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Photocopying March listing by industry category 03/11

20110075118 - Heat pipe, lithographic apparatus and device manufacturing method: A lithographic apparatus is provided that includes a substrate holder configured to hold a substrate, and a heat pipe to maintain the substrate holder at a substantially uniform temperature. The heat pipe has a chamber containing a liquid reservoir and a vapor space, and a heating element at least partly... Agent: Asml Netherlands B.v.

20110075119 - Resist pattern forming method, semiconductor apparatus using said method, and exposure apparatus thereof: In immersion exposure, a resist pattern forming method suppressing resist pattern defects comprises mounting a substrate formed a resist film thereon and a reticle formed a pattern thereon onto an exposure apparatus, supplying a first chemical solution onto the resist film to selectively form a first liquid film in a... Agent: Kabushiki Kaisha Toshiba

20110075120 - Exposure apparatus, exposure method, and device manufacturing method: A wafer stage is driven, based on positional information of a wafer stage measured using a measuring system and tilt information of the wafer stage. This allows the wafer stage to be driven with high precision, with the influence on the wafer stage when the wafer stage is tilted being... Agent: Nikon Corporation

20110075121 - Catadioptric projection objective: Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9), including a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging... Agent: Carl Zeiss Smt Ag

20110075123 - Method for detecting work alignment mark and exposure apparatus using the same: In a method of detecting a workpiece alignment mark for positioning a mask and a workpiece or in an exposure apparatus, a control unit detects a pattern whose positional relationship is determined with respect to the workpiece mark at a low magnification. The pattern is larger than the workpiece mark,... Agent: Ushio Denki Kabushiki Kaisha

20110075122 - Positioning system and a method for positioning a substage with respect to a frame: A method for positioning a substage, supported by a main stage, relative to a reference object, the substage moveable in a direction between a first and second position relative to the main stage. The method includes positioning the first stage using a passive force system that is activated by positioning... Agent: Asml Netherlands B.v.

20110075124 - Source and mask optimization by changing intensity and shape of the illumination source: An illumination source is optimized by changing the intensity and shape of the illumination source to form an image in the image plane that maximizes the minimum ILS at user selected fragmentation points while forcing the intensity at the fragmentation points to be within a small intensity range. An optimum... Agent: Asml Masktools B.v.

20110069287 - Device for producing a high-resolution reflection hologram: The invention relates to a device (1) for producing a reflection hologram (RH) by means of a master (3) which is formed by a substrate (4) on which a saw-toothed shaped structure (5) is formed by moulding, mechanical or lithographical methods. Said structure (5) has a reflective finish, is reflective... Agent:

20110069290 - Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method: A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured... Agent: Asml Netherlands B.v.

20110069289 - Lithographic apparatus, coverplate and device manufacturing method: An immersion lithographic apparatus, including: first and second objects which are spaced apart with a gap therebetween and on whose top surfaces immersion liquid is provided; and a gutter positioned under the gap and configured to collect any immersion liquid which passes through the gap, wherein an advancing contact angle... Agent: Asml Netherlands B.v.

20110069288 - Reticle transport apparatus, exposure apparatus, reticle transport method, and reticle processing method: A reticle transport apparatus transports a reticle to and from a processing atmosphere. A reticle loader loads the reticle into the processing atmosphere, with at least a portion of the reticle being covered by a cover. A cover manipulator, in the processing atmosphere, removes the reticle from the cover and... Agent: Nikon Corporation

20110069291 - Physical sensor for autofocus system: Methods and apparatus for compensating for forces applied by a system which measures a height of a photoresist-coated surface of a wafer are disclosed. According to one aspect, a method for measuring a height associated with a wafer includes utilizing a measurement of an air flow through an air gauge... Agent:

20110069293 - Actuator, positioning system and lithographic apparatus: Actuator for exerting a force and a torque on an object, wherein the actuator includes a first part that is movable with respect to a second part of the actuator in at least a first degree of freedom, wherein the object is mounted to the first part, wherein one of... Agent: Asml Netherlands B.v.

