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Photocopying May archived by USPTO category 05/11Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 05/26/2011 > 20 patent applications in 10 patent subcategories. archived by USPTO category
20110122375 - Multicolor holgraphic replication by masking: A multicolor hologram (e.g., a two-color hologram) is replicated (copied) into a photosensitive layer by masking to produce a copy (replicate) of the hologram in a manner such that the copy is an accurate and true replication of the hologram (e.g., master hologram) and the copy is characterized to possess... Agent: E. I. Du Pont De Nemours And Company
20110122378 - Filter apparatus, filter accommodating method, exposure apparatus and method for producing device: A filter apparatus which holds a chemical filter includes a frame which holds the chemical filter and which has a guide groove provided on a side surface of the frame; and a casing which accommodates the frame. The guide groove has a first groove which is communicated with a back... Agent: Nikon Corporation
20110122379 - Filter holding apparatus, exposure apparatus, and method for producing device: A filter holding apparatus holding a first chemical filter and a second chemical filter, includes a first frame which holds the first chemical filter and which has a first guide groove provided on a side surface of the first frame; a second frame which holds the second chemical filter and... Agent: Nikon Corporation
20110122380 - Immersion photolithography system and method using inverted wafer-projection optics interface: A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation, and also includes an optical system that images the electromagnetic radiation on the substrate. A liquid is between the optical system and the substrate. The projection optical system is positioned below the substrate.... Agent: Asml Holding N.v.
20110122376 - Lithographic apparatus and device manufacturing method: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion... Agent: Asml Netherlands B.v.
20110122377 - Projection exposure apparatus, projection exposure method, and method for producing device: A projection exposure apparatus transfers a pattern formed on a mask onto a substrate through a liquid. The projection exposure apparatus includes an optical member which projects an image of the pattern onto the substrate and an electricity removal device which removes electricity from the liquid to be supplied to... Agent: Nikon Corporation
20110122381 - Imaging assembly: A imaging assembly for generating a light beam suitable for sintering comprises a lamp housing and a lamp mounted in the lamp housing comprising a filament and a lamp base, wherein the lamp is oriented with the lamp base to the side of the filament. The imaging assembly further comprises... Agent:
20110122382 - Method for modifying a polarization distribution in a microlithographic projection exposure apparatus, and microlithographic projection exposure apparatus: The disclosure relates to a method for modifying a polarization distribution in a microlithographic projection exposure apparatus, and to a microlithographic projection exposure apparatus. The projection exposure apparatus has an illumination device and a projection objective. The illumination device has an optical axis and a correction arrangement having a lambda/4... Agent: Carl Zeiss Smt Gmbh
20110122383 - Magnification control for lithographic imaging system: In a lithographic projection system, a corrective optic in the form of one or more deformable plates is mounted within telecentric image or object space for making one-dimensional or two-dimensional adjustments to magnification. The deformable plate, which can be initially bent under the influence of a preload, contributes weak magnification... Agent:
20110122384 - Imaging optics: An imaging optics has a plurality of mirrors to image an object field in an object plane into an image field in an image plane. At least one of the mirrors has a through opening for the passage of imaging light. An arrangement of the mirrors is such that principal... Agent: Carl Zeiss Smt Gmbh
20110122386 - Apparatus, system, and method for flash printing: An apparatus, system, and method to flash print an image. The apparatus includes an energy source that delivers energy. The apparatus includes an energy pulse width modulator coupled to the energy source. The energy pulse width modulator may receive energy from the energy source and modulate the energy received from... Agent:
20110122385 - Homogenizer: A two-stage homogenizer comprising a first homogenizer stage and a second homogenizer stage. The first homogenizer stage includes a pair of microlens arrays and associated focusing optics. The second homogenizer stage includes a second pair of microlens arrays and associated focusing optics. The second homogenizer stage is positioned to receive... Agent: Asml Netherlands B.v.
