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Photocopying February patent applications/inventions, industry category 02/11

20110043773 - Coating/developing apparatus and coating/developing method: Disclosed is an coating/developing apparatus and method thereof in which the processing time is shortened and the foot prints is reduced by shortening the travel distance of a wafer transfer arm. The coating/developing apparatus of the present disclosure includes, inter alia, liquid processing part (COT) that processes the substrate using... Agent: Cantor Colburn LLP

20110043774 - Cleaning module, euv lithography device and method for the cleaning thereof: In order to clean optical components (35) inside an EUV lithography device in a gentle manner, a cleaning module for an EUV lithography device includes a supply line for molecular hydrogen and a heating filament for producing atomic hydrogen and hydrogen ions for cleaning purposes. The cleaning module also has... Agent: Sughrue Mion, PLLC

20110043775 - Lithographic apparatus, distortion determining method, and patterning device: The invention relates to a lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, wherein said apparatus is operable to measure higher-order distortions and/or image plane deviations of the patterning device, said apparatus comprising: a device for transmission image detection; and a processor configured and... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20110043776 - Exposure control apparatus, manufacturing method of semiconductor device, and exposure apparatus: According to one embodiment, an exposure control apparatus includes exposure setting unit that performs an exposure setting of setting an exposure shot as a shot that is exposed or a shot that is not exposed based on height information on a height of a substrate in the exposure shot arranged... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20110043777 - Target material, a source, an euv lithographic apparatus and a device manufacturing method using the same: A target material is configured to be used in a source constructed and arranged to generate a radiation beam having a wavelength in an extreme ultraviolet range. The target material includes a Gd-based composition configured to modify a melting temperature of Gd.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20110043778 - Lithographic apparatus and device manufacturing method utilizing data filtering: An apparatus and method are used to form patterns on a substrate. The apparatus comprises a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams. The patterning device modulates the... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20110043779 - Grazing incidence collector optical systems for euv and x-ray applications: A collector optical system for EUV and X-ray applications is disclosed, wherein the system includes a plurality of mirrors arranged in a nested configuration that is symmetric about an optical axis. The mirrors have first and second reflective surfaces that provide successive grazing incidence reflections of radiation from a radiation... Agent: OpticusIPLaw, PLLC

20110043780 - Lithographic apparatus and device manufacturing method: Disclosed is a method of determining higher order distortions of a patterning device of a lithographic apparatus, and associated apparatus. The higher order distortions are measured using the transmission imaging device. In a main embodiment, enhanced reticles are used which may have additional alignment gratings in the perimeter, in the... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20110043781 - Projection optical device and exposure apparatus: A projection optical device includes a projection optical system which projects an image of a pattern, a support member attached to the projection optical system, and a plurality of coupling members connected to the support member. The coupling members suspend and support the projection optical system through the support member... Agent: Oliff & Berridge, PLC

20110043783 - Illumination optical system, exposure method and designing method: Exposure for performing patterning in which micropatterns differing in pitch exist in close vicinity to one another is handled, and micropatterns are formed with high accuracy with sufficient manufacture process margins without using a photomask complicated in manufacturing process at high manufacture cost like an alternating phase shift mask. A... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20110043782 - Spectral purity filters for use in a lithographic apparatus: A spectral purity filter includes a plurality of apertures extending through a member. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20110043784 - Object moving apparatus, object processing apparatus, exposure apparatus, object inspecting apparatus and device manufacturing method: A substrate is held by adsorption by a substrate holding frame that is formed into a frame shape and is lightweight, and the substrate holding frame is driven along a horizontal plane by a drive unit that includes a linear motor. Below the substrate holding frame, a plurality of air... Agent: Oliff & Berridge, PLC

20110037957 - Monitoring apparatus and method particularly useful in photolithographically processing substrates: Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a... Agent: Browdy And Neimark, PLLC

20110037959 - Environmental system including vacuum scavenge for an immersion lithography apparatus: A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table, the space having a cross-sectional area smaller than the area of the substrate. The liquid confinement structure includes a first inlet... Agent: Oliff & Berridge, PLC