20110069294 - Apparatus and method for exposing edge of substrate: An apparatus and method for exposing an edge of a substrate are disclosed, in which an exposure time period for exposing the edge of the substrate is reduced. The apparatus for exposing an edge of a substrate includes a loading unit loading the substrate, and an edge exposure unit exposing... Agent: Lg Display Co., Ltd.

20110069292 - Metrology method and apparatus, lithographic apparatus, and device manufacturing method: A metrology apparatus includes first (21) and second (22) radiation sources which generate first (iB1) and second (iB2) illumination beams of different spatial extent and/or angular range. One of the illumination beams is selected, e.g. according to the size of target to be measured. The beam selection can be made... Agent:

20110069295 - Optical system for microlithography: An optical system (10), in particular a projection objective (12), for microlithography, has an optical axis and at least one optical correction arrangement (44), which has a first optical correction element (48) and at least one second optical correction element, wherein the first correction element is provided with a first... Agent: Carl Zeiss Smt Gmbh

20110069296 - Microlithographic exposure method as well as a projection exposure system for carrying out the method: In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable... Agent: Carl Zeiss Smt Ag

20110069297 - Lithographic apparatus, coverplate and device manufacturing method: A lithographic apparatus, including a substrate table configured to hold a substrate; a positioner configured to position the substrate table relative to a projection system, the positioner including a short stroke module configured to perform fine positioning movements, on which the substrate table is held and which is supported on... Agent: Asml Netherlands B.v.

20110069298 - Support or table for lithographic apparatus, method of manufacturing such support or table and lithographic apparatus comprising such support or table: A substrate table or a patterning device support includes an aerogel. The aerogel may be very light weight, for example the aerogel may have a density between 0.5 and 500 mg/cm3, preferably between 1 and 100 mg/cm3 and most preferably between 1 and 10 mg/cm3. The aerogel may be made... Agent: Asml Netherlands B.v.

20110063588 - Substrate processing apparatus, substrate processing system and inspection/periphery exposure apparatus: An edge exposure unit includes a projector, a projector holding unit, a substrate rotating unit, an outer edge detecting unit and a surface inspection processing unit. Each component of the projector holding unit operates to move the projector in an X direction and a Y direction. The projector irradiates a... Agent:

20110063589 - Exposure apparatus and method for manufacturing device: An exposure apparatus which exposes a substrate by projecting an image of a pattern, via an projection optical system and a liquid of a liquid immersion area formed on the substrate, onto the substrate, includes a liquid supply mechanism having supply ports for supplying the liquid on both sides of... Agent: Nikon Corporation

20110063590 - Optical element module: An optical element module comprising a plurality of module components is provided. The module components comprise an optical element, an optical element holder and a contact element. The optical element has a first coefficient of thermal expansion. The optical element holder holds the optical element via the first contact element... Agent: Carl Zeiss Smt Ag

20110063592 - Fluorescent film, method of forming fluorescent film, multilayer dielectric film, optical element, optical system, imaging unit, optical property measuring apparatus, method of measuring optical property, exposure apparatus, exposure method, and method of: A fluorescent film including a base material constituted of a UV-permeable fluoride, and an activator doped in the base material, wherein the activator contains a transition element or a rare earth element and emits fluorescent light in the base material when ultraviolet light is irradiated to the base material. Also... Agent: Nikon Corporation

20110063593 - Management apparatus, exposure method, and method of manufacturing device: A management apparatus obtains a list of a plurality of lots for which exposure processes are reserved, an initial value of an aberration of a projection optical system before start of the exposure processes of the plurality of lots, and an allowable value of the aberration of the projection optical... Agent: Canon Kabushiki Kaisha

20110063591 - Scanning exposure device and image-forming apparatus: A scanning exposure device includes: a reflecting member that reflects a light irradiated by an irradiating unit; a housing that has a bottom, a first sidewall, a second sidewall, and an aperture opening in a direction of a light reflected by the reflecting member; a cover that covers the aperture,... Agent: Fuji Xerox Co., Ltd.

