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Photocopying January recently filed with US Patent Office 01/11Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 01/27/2011 > 9 patent applications in 5 patent subcategories. recently filed with US Patent Office
20110019167 - Method and system for color correction for three-dimensional (3d) projection: A method and system are disclosed for producing a color-corrected stereoscopic film for three-dimensional (3D) projection. Based on color measurements performed with different optical configurations of a projection system, at least one dye density adjustment can be determined for reducing discoloration in projected stereoscopic images that arises from one or... Agent: Robert D. Shedd, Patent Operations Thomson Licensing LLC
20110019168 - Lithographic apparatus and device manufacturing method: An immersion lithographic apparatus and method are disclosed in which measures are taken to account for dissolution of resist components, such as photo-acids or photo-acid generators, in immersion liquid. This may involve ensuring that each relevant part of the substrate is covered by liquid the same amount of time and/or... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20110019170 - Projection exposure apparatus and stage unit, and exposure method: A projection exposure apparatus has a substrate table on which a substrate is mounted that can be moved holding the substrate, a position measuring system that measures positional information of the substrate table, and a correction unit that corrects positional deviation occurring in at least either the substrate or the... Agent: Oliff & Berridge, PLC
20110019169 - Projection objective of a microlithographic projection exposure apparatus: A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator... Agent: Fish & Richardson P.C. (bo)
20110019173 - Diffraction elements for alignment targets: A patterning device, including alignment targets having alignment features formed from a plurality of diffractive elements, each diffractive element including an absorber stack and a multi-layered reflector stack is provided. The diffractive elements are configured to enhance a pre-determined diffraction order used for pre-alignment and to diffract light in a... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.
20110019172 - Illumination optics and projection exposure apparatus: An illumination optics illuminates an object field of a projection exposure apparatus for microlithography. The illumination optics include a condenser group of optical components which guide a bundle of useful light. An objective group of bundle-guiding components is arranged downstream of the condenser group. At least one component of the... Agent: Fish & Richardson P.C. (bo)
20110019171 - Optical unit having adjustable force action on an optical module: The present disclosure relates to an optical device, in particular for microlithography, having an optical module, a supporting structure and a force-generating device. The force-generating device is connected to the optical module and the supporting structure and is designed to exert a clamping force on the optical module. The force-generating... Agent: Fish & Richardson P.C. (bo)
20110019174 - Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby: An optical element includes a first layer that includes a first material, and is configured to be substantially reflective for radiation of a first wavelength and substantially transparent for radiation of a second wavelength. The optical element includes a second layer that includes a second material, and is configured to... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20110019175 - Laser interference lithography apparatus capable of stitching small exposed areas into large exposed area: A laser interference lithography apparatus capable of stitching small exposed areas into a large exposed area includes a body, a laser beam supplying unit, a reflecting mechanism, an L-shaped fixing mechanism and a substrate stage. The laser beam supplying unit fixed onto the body provides a laser beam. The reflecting... Agent: Muncy, Geissler, Olds & Lowe, PLLC01/20/2011 > 16 patent applications in 9 patent subcategories. recently filed with US Patent Office
20110013156 - Exposure apparatus, image forming apparatus, and hologram recording apparatus: An exposure apparatus according to an exemplary embodiment of the invention includes a substrate in which plural light-emitting devices are arrayed one-dimensionally or two-dimensionally; and a hologram recording layer that is disposed on the substrate, plural holograms being recorded in the hologram recording layer by holographic interference between a first... Agent: Oliff & Berridge, PLC
20110013157 - Lithographic apparatus comprising a magnet, method for the protection of a magnet in a lithographic apparatus and device manufacturing method: A lithographic apparatus includes a magnet being contained in a protective enclosure, the protective enclosure being arranged to protect the magnet from contact with a H2-containing or H-atom containing gas. The enclosure may further contain a hydrogen getter, such as a magnet-surface modifying gas, or a non-hydrogen containing gas. A... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20110013158 - Fluid handling structure, lithographic apparatus and device manufacturing method: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. A first portion of an undersurface of the fluid handling structure, in use, is a different distance from the facing... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20110013161 - Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method: An exposure apparatus exposes a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid that fills a space between the projection optical system and the substrate. The exposure apparatus has a liquid supply system having a supply path that supplies... Agent: Oliff & Berridge, PLC
20110013159 - Lithographic apparatus and a method of measuring flow rate in a two phase flow: A lithographic apparatus is disclosed that includes a conduit for two phase flow therethrough. A flow separator is provided to separate the two phase flow into a gas flow and a liquid flow. A flow meter measures the flow rate of fluid in the gas flow or the liquid flow.... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20110013160 - Optical element, exposure apparatus based on the use of the same, exposure method, and method for producing microdevice: An optical element includes a base material, a liquid-repellent member provided on at least a part of a surface of the base material, and a light-reducing member provided between the base material and the liquid-repellent member to protect the liquid-repellent member from radiation of light by reducing the light. The... Agent: Oliff & Berridge, PLC
20110013163 - Device manufacturing method, computer program and lithographic apparatus: In a device manufacturing method using a lithographic apparatus, corrections to the dose are applied, within and/or between fields, to compensate for CD variations due to heating of elements of the projection system of the lithographic apparatus.... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.
