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Photocopying April category listing, related patent applications 04/11

20110096304 - Developing apparatus, developing method and storage medium: A pretreatment process, carried out prior to a developing process, spouts pure water, namely, a diffusion-assisting liquid for assisting the spread of a developer over the surface of a wafer, through a cleaning liquid spouting nozzle onto a central part of the wafer to form a puddle of pure water.... Agent: Tokyo Electron Limited

20110096308 - Apparatus comprising a rotating contaminant trap: A contaminant trap apparatus arranged in a path of a radiation beam to trap contaminants emanating from a radiation source configured to produce the radiation beam is disclosed. The contaminant trap apparatus includes a rotor having a plurality of channel forming elements defining channels which are arranged substantially parallel to... Agent: Asml Netherlands B.v.

20110096307 - Lithographic apparatus and device manufacturing method: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the... Agent: Asml Netherlands B.v.

20110096305 - Shutter member, a lithographic apparatus and device manufacturing method: An immersion lithographic apparatus that includes a substrate table, a fluid handling structure and a swap table. The substrate table is configured to support a substrate. The fluid handling structure is configured to supply and confine immersion liquid to a space defined between a projection system and the substrate table,... Agent: Asml Netherlands B.v.

20110096306 - Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method: A stage apparatus includes a guide member that extends in first directions, that moves in second directions, which are substantially orthogonal to the first directions; two second moving bodies, which are provided along the guide member such that they are independently moveable in the first directions, that move in the... Agent: Nikon Corporation

20110096310 - Method and apparatus for measurement and control of photomask to substrate alignment: A method, structure, system of aligning a substrate to a photomask. The method includes: directing incident light through a pattern of clear regions transparent to the incident light in an opaque-to-the-incident-light region of a photomask, through a lens and onto a photodiode formed in a substrate, the photodiodes electrically connected... Agent: International Business Machines Corporation

20110096309 - Method and system for wafer inspection: A method and system for evaluating a lithographic pattern obtained using multiple-patterning lithographic processing are presented. In one aspect, the method includes aligning a target design with a lithographic pattern. The target design may comprise a first design and a second design. The method further comprises identifying in the lithographic... Agent: Hitachi High-technologies Corporation

20110096311 - Lithographic apparatus and patterning device: A lithographic apparatus includes a support to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned... Agent: Asml Netherlands B.v.

20110096312 - Exposure apparatus and device fabricating method: An exposure apparatus includes: a first moving body, which comprises a guide member that extends in a first direction, that moves in a second direction, which is substantially orthogonal to the first direction; two second moving bodies, which are provided such that they are capable of moving in the first... Agent: Nikon Corporation

20110096315 - Calibration method and lithographic apparatus using such a calibration method: A calibration method for calibrating a stage position includes projecting a pattern of a patterning device onto a substrate; measuring a resulting position of the projected pattern; and deriving a calibration of the stage position from the measured position, wherein, during the measuring, the substrate is rotated from a rotational... Agent: Asml Netherlands B.v.

20110096313 - Constrained optimization of lithographic source intensities under contingent requirements: A method for illuminating a mask to project a desired image pattern into a photoactive material is described. The method includes receiving an image pattern. Determining a relationship between source pixels in a set of source pixels to desired intensities at one or more points in the image pattern is... Agent: International Business Machines Corporation

20110096316 - Illumination system for microlithography: An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with the light from an assigned light source includes a pupil shaping unit for receiving light from the assigned light source and for generating a predeterminable basic light distribution in a pupil plane of the illumination... Agent: Carl Zeiss Smt Ag

20110096314 - Optical device, exposure apparatus using same, and device manufacturing method: The optical device of the present invention includes an optical element; a first holding member that holds the optical element; and a second holding member that holds the first holding member via a plurality of connections, and has a linear expansion coefficient different from that of each one of the... Agent: Canon Kabushiki Kaisha

20110096317 - Component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus: A component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus is disclosed. The component includes a plurality of diaphragms which are arranged alongside one another with respect to a direction perpendicular to the scan movement and which differ in their form and... Agent: Carl Zeiss Smt Gmbh

20110096318 - Exposure apparatus and device fabricating method: A first stage unit and a second stage unit are disposed adjacently in a second direction. A first holding member, which is supported by a first stage unit, and a second holding member, which is supported by the second stage unit, move in a direction parallel to the second direction... Agent: Nikon Corporation

20110090472 - Fluid handling structure, lithographic apparatus and device manufacturing method: A fluid handling structure is provided for a lithographic apparatus having at a boundary between a space containing immersion fluid and a region external to the fluid handling structure, a plurality of openings arranged in a first line, a first gas knife device having an aperture in a second line,... Agent: Asml Netherlands B.v.

20110090473 - Lithographic apparatus: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the... Agent: Asml Netherlands B.v.

20110090474 - Lithographic apparatus and device manufacturing method: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.... Agent: Asml Netherlands B.v.

20110090476 - Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate: A lithographic apparatus includes at least one image alignment sensor for receiving radiation projected from an alignment mark on a reticle. Processor processes signals from the sensor(s) to resolve spatial information in the projected alignment mark to establish a reference for measuring positional relationships between a substrate support and the... Agent: Asml Netherlands B.v.