20110037958 - Lithographic apparatus and device manufacturing method: In an embodiment, a lithographic projection apparatus has an off-axis image field and a concave refractive lens as the final element of the projection system. The concave lens can be cut-away in parts not used optically to prevent bubbles from being trapped under the lens.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20110037960 - Lithographic apparatus, device manufacturing method, cleaning system and method for cleaning a patterning device: A lithographic apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device is configured to impart a pattern to the beam of radiation. The apparatus includes a patterning device cleaning system configured to provide an... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20110037961 - Lithographic apparatus comprising an internal sensor and a mini-reactor, and method for treating a sensing surface of the internal sensor: A lithographic apparatus includes a projection system constructed and arranged to project a beam of radiation onto a target portion of a substrate, an internal sensor having a sensing surface, and a mini-reactor movable with respect to the sensor. The mini-reactor includes an inlet for a hydrogen containing gas, a... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20110037962 - Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method: According to one embodiment, a polarization converting unit configured to convert incident light into light in a predetermined polarization state has a first optical element and a second optical element. The first optical element has a plurality of first regions, and at least two adjacent first regions have respective different... Agent: Oliff & Berridge, PLC

20110032494 - Apparatus and method of application and development: A block for coating film formation and a block for a development process are stacked. A delivery stage to effect delivery of a substrate with a transportation unit for use in a block is provided for each process block at the carrier block side to constitute a shelf-type delivery stage... Agent: Smith, Gambrell & Russell

20110032497 - Conduit system for a lithographic apparatus, lithographic apparatus, pump, and method for substantially reducing vibrations in a conduit system: A conduit system for a lithographic apparatus is disclosed, the conduit system including a conduit configured to guide a liquid or liquid-gas mixture, and a gas injection nozzle configured to introduce a gas in the liquid or liquid-gas mixture to at least partially absorb pressure peaks or waves in the... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20110032495 - Exposure apparatus, exposure method, and device manufacturing method: A purge cover is equipped whose upper end is connected to an illumination unit and the lower end has a pair of plate sections facing an upper surface of a reticle stage and a reticle via a predetermined clearance. Therefore, gaseous circulation can be substantially blocked via the clearance between... Agent: Oliff & Berridge, PLC

20110032498 - Exposure apparatus, exposure method, and method for producing device: An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which performs the projection, and a liquid supply mechanism which supplies the liquid onto the substrate to form a liquid immersion area... Agent: Oliff & Berridge, PLC

20110032496 - Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method: One pair each of a Y linear motor (a total of four) on the +X side and the −X side that drive a reticle stage include one pair each of a stator section (a total of four) and three each of a mover section (a total of six) on the... Agent: Oliff & Berridge, PLC

20110032499 - Generating method, creating method, exposure method, and storage medium: The present invention provides a method of generating, by a computer, data on patterns of a plurality of originals for use in multiple exposure, in which a single-layer pattern is formed on a substrate by exposing the substrate a plurality of times, in an exposure apparatus including an illumination optical... Agent: Canon U.s.a. Inc. Intellectual Property Division

20110032500 - Inspection apparatus for lithography: The measurement of two separately polarized beams (Ix, Iy) upon diffraction from a substrate (W) in order to determine properties of the substrate is disclosed. Circularly or elliptically polarized radiation is passed via a variable phase retarder in order to change the phase of one of two orthogonally polarized radiation... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20110032501 - Exposure apparatus, exposure system, and method of manufacturing semiconductor device: In one embodiment, an exposure apparatus is configured to irradiate a mask with illumination light and to irradiate a wafer with light from the mask irradiated with the illumination light. The apparatus includes an information acquisition unit configured to acquire use history information that is information regarding a use history... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20110032502 - Polarization evaluation mask, exposure device, and polarization evaluation method: Polarization evaluation mask according to one mode includes a transparent substrate, a light shielding portion, plural quarter-wavelength plates, and plural polarizers. The light shielding portion is formed on the transparent substrate and has plural openings therein. Plural quarter-wavelength plates are formed to cover at least one opening. Fast axes of... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20110032503 - Measurement apparatus, exposure apparatus, and device fabrication method: The present invention provides a measurement apparatus which measures a height of a test surface, the apparatus including an image sensing device including a plurality of detection units configured to detect interfering light formed by measurement light from the test surface and reference light from a reference surface, and an... Agent: Rossi, Kimms & Mcdowell LLP.

20110032504 - Measurement apparatus, exposure apparatus, and device fabrication method: The present invention provides a measurement apparatus which measures a height of a test surface, the apparatus including an image sensing device including a plurality of detection units configured to detect interfering light formed by measurement light from the test surface and reference light from a reference surface, and an... Agent: Rossi, Kimms & Mcdowell LLP.

20110032505 - Robot for in-vacuum use: A robot positions a workpiece within a vacuum chamber of a lithographic apparatus. A first component of the robot is located within a vacuum chamber to position a workpiece along a translational axis. A shaft supports the first component such that an axis of symmetry of the shaft is perpendicular... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20110032506 - Exposure apparatus, system, updating method, and device manufacturing method: An exposure apparatus comprises a first interface connected to a communication network to which a control apparatus for performing a control operation of the exposure apparatus is connected, a second interface connected, not via the communication network, to an information processing apparatus which updates a software installed on the exposure... Agent: Rossi, Kimms & Mcdowell LLP.

20110025999 - Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine: An immersion exposure apparatus exposes a substrate with a light beam. The apparatus includes an optical member through which the light beam is irradiated onto the substrate, a substrate table which holds the substrate and is movable relative to the optical member, and a pad member which is movable relative... Agent: Oliff & Berridge, PLC

20110026000 - Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine: An immersion exposure apparatus exposes a substrate with a light beam. The apparatus includes an optical member through which the light beam is irradiated onto the substrate, a substrate table which holds the substrate and is movable relative to the optical member, and a pad member which is movable relative... Agent: Oliff & Berridge, PLC

20110025996 - Exposure apparatus, and device manufacturing method: An immersion liquid is supplied to a space between a projection system and a substrate, and a patterned beam of radiation is projected through the liquid onto a target portion of the substrate using the projection system. A liquid retaining member is replaced with a table member that holds the... Agent: Oliff & Berridge, PLC

20110025997 - Exposure apparatus, and device manufacturing method: An immersion liquid is supplied to a space between a projection system and a substrate, and a patterned beam of radiation is projected through the liquid onto a target portion of the substrate using the projection system. Substrates can be held on first and second tables. The first and second... Agent: Oliff & Berridge, PLC

20110025993 - Lithographic apparatus and device manufacturing method: A system to recycle immersion fluid in an immersion fluid lithographic apparatus is described. A recycling path comprising a plurality of parallel paths, each of which has its own parallel liquid treatment unit optimized to treat fluid which is directed through it, is disclosed.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20110025994 - Lithographic apparatus and device manufacturing method: A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20110025995 - Lithographic apparatus, device manufacturing method and a control system: A capillary passage is formed between a substrate holder and an edge structure. Along the capillary passage are arranged a plurality of electrodes which, when charged, become liquidphilic. The electrodes may be used to split droplets of liquid and pump the liquid along the capillary passage.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20110025992 - Optical system having an optical arrangement: An optical system, such as an illumination system, includes an optical arrangement having at least one optical element and at least one heat dissipation element configured to at least partially dissipate thermal energy generated in the optical element(s) to the outside environment of the optical system. The heat dissipation element(s)... Agent: Fish & Richardson P.C. (bo)

20110025998 - Stage drive method and stage unit, exposure apparatus, and device manufacturing method: A lithographic projection apparatus includes a substrate table to hold a substrate, a projection system to project a patterned beam of radiation onto the substrate and a liquid confinement structure to confine a liquid in a space between the projection system and the substrate, the substrate, the substrate table, or... Agent: Oliff & Berridge, PLC

20110026001 - Lithographic apparatus and monitoring method: A lithographic apparatus including a radiation beam monitoring apparatus, the radiation beam monitoring apparatus including an optical element configured to generate a diffraction pattern, and an imaging detector located after the optical element and not in a focal plane of the optical element such that the imaging detector is capable... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20110026002 - Euv radiation generation apparatus: An EUV radiation generation apparatus includes an optical gain medium configured to produce laser radiation for interaction with a target material to produce an EUV radiation-emitting plasma, and a structure defining an aperture through which the laser radiation may pass. The structure includes a radiation guide having an outer surface... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20110026003 - Projection objective for microlithography: A projection objective for microlithography is used for imaging an object field in an object plane into an image field in an image plane. The projection objective comprises at least six mirrors of which at least one mirror has a freeform reflecting surface. The ratio between an overall length (T)... Agent: Fish & Richardson P.C. (bo)

20110026005 - Exposure apparatus, exposure method, and method for producing device: An exposure apparatus includes a first optical member via which an exposure beam exits; a first movable body which is movable on a light-exit side of the first optical member; a measuring member which is provided on the first movable body and which has an inclined surface to which a... Agent: Oliff & Berridge, PLC

20110026004 - Positioning system, lithographic apparatus and method: A positioning system to position a movable object having a body, the positioning system includes an object position measurement system, an object actuator, and an object controller, wherein the positioning system further includes a stiffener to increase the stiffness and/or to damp relative movements within the body of the object,... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20110026006 - Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus, and device manufacturing method: Positional information of a movable body in a Y-axis direction is measured using an interferometer and an encoder whose short-term stability of measurement values excels when compared with the interferometer, and based on the measurement results, a predetermined calibration operation for obtaining correction information for correcting measurement values of the... Agent: Oliff & Berridge, PLC