20110013162 - Pattern formation apparatus, pattern formation method, and device manufacturing method: When a segmented region SAi of a sheet S is scan-exposed, a stage SST1 adsorbs, at a standby position at the +X end portion of a scan region AS, a rear surface portion corresponding to the segmented region SAi of the sheet S onto a holding surface of a sheet... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20110013164 - Shear-layer chuck for lithographic apparatus: A lithographic apparatus is described that comprises a support structure (300) to hold an object (210). The object may be a patterning device or a substrate to be exposed. The support structure comprises a chuck (321), on which the object is supported, and an array of shear-compliant elongated elements (325)... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.
20110013165 - Position calibration of alignment heads in a multi-head alignment system: A calibration method for the position calibration of secondary alignment heads with a primary alignment head in a multi-head alignment system, such as that used for the measurement of markers on the surface of a wafer, as carried out during a lithographic process in the formation of circuits in or... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20110013167 - Apparatus with plasma radiation source and method of forming a beam of radiation and lithographic apparatus: An apparatus for forming a beam of electromagnetic radiation. The apparatus includes a plasma radiation source, a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source, and a grid disposed between the plasma radiation source and the... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20110013166 - Radiation system and lithographic apparatus: A radiation system includes a target material supply configured to supply droplets of target material along a trajectory, and a laser system that includes an amplifier and optics. The optics are configured to establish a first beam path which passes through the amplifier and through a first location on the... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20110013168 - Light guide panel and apparatus for forming pattern on light guide panel: A pattern forming apparatus for a light guide panel is provided. The apparatus may include a pattern design system, a control system, a header moving unit including an XY moving unit and a header unit, a laser system, beam splitters, and an optical unit. The pattern design system may have... Agent: North Star Intellectual Property Law, PC
20110013170 - Device for treating sheet-like substrates with light: A device for treating sheet-like substrates with light is made for a suction table, which includes a circulating suction strip for transporting the sheet-like substrates, which suction strip forms a descending loop relative to its table-parallel transport level. The loop has a descending branch and, adjacent to the latter, an... Agent: Edwin D. Schindler
20110013169 - Substrate table for a lithographic apparatus, lithographic apparatus, method of using a substrate table and device manufacturing method: A cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received.... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20110013171 - Projection exposure system for microlithography with a measurement device: A projection exposure system (10) for microlithography which includes: a mask holding device (14) holding a mask (18) with mask structures (20) disposed on the mask, a substrate holding device (36) holding a substrate (30), projection optics (26) imaging the mask structures (20) onto the substrate (30) during an exposure... Agent: Sughrue Mion, PLLC01/13/2011 > 14 patent applications in 7 patent subcategories. recently filed with US Patent Office