20110090475 - Scanning exposure apparatus, control apparatus and method of manufacturing device: A scanning exposure apparatus includes a first feedback loop including a first controlled object including an original stage and controlling a position of the original stage, a second feedback loop including a second controlled object including a substrate stage and controlling a position of the substrate stage, and a feedback... Agent: Canon Kabushiki Kaisha

20110090477 - Exposure device and exposure method: An exposure device includes a rotation driving section that rotationally drives an exposure object; a light irradiation section that irradiates an exposure surface of the exposure object with laser light; a slide moving section secured to the rotation driving section or the light irradiation section, and moving the rotation driving... Agent: Sony Corporation

20110090478 - Lens barrel support device and maskless exposure apparatus having the same: Provided is a barrel support device for supporting a lens barrel. The barrel support device may include a guide frame configured to laterally support the lens barrel and tilt with the lens barrel, a rotation guide on a first end of the guide frame, the rotation guide being ring shaped... Agent: Samsung Electronics Co., Ltd.

20110090479 - Optical component for maskless exposure apparatus: The present invention relates to an optical component for a maskless exposure apparatus, and more particularly, to a micro-prism array or a micro-mirror array which is an optical component capable of screening diffused light such that the image of a pixel of a digital micro-mirror display (DMD) formed by a... Agent:

20110090480 - Dynamic masking method for micro-truss foam fabrication: A system for fabricating a radiation-cured structure is provided. The system includes a radiation-sensitive material configured to at least one of initiate, polymerize, crosslink and dissociate with exposure to radiation. At least one radiation source is configured to project a radiation beam toward the radiation-sensitive material. A smart glass device... Agent: Gm Global Technology Operations, Inc.

20110085149 - Pulsed high-power laser apparatus and methods: In various embodiments, output beams of multiple seed lasers differing in at least one beam characteristic are combined, amplified, and separated according to the beam characteristic(s) for use in, e.g., plateless lithographic printing.... Agent:

20110085150 - Exposure apparatus, exposure method, and device manufacturing method: A wafer is loaded on a wafer stage and unloaded from a wafer stage, using a chuck member which holds the wafer from above in a non-contact manner. Accordingly, members and the like to load/unload the wafer on/from the wafer stage do not have to be provided, which can keep... Agent: Nikon Corporation

20110085151 - Illumination optical system for microlithography and illumination system and projection exposure system with an illumination optical system of this type: An illumination optical system for microlithography is used to guide an illumination light bundle from a radiation source to an object field in an object plane. A field facet mirror has a plurality of field facets to predetermine defined illumination conditions in the object field. A following optical system is... Agent: Carl Zeiss Smt Gmbh

20110085152 - Vibration control apparatus, vibration control method, exposure apparatus, and device manufacturing method: A vibration control apparatus suppresses a vibration of a structure which is vibrated. The vibration control apparatus includes: a vibration isolation apparatus that supports the structure and suppresses a transmission of a vibration to the structure, the vibration having an amplitude equal to or less than a first amplitude in... Agent:

20110080566 - Method for replicating production of 3d parallax barrier: A method for replicating production of a 3D parallax barrier is capable of transfer-printing a 3D parallax barrier pattern on a planar transparent substrate mainly with a glass photo mask having the 3D parallax barrier pattern through processes of photo resistor coating, exposure, and development by using a photolithography technology,... Agent: Unique Instruments Co.ltd

20110080568 - Immersion exposure apparatus and immersion exposure method, and device manufacturing method: An immersion type exposure apparatus comprises: an optical member from which an exposure beam is emitted; a first movable member that is movable while holding a substrate, in a predetermined region including a first region including a position facing the optical member and a second region different from the first... Agent: Nikon Corporation

20110080567 - Lithographic apparatus and a method of operating the apparatus: A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.... Agent: Asml Netherlands B.v.

20110080569 - Optical element and method: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.... Agent: Carl Zeiss Smt Gmbh

20110080570 - Exposure apparatus and exposure method: An exposure apparatus and an exposure method by which alignment of regions of a substrate that are to be exposed by optical systems can be performed with accuracy even if the substrate is deformed nonuniformly within a plane. A step-and-scan exposure apparatus (1) for performing exposure on a substrate (5)... Agent:

20110080571 - Recording medium imaging apparatus: A recording medium imaging apparatus includes an irradiation unit configured to irradiate a recording medium with light, an imaging unit configured to capture reflected light which is irradiated by the irradiation unit and reflected by the recording medium as a surface image, and a reference plate which includes a background... Agent: Canon Kabushiki Kaisha

20110080572 - Anti-reflective coating for optical elements: An optical element including an anti-reflective coating is provided. The optical element includes a silicon substrate and a reflective layer disposed onto a first portion of the surface of the silicon substrate. An anti-reflective layer is disposed onto a second portion of the surface of the silicon substrate such that... Agent: Asml Holding N.v.

20110080573 - Multilayer mirror and lithographic apparatus: A multilayer mirror is constructed and arranged to reflect radiation haying a wavelength in the range of 2-8 nm. The multilayer mirror has alternating layers selected from the group consisting of: Cr and Sc layers, Cr and C layers, C and B4C layers, U and B4C layers, Th and B4C... Agent: Asml Netherlands B.v.

20110080574 - Stage apparatus, exposure apparatus, and exposure method: A stage apparatus PST is provided with a holder PH, which has a substrate holding surface 33A that holds a substrate P; a stage 52, which supports and moves the holder PH; and a recovery apparatus 60, which is disposed in the vicinity of the holder PH and has lyophilic... Agent: Nikon Corporation