20110063594 - Light source device and image forming apparatus: A light source device includes a surface emitting laser, a surface emitting laser holding unit on which the surface emitting laser is mounted, a parallel plate that is arranged on a light path of a light flux from the surface emitting laser so that the light flux enters into one... Agent: Ricoh Company, Ltd.

20110063595 - Optical aperture device: An optical module includes an aperture device and a support structure supporting the aperture device. The aperture device defines an aperture edge and an aperture plane. The aperture edge is adapted to define a geometry of a light beam passing the aperture device along an optical axis. The support structure... Agent: Carl Zeiss Smt Ag

20110063596 - Projection objective and projection exposure apparatus with negative back focus of the entry pupil: The disclosure concerns a projection objective, which can include an object plane in which an object field is formed, an entry pupil, a mirrored entry pupil (RE) in a mirrored entry pupil plane obtained by mirroring the entry pupil (VE) at the object plane, an image plane, an optical axis,... Agent: Carl Zeiss Smt Ag

20110063598 - Illumination optics for euv microlithography and related system and apparatus: An illumination optics for EUV microlithography guides an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter field dimension, where the ratio is considerably greater than 1. A field facet mirror has a plurality of field... Agent: Carl Zeiss Smt Gmbh

20110063597 - Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method: An optical system for a microlithographic projection exposure apparatus, and a microlithographic exposure method are disclosed. An optical system for a microlithographic projection exposure apparatus includes an illumination device, which has a mirror arrangement having a plurality of mirror elements which are adjustable independently of one another for altering an... Agent: Carl Zeiss Smt Ag

20110063599 - Film holder: A film holder is provided. During scanning of a to-be-scanned object, the film holder is inserted into a scanning device. The film holder includes an input portion, a guiding portion and a leveling portion. The input portion has an entrance, a channel and an exit, the channel disposed between the... Agent: Qisda (suzhou) Co., Ltd

20110063600 - Film holder: A film holder is provided. During scanning of a to-be-scanned object, the film holder is inserted into a scanning device. The film holder includes an input portion, a guiding portion and an information window. The input portion has an entrance, a channel and an exit, the channel disposed between the... Agent: Qisda (suzhou) Co., Ltd

20110063601 - Pellicle frame, pellicle, lithography apparatus, and method of fabricating the pellicle frame: A pellicle frame, including aluminum, aluminum oxide, and a transition metal.... Agent:

20110058147 - Cleaning module and euv lithography device with cleaning module: A cleaning module for an EUV lithography device with a supply (206) for molecular hydrogen, a heating filament (210) and a line (212) for atomic and/or molecular hydrogen. The line (212) has at least one bend with a bending angle of less than 120 degrees, and has a material on... Agent: Carl Zeiss Smt Ag

20110058148 - Lithographic apparatus and device manufacturing method: An immersion lithography apparatus is disclosed having a liquid supply system configured to at least partially fill a space between a final element of a projection system and a substrate table, with a first liquid, and a measurement system configured to measure a location of each of a plurality of... Agent: Asml Netherlands B.v.