20110007289 - Device constructed and arranged to generate radiation, lithographic apparatus, and device manufacturing method: A device is constructed and arranged to generate radiation by using an electrical discharge through a gaseous medium. The device includes a first electrode and a second electrode, and a liquid supply arranged to provide a liquid to a location in the device. The device is arranged to be electrically... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20110007288 - Heat transfer assembly, lithographic apparatus and manufacturing method: A lithographic apparatus includes a heat transfer assembly configured to temperature control at least a portion of the lithographic apparatus. The heat transfer assembly includes a printed circuit board, and a plurality of heat transfer elements. The printed circuit board and the plurality of heat transfer elements are configured to... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20110007285 - Lithographic apparatus and device manufacturing method: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20110007287 - Lithographic apparatus and device manufacturing method: An immersion lithographic apparatus comprising a surface which is curved such that a surface-tension drainage force acts in a direction on a film of immersion liquid on the surface.... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20110007286 - Lithographic apparatus, a method of controlling the apparatus and a method of manufacturing a device using a lithographic apparatus: An immersion lithographic apparatus is disclosed that includes a substrate table configured to support a substrate, a projection system configured to direct a patterned beam of radiation onto a substrate, a liquid handling system configured to supply and confine immersion liquid to a space defined between a projection system and... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20110007290 - Exposure apparatus and device manufacturing method: Positional information of each of wafer stages during exposure and during alignment is measured directly under a projection optical system and directly under a primary alignment system, respectively, by a plurality of encoder heads, Z heads and the like, which a measurement bar placed below surface plates has, using gratings... Agent: Oliff & Berridge, PLC
20110007291 - Exposure apparatus and device manufacturing method: Positional information of each of wafer stages during exposure and during alignment is measured directly under a projection optical system and directly under a primary alignment system, respectively, by a plurality of encoder heads, Z heads and the like, which a measurement bar placed below surface plates has, using gratings... Agent: Oliff & Berridge, PLC
20110007292 - Lithographic apparatus, plasma source, and reflecting method: A lithographic apparatus includes a plasma source that includes a vessel configured to enclose a plasma formation site, an optical device configured to transfer optical radiation to or from the vessel, and a reflector arranged in an optical path between the optical device and the plasma formation site source. The... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20110007293 - Microlithographic projection exposure apparatus: The disclosure relates to a microlithographic projection exposure apparatus, as well as related components and methods. In some embodiments, a microlithographic projection exposure apparatus includes an illumination system and a projection objective, where the illumination system can illuminate an object plane of the projection objective and the projection objective can... Agent: Fish & Richardson P.C. (bo)
20110007296 - Exposure apparatus and device fabrication method: The present invention provides an exposure apparatus which transfers a pattern of a reticle onto a substrate, the apparatus including a convey unit configured to convey the substrate while chucking and holding a lower surface of the substrate, and a control unit configured to control a conveyance condition of the... Agent: Rossi, Kimms & Mcdowell LLP.
20110007294 - Lithographic apparatus and device manufacturing method: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20110007295 - Movable body apparatus, exposure apparatus and device manufacturing method: A stage device is equipped with a fine movement stage on which a wafer is mounted, a coarse movement stage formed into a frame shape that encloses the periphery of the fine movement stage, which supports the fine movement stage such that the fine movement stage is relatively movable and... Agent: Oliff & Berridge, PLC
20110007297 - Stage apparatus, exposure apparatus, and method of manufacturing device: A stage apparatus, which holds a plate member, comprises: a stage; a first positioning member and a second positioning member which are placed on the stage, and are configured to contact a lower surface and an upper surface of the plate member respectively to position the plate member in a... Agent: Rossi, Kimms & Mcdowell LLP.
