrical connection system: An electrical connection system is disclosed. The electrical connection system comprises a housing, an elongate conductor and a flexible planar electrical connector. The housing comprises a front plate having a conducting surface and a back plate having a conducting surface. The elongate conductor extends through the front plate. The flexible... Agent: Asml Netherlands B.v.

20110149263 - Method for controlling the position of a movable object, a control system for controlling a positioning device, and a lithographic apparatus: A control system controls a positioning device displaceable in at least one degree of freedom by a reluctance motor. A force sensing element and a controller adjust force applied by the motor responsive to a force sensing element configured to sense force applied by the motor. The controller receives a... Agent: Asml Holding N.v.

20110141443 - Imaging methods in scanning photolithography and a scanning photolithography device used in printing an image of a reticle onto a photosensitive substrate: An imaging method in scanning photolithography includes application of different quantity first and second exposure doses of electromagnetic radiation through a reticle to a photosensitive substrate while scanning across a substrate exposure field along a direction of scan. The first dose spans entirely across the width of the exposure field... Agent:

20110141445 - Illumination optical unit for euv microlithography: An illumination optical unit for EUV microlithography includes a first optical element having a plurality of first reflective facet elements and a second optical element having a plurality of second reflective facet elements. Each first reflective facet element from the plurality of the first reflective facet elements has a respective... Agent: Carl Zeiss Smt Gmbh

20110141444 - Inspection apparatus for lithography: A scatterometer configured to measure a property of a substrate, includes a radiation source configured to provide a radiation beam; and a detector configured to detect a spectrum of the radiation beam reflected from a target (30) on the surface of the substrate (W) and to produce a measurement signal... Agent: Asml Netherlands B.v.

20110141447 - Measurement system and lithographic apparatus for measuring a position dependent signal of a movable object: An encoder-type measurement system is configured to measure a position dependent signal of a movable object, the measurement system including at least one sensor mountable on the movable object a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object... Agent: Asml Netherlands B.v.

20110141446 - Projection objective: A projection objective, such as for EUV lithography, for imaging a pattern arranged in an object plane into an image plane with the aid of electromagnetic radiation from the extreme ultraviolet range is provided. The projection objective includes a plurality of mirrors provided with reflective coatings and arranged between the... Agent: Carl Zeiss Smt Gmbh

20110141449 - Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method: A substrate table positioning device that is supported by four bearing elements is provided. The substrate table positioning device also includes a balance mass. Two of the bearing elements support the base frame in such a way that they can move in a vertical direction independently of the other bearing... Agent: Asml Netherlands B.v.

20110141448 - Substrate carrier device, substrate carrying method, substrate supporting member, substrate holding device, exposure apparatus, exposure method and device manufacturing method: A substrate carry-out device carries out an exposed substrate mounted on a substrate stage from a substrate holder by moving the substrate in one axis direction (X-axis direction) parallel to a horizontal plane in a state where the substrate is mounted on a substrate tray housed in the substrate holder.... Agent: Nikon Corporation

20110141450 - Method and apparatus for overlay measurement: A method of measurement of at-resolution overlay offset may be implemented in a scatterometer. At least three targets are provided on a wafer, each target comprising a first marker grating and a second interleaved marker grating and each target having a different overlay bias between its first and second marker.... Agent: Asml Netherlands B.v.

20110141451 - Displacement measurement device, exposure apparatus, and working device: A device has a scale on which a grating pattern is formed, a light source to irradiate light on the scale, a wavelength plate to transform multiple diffracted lights from the light source into circular polarized light, respectively, an optical element to superposition and cause interference of the multiple diffracted... Agent: Canon Kabushiki Kaisha

20110134400 - Exposure apparatus, liquid immersion member, and device manufacturing method: Liquid is held between a tip lens of a projection optical system and a wafer on a wafer stage, using a nozzle member which has shape enclosing an optical path of an illumination light, and a bottom surface to which wafer W is placed facing via a predetermined clearance that... Agent: Nikon Corporation

20110134401 - Lithographic apparatus and a device manufacturing method: An immersion lithographic apparatus is disclosed that includes a fluid handling system configured to confine immersion liquid to a localized space between a final element of a projection system and a substrate and/or table and a gas supplying device configured to supply gas with a solubility in immersion liquid of... Agent: Asml Netherlands B.v.

20110134402 - Lithographic apparatus and device manufacturing method: A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.... Agent: Asml Holding N.v.

20110134399 - Lithographic projection apparatus: A lithographic apparatus arranged to transfer a pattern onto a substrate is disclosed. The lithographic apparatus comprises a power supply and an electrical connector. The electrical connector electrically connects the power supply to another component of the lithographic apparatus. The electrical connector comprises a laminate that comprises, in order, a... Agent: Asml Netherlands B.v.

20110134404 - Exposure apparatus and method of manufacturing device: An exposure apparatus includes an original stage including a first mark, a substrate stage including a second mark and a photoelectric conversion device configured to detect light having passed through the second mark, a projection optical system, a measurement device configured to measure a position of at least one stage... Agent: Canon Kabushiki Kaisha

20110134403 - Microlithographic projection exposure apparatus: A microlithographic projection exposure apparatus contains a projection objective, whose last optical element on the image side is a dry terminating element that has no refractive power and is designed for dry operation of the projection objective. According to the invention, the projection exposure apparatus furthermore contains an immersion terminating... Agent: Carl Zeiss Smt Ag

20110134406 - Maskless exposure apparatus and control method thereof: Disclosed herein is a mask-less exposure apparatus to enlarge or reduce an exposure area in a scan direction and a control method thereof. The mask-less exposure apparatus includes a light source unit configured to supply light, a spatial light modulation unit configured to selectively transmit the light to a substrate,... Agent: Samsung Electronics Co., Ltd.