20110058149 - Stage drive method and stage unit, exposure apparatus, and device manufacturing method: When a transition from a first state where one stage is positioned at a first area directly below projection optical system to which liquid is supplied to a state where the other stage-is positioned at the first area, both stages are simultaneously driven while a state where both stages are... Agent: Nikon Corporation

20110058151 - Exposure apparatus and device manufacturing method: An exposure apparatus which projects a pattern of an original onto a substrate by a projection optical system, comprises a measurement device configured to measure a relative position between an original stage and a substrate stage via the projection optical system using an original-side fiducial plate and a substrate-side fiducial... Agent: Canon Kabushiki Kaisha

20110058150 - Molecular transfer lithography apparatus and method for transferring patterned materials to a substrate: A system and method to implement a molecular transfer lithography process is described. A destroyable nanopatterned template coated with functional material is attached to a removable carrier that is held suspended over a substrate, and a shaped pressure pad brings the functional material into contact with the substrate, initiating adhesion... Agent:

20110051106 - Exposure apparatus and device manufacturing method: An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted that moves within a two-dimensional plane holding the substrate. In addition, a supply mechanism supplies... Agent:

20110051107 - Lithographic apparatus and device manufacturing method: In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate.... Agent:

20110051104 - Stage drive method and stage unit, exposure apparatus, and device manufacturing method: When a transition from a first state where one stage is positioned at a first area directly below projection optical system to which liquid is supplied to a state where the other stage-is positioned at the first area, both stages are simultaneously driven while a state where both stages are... Agent:

20110051105 - Stage drive method and stage unit, exposure apparatus, and device manufacturing method: A lithographic projection apparatus includes a substrate table to hold a substrate, a projection system to project a patterned beam of radiation onto the substrate and a liquid confinement structure to confine a liquid in a space between the projection system and the substrate, the substrate, the substrate table, or... Agent:

20110051108 - Exposure method, exposure apparatus, and device manufacturing method: Positional information of a stage is obtained using an interferometer system only during an exposure time when a constant speed drive of the stage is performed to form a pattern. Therefore, the linear measurement of the positional information is secured enough, which makes it possible to linearly drive the stage... Agent:

20110051109 - Measurement apparatus, exposure apparatus, and device manufacturing method: A measurement apparatus which includes a plurality of sensors arranged on a movable member, and a plurality of scales attached to a structure, and measures a position of the movable member by detecting a displacement of the movable member using a sensor and a scale that face each other, the... Agent:

20110051112 - Exposure apparatus, exposure method, and method for producing device: An exposure apparatus fills an optical path space of an exposure light beam with a liquid, and exposes a substrate by irradiating the substrate with the exposure light beam via a projection optical system and the liquid. A first optical element of the projection optical system is provided with a... Agent:

20110051110 - Lens comprising a plurality of optical element disposed in a housing: The invention relates to a lens comprising several optical elements that are disposed in a lens housing. At least one sensor array encompassing at least one capacitive sensor unit and/or at least one inductive sensor unit is provided for determining the relative position between a first optical element and a... Agent:

20110051111 - Position detection apparatus, exposure apparatus, and device fabrication method: The present invention provides a position detection apparatus including a sensor in which a plurality of regions where light from a mark formed on a substrate held by a stage is detected are arrayed in a first direction, a driving unit configured to drive the stage, a control unit configured... Agent:

20110051113 - Lithography system and optical module thereof: A lithography system includes a light source, a photo mask positioned downstream of the light source, an optical module having a front surface positioned downstream of the photo mask, and a wafer stage positioned downstream of the optical module for supporting a wafer, wherein the wafer comprises a dry film... Agent:

20110051114 - Optimized polarization illumination: Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an illumination intensity for at least one point on an illuminator for at least two polarization states, determining image log slope... Agent:

20110051115 - Substrate holding apparatus, mask alignment method, and vacuum processing apparatus: The present invention provides a mask alignment mechanism which reduces the occurrence of particles and which aligns a mask with high accuracy, and a vacuum processing apparatus including such a mask alignment mechanism. A mask alignment mechanism according to one embodiment of the present invention includes a substrate holder which... Agent:

20110051116 - Substrate matrix to decouple tool and process effects: A method of characterizing a process by selecting the process to characterize, selecting a parameter of the process to characterize, determining values of the parameter to use in a test matrix, specifying an eccentricity for the test matrix, selecting test structures to be created in cells on a substrate, processing... Agent: