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Photocopying October categorized by USPTO classification 10/10Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 10/28/2010 > patent applications in patent subcategories. categorized by USPTO classification
20100271602 - Protective apparatus, mask, mask forming apparatus, mask forming method, exposure apparatus, device fabricating method, and foreign matter detecting apparatus: A protective apparatus protects a predetermined area on a surface of a substrate. The protective apparatus includes: a frame portion that includes a pair of flexible portions which are disposed along a first direction and oppose each other, and is connected to the surface of the substrate to surround the... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100271605 - Side seal for wet lens elements: A method for protecting a wet lens element from liquid degradation is provided. The method includes applying a thin coating of an organoxy-metallic compound to the side portions of a wet lens element to leave behind an optically inert, light absorbing metal oxide film. A liquid shield coating is applied... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.
20100271603 - Stage for substrate temperature control apparatus: A stage for substrate temperature control apparatus in which an extent of a transient temperature distribution that occurs when a substrate is heated or cooled can be reduced in comparison with the conventional one. The stage for substrate temperature control apparatus is a stage to be used for mounting a... Agent: Wenderoth, Lind & Ponack, L.L.P.
20100271604 - System and method to increase surface tension and contact angle in immersion lithography: A system and method to allow organic fluids to be used in immersion lithographic systems. This is done by providing a showerhead portion of a liquid supply system that is partially coated or made from a TEFLON like material. The TEFLON like material reduces wetness effect, and thus increases containment,... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100271606 - Lithographic apparatus and a method of operating the apparatus: An immersion lithographic apparatus is disclosed. The apparatus has a projection system configured to project a patterned radiation beam onto a target portion of the substrate, the projection system having a lower surface. The apparatus also has a liquid confinement structure defining, in use, in part with the lower surface... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100271607 - Optical assembly: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one... Agent: Fish & Richardson PC
20100271608 - System and method for imaging apparatus calibration: A system is disclosed including an image sensor positioned at a first specified angle relative to a projected image plane. The system includes a projector that projects a test pattern onto the projected image plane. A controller is structured to iteratively adjust the projector focus until an image focus index... Agent: Krieg Devault LLP
20100271610 - Lithographic radiation source, collector, apparatus and method: A collector assembly for use in a laser-produced plasma extreme ultraviolet radiation source for use in lithography has a collector body having a collector mirror and a window in the collector body. The window is transmissive to excitation radiation, which may be an infrared laser beam, so that it can... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100271609 - Mark position detection device and mark position detection method, exposure apparatus using same, and device manufacturing method: The mark position detection device of the present invention, which detects a position of a mark provided on a substrate, includes an image sensor with changeable resolution and readout area, an optical system that directs light reflected from the mark to the image sensor, and a control unit configured to... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100271613 - Bearing device, stage device, and exposure apparatus: A sufficient moving stroke can be secured without connecting a tube, etc. for supply of air. A movable body (3) having a pad part (73) and a fixed body (2) are provided. The movable body (3) is movably supported by the fixed body (2) by supplying the medium to the... Agent: Miles & Stockbridge PC
20100271611 - Lithographic apparatus having a substrate support with open cell plastic foam parts: A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate support constructed to hold a... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100271612 - Method and pellicle mounting apparatus for reducing pellicle induced distortion: An apparatus for mounting a pellicle onto a mask is provided. In one embodiment, the apparatus comprises a base provided with a track; a dummy plate holder coupled to the base, the dummy plate holder for receiving a dummy plate having an elevated portion on one side thereof; a mask... Agent: Lowe Hauptman Ham & Berner, LLP10/21/2010 > patent applications in patent subcategories. categorized by USPTO classification
20100265476 - Lithographic apparatus and device manufacturing method: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100265477 - Semiconductor manufacturing apparatus and pattern formation method: In a pattern formation method employing immersion lithography, after a resist film is formed on a wafer, pattern exposure is performed by selectively irradiating the resist film with exposing light with a liquid including an unsaturated aliphatic acid, such as sunflower oil or olive oil including oleic acid, provided on... Agent: Mcdermott Will & Emery LLP
20100265478 - Projection lens system of a microlithographic projection exposure installation: A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging... Agent: Fish & Richardson PC
20100265479 - Device manufacturing method and lithographic apparatus: A mask can be used to print a pattern. Due to mask pattern surface topography, an image error may occur, such as an intensity imbalance between adjacent bright lines in the projected pattern. To help alleviate or eliminate the problem of intensity imbalance, the projection system may include an optical... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100265480 - Mirror for the euv wavelength range, projection objective for microlithography comprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objective: A mirror for the EUV wavelength range (1) having a layer arrangement (P) applied on a substrate (S), the layer arrangement having a periodic sequence of individual layers, where the periodic sequence has at least two individual layers—forming a period—composed respectively of silicon (Si) and ruthenium (Ru). Also disclosed are... Agent: Sughrue Mion, PLLC
20100265482 - Illumination system for illuminating a mask in a microlithographic exposure apparatus: An illumination system of a micro-lithographic projection exposure apparatus is provided, which is configured to illuminate a mask positioned in a mask plane. The system includes a pupil shaping optical subsystem and illuminator optics that illuminate a beam deflecting component. For determining a property of the beam deflecting component, an... Agent: Fish & Richardson PC
20100265481 - Imaging optical system and projection exposure installation: An imaging optical system has a plurality of mirrors. These image an object field in an object plane into an image field in an image plane. In the imaging optical system, the ratio of a maximum angle of incidence of imaging light) on reflection surfaces of the mirrors and an... Agent: Fish & Richardson PC
20100265483 - Exposure apparatus, exposure method, and method of manufactruing device: An exposure apparatus of one aspect of the present invention is provided with a moving mechanism that moves a first portion of a belt-shaped substrate that has photosensitivity in a first heading along a first direction and moves a second portion of the substrate in a second heading along the... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100265484 - Lithographic apparatus, method for levelling an object, and lithographic projection method: A lithographic apparatus configured to project a patterned radiation beam onto a substrate. The apparatus includes a support configured to hold a patterned object, and a measurement system configured to detect orientations and/or densities of user area structures that are present on a user area of the patterned object.... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100265485 - Flexibly deformable holding element for substrates: Flexibly deformable holding elements operate such that substrates can be held in a fixed manner at a surface of the holding element electrostatically or also by means of negative pressure and planar positional deviations or unwanted deformations can be compensated simply and reliably, where at least one cut-out having an... Agent: Gibson & Dernier LLP
20100265487 - Lithographic apparatus, positioning system, and positioning method: A positioning system for a lithographic apparatus including a control system to position a moveable object of the lithographic apparatus in at least one direction which is substantially parallel to a frame, the control system including a measurement system to measure a position of the moveable object, an actuator to... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100265486 - Method of clamping a substrate and clamp preparation unit: The invention relates to a method of clamping a substrate on a surface of a substrate support structure. First, a liquid is applied on a surface of the substrate support structure. The surface is provided with a plurality of contact elements. The liquid is applied such that the contact elements... Agent: Howrey LLP-eu
20100265488 - Method of placing a substrate, method of transferring a substrate, support system and lithographic projection apparatus: A method of placing a substrate onto a surface of a substrate holder, in which the surface is provided with a plurality of burls. Substrate placement data for allowing placement of the substrate at a certain position with respect to a position of the plurality of burls on the surface... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.- None available for 10/01/2010
- None available for 10/7/2010
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