20110134407 - Maskless exposure apparatus and pattern compensation method using the same: Disclosed herein is a method of compensating for distortion of an exposure pattern due to stage yawing in a maskless exposure apparatus using digital micromirror devices (DMDs). Requirements as to control performance of the stage yawing through the adjustment of sync signals (PEGs) to switch frames of the DMDs are... Agent: Samsung Electronics Co., Ltd.

20110134408 - Measurement apparatus, exposure apparatus, and device fabrication method: The present invention provides a measurement apparatus which measures an imaging performance of an optical system to be measured, the apparatus including a first reference substrate which is placed on an object plane of the optical system to be measured, and has periodic patterns arranged in accordance with a plurality... Agent: Canon Kabushiki Kaisha

20110134405 - Radiation source, lithographic apparatus and device manufacturing method: A radiation source is configured to generate radiation. The radiation source includes a first electrode and a second electrode configured to produce an electrical discharge during use to generate radiation-emitting plasma from a plasma fuel. The radiation source also includes a fuel supply configured to supply a plasma fuel to... Agent: Asml Netherlands B.v.

20110134409 - Actuator, stage device, and exposure apparatus: An actuator according to example embodiments may be relatively compact and may be driven with 2 degrees of freedom with less spatial constraints. The actuator may include a base member, a ball screw member including a ball screw coupled to the base member and a ball nut screwed onto the... Agent: Samsung Electronics Co., Ltd.

20110134410 - Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method: A lithographic apparatus comprising a support configured to support a patterning device; a substrate table configured to hold a substrate; a projection system configured to project a pattern imparted to a radiation beam by the patterning device onto a target portion of the substrate; and a first multi-layer mirror and... Agent: Asml Netherlands B.v.

20110134411 - Lithographic printing plate precursor, lithographic printing method and packaged body of lithographic printing plate precursors: (1) A packaged body of lithographic printing plate precursors, wherein an image-recording layer or a protective layer of the outermost surface layer contains an inorganic layered compound. (2) A lithographic printing plate precursor having a protective layer containing an inorganic layered compound, and an image-recording layer containing a binder polymer.... Agent:

20110128512 - Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method: A scatterometer, configured to measure a property of a substrate, includes a radiation source which produces a radiation spot on a target formed on the surface of the substrate, the size of the radiation spot being smaller than the target in one direction along the target, the position of the... Agent: Asml Netherlands B.v.

20110128513 - Cooling systems and methods for grazing incidence euv lightography collectors: Input and output secondary cooling-fluid manifolds (44, 46) are respectively fluidly connected to the plurality of cooling lines to flow a cooling fluid from the input secondary cooling-fluid manifold to the output cooling secondary fluid manifold over two semicircular paths for each cooling line. Separating the cooling fluid input and... Agent: Media Lario S.r.l

20110128517 - Lithographic apparatus and device manufacturing method: An article support is constructed to support an article. The article support includes a back fill structure constructed to supply and extract a thermal buffering fluid to and from the article support. The back fill structure is connected to an extraction duct that is constructed and arranged to extract at... Agent: Asml Netherlands B.v.

20110128515 - Lithographic apparatus and sealing device for a lithographic apparatus: An apparatus includes a first body; a second body that is moveable relative to the first body; a seal arranged between the first and the second body such that a first space is separated from a second space by the first body, the second body and the seal, wherein the... Agent: Asml Netherlands B.v.

20110128516 - Lithographic apparatus and surface cleaning method: An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied... Agent: Asml Netherlands B.v.

20110128514 - Optical element and projection exposure apparatus based on use of the optical element: A lithographic projection apparatus projects a pattern from a patterning device onto a substrate using a projection system and includes a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid. An element of the projection system through which... Agent: Nikon Corporation

20110128518 - Reflective reticle chuck, reflective illumination system including the same, method of controlling flatness of reflective reticle using the chuck, and method of manufacturing semiconductor device using the chuck: Provided are a reflective reticle chuck, a reflective illumination system including the chuck, a method of controlling the flatness of a reflective reticle using the chuck, and a method of manufacturing a semiconductor device using the chuck. The reflective reticle chuck includes a fixed portion and a mobile portion that... Agent:

20110128521 - Actuators and microlithography projection exposure systems and methods using the same: An actuator includes a housing and a rotor that can be moved in relation to the housing in the effective direction of the actuator, wherein the actuator includes an advancing unit that is connected to the rotor at least part of the time. The advancing unit includes at least one... Agent: Carl Zeiss Smt Gmbh

20110128520 - Alignment systems and methods for lithographic systems: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first... Agent: Asml Netherlands B.v.

20110128522 - Method for manufacturing a patterned member and processing apparatus using electromagnetic beam: To provide a manufacturing method for a patterned member, by which a dotted pattern can be readily formed without deforming the shape of pits. There is provided a method for manufacturing a patterned member on which a dotted pattern is formed. This manufacturing method comprises: a preparation step of preparing... Agent: Fujifilm Corporation

20110128519 - Radiation source: A radiation source may include a radiation emitter for emitting radiation, a collector for collecting radiation emitted by the radiation emitter, and an outlet configured, in use, to introduce a cooled gas into the radiation source.... Agent: Asml Netherlands B.v.

20110128523 - Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method: A drive system drives the moving body based on: measurement results of a first measuring system that measures the position of the moving body within an plane by radiating a measurement beam from an arm member to a grating disposed in one surface of a moving body that is parallel... Agent: Nikon Corporation