20110007298 - Method and apparatus for measurement of exit pupil transmittance: A method and apparatus for determining the state of the lens transmittance of an optical projection system are described. A lens or imaging objective transmission is determined as a function of exit pupil transverse direction cosine (nx,ny) at multiple field points thereby providing a more complete analysis and correction of... Agent: Foley & Lardner LLP01/06/2011 > 15 patent applications in 6 patent subcategories. recently filed with US Patent Office
20110001943 - Exposure apparatus, exposure method, and device manufacturing method: Of a measurement stage that has a plate on which liquid is supplied, and performs measurement related to exposure via a projection optical system and a liquid, at least a part of the measurement stage including the plate can be exchanged. Therefore, by exchanging at least a part of the... Agent: Oliff & Berridge, PLC
20110001942 - Lithographic apparatus and device manufacturing method: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20110001944 - Lithographic apparatus and device manufacturing method: An immersion lithographic apparatus is disclosed which includes a liquid supply system having an inlet configured to supply a liquid to a space between a projection system of the lithographic apparatus and a substrate and an outlet configured to remove at least part of the liquid, the liquid supply system... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20110001946 - Exposure apparatus and method of manufacturing device: An exposure apparatus includes an illumination system which illuminates an original, a projection optical system which projects a pattern of the original onto a substrate, a measurement device configured to measure optical characteristics of at least one of the illumination system and the projection optical system, and a control unit... Agent: Rossi, Kimms & Mcdowell LLP.
20110001947 - Facet mirror for use in a projection exposure apparatus for microlithography: A facet mirror is to be used as a bundle-guiding optical component in a projection exposure apparatus for microlithography. The facet mirror has a plurality of separate mirrors. For individual deflection of incident illumination light, the separate mirrors are in each case connected to an actuator in such a way... Agent: Fish & Richardson P.C. (bo)
20110001948 - Illumination system for a microlithography projection exposure apparatus: An illumination system for a microlithography projection exposure apparatus generally includes an optical element formed of a plurality of facet elements. The facet elements are arranged such that, for each facet element, a proportion of the side surfaces of the facet element is at a certain distance from the side... Agent: Fish & Richardson P.C. (bo)
20110001951 - Lithographic apparatus and method: A drive system for controllably driving an electric actuator includes a current sensor system to sense a current conducted by the actuator and a driver to electrically drive the actuator based on an output signal of the current sensor system. The current sensor system includes at least a first and... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20110001950 - Multi-photon exposure system: An exposure system includes a light source emitting a beam along an optical axis that is capable of inducing a multi-photon reaction in a resin. The exposure system further includes a resin undergoing multiphoton reaction, as well as an automated system including a monitor that measures at least one property... Agent: 3m Innovative Properties Company
20110001949 - Optical imaging arrangement: There is provided an optical imaging arrangement comprising: a mask unit comprising a pattern, a substrate unit comprising a substrate, an optical projection unit comprising a group of optical element units, the optical projection unit being adapted to transfer an image of the pattern onto the substrate, a first imaging... Agent: Fish & Richardson P.C. (bo)
20110001945 - Projection optical system, exposure apparatus, and assembly method thereof: According to one embodiment, an assembly method of a projection optical system, including a lower tube and an upper tube, comprises: storing a relative positional relation between the lower tube and the upper tube in a state in which an optical characteristic of the projection optical system is adjusted; disassembling... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20110001952 - Resist exposure and contamination testing apparatus for euv lithography: An resist exposure and contamination testing apparatus for extreme ultraviolet lithography utilizing a wafer coated with a resist. A source of electromagnetic radiation produces a first electromagnetic beam. A deflection mirror receives the first electromagnetic beam and removes debris therefrom. The deflection mirror also produces a second electromagnetic beam free... Agent: Theodore J. Bielen Jr. Bielen, Lampe, & Thoeming
20110001954 - Chucking system with recessed support feature: In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward deflection of outer edges of the template in a nano imprint lithography process.... Agent: Molecular Imprints
20110001953 - Transport apparatus and exposure apparatus: A substrate is transported between a first space and a second space, which are separated by a partition wall, through an opening portion formed in the partition wall. A transport apparatus includes a support device having a support portion which supports the substrate, the support device being provided so as... Agent: Oliff & Berridge, PLC
20110001955 - System and method for using a two part cover and a box for protecting a reticle: Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.
20110001956 - Exposure method, exposure apparatus, and method of manufacturing device: An exposure method comprises a calculation step of calculating a correction amount of a correction unit which corrects a change in imaging characteristics of a projection optical system based on at least one of parameters including a numerical aperture and effective light source of an illumination optical system, a numerical... Agent: Rossi, Kimms & Mcdowell LLP.Previous industry: Optics: image projectors
Next industry: Optics: measuring and testing
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