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Photocopying November recently filed with US Patent Office 11/10

20100296068 - Exposure apparatus, exposure method, and device manufacturing method: An exposure apparatus exposes an object with exposure light. The exposure apparatus includes: a moving body which holds the object and is movable in a predetermined plane, and in which a scale member including a grating is disposed; a measurement system which measures positional information of the moving body in... Agent: Oliff & Berridge, PLC

20100296067 - Lithographic apparatus and method of operating the apparatus: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100296070 - Exposure apparatus, exposure method, and device manufacturing method: While an exposure processing is performed to a wafer held by a fine movement stage supported by a coarse movement stage in an exposure station, at least a part of a measurement processing to a wafer held by another fine movement stage supported by another coarse movement stage and an... Agent: Oliff & Berridge, PLC

20100296071 - Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method: A fine movement stage is driven by a controller, based on positional information of the fine movement stage in a measurement direction measured by a measurement system and correction information of a measurement error caused by a tilt of the fine movement stage included in the positional information. Accordingly, driving... Agent: Oliff & Berridge, PLC

20100296069 - Pattern division method, pattern division processing apparatus and information storage medium on which is stored a program: There is provided a pattern division method to form crowded patterns accurately on a substrate includes acquiring a mask pattern, dividing a predetermine area into a plurality of areas to prepare a division pattern in which the plurality of the areas are classified into first and second groups, generating a... Agent: Mcginn Intellectual Property Law Group, PLLC

20100296072 - Inspection apparatus, lithographic apparatus and method of measuring a property of a substrate: A piezo-electric material is placed adjacent to the path of the radiation beam such that, when power is applied to the piezo-electric material it rotates into the path of the radiation beam to block it. A smaller and lighter radiation beam shutter therefore results.... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20100296073 - Lithographic apparatus, substrate table, and method for enhancing substrate release properties: A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20100296074 - Exposure method, and device manufacturing method: A lateral shift ΔXAM of an image of an alignment mark projected on a wafer is obtained for a plurality of linewidth (a to d) which are different to one another and defocus amount (ΔZ), taking into consideration an illumination condition and optical properties of a projection optical system, and... Agent: Oliff & Berridge, PLC

20100290015 - Ex-situ removal of deposition on an optical element: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector... Agent: Pillsbury Winthrop Shaw Pittman LLP

20100290013 - Immersion lithographic apparatus and a device manufacturing method: An immersion lithographic apparatus has a pressure sensor configured to measure the pressure of immersion liquid in a space between the substrate and a projection system. A control system is responsive to a pressure signal generated by the pressure sensor and controls a positioner to exert a force on the... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100290014 - Supporting plate, stage device, exposure apparatus, and exposure method: An exposure apparatus and method exposes, using an optical member, a pattern of a mask onto a substrate that is located on a substrate stage which is movable over a supporting plate. A liquid is provided between the optical member and the substrate, Fluid is sprayed toward the supporting plate... Agent: Oliff & Berridge, PLC

20100290016 - Microdevice fabrication: According to certain embodiments, systems comprising an energy source; at least one conjugate mask; a magnification device; and a fabrication material; wherein the at least one conjugate mask is disposed between the energy source and the magnification device; and wherein the fabrication material is disposed operable to the magnification device.... Agent: Baker Botts L.l.p

20100290017 - Folded optical encoder and applications for same: A system and method are used to determine a parameter (e.g., angle, position, orientation, etc.) of a device. A first portion includes a source of radiation configured to produce a beam of radiation that is directed to be reflected from a reflective portion of the device. A second portion is... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20100290018 - Miniaturized microparticles: A system and method for forming encoded microparticles is described. One embodiment includes a system for forming encoded microparticles, the system comprising a step and repeat exposure system capable of performing a method comprising: printing at a first time a first portion of a code of a microparticle; and printing... Agent: Cooley LLP Attn: Patent Group

20100290019 - Exposure apparatus, exposure method and device fabricating method: An exposure method for exposing a plate with an image of a pattern of a mask comprises: reciprocating the mask along X direction, synchronizing a movement of the mask and a movement of the plate to +X direction, projecting an image of a first pattern of the mask onto the... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20100290020 - Optical apparatus, exposure apparatus, exposure method, and method for producing device: An optical apparatus, having a lens which is irradiated with an exposure light, includes a light source which emits a non-exposing light having a wavelength region different from that of the exposure light, an irradiation unit which irradiates a part of a surface of the lens with the non-exposing light... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20100290021 - Optical element for reflection of uv radiation, method for manufacturing the same and projection exposure apparatus comprising the same: An optical element (1a, 1b) for reflecting UV radiation at an operating wavelength below 250 nm, preferably at 193 nm, which has a substrate (2a, 2b), a reflective layer (3a, 3b) made of aluminum superimposed on the substrate (2a, 2b). The reflective aluminum layer (3a, 3b) is not transparent to... Agent: Sughrue Mion, PLLC

20100290022 - Enhancing alignment in lithographic apparatus device manufacture: In a lithographic apparatus, a scanning mechanism is coarse compared with precise patterns to be exposed onto a substrate. In order to ensure that the image and the substrate are aligned at some point in time, an oscillation is imparted to either the substrate table, or to a device that... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20100290023 - Method for detecting substrate position of charged particle beam photolithography apparatus and charged particle beam photolithography apparatus: One aspect of the invention provides a substrate position detecting method for charged particle beam photolithography apparatus in order to be able to measure accurately and simply a substrate position on a stage. The substrate position detecting method for charged particle beam photolithography apparatus includes placing a substrate on a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20100290024 - Method for improving the imaging properties of a projection objective, and such a projection objective: The invention relates to a method-for improving the imaging properties of a micro lithography projection objective, wherein the projection objective has a plurality of lenses between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively... Agent: Fish & Richardson PC

20100283978 - Led-based uv illuminators and lithography systems using same: An LED-based UV illuminator is disclosed that includes a plurality of LED light sources that emit UV light, and a plurality of dichroic mirrors. The dichroic mirrors are arranged relative to the LED light sources and configured to direct the UV light along a common optical path. A light homogenizer,... Agent: OpticusIPLaw, PLLC

20100283979 - Exposure apparatus, exposing method, and device fabricating method: An exposure apparatus successively exposes each substrate of a plurality of substrates included in a lot with exposure light through a liquid. The exposure apparatus comprises: a movable substrate holding member that holds the substrate at a position whereto the exposure light can be radiated; and a liquid immersion member... Agent: Oliff & Berridge, PLC

20100283981 - Immersion lithographic apparatus and device manufacturing method: In an all-wet immersion lithographic apparatus, the immersion liquid is allowed to flow off an edge of the substrate table. The immersion liquid is moved with the substrate table during exposure. The motion of the immersion liquid may result in a disturbance and/or de-wetting. A geometry of the substrate table... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100283980 - Liquid immersion member: A liquid immersion member is disposed around an optical member having an emergent surface from at least part of which exposure light is emitted and which holds a liquid between itself and an object opposing the emergent surface so that an optical path of exposure light between the emergent surface... Agent: Oliff & Berridge, PLC

20100283982 - High contrast lithographic masks: A structure and a method for an equi-brightness optimization. The method may include projecting a plurality of bright patterns having a plurality of bright points and a plurality of dark patterns having a plurality of dark points on a substrate, generating a plurality of joint eigenvectors of the plurality of... Agent: Harrington & Smith

20100283983 - Illumination apparatus for efficiently gathering illumination light: An illumination apparatus includes a light guide fiber receiving illumination light, which is generated by first to third light sources, with first to third entrances and emitting at least part of the illumination light received by each entrance from a common exit. A second illumination relay optical system optically relays... Agent: Staas & Halsey LLP

20100283984 - Microlithographic projection exposure apparatus: A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest... Agent: Fish & Richardson PC

20100283985 - Microlithographic projection exposure apparatus: A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest... Agent: Fish & Richardson PC

20100283986 - Stage unit, exposure apparatus, and exposure method: A power usage supply unit—that supplies power usage to a stage which moves on a movement surface has a first axis section, first support sections, a second axis section, and a second support section. The first axis section is movably supported by the first support section in a direction of... Agent: Oliff & Berridge, PLC

20100283987 - Pattern forming method: Using a mask in which line patterns are arranged in X and Y directions each at a pitch of P, first exposure is performed at a first position, and then the position of the mask is shifted in the X and Y directions by P/2 and second exposure is performed.... Agent: Fitzpatrick Cella Harper & Scinto

20100277706 - Method of measurement, an inspection apparatus and a lithographic apparatus: According to an example, a first layer of a substrate comprises a plurality of gratings having a periodicity P. A second layer of the substrate comprises a plurality of gratings, overlapping with the first set of gratings, and having a periodicity of NP, where N is an integer greater than... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20100277707 - Illumination optics for a microlithographic projection exposure apparatus: Illumination optics for a microlithographic projection exposure apparatus is used for illumination of an object field in the object plane with illumination light of a radiation source. The illumination optics has an optical beam influencing element which is divided into at least two beam influencing regions in order to generate... Agent: Fish & Richardson PC

20100277708 - Illumination system of a microlothographic projection exposure apparatus: An illumination system of a microlithographic projection exposure apparatus includes a beam deflection array including a number beam deflection elements, for example mirrors. Each beam deflection element is adapted to deflect an impinging light beam by a deflection angle that is variable in response to control signals. The light beams... Agent: Fish & Richardson PC

20100277710 - Exposure apparatus: An apparatus includes a measurement station configured to perform a measurement including a reference mark measurement in which a position of a reference mark provided on a stage that supports a substrate is measured, an alignment measurement, and a focus measurement, and an exposure station configured to perform exposure of... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100277709 - Substrate table, immersion lithographic apparatus and device manufacturing method: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system... Agent: Pillsbury Winthrop Shaw Pittman, LLP