20110122388 - Illumination system of a microlithographic projection exposure apparatus: An illumination system of a microlithographic projection exposure apparatus includes an optical raster element configured to produce a plurality of secondary light sources located in a system pupil surface. The optical raster element has a plurality of light entrance facets, each being associated with one of the secondary light sources.... Agent: Carl Zeiss Smt Gmbh
20110122387 - System and method for light source employing laser-produced plasma: A system and method of generating radiation are disclosed. In at least some embodiments, the system is suitable for use as (or as part of) an extreme ultraviolet lithography (EUVL) light source. Also, in at least some embodiments, the system includes a laser source for generating a laser pulse, a... Agent: The Regents Of The University Of California
20110122389 - Radiation source, lithographic apparatus and device manufacturing method: A lithographic apparatus includes a source module that include a collector and a radiation source. The collector is configured to collect radiation from the radiation source. An illuminator is configured to condition the radiation, collected by the collector and to provide a radiation beam. A detector is disposed in a... Agent: Asml Netherlands B.v.
20110122390 - Exposing method, method of manufacturing semiconductor device, and exposure apparatus: According to one embodiment, on a substrate, a resist layer is laminated on an upper side of a pattern formation layer on which a desired pattern is formed. A diffraction pattern that diffracts exposure light irradiated on the substrate is formed further on the upper side than the resist layer.... Agent:
20110122392 - Microlithography illumination system and microlithography illumination optical unit: An illumination optical unit for microlithography illuminates an object field with illumination light. The unit includes a first facet mirror that has a plurality of first facets, and a second facet mirror that has a plurality of second facets. The unit has facet pairs which include respectively a facet of... Agent: Carl Zeiss Smt Gmbh
20110122391 - Optical system of a microlithographic projection exposure apparatus and microlithographic exposure method: The disclosure relates to an optical system of a microlithographic projection exposure apparatus and to a microlithographic exposure method. An optical system of a microlithographic projection exposure apparatus includes an image rotator, which is arranged in the optical system such that light impinging on the image rotator is at least... Agent: Carl Zeiss Smt Gmbh
20110122394 - Computer readable storage medium including effective light source calculation program, and exposure method: A storage medium includes a program which causes a computer to execute a method of calculating a light intensity distribution on a pupil plane of an illumination optical system. The method includes: determining an impulse response function of a projection optical system by performing Fourier transform on a pupil function... Agent: Canon Kabushiki Kaisha
20110122393 - Substrate transport apparatus and method, exposure apparatus and exposure method, and device fabricating method: A method for exposing a substrate includes holding the substrate on a substrate holding member, irradiating, via a liquid, a light beam to the substrate on the substrate holding member, and removing, after the exposure of the substrate via the liquid, a liquid remained on the substrate before supporting the... Agent: Nikon Corporation05/19/2011 > 13 patent applications in 7 patent subcategories. archived by USPTO category
20110116058 - Printer and printing method for lenticular sheet: A lenticular sheet includes an array of lenticules and a back surface located opposite to the lenticules. In a printer, a printhead prints plural interlaced images on the back surface, the interlaced images being formed by interlacing two original images having disparity. A line sensor has plural sensor elements arranged... Agent:
20110116059 - Filter box, exposure apparatus, and method for producing device: A filter box which holds a chemical filter includes a box-shaped frame which holds the chemical filter and a guide groove which is provided on a side surface of the frame. The guide groove includes a first recess which is arranged between an upper end and a lower end of... Agent: Nikon Corporation
20110116061 - Lithographic apparatus and device manufacturing method: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk... Agent: Asml Netherlands B.v.
20110116060 - Lithographic apparatus, removable member and device manufacturing method: A member is provided to prevent immersion liquid ingress to a gap between components or to adhere to at least one component to provide a surface to a feature of an immersion system. The member has a plastic sealing portion that is adhered to the component(s). The plastic sealing portion... Agent: Asml Netherlands B.v.
20110116062 - Reflective imaging optical system, exposure apparatus, and method for producing device: An imaging optical system of the far pupil type, which is applicable to an exposure apparatus, is provided with six reflecting mirrors and forms an image of a first plane on a second plane. An incident pupil of the imaging optical system is positioned on a side opposite to the... Agent:
20110116063 - Exposure unit containment mechanism and image-forming apparatus: An exposure unit containment mechanism includes an exposure unit and a frame that defines a space into which the exposure unit is inserted, the exposure unit including: first protrusions protruding in left and right directions at a position spaced apart from a center of gravity of the exposure unit in... Agent: Fuji Xerox Co., Ltd.
20110116064 - Maskless exposure apparatus and method: Example embodiments are directed to a maskless exposure apparatus using off-axis alignment to form a virtual mask pattern on a substrate. The maskless exposure apparatus includes a movement unit on which the substrate is placed, a light source unit configured to output light, a projection unit configured to divide the... Agent: Samsung Electronics Co., Ltd.
20110116068 - Euv reticle substrates with high thermal conductivity: A reflective reticle substantially reduces or eliminates pattern distortion that results from the absorption of EUV radiation while maintaining a reticle thickness consistent with industry standards. The reflective reticle includes a layer of ultra-low expansion (ULE) glass and a substrate of Cordierite having a thermal conductivity substantially larger than that... Agent: Euv Reticle Substrates With High Thermal Conductiv
20110116067 - Illumination optimization: A method of optimizing an illumination pupil shape for a lithographic process 1 comprises identifying a target pattern (206) to be imaged by said lithographic process. It further comprises identifying at least one optimization point (262) in said target pattern and identifying at least one design for manufacturing metric (270)... Agent: Brion Technologies, Inc.
20110116066 - Lithographic apparatus and device manufacturing method: A position measurements system to measure a position of a movable object with respect to another object includes two or more one dimensional (1D) encoder heads mounted on one of the movable object and the other object and each capable of emitting a measurement beam along a measurement direction, one... Agent: Asml Netherlands B.v.
20110116065 - Lithographic method and apparatus: A lithographic method includes controlling a phase adjuster of a lithographic apparatus, the phase adjuster being constructed and arranged to adjust a phase of an electric field of a radiation beam traversing an optical element of the phase adjuster, and controlling a signal provided to the phase adjuster that results... Agent: Asml Netherlands B.v.
20110116069 - Computer generated hologram, exposure apparatus and device fabrication method: The present invention provides a computer generated hologram including a plurality of anisotropic cells having different refractive indices with respect to linearly polarized light in a first direction and linearly polarized light in a second direction perpendicular to the linearly polarized light in the first direction, wherein the plurality of... Agent: Canon Kabushiki Kaisha
20110116070 - Exposure apparatus and method of manufacturing device: An exposure apparatus comprises: a substrate stage movable from a first position to a second position; a conveyance arm movable from a third position to the second position; an elevating member transferring the substrate to the arm at the second position; and a controller. The controller judges whether the stage... Agent: Canon Kabushiki Kaisha05/12/2011 > 10 patent applications in 6 patent subcategories. archived by USPTO category
20110109887 - Lithographic apparatus and device manufacturing method: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or... Agent: Asml Netherlands B.v.
20110109888 - Method and apparatus for measuring line end shortening, substrate and patterning device: End of line effect can occur during manufacture of components using a lithographic apparatus. These end of line effects can result in line end shortening of the features being manufactured. Such line end shortening may have an adverse impact on the component being manufactured. It is therefore desirable to predict... Agent: Asml Netherlands B.v.
20110109889 - Method for positioning a target portion of a substrate with respect to a focal plane of a projection system: A method is provided for positioning at least one target portion of a substrate with respect to a focal plane of a projection system. The method comprises performing height measurements of at least part of the substrate to generate height data, using predetermined correction heights to compute corrected height data... Agent: Asml Netherlands B.v.
20110109891 - Apparatus for supporting and optical element, and method of making same: An apparatus for supporting an optical element is provided. The apparatus includes a lens cell (1003) and a plurality of fingers (1000) coupled to the lens cell. Each finger includes a base (1012) configured to be coupled to the optical element when mounted therein, first (1006a) and second (1006b) flexures... Agent: Asml Holding N.v.
20110109890 - Light source apparatus, exposure apparatus, and electronic device manufacturing method: There is provided a light source apparatus for emitting light having a uniform intensity distribution. Such a light source apparatus for generating a light beam to be projected toward a fly-eye optical system included in an exposure apparatus includes a light source, and a mirror that reflects the light beam... Agent:
20110109892 - Source module of an euv lithographic apparatus, lithographic apparatus, and method for manufacturing a device: A source module for use in a lithographic apparatus is constructed to generate extreme ultra violet (EUV) and secondary radiation, and includes a buffer gas configured to cooperate with a source of the EUV radiation. The buffer gas has at least 50% transmission for the EUV radiation and at least... Agent: Asml Netherlands B.v.
20110109893 - Microlithographic projection exposure apparatus: A projection exposure apparatus has a projection lens with an object plane, an image plane, an optical axis and a non-telecentric entrance pupil. The apparatus further comprises an illumination system having an intermediate field plane and a field stop. The field stop is positioned in or in close proximity to... Agent: Carl Zeiss Smt Ag
20110109894 - Polarization-modulating optical element and method for manufacturing thereof: The disclosure relates to a method of manufacturing a polarization-modulating optical element, wherein the element causes, for light passing through the element and due to stress-induced birefringence, a distribution of retardation between orthogonal states of polarization, the method comprising joining a first component and a second component, wherein a non-plane... Agent: Carl Zeiss Smt Gmbh
20110109895 - Magnetic supporting mechanism, exposure apparatus and device manufacturing method: A magnetic supporting mechanism which comprises first to fourth magnets having first to fourth magnetic poles, in which the third magnet is partially inserted into a gap between the first and second magnets so that the first and third magnetic poles face each other and the second and fourth magnetic... Agent: Canon Kabushiki Kaisha
20110109896 - Support structure, inspection apparatus, lithographic apparatus and methods for loading and unloading substrates: A substrate support, configured to support a substrate during a process within a lithography system, includes a lifting structure configured to move the substrate between a first position, in which a lifting face of the lifting structure supports the substrate at a position set apart from a support surface of... Agent: Asml Netherlands B.v.05/05/2011 > 10 patent applications in 4 patent subcategories. archived by USPTO category
20110102753 - Apparatus and method of measuring a property of a substrate: The present invention makes the use of measurement of a diffraction spectrum in or near an image plane in order to determine a property of an exposed substrate. In particular, the positive and negative first diffraction orders are separated or diverged, detected and their intensity measured to determine overlay (or... Agent: Asml Netherlands B.v.
20110102754 - Exposure apparatus and device manufacturing method: An exposure apparatus includes an atmosphere maintaining unit which maintains an exposure chamber in an air atmosphere, a gas supply unit which supplies air or a mixed gas containing air and an inert gas to a local space, between a final surface of a projection optical system and a substrate,... Agent: Canon Kabushiki Kaisha
20110102755 - Method of manufacturing semiconductor devices and exposure apparatus: According to embodiments, a substrate coated with a resist film is carried into a first pressure adjustment mechanism. Then, a peripheral atmosphere of the substrate is decompressed from an atmospheric pressure by the first pressure adjustment mechanism to measure a physical quantity correlated with an outgassing amount from the substrate.... Agent:
20110102756 - Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus, and device manufacturing method: Positional information of a movable body in a Y-axis direction is measured using an interferometer and an encoder whose short-term stability of measurement values excels when compared with the interferometer, and based on the measurement results, a predetermined calibration operation for obtaining correction information for correcting measurement values of the... Agent: Nikon Corporation
20110102758 - Illumination system for a microlithography projection exposure apparatus, microlithography projection exposure apparatus comprising such an illumination system, and fourier optical system: An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with the light from a primary light source has a variably adjustable pupil shaping unit for receiving light from the primary light source and for generating a variably adjustable two-dimensional intensity distribution in a pupil shaping... Agent: Carl Zeiss Smt Gmbh
20110102759 - Laser system: A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a... Agent: Cymer, Inc.
20110102757 - Lithographic method and apparatus: A method is disclosed. A change in position of a substrate in a direction substantially parallel to a direction of propagation of a radiation beam that is, or is to be, projected on to that substrate is determined, which change in position would result in a lithographic error in the... Agent: Asml Netherlands B. V.
20110102760 - Alignment method for semiconductor processing: A method provides improved alignment for a photolithographic exposure. In such method, a first exposure tool and a first chuck used in a reference photolithographic exposure of a first material layer on a substrate can be identified. The substrate typically includes at least a semiconductor layer. The first chuck typically... Agent: International Business Machines Corporation
20110102762 - Exposure apparatus and device manufacturing method: An exposure apparatus is equipped with a wafer stage which holds a wafer and to which one ends of flat tubes having flexibility that transmit the power usage for exposure between the wafer stage and a predetermined external device are connected and which is movable along an XY plane, and... Agent: Nikon Corporation
20110102761 - Stage apparatus, exposure apparatus, and device fabricating method: A stage apparatus comprises: a measuring apparatus that radiates a measurement beam to a measurement surface, which is formed on a surface on an side opposite a holding surface whereon an object of an holding member is held, and measures the position of the holding member in a direction corresponding... Agent: Nikon CorporationPrevious industry: Optics: image projectors
Next industry: Optics: measuring